CN107272348A

CN107272348A - Scanning-exposure apparatus and device making method

Info

Publication number: CN107272348A
Application number: CN201710459661.4A
Authority: CN
Inventors: 熊泽雅人
Original assignee: Nikon Corp
Current assignee: Nikon Corp
Priority date: 2012-07-13
Filing date: 2013-03-26
Publication date: 2017-10-20
Anticipated expiration: 2033-03-26
Also published as: CN104428715B; KR20150035991A; KR102096891B1; KR101880792B1; HK1221778A1; JP6128240B2; KR101914895B1; JP6137356B2; JP6350687B2; JP2016085475A; JP2018136577A; HK1207161A1; KR102007616B1; CN104428715A; CN107229190A; JP2016122202A; WO2014010274A1; JP6245342B2; CN105652609B; JP6519694B2

Abstract

Lining processor (EX) includes：Projection optical system (PL), makes to project to substrate from the reflected beams (L2) that illumination region (IR) is produced, so that in the picture of substrate formation mask pattern；Light separation unit (10), make towards illumination region illumination light and from illumination region produce imaging beam in a side by and reflect the opposing party；With lamp optical system (IL), primary source picture is formed, and by the illumination from primary source picture in illumination region, and formed between center line and barrel surface with primary source as the 1st conjugate planes of optical conjugate.

Description

Scanning-exposure apparatus and device making method

The present patent application be international filing date be on March 26th, 2013, international application no be PCT/JP2013/058704, National applications number into National Phase in China is 201380036561.0, entitled " lining processor and device system Make method " patent application divisional application.

Technical field

The present invention relates to lining processor and device making method.

The application is based on Japan's Patent filed in 13 days July in 2012 2012-157810 and on July 13rd, 2012 Japan's Patent 2012-157811 CLAIM OF PRIORITYs of application, and here cite its content.

Background technology

It is used as the lining of the pattern formation (patterning) for the electronic circuit for carrying out semiconductor integrated device, display panel etc. Bottom processing unit, utilizes accurate exposure device extensively.The exposure device is usually the electronics electricity that will be formed in light shield (mask) The pattern on road is optically transferred in the dress on the photonasty substrate such as semiconductor crystal wafer or glass substrate via projection optical system Put.Wherein used light shield is typically to form circuit pattern by light screening materials such as chromium on flat quartz plate to form, In the projection aligner of sweep type, while making the light shield one-dimensionally move back and forth, while making photonasty substrate with step-scan Mode is moved, so that the circuit pattern of light shield is transferred on substrate in the way of rectangular (2 dimension) arrangement.

It is known in the projection aligner of such step-scan mode, (move substrate by the number of times for reducing stepping The acceleration and deceleration number of times of dynamic movable microscope carrier) output (productivity ratio) can be improved.Thus, for example in following patent documents 1 A kind of exposure device is described, it prepares the cylinder light shield of reflection-type, and arranges multiple repeatedly in the circumference of the drum surface Circuit pattern is to realize high-throughput.

On the other hand, production larger display panels scene, using with carry large glass substrate (2m × 2m with On) the scanning exposure apparatus of movable microscope carrier, the various places that are directly imaged, etched to large glass substrate, deposited etc. Manage device and handling device.These exposure devices, processing unit, handling device are all extremely large-scale and high costs, not only such as This, be also difficult to suppress the totle drilling cost relevant with the manufacture of display panel (the various operating funds of companion devices work, on a large scale clearly Waste that the material scrap process of maintenance funds, the etching of clean room etc. is brought etc.).

Therefore, attracted attention as more the manufacture method of resource is saved, using high-precision printing technology soft Property resin substrates or plastic supporting base on directly formed electronic circuit printed electronics.Using the technology in volume to volume mode The method for manufacturing organic EL display panel is for example on the books in following patent documents 2.Volume to volume mode refers to, from supply Reel pulls out the strip substrate (film) of flexible (flexibility) and right in the way for reclaiming the transport path on reel is wound up into Substrate implements the mode of various processing.

In addition, as the lining processor of exposure device etc., as example patent document 1 described as follows is described, being Improve on a semiconductor wafer with scan mode continuously projection exposure multiple chip devices when output, it is proposed that use The device of cylindric rotation light shield.In addition, as one of methods of electronic device such as manufacture display panel, solar cell, Volume to volume mode described in known example patent document 2 described as follows.Volume to volume mode is, while from the reel of submitting to returning The reel of receipts carries the flexible substrates such as film, while carrying out the mode of various processing to substrate in transport path.

Prior art literature

Patent document

Patent document 1:International Publication No. 2008/029917

Patent document 2:International Publication No. 2008/129819

The content of the invention

In exposure device disclosed in patent document 1, due to can for example make the rotation of cylinder light shield while in substrate Exposure is intensively scanned to multiple irradiations (shot) region formed a line along scan exposure direction on (wafer), so step Enter number of times swash subtract, the exposure-processed of high-throughput can be realized.But, in the projected light of exposure device disclosed in patent document 1 It is drum due to forming the pattern on the outer peripheral face of cylinder light shield, so there is also project to substrate in system On pattern image quality (as matter) deterioration, projectable minimum line it is broad and rough, high-precision (loyal) transfer can not be expected Possibility.

In addition, in the manufacture of the display panel of the volume to volume mode disclosed in patent document 2, if only passing through printing The pattern that mode or ink-jet (drop) mode can not carry out fine is formed, then imports exposure device.In this case, it is necessary to The sheet-like substrates of flexibility are stably carried under optical projection system.For realizing that the effective means of the carrying is, such as by sheet-like substrates Tensioning along its length is while the mode transported in the part on the surface of rotating cylinder on one side.In this approach, Because the pattern image of the light shield formed based on optical projection system is projected in the sheet-like substrates for bending to cylinder planar, so equally Exist quality (as matter) deterioration of the pattern image on substrate, projectable minimum line it is broad and rough, can not expect high-precision (loyal ) possibility of transfer.

The purpose of a mode of the present invention is there is provided a kind of lining processor and device making method, and it can be Bend to the projection of the pattern on the light shield face of cylindrical shape or into the pattern projection on the substrate for bending to cylindrical shape, will project Picture is with high-precision exposure on substrate.

In addition, above-mentioned exposure device by the mask pattern for for example bending to drum is continuously rotated while with The rotation synchronously makes substrate (wafer) scanning movement, can realize efficient exposure-processed.But, because mask pattern is curved Song is into cylinder planar, if so a part for the mask pattern is projected into plane half via common projection optical system On semiconductor wafer, then there is the low possibility of the quality (distortion inaccuracy, anisotropic magnification error, focusing error etc.) of projection image Property.

The purpose of the another way of the present invention is that, there is provided a kind of lining processor and device making method, it can Using the mask pattern (cylinder light shield) of bending in the case where the quality for not making projection image is reduced accurately projection exposure.

According to the 1st mode of the present invention there is provided a kind of lining processor, make the reflexive light configured along barrel surface The picture of cover pattern projection exposure on irritability substrate, the barrel surface is with defined radius bend around defined center line , the lining processor is characterised by, including：Light shield holding member, the light is kept along the barrel surface Cover pattern, and can be around center line rotation；Projection optical system, makes from the part being set in the mask pattern Illumination region produce the reflected beams projected to the irritability substrate, thus form the light on the irritability substrate The picture of a part for cover pattern；Light separation unit, is configured in the projected light to fall to penetrate illumination to illumination region progress In the light path of system, make towards the illumination light of the illumination region and from the reflected beams of illumination region generation A side by and reflect the opposing party；And lamp optical system, form the primary source of the light source as the illumination light Picture, via a part of light path of the smooth separation unit and the projection optical system by from the primary source as described in Illumination is formed and the primary source in the illumination region, also, between the center line and the barrel surface As the 1st conjugate planes of optical conjugate.

In aforesaid way or, it is in the chief ray for the illumination light for reaching the illumination region, described The extended line for each chief ray being distributed in the circumference of barrel surface is configured to and the 1st conjugate planes parallel to the center line On line intersect.

In aforesaid way or, the 1st conjugate planes configuration is between the center line and the illumination region Middle position or its near.

In aforesaid way or, the projection optical system has pupil plane, formed on the pupil plane by The secondary souce picture of the lamp optical system formation, the smooth separation unit is configured at the position of the pupil plane or its is attached Closely.

In aforesaid way or, the smooth separation unit include make the illumination light towards the illumination region Pass through by portion and make from the illumination region produce the reflected beams reflect reflecting part, the projection optical system bag Include the optical system in light path of the configuration between the smooth separation unit and the illumination region, the reflecting part of the smooth separation unit At least a portion configuration pass through portion pair with described in the intersection point of the optical axis on the optical system and the smooth separation unit At the position of title.

In aforesaid way or, form the secondary souce on the pupil plane of the projection optical system It is bigger than along the size on the direction of the center line along the size in the circumference of the barrel surface as being configured to.

In aforesaid way or, the smooth separation unit also have provide out via it is described by portion towards institute State the specified part by scope of the illumination light of illumination region.

In aforesaid way or, the specified part utilize the reflecting part at least a portion.

In aforesaid way or, the lamp optical system includes：Diaphragm part, configuration with the illumination Area optical conjugation position or its near；And optical component, configuration from the primary source as to the diaphragm part In light path, and the optical component the circumferential ability along the barrel surface than the energy along the direction of the center line Power is big.

In aforesaid way or, the optical component makes the master of the illumination light of the arrival illumination region Each chief ray in light, being arranged on the direction of the center line is parallel to each other, and makes in the circumference of the barrel surface Each chief ray of arrangement is in the way of causing its extended line to intersect with the line in the 1st conjugate planes parallel to the center line Deflection.

In aforesaid way or, the lamp optical system has a uniform irradiation optical system, described uniform to shine Penetrate optical system configurations, at least a portion of the light path of the diaphragm part, and makes with described from the primary source picture Primary source picture is uniform near the position of the diaphragm part or its for the light intensity distributions of the illumination light of light source.

In aforesaid way or, the uniform irradiation optical system include and the 1st conjugate planes optical conjugate And it is formed with the 2nd conjugate planes of the secondary souce picture, the distribution of the secondary souce picture formed in the 2nd conjugate planes Scope is set to smaller than the circumferential size along the barrel surface along the size in the direction of the center line.

In aforesaid way or, the lamp optical system also includes：Diaphragm part, configuration is shone with described The position of area pellucida domain optical conjugate or its near；And specified part, configure from the light source of the illumination light is sent to the optics In the light path of system, and provide out distribution of the illumination light in the smooth separation unit towards the illumination region.

According to the 2nd mode of the present invention there is provided a kind of device making method, including：Filled by the substrate processing of the 1st mode Put while carrying the irritability substrate along prescribed direction while the light shield holding member is rotated, while described The mask pattern is exposed on irritability substrate；After the change of the inductive layer using the irritability substrate being exposed Continuous processing.

According to the 3rd mode of the present invention there is provided a kind of lining processor, make the reflexive light configured along barrel surface The picture of cover pattern projection exposure on irritability substrate, the barrel surface is with defined radius bend around defined center line , the lining processor is characterised by, including：Light shield holding member, the light is kept along the barrel surface Cover pattern, and can be around center line rotation；Projection optical system, makes from the part being set in the mask pattern Illumination region produce the reflected beams projected to the irritability substrate, thus form the light on the irritability substrate The picture of a part for cover pattern；Light separation unit, is configured in the projected light to fall to penetrate illumination to illumination region progress In the light path of system, make towards the illumination light of the illumination region and from the reflected beams of illumination region generation A side by and reflect the opposing party；And lamp optical system, make the illumination light from light source generation via the light Separation unit and be irradiated in the illumination region, and make the chief ray of the illumination light with towards the center line and the cylinder Peripheral, oblique of the mode of assigned position between face on the barrel surface.

According to the 4th mode of the present invention there is provided a kind of lining processor, make the reflexive light configured along barrel surface The picture of cover pattern projection exposure on irritability substrate, the barrel surface is with defined radius bend around defined center line , the lining processor is characterised by, including：Light shield holding member, the light is kept along the barrel surface Cover pattern, and can be around center line rotation；Lamp optical system, is formed as direction and is set in the mask pattern On a part illumination region illumination light light source primary source picture, by the illumination from the primary source picture Light irradiation is formed and the primary source picture light in the illumination region, also, between the center line and the barrel surface Learn the 1st conjugate planes of conjugation；1st projection optical system, by the anti-of the illumination region generation from the illuminated illumination light Irradiating light beam is guided to intermediate image plane, and forms in the intermediate image plane picture of a part for the mask pattern；Concave mirror, configuration Near the position of the intermediate image plane or its；And the 2nd projection optical system, by by described in the concave mirror The picture that the reflected beams project towards the irritability substrate and form the 1st projection optical system in the intermediate image plane It is projected on the irritability substrate.

In aforesaid way or, the concave mirror is so as to which the pupil plane of the 2nd projection optical system must be reached The modes that are parallel to each other of chief ray of the reflected beams set.

In aforesaid way or, in the distance of image planes and the view field of the 2nd projection optical system For in the scope below the depth of focus, the concave mirror is configured with offseting from the intermediate image plane.

In aforesaid way or, in addition to deflection component, the deflection component configuration from the concave mirror to In the light path of the pupil plane of 2nd projection optical system, and make the reflected beams deflection in the concave mirror.

In aforesaid way or, the deflection component is so as to which the pupil of the 2nd projection optical system must be reached The mode that the chief ray of the reflected beams in face is parallel to each other is set.

In aforesaid way or, the 1st projection optical system is in the intermediate image plane by the light shield figure The picture of a part for case is formed with reduction magnification.

In aforesaid way or, comprising the 1st projection optical system and the 2nd projection optical system Projection optical system by the picture of a part for the mask pattern with etc. multiplying power formation in the view field.

In aforesaid way or, the 1st conjugate planes configuration is between the center line and the illumination region Central position or its near.

In aforesaid way or, also with light separation unit, the smooth separation unit is across from the primary source picture Configure, make towards the illumination to the light path of the illumination region and from the illumination region to the light path of the intermediate image plane The illumination light in region and towards the side in the reflected beams of the intermediate image plane by and reflect the opposing party, institute Lamp optical system is stated via the smooth separation unit by the illumination in the illumination region, the 1st projected light System guides the reflected beams to the intermediate image plane via the smooth separation unit.

In aforesaid way or, the 1st projection optical system has pupil plane, the shape on the pupil plane Into the secondary souce picture formed by the lamp optical system, the smooth separation unit configuration is in the 1st projection optical system The position of pupil plane or its near.

In aforesaid way or, the 1st projection optical system include configuration the smooth separation unit with it is described The optical system in light path between illumination region, the smooth separation unit is included for the illumination light towards the illumination region Pass through by part and the reflection part for reflecting the reflected beams from the illumination region, the smooth separation unit Reflection part at least a portion configuration the optical axis on the optical system and the smooth separation unit intersection point and with institute State by the symmetrical position of part.

In aforesaid way or, form the secondary light on the pupil plane of the 1st projection optical system Source image is configured to bigger than along the size on the direction of the center line along the size in the circumference of the barrel surface.

In aforesaid way or, the smooth separation unit also have provides out towards described in the illumination region The specified part by scope of illumination light.

In aforesaid way or, the specified part utilize the reflection part at least a portion.

In aforesaid way or, the smooth separation unit also includes configuration from the primary source picture to described Reflection part in the light path of the pupil plane of 1st projection optical system, at least a portion of the reflection part is configured to The reflected beams are not blocked into the light path of the intermediate image plane from the pupil plane of the 1st projection optical system.

In aforesaid way or, the lamp optical system also includes：Diaphragm part, configuration is shone with described The position of area pellucida domain optical conjugate or its near；And specified part, configure from the light source of the illumination light is sent to optical system Light path in, and provide out distribution of the illumination light in the smooth separation unit towards the illumination region.

According to the 5th mode of the present invention there is provided a kind of device making method, including：Filled by the substrate processing of the 3rd mode Put and carry the irritability substrate along prescribed direction while the light shield holding member is rotated, in irritability lining Mask pattern described in continuous exposure on bottom；It is follow-up with change using the inductive layer of the irritability substrate being exposed Processing.

According to the 6th mode of the present invention there is provided a kind of lining processor, make the reflexive light configured along barrel surface The picture of cover pattern projection exposure on irritability substrate, the barrel surface is with defined radius bend around defined center line , the lining processor is characterised by, including：Light shield holding member, the light is kept along the barrel surface Cover pattern, and can be around center line rotation；Lamp optical system, makes the illumination light from light source described towards being set in The illumination region irradiation of a part in mask pattern, and make the chief ray of the illumination light with towards the center line and institute State peripheral, oblique of the mode of assigned position between barrel surface on the barrel surface；1st projection optical system, will pass through institute The reflected beams stated the irradiation of illumination light and produced from the illumination region are guided to intermediate image plane, and in the intermediate image plane shape Into the picture of a part for the mask pattern；Concave mirror, is configured near the position of the intermediate image plane or its；And the 2nd throw Shadow optical system, makes the reflected beams in the concave mirror incident, will be formed by the 1st projection optical system Picture in the intermediate image plane is projected on the irritability substrate.

Invention effect

According to the mode of the present invention, using the teaching of the invention it is possible to provide a kind of lining processor and device making method, it will can be projected As being accurately exposed on substrate, and can expeditiously it be exposed.

In addition, according to the another way of the present invention, using the teaching of the invention it is possible to provide a kind of lining processor and device making method, its energy The picture of enough mask patterns that bending is projected out with high-quality, and in the figure for carrying out High precision, the display device of miniaturization etc. During case formation, high-precision projection exposure can be carried out.

Brief description of the drawings

Fig. 1 is the figure for the device inspection apparatus for showing the 1st embodiment.

Fig. 2 is the schematic diagram for illustrating the schematic illustration of the optical system of exposure device.

Fig. 3 is to show the figure to the incident light beam of illumination region and the light beam from illumination region outgoing.

Fig. 4 is the figure for the composition for showing lining processor (exposure device).

Fig. 5 is the figure for the composition for showing the 2nd diaphragm part from light source to lamp optical system.

Fig. 6 is the figure of the composition for the 1st diaphragm part for showing lamp optical system.

Fig. 7 A are the figures from the 1st diaphragm part to the composition of light separation unit for showing lamp optical system.

Fig. 7 B are the figures from the 1st diaphragm part to the composition of light separation unit for showing lamp optical system.

Fig. 8 is to show the figure from composition of the light separation unit of lamp optical system to the image planes of projection optical system.

Fig. 9 is the figure for the light separation unit for showing the 1st embodiment.

Figure 10 is to show the figure to the incident light beam of illumination region and the light beam from illumination region outgoing.

Figure 11 is the top view for showing the light beam from illumination region outgoing.

Figure 12 is the figure for the representative position for showing the illumination region of reference in the explanation of luminous point.

Figure 13 is the figure for showing the luminous point in the 1st conjugate planes with light source image conjugate.

Figure 14 is the figure of the composition for the lining processor for showing the 2nd embodiment.

Figure 15 is by the figure shown in the part amplification of the optical system of exposure device.

Figure 16 is the figure for the device inspection apparatus for showing the 3rd embodiment.

Figure 17 is the schematic diagram for illustrating the optical system of the exposure device of the 3rd embodiment.

Figure 18 is to show the figure to the incident light beam of illumination region and the light beam from illumination region outgoing.

Figure 19 is the figure of the composition for the bottom processing unit (exposure device) for showing the 3rd embodiment.

Figure 20 is the figure for the composition for showing uniform irradiation optical system.

Figure 21 is the figure for the composition for showing the 1st diaphragm part.

Figure 22 A are to show the figure from the 1st diaphragm part to the composition of light separation unit.

Figure 22 B are to show the figure from the 1st diaphragm part to the composition of light separation unit.

Figure 23 is the figure for the composition for showing light separation unit.

Figure 24 is shown to the incident light beam of illumination region and the beam pattern from illumination region outgoing.

Figure 25 is the figure for showing the light beam from illumination region outgoing.

Figure 26 is the figure for the representative position for showing the illumination region of reference in the explanation of luminous point.

Figure 27 is the figure for showing the luminous point in the 1st conjugate planes with light source image conjugate.

Figure 28 is the figure for showing the light path in the 1st projection optical system.

Figure 29 is the figure for showing the light path in the 2nd projection optical system.

Figure 30 is the figure of the composition for the lining processor (exposure device) for showing the 4th embodiment.

Figure 31 is the figure for showing the light path in lamp optical system.

Figure 32 is the figure for showing the light path in the 1st projection optical system.

Figure 33 is the figure for showing the light path in the 2nd projection optical system.

Figure 34 is the flow chart for showing device making method.

Embodiment

[the 1st embodiment]

Fig. 1 is the structure of one for the device inspection apparatus SYS (flexible display manufacturing line) for showing present embodiment Into figure.There is illustrated sequentially pass through n platform processing units from the supply roll FR1 flexible substrate P (piece, film etc.) pulled out U1, U2, U3, U4, U5, Un and until wound on reclaim reel FR2 on example.

In the following description, on XYZ orthogonal coordinate system, substrate P surface (or back side) is set as to hang down with XZ faces Directly and the orthogonal width in the carrying direction (length direction) with substrate P is set as Y direction.In the following description, The direction of rotation of X-direction be will be around as θ X-directions, similarly, the direction of rotation point of Y direction, Z-direction is will be around Not as θ Y directions, θ Z-directions.

Substrate P on supply roll FR1 is pulled out from the driven roller DR1 clamped and carried to processing unit U1. The center of substrate P Y direction (width) is by marginal position controller EPC1 SERVO CONTROLs, to cause it relative to target Position is in the range of ± more than ten μm to tens of μm degree.

Processing unit U1 is by photonasty functional liquid (photoresist, photonasty coupling material, photonasty with mode of printing Plating reducing agent, UV solidified resin liquid etc.) continuously or optionally it is coated on substrate P carrying direction (length direction) Apparatus for coating on substrate P surface.It is provided with processing unit U1：Wind substrate P roller platen DR2；It is included in the impressing The coating that photonasty functional liquid (irritability functional liquid) equably or is partly coated on substrate P surface on roller DR2 is used The apparatus for coating Gp1 of roller etc.；For the solvent or moisture included in the photonasty being coated on substrate P functional liquid rapidly to be removed Drying device Gp2 gone etc..

Processing unit U2 is to be heated to set point of temperature (for example, tens of DEG C for will carry the substrate P come from processing unit U1 To 120 DEG C or so) so that the heater of photonasty functional layer (irritability functional layer) the stably set of coating on the surface. It is provided with processing unit U2：Multiple rollers and air turning-bar (air turn bar) for carrying that substrate P turns back；For The heating chamber portion HA1 heated to the substrate P moved into；For make warmed-up substrate P temperature drop with subsequent handling The cooling chamber portion HA2 that the environment temperature of (processing unit U3, lining processor) is mutually fitted；Driven roller DR3 clamped etc..

Processing unit U3 (lining processor) includes exposure device, and it from processing unit U2 to carrying the substrate P's come Photonasty functional layer (irritability functional layer) irradiates the ultraviolet line chart corresponding with the circuit pattern or wiring pattern of display Case forms light.It is provided with processing unit U3：The center of substrate P Y direction (width) is controlled in constant position Marginal position controller EPC2；The driven roller DR4 clamped；In pattern formation light irradiation substrate P position supporting substrate P lining Bottom support reel DR5 (substrate supporting member)；And for applying defined slackness (surplus capacity) DL 2 groups of drives to substrate P Dynamic roller DR6, DR7 etc..

It is provided with processing unit U3：The mask pattern M of reflection-type is formed with cylindric outer peripheral face and is surrounded and Y-axis The roller light shield DM of the parallel center line rotation in direction；To roller light shield DM mask pattern M irradiation along Y direction extend it is narrow The lighting unit IU of the exposure illumination light of gap-like；In the part by the substrate supporting drum DR5 substrate P supported, projection The projection optical system PL of the picture of a part in the circumference for the mask pattern M for going out roller light shield DM；And in order that be projected Pattern the picture of a part and substrate P relative position pairing (alignment) and detecting be previously formed on substrate P to fiducial mark The aligming microscope AM of note etc..

Processing unit U4 is carried out to carrying the substrate P come photonasty functional layer from processing unit U3 at the imaging of wet type At least one kind of wet type processing device of the various wet processeds such as reason, electroless plating processing.It is provided with processing unit U4：In Z 3 treatment troughs BT1, BT2, BT3 of direction of principal axis higher slice；Multiple rollers that substrate P bendings are carried；And the driven roller clamped DR8 etc..

Processing unit U5 is to carry out heating so as to will become tide in wet processed to carrying the substrate P come from processing unit U4 Wet substrate P moisture amount is adjusted to the heat drying apparatus of setting, and description is omitted.Then, by several Processing unit and the last processing unit Un for passing through a succession of processing substrate P via the driven roller DR9 clamped by On recovery reel FR2.It is also that driven roller DR9 is rolled up with reclaiming by marginal position controller EPC3 in the winding Relative position in cylinder FR2 Y direction is carried out in gradually Correction and Control, the Y direction (width) to cause substrate P The heart or the substrate ora terminalis of Y direction are in the Y-axis direction without deviation.

The operating that host control device CONT is used for each processing unit U1 to Un to constituting manufacturing line is carried out totally Control.Host control device CONT is also carried out to each processing unit U1 to Un treatment situation with the monitoring of processing state, to place Manage device between substrate P carrying state monitoring, based on inspection, the feedback modifiers of measurement result and feedforward before and after the event Amendment etc..

The substrate P used in the present embodiment is, for example, resin film, the paper tinsel being made up of metal or alloy such as stainless steels Flexible substrates such as (films).The material of resin film is for example comprising polyvinyl resin, acrylic resin, polyester resin, ethene-second Enol copolymer resin, Corvic, celluosic resin, polyamide, polyimide resin, polycarbonate resin, It is one kind or two or more in polystyrene resin, vinyl acetate resin.

Substrate P preferably selectes thermal coefficient of expansion and does not become big material significantly, so as to substantially ignore in various processing Because of deflection caused by heated in process.Thermal coefficient of expansion for example can be thin by the way that inorganic filling material is mixed into resin It is set in film and by its thermal coefficient of expansion smaller than threshold value corresponding with treatment temperature etc..Inorganic filling material for example can be oxygen Change titanium, zinc oxide, aluminum oxide, silica etc..In addition, it by the thickness of the manufactures such as float glass process is 100 μm or so that substrate P, which can be, Very thin glass individual layers or the laminate of fitted on the very thin glass above-mentioned resin film, paper tinsel etc.. In addition, substrate P can also its surface is modified beforehand through defined pre-treatment and activated, or pass through stamped method Formed and constructed (sag and swell) for the fine next door of precise pattern formation on the surface.

The device inspection apparatus SYS of present embodiment is performed or continuously performed repeatedly for device (display to substrate P Panel etc.) manufacture various processing.The substrate P for implementing various processing is divided (section) according to each device from into multiple Device.Substrate P size is, for example, that the size of width (being used as the Y direction of short side) is 10cm to 2m or so, length side It is more than 10m to the size of (being used as the X-direction on long side).The size of substrate P width (being used as the Y direction of short side) It can also be below 10cm, can also be more than 2m.The size of substrate P length direction (being used as the X-direction on long side) also may be used Think below 10m.

Below, the exposure principle of processing unit U3 (exposure device EX, lining processor) is illustrated.Fig. 2 is to be used to illustrate The schematic diagram of the schematic configuration of exposure device EX optical system.Fig. 3 is shown to light beam incident illumination region IR and from photograph The explanation figure of the state of the light beam of area pellucida domain IR outgoing.

Exposure device EX shown in Fig. 2 includes roller light shield DM, lamp optical system IL, projection optical system PL, light point From portion 10 and deflection component 11.Roller light shield DM has the outer peripheral face (hereinafter referred to as barrel surface 12) of cylinder planar, is formed with The mask pattern M of the reflection-type bent along barrel surface 12.Barrel surface 12 is with predetermined radius bending around defined center line Into face, the e.g. outer peripheral face of cylinder or cylinder at least a portion.Roller light shield DM can surround Pivot axle AX1 (center line) rotates.

Lamp optical system IL is protected via a projection optical system PL part by illumination light L1 to roller light shield DM Illumination region IR on the mask pattern M held carries out falling to penetrate illumination.Lamp optical system IL includes：1st optical system 13, is used for The light source as illumination light L1 light source is formed as L0；With the 2nd optical system as the part for projection optical system PL 14 (its optical axis is 14a).From light source as L0 illumination light L1 by light separation unit 10 by portion 15 to the 2nd optical system 14 is incident, and is then irradiated to illumination in the plane of reflection upper deflecting of the upside of deflection component 11 by the 2nd optical system 14 Region IR, above-mentioned light separation unit 10 is by configuring mother metal, the i.e. nitre material of the concave mirror on projection optical system PL pupil plane Constitute.Projection optical system PL is included in the light path of light separation unit 10, configuration between light separation unit 10 and illumination region IR 2nd optical system (optical system) 14.

On light separation unit 10, in fig. 2, the top half from optical axis 14a of light separation unit 10 (is passed through by portion Portion) 15, light source is formed herein as L0 (for example, set of spot light picture many formed by by fly's-eye lens), detailed feelings Condition will be in rear explanation.In addition, in fig. 2, the latter half of 14a, the optical axis of light separation unit 10 is the reflecting part 16 of concave shape.

Projection optical system PL (including the 2nd optical system 14) is by the reflected beams that will be produced in illumination region IR to lining Bottom P is projected and is projected to the picture of the mask pattern M shown in illumination region IR a part on substrate P.Following In explanation, the light beam for being produced by illumination light L1 irradiation from mask pattern M and be projeced into substrate is suitably termed as imaging Light beam L2.

The planes of reflection of the imaging beam L2 produced in illumination region IR in the upside of deflection component 11 it is deflected and to 2nd optical system 14 is incident, after the reflecting part 16 of light separation unit 10 reflects, passes through once again by the 2nd optical system 14 2nd optical system 14 and the plane of reflection for reaching the downside of deflection component 11.The plane of reflection in the downside of deflection component 11 is anti- The imaging beam L2 penetrated is formed at the position being conjugated with illumination region IR with the mask pattern M's that shows in illumination region IR A part of corresponding intermediary image Im.Intermediary image Im (uses reference in Fig. 4 by the projection optical system configured behind PL2 is represented) and on substrate P reimaging.

In addition, as shown in figure 3, because illumination region IR bends to cylinder planar, so illumination light L1 chief ray L1a phases For illumination region IR incidence angle can according to the incoming position of the chief ray L1a in the circumference of barrel surface 12 and it is different.This Be in order that from illumination region IR produce imaging beam L2 each chief ray L2a in the face vertical with Pivot axle AX1 It is parallel to each other.

In the present embodiment, lamp optical system IL is in order that each chief ray L2a for obtaining imaging beam L2 turns into close State (telecentric iris (Telecentric) state) parallel to each other and be configured to make in the face vertical with Pivot axle AX1 main Light L1a is that nonparallel illumination light L1 is irradiated to illumination region IR.That is, lamp optical system IL in order that imaging beam L2 to Projection optical system PL light incident side turns into telecentric iris state and will be configured to non-telecentric to the incident illumination light L1 of illumination region IR State.

In order to form such illumination condition, illumination light L1 each chief ray L1a is configured in barrel surface 12 and rotation Central shaft AX1 centre position (near 1/2 position of the radius of barrel surface 12) convergence.Therefore, the centre position turns into and photograph The position of bright optical system IL pupil plane (Fig. 2 light separation unit 10 by portion 15) conjugation.

In addition, each chief ray L2a of imaging beam L2 in the face vertical with Pivot axle AX1 direct of travel is set Determine into：For example relative to the generation position on each chief ray L2a illumination region IR and Pivot axle AX1 be formed by connecting Connecting line (radial direction) is tilted.Because, as shown in Figure 2, it is necessary to make illumination light L1 and imaging beam L2 in light separation unit 10 Separated up and down across optical axis 14a at position.Therefore, as shown in Fig. 2 imaging in the face vertical with Pivot axle AX1 The beam L2 each chief ray L2a direct of travel face (with paper vertical) vertical relative to the optical axis 14a of the 2nd optical system 14 It is inclined at an angle in the face (paper).

Below, processing unit U3 (exposure device EX) composition is described in more detail.Fig. 4 is the structure for showing exposure device EX Into figure.Exposure device EX includes：Keep mask pattern M and the roller light shield DM (light that can be rotated around Pivot axle AX1 Cover holding member)；Support substrate P and the rotating cylinder DP (substrate supporting member) that can be rotated around Pivot axle AX2.According to Bright optical system IL is illuminated on the mask pattern M kept with uniform brightness to roller light shield DM by Ke Le (Kohler) Illumination region IR is illuminated.

Projection optical system PL is by the imaging beam L2 produced from illumination region IR to the substrate P supported by rotating cylinder DP On view field PR projections, the picture of a mask pattern M part (in illumination region IR) is thus formed on substrate P.

Projection optical system PL shown in Fig. 4 includes：1st projection optical system PL1, for being formed in illumination region IR Mask pattern M intermediary image Im；With the 2nd projection optical system PL2, for intermediary image Im to be projected on into substrate P.Shown in Fig. 4 The 1st projection optical system PL1 and the 2nd projection optical system PL2 as example by circular image field pass through prism mirror (deflection Part 11,35) the Reflected refraction type no projection optical system of half image field type that is split to form of the plane of reflection up and down and with telecentric iris shape State is constituted.

Exposure device EX is so-called scanning-exposure apparatus, and it is by making roller light shield DM and rotating cylinder DP with defined Rotary speed rotates than synchronously, the mask pattern M that can be kept roller light shield DM picture continuously projection exposure repeatedly In on the rotating cylinder DP substrate P supported surface (face bent along barrel surface).

As long as part cylindric or cylindric roller light shield DM, and be formed with instead along its outer peripheral face (barrel surface 12) The mask pattern M of emitting.

Mask pattern M can also be following composition, i.e.,：It will be deposited in the flexible glass that thickness is such as 100 μm or so High reflectivity metal envelope on piece is made as the sheet light shield patterned, and by it wound on the outer of roller light shield DM So as to be installed relative to roller light shield DM in the way of it can change on side face.

Rotating cylinder DP (Fig. 1 substrate supporting drum DR5) is cylindric or cylindric part, and its outer peripheral face is cylinder Planar.Substrate P in a part for rotating cylinder DP outer peripheral face for example by being supported on rotating cylinder DP.For The view field PR of mask pattern M picture projection is configured near rotating cylinder DP outer peripheral face.

Substrate P can be supported by by being suspended in multiple transport rollers, and in this case, view field PR can be configured Between multiple transport rollers.

Exposure device EX for example including：Drive division for distinguishing rotation driving roller light shield DM and rotating cylinder DP；With Test section in detection roller light shield DM and the respective positions of rotating cylinder DP；For adjusting roller light shield DM and rotating cylinder DP The move portion of respective position；And for the control unit in each portion for controlling exposure device EX.

Exposure device EX control unit controls drive division according to the testing result of test section, so that roller light shield DM and rotation Tumbler cylinder DP compares synchronous rotary with defined rotary speed.In addition, the control unit controls to move according to the testing result of test section Dynamic portion, to adjust roller light shield DM and rotating cylinder DP relative position.

Lighting unit IU shown in Fig. 1 includes the 1st optical system of the light source 20 and lamp optical system IL shown in Fig. 4 System 13.Lamp optical system IL the 1st optical system 13 from the light that light source 20 is sent by forming the light as illumination light L1 The light source in source makes illumination light L1 light intensity distributions uniform as L0.

Light source 20 includes the solid light of the lamp source or laser diode, light emitting diode (LED) such as mercury vapor lamp etc. Source.The illumination light L1 sent from light source 20 is, for example, that bright line (g lines, h lines, i lines), KrF PRKs (wavelength 248nm) etc. are remote Ultraviolet (DUV light), ArF PRKs (wavelength 193nm) etc..

Fig. 5 shows the light source 20 that is also showed that from Fig. 4 to the figure of the composition of lamp optical system IL the 2nd diaphragm part 26. The 1st optical system 13 shown in Fig. 5 include input lens (input lens) 21, fly's-eye lens 22, the 1st diaphragm part 23, in After lens 24, the diaphragm part 26 of cylindrical lens 25 and the 2nd.

Input lens (input lens) 21 are configured in position incident the illumination light L1 sent from light source 20.Input is saturating Mirror (input lens) 21 converges illumination light in the way of within illumination light L1 is closed at the incident end face 22a of fly's-eye lens 22 L1.Fly's-eye lens 22 has in the face orthogonal with the optical axis of input lens (input lens) 21 with the multiple of two-dimensional arrangements Mirror key element 22b.

Fly's-eye lens 22 will exist from the illumination light L1 of input lens (input lens) 21 outgoing according to each lens feature 22b Spatially split.In light from the outgoing end face 22c of the outgoing of fly's-eye lens 22 according to each lens feature 22b formation primary sources As (convergent spot light etc.).The pupil plane for the 1st projection optical system PL1 being formed with the face and Fig. 4 of the primary source picture (being also lamp optical system IL pupil plane) neighbouring light separation unit 10 and (the 1st conjugation of conjugate planes 40 in rear explanation Face, as shown in Figure 10 etc.) optical conjugate.

1st diaphragm part 23 is so-called opening diaphragm (illumination σ diaphragm), configures the outgoing end face in fly's-eye lens 22 22c or its near.

Fig. 6 is the figure of the composition for the 1st diaphragm part 23 for showing lamp optical system IL.As shown in fig. 6, the 1st diaphragm portion Long Circle or the opening of elliptical shape that part 23 passes through with least a portion for the illumination light L1 from fly's-eye lens 22 23a。

In Fig. 5, Fig. 6, the 1st diaphragm part 23 configure with face (parallel with XY faces) that the optical axis of relay lens 24 is orthogonal On.In addition, inside dimension (size) D1 on opening 23a the 1st direction (X-direction) is than the interior chi on the 2nd direction (Y direction) Very little (size) D2 is small, and the 2nd direction corresponds to the direction parallel with Pivot axle AX1.Inside dimension (size) D1 the 1st side It is circumferential consistent with barrel surface 12 into the illumination region IR on the roller light shield DM in Fig. 2 or Fig. 4.

1st direction is the direction that projection is irradiated in the circumference in barrel surface 12, and the 2nd direction is in the rotation with barrel surface 12 Turn to irradiate the direction of projection on the parallel directions of central shaft AX1.That is, the 1st diaphragm part 23 is configured so that barrel surface 12 Illumination light L1 on the angle of divergence (NA) of illumination light L1 in the circumference direction more parallel than with the Pivot axle AX1 of barrel surface 12 The angle of divergence (NA) it is small.

Fig. 7 A and Fig. 7 B are to show to separate from the 1st diaphragm part 23 of the lamp optical system IL shown in Fig. 4 and Fig. 5 to light The figure of one of the specific optical system (lens configuration) in portion 10.Fig. 7 A are shown on the face orthogonal with Pivot axle AX1 Plan.Fig. 7 B show the plan on the face parallel with Pivot axle AX1.

As shown in Figure 7 A, optical axis parallel relative to the Z axis of the 1st optical system 13 the opening 23a of the 1st diaphragm part 23 13a is amesiality (+X-axis side) configures.In addition, as shown in Figure 7 B, the opening 23a of the 1st diaphragm part 23 is closed in the Y-axis direction Symmetrically configured in the optical axis 13a of the 1st optical system 13.That is, the 1st diaphragm part 23 is configured to the 1st when from X-direction The center that the optical axis 13a of optical system 13 passes through opening 23a.

Relay lens 24 is configured at the incident position of the light for having passed through the 1st diaphragm part 23.Relay lens 24 is set It is set to so that the light beam from the multiple primary source pictures for being formed at fly's-eye lens 22 is overlapping.Come from penetrating in fly's-eye lens 22 Going out the light of multiple primary source pictures of side formation, its light intensity distributions is homogenized in overlapping position.

Cylindrical lens 25 is configured at from the position of formation primary source picture in fly's-eye lens 22 to the 2nd diaphragm part 26 In light path.

As the cylindrical lens 25 in previous Fig. 4, Fig. 5, the cylindrical lens 25 in Fig. 7 A, Fig. 7 B is the energy in XZ faces The big optical component of ability (refracting power) in power (refracting power) the YZ faces more parallel than with Pivot axle AX1.Cylindrical lens 25 Illumination region IR of the big direction of ability (refracting power) on roller light shield DM in Fig. 2 or Fig. 4 in week with barrel surface 12 To consistent.

2nd diaphragm part 26 is so-called field stop, provides out illumination region IR position and shape.2nd diaphragm portion Part 26 configure with the illumination region IR positions being conjugated or its near.From the multiple primary source pictures for being formed at fly's-eye lens 22 Light it is overlapping at the position of the 2nd diaphragm part 26 by relay lens 24 and cylindrical lens 25, in the 2nd diaphragm part 26 Light intensity distributions are homogenized.That is, input lens (input lens) 21, fly's-eye lens 22, relay lens 24 and cylindrical lens 25 compositions make the uniform irradiation optical system 19 that illumination light L1 light intensity distributions are homogenized.

In addition, lamp optical system IL includes uniform irradiation optical system 19, the uniform irradiation optical system 19 is configured From primary source picture at least a portion of the light path of the 2nd diaphragm part 26, for making the photograph using primary source picture as light source Mingguang City L1 light intensity distributions are uniform near the position of the 2nd diaphragm part 26 or its.In addition, lamp optical system IL does not have 2nd diaphragm part 26 can also.In addition, uniform irradiation optical system 19 can also replace fly's-eye lens 22 and structure with lens pillar Into.In this case, lamp optical system IL composition is suitably altered to cause the exit end of the light outgoing in lens pillar Face and illumination region IR optical conjugates.

As shown in figs. 7 a and 7b, the 1st optical system 13 includes configuration between the 2nd diaphragm part 26 and light separation unit 10 Light path in lens group 27.Lens group 27 is for example by using the optical axis 13a of the 1st optical system 13 as the axisymmetric of pivot Multiple lens are constituted.As shown in Figure 7 B, lens group 27 is formed when from X-direction and the optical conjugate of the 1st diaphragm part 23 Pupil plane 28 (the 2nd conjugate planes).On pupil plane 28, such as shown in Fig. 2 (or Fig. 4), it is formed with and is shone as to illumination region IR The light source of the illumination light L1 penetrated light source is as L0 (secondary souce picture).

The secondary souce of projection optical system PL pupil plane 28 is formed at as L0 is in Fig. 2 (or Fig. 4) and Fig. 7 A, Fig. 7 B It is configured to, the size in the size ratio of the X-direction Y direction parallel with Pivot axle (center line) AX1 is big.Secondary light Week in illumination region IR of the big X-direction of source image L0 size on the roller light shield DM in Fig. 2 or Fig. 4 with barrel surface 12 To consistent.

In addition, in Fig. 7 A, Fig. 7 B, being formed at the secondary souce of the 2nd conjugate planes (pupil plane 28) as L0 distribution It is configured to, the size of the Y direction parallel with Pivot axle (center line) AX1 is smaller than the size of X-direction.Secondary souce As L0 distribution illumination region IR of the relatively large X-direction of size on roller light shield DM in Fig. 2 or Fig. 4 in The circumference of barrel surface 12 is consistent.

In addition, lens group 27 is configured to so that come to be formed in the light beam of the primary source picture of the 1st diaphragm part 23 , the composition dissipated in the Y-axis direction converged on pupil plane 28.Here, due to cylindrical lens 25 ability in the X-axis direction Be different in Y direction, so each point from primary source picture (opening of the 1st diaphragm part 23) is sent out in the X-axis direction Will not converge on pupil plane 28 as shown in Figure 7 A 1 point of scattered composition.In other words, pupil plane 28 is in work as and seen along Y direction Relation when examining not with the optical conjugate of the 1st diaphragm part 23.

Light separation unit 10 configured in the way of its at least a portion is configured at pupil plane 28 in the position of pupil plane 28 or Near it.Here, the position of pupil plane 28 or its nearby be roughly equivalent to Fourier transformation face relative to illumination region IR.Cause This, the scope that is passed through by the illumination light L1 provided in light separation unit 10 (in Fig. 2 by portion 15) can be provided to roller light The illumination light L1 of illumination region IR incidences on cover DM chief ray L1a direction (orientation characteristic).As illustrated by using Fig. 3 Like that, light separation unit 10 (specified part) in order that light incident side from imaging beam L2 to projection optical system PL turn into telecentric iris state, And the illumination in the way of making illumination light L1 turn into non-telecentric state to illumination region IR light incident side in regulation light separation unit 10 Light L1's passes through scope (distribution).Light separation unit 10 is configured in projected light to fall to penetrate illumination to illumination region IR progress In system PL light path.

Fig. 8 is to show the intermediate image plane 32 (Im) from lamp optical system IL light separation unit 10 to projection optical system PL Composition figure.Fig. 9 is the top view for the light separation unit 10 for showing present embodiment.

Light separation unit 10 shown in Fig. 8 includes light and can pass through the lenticular unit 30 of material, is formed at the table of lenticular unit 30 Reflectance coating 31 on face (equivalent to the reflecting part 16 in Fig. 2).Lenticular unit 30 is, for example, shape as meniscus lens, is come from The face 30a sides that the illumination light L1 of 1st optical system 13 is incident are convex surface, and the face 30b sides towards face 30a opposite side are recessed Face.Reflectance coating 31 is on the face 30b of lenticular unit 30.

As shown in figure 9, light separation unit 10 includes：At least a portion for the illumination light L1 from the 1st optical system 13 is led to Cross by portion 15；With will be produced in the illumination region IR on mask pattern M imaging beam L2 (reference picture 2) reflection it is anti- Penetrate portion 16.In light separation unit 10, reflectance coating 31 forms the part in addition to a part in the face 30b of lenticular unit 30, leads to Cross portion 15 and configure region in light separation unit 10, that reflectance coating 31 is not formed along Z-direction observation.

Intersection point 13b by portion 15 on the optical axis 13a and face 30b of the 1st optical system 13, is configured in-X-axis side.Pass through Portion 15 configures the region not overlapped with intersection point 13b in the 30b of face.Be formed as in fig. 8 with X-axis by portion 15 (light passes through window) Direction is long side direction, using the Y direction parallel with roller light shield DM Pivot axle AX1 as the Long Circle of short side direction. Therefore, the illumination region IR on roller light shield DM of the long side direction by portion 15 of Long Circle in Fig. 2 (or Fig. 4) and Fig. 8 It is interior to be answered with the circumferentially opposed of barrel surface 12.

Region in light separation unit 10, being formed with reflectance coating 31 along Z-direction observation is used for anti-for imaging beam L2 The reflecting part 16 penetrated, and also serve as regulation via by portion 15 towards illumination region IR illumination light L1 by scope. In other words, reflectance coating 31 is configured such that illumination light L1 not from passing through by the region beyond portion 15 in light separation unit 10. In addition, reflectance coating 31 is in order that imaging beam L2 reflects and is configured at least include following regions, i.e.,：It is present in light separation unit 10 In, on intersection point 13b substantially with passing through the region at the symmetrical position in portion 15.

Fig. 8 explanation is returned to, the 2nd optical system 14, which is configured, is passing through the illumination light L1 by portion 15 of light separation unit 10 At incident position.2nd optical system 14 is converged in the way of causing illumination region IR and the optical conjugate of the 1st diaphragm part 23 Illumination light L1.That is, the 2nd optical system 14 and the lens group 27 shown in Fig. 7 A and Fig. 7 B make and the optical conjugate of the 2nd diaphragm part 26 Face formed in illumination region IR.

2nd optical system 14 around the axisymmetric multiple lens of defined central shaft (optical axis 14a) for example by constituting.2nd The optical axis 14a of optical system 14 is for example configured to coaxial with the optical axis 13a of the 1st optical system 13.Incide the 2nd optical system Faces (YZ face) of the 14 illumination light L1 relative to the optical axis 14a comprising the 2nd optical system 14 passes through in its side, and from the 2nd light The outgoing of system 14.

Deflection component 11 is configured in position incident the illumination light L1 from the outgoing of the 2nd optical system 14.Deflection component 11 The e.g. part of triangular prism shape, and with orthogonal the 1st reflecting surface 11a and the 2nd reflecting surface 11b.1st reflecting surface 11a And the 2nd reflecting surface 11b be for example configured to respectively with the optical axis 14a of the 2nd optical system 14 into substantially 45° angle.

Reflect and deflect in the 1st reflecting surface 11a from the illumination light L1 of the outgoing of the 2nd optical system 14, and to roller light shield DM Illumination region IR on the mask pattern M kept is incident.Illumination light L1 is reflected and turned back by mask pattern M, so as to produce Raw imaging beam L2.On the illumination light L1 and the imaging beam L2 from illumination region IR outgoing to illumination region IR incidences, Described in detail later herein with reference to Fig. 9~Figure 14.

The 1st reflecting surface 11a from imaging beam L2 to the deflection component 11 of illumination region IR outgoing is incident.Imaging beam L2 Deflected by being reflected in the 1st reflecting surface 11a, it is incident to the 2nd optical system 14.Incide the imaging of the 2nd optical system 14 Beam L2 passes through the light path different from the illumination light L1 towards illumination region IR as illustrated by by previous Fig. 2, Fig. 3. Match somebody with somebody in face (YZ faces) of the light path of imaging beam L2 in 2nd optical system 14 relative to the optical axis 14a including the 2nd optical system 14 Put in the substantially opposite side (+X-axis side) of illumination light L1 light path.

The imaging beam L2 for having passed through the 2nd optical system 14 is incident to light separation unit 10.As shown in figure 9, in light separation unit Scope R1 incident imaging beam L2 is set to incident from the 1st optical system 13 to light separation unit 10 with illumination light L1 in 10 Scope R2 (by portion 15) it is not overlapping.Scope R1 incident imaging beam L2 is for example set on YZ faces and by portion 15 Opposite side, the reflecting part 16 as light separation unit 10.Reflecting part 16 be configured at pupil plane 28 or its near, in addition, such as Fig. 3 Shown, the chief ray L2a from illumination region IR each point outgoing is the relation being generally parallel to each other, therefore, in illumination region IR The light beam that produces of each point by scope R2 luminous point overlap in the way of it is incident to reflecting part 16.

As shown in figure 8, the imaging beam L2 for having incided reflecting part 16 reflects in reflecting part 16 and incides the 2nd light once again System 14.Pass through the imaging beam L2 of the 2nd optical system 14 incident to the 2nd reflecting surface 11b of deflection component 11, and the 2 reflecting surface 11b reflect and are deflected.The direct of travel of the 2nd reflecting surface 11b imaging beam L2 reflected chief ray be with It direction that be substantially parallel from the direct of travel of chief ray during illumination region IR outgoing, be relative to the light of the 2nd optical system 14 The direction that axle 14a non-vertically intersects.

The light beam of each point outgoing in imaging beam L2, from illumination region IR passes twice through the 2nd optical system 14, thus Substantially 1 point converged in the intermediate image plane 32 with illumination region IR optical conjugates.So, Fig. 4 in projection optical system PL The intermediary image of a mask pattern M part (illumination region IR) is formed at intermediate image plane by the 1st shown projection optical system PL1 32(Im).Intermediate image plane 32 is also the face with view field PR optical conjugates, is configured with sometimes for regulation view field PR's The field stop (the 3rd diaphragm part) of position and shape.

The 2nd projection optical system PL2 shown in Fig. 4 is not for example by the light in the 1st projection optical system PL1 light path point Constitute, but replaced by constituting configuring concave mirror 33 with the position of the optical conjugate of light separation unit 10 from portion 10.That is, 2nd projection optical system PL2 includes the 3rd same optical system 34 of the 2nd optical system 14 with the 1st projection optical system PL1. Reflected and deflected in the 1st reflecting surface 35a of deflection component 35 by the imaging beam L2 of intermediate image plane 32, pass through the 3rd optics System 34 and it is incident to concave mirror 33.The imaging beam L2 for having incided concave mirror 33 reflects in concave mirror 33 and once again by 3 optical systems 34, are then deflected in the 2nd reflecting surface 35b reflections of deflection component 35, to the substrate supported by rotating cylinder DP View field PR on P is incident.The light beam of each point outgoing from intermediate image plane 32 in imaging beam L2 is due to passing twice through the 3rd Optical system 34, so converging on and the corresponding each point in the view field PR of the optical conjugate of intermediate image plane 32.So, the 2nd Projection optical system PL2 will be projected on view field PR by the 1st projection optical system PL1 intermediary image Im formed.

Below, to the shape to illumination region IR illumination light L1 when incident and the imaging beam L2 from illumination region IR outgoing State is described in detail.

Figure 10 be the Pivot axle AX1 along roller light shield DM direction (in XZ faces vertical with Y-axis) observe to The side view of light beam (illumination light L1) incident illumination region IR and the imaging beam L2 from illumination region IR outgoing.Figure 11 be from The top view for the imaging beam L2 from illumination region IR outgoing that the direction (Z-direction) orthogonal with Figure 10 is observed.

As shown in Figure 10 (reference picture 3), illumination light L1 chief ray L1a is incident to illumination region IR, and to work as from rolling During cylinder light shield DM Pivot axle AX1 direction (Y direction) observation, the shape between Pivot axle AX1 and barrel surface 12 The conjugate planes 40 of Cheng Youyu primary sources picture (the 1st diaphragm part 23) conjugation is (also with being formed with the 1st projected light of secondary souce picture System PL1 pupil plane 28 is conjugated).Conjugate planes 40 (the 1st conjugate planes) example is such as disposed in Pivot axle AX1 and illumination region Middle position between IR or its near.That is, light separation unit 10 is configured to by portion 15 and the position relationship of reflecting part 16, When mask pattern M radius is r, from Pivot axle AX1 to conjugate planes 40 it is only about half of for radius r apart from D3.

Here, illumination light L1 chief ray L1a extended line 41 is configured in the Pivot axle with roller light shield DM Intersect on section orthogonal AX1 in conjugate planes 40.The intersection point 142 of such chief ray L1a extended line 41 with roller light Cover and be continuously arranged on the DM parallel lines of Pivot axle AX1.That is, light separation unit 10 passes through portion 15 and reflecting part 16 Position relationship be configured to so that the extended line of the chief ray L1a being distributed in the circumference of barrel surface 12 in illumination light L1 41 intersect with the line in the conjugate planes 40 parallel to Pivot axle AX1.That is, lamp optical system IL will be produced from light source 20 Illumination light L1 is radiated at illumination region IR via light separation unit 10, and makes illumination light L1 chief ray L1a with towards pivot Peripheral, oblique of the mode of assigned position between axle AX1 and barrel surface 12 on barrel surface 12.

In addition, the key light being distributed on the direction parallel with roller light shield DM Pivot axle AX1 in illumination light L1 Line L1a is incident to illumination region IR with the relation being generally parallel to each other.Moreover, as shown in figure 11, imaging beam L2 chief ray Passes of the L2a to be generally parallel to each other when being observed along the direction (Z-direction) orthogonal with roller light shield DM Pivot axle AX1 It is from illumination region IR outgoing.Here, illumination light L1 chief ray L1a observes the barrel surface from roller light shield DM along Z-direction 12 substantially normal direction (X-direction) is incident to illumination region IR, and imaging beam L2 chief ray L2a is seen along Z-direction When examining towards roller light shield DM barrel surface 12 substantially normal direction (X-direction) from illumination region IR outgoing.

Below, reference picture 9, Figure 12 and Figure 13 pairs are illustrated with the pupil shape in the face of light source image conjugate.Figure 12 is The figure of the illumination region IR of the institute's reference representative position in the explanation of pupil is shown.Figure 13 is to show to be total to light source image conjugate The figure of luminous point in yoke surface 40.Here, for convenience of description, light beam (the illumination light L1 that have passed through illumination region IR each point is made And imaging beam L2) it is being circle with the light spot form in the face of light source image conjugate (pupil plane 28 and conjugate planes 40).

In fig. 12, reference P1~P9 is represented along the point on illumination region IR during X-direction top view.Point P1, point P2 and point P3 are the groups (being referred to as the 1st group) of the point arranged in the circumference of the barrel surface 12 shown in Figure 10 etc..Point P1 Configure illumination region IR+end of Z axis side, point P3 configure illumination region IR-end of Z axis side, point P2, which is configured, to exist Point P1 and point P3 center.Similarly, point P4, point P5 and point P6 the 2nd group, point P7, point P8 and point P9 the 3rd group are The group of the point arranged in the circumference of barrel surface 12.In addition,-Y of point P1~point P3 the 1st group configuration in illumination region IR The end of axle side, point P7~point P9 the 3rd group configuration illumination region IR+end of Y-axis side, the 2nd of point P4~point P6 the Group is configured between the 1st group and the 3rd group.

First, reference picture 9 and Figure 12 being illustrated by scope to the illumination light L1 in pupil plane 28.Shown in Figure 12 Illumination region IR in point P1, the point P4 and point P7 that are arranged on the direction parallel to Pivot axle AX1 incident illumination Light L1 chief ray, its incoming position in illumination region IR circumference is roughly the same, relative to illumination region IR incidence Angle is roughly the same.

Therefore, also referring to previous Fig. 8, to leading on point P1, point P4 and the incident each comfortable pupil planes 28 of light beam of point P7 The position for crossing scope is roughly the same in the X-axis direction.Therefore, when from illumination region IR sides, on roller light shield DM The light beam of point P1, point P4 and point P7 incidences in illumination region IR are the light beams substantially come in from identical direction.Herein, Xiang Dian The roughly the same scope R3 of P1, point P4 and the incident light beams of point P7 on the pupil plane 28 shown in Fig. 9 passes through.Similarly, To point P3, the point P6 and point P9 that are arranged on the direction parallel to Pivot axle AX1 incident light beam on pupil plane 28 Roughly the same scope R4 pass through.

In addition, to illumination light L1 incident point P1 chief ray and the chief ray to illumination light L1 incident point P3 its shining Incoming position in area pellucida domain IR circumference is different, and the incidence angle relative to illumination region IR is also different.

Therefore, the position by scope (scope R3) that light beam incident point P1 into illumination region IR passes through pupil plane 28 Put and the incident light beams of the point P3 into illumination region IR are wrong in the X-axis direction by scope (scope R4) by pupil plane 28 Open.

In fig .9, the position in scope R3 Y direction is roughly the same with scope R4.In addition, scope R3 X-direction On position compared with the position in scope R4 X-direction, from the optical axis 13a of the 1st optical system 13 and light separation unit 10 Intersection point 13b farther away from.

In addition, to the point arranged on the direction parallel to Pivot axle AX1 in the illumination region IR shown in Figure 12 P2, point P5 and point P8 incident light beam by scope, although figure 9 illustrates be not disposed on scope R3 and scope R4 Between.Similarly, by the arbitrary point on point of contact P1 and point P3 line light beam by with the arbitrary point relative to point The scope that P1 offset accordingly offset by from scope R3 to scope R4.Therefore, to illumination light L1 incident illumination region IR On pupil plane 28 is, for example, by the scope R2 of scope R3 and scope the R4 Long Circle linked up by scope.

So, if the scope R2 for passing through portion 15 is Long Circle, the imaging being distributed in Pivot axle AX1 circumference Beam L2 chief ray L2a, it is closer parallel to each other compared with illumination light is turned into collimated light beam to the incident situation of illumination region Relation (telecentric iris state).It is engaged and reached by lamp optical system with following setting light separation unit 10 and its before Into that is,：Lamp optical system by light separation unit 10 and its before is set such that conjugate planes 40 is configured in Pivot axle AX1 Middle position between illumination region IR or its near.

Below, reference picture 10, Figure 12 and Figure 13 are illustrated to the pupil shape in conjugate planes 40.Light in conjugate planes 40 It is formed at during inner side of the shape of pupil with hypothetically having traveled to roller light shield DM in the illumination light L1 for inciding illumination region IR The shape of secondary souce picture in conjugate planes 40 is corresponding.

The point P1s that circumferentially arranges of the illumination light L1 chief ray L1a into the illumination region IR in barrel surface 12, point P2, Point P3 is incident, and chief ray L1a extended line 41 is substantially overlapped in conjugate planes 40 at 1 point.Therefore, to point P1, point P2, If the position by scope that light beam incident point P3 has been traveled in the inner side of barrel surface 12, conjugate planes 40 respectively can be weighed Close, pass through in the scope R5 shown in Figure 13.Based on it is same the reasons why, into the illumination region IR in barrel surface 12 along week Pass through to the incident light beam of the point P4, point P5, point P6 of arrangement in same scope R6, to the illumination region IR in barrel surface 12 The interior point P7 circumferentially arranged, point P8, point P9 incident light beam passes through in same scope R7.

In addition, illumination light L1 chief ray L1a with the relation that is generally parallel to each other to parallel to Pivot axle AX1's Point P1, point P4, the point P7 arranged on direction (Y direction) is incident.Therefore, if to point P1, point P4, point P7 incident light beam respectively The inner side of barrel surface 12 is traveled to, then in the Y direction parallel with Pivot axle AX1, scope is passed through in conjugate planes 40 Position stagger.That is, scope R5 configurations in conjugate planes 40-end of Y-axis side, scope R7 configured in conjugate planes 40 On+end of Y-axis side, scope R6 configurations are in scope R5 and scope R7 center.As a result, incident to illumination region IR Pupil shapes of the illumination light L1 in conjugate planes 40 is by the scope R8 of scope R5 and scope the R7 Long Circle linked.

As described above, the chief ray L2a that the position in illumination region IR in imaging beam L2 is produced is respectively in circle It is generally parallel to each other in the circumference in cylinder face 12 and on the direction (Y direction) parallel with Pivot axle AX1.Therefore, project Optical system PL light incident side (illumination region IR exiting side) can constitute telecentric iris state.

More than in the processing unit U3 (exposure device EX) of such present embodiment, due to cause to projection optics The mode of imaging beam L2 close to collimated light beam incident system PL constitutes lamp optical system IL, so, projection optics system System PL is simultaneously uncomplicated, and can go out the mask pattern M of bending picture with high-precision projection exposure.Therefore, processing unit U3 energy It is enough that substrate P is efficiently exposed while performing exposure-processed by rotating mask pattern M.

In addition, in processing unit U3, due to light separation unit 10 to be configured to projection optical system PL pupil plane 28, institute So that illumination light L1 light path can be made to be separated with imaging beam L2 light path.Therefore, with for example with polarizing beam splitter (PBS) etc. Compare the composition of light path separation, processing unit U3 can reduce the light loss in PBS and the generation of veiling glare.Separately Outside, light separation unit 10 can also be made up of PBS etc..

Further, since light separation unit 10 define via by portion 15 towards illumination region IR illumination light L1 by model Enclose, so the chief ray L1a of the illumination light L1 to illumination region IR when incident direction can be provided with high accuracy.In addition, by In light separation unit 10 using reflecting part 16 define illumination light L1 by scope, so can be constitute it is simple etc..

In addition, the relation of the chief ray L1a being distributed on the direction parallel with Pivot axle AX1 in illumination light L1 The pass for the chief ray L2a being distributed on the direction parallel with Pivot axle AX1 of (for example, parallel to each other) in imaging beam L2 Also it is maintained in system (for example, parallel to each other).In addition, the chief ray being distributed in imaging beam L2 in the circumference of barrel surface 12 L2a relation (for example, parallel to each other) is relative to the chief ray L1a's being distributed in the circumference of barrel surface 12 in illumination light L1 Relation (for example, non-parallel mutually) change.If thus, for example, adjusting illumination by the optical component with equal orientation performance power The light L1 angle of divergence (NA), to cause the chief ray L2a being distributed in imaging beam L2 in the circumference of barrel surface 12 to turn into mutual The pass of parallel relation, then the chief ray L2a being distributed on the direction parallel with Pivot axle AX1 in imaging beam L2 It is tied to form to be not parallel mutually.

In the present embodiment, by cylindrical lens 25, the illumination region in arrival roller light shield DM barrel surface 12 is made The IR illumination light L1 angle of divergence on direction (Y direction) corresponding with Pivot axle AX1 with the circle in illumination region IR It is different in the circumference in cylinder face 12.

That is, the one side of cylindrical lens 25 make it is in arrival illumination region IR illumination light L1 chief ray L1a, with rotation The chief ray L1a arranged on direction parallel heart axle AX1 is parallel to each other, while making the key light arranged in the circumference of barrel surface 12 Line L1a deflects that its extended line 41 is intersected with the line in the conjugate planes 40 parallel to Pivot axle AX1.Therefore, it is possible to The chief ray L2a for the imaging beam L2 being distributed on the direction parallel with Pivot axle AX1 is generally parallel to each other, and is made The chief ray L2a for the imaging beam L2 being distributed in the circumference of barrel surface 12 is also generally parallel to each other.In addition, as making illumination light The method that the L1 angle of divergence has anisotropy, it would however also be possible to employ make the bundles of light guide member of optical fiber, go out the light of the light guide member Long Circle or ellipse as the opening portion 23a for the 1st diaphragm part 23 being shaped as in such as Fig. 6 for penetrating side, and by its light The position of the 1st diaphragm part 23 of exiting side configuration in figure 6.

[the 2nd embodiment]

Below, the 2nd embodiment is illustrated.In the present embodiment, for the inscape same with above-mentioned embodiment, Mark identical reference and simplification or the description thereof will be omitted.

Figure 14 is the figure of the composition for the processing unit (exposure device EX2) for showing present embodiment.Exposure shown in Figure 14 Device EX2 projection optical system PL optical systems as Offner optical systems constitute on this point with the 1st embodiment party Formula is different.

Projection optical system PL includes：1st projection optical system PL1, forms a mask pattern M part (illumination region IR intermediary image Im)；With the 2nd projection optical system PL2, the 1st projection optical system PL1 intermediary images formed are projected on lining View field PR on the P of bottom.Herein, the 1st projection optical system PL1 and the 2nd projection optical system PL2 are respectively by Offner optics Optical system as system is constituted.

Lamp optical system IL is on configuring can be same with the 1st embodiment to the key element of light separation unit 50 from light source 20 Constitute sample.The illumination light L1 sent from light source 20 is by uniform irradiation optical system 19, the thus light in the 2nd diaphragm part 26 Intensity distribution is homogenized.It is incident to light separation unit 50 by lens group 27 by the illumination light L1 of the 2nd diaphragm part 26.

Figure 15 is by shown in a part of the lamp optical system IL in Figure 14 and the 1st projection optical system PL1 amplifications Figure.Light separation unit 50 have illustrate in the 1st embodiment by portion 15 and reflecting part 16.Light separation unit 50, which is configured, to be formed Have the pupil plane of light source picture as illumination light L1 light source position or its near.On matching somebody with somebody by portion 15 and reflecting part 16 Put, be the same with the 1st embodiment.

Light separation unit 50 has the face 50b of the opposite side for face 50a incident illumination light L1 and towards face 50a.Face 50b It is incident imaging beam L2 face in the 1st projection optical system PL1 light path, towards outside, (imaging beam L2's enters for it Penetrate side) protrusion.

By the illumination light L1 by portion 15 of light separation unit 50 by the lens group 51 for lens error correction etc. to The reflecting surface 53a of concave mirror 53 is incident.Reflecting surface 53a is configured in the mode relative with the face 50b of light separation unit 50.Concave mirror 53 Reflecting surface 53a and light separation unit 50 face 50b be the center of curvature configuration roughly the same position flexure plane.

Incide illumination light L1 in reflecting surface 53a to reflect and be accumulated in reflecting surface 53a, restrain while to deflection The reflecting surface 54a of part (plane mirror) 54 is incident.The reflecting surface 54a illumination light L1 of deflection component 54 has been incided anti- Penetrate face 54a reflections and deflect, by incident to illumination region IR as adjustment part 55.As adjustment part 55 is to be used for luminous intensity The optical component (the competent lens element of tool) of the adjustment of distribution, the adjustment of the angle of divergence, lens error correction etc..

As explained in relation to fig. 3, lamp optical system IL as the above in illumination region IR in order that produce Imaging beam L2 chief ray it is parallel to each other and to cause the extension of the chief ray to illumination light L1 incident illumination region IR Line is constituted in the mode that roller light shield DM inner side intersects.

Pass through in the illumination region IR imaging beam L2 produced as adjustment part 55 and to the reflecting surface 54a of deflection component 54 Incidence, it is incident to the reflecting surface 53a of concave mirror 53 in reflecting surface 54a reflections.The imaging beam L2 for inciding reflecting surface 53a leads to Cross and reflect and be accumulated in reflecting surface 53a, by lens group 51 to the reflecting part 16 of light separation unit 50 while being restrained It is incident.The imaging beam L2 for inciding reflecting part 16 reflects in reflecting part 16, and by lens group 51 to the anti-of concave mirror 53 Penetrate face 53a incident.The imaging beam L2 for inciding reflecting surface 53a is accumulated by being reflected in reflecting surface 53a, convergent It is simultaneously incident to the reflecting surface 56a of deflection component (plane mirror) 56.

Herein, deflection component 54 and deflection component 56 are to enable imaging beam L2 in deflection component 54 and deflection component Set between 56 by way of.The imaging beam L2 for having incided the reflecting surface 56a of deflection component 56 passes through in reflecting surface 56a Reflect and deflect, by incident to intermediate image plane 32 as adjustment part 57.As adjustment part 57 is that have and picture adjustment part The optical component of 55 same functions.So, the 1st projection optical system PL1 is by a mask pattern M part (illumination region IR) Intermediary image Im be formed at intermediate image plane 32.

Return to Figure 14 explanation, the 2nd projection optical system PL2 is made up of light separation unit 50, but take and Instead of constituted by configuring convex mirror 60.1st reflections of the imaging beam L2 in deflection component 61 of intermediate image plane 32 is passed through Face 61a reflects and incident to concave mirror 62, is reflected and incident to convex mirror 60 in concave mirror 62.Incided convex mirror 60 into Reflected as light beam L2 reflects in convex mirror 60 to the incidence of concave mirror 62, the in deflection component 61 after the reflection of concave mirror 62 the 2nd Face 61b reflects, and incident to the view field PR on the substrate P that rotating cylinder DP is supported.So, the 2nd projection optical system Mask pattern M illumination region IR intermediary image Im is projected on the view field PR on substrate P by PL2.

[the 3rd embodiment]

Below, the 3rd embodiment is illustrated.In the present embodiment, for the inscape same with above-mentioned embodiment, Mark identical reference and simplification or the description thereof will be omitted.

Figure 16 is the composition for the device inspection apparatus SYS2 (flexible display manufacturing line) for showing present embodiment Figure.Here, show from the supply roll FR1 flexible substrate P (piece, film etc.) pulled out and sequentially pass through n platform processing unit U1, U2, U3, U4, U5, Un and until wound on reclaim reel FR2 on example.

In figure 16, XYZ orthogonal coordinate system is also set so that substrate P surface (or back side) is vertical with XZ faces, and And the orthogonal direction (width) in the carrying direction (length direction) with substrate P is set as Y direction.

Below, the device inspection apparatus SYS2 of present embodiment processing unit U3 (exposure device EX, substrate processing is illustrated Device) exposure principle.Figure 17 is the schematic diagram for illustrating exposure device EX3 optical system.Figure 18 is shown to illumination Illumination light L1 incident region IR and the imaging beam L2 from illumination region IR outgoing figure.

Exposure device EX3 shown in Figure 17 includes keeping mask pattern M roller light shield DM, lamp optical system IL, thrown Shadow optical system PL and supporting substrate P rotating cylinder DP (the substrate supporting drum DR5 shown in Figure 16).

Roller light shield DM has the outer peripheral face (hereinafter also referred to as barrel surface 12) of cylinder planar, and it is by the light shield of reflection-type Pattern M bends to cylinder planar and kept in the way of along barrel surface 12.Barrel surface is to surround defined center line (in rotation Heart axle AX1) with least a portion in the face, the e.g. outer peripheral face of cylinder or cylinder of predetermined radius bending.

Lamp optical system IL is protected via a projection optical system PL part by illumination light L1 to roller light shield DM Illumination region IR on the mask pattern M held carries out falling to penetrate illumination.Lamp optical system IL includes：Formation is used as illumination light L1's The light source of light source is as L0 the 1st optical system 13；With the 2nd optical system 14 as the part for projection optical system PL. By the light source of the 1st optical system 13 formation as L0 formation is in the vicinity by portion 15 (through portion) of light separation unit 10, from light The illumination light L1 that source image L0 is sent via incident to the 2nd optical system 14 by portion 15, and by the 2nd optical system 14 to Illumination region IR is incident.

Projection optical system PL will be projeced into the illumination region IR the reflected beams produced and be supported on rotating cylinder DP Substrate P, so that the picture of the illumination region IR on mask pattern M is projected on into substrate P.Projection optical system PL includes：1st throws Shadow optical system PL1, forms illumination region IR intermediary image Im；With the 2nd projection optical system PL2, by the 1st projection optical system The intermediary image Im that PL1 is formed is projected on substrate P.1st projection optical system PL includes light separation unit 10, configured in light separation unit The 2nd optical system (optical system) 14 in light path between 10 and illumination region IR.In the following description, will be illuminated The light beam for being produced in the mask pattern M of light L1 illuminations and being projeced into substrate is suitably termed as imaging beam L2.

Illumination region IR produce imaging beam L2 by the 1st projection optical system PL1 the 2nd optical system 14 The reflecting part 16 of light separation unit 10 reflects, then incident to deflection component 17 again by the 2nd optical system 14.Incide The imaging beam L2 of deflection component 17 is deflected part 17 and deflected and incident to concave mirror 18.

The light beam (imaging beam L2) produced from certain point in illumination region IR is by passing twice through the 2nd optical system 14 Converge on point (conjugate point) corresponding with the intermediate image plane 42 of illumination region IR optical conjugates.So, the 1st projection optics system The intermediary image Im of the mask pattern M illuminated by illumination light L1 a part (illumination region IR) is formed at intermediate image plane by system PL1 42.Because illumination region IR is directed towards the cylinder planar of light exit side protrusion, so intermediate image plane 42 is directed towards light incident side (partially The side of rotation member 17) recessed cylinder planar.

The recessed configuration of barrel surface mirror (hreinafter referred to as concave mirror) 18 is near the position of intermediate image plane 42 or its.Concave mirror 18 bend in the way of along intermediate image plane 42 towards the recessed cylinder planar of light incident side.The imaging reflected in concave mirror 18 Light beam L2 is projeced into view field PR via the 2nd projection optical system PL2 optical component (lens, speculum etc.).So, Mask pattern M illumination region IR picture is projected in the view field PR on the substrate P supported by rotating cylinder DP.

Here, it is assumed that being the composition (situation of simple level crossing) for being not provided with concave mirror 18.In this composition, the 2nd Projection optical system PL2 image planes are towards light incident side in the same manner as the 1st projection optical system PL1 image planes (intermediate image plane) Recessed cylinder planar, its opposite lateral bend (concavo-convex direction and throwing for cutting flat with towards view field relative to view field Shadow zone domain is opposite).Therefore, as away from the tangent line with section, defocus quantitative change is big in the circumference of the view field of bending.

In the exposure device EX3 shown in Figure 17, concave mirror 18 is so that the 2nd projection optical system PL2 image planes are towards light Light incident side turns into the mode conversion image planes of convex.In other words, concave mirror 18 is to cause the 2nd projection optical system PL2 image planes The center of curvature is configured in the mode with view field PR center of curvature identical side relative to view field PR, conversion the 2nd Projection optical system PL2 image planes.Therefore, the 2nd projection optical system PL2 image planes turn into along with the lining of barrel surface sigmoid The shape of view field PR on the P of bottom, as a result, exposure device EX3 can be by desired pattern accurately verily Transfer, so as to realize the pattern exposure of fine.

Further, since illumination region IR is with barrel surface sigmoid as shown in figure 18, so in the present embodiment, making illumination Incidence of incidence angles of the light L1 chief ray L1a relative to illumination region IR according to chief ray L1a in the circumference of barrel surface 12 Position and it is different.That is, it is not as the Kohler illumination method of common illuminator, to make the key light to the incident illumination light of object plane Line is parallel to each other, but makes the chief ray of the position of the substantially half for the radius for converging on barrel surface 12.So, shining The chief ray L2a for the reflected beams (imaging beam L2) that each point in the IR of area pellucida domain is produced turns on the circumferential mutual of barrel surface 12 Parallel state (telecentric iris state).

In the present embodiment, lamp optical system IL is configured to turn into illumination light L1 master on the circumference of barrel surface 12 Light is the system of nonparallel non-telecentric state, and imaging beam L2 chief ray is on circumferential parallel.Therefore, such as Figure 18 institutes Show, be configured to：By illumination light L1 chief ray L1a extend extended line 41 the inner side of barrel surface 12 in radius about Intersect at the position of half.

In such imaging beam L2, the chief ray L2a that each point on illumination region IR is produced is for example with mutually equal Capable relation is from illumination region IR outgoing.In the direction observation of the center line (Pivot axle AX1) along roller light shield DM, respectively Chief ray L2a direct of travel be, for example, relative to by generation positions of each chief ray L2a on illumination region IR with rotation The direction that the line (radial direction) that heart axle AX1 is linked up intersects.In addition, as shown in figure 17, being seen when along Pivot axle AX1 direction When examining, each chief ray L2a direct of travel is, for example, the direction non-vertically intersected with the optical axis 14a of the 2nd optical system 14.

As described above, lamp optical system IL is to cause the 1st projection optical system PL1 light incident side to turn into telecentric iris state Mode is constituted, but by projection optical system PL imaging beam L2 due to the picture for example produced in the 1st projection optical system PL1 Difference wait and be no longer telecentric iris relation.Concave mirror 18 is set to such as by the aberration that the 1st projection optical system PL1 is produced Take into account to adjust the characteristic for the picture for being projected on substrate P.Therefore, feelings of the exposure device EX3 in the mask pattern M using bending Also can accurately it be exposed under condition.

In addition, the 1st projection optical system PL1 for example as multiplying power for N times (wherein, N ＜ 1) diminution optical system and structure Into.That is, the 1st projection optical system PL1 is in intermediate image plane 42 with the picture of a reduction magnification formation mask pattern M part.It is logical Cross using such composition, the chief ray L2a offset relative to telecentric iris relation can be reduced in imaging beam L2.Projection Optical system PL be, for example, by the picture of a mask pattern M view field PR part with etc. multiplying power be formed in view field PR Wait magnification optical system, the 2nd projection optical system PL2 constitutes as multiplying power for 1/N times of magnifying optics.

Outside, in the case where projection optical system PL generally waits magnification optical system, the 1st projection optical system PL1 and the 2nd Projection optical system PL2 can be grade magnification optical system or a side is diminution optical system and the opposing party is amplification Optical system.In addition, projection optical system PL can reduce optical system, can also be integrally magnifying optics.

Below, the composition to processing unit U3 (exposure device EX3) is further elaborated.

Figure 19 is the figure for the composition for showing exposure device EX3.Exposure device EX3 includes：Keep mask pattern M and can enclose The roller light shield DM (light shield holding member) rotated around Pivot axle AX1；Supporting substrate P simultaneously enables to surround pivot The rotating cylinder DP (substrate supporting member) of axle AX2 rotations.Rotating cylinder DP Pivot axle AX2 be set to for example with rolling Cylinder light shield DM Pivot axle AX1 is almost parallel.

Roller light shield DM is the cylindric or cylindric part with constant radius, and its outer peripheral face is barrel surface 12.Light Cover pattern M is installed for example on roller light shield DM outer peripheral face relative to roller light shield DM in the way of it can unload. Mask pattern M is formed on roller light shield DM surface or can not be from roller light shield DM such as can utilize vapour deposition method On unload.As the mask pattern M that can be unloaded, it can use to being deposited on very thin sheet glass (thickness is 100 μm or so) Layers of chrome carry out the mask pattern of pattern formation, carry out with light shield layer on transparent resin or plastic sheet pattern formation and Into mask pattern.In the case where such sheet mask pattern M is wound in into roller light shield DM, or in roller light shield DM Draw to form mask pattern M directly on a surface in the case of, important is all critically to grasp the light for bending to cylinder planar Cover pattern M radius (diameter).

Rotating cylinder DP is the cylindric or cylindric part with constant radius, and its outer peripheral face is cylinder planar.Lining Bottom P in a part for rotating cylinder DP outer peripheral face for example by being supported on rotating cylinder DP.For light shield figure The view field PR of case M picture projection is configured near rotating cylinder DP outer peripheral face.Support substrate P substrate supporting member It is configured to suitably change.For example, substrate P can also be supported by by being suspended in multiple transport rollers, in this case, View field PR is between multiple transport rollers with plane configuration.

As shown in figure 19, lamp optical system IL is kept by illumination as Kohler illumination to roller light shield DM Illumination region IR on mask pattern M is illuminated with uniform brightness.Projection optical system PL will be produced in illumination region IR The substrate P that are supported towards rotating cylinder DP of imaging beam L2 on view field PR projections, by a mask pattern M part The picture of (in illumination region IR) is formed at the view field PR on substrate P.

Exposure device EX3 is so-called scanning-exposure apparatus, and it is by making roller light shield DM with rotating cylinder DP to provide Rotary speed rotated than synchronously, continuously projection exposes repeatedly for the mask pattern M that can be kept roller light shield DM picture Light is on the rotating cylinder DP substrate P supported surface (face bent along barrel surface).

Exposure device EX3 for example including：Difference rotation driving roller light shield DM and rotating cylinder DP rotary driving part；It is right The position detection part (rotary encoder etc.) that roller light shield DM and the respective positions of rotating cylinder DP are detected；For adjusting rolling Cylinder light shield DM and the move portion of the respective positions of rotating cylinder DP；With the control unit in control exposure device EX3 each portion.

Roller light shield DM and rotating cylinder DP of the exposure device EX3 control unit according to detected by position detection part rotation Indexing puts to control rotary driving part, so that roller light shield DM and rotating cylinder DP compare synchronous rotary with defined rotary speed. In addition, the control unit controls move portion according to the testing result of position detection part, thus, it is possible to adjust roller light shield DM and rotation Roller DP relative position.

Below, lamp optical system IL is described in detail.Lamp optical system IL the 1st optical system 13 is wrapped Include uniform irradiation optical system 19 of the configuration in from light source 20 to the light path of light separation unit 10 and configure from uniform irradiation light System 19 is to the lens group 27 in the light path of light separation unit 10.

Uniform irradiation optical system 19 forms multiple primary source pictures using the light sent from light source 20 and made from multiple The light beam of primary source picture is overlapping, thus makes light intensity distributions uniform.From the illumination light L1 of the outgoing of uniform irradiation optical system 19 Advanced to the nonparallel directions of optical axis 27a relative to lens group 27 and incident to lens group 27.Lens group 27 is formed and uniform The secondary souce picture for the primary source image conjugate that illuminating optical system 19 is formed.Herein, lens group 27 is axisymmetric optics System, the optical axis 27a of lens group 27 is the optical axis 13a of the 1st optical system 13.

On the light source 20 of present embodiment, for example, it can constitute in a same manner as in the first embodiment.In addition, in this implementation In mode, the lighting unit IU shown in Figure 16 is for example including the optical system 13 of light source 20 and the 1st.

Figure 20 is the figure for the composition for showing uniform irradiation optical system 19.Uniform irradiation optical system 19 shown in Figure 20 is wrapped Include input lens (input lens) 21, fly's-eye lens 22, the 1st diaphragm part 23, relay lens (collector lens) 24, cylinder saturating The diaphragm part 26 of mirror 25 and the 2nd.

, for example can structure in a same manner as in the first embodiment on the input lens (input lens) 21 of present embodiment Into.In addition, the optical axis 21a of the input lens (input lens) 21 of present embodiment substantially with lens group 27 (Figure 19 references) Optical axis 27a is parallel, and from optical axis 27a to+X-axis side skew in the X-direction orthogonal with optical axis 27a.

On the fly's-eye lens 22 of present embodiment, for example, it can constitute in a same manner as in the first embodiment.In addition, this reality Applying the fly's-eye lens 22 of mode will exist from the illumination light L1 of input lens (input lens) 21 outgoing according to each lens feature 22b Spatially split.In light from the outgoing end face 22c of the outgoing of fly's-eye lens 22 according to each lens feature 22b formation primary sources As (focal point).Be formed with the primary source as face with conjugate planes (the 1st conjugate planes) 40 described in rear (such as the institute such as Figure 24 Show) optical conjugate.

1st diaphragm part 23 is so-called opening diaphragm, and it configures the outgoing end face in fly's-eye lens 22 (reference picture 20) 22c or its near.Figure 21 is the figure for the composition for showing the 1st diaphragm part 23.1st diaphragm part 23 has for coming from fly's-eye lens Long Circle or the opening 23a of ellipse that 22 illumination light L1 at least a portion passes through, opening 23a center is configured to example Optical axis 21a such as with input lens (input lens) 21 (reference picture 20) is substantially coaxial.

As shown in figure 20, the 1st diaphragm part 23 is configured in the face orthogonal with the optical axis of input lens (input lens) 21 On (parallel with XY faces).In addition, inside dimension (size) D1 on opening 23a the 1st direction (X-direction) is than the 2nd direction (Y-axis Direction) on inside dimension (size) D2 it is small, the 2nd direction correspond to the direction parallel with Pivot axle AX1.Inside dimension With circumferential the one of barrel surface 12 in illumination region IR of (size) D1 the 1st direction on the roller light shield DM in Figure 17 or Figure 19 Cause.

In addition, in the present embodiment on the 1st direction and the 2nd direction, can define in a same manner as in the first embodiment.

Figure 22 A and Figure 22 B are to show the figure from the 1st diaphragm part 23 to the composition of light separation unit 10.Figure 22 A show and revolved Turn the plan in the orthogonal faces of central shaft AX1.Figure 22 B show the plan in the face parallel with Pivot axle AX1.

As shown in fig. 22, the opening 23a of the 1st diaphragm part 23 is inclined to one relative to the optical axis 13a of the 1st optical system 13 Configure to side (+X-axis side).In addition, as shown in Figure 22 B, the opening 23a of the 1st diaphragm part 23 is in the Y-axis direction on the 1st light The optical axis 13a of system 13 is symmetrically configured.That is, the 1st diaphragm part 23 is configured so that when being observed along X-direction, the 1st The center that the optical axis 13a of optical system 13 passes through opening 23a.

Relay lens (collector lens) 24 is configured at the incident position of the light for having passed through the 1st diaphragm part 23.Relaying Lens 24 are configured such that the light beam from the multiple primary source pictures (focal point) for being formed at fly's-eye lens 22 is overlapping.Come from Light intensity distributions at the illumination light L1 of the multiple primary source pictures formed in fly's-eye lens 22 lap position are homogenized.

Cylindrical lens 25 is configured at from the position of formation primary source picture in fly's-eye lens 22 to the 2nd diaphragm part 26 In light path.Cylindrical lens 25 is configured to the week on the barrel surface 12 (mask pattern face) including roller light shield DM (reference picture 17) To the face including circular arc, XZ faces i.e. vertical with Pivot axle AX1 refracting power (ability) than on Pivot axle AX1 The big optical component (lens group) of the refracting power (ability) in the YZ faces in parallel direction.

2nd diaphragm part 26 is so-called field stop, provides out illumination region IR position and shape.2nd diaphragm portion Part 26 configure with the illumination region IR positions being conjugated or its near.As shown in fig. 22, the illumination light in the 2nd diaphragm part 26 The center for the opening that L1 passed through is offset than the optical axis 13a of the 1st optical system 13 to+X-axis side.In addition, such as Figure 22 B institutes Show, the center for the opening that illumination light L1 is passed through is configured in the optical axis with the 1st optical system 13 in the 2nd diaphragm part 26 At position roughly the same 13a.

The light come from multiple primary source pictures of the formation of fly's-eye lens 22 passes through relay lens 24 and cylindrical lens 25 And it is overlapping at the position of the 2nd diaphragm part 26, so that the light intensity distributions in the 2nd diaphragm part 26 are homogenized.That is, input Lens (input lens) 21, fly's-eye lens 22, relay lens 24 and cylindrical lens 25 make illumination light L1 light intensity distributions equal Homogenize.

In addition, lamp optical system IL includes uniform irradiation optical system 19, the uniform irradiation optical system 19 is configured From primary source picture at least a portion of the light path of the 2nd diaphragm part 26, make the illumination light using primary source picture as light source L1 light intensity distributions are uniform near the position of the 2nd diaphragm part 26 or its.In addition, lamp optical system IL is for example being projected In the case that optical system PL has field stop, can also not have the 2nd diaphragm part 26.In addition, uniform irradiation optical system System 19 can also replace fly's-eye lens 22 and constitute with lens pillar.In this case, lamp optical system IL composition is suitable Ground is altered to cause the outgoing end face of light outgoing and illumination region IR optical conjugates in lens pillar.

Lens group 27 is for example made up of axisymmetric multiple lens by pivot of defined axle.As shown in Figure 22 B, Lens group 27 forms the pupil plane 28 with the optical conjugate of the 1st diaphragm part 23 when being observed along X-direction.On pupil plane 28, As shown in figure 17, the light source as the light source for the illumination light L1 for being irradiated to illumination region IR is formed with as L0 (secondary souces Picture).

The secondary souce formed on the 1st projection optical system PL1 pupil plane 28 is as L0 is set to：When along illumination When light path is projeced into roller light shield DM barrel surface 12 to observe, the size in the circumference of barrel surface 12 compares Pivot axle Size on (center line) AX1 direction is big.

In addition, the secondary souce formed in the 2nd conjugate planes (pupil plane 28) is as L0 distribution is set to：As general The secondary souce as L0 distribution along illumination path be projeced into roller light shield DM barrel surface 12 to observe when, rotation Size on central shaft (center line) AX1 direction is smaller than the size in the circumference of barrel surface 12.

In addition, lens group 27 so that get it is in the light beam of the primary source picture of comfortable 1st diaphragm part 23 formation, in Y The mode that the composition dissipated on direction of principal axis is converged on pupil plane 28 is constituted.Here, because the ability of cylindrical lens 25 is in X-axis side To be different in Y direction, so from each point of primary source picture (the opening 23a of the 1st diaphragm part 23) in X-direction Do not restrained on the corresponding each point of the composition of upper diverging as shown in fig. 22 on pupil plane 28.In other words, pupil plane 28 can be When being observed along X-direction in the relation with the optical conjugate of the 1st diaphragm part 23, and when being observed along Y direction with the 1st light Late part 23 is not optical conjugate.

On the light separation unit 10 of present embodiment, for example, it can constitute in a same manner as in the first embodiment.In addition, this reality Applying the light separation unit 10 of mode includes what is supplied the lenticular unit 30 of the material of light transmission and formed on the surface of lenticular unit 30 Reflectance coating 31.Lenticular unit 30 is, for example, shape as meniscus lens, and the illumination light L1 institutes from the 1st optical system 13 are incident Face 30a sides be convex surface, towards face 30a opposite side face 30b sides be concave surface.Face 30b is, for example, the part for including sphere Flexure plane.Reflectance coating 31 is located at the face 30b of lenticular unit 30.

Figure 23 is the plan for the composition for showing light separation unit 10.As shown in figure 23, light separation unit 10 includes：For from The illumination light L1 of 1 optical system 13 at least a portion pass through by portion 15 and making the illumination region IR on mask pattern M The reflecting part 16 of imaging beam L2 (reference picture 17) reflections of generation.Light separation unit 10 is across from primary source picture to illumination region IR light path and from illumination region IR to intermediate image plane 42 light path and configure.The reflecting part of the light separation unit 10 of present embodiment 16 are included for example with the reflecting surface (reflectance coating 31) of the concave surface sigmoid of the part comprising sphere.

As shown in figure 19, the 2nd optical system 14 is configured in being entered by the illumination light L1 in portion 15 by light separation unit 10 The position penetrated.2nd optical system 14 converges illumination light in the way of causing illumination region IR and the optical conjugate of the 1st diaphragm part 23 L1.That is, the optical system 14 of lens group 27 and the 2nd makes the face with the optical conjugate of the 2nd diaphragm part 26 be formed in illumination region IR.

2nd optical system 14 around the axisymmetric multiple lens of defined central shaft for example by constituting.In present embodiment In, the defined central shaft is the optical axis 14a of the 2nd optical system 14.The optical axis 14a of 2nd optical system 14 for example with the 1st optics The optical axis 13a of system 13 is coaxially set.The illumination light L1 of the 2nd optical system 14 is incided on including the 2nd optical system 14 Optical axis 14a including face (YZ faces) pass through in its side, and from the outgoing of the 2nd optical system 14.From the outgoing of the 2nd optical system 14 The mask pattern M that are kept to roller light shield DM of illumination light L1 on illumination region IR it is incident.Illumination light L1 passes through in light Cover pattern M reflection turns back and forms imaging beam L2.

Here, to being carried out to illumination region IR illumination light L1 when incident and the imaging beam L2 from illumination region IR outgoing More detailed description.

Figure 24 be observed along roller light shield DM Pivot axle AX1 direction (Y direction), to illumination region IR The side view of incident light beam (illumination light L1) and the imaging beam L2 from illumination region IR outgoing.Figure 25 is orthogonal with Figure 24 Imaging beam L2 that direction (Z-direction) is observed, from illumination region IR outgoing top view.In the present embodiment, close In illumination light L1 and imaging beam L2 Figure 24 and Figure 25 explanation due to being the explanation with Figure 10 and Figure 11 of the 1st embodiment Same content, so the description thereof will be omitted herein.

Below, illustrated on the pupil shape in the face (pupil plane 28, conjugate planes 40) with light source image conjugate.Figure 26 It is that the figure in the illumination region IR of the explanation institute reference of pupil representative position is shown.Figure 27 is to show to be total to light source image conjugate The figure of pupil shape in yoke surface 40.Here, for convenience of description, via illumination region IR each point light beam (illumination light L1 And imaging beam L2) it is being shaped as circle with luminous point in the face of light source image conjugate (pupil plane 28 and conjugate planes 40).

In fig. 26, reference P1~P9 represent along X-direction top view to illumination region IR on point.Point P1, point P2 and point P3 are that the group of the point arranged in the circumference (X-direction during vertical view) of roller light shield DM barrel surface 12 (claims For the 1st group).Point P1 configure illumination region IR+end of X-axis side, point P3 configurations illumination region IR-X-axis side End, point P2 configurations are in point P1 and point P3 center.Similarly, point P4, point P5 and point P6 the 2nd group, point P7, point P8 and point P9 the 3rd group is the group of the point arranged in the circumference of barrel surface 12.In addition, point P1~point P3 the 1st group configuration Illumination region IR-end of Y-axis side, point P7~point P9 the 3rd group configuration illumination region IR+end of Y-axis side Portion, point P4~point P6 the 2nd group is configured between the 1st group and the 3rd group.

First, being illustrated by scope to the illumination light L1 in pupil plane 28 (light separation unit 10).To in Figure 26 institutes Point P1, point P4 and point on the illumination region IR shown periphery along the direction parallel with Pivot axle AX1 (Y direction) side by side Illumination light L1 incident P7 chief ray, its incoming position in illumination region IR circumference is roughly the same, relative to illumination Region IR incidence angle is also roughly the same.Therefore, it is respective in light separation unit 10 to point P1, point P4 and the incident light beams of point P7 The position by scope on (pupil plane 28) is to overlap in the X-axis direction in Figure 22 A.Therefore, as shown in figure 23, Xiang Dian The scope R3 of P1, point P4 and the incident light beams of point P7 in light separation unit 10 (pupil plane 28) passes through.Similarly, to rotation Turn the incident light beam of point P3, point P6, point P9 in the illumination region IR that is arranged on the parallel directions of central shaft AX1 in pupil plane Scope R4 on 28 passes through.

In addition, to illumination light L1 incident point P1 chief ray and the chief ray to illumination light L1 incident point P3, its Incoming position in illumination region IR (barrel surface 12) circumference is different, and it is also relative to illumination region IR incidence angle Different.

Therefore, scope (scope R3) is passed through in the light separation unit 10 (pupil plane 28) that light beam passed through incident point P1 With in the light separation unit 10 (pupil plane 28) that light beam passed through incident point P3 by scope (scope R4) in pupil plane 28 On stagger along X-direction, stagger in illumination region IR along the circumference of barrel surface 12.

In fig 23, the position in the Y direction of the scope R3 on pupil plane 28 is roughly the same with scope R4.In addition, model Enclose the position in R3 X-direction compared with the position in scope R4 X-direction, from the optical axis 13a of the 1st optical system 13 with The intersection point 13b of light separation unit 10 farther away from.

In addition, to the point arranged on the direction parallel to Pivot axle AX1 in the illumination region IR shown in Figure 26 P2, point P5 and point P8 incident light beam by scope, although figure 23 illustrates be not disposed on scope R3 and scope Between R4.Similarly, by the arbitrary point on point of contact P1 and point P3 line light beam by with the arbitrary point relative to The scope that point P1 offset accordingly offset by from scope R3 to scope R4.Therefore, to illumination light incident illumination region IR L1 on pupil plane 28 is, for example, by the scope R2 of scope R3 and scope the R4 Long Circle linked up by scope.

Below, the pupil shape in conjugate planes 40 is illustrated.The shape of pupil in conjugate planes 40 is with inciding Illumination region IR illumination light L1 is formed at the luminous point in conjugate planes 40 when hypothetically having traveled to roller light shield DM inner side Shape is roughly the same.

Point P1, point P2, points of the illumination light L1 chief ray L1a into the illumination region IR of the circumferential array along barrel surface 12 P3 is incident, and chief ray L1a extended line 41 (reference picture 24) is substantially overlapped in conjugate planes 40 at 1 point.Therefore, Xiang Dian If the position by scope that P1, point P2, point P3 incident light beam has been traveled in the inner side of barrel surface 12, conjugate planes 40 respectively Putting to overlap, and pass through in the scope R5 shown in Figure 27.Based on it is same the reasons why, into the illumination region IR in barrel surface 12 The point P4 circumferentially arranged, the incident light beam of point P5, point P6 pass through in scope R6, the illumination region in barrel surface 12 The point P7 circumferentially arranged, point P8, the light beam of point P9 incidences in IR pass through in scope R7.

In addition, illumination light L1 chief ray L1a with the relation that is generally parallel to each other to parallel to Pivot axle AX1's Point P1, point P4, the point P7 arranged on direction (Y direction) is incident.Therefore, if to point P1, point P4, point P7 incident light beam respectively The inner side of barrel surface 12 is traveled to, then in the Y direction parallel with Pivot axle AX1, scope is passed through in conjugate planes 40 Position stagger.That is, scope R5 configurations in conjugate planes 40-end of Y-axis side, scope R7 configured in conjugate planes 40 On+end of Y-axis side, scope R6 configurations are in scope R5 and scope R7 center.As a result, as shown in figure 27, to illumination Pupil shapes of the illumination light L1 incident region IR in conjugate planes 40 is the Long Circle that scope R5 and scope R7 link Scope R8.

As described above, the chief ray L2a that the position in illumination region IR in imaging beam L2 is produced is respectively in circle It is generally parallel to each other in the circumference in cylinder face 12 and on the direction (Y direction) parallel with Pivot axle AX1.Therefore, project Optical system PL light incident side (illumination region IR sides) can constitute telecentric iris state.In addition, as shown in Figure 19 etc., from illumination region The chief ray L2a of imaging beam L2 during IR outgoing direct of travel is and when being observed along Pivot axle AX1 direction The direction that the optical axis 14a of 2 optical systems 14 non-vertically intersects.

Below, projection optical system PL is described in detail.Figure 28 is to be shown as the 1st projection optical system hair Wave the figure of the light path of function.Figure 29 is the figure for the light path for being shown as the 2nd projection optical system function.

Projection optical system PL includes：Intermediary image Im the 1st projection optical system PL1 is formed as shown in figure 28；With such as figure Intermediary image Im is projected on to substrate P the 2nd projection optical system PL2 shown in 29.1st projection optical system PL1 and the 2nd projected light System PL2 is for example as the Reflected refraction type no projection optical system for the half image field type for being split to form circular image field with telecentric iris State is constituted.

The 1st projection optical system PL1 shown in Figure 28 include the 2nd optical system 14, light separation unit 10, deflection component 17, Lens group 43 and deflection component 44.

2nd optical system 14 doubles as the part for lamp optical system IL, including lens group 45 and lens as described above Group 46.Lens group 45 and the formation of lens group 46 and face (the 1st projection optics of the lamp optical system IL light source image conjugates formed System PL1 pupil plane 28).

Lens group 45 relative to the optical axis PL2a comprising the 2nd projection optical system PL2 and with Pivot axle AX1 (references Figure 19) parallel face (XY faces) configuration with illumination region IR (roller light shield DM) identical side.Lens group 46 is relative to bag Optical axis PL2a containing the 2nd projection optical system PL2 and configuration of parallel with Pivot axle AX1 (reference picture 19) face (XY faces) exists The side opposite with illumination region IR (roller light shield DM).

Incided the imaging beam L2 of the 2nd optical system 14 with the illumination light L1 (reference pictures towards illumination region IR 19) pass through in different light paths.The light path of imaging beam L2 in 2nd optical system 14 is relative to including the 2nd optical system 14 Optical axis 14a face (YZ faces) configure in the side (+X-axis side) substantially opposite with illumination light L1 light path.

The imaging beam L2 for having passed through the 2nd optical system 14 is incident to light separation unit 10.In light separation unit 10, (Figure 23 joins According to) in the incident scope R1 of imaging beam L2 be configured to from the 1st optical system 13 to light separation unit 10 enter with illumination light L1 The scope R2 (by portion 15) penetrated is not repeated.Scope R1 incident imaging beam L2 is for example arranged on by portion 15 on YZ faces Opposite side, the reflecting part 16 as light separation unit 10.Reflecting part 16 is configured near pupil plane 28 or its, further, since such as It is the relation being generally parallel to each other from the chief ray L2a of illumination region IR each point outgoing shown in Figure 18, so in illumination region The light beam that IR each point is produced is incident to reflecting part 16 in the way of the luminous point coincidence in scope R2.

As shown in figure 28, the imaging beam L2 for having incided the reflecting part 16 of light separation unit 10 reflects and led in reflecting part 16 The lens group 46 of the 2nd optical system 14 is crossed, and it is incident to deflection component 17.Deflection component 17 is, for example, prism mirror, is come from The face that the imaging beam L2 of light separation unit 10 is incident is plane reflecting surface.

Deflection component 17 is not to block by the 2nd optical system 14 towards illumination region IR illumination light L1 (reference pictures 19) mode is configured in the position staggered from illumination light L1 light path.Herein, deflection component 17 is blocked reflects in light separation unit 10 Imaging beam L2 so that it is not towards roller light shield DM.The imaging beam L2 of deflection component 17 has been incided in deflection component 17 reflect and deflect, incident to lens group 43.

Lens group 43 makes to reflect in deflection component 17 in the way of forming the intermediate image plane 42 being conjugated with illumination region IR Imaging beam L2 convergence.Lens group 43 is on the optical axis 14a comprising the 2nd optical system 14 and Pivot axle AX1 (reference pictures 19) face (YZ faces) configuration for example with view field's PR (rotating cylinder DP) identical side.Lens group 43 is configured to for example The optics of lens group 45 with the 2nd optical system 14 is of equal value.Lens group 43 is for example by around defined axle (the 2nd projection optical system PL2 optical axis PL2a) optical component such as rotationally symmetrical lens constitutes.2nd projection optical system PL2 optical axis PL2a for example by It is set to orthogonal with the optical axis 14a of the 2nd optical system 14.

Reflect and entered by the imaging beam L2 of lens group 43 to the reflecting surface 44a of deflection component 44 in deflection component 17 Penetrate, and deflected by being reflected in reflecting surface 44a, so that incident to concave mirror 18.Deflection component 17 is, for example, prism mirror, Reflecting surface 44a is roughly planar.

The 2nd projection optical system PL2 shown in Figure 29 includes concave mirror 18, deflection component 44, lens group 43, lens group 47 And concave mirror 48.

Concave mirror 18 shown in Figure 28, Figure 29 is configured to be formed with intermediary image Im by the 1st projection optical system PL1 Between image planes 42 position or its near.That is, the light beam from each point outgoing on illumination region IR in imaging beam L2 is received respectively Hold back in the corresponding each point (conjugate point) on concave mirror 18, and in each point reflection.It is concave mirror 18, from deflection component 44 Face incident imaging beam L2 is the reflecting surface of substantially cylinder planar.The radius of curvature of concave mirror 18 and the 1st projection optics system System PL1 multiplying power is independently configured to roughly the same with illumination region IR radius of curvature.

In the imaging beam L2 that concave mirror 18 reflects nonparallel relative to the direct of travel during incidence of concave mirror 18 Side is travelled upwardly and incident to deflection component 44.Therefore, the imaging beam L2 reflected in concave mirror 18 is relative to deflection component 44 incidence angle is different towards incidence angle during concave mirror 18 relative to deflection component 44 from light beam.As a result, in concave mirror The 18 and imaging beam L2 that reflects of deflection component 44 by with from deflection component 17 towards imaging beam during deflection component 44 The light path that L2 light path (reference picture 28) is different is incident to lens group 43.

Passed through the imaging beam L2 of lens group 43 be not deflected part 17 block it is incident to lens group 47.In other words, Deflection component 17 is configured at the incident positions of the imaging beam L2 reflected in light separation unit 10 and reflected through concave mirror 18 The imaging beam L2 reflected afterwards in deflection component 44 not incident position.

Lens group 47, will in the way of forming the pupil plane 47a being conjugated with the 1st projection optical system PL1 pupil plane 28 The imaging beam L2 convergences of lens group 43 are reflected and have passed through in deflection component 44.Lens group 47 be configured to for example with the 2nd light The optics of lens group 46 of system 14 is of equal value.Lens group 47 is for example by around defined axle (the 2nd projection optical system PL2 light Axle PL2a) rotationally symmetrical lens etc. constitute.

The imaging beam L2 for reflecting in deflection component 44 and having passed through lens group 43 and lens group 47 is incident to concave mirror 48. Concave mirror 48 configure the pupil plane 47a in such as the 2nd projection optical system PL2 position or its near.Concave mirror 48 is for example The incident end face for being configured to imaging beam L2 institutes light incident side bends to the reflecting surface of dome shape.In the incident end face of concave mirror 48 At least region incident imaging beam L2 is reflecting surface.

In addition, concave mirror 48 can also be incident for imaging beam L2 in incident end face the part in region be not anti- Penetrate face.For example, concave mirror 48 is by making the part in the incident regions of the imaging beam L2 in incident end face be to supply imaging The through portion that beam L2 is passed through, and diaphragm part function can be used as.At least a portion of the through portion can also be replaced, and It is that the absorption portion for absorbing imaging beam L2 is set.

The imaging beam L2 reflected in concave mirror 48 by lens group 47 and lens group 43 projects view field PR.Into As the light beam of each point in intermediate image plane 42 in light beam L2 passes twice through lens group 43 and lens group 47 respectively, thus, it is possible to It is enough to converge on each point corresponding with the face (the 2nd projection optical system PL2 image planes) that intermediate image plane 42 is conjugated respectively (altogether Yoke point).So, by the 1st projection optical system PL1, the intermediary image Im in image planes formed between 42 is projected in the 2nd throwing Shadow optical system PL2 image planes.

2nd projection optical system PL2 image planes are set on the substrate P supported with rotating cylinder DP outer peripheral face At position roughly the same view field PR, the picture of the illumination region IR on mask pattern M, which is projected, is exposed on view field PR In.In such exposure device EX3, because the 2nd projection optical system PL2 image planes are transformed into and projected area by concave mirror 18 Domain PR shape is engaged, so illumination region IR picture can be verily projected out in high precision.

In addition, as illustrated using Figure 25 etc., lamp optical system IL is to cause to projection optical system PL The mode that the chief ray L2a of imaging beam L2 when incident is generally parallel to each other is constituted.But, pass through projection optical system PL At least one of imaging beam L2 because be possible to such as aberration from chief ray it is parallel to each other relation skew.To projection Relation between the chief ray of imaging beam L2 when region PR is incident is offset from parallel relation, and exposure accuracy is just It is possible to lower.

Therefore, projection optical system PL can also have the orientation amendment of imaging beam L2 chief ray into close to mutual The correction portion of mutually almost parallel relation.During the correction portion can be only fitted to from illumination region IR to view field PR light path Optional position.But, more it is disposed on the vicinity of intermediate image plane 42, it becomes possible to more effectively correct imaging beam L2 chief ray L2a direction.

For example, concave mirror 18 is disposed on the optical component nearest from intermediate image plane 42 in projection optical system PL, on Stating correction portion can be constituted using concave mirror 18.For example, the reflector shape of concave mirror 18 and a side of position can be set Or both sides, so that the chief ray that must reach the 2nd projection optical system PL2 pupil plane 47a imaging beam L2 is parallel to each other.

That is, it is different with circle that the shape of concave mirror 18, which can be configured to cross sectional shape for example orthogonal from Y direction, Ellipse, to cause imaging beam L2 chief ray parallel to each other.In addition, the position of concave mirror 18 can be in the 2nd projected light The distance between system PL2 image planes and view field PR is in the scope below the depth of focus, offset from intermediate image plane 42 Ground is configured, to cause imaging beam L2 chief ray parallel to each other.

In addition, above-mentioned correction portion can include one or both of deflection component 17 and deflection component 44.For example, deflector The reflecting surface 44a of part 44 can be bent, so as to the 2nd projection optical system PL2 pupil plane 47a imaging beam L2 must be reached Chief ray is parallel to each other.This point is also the same on deflection component 17.

Deflection component 44 is due to being arranged to than deflection component 17 closer to intermediate image plane 42, so by being repaiied as above-mentioned Positive portion can effectively adjust the direction of chief ray.Further, since deflection component 17 has the imaging beam towards intermediate image plane 42 L2 is incident, but not incident from the imaging beam L2 of the outgoing of intermediate image plane 42, so imaging beam L2 chief ray can be adjusted Direction, and design freedom is high.In addition, above-mentioned correction portion can also include with concave mirror 18, deflection component 17 and partially Other different optical components of rotation member 44, can also be not provided with.

In the processing unit U3 (exposure device EX3) of present embodiment more than, due to cause to projection optics system The mode of imaging beam L2 close to collimated light beam incident system PL constitutes lamp optical system IL, so, projection optical system PL is simultaneously uncomplicated, and can go out the mask pattern M of bending picture with high-precision projection exposure.Therefore, processing unit U3 can By making mask pattern M rotations perform exposure-processed on one side come efficient and be accurately exposed to substrate P.

Further, since in order to which substrate P with cylinder sigmoid will be projected to the mask pattern M of cylinder sigmoid picture On, there is provided there is the concave mirror 18 of cylindric reflecting surface in the position of intermediate image plane, so, the 2nd projection optical system PL2 Image planes be transformed into along view field PR so that processing unit U3 can be on scan exposure direction (mask pattern M circle Circumferential direction) ensure big illumination region IR and view field PR width, it can realize that productivity ratio is high and at high-precision exposure Reason.

In addition, in processing unit U3, due to light separation unit 10 to be configured to the 1st projection optical system PL pupil plane 28, so can use illumination light L1 light path is separated with imaging beam L2 light path to fall to penetrate lighting system.Therefore, with example The composition for such as separating using polarizing beam splitter (PBS) light path is compared, and the light quantity that processing unit U3 can be reduced in PBS is damaged Mistake and the generation of veiling glare.In addition, making light source 20 for LASER Light Source etc. and seeking light using the polarized light property of illumination light In the case of the reduction for measuring loss, such light separation unit 10 can also be made up of PBS etc..

Further, since light separation unit 10 (specified part) define via by portion 15 towards illumination region IR illumination light L1 By scope, so the chief ray L1a of the illumination light L1 to illumination region IR when incident direction can be provided with high accuracy. Further, since light separation unit 10 using reflecting part 16 define illumination light L1 by scope, so can be constitute it is simple etc..

In the present embodiment, made by cylindrical lens 25 illumination light L1 (chief ray) angle of divergence with roller light shield DM The directions that are extended of Pivot axle AX1 and barrel surface 12 circumference on it is different.That is, one side of cylindrical lens 25 illuminates arrival Chief ray L1a in region IR illumination light L1 chief ray L1a, being arranged on the direction parallel with Pivot axle AX1 It is parallel to each other, while making to arrange the chief ray L1a deflections (setting) of (distribution) in the circumference of barrel surface 12 to cause it Extended line 41 intersects with the line in the conjugate planes 40 parallel to Pivot axle AX1.Therefore, it is possible to make with Pivot axle The chief ray L2a for the imaging beam L2 being distributed on direction parallel AX1 is generally parallel to each other, and makes the circumference in barrel surface 12 The imaging beam L2 of upper distribution chief ray L2a is also generally parallel to each other.In addition, having as the angle of divergence for making illumination light L1 different The method of tropism, can also equally be used with the 1st previous embodiment makes the bundles of light guide member of optical fiber and to the leaded light The method that the shape of the light exit side of part is adjusted.

[the 4th embodiment]

Below, the 4th embodiment is illustrated.In the present embodiment, for the inscape same with above-mentioned embodiment, Mark identical reference and simplification or the description thereof will be omitted.

Figure 30 is the figure of the composition for the processing unit (exposure device EX4) for showing present embodiment.Figure 31 is shown in figure In 30 composition as lamp optical system IL functions light path figure.Figure 32 is shown in Figure 30 composition as The figure of the light path of 1 projection optical system PL1 functions.Figure 33 is shown in Figure 30 composition as the 2nd projection optics system The figure of the light path for PL2 functions of uniting.

Projection optical system PL includes：1st projection optical system PL1, forms a mask pattern M part (illumination region IR intermediary image Im)；With the 2nd projection optical system PL2, the 1st projection optical system PL1 intermediary images formed are projected on lining View field PR on the P of bottom.Herein, the 1st projection optical system PL1 and the 2nd projection optical system PL2 are respectively by Offner optics Optical system as system is constituted.Lamp optical system IL passes through illumination light via a 1st projection optical system PL1 part L1 is illuminated to illumination region IR.

Lamp optical system IL is on configuring key element (the uniform irradiation optical system from light source to the 1st diaphragm part 23 19), it can for example constitute in a same manner as in the third embodiment.The illumination light L1 sent from light source is due to by uniform irradiation optics System 19 and homogenize the light intensity distributions in the 1st diaphragm part 23.

Lamp optical system IL shown in Figure 31 includes light separation unit 50, as adjustment part 51, concave mirror 52, lens group 53rd, convex mirror 54, deflection component 55 and as adjustment part 56.

Pass through the illumination light L1 of the 1st diaphragm part 23 to pass through as adjustment part 51 and to the reflecting part 57 of light separation unit 50 It is incident.As adjusting part 51 to adjust the picture characteristic in the secondary souce picture with being formed on the face of primary source image conjugate, and Aberration etc. is taken into account and set.As adjustment part 51 can be omitted suitably.

The reflecting part 57 of light separation unit 50 is configured in position incident the illumination light L1 from uniform irradiation optical system 19 Put and by position not incident projection optical system PL imaging beam L2 (reference picture 30).The reflecting part 57 of light separation unit 50 E.g. prism mirror, is plane reflecting surface from the incident faces of the illumination light L1 of uniform irradiation optical system 19.

The illumination light L1 for having incided reflecting part 57 is deflected by being reflected in reflecting part 57, and incident to concave mirror 52. Reflect and reflected to the incident illumination light L1 of concave mirror 52 in concave mirror 52 in reflecting part 57, and by lens group 53 to convex mirror 54 is incident.

Concave mirror 52 has the reflecting surface of such as part comprising sphere, and it is with formation and in uniform irradiation optical system The primary source formed in 19 makes illumination light L1 converge as the mode for the pupil plane 28 that (the 1st diaphragm part 23 shown in Figure 20) is conjugated It is poly-.That is, secondary souce picture is formed on pupil plane 28.

Lens group 53 is suitably set so as to the secondary souce picture in pupil plane 28 as characteristic is adjusted, for example Including field lens (field lens).Convex mirror 54 has one point of the reflecting surface for example comprising sphere, and is configured to curvature Center is consistent with concave mirror 52.Herein, it regard the axle that the central link at the center of concave mirror 52 and convex mirror 54 is got up as illumination Optical system IL optical axis ILa (the 1st projection optical system PL1 optical axis PL1a).Convex mirror 54 and concave mirror 52 are configured to So that being again incident in the light (illumination light L1, imaging beam L2) that convex mirror 54 reflects in concave mirror 52.

Optical axis ILas of the illumination light L1 from concave mirror 52 relative to lamp optical system IL convex mirror 54-X-axis side Incidence, is reflected in convex mirror 54, and incident to concave mirror 52 again, and the photograph of concave mirror 52 is reflected and incided in convex mirror 54 Mingguang City L1 reflects in concave mirror 52 and to the incidence of deflection component 55, deflected by being reflected in deflection component 55, so as to pass through picture Adjust part 56 and incident to illumination region IR.

Deflection component 55 is, for example, prism mirror, is plane from the incident faces of the illumination light L1 of concave mirror 52 Reflecting surface.As adjustment part 56 by aberration etc. with equally taking into account and suitably setting as adjusting part 51.

As shown in figure 32, the 1st projection optical system PL1 include as adjustment part 56, deflection component 55, concave mirror 52, thoroughly Microscope group 53, convex mirror 54 and as adjustment part 58.

From the imaging beam L2 of illumination region IR outgoing by incident to deflection component 55 as adjustment part 56, by Deflection component 55 reflects and is deflected.The imaging beam L2 deflected in deflection component 55 by with from the concave mirror shown in Figure 31 52 towards the different light path of the illumination light L1 of deflection component 55 light path, incident to concave mirror 52.Incide in concave mirror 52 Imaging beam L2 it is incident to convex mirror 54 by the light path different from illumination light L1, and by lens group 53.In convex mirror In 54 position incident imaging beam L2 relative to the 1st projection optical system PL1 optical axis PL1a configuration with illumination light L1 The opposite side (+X-axis side) of incoming position.

The imaging beam L2 reflected in convex mirror 54 is incident to concave mirror 52 by lens group 53, and in concave mirror 52 Reflection.The imaging beam L2 reflected in concave mirror 52 is entered by light separation unit 50 by portion 59 to as adjusting part 58 Penetrate.Herein, light separation unit 50 is the region that is not provided with reflecting part 57 by portion 59.That is, reflecting part 57 is configured in convex mirror After 54 reflections and in position not incident the imaging beam L2 that concave mirror 52 is reflected.So, established practice is set in light separation unit 50 Determine illumination light L1 by scope.

The light path as more than of the light beam from each point outgoing on illumination region IR in imaging beam L2, is thus received Hold back in substantially 1 point in the intermediate image plane 42 being conjugated with illumination region IR.In other words, in the formation illumination region of intermediate image plane 42 IR Picture.Aberration etc. is taken into account suitably to set as adjustment part 56 and as adjustment part 58, to adjust intermediary image Im Picture characteristic.As adjustment part 56 and as one or both of adjustment part 58 can be omitted suitably.

As shown in figure 33, the 2nd projection optical system PL2 includes concave mirror 60, as adjustment part 58, deflection component 61, recessed Face mirror 62, lens group 63, convex mirror 64, deflection component 65 and as adjustment part 66.

Concave mirror 60 is configured near the position of intermediate image plane 42 or its.To be formed along the 1st projection optical system PL1 The intermediary image Im mode of shape be formed as towards the recessed cylinder planar of imaging beam L2 light incident side.Concave mirror 60 such as exists In 3rd embodiment it is illustrated as, by the shape conversion of the 2nd projection optical system PL2 image planes into along view field PR。

The imaging beam L2 for having incided concave mirror 60 reflects in concave mirror 60, and by as adjusting part 58 to deflector Part 61 is incident.Deflection component 61 is, for example, prism mirror, is plane from the incident faces of the imaging beam L2 of concave mirror 60 The reflecting surface of shape.Deflection component 61 be configured at the incident positions of the imaging beam L2 reflected in concave mirror 60 and do not block from 1st projection optical system PL1 concave mirror 52 (reference picture 32) is towards the imaging beam L2 of concave mirror 60 position.

The imaging beam L2 for having incided deflection component 61 reflects and is deflected in deflection component 61, so as to concave mirror 62 It is incident.The imaging beam L2 of concave mirror 62 has been incided to reflect and incident to convex mirror 64 by lens group 63 in concave mirror 62.

The pupil plane 67 that concave mirror 62 is conjugated with the pupil plane 28 of formation and the 1st projection optical system PL1 shown in Figure 32 Mode make imaging beam L2 converge.Concave mirror 62 is for example configured to the optics of concave mirror 52 with the 1st projection optical system PL1 It is of equal value.Concave mirror 62 has the reflecting surface of such as bending of the part comprising sphere.

Into account the ground suitable setting lens group 63 is taken such as aberration, so as to for example forming the spy in view field PR picture Property is adjusted, and lens group 63 is including field lens etc..

Convex mirror 64 is configured near the position being conjugated with pupil plane 67 or its.Convex mirror 64 is for example configured to throw with the 1st The shadow optical system PL1 optics of convex mirror 54 is of equal value.Convex mirror 64 has the reflection of such as bending of the part comprising sphere Face, and the center of curvature of the reflecting surface is set at the position roughly the same with the center of curvature of concave mirror 62.

The imaging beam L2 reflected in convex mirror 64 is again incident on concave mirror 62 by lens group 63, in concave mirror 62 reflections and it is incident to deflection component 65.Incided the imaging beam L2 of deflection component 65 by being reflected in deflection component 65 and It is deflected, by incident to view field PR as adjustment part 66.

As previously discussed, the intermediary image for the illumination region IR that the 2nd projection optical system PL2 will be formed in intermediate image plane 42 Im is formed in the 2nd projection optical system PL2 image planes, and the 2nd projection optical system PL2 image planes are set at rotating cylinder DP The view field PR on substrate P supported position or its near, illumination region IR's is exposed on substrate P as being projected View field PR.

In the processing unit U3 (exposure device EX4) of present embodiment more than, due to cause to projection optics system Imaging beam L2 incident system PL chief ray constitutes lamp optical system IL close to the mode of parallel relation, so, projected light System PL is simultaneously uncomplicated, and can go out the mask pattern M of bending picture with high-precision projection exposure.Therefore, processing unit U3 can be by making mask pattern M rotations perform exposure-processed on one side come efficient and be accurately exposed to substrate P.

In addition, the mask pattern M of bending picture is projected on the substrate P of bending by processing unit U3.In addition, in processing dress Put in U3, because the 2nd projection optical system PL2 image planes are transformed into along view field PR by concave mirror 18, so processing dress Putting U3 can accurately be exposed.In addition, by setting correction portion make it that for example imaging beam L2 is close to telecentric iris state, Processing unit U3 can be accurately exposed.The correction portion for example can using concave mirror 60, as adjustment part 58 and partially At least one of rotation member 61 and constitute.

In addition, in processing unit U3, due to light separation unit 10 to be configured to the pupil plane in the 1st projection optical system PL1 At 28, so illumination light L1 light path can be made to be separated with imaging beam L2 light path.Therefore, with for example with polarizing beam splitter Etc. come make light path separate composition compare, processing unit U3 can reduce the generation of light loss and veiling glare.

In addition, the technical scope of the present invention is not limited to above-mentioned each embodiment.For example, in the presence of will be in above-mentioned each embodiment party The situation that more than 1 of the key element illustrated in formula omits.In addition, the key element illustrated in above-mentioned each embodiment can be appropriate Combine on ground.

In addition, in above-mentioned each embodiment, the view field PR on substrate P bends to cylinder planar, but projected area Domain PR can also be plane.

That is, it is the situation of substantial indeformable rigid substrate in substrate P, even or flexible sheet-like substrates but energy In the case of certain scope comprising view field PR enough is kept into flat (plane), pass through the exposure device of each embodiment The substrate P for being capable of (plane) flat to these is similarly exposed.

For example, substrate P can be substantial indeformable rigid substrate etc., exposure device can expose to substrate P Light.Furthermore, it is possible to carry substrate P as plane mode with the view field PR on substrate P, exposure device is to such lining Bottom P is exposed.

It is 1, the number of projection optical system to the quantity of lamp optical system in addition, in above-mentioned each embodiment Amount is that the example of the exposure device of the simple lens mode of 1 is illustrated, but exposure device can be in roller light shield DM and Configure multiple by multiple lamp optical systems and projected light on the direction that rotating cylinder DP Pivot axle AX2, AX1 is extended The composition of the group of system formation, the exposure device of as so-called poly-lens mode.

In addition, in the 1st embodiment and the 3rd embodiment, being illuminated using the reflecting part 16 of light separation unit 10 come regulation Light L1's passes through scope, but it is also possible to provided by the light shielding part set in addition relative to reflecting part 16 by scope.The screening The light is blocked into not by light separation unit 10 for example, by absorbing to the incident light in the outside by portion 15 in light portion.In addition, Can also for example be configured to permit the space (opening) that illumination light L1 passes through by portion 15.

[device making method]

Below, the device making method of above-mentioned embodiment is illustrated.Figure 34 is the device for showing above-mentioned embodiment The flow chart of manufacture method.A part of process in the flow chart is in the device inspection apparatus shown in previous Fig. 1 and Figure 16 Implement in SYS, SYS2 (flexible display manufacturing line).But, for all process steps of the flow chart of implementing Fig. 34, also need Prepare multiple manufacture processing units.

In the device making method shown in Figure 34, function, the property of the device such as organic EL display panel are carried out first Can design (step 201).Then, the design based on device makes mask pattern M (step 202).In addition, by buying or making The transparent membrane or the substrate (step 203) of sheet material or very thin metal foil etc. for preparing the base material as device such as make.

Then, ready substrate is put into roll type, SMD manufacturing line, over the substrate formed constitute TFT backplane (backplane) layer of the electrode of device and wiring, dielectric film, semiconductor film etc., organic EL hairs as pixel portion Photosphere (step 204).In step 204, typically comprise the process that corrosion-resisting pattern is formed on the film on substrate and resisted with this Corrosion figure case is the process that light shield is etched to above-mentioned film.In the formation of corrosion-resisting pattern, etchant resist is formed uniformly by implementation Process in substrate surface, the exposure light that has been patterned via mask pattern M passed through according to above-mentioned each embodiment The process being exposed to the etchant resist of substrate, the work of the etchant resist imaging for the sub-image for making to be formed with mask pattern by the exposure Sequence.

It is used as the typical case of the processing for saving resource, not use conventional chromating additional (Additive) Son, and in the case of having used the flexible device manufacture method of printing technology etc., implement following processes, i.e.,：In flexible substrate Pass through the process of cloth of coating-type formation feature photosensitive layer (silane coupled material of feature inductive layer, photonasty etc.) on surface；Make The exposure device shown in above-mentioned each embodiment, the exposure light being patterned via roller light shield DM is irradiated In the feature photosensitive layer (feature inductive layer) in flexible substrate, parent is formed according to pattern form on feature photosensitive layer The part of aquation and the process of the part of hydrophobization；Electroplated substrates liquid is coated with the high part of the hydrophily of feature photosensitive layer Deng, the process that the pattern to form metallicity is separated out by electroless plating, that is, at the low temperature wet type for implementing so-called less than 120 DEG C Reason etc..

Then, according to the device to be manufactured, for example, implement what substrate was cut into slices or cut and manufactured in other processes Other substrates, the process of the laminating such as sheet colored filter or thin glass substrate with sealing function, so that assembler Part (display panel) (step 205).Then, device is carried out the post processing (step 206) such as checking.It can manufacture as above Go out device.Device making method in above-mentioned embodiment includes：By processing unit (lining processor) while making rolling Cylinder light shield (light shield holding member) rotation is continuously exposed on irritability substrate while irritability substrate is carried along prescribed direction The process of light mask pattern；The process of the processing of the change of the inductive layer for the irritability substrate being exposed with utilization subsequently.

The explanation of reference

10 smooth separation units, 12 barrel surfaces, 15 by portion, 16 reflecting parts, 18 concave mirrors, 19 uniform irradiation optical systems, 23 the 1st diaphragm parts, 25 cylindrical lenses, 26 the 2nd diaphragm parts, 28 pupil planes, 40 conjugate planes, 41 extended lines, in the middle of 42 Image planes, 50 smooth separation units, 57 reflecting parts, 60 concave mirrors, IL lamp optical systems, IR illumination regions, Im intermediary images, L0 light source pictures, L1 illumination lights, L2 imagings Beam, L2a chief rays, M mask patterns, substrate P, PL projection optical systems, PR View field, the projection optical systems of PL1 the 1st, the projection optical systems of PL2 the 2nd, U3 processing units.

Claims

1. a kind of scanning-exposure apparatus, the mask pattern for the reflection-type that will be formed on the outer peripheral face of roller light shield is exposed to along length In the flexible sheet-like substrates for spending direction movement, the roller light shield rotates around the 1st central shaft, the scanning-exposure apparatus It is characterised by, including：

Lamp optical system, the illumination region irradiation illumination light of a part for the outer peripheral face to being set in the roller light shield；

The projection optical system of telecentric iris, by reflected light of the incidence from the mask pattern being apparent in the illumination region, And it is imaged out the picture of the mask pattern in the view field for the part being set in the sheet-like substrates；With

1st optical component, in order that the direction that the reflected light from the mask pattern is extended in the 1st central shaft Telecentric iris state is respectively become with the circumference of the outer peripheral face, is arranged in the lamp optical system, and make in the described 1st The chief ray for the illumination light being distributed on the direction that heart axle is extended turns into state substantially parallel to one another, makes in the periphery In the circumference in face the chief ray that is distributed with middle position of its extended line between the 1st central shaft and the outer peripheral face or its The mode that neighbouring position is intersected turns into the state inclined towards each other.

2. scanning-exposure apparatus as claimed in claim 1, it is characterised in that

1st optical component includes lens, and the lens make the refracting power in the direction that the 1st central shaft extended and on institute The circumferential refracting power for stating the outer peripheral face of roller light shield is different,

The circumferential refracting power on the outer peripheral face of the lens is set, to be distributed from the circumference in the outer peripheral face Chief ray the position that is intersected of extended line to the 1st central shaft distance for the outer peripheral face of the roller light shield radius About 1/2nd.

3. scanning-exposure apparatus as claimed in claim 1, it is characterised in that

1st optical component includes cylindrical lens, and the cylindrical lens is used to make the circumferential refracting power on the outer peripheral face The refracting power in the direction extended more than the 1st central shaft,

The circumferential refracting power on the outer peripheral face of the cylindrical lens is set, to cause from the circumference in the outer peripheral face The position that the extended line of the chief ray of distribution is intersected to the 1st central shaft distance for the roller light shield outer peripheral face About 1/2nd of radius.

4. such as scanning-exposure apparatus according to any one of claims 1 to 3, it is characterised in that

The lamp optical system has the 2nd optical component, and the 2nd optical component has the pupil for the light source picture for forming light source Face, to cause the angle of flare of the illumination light for irradiating the illumination region in the circumference of the outer peripheral face of the roller light shield and Different modes sets the shape of the light source picture on the direction that 1st central shaft is extended, wherein the light source produces institute State illumination light.

5. scanning-exposure apparatus as claimed in claim 4, it is characterised in that

2nd optical component includes opening diaphragm, and the opening diaphragm is configured on the pupil plane of the lamp optical system, and The opening size of the opening diaphragm is different on the direction that the circumference and the 1st central shaft of the outer peripheral face are extended.

6. scanning-exposure apparatus as claimed in claim 4, it is characterised in that

2nd optical component includes light guide member, and the light guide member makes the bundles of light exit side of optical fiber configure described On the pupil plane of lamp optical system, and make the outer peripheral face being shaped so as in the roller light shield of the light exit side Length in the circumference long round shape or ellipticity different from the length on the direction that the 1st central shaft is extended.

7. the scanning-exposure apparatus as described in claim 5 or 6, it is characterised in that

Also include rotating cylinder, the outer peripheral face that the rotating cylinder passes through the cylinder planar of constant-radius relative to the 2nd central shaft Bend the sheet-like substrates and support the sheet-like substrates, and rotated simultaneously around the 2nd central shaft, wherein, in the described 2nd Heart axle is configured substantially in parallel with the 1st central shaft,

The sheet-like substrates are made to move along its length by the rotation of the rotating cylinder.

8. a kind of device making method, in the flexible sheet-like substrates for pulling out and being reclaimed by recovery reel from supply roll The pattern of electronic device is formed, the device making method is characterised by, including：

The sheet-like substrates are transported to apparatus for coating by the 1st process, and photosensitive layer is formed on the surface of the sheet-like substrates；

2nd process, the sheet-like substrates come from apparatus for coating carrying is transported to the scan exposure described in claim 7 Device, with making the rotation of the rotating cylinder of sheet-like substrates movement synchronously rotate the roller light shield, thus root The mask pattern scan exposure of the roller light shield is will be formed in the photosensitive layer according to the pattern of the electronic device； And

3rd process, is transported to wet type processing device by the next sheet-like substrates are carried from the scanning-exposure apparatus, implements profit With the wet processed of the change of the photosensitive layer.

9. device making method as claimed in claim 8, it is characterised in that

The photosensitive layer is any in photoresist, photonasty coupling material, photonasty plating reducing agent, UV solidified resins Kind.

10. device making method as claimed in claim 8, it is characterised in that

3rd process is any of following process：Show the photosensitive layer for the sub-image for being formed with the mask pattern The process of picture, make to impart hydrophily according to the picture of the mask pattern and the hydrophobic photosensitive layer separates out the work of pattern Sequence.

11. a kind of device making method, has used projection aligner in the method, the projection aligner makes cylindrical shape Roller light shield rotate and served as a contrast via projection optical system in the photosensitive sheet that moves along its length around the 1st central shaft Expose the picture of mask pattern on bottom, the roller light shield is along the outer of the constant-radius relative to the 1st central shaft The mask pattern of the reflection-type of side face formation electronic device, the device making method is characterised by,

By the lamp optical system of the projection aligner, make the lighting area being irradiated on the outer peripheral face of the roller light shield The orientation characteristic of the illumination light in domain turns into non-telecentric state on the circumference of the outer peripheral face, and on the 1st central shaft Institute is axially extending to turn into telecentric iris state, thus makes week of the reflected beams on the outer peripheral face produced from the illumination region The projection optical system is incided to the axial both sides with turning into telecentric iris state.

12. device making method as claimed in claim 11, it is characterised in that

The lamp optical system is formed between the outer peripheral face and the 1st central shaft of the roller light shield with being shone as described The 1st conjugate planes that the light source picture of the light source of Mingguang City is optically conjugated.

13. device making method as claimed in claim 12, it is characterised in that

About 1/2nd of the radius of the outer peripheral face are set to the distance of the 1st conjugate planes from the 1st central shaft.

14. device making method as claimed in claim 13, it is characterised in that

The projection optical system has the pupil plane for forming the light source picture, and the light source picture for being formed at the pupil plane is set It is set to：Corresponding with the circumference of outer peripheral face size ratio size corresponding with the axial direction is big.

15. the device making method as any one of claim 11~14, it is characterised in that

In order that towards the illumination region on the roller light shield the illumination light orientation characteristic in the circumference and It is different on the axial direction, refracting power light different in the circumference and the axial direction is provided with the lamp optical system Department of the Chinese Academy of Sciences's part.

16. the device making method as any one of claim 11~14, it is characterised in that

Rotating cylinder is provided with the projection aligner, the rotating cylinder has to turn into perseverance relative to the 2nd central shaft The mode for determining radius winds the sheet-like substrates and supports the outer peripheral face of the sheet-like substrates, and the rotating cylinder passes through around institute State the rotation of the 2nd central shaft to make the sheet-like substrates move along its length, wherein in the 2nd central shaft and the described 1st Heart axle is abreast configured.

17. device making method as claimed in claim 16, it is characterised in that

It is long by apparatus for coating edge in the sheet-like substrates being moved to before the rotating cylinder of the projection aligner Degree direction continuously or is optionally coated with solid based on photoresist, photonasty coupling material, photonasty plating reducing agent, UV Change the photonasty functional layer of any of resin.

18. device making method as claimed in claim 17, it is characterised in that

Described of the picture of the mask pattern is exposed in the photonasty functional layer by the projection aligner Shape substrate is then routed to wet type processing device and by wet processed.

19. a kind of device making method, has used projection aligner in the method, the projection aligner makes cylindrical shape Roller light shield rotate and served as a contrast via projection optical system in the photosensitive sheet that moves along its length around the 1st central shaft Expose the picture of mask pattern on bottom, the roller light shield is along the outer of the constant-radius relative to the 1st central shaft The mask pattern of the reflection-type of side face formation electronic device, the device making method is characterised by, including：

The illumination on the outer peripheral face of the roller light shield is set in by the lamp optical system direction of the projection aligner The step of area illumination has the illumination light of following orientation characteristic, i.e.,：Make the chief ray being distributed in the circumference of the outer peripheral face As non-telecentric state, and make to be distributed in the 1st central shaft it is axially extending on chief ray turn into telecentric iris state；With

Make circumference and the axial both sides of the chief ray of the reflected beams produced from the illumination region on the outer peripheral face The step of projection optical system being incided as telecentric iris state.

20. device making method as claimed in claim 19, it is characterised in that

21. device making method as claimed in claim 20, it is characterised in that

22. device making method as claimed in claim 21, it is characterised in that

23. the device making method as any one of claim 19~22, it is characterised in that