CN101614836A - Quartz transmission polarization beam splitting grating - Google Patents
Quartz transmission polarization beam splitting grating Download PDFInfo
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- CN101614836A CN101614836A CN200910054510A CN200910054510A CN101614836A CN 101614836 A CN101614836 A CN 101614836A CN 200910054510 A CN200910054510 A CN 200910054510A CN 200910054510 A CN200910054510 A CN 200910054510A CN 101614836 A CN101614836 A CN 101614836A
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 18
- 239000010453 quartz Substances 0.000 title claims abstract description 17
- 230000010287 polarization Effects 0.000 title abstract description 44
- 230000005540 biological transmission Effects 0.000 title abstract description 14
- 238000005530 etching Methods 0.000 claims abstract description 20
- 230000008033 biological extinction Effects 0.000 abstract description 24
- 230000003287 optical effect Effects 0.000 abstract description 8
- 238000005516 engineering process Methods 0.000 abstract description 6
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- UIZLQMLDSWKZGC-UHFFFAOYSA-N cadmium helium Chemical compound [He].[Cd] UIZLQMLDSWKZGC-UHFFFAOYSA-N 0.000 description 1
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Abstract
A quartz transmission polarization beam splitting grating for 1310 nano wave band is characterized in that a groove of the grating is a sine groove type, the period of the grating is 737-780 nanometers, and the etching depth is 1.942-2.204 micrometers. The extinction ratio of the polarization beam splitting grating reaches 8.085 multiplied by 103The 0-order transmission diffraction efficiency of TM polarized light is 97.76%, and the-1-order transmission diffraction efficiency of TE polarized light is 97.49%; the quartz transmission grating is processed by combining an optical holographic recording technology or an electron beam direct writing device with a microelectronic deep etching process, and can be produced in large batch at low cost.
Description
Technical field
The present invention relates to the High Extinction Ratio high-diffraction efficiency polarization beam-splitting grating device of infrared communication 1310 nano wave lengths, particularly a kind of quartz transmission-polarizing beam-splitting grating.
Background technology
Along with the fast development of infotech, the optical communication with advantages such as capacity is big, loss is low, long transmission distance has obtained application more and more widely.In optical communication and many optical information processing systems, polarization beam apparatus is a kind of key element, and it can be divided into light the orthogonal polarized light of two bundle polarization modes.During great majority are used, but people often need the operating wavelength range of High Extinction Ratio, high-diffraction efficiency, broad and angle bandwidth, polarization beam apparatus that volume is little.Traditional polarization beam apparatus is based on the natural birefringence effect (for example Thomson prism, Nicol prism and Wollaston prism) of some crystal or the polarization selectivity of multilayer dielectric film.But, utilize the made polarization beam apparatus volume of birefringece crystal big, cost an arm and a leg; And film polarization beam apparatus general work bandwidth is less, and the film number of plies reaches tens layers, and is tighter to homogeneity and symmetry requirement, and processing is difficult, and the cost of High Extinction Ratio element is very high.Along with the fast development of micro-fabrication technology, the photonic crystal that emerges in recent years also can be used as polarization beam apparatus, but exists unfavorable factors such as making difficulty equally.The peculiar optical effect that the while sub-wave length grating shows gets more and more people's extensive concerning.Recently, some research work have reported that surface relief type grating is as polarization beam apparatus.Compare with other polarization beam apparatus, surface relief type polarization beam-splitting grating compact conformation is easy to miniaturization and integrated, and the insertion loss is little, is a kind of passive device.In the surface relief type polarization beam-splitting grating that these have been reported, rectangle grooved polarization beam-splitting grating is arranged, triangle grooved polarization beam-splitting grating etc.The extinction ratio of rectangle grooved polarization beam-splitting grating and diffraction efficiency are not very high, but are easy to make processing.Triangle grooved polarization beam-splitting grating has high extinction ratio and diffraction efficiency, but is difficult to actual fabrication.
Summary of the invention
The technical problem to be solved in the present invention is to provide a kind of quartz transmission-polarizing beam-splitting grating at the infrared light of using 1310 nano wave lengths always, this grating can be divided into different directions with two kinds of orthogonal light of polarization mode of TM, TE, realizes that 0 grade and 1 order diffraction light extinction ratio are greater than 100.In optical communication 0 wave band (1260～1360 nanometer), realize 0 grade and the higher extinction ratio of-1 order diffraction light, 0 grade of transmission diffraction efficient of TM polarized light and-1 grade of transmission diffraction efficient of TE polarized light are higher than 95.98% and 96.59% respectively.Therefore can realize the deeply etched sinusoidal and channeled quartz transmission-polarizing beam-splitting grating of High Extinction Ratio, high-diffraction efficiency, have important Practical significance.
Technical solution of the present invention is as follows:
A kind of quartz transmission-polarizing beam-splitting grating that is used for 1310 nano wavebands, its characteristics are that the groove of this grating is sinusoidal and channeled, and the cycle of grating is that 737～780 nanometers, etching depth are 1.942～2.204 microns.
The cycle of the sinusoidal deep etching quartz grating of described high density is 758 nanometers, and etching depth is 2.074 microns.
Foundation of the present invention is as follows:
Fig. 1 has shown the geometry of the sinusoidal deep etching quartz grating of high density.Zone 1,2 all is uniformly, is respectively air (refractive index n
1=1) and quartzy (refractive index n
2=1.44692).The TM polarized incident light corresponding to the direction of vibration of magnetic vector perpendicular to the plane of incidence, the TE polarized incident light corresponding to the direction of vibration of electric field intensity perpendicular to the plane of incidence.The light wave of linear polarization is θ at a certain angle
i=sin
-1(λ/(2* Λ * n
2)) incident (be defined as the Littrow condition, promptly-1 grade reflected light returns along former incident direction of light), λ represents incident wavelength, and Λ represents the grating cycle.The extinction ratio of this polarization beam-splitting grating is defined as less value in the ratio of TE, TM polarization mode diffraction efficiency in the ratio of TM in the 0 order diffraction light, TE polarization mode diffraction efficiency and-1 order diffraction light.
Under optical grating construction as shown in Figure 1, the present invention adopts rigorous coupled wave theory [formerly technology 1] to calculate extinction ratio and the diffraction efficiency of high-density deeply etched fused quartz sinusoidal grating at infrared 1310 nano wavebands.Shown in Fig. 2,3, obtain the numerical optimization result of High Extinction Ratio, high-diffraction efficiency sinusoidal grating according to Theoretical Calculation, promptly when the cycle of grating be 737～780 nanometers, when etching depth is 1.942～2.204 microns, the extinction ratio of polarization beam-splitting grating is greater than 100.Particularly the grating cycle is 758 nanometers, when etching depth is 2.074 microns, can make the extinction ratio of polarization beam-splitting grating reach 8.085 * 10
3, 0 grade of transmission diffraction efficient of TM polarized light is 97.76%, TE polarized light-1 grade transmission diffraction efficient is 97.49%.
Shown in Fig. 4,5, the cycle of grating is 758 nanometers, the degree of depth is 2.074 microns, when if the incident light of considering near two kinds of polarization modes 1310 nanometers incides grating with the Littrow angle of correspondence separately, the extinction ratio of this polarization beam-splitting grating all wavelengths in 1275～1348 nanometer wavelength range all can reach more than 100, promptly corresponding to the spectrum width scope of 73 nanometers, 0 order diffraction efficient of TM polarized light and-1 order diffraction efficient of TE polarized light are higher than 96.72% and 96.87% respectively.
Shown in Fig. 6,7, the incident light of TM/TE polarization mode is when inciding grating near 59.78 ° of angles (corresponding to λ=1310 nanometers time Littrow angle), the cycle of grating is 758 nanometers, the degree of depth is 2.074 microns, the extinction ratio of this polarization beam-splitting grating all incident angles in 57.45 °～61.78 ° angular ranges all can reach more than 100, promptly corresponding to 4.33 ° angle bandwidth, 0 order diffraction efficient of TM polarized light and-1 order diffraction efficient of TE polarized light are higher than 97.53% and 96.06% respectively.
Description of drawings
Fig. 1 is the geometry synoptic diagram of the quartz transmission-polarizing beam-splitting grating of the present invention's 1310 nano wave lengths.Among the figure, 1 represents zone 1, and (refractive index is n
1), 2 represent zone 2, and (refractive index is n
2), 3 represent grating, and 4 represent incident light, and 5 represent 0 order diffraction light under the TM pattern, and 6 represent-1 order diffraction light under the TE pattern.
Fig. 2 is the extinction ratio of polarization beam-splitting grating of the present invention (quartzy refractive index gets 1.44692) under different grating cycle and etching depth.
Fig. 3 is that polarization beam-splitting grating of the present invention (quartzy refractive index gets 1.44692) is being optimized grating under the cycle (Λ=758 nanometers), and extinction ratio is along with the change curve of etching depth.
Fig. 4 is that polarization beam-splitting grating of the present invention (quartzy refractive index gets 1.44692) the grating cycle is 2.074 microns of 758 nanometers, the grating degree of depth, near 1310 nano wavebands, use, when each wavelength incided grating with corresponding Littrow angle, extinction ratio was with the change curve of incident wavelength.
Fig. 5 is that polarization beam-splitting grating of the present invention (quartzy refractive index gets 1.44692) the grating cycle is 2.074 microns of 758 nanometers, the grating degree of depth, near 1310 nano wavebands, use, when each wavelength incides grating with corresponding Littrow angle, the diffraction efficiency under the TM/TE pattern.
Fig. 6 is that polarization beam-splitting grating of the present invention (quartzy refractive index gets 1.44692) the grating cycle is 2.074 microns of 758 nanometers, the grating degree of depth, incident light is when inciding grating near 59.78 ° of angles (corresponding to λ=1310 nanometers time Littrow angle), and extinction ratio is with the change curve of incident angle.
Fig. 7 is that polarization beam-splitting grating of the present invention (quartzy refractive index gets 1.44692) the grating cycle is 2.074 microns of 758 nanometers, the grating degree of depth, incident light when inciding grating near 59.78 ° of angles (corresponding to λ=1310 nanometers time Littrow angle), the diffraction efficiency under the TM/TE pattern.
Fig. 8 is the holographic grating recording beam path.7 represent helium cadmium laser among the figure, and 8 represent shutter, and 9 represent beam splitter, and 10,11,12,13 represent catoptron, and 14,15 represent beam expanding lens, and 16,17 represent lens, and 18 represent substrate.
Embodiment
Utilize the micro-optic technology to make the sinusoidal polarization beam-splitting grating of high density, at first on the quartz substrate of dry, cleaning, evenly be coated with the last layer positive photoetching rubber (Shipley, S1805, USA).Adopt the holographic recording mode to write down the grating (see figure 8) then, adopt He-Cd laser instrument 7 (wavelength is 441.6 nanometers) as recording light source.During the recording holographic grating, shutter 8 is opened, and the arrow beam of light that sends from laser instrument is divided into two arrow beam of lights through beam splitter 9.A branch of by behind the catoptron 10, form wide plane wave through beam expanding lens 14, lens 16; Another bundle forms wide plane wave by behind the catoptron 11 through beam expanding lens 15, lens 17.After two bundle plane waves pass through catoptron 12,13 respectively, on substrate 18, form interference field with 2 θ angles.Grating space periodic (being the spacing of adjacent stripes) can be expressed as Λ=λ/(2*sin θ), and wherein λ is the recording light wavelength.Angle θ is big more for record, and then Λ is more little, so by changing the size of θ, can control the cycle (periodic quantity can be designed by above-mentioned extinction ratio and efficiency diagram) of grating, the record high dencity grating.Then, after the development, form sinusoidal and channeled photoresist grating at substrate surface.At last, sample is put into the plasma etching (or using reactive ion beam etching (RIBE)) that inductively coupled plasma etching machine carries out certain hour, raster graphic is transferred on the quartz, with acetone, alcohol the remaining photoresist of substrate surface is removed again, just obtained the quartzy grating of high-density deeply etched surface relief structure.In the process of making, need the thickness of strict control photoresist, time shutter, and etch rate and etching time, make the sinusoidal shape that under the situation of the big grating degree of depth, can keep the grating flute profile.
In the process of making grating, suitably select grating etching depth and cycle, just can get the sinusoidal and channeled quartz polarization beam splitting optical grating of High Extinction Ratio, high-diffraction efficiency.In conjunction with Fig. 3 as can be known, the cycle of this grating is 758 nanometers, when etching depth is 1.942～2.204 microns, the extinction ratio of polarization beam-splitting grating is greater than 100,0 grade of transmission diffraction efficient of TM polarized light and-1 grade of transmission diffraction efficient of TE polarized light are higher than 97.74% and 96.54% respectively, have realized two kinds of orthogonal light of polarization mode are divided into different directions.Particularly the grating cycle is 758 nanometers, and when etching depth was 2.074 microns, the present invention can make the extinction ratio of polarization beam-splitting grating reach 8.085 * 10
3, 0 grade of transmission diffraction efficient of TM polarized light is 97.76%, TE polarized light-1 grade transmission diffraction efficient is 97.49%.
Quartz transmission-polarizing beam-splitting grating of the present invention is as polarization beam apparatus, needn't metal-coated membrane or deielectric-coating, have very high extinction ratio and diffraction efficiency, utilize holographic grating recording technique or direct electronic beam write device in conjunction with the deep etching technique of microelectronics, can be in enormous quantities, produce at low cost, grating stable performance after the etching, reliable is a kind of important realization technology of polarization beam apparatus.
Claims (2)
1, a kind of quartz transmission-polarizing beam-splitting grating that is used for 1310 nano wavebands, the groove that it is characterized in that this grating is sinusoidal and channeled, the cycle of grating is that 737～780 nanometers, etching depth are 1.942～2.204 microns.
2, quartz transmission-polarizing beam-splitting grating according to claim 1, the cycle that it is characterized in that described grating is 758 nanometers, etching depth is 2.074 microns.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN200910054510A CN101614836A (en) | 2009-07-08 | 2009-07-08 | Quartz transmission polarization beam splitting grating |
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|---|---|---|---|
| CN200910054510A CN101614836A (en) | 2009-07-08 | 2009-07-08 | Quartz transmission polarization beam splitting grating |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102879844A (en) * | 2012-08-15 | 2013-01-16 | 郑州恒昊玻璃技术有限公司 | Glass concave grating and preparation method thereof |
| CN103543484A (en) * | 2013-09-29 | 2014-01-29 | 中国科学院上海光学精密机械研究所 | Efficient quartz double-layered offsetting grating |
| CN106338905A (en) * | 2016-10-31 | 2017-01-18 | 京东方科技集团股份有限公司 | Display apparatus and display method |
| JP2019113625A (en) * | 2017-12-21 | 2019-07-11 | 日本電信電話株式会社 | Optical element |
-
2009
- 2009-07-08 CN CN200910054510A patent/CN101614836A/en active Pending
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102879844A (en) * | 2012-08-15 | 2013-01-16 | 郑州恒昊玻璃技术有限公司 | Glass concave grating and preparation method thereof |
| CN103543484A (en) * | 2013-09-29 | 2014-01-29 | 中国科学院上海光学精密机械研究所 | Efficient quartz double-layered offsetting grating |
| CN106338905A (en) * | 2016-10-31 | 2017-01-18 | 京东方科技集团股份有限公司 | Display apparatus and display method |
| CN106338905B (en) * | 2016-10-31 | 2017-11-14 | 京东方科技集团股份有限公司 | A kind of display device and its display methods |
| WO2018076914A1 (en) * | 2016-10-31 | 2018-05-03 | 京东方科技集团股份有限公司 | Display apparatus and display method therefor |
| US10642222B2 (en) | 2016-10-31 | 2020-05-05 | Boe Technology Group Co., Ltd. | Display apparatus and display method |
| JP2019113625A (en) * | 2017-12-21 | 2019-07-11 | 日本電信電話株式会社 | Optical element |
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Open date: 20091230 |