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Vertical incidence quartz 1*2 beam-splitting tilted grating for TE (Tangent Elevation) polarization

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CN103698827A
CN103698827A CN 201310547673 CN201310547673A CN103698827A CN 103698827 A CN103698827 A CN 103698827A CN 201310547673 CN201310547673 CN 201310547673 CN 201310547673 A CN201310547673 A CN 201310547673A CN 103698827 A CN103698827 A CN 103698827A
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grating
beam
light
splitting
incidence
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CN 201310547673
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Chinese (zh)
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周常河
李树斌
曹红超
吴俊�
刘昆
黄巍
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中国科学院上海光学精密机械研究所
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Abstract

The invention discloses a vertical incidence quartz 1*2 beam-splitting tilted grating for TE (Tangent Elevation) polarization with 1550nanometer wavelength. The beam-splitting grating has the grating period of 2108-2010 nanometers, the inclination angle of 20-21 degrees, the ridge depth of 2982-2984 nanometers and the ridge width of 1576-1578 nanometers. When TE polarized light is in a vertical incidence manner, the transmission light is split into two beams of light with equal intensity, the total diffraction efficiency of the two beams of light is more than 95%, and the uniformity is superior to 4%. The quartz 1*2 beam-splitting tilted grating is processed by combining an electron beam direct-write device with micro-electronics deep etching process, is convenient in material selection and low in construction cost, can be subjected to large-scale production and has important practical prospect.

Description

TE偏振的垂直入射石英1 X 2分束倾斜光栅 TE polarized perpendicularly incident beam 1 X 2 Shi Ying inclined grating

技术领域 FIELD

[0001] 本发明涉及透射分束光栅,特别是一种用于1550纳米波长的TE偏振的垂直入射石英1X2分束倾斜光栅。 [0001] The present invention relates to a transmission grating beam splitter, in particular a Shi Ying perpendicularly incident wavelength 1550 nm for TE polarization splitting 1X2 inclined grating.

背景技术 Background technique

[0002] 分束器是光学系统中的基本元件,在光学系统中有着重要的应用。 [0002] The beam splitter is an optical system in the base element, has important applications in the optical system. 在光通信、光信息处理、光子晶体制作、全息等等系统中有着不可替代的作用。 Irreplaceable role in optical communications, optical information processing, production of the photonic crystal, a hologram, etc. system. 由于传统的多层膜结构分束器工艺复杂,成本昂贵,而且激光破坏阈值不高,因此限制多层膜结构的广泛应用。 Since the conventional multilayer film structure beamsplitter process is complex, expensive, and laser damage threshold is not high, thus limiting widespread use of the multilayer film structure. 熔融石英是一种理想的光栅材料,它具有高光学质量:不但具有稳定的性能,而且具有高的损伤阈值和高衍射效率。 Fused Shi Ying is an ideal grating material having high optical quality: not only has a stable performance and a high damage threshold and a high diffraction efficiency. 采用先进的微电子工艺,制作光栅的工艺流程十分简单。 The use of advanced micro-electronics technology, making a grating process is very simple. 因此,刻蚀高密度深刻蚀熔融石英倾斜光栅作为新型的分束器件具有广泛的应用前景。 Thus, a high-density etching deeply etched grating tilt fused Shi Ying as a new beam splitting device has a wide application prospect. 对于倾斜石英光栅,由于其不对称结构特点,可以实现不对称分束的功能,这样可以使倾斜光栅更方便的应用在光学系统中。 Shi Ying inclined grating, due to its asymmetric structure characteristic, asymmetrical splitting function can be realized, which can make application more convenient tilted grating in the optical system.

[0003] Jijun Feng等人设计了一种布拉格角入射下的高效率透射式矩形熔石英偏振无关1X2分束光栅,其衍射效率非常高【在先技术I J.Feng et al.,Appl.0pt.48,5636-5641 (2009)】。 [0003] Jijun Feng et al., Designed a high efficiency rectangular transmissive fused Shi Ying at a Bragg angle incident beam polarization independent 1X2 grating, the diffraction efficiency is very high CITATION I J.Feng et al., Appl.0pt .48,5636-5641 (2009)]. 以上光栅都是基于矩形结构,倾斜光栅不仅可以增加设计的灵活性,还可以实现垂直入射O级和-1级1X2分束的功能。 Above are based on a rectangular structure grating, the grating can be tilted not only increase the design flexibility, the function may also be implemented perpendicularly incident O level and the -1 order beam 1X2.

[0004] 倾斜光栅是利用微电子深刻蚀工艺,在基底上加工出的具有倾斜槽形的光栅。 [0004] The grating is inclined deep etching using microelectronic technology, processing on a substrate having an inclined groove of a grating. 高密度倾斜光栅的衍射理论,不能由简单的标量光栅衍射方程来解释,而必须采用矢量形式的麦克斯韦方程并结合边界条件,通过编码的计算机程序精确地计算出结果。 High density inclined diffraction grating theory can not be explained by simple scalar diffraction grating equation, the vector must be used in the form of Maxwell's equations and the boundary conditions in combination, accurately calculated results encoding a computer program. Moharam等人已给出了严格I禹合波理论的算法【在先技术2:MGMoharam et al., J.0pt.Soc.Am.A.12,1077(1995)】,可以解决这类高密度光栅的衍射问题。 Moharam et al. Have given strict I and Yu wave theory algorithms CITATION 2:. MGMoharam et al, J.0pt.Soc.Am.A.12,1077 (1995)], can solve such a high density diffraction gratings. 但据我们所知,目前为止,还没有人针对常用1550纳米波长给出在熔融石英基片上制作的TE偏振IX 2倾斜分束光栅。 To our knowledge, so far, no one is given on the molten quartz substrate made IX TE polarization for a wavelength of 1550 nm, commonly inclined separating grating. `发明内容 `SUMMARY

[0005] 本发明要解决的技术问题是提供一种用于1550纳米波长的TE偏振的垂直入射石英1X2分束倾斜光栅。 Shi Ying normal incidence [0005] The present invention is to solve the technical problem of providing a wavelength of 1550 nm for TE polarization beam splitter 1X2 inclined grating. 当TE偏振光在垂直入射时,该光栅可以使入射光分成2束等强度的透射光,这2束透射光的总效率大于95%,并且均匀性优于4%。 When the TE polarized light at normal incidence, the grating may be divided into the transmitted light intensity of the incident light beam 2 and the like, the overall efficiency of the two beams of light transmittance greater than 95%, and even better than 4%. 因此,该分束光栅具有重要的实用价值。 Thus, the separating grating has important practical value.

[0006] 本发明的技术解决方案如下: [0006] The technical solutions of the present invention are as follows:

[0007] —种用于1550纳米波长的TE偏振的垂直入射石英1X2分束倾斜光栅,其特点在于该分束光栅的光栅周期为2108~2110纳米,倾斜角为20~21度,脊深为2982~2984纳米,脊宽比为1576~1578纳米。 [0007] - species for 1550 nm wavelength of normally incident TE polarized beam inclined Shi Ying 1X2 grating, characterized in that the separating grating grating period 2108 - 2110 nm, an inclination angle of 20 to 21 degrees, deep ridge 2982 ~ 2984 nm, the land width ratio of 1576 ~ 1578 nm.

[0008] 最佳的分束光栅的光栅周期为2109纳米,倾斜角为20.1度,脊深为2983纳米,脊宽比为1577.5纳米。 [0008] The optimal splitting grating period of the grating 2109 nanometers, the inclination angle of 20.1 degrees, the ridge depth of 2983 nm, the land width ratio of 1577.5 nm.

[0009] 本发明的技术效果如下:[0010] 特别是当分束光栅的光栅周期为2109纳米,倾斜角为20.1度,脊深为2983纳米,脊宽比为1577.5纳米,该光栅透射光的总效率大于95%,并且均匀性优于4%。 [0009] Technical effects of the present invention are as follows: [0010] especially when splitting grating is a grating period of 2109 nanometers, the inclination angle of 20.1 degrees, the ridge depth of 2983 nm, the land width ratio of 1577.5 nm, the grating transmitted light Total efficiency greater than 95%, and even better than 4%. 利用电子束直写装置结合微电子深刻蚀工艺,可以大批量、低成本地生产,刻蚀后的光栅性能稳定、可靠,具有重要的实用前景。 Direct writing using an electron beam apparatus in conjunction with microelectronic deep etching processes may be high-volume, low cost production, stable performance of the etched grating, reliable, has important practical prospects. 本发明具有使用灵活方便、均匀性较好、衍射效率较高等优点,是一种非常理想的衍射光学元件。 The present invention has the use of flexible, with good uniformity, high diffraction efficiency etc., it is an ideal diffractive optical element.

附图说明 BRIEF DESCRIPTION

[0011] 图1是本发明1550纳米波长的TE偏振高效率垂直入射石英IX 2分束倾斜光栅的几何结构。 [0011] FIG. 1 is a wavelength of 1550 nm with high efficiency TE polarized perpendicularly incident beam inclination IX 2 Shi Ying grating geometry of the present invention.

[0012] 图中,I代表区域I (折射率为Ii1), 2代表区域2 (折射率为n2),3代表入射光,4、5分别代表TE模式下的_1、0级衍射光。 [0012] FIG, on behalf of the I region I (refractive index of Ii1), the representative region 2 2 (refractive index n2), 3 representative of the incident light, representing _1,0 4,5-order diffracted light in the TE mode. d为光栅周期,h为光栅深度,0in为入射角,(^为倾斜角。 d is the grating period, h is the grating depth, angle of incidence 0in, (^ inclination angle.

[0013] 图2是本发明要求范围内一个实施例的0、_1级总衍射效率随波长变化的曲线。 [0013] FIG. 2 is a requirement of the present invention is in the range of 0 cases embodiment, the total diffraction efficiency level _1 function of wavelength curve. 具体实施方式 detailed description

[0014] 下面结合实施例和附图对本发明作进一步说明,但不应以此限制本发明的保护范围。 [0014] The following examples and in conjunction with the accompanying drawings of the present invention is further illustrated, but should not be used to limit the scope of the present invention.

[0015] 先请参阅图1,图1是本发明TE偏振垂直入射石英1X2分束倾斜光栅的几何结构。 [0015] Please refer to FIG. 1, FIG. 1 of the present invention is a normal incidence the TE polarization splitting Shi Ying 1X2 inclined grating geometry. 图中,区域1、2都是均匀的,分别为空气(折射率Ii1=I)和熔融石英(折射率n2=l.44462 )。 FIG., The region 2 is uniform, respectively, air (refractive index Ii1 = I) and fused Shi Ying (refractive index n2 = l.44462). 3为入射光,4和5为出射光。 3 incident light, 4 and 5 for the outgoing light. d为光栅周期,为倾斜角,h为光栅深度,b为脊宽。 d is the grating period, inclination angle, h is the grating depth, b is the width of the ridges. TE偏振入射光对应于电场矢量的振动方向垂直于入射面,其垂直入射到光栅。 TE polarized incident light corresponding to the electric field vector oscillation direction is perpendicular to the incident surface, which is perpendicularly incident on the grating. 由图可见,本发明用于波长为1550纳米波段的TE偏振石英透射分束斜光栅,该分束光栅的光栅周期为2108~2110纳米,倾斜角为20~21度,脊深为2982~2984纳米,脊宽比为1576~1578纳米。 Seen from the figure, the present invention is used for a wavelength of 1550 nm band transmission of the TE polarization beam obliquely Shi Ying grating, the grating period of the grating beam is 2108 - 2110 nm, an inclination angle of 20 to 21 degrees, the ridge depth of 2982 - 2984 nm, the land width ratio of 1576 ~ 1578 nm.

[0016] 在如图1所示的光栅结构下,本发明采用严格耦合波理论【在先技术2】计算了石英倾斜光栅在1550纳米波段的衍射效率。 [0016] In the grating structure shown in Figure 1, the present invention employs a rigorous coupled wave theory CITATION 2] calculated diffraction efficiency of the 1550 nm wavelength band quartz inclined grating.

[0017] 表1给出了本发明一系列实施例,表中d为光栅周期,为倾斜角,h为光栅深度,b为脊宽,λ为入射波长,Unifromity为2个端口的衍射均匀性,η为衍射效率。 [0017] Table 1 shows a series of examples of the present invention, the table d is the grating period, inclination angle, h is the grating depth, b is the width of the ridges, [lambda] is the incident wavelength, Unifromity uniformity of diffraction 2 port , η is the diffraction efficiency. 在制作本发明用于1550纳米波长的TE偏振的垂直入射石英1X2分束倾斜光栅的过程中,适当选择光栅周期、倾斜角和刻蚀深度就可以在一定的带宽内得到高衍射效率和均匀性较好的透射1X2分束光栅。 In the production process of the present invention for 1550 nm wavelength of normally incident TE polarized beam inclined Shi Ying 1X2 grating, the grating period is appropriately selected, and the inclination angle of the etching depth can be obtained high diffraction efficiency and uniformity in a certain bandwidth 1X2 better transmission grating beam splitter.

[0018] 图2是本发明要求范围内一个实施例的0、_1级总衍射效率随波长变化的曲线。 [0018] FIG. 2 is a requirement of the present invention is in the range of 0 cases embodiment, the total diffraction efficiency level _1 function of wavelength curve.

[0019] 本发明的TE偏振高效率倾斜石英透射分束光栅,利用电子束直写装置结合微电子深刻蚀工艺,可以大批量、低成本地生产,刻蚀后的光栅性能稳定、可靠,具有重要的实用前景,具有使用灵活方便、均匀性较好、衍射效率较高等优点,是一种非常理想的衍射光学元件。 [0019] TE polarization to the present invention high efficiency transmitting Shi Ying beamsplitter tilted grating using electron beam direct writing apparatus incorporated microelectronic deep etching processes may be high-volume, low cost production, stable performance of the etched grating, reliable, having important practical prospect of having to use flexible, with good uniformity, high diffraction efficiency etc., is an ideal diffractive optical element.

[0020] 表1TE偏振光垂直入射时波长为1550nm时光在2个端口的总衍射效率和均匀性。 [0020] Table 1TE perpendicularly incident polarized light having a wavelength of the diffraction efficiency and uniformity of the total time on the two 1550nm port.

[0021] [0021]

Figure CN103698827AD00051

Claims (2)

1.一种用于1550纳米波长的TE偏振的垂直入射石英1X2分束倾斜光栅,其特征在于该分束光栅的光栅周期为2108〜2110纳米,倾斜角为20〜21度,脊深为2982〜2984纳米,脊宽为1576〜1578纳米。 A 1550 nm for TE polarization beam perpendicularly incident Shi Ying 1X2 inclined grating, characterized in that the separating grating period of the grating 2108~2110 nm, tilt angle of 20~21 degrees, deep ridge 2982 ~2984 nm, ridge width 1576~1578 nm.
2.根据权利要求1所述的TE偏振的垂直入射石英IX 2分束倾斜光栅,其特征在于所述的分束光栅的光栅周期为2109纳米,倾斜角为20.1度,脊深为2983纳米,脊宽为1577.5纳米。 The TE polarization perpendicular to the incident beam is inclined Shi Ying grating IX 2, wherein said splitting grating period of the grating 2109 nanometers, the inclination angle of 20.1 degrees, the ridges 2983 nanometers deep claims, ridge width of 1577.5 nm.
CN 201310547673 2013-11-06 2013-11-06 Vertical incidence quartz 1*2 beam-splitting tilted grating for TE (Tangent Elevation) polarization CN103698827A (en)

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1341026A2 (en) * 2002-02-28 2003-09-03 Canon Kabushiki Kaisha Beam splitting element and optical apparatus using it
US6927891B1 (en) * 2002-12-23 2005-08-09 Silicon Light Machines Corporation Tilt-able grating plane for improved crosstalk in 1×N blaze switches
CN103364856A (en) * 2013-07-09 2013-10-23 中国科学院上海光学精密机械研究所 TE (Transverse Electric) polarized vertical-incidence negative-level-one high-efficiency inclined-transmission quartz grating

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1341026A2 (en) * 2002-02-28 2003-09-03 Canon Kabushiki Kaisha Beam splitting element and optical apparatus using it
US6927891B1 (en) * 2002-12-23 2005-08-09 Silicon Light Machines Corporation Tilt-able grating plane for improved crosstalk in 1×N blaze switches
CN103364856A (en) * 2013-07-09 2013-10-23 中国科学院上海光学精密机械研究所 TE (Transverse Electric) polarized vertical-incidence negative-level-one high-efficiency inclined-transmission quartz grating

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