CN110568528A - Double-mode super surface based on SOI material and double-mode display application thereof - Google Patents
Double-mode super surface based on SOI material and double-mode display application thereof Download PDFInfo
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- 239000000463 material Substances 0.000 title claims abstract description 15
- 239000011449 brick Substances 0.000 claims abstract description 95
- 230000010287 polarization Effects 0.000 claims abstract description 33
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 22
- 239000010703 silicon Substances 0.000 claims abstract description 22
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 20
- 238000003384 imaging method Methods 0.000 claims abstract description 20
- 239000000758 substrate Substances 0.000 claims abstract description 17
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 12
- 239000005350 fused silica glass Substances 0.000 claims abstract description 12
- 238000001615 p wave Methods 0.000 claims description 37
- 238000000034 method Methods 0.000 claims description 19
- 238000001093 holography Methods 0.000 claims description 17
- 238000004088 simulation Methods 0.000 claims description 11
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- 238000005457 optimization Methods 0.000 claims description 2
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
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Abstract
the invention discloses a double-mode super surface based on an SOI material, which can realize the functions of a polarizer and a half-wave plate respectively corresponding to different wavelengths by designing the geometric parameters of a nano brick structure of the super surface. The super-surface is composed of a silicon nano brick array, a fused quartz medium layer and a silicon substrate layer, based on the function, the near-field continuous gray level image display of a polarizer and the far-field two-step Fourier holographic imaging of a half-wave plate can be designed by combining the polarizer and the half-wave plate to modulate the intensity and the phase of an optical wave, the two imaging modes are not affected by each other, and the super-surface can be applied to the fields of polarization display, encryption, anti-counterfeiting and the like.
Description
Technical Field
The invention relates to the field of micro-nano optics, in particular to a dual-mode super surface designed based on an SOI material, which simultaneously realizes the functions of a polarizer and a half-wave plate and is used for dual-mode display application.
background
The super-surface is used as a novel optical material, is composed of sub-wavelength structure antennas, and has extraordinary physical properties which are not possessed by some natural materials. By reasonably designing the geometric shape and size parameters of the super-surface unit structure, the functions of amplitude and phase modulation, polarization control, filtering and the like of the optical wave can be realized. At present, optical devices based on super-surfaces are widely researched and limited to the fine geometrical structure of the super-surfaces, and most super-surfaces are only limited to scientific research and are difficult to be put into mass production and application. Therefore, a new design method is urgently needed for the optical device based on the super-surface, the processing technology is greatly simplified, and the basic light regulation and control power is multiplexed to meet the deep application requirements.
Disclosure of Invention
in order to solve the above technical problems, the present invention provides a dual-mode super-surface based on SOI (silicon-on-insulator) material, which can respectively realize two different optical control functions (polarizer and half-wave plate) by using one structure, and realize a dual-mode display function by changing an excitation mode of incident light.
the technical scheme provided by the invention is as follows:
a double-mode super surface based on SOI material is composed of a plurality of unit structures which are periodically arrayed on a plane;
the unit structure comprises a three-layer structure which comprises a substrate, a dielectric layer and a top layer from bottom to top in sequence;
wherein,
the substrate is a square with a square top surface;
the dielectric layer is a square with a square top surface;
The top layer is a nano brick;
The side lengths of the top surfaces of the substrate and the dielectric layer are the same;
by the alignment of the top surface of the dielectric layerthe angle edges are an x axis and a y axis, the vertex is an original point, a xoy rectangular coordinate system is established, and the included angle between the long axis of the nano brick and the x axis is a rotation angle
The period CS of the unit structure is the side length of the top surface of the dielectric layer;
The bimodal super-surface can simultaneously operate as a polarizer and a half-wave plate at different wavelengths.
in particular, the method comprises the following steps of,
When the super surface is used as a polarizer, the super surface is at the working wavelength lambda1when lower s waves and p waves are incident, only the p waves can generate Mie resonance and are totally reflected, the s waves generate multi-beam interference under the action of the dielectric layer, the reflectivity is suppressed to a lower level, and the super surface can be used as a polarizer to modulate light;
When the super surface is used as a half-wave plate, the working wavelength lambda2When the lower s wave and the p wave are incident, the s wave and the p wave can generate Mie resonance with different degrees, one part of the light wave is subjected to Mie resonance direct reflection, one part of the light wave is emitted through the silicon nano brick after undergoing multi-beam interference in the dielectric layer, the amplitude of the reflected light of the s wave and the p wave is the same, the phase difference is pi, and the super surface can be used as a half-wave plate to modulate light.
the incidence surface of the nano brick is a plane with the vector in the long axis direction of the nano brick and the vector in the incidence direction coplanar; the s wave is a linear polarized wave of which the electric field decomposed by incident light in a polarization state is vertical to the incident surface of the nano brick; the p wave is a linearly polarized wave of which the electric field decomposed by incident light in a polarization state is horizontal to the incident surface of the nano brick.
In particular, the method comprises the following steps of,
The structural parameters of length L, width W and period CS of the nano brick are optimized by an electromagnetic simulation method, so that the working wavelength lambda is enabled to be1When the lower s wave and the p wave are incident, only the p wave can generate Mie resonance and most of the Mie resonance is reflected;
The structural parameters of length L, width W and period CS of the nano brick are optimized by an electromagnetic simulation method, so that the working wavelength lambda is2the lower left-hand circular polarized light LCP is incident, the RCP efficiency of the right-hand circular polarized light in the reflected light is the highest, and the LCP efficiency is the highestLow.
Specifically, the substrate and the top layer are made of crystalline silicon materials; the dielectric layer is fused quartz.
Specifically, the thickness of the substrate, the thickness d of the dielectric layer and the thickness H of the nano brick are determined by the type of the SOI material.
In particular, the method comprises the following steps of,
the super-surface has a plurality of working modes:
(1) The optical fiber is independently used as a polarizer and a half-wave plate to work, and near-field gray image display and holographic imaging functions (Fresnel holography, image holography and Fourier holography) are designed;
(2) The optical fiber polarizer and the half-wave plate work simultaneously, light is regulated and controlled, a near-far field multiplexing function (the polarizer is used for displaying a near-field gray image, the half-wave plate is used for carrying out far-field holographic imaging and two-step Fourier holography) is realized, the high efficiency of holographic imaging is ensured, and the energy utilization rate is maximized.
another object of the present invention is to provide a method for realizing a dual-mode display by using the super-surface, comprising the following steps:
(1) an electromagnetic simulation tool is adopted to optimize the structural parameters of the nano brick unit structure, such as length L, width W and period CS, within the range of 540 nm-740 nm, so that Mie resonance with different degrees occurs when s-wave and p-wave are incident, and the nano brick unit structure can respectively serve as a polarizer and a half-wave plate to work under two wavelengths;
(2) when the super surface only works as a polarizer, the intensity information of the gray level image can be converted into the rotation angle arrangement of the nano brick array only according to the Malus law, when linearly polarized light in a polarization state is vertically incident on the super surface, the gray level image display of high resolution and random gray level change of a reflection end near field can be realized, and if an analyzer is not usedthe value range is 0-pi/2, if the analyzer is usedthe value range is 0-pi/2;
When the super-surface is only used as a polarizer, the super-surface has the same effect on circularly polarized lightHas the function of phase modulation, and the phase modulation,the value range is 0-pi, and holographic imaging such as holography, Fresnel holography and Fourier holography is realized when circularly polarized light vertically enters the super-surface by designing the rotation angle arrangement of the nano brick array;
(3) When the super-surface only works as a half-wave plate, the half-wave plate can modulate the polarization state of linearly polarized light, a polarizer and an analyzer can be added to realize the display and encryption of gray level images,The value range is 0-pi/4, and the working effect is as described in (2);
when the super-surface only works as a half-wave plate, the super-surface has accurate and efficient phase modulation effect on circularly polarized light,the value range is 0-pi, various holographic imaging can be realized, and the working effect is as described in (2);
(4) The super-surface works as a polarizer and a half-wave plate at the same time, realizes near-far field multiplexing, ensures the high efficiency of holographic imaging, maximizes the energy utilization rate, and works asWhen the value range is 0-pi (no analyzer is used): the polarizer modulates the intensity of the linearly polarized light, and each intensity value corresponds to twovalue of and twoThe sizes are complementary; the half-wave plate modulates the phase of the circularly polarized light, and if the phase change quantity is quantized into two steps, each step corresponds to one phase change quantityValue range of the polarizerthe value ranges of the two-dimensional display are not affected with each other, so that the near-field gray scale image of the polarizer and the far-field Fourier holographic imaging of the half-wave plate can be respectively realized through one super surface, and under the condition, the dual-mode display function can be simultaneously completed.
In particular, the method comprises the following steps of,
When the super-surface works as a polarizer and a half-wave plate at the same time, the working wavelength of the super-surface is set to be lambda1operating wavelength as a half-wave plate is λ2SaidIn the range of 0-pi;
For an operating wavelength λ1the near field is designed by adopting the following formula (I), so that when s wave and p wave at the wavelength are incident, only p wave energy generates Mie resonance and most of the reflection, polarization separation is generated, light intensity modulation is realized, and for the same intensity,two values, one value is in the range of 0-pi/2, and one value is in the range of pi/2-pi;
aiming at the working wavelength lambda 2, the following formula (II) is adopted to design Fourier holography, so that when s wave and p wave are incident under the wavelength, the s wave and the p wave can generate Mie resonance with different degrees, a part of light wave is subjected to Mie resonance direct reflection, a part of light wave is emitted through a silicon nano brick after multi-beam interference in a dielectric layer, the amplitude of s wave reflected light and the amplitude of p wave reflected light are the same, the phase difference is pi, the super surface works as a half-wave plate, and incident light is incident with circularly polarized light, and the emergent light carries with the circularly polarized lightan amount of phase modulation ofchirality is changed, and each nano-brick is designed according to formula (I) under the premise that a near field is designedTwo options are available, namely a 0-pi/2 interval or a pi/2-pi interval, the phase modulation amount brought to the circularly polarized light at the lambda 2 is 0-pi or pi-2 pi respectively, so that the super surface can generate two-step Fourier holography through phase optimization to form an image at a far field
The principle of the imaging of the SOI super-surface based multiple working modes provided by the invention is as follows:
The polarizer can be designed for near-field image display, the working mode is reflection, and the working wavelength is lambda1The incident light is linearly polarized light polarized along the x-axis (x-axis polarized light), and if no analyzer is used, the light intensity modulation effect of the nano-brick unit structure on the reflected light can be expressed as:
Wherein,Is the rotation angle of the metal nano-brick.
when the linearly polarized light polarized along the x-axis is normally incident, the reflected light is polarized along the long axis of the nano brick and the intensity is modulated to become the light intensity of the incident lightAnd (4) doubling.
If the x-axis polarized light is incident and an analyzer with the long axis along the y-axis direction is added, the light intensity modulation effect of the nano-brick unit structure on the reflected light can be expressed as follows:
The reflected light being polarised in the direction of the y-axis and intensity modulated to the intensity of the incident light
the polarizer also has phase modulation effect on circularly polarized light, and can be expressed as
thus, λ may be the operating wavelength1The laser (circular polarization) of (1) uses the nano-brick structure to design Fourier holography, and at the moment, the nano-brick structure is used as a polarizer, and the polarization conversion efficiency is only 25%.
When the operating wavelength is lambda2in the process, the nano brick structure can be used as a half-wave plate, and the functions of near-field image display and holographic imaging can be realized.
the near field image display designed for half-wave plate has reflection mode and λ as working wavelength2the incident light is linearly polarized light, and the half-wave plate only changes the polarization direction of the linearly polarized light and does not change the light intensity, so that an analyzer is required, and the polarization direction of the incident light and the included angle between the long axis direction of the analyzer and the x axis are respectively set as alpha1、α2the reflected light intensity can be expressed as:
Far-field Fourier holography can be designed for a half-wave plate, and since the reflectivity of s-wave and p-wave is equal and the phase difference of pi is provided, the modulation effect of the nano-brick unit structure on circular polarization can be expressed as follows:
the reflected light carries a phase change in the opposite polarization (polarization opposite to the incident light)can be used for designing phase type holography, such as holography, Fresnel holography, Fourier holography and the like, and has high diffraction efficiency.
Based on the imaging principle, the super surface can be adopted to respectively realize near-field image display and holographic imaging under different modes: (1) polarizer near-field image display (2), polarizer holographic imaging (3), half-wave plate near-field image display (4) half-wave plate holographic imaging. Meanwhile, a unique super-surface array structure can be designed to simultaneously realize image display functions of different wavelengths and different modes, which is called as a dual-mode display function. When a super-surface array is used for realizing the dual-mode display function, the design idea is as follows: for an operating wavelength λ1designing a near field by adopting a formula (1), and aiming at the working wavelength lambda according to a formula (5)2designing a Fourier hologram; rotation angle of nano brickThe rotation angle of the nano brick changes between 0 and pi, and for each specific light intensity value, the rotation angle of the nano brick has two value ranges (0-pi/2 or pi/2-pi), so that the two-step hologram can be designed by utilizing the phase control quantity in combination with a simulated annealing algorithm.
The invention has the beneficial effects that:
(1) According to the invention, the Mie resonance characteristics of the long and short axes of the silicon nano-brick can be regulated and controlled only by changing the geometric structural parameters of the silicon nano-brick, and two light modulation effects (a polarizer and a half-wave plate) at different wavelengths are realized by combining the multi-beam interference effect of the dielectric layer, so that the design is flexible and the innovation is achieved;
(2) The structure of the invention relies on SOI material, can be fully compatible with semiconductor processing technology, process simply;
(3) Based on the super-surface structure provided by the invention, an image display scheme can be flexibly designed, a near-field image and a far-field hologram can be respectively designed for a polarizer and a half-wave plate independently, the functions of the polarizer and the half-wave plate at two wavelengths can be combined, the near-field image and the far-field hologram of the polarizer are designed, the working efficiency of a device is optimal, dual-mode display is realized, and the information multiplexing function is realized;
(4) the application of the dual-mode display is based on two choices of the rotation angle of the nano brick, so that the dual-mode display can be independently designed according to different patterns of a near-far field, and the two working modes cannot influence each other;
(5) the nano brick provided by the invention has a sub-wavelength scale, has an ultramicro structure, can be widely applied to the field of photonic integration, and is suitable for future miniaturization.
Drawings
FIG. 1 is a schematic three-dimensional structure of a nano-brick unit in an embodiment;
FIG. 2 is the polarization conversion efficiency distribution of the nano-brick unit structure in the embodiment when the incident light is circularly polarized;
FIG. 3 is a diagram of analyzing the phase change of reverse-chiral polarized light when incident in circular polarization at different rotation angles for 627nm in the nano-brick unit structure in the embodiment;
FIG. 4 is the reflectance distribution of s-wave and p-wave when the incident light is deflected in x-axis in the unit structure of nano-brick in the embodiment;
FIG. 5 is a light intensity modulation distribution diagram of the nano-brick unit structure in the embodiment for reflected light when the nano-brick unit structure is incident with x-axis polarization under different rotation angles of 610 nm;
FIG. 6 is a simulation diagram illustrating the effect of observing an image in the near field of a super surface when x-axis polarized (610nm) is incident, as designed for a dual-mode display application in the example;
FIG. 7 is a schematic diagram illustrating the simulation of the effect of generating a phase-type holographic image in the far field of the super surface when circularly polarized (627nm) light is incident, which is designed for the dual-mode display application in the embodiment;
In the figure, 1-silicon substrate; 2-a fused quartz medium layer; 3-silicon nano brick; l is the long axis size of the nano brick; w is the minor axis size of the nano brick; h is the height of the nano brick; CS is the size of the cycle of the nano brick;Is the rotation angle of the nano-brick; d is the thickness of the fused silica dielectric layer.
Detailed Description
In order to more clearly illustrate the embodiments of the present invention and/or the technical solutions in the prior art, the following description will explain specific embodiments of the present invention with reference to the accompanying drawings. It is obvious that the drawings described below are only examples of the invention, and that for a person skilled in the art, other drawings and embodiments can be obtained from them without inventive effort. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention.
examples
The nano brick unit structure shown in fig. 1 comprises three layers, namely a silicon substrate 1, a fused quartz medium layer 2 and a nano brick 3 constructed by crystalline silicon from bottom to top. The nano brick array is formed by periodically arranging nano brick unit structures, the nano bricks are cuboid, and the length, the width and the height of the nano bricks are sub-wavelength sizes.
the nano-brick array structure based on the SOI material can be manufactured by adopting a photoetching process which is conventional in the field, and a specific preparation process is provided as follows, and comprises the following steps:
(1) Coating photoresist on the surface of the SOI;
(2) Exposing the photoresist by adopting an electron beam direct writing or a photoetching machine;
(3) And developing and etching are sequentially carried out, so that the dielectric nano brick array is obtained on the SOI substrates (1 and 2).
for ease of understanding, the working principle of the nanoblock structure as a polarizer and a half-wave plate will be explained below.
The silicon nanoblock can generate strong electric field scattering and magnetic field scattering, namely Mie resonance (Mie magnetic resonance), and the Mie resonance scattering property of the silicon nanoblock is determined by the size and the structural parameters of the silicon nanoblock. The fused quartz medium layer is arranged between the top silicon nano brick and the bottom silicon substrate to form a cavity structure with high refractive index, low refractive index and high refractive index, when light beams pass through the silicon nano bricks, multiple reflection and transmission can occur on the upper surface and the lower surface of the fused quartz medium layer to form new energy distribution, and the physical process can be explained by using a multi-beam interference effect. By controlling the Mie resonance scattering property of the silicon nano-brick, the silicon nano-brick is combined with multi-beam interference generated in the fused quartz medium layer, and the amplitude and the phase of corresponding linear polarization light (p wave and s wave) can be respectively regulated and controlled along the long axis direction and the short axis direction of the nano-brick, so that the silicon nano-brick has different modulation effects on light waves. Since the SOI bottom layer silicon substrate is thick and has losses in the visible band, the designed super-surface can only operate in the reflective mode.
One, polarizer (lambda)1)
wavelength of λ1In the process, the polarized linear polarization (p wave) along the long axis of the nano brick directly generates back scattering due to the generation of strong Mie resonance, and the reflection rate is very high; mie resonance does not occur in polarized linear polarization (s-wave) along the short axis of the nano-brick, and reflection is suppressed by the multi-beam interference effect occurring in the fused silica dielectric layer, so that the reflectance is low. In this case, the reflected light of the nano-brick includes most of p-waves and a small part of s-waves (which are negligible), and it can be considered that the polarization splitting function is realized.
two, half wave plate (lambda)2)
Wavelength of λ2During the process, Mie resonance (different lengths and widths of nano bricks) of s waves and p waves in different degrees occurs, part of light is directly subjected to backward scattering, part of light enters a fused quartz medium layer to generate multi-beam interference, and the two parts of light are finally output in a reflected light mode and are expressed as modulation of light amplitude and phase; under the action of Mie resonance and multi-beam interference, the reflectivities of s-wave and p-wave are equal, but due to the difference of the long axis and the short axis of the nano-brick and the difference of the physical processes of the intermediate action, the reflected light of the s-wave and the p-wave has phase delay of pi, and at the moment, the nano-brick can be used as a half-wave plate and has higher polarization conversion efficiency.
Specific implementations of the SOI material-based polarizer and half-wave plate and its dual-mode display application will be provided below.
In this embodiment, a nano-brick model is constructed by using SOI material, the nano-brick and the substrate are crystalline silicon, the response band is set within the visible light range, the thicknesses of SOI top silicon (nano-brick) and a fused quartz medium layer are correspondingly selected to be 220nm and 2000nm, respectively, and the nano-brick unit structure model is shown in fig. 1.
The first step, the existing CST STUDIO SUITE electromagnetic simulation tool is adopted, the geometric parameters of the nano brick unit structure are optimized within the range of 540 nm-740 nm, Mie resonance with different degrees occurs when s-wave and p-wave are incident, and the nano brick unit structure respectively serves as a polarizer and a half-wave plate to work under different wavelengths. In this embodiment, the optimized geometric parameters of the nano brick unit structure are as follows: the length L of the nano brick is 200nm, the width W of the nano brick is 100nm, and the period C of the nano brick is 300 nm.
Secondly, simulating the circular polarization conversion rate of the determined nano brick unit structure in the range of 540nm to 740nm and the phase modulation effect of the nano brick unit structure on circular polarization under different rotation angles by adopting a CST (computer controlled telecommunications) STUDIO SUITE electromagnetic simulation tool, wherein the same-direction polarized light and the opposite-direction polarized light respectively represent circular polarization components with the same chirality and the opposite direction of incident light as shown in figures 2 and 3; simulating the linear polarization reflectivity of the nano-brick unit structure in the range of 540nm to 740nm and the light intensity modulation effect of the nano-brick unit structure on the x-axis polarization under different rotation angles, as shown in fig. 4 and 5, wherein R iss、RlRespectively showing the reflectivity of the linearly polarized light along the minor axis and major axis of the nano brick in the vibration direction of the electric field.
as can be seen from FIG. 2, when the wavelength is 627nm, the polarization conversion efficiency of the circularly polarized light reaches 66.6%, the reflectance of the same-direction polarized light is only 0.1%, and when the rotation angle of the nano-brick structure is largerwhen the angle is changed within the range of 0-90 DEG, the simulated value and the theoretical value of the phase change amount carried by the reverse polarized light are shown in FIG. 3, and the theoretical calculation result is(given by equation 5), it can be seen from fig. 2 that the phase modulation effect of the nanoblock structure on the reverse circularly polarized light conforms to the geometric phase modulation theory of the super-surface. As can be seen from FIG. 3, when the operating wavelength is 610nm, s-wave and p-wave are separated in polarization, the nano-brick can be used as a polarizer, and FIG. 4 analyzes the light intensity modulation effect of the nano-brick on the x-axis polarized light under different rotation angles. From a combination of fig. 2, 3, 4, 5, it can be concluded that the nano-brick structure is directed toThe wavelengths of 610nm and 627nm have the functions of a polarizer and a half-wave plate respectively.
thirdly, when the nano brick is used as a polarizer to modulate the intensity of the polarized light of the x axis,AndThe light intensity modulation effect of the nano-brick is the same in the two cases, but for the half-wave plate, the two angles will generate different phase modulation amounts, according to the characteristic, the near-field gray image display (610nm, x-axis polarization) of the polarizer and the far-field Fourier holographic imaging (627nm, circular polarization) of the half-wave plate can be simultaneously realized, and the imaging simulation results are respectively shown in fig. 6 and fig. 7. The two displays are not influenced mutually, and the generated near-field image and far-field image have no correlation, so that the other holographic image cannot be deduced from one image, and the super surface can be applied to the fields of polarization display, encryption, anti-counterfeiting and the like.
The above description is only for the preferred embodiment of the present invention, but the scope of the present invention is not limited thereto, and any modification, equivalent replacement, and improvement made by those skilled in the art within the technical scope of the present invention should be included in the scope of the present invention.
Claims (8)
1. A double-mode super surface based on an SOI material is characterized in that:
the unit structures are periodically arrayed on a plane to form the structure;
the unit structure comprises a three-layer structure which comprises a substrate, a dielectric layer and a top layer from bottom to top in sequence;
wherein,
The substrate is a square with a square top surface;
The dielectric layer is a square with a square top surface;
the top layer is a nano brick;
The side lengths of the top surfaces of the substrate and the dielectric layer are the same;
to let throughThe right-angle sides of the top surface of the stratum layer are an x axis and a y axis, the vertex is an original point, an xoy direct coordinate system is established, and the included angle between the long axis of the nano brick and the x axis is a rotation angle
The period CS of the unit structure is the side length of the top surface of the dielectric layer;
The super-surface can simultaneously operate as a polarizer and a half-wave plate at different wavelengths.
2. a super-surface according to claim 1, wherein:
when it is used as polarizer, it is at working wavelength lambda1When lower s waves and p waves are incident, only the p waves can generate Mie resonance and are totally reflected, the s waves generate multi-beam interference under the action of the dielectric layer, the reflectivity is suppressed to a lower level, and the super surface can be used as a polarizer to modulate light;
When it works as a half-wave plate, the working wavelength lambda2when the lower s wave and the p wave are incident, the s wave and the p wave can generate Mie resonance with different degrees, one part of the light wave is subjected to Mie resonance direct reflection, one part of the light wave is emitted through the silicon nano brick after undergoing multi-beam interference in the dielectric layer, the amplitude of the reflected light of the s wave and the p wave is the same, the phase difference is pi, and the super surface can be used as a half-wave plate to modulate light.
3. A super-surface according to claim 2, wherein:
The structural parameters of length L, width W and period CS of the nano brick are optimized by an electromagnetic simulation method, so that the working wavelength lambda is enabled to be1When the lower s wave and the p wave are incident, only the p wave can generate Mie resonance and most of the Mie resonance is reflected;
The structural parameters of length L, width W and period CS of the nano brick are optimized by an electromagnetic simulation method, so that the working wavelength lambda is2The lower left-hand circular polarized light LCP is incident, and the RCP efficiency of the right-hand circular polarized light in the reflected light is the highest and the LCP efficiency is the lowest.
4. a super-surface according to claim 1, wherein: the substrate and the top layer are made of crystalline silicon materials; the dielectric layer is fused quartz.
5. A super-surface according to claim 1, wherein: the thickness of the substrate, the thickness d of the dielectric layer and the thickness H of the nano brick are determined by the type of the SOI material.
6. a super-surface according to claim 1,
The super-surface has a plurality of working modes:
(1) the optical fiber is independently used as a polarizer and a half-wave plate to work, and near-field gray image display and holographic imaging functions are designed;
(2) The optical fiber is used as a polarizer and a half-wave plate to work simultaneously, and light is regulated and controlled, so that the near-far field multiplexing function is realized.
7. The method for realizing a dual-mode display by using a super surface as claimed in claim 1, comprising the steps of:
(1) An electromagnetic simulation tool is adopted to optimize the structural parameters of the nano brick unit structure, such as length L, width W and period CS, within the range of 540 nm-740 nm, so that Mie resonance with different degrees occurs when s-wave and p-wave are incident, and the nano brick unit structure can respectively serve as a polarizer and a half-wave plate to work under two wavelengths;
(2) the super-surface simultaneously works as a polarizer and a half-wave plate to realize near-far field multiplexing, and respectively serves as a polarizer to display gray level images in a near field and serves as a half-wave plate to realize Fourier holographic imaging in a far field, so that the high efficiency of holographic imaging is ensured, and the energy utilization rate is maximized.
8. The method of claim 7, wherein:
When the super-surface works as a polarizer and a half-wave plate at the same time, the working wavelength of the super-surface is set to be lambda1Operating wavelength as a half-wave plate is λ2Saidin the range of 0-pi;
For an operating wavelength λ1The near field is designed by adopting the following formula (I), so that when s wave and p wave at the wavelength are incident, only p wave energy generates Mie resonance and most of the reflection, polarization separation is generated, light intensity modulation is realized, and for the same intensity,Two values, one value is in the range of 0-pi/2, and one value is in the range of pi/2-pi;
aiming at the working wavelength lambda 2, the following formula (II) is adopted to design Fourier holography, so that when s wave and p wave are incident under the wavelength, the s wave and the p wave can generate Mie resonance with different degrees, a part of light wave is subjected to Mie resonance direct reflection, a part of light wave is emitted through a silicon nano brick after multi-beam interference in a dielectric layer, the amplitude of s wave reflected light and the amplitude of p wave reflected light are the same, the phase difference is pi, the super surface works as a half-wave plate, and incident light is incident with circularly polarized light, and the emergent light carries with the circularly polarized lightthe amount of phase modulation and the chirality of each nanobead are changed on the premise that the near field is designed according to the formula (I)Two options are available, namely a 0-pi/2 interval or a pi/2-pi interval, the phase modulation amount brought to the circularly polarized light at the lambda 2 is 0-pi or pi-2 pi respectively, so that the super surface can generate two-step Fourier holography through phase optimization to form an image at a far field
。
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Application publication date: 20191213 |