CN107272099A - The beam-splitting optical grating of single ridge structure 1 × 5 of TE polarizations - Google Patents
The beam-splitting optical grating of single ridge structure 1 × 5 of TE polarizations Download PDFInfo
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- CN107272099A CN107272099A CN201710576263.0A CN201710576263A CN107272099A CN 107272099 A CN107272099 A CN 107272099A CN 201710576263 A CN201710576263 A CN 201710576263A CN 107272099 A CN107272099 A CN 107272099A
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1866—Transmission gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
- G02B27/283—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising used for beam splitting or combining
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
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- Diffracting Gratings Or Hologram Optical Elements (AREA)
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Abstract
A kind of beam-splitting optical grating of single ridge structure 1 × 5 for the TE polarizations for being used for 1550 nano wave lengths, the screen periods of the grating are 3010~3020 nanometers, and a width of 1505~1510 nanometers of ridge, etching depth is 2270~2278 nanometers.When the TE polarised light vertical incidence of 1550 nano wave lengths, its transmitted light will be divided into equicohesive 5 beam light, and its diffraction efficiency is more than 97%, and beam splitting uniformity is better than 1.5%.The beam-splitting optical grating of single ridge structure 1 × 5 of TE polarizations of the present invention is processed by electron-beam direct writing device combination microelectronics deep etching process, and convenient material drawing, cost is small, can produce in enormous quantities, with important practical prospect.
Description
Technical field
The present invention relates to transmission beam-splitting optical grating, especially a kind of single ridge knot for the TE polarized incidents for being used for 1550 nano wave lengths
The beam-splitting optical grating of structure 1 × 5.
Background technology
Beam splitter is the primary element in optical system, is had a wide range of applications in various optical systems.Traditional is more
Layer dielectric preparing grating complex process, it is costly.And grating is as beam splitter, with simple in construction, efficiency of transmission it is high, make
The advantages of facilitating is used, is had wide practical use.
The high efficiency transmission-type fused quartz 1 × 2 that Jiangjun Zheng et al. are designed under a kind of Bragg angle incidence is polarized
Independent beam splitting grating【First technology 1：J.Feng et al.,Appl.Opt.48,5636-5641(2009)】.Jiangjun
Zheng et al. devises the polarization-independent beam splitting grating of high efficiency transmission-type fused quartz 1 × 3 under a kind of vertical incidence【First skill
Art 2：J.Feng et al.,Appl.Opt.47,6638-6643(2008)】.Wu Jun et al. are devised under a kind of vertical incidence
The double ridge fused quartz TE of high efficiency transmission-type polarize 1 × 5 beam-splitting optical grating, point of more multiport is realized by using double ridge structures
Beam【First technology 3：J.Wu et al.,J.Opt.13,115703(2011)】.But double ridge gratings are relative to conventional single ridge
Grating is more difficult to make.
Rectangular raster is to utilize microelectronics deep etching process, the grating with rectangle flute profile processed in substrate.It is high
Density rectangle grating diffration is theoretical, it is impossible to is explained by simple scalar optical grating diffraction equation, and must use vector form
Maxwell equation and combine boundary condition, result is precisely calculated by the computer program of coding.Moharam et al.
The algorithm of rigorous coupled wave approach is given【First technology 4：M.G.Moharam et al.,J.Opt.Soc.Am.A.12,
1077(1995)】, the Diffraction Problems of this kind of high dencity grating can be solved.As far as we know, also nobody is directed to 1550 nanometers
Optical communicating waveband designed the single beam-splitting optical grating of ridge structure 1 × 5 of TE polarizations.
The content of the invention
The present invention, which is proposed, a kind of is used for the beam splitter light of single ridge structure 1 × 5 of 1550 nano wave lengths incidence TE polarized incidents
Grid.When the light vertical incidence that 1550 nano wave lengths, TE are polarized, the beam splitter can be divided into the equicohesive transmitted light of 5 beams,
Its diffraction efficiency can reach more than 97%, and beam splitting uniformity is better than 1.5%.The present invention has important application value.
The technical solution of the present invention：
A kind of beam-splitting optical grating of single ridge structure 1 × 5 for the TE polarizations for being used for 1550 nano wave lengths, its feature is the beam splitting light
The screen periods of grid are 3010~3020 nanometers, a width of 1505~1510 nanometers of ridge, and etching depth is 2270~2278 nanometers.
Used high-density deeply etched grating is formed by BK7 glass etchings, and groove profile is rectangle, and screen periods are preferably
3015.5 nanometers, wide rectangular ridge is preferably 1507.8 nanometers, and etching depth is preferably 2274 nanometers.As 1550 nano wave lengths, TE
When the light of polarization impinges perpendicularly on the grating, incident light will be divided into the equicohesive transmitted light of 5 beams.
Compared with prior art, technique effect of the invention is as follows：
1) diffraction efficiency of total transmission light is more than 97%, and the uniformity of beam splitter is better than 0.1%, with beam splitting uniformity
The higher advantage of good, efficiency of transmission.
2) electron-beam direct writing device combination microelectronics deep etching process is utilized, can in high volume, at low cost produce, etch
Grating performance afterwards is stable, reliable, with important practical prospect.
Brief description of the drawings
Fig. 1 is the schematic diagram of 1 × 5 beam-splitting optical grating of TE polarizations of the present invention.
1 represents that (refractive index is n in Fig. 11), 2 represent grating, and (refractive index is n2), 3 represent TE polarization incident light, 4,5,
6th, 7,8-2 ,-1,0 ,+1 ,+2 order diffraction levels are represented, d is screen periods, and r is that ridge is wide, and h is grating depth.
Embodiment
With reference to embodiment and accompanying drawing, the invention will be further described, but the protection model of the present invention should not be limited with this
Enclose.
First referring to Fig. 1, Fig. 1 is the schematic diagram of 1 × 5 beam-splitting optical grating of TE polarizations of the present invention, region 1 is uniform Jie in figure
Matter air (refractive index n1=1), 2 be grating, by uniform dielectric BK7 glass (refractive index n2=1.5007) be made.TE polarized incidents
Correspondence electric field intensity direction of vibration is perpendicular to the plane of incidence, and it impinges perpendicularly on grating.As seen from the figure, the present invention is used for 1550 nanometers
The beam-splitting optical grating of single ridge structure 1 × 5 of wavelength TE polarized incidents, screen periods are 3010~3020 nanometers, rectangular ridge a width of 1507
~1509 nanometers, etching depth is 2270~2278 nanometers.
Under optical grating construction as shown in Figure 1, present invention employs rigorous coupled wave approach【First technology 4】Calculate light
Diffraction efficiency of the grid in 1550 nano wavebands.We apply rigorous coupled wave approach【First technology 4】Obtain the initial ginseng of grating
Number, and the optimization of application simulation annealing method【First technology 5】, so as to obtain the optimal ginseng of this high efficiency list ridge structure beam-splitting optical grating
Number.
It is light that table 1, which gives d in a series of embodiments of the invention and its corresponding beam splitting uniformity and total transmission efficiency, table,
Grid cycle, r is that ridge is wide, and h is grating depth, and λ is wavelength.During grating is made, suitably select screen periods, ridge it is wide,
Edge in certain bandwidth with etching depth away from can just obtain high-diffraction efficiency and the preferable transmission grating of uniformity between ridge.
During 1 1550 nano wave length TE polarised light vertical incidence of table, the total diffraction efficiency and uniformity of 5 ports.
The beam-splitting optical grating of TE polarizations high efficiency transmission 1 * 5 of the present invention, with flexible and convenient to use, uniformity preferably, transmission
The advantages of efficiency is higher, is a kind of ideal diffraction optical element, deep using electron-beam direct writing device combination microelectronics
Etching technique, can be produced in high volume, at low cost, and the grating performance after etching is stable, reliable, with important practical prospect.
Claims (2)
1. a kind of beam-splitting optical grating of single ridge structure 1 × 5 for the TE polarizations for being used for 1550 nano wave lengths, it is characterised in that the beam-splitting optical grating
Screen periods be 3010~3020 nanometers, a width of 1505~1510 nanometers of ridge, etching depth be 2270~2278 nanometers.
2. the beam-splitting optical grating of single ridge structure 1 × 5 of TE polarizations according to claim 1, it is characterised in that described beam splitting light
The screen periods of grid are 3015.5 nanometers, a width of 1507.8 nanometers of ridge, and etching depth is 2274 nanometers.
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| CN201710576263.0A CN107272099B (en) | 2017-07-14 | 2017-07-14 | 1 × 5 beam-splitting optical grating of single ridge structure of TE polarization |
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| CN201710576263.0A CN107272099B (en) | 2017-07-14 | 2017-07-14 | 1 × 5 beam-splitting optical grating of single ridge structure of TE polarization |
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| CN107272099B CN107272099B (en) | 2019-06-21 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108680978A (en) * | 2018-03-19 | 2018-10-19 | 中国科学院上海光学精密机械研究所 | 5 × 5 lattice diffracting rasters based on two single ridge gratings |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2000057215A1 (en) * | 1999-03-22 | 2000-09-28 | Mems Optical, Inc. | Diffractive selectively polarizing beam splitter and beam routing prisms produced thereby |
| CN1815276A (en) * | 2006-03-08 | 2006-08-09 | 中国科学院上海光学精密机械研究所 | Quartz transmission polarization beam splitting grating with 800 nanometer wave band |
| CN1821817A (en) * | 2006-03-22 | 2006-08-23 | 中国科学院上海光学精密机械研究所 | 532 nm wavelength high-density deep-etched quartz transmission polarization beam-splitting grating |
| CN101109831A (en) * | 2007-08-22 | 2008-01-23 | 中国科学院上海光学精密机械研究所 | 1550 nm wavelength silicon reflection type polarization beam splitting grating |
| US20100277797A1 (en) * | 2009-05-01 | 2010-11-04 | Toyota Motor Engineering And Manufacturing North America, Inc. | Grating structure for splitting light |
| CN102156315A (en) * | 2011-04-26 | 2011-08-17 | 中国科学院上海光学精密机械研究所 | TE polarized double-ridge fused quartz 1 x 5 beam splitting grating |
-
2017
- 2017-07-14 CN CN201710576263.0A patent/CN107272099B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2000057215A1 (en) * | 1999-03-22 | 2000-09-28 | Mems Optical, Inc. | Diffractive selectively polarizing beam splitter and beam routing prisms produced thereby |
| CN1815276A (en) * | 2006-03-08 | 2006-08-09 | 中国科学院上海光学精密机械研究所 | Quartz transmission polarization beam splitting grating with 800 nanometer wave band |
| CN1821817A (en) * | 2006-03-22 | 2006-08-23 | 中国科学院上海光学精密机械研究所 | 532 nm wavelength high-density deep-etched quartz transmission polarization beam-splitting grating |
| CN101109831A (en) * | 2007-08-22 | 2008-01-23 | 中国科学院上海光学精密机械研究所 | 1550 nm wavelength silicon reflection type polarization beam splitting grating |
| US20100277797A1 (en) * | 2009-05-01 | 2010-11-04 | Toyota Motor Engineering And Manufacturing North America, Inc. | Grating structure for splitting light |
| CN102156315A (en) * | 2011-04-26 | 2011-08-17 | 中国科学院上海光学精密机械研究所 | TE polarized double-ridge fused quartz 1 x 5 beam splitting grating |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108680978A (en) * | 2018-03-19 | 2018-10-19 | 中国科学院上海光学精密机械研究所 | 5 × 5 lattice diffracting rasters based on two single ridge gratings |
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| CN107272099B (en) | 2019-06-21 |
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