CN107272099B - 1 × 5 beam-splitting optical grating of single ridge structure of TE polarization - Google Patents
1 × 5 beam-splitting optical grating of single ridge structure of TE polarization Download PDFInfo
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- CN107272099B CN107272099B CN201710576263.0A CN201710576263A CN107272099B CN 107272099 B CN107272099 B CN 107272099B CN 201710576263 A CN201710576263 A CN 201710576263A CN 107272099 B CN107272099 B CN 107272099B
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1866—Transmission gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
- G02B27/283—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising used for beam splitting or combining
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
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Abstract
A kind of 1 × 5 beam-splitting optical grating of single ridge structure that the TE for 1550 nano wave lengths is polarized, the screen periods of the grating are 3010~3020 nanometers, and ridge width is 1505~1510 nanometers, and etching depth is 2270~2278 nanometers.When the TE polarised light vertical incidence of 1550 nano wave lengths, transmitted light will be divided into equicohesive 5 beam light, and diffraction efficiency is greater than 97%, and beam splitting uniformity is better than 1.5%.1 × 5 beam-splitting optical grating of single ridge structure of TE polarization of the present invention is process by electron-beam direct writing device combination microelectronics deep etching process, and materials are convenient, and cost is small, can produce in enormous quantities, has important practical prospect.
Description
Technical field
The present invention relates to transmission beam-splitting optical grating, single ridge knots of especially a kind of TE polarized incident for 1550 nano wave lengths
1 × 5 beam-splitting optical grating of structure.
Background technique
Beam splitter is the primary element in optical system, is had a wide range of applications in various optical systems.Traditional is more
Layer dielectric preparing grating complex process, it is expensive.And grating is as beam splitter, has that structure is simple, efficiency of transmission is high, makes
The advantages that with facilitating, has wide practical use.
Jiangjun Zheng et al. designs the high efficiency transmission-type fused quartz 1 × 2 under a kind of Bragg angle incidence and polarizes
Independent beam splitting grating [first technology 1:J.Feng et al., Appl.Opt.48,5636-5641 (2009)]. Jiangjun
Zheng et al. devises 1 × 3 polarization-independent beam splitting grating [the first skill of high efficiency transmission-type fused quartz under a kind of vertical incidence
Art 2:J.Feng et al., Appl.Opt.47,6638-6643 (2008)].Wu Jun et al. devises a kind of vertical incidence
Under the double ridge fused quartz TE of high efficiency transmission-type polarize 1 × 5 beam-splitting optical grating, realize more multiport by using double ridge structures
Beam splitting [first technology 3:J.Wu et al., J.Opt.13,115703 (2011)].But double ridge gratings are relative to common list
Ridge grating is more difficult to make.
Rectangular raster is the grating with rectangle flute profile processed in substrate using microelectronics deep etching process.It is high
Density rectangle grating diffration is theoretical, cannot be explained by simple scalar optical grating diffraction equation, and must use vector form
Maxwell equation and combine boundary condition, result is precisely calculated by the computer program of coding.Moharam et al.
Given rigorous coupled wave approach algorithm [first technology 4:M.G.Moharam et al., J.Opt.Soc.Am.A.12,
1077 (1995)], it can solve the Diffraction Problems of this kind of high dencity grating.As far as we know, there are no people to be directed to 1550 nanometers
Optical communicating waveband designed TE and polarizes 1 × 5 beam-splitting optical grating of single ridge structure.
Summary of the invention
The invention proposes a kind of 1 × 5 beam splitter light of single ridge structure for 1550 nano wave length incidence TE polarized incidents
Grid.When the light vertical incidence that 1550 nano wave lengths, TE are polarized, which can be divided into the equicohesive transmitted light of 5 beams,
Its diffraction efficiency can achieve 97% or more, and beam splitting uniformity is better than 1.5%.The present invention has important application value.
Technical solution of the invention:
A kind of 1 × 5 beam-splitting optical grating of single ridge structure that the TE for 1550 nano wave lengths is polarized, it is characterized in that the beam splitting light
The screen periods of grid are 3010~3020 nanometers, and ridge width is 1505~1510 nanometers, and etching depth is 2270~2278 nanometers.
Used high-density deeply etched grating is formed by BK7 glass etching, and groove profile is rectangle, and screen periods are preferably
3015.5 nanometers, rectangular ridge is preferably 1507.8 nanometers wide, and etching depth is preferably 2274 nanometers.When 1550 nano wave lengths, TE
When the light of polarization impinges perpendicularly on the grating, incident light will be divided into the equicohesive transmitted light of 5 beams.
Compared with prior art, technical effect of the invention is as follows:
1) diffraction efficiency of total transmission light is greater than 97%, and the uniformity of beam splitter is better than 0.1%, has beam splitting uniformity
Good, the higher advantage of efficiency of transmission.
2) electron-beam direct writing device combination microelectronics deep etching process is utilized, can produce, etch in high volume, at low cost
Grating performance afterwards is stable, reliable, has important practical prospect.
Detailed description of the invention
Fig. 1 is the schematic diagram of 1 × 5 beam-splitting optical grating of TE polarization of the present invention.
1 represents uniform dielectric air (refractive index is n in Fig. 11), 2 represent grating, and (refractive index is n2), 3 represent TE polarization
Incident light, 4,5,6,7,8 represent -2, -1,0 ,+1 ,+2 grades of diffraction times, and d is screen periods, and r is that ridge is wide, and h is that grating is deep
Degree.
Specific embodiment
Below with reference to embodiment and attached drawing, the invention will be further described, but protection model of the invention should not be limited with this
It encloses.
First referring to Fig. 1, Fig. 1 is the schematic diagram of 1 × 5 beam-splitting optical grating of TE polarization of the present invention, region 1 is uniform in figure
Medium air (refractive index n1=1), 2 be grating, by uniform dielectric BK7 glass (refractive index n2=1.5007) it is made.TE polarization
The corresponding electric field intensity direction of vibration of incidence impinges perpendicularly on grating perpendicular to the plane of incidence.As seen from the figure, the present invention is used for 1550
1 × 5 beam-splitting optical grating of single ridge structure of nano wave length TE polarized incident, screen periods are 3010~3020 nanometers, and rectangular ridge width is
1507~1509 nanometers, etching depth is 2270~2278 nanometers.
Under optical grating construction as shown in Figure 1, present invention employs rigorous coupled wave approach [first technology 4] to calculate light
Diffraction efficiency of the grid in 1550 nano wavebands.We obtain the initial ginseng of grating using rigorous coupled wave approach [first technology 4]
Number, and application simulation annealing method optimization [first technology 5], to obtain the optimal ginseng of this high efficiency list ridge structure beam-splitting optical grating
Number.
Table 1 gives a series of embodiments of the invention and its corresponding beam splitting uniformity and total transmission efficiency, and d is in table
Screen periods, r are that ridge is wide, and h is grating depth, and λ is wavelength.During making grating, screen periods, ridge are suitably selected
Edge in certain bandwidth away from can obtain high-diffraction efficiency and transmitted light with good uniformity with etching depth between wide, ridge
Grid.
When 1 1550 nano wave length TE polarised light vertical incidence of table, the total diffraction efficiency and uniformity of 5 ports.
TE of the invention polarizes 5 beam-splitting optical grating of high efficiency transmission 1 *, with flexible and convenient to use, uniformity is preferable, transmission
The advantages that efficiency is higher is a kind of ideal diffraction optical element, deep using electron-beam direct writing device combination microelectronics
Etching technique can produce in high volume, at low cost, and the grating performance after etching is stable, reliable, have important practical prospect.
Claims (2)
1. a kind of 1 × 5 beam-splitting optical grating of single ridge structure that the TE for 1550 nano wave lengths is polarized, it is characterised in that the beam-splitting optical grating
Screen periods be 3010~3020 nanometers, ridge width be 1505~1510 nanometers, etching depth be 2270~2278 nanometers, transmission
Beam-splitting optical grating, grating are formed by BK7 glass.
2. 1 × 5 beam-splitting optical grating of single ridge structure of TE polarization according to claim 1, it is characterised in that the beam splitting light
The screen periods of grid are 3015.5 nanometers, and ridge width is 1507.8 nanometers, and etching depth is 2274 nanometers.
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| CN201710576263.0A CN107272099B (en) | 2017-07-14 | 2017-07-14 | 1 × 5 beam-splitting optical grating of single ridge structure of TE polarization |
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| CN108680978B (en) * | 2018-03-19 | 2020-12-04 | 中国科学院上海光学精密机械研究所 | 5X 5 lattice diffraction grating based on two single ridge gratings |
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| JP2002540446A (en) * | 1999-03-22 | 2002-11-26 | エムイーエムエス・オプティカル・インコーポレイテッド | Diffraction selective polarization beam splitter and beam routing prism produced thereby |
| CN100340875C (en) * | 2006-03-08 | 2007-10-03 | 中国科学院上海光学精密机械研究所 | 800 nano waveband quartz transmission-polarizing beam-splitting grating |
| CN100340876C (en) * | 2006-03-22 | 2007-10-03 | 中国科学院上海光学精密机械研究所 | High density deep etching quartz transmission plarizing beam split grating of 532 nano wave length |
| CN100464199C (en) * | 2007-08-22 | 2009-02-25 | 中国科学院上海光学精密机械研究所 | 1550 nanometer wavelength silicon reflection type polarized beam splitting optical grating |
| US8264773B2 (en) * | 2009-05-01 | 2012-09-11 | Toyota Motor Engineering And Manufacturing North America, Inc. | Grating structure for splitting light |
| CN102156315B (en) * | 2011-04-26 | 2012-05-23 | 中国科学院上海光学精密机械研究所 | 1*5 beam splitting grating for double-ridge fused quartz of TE (tangent elevation) polarization |
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