CN102156315A - 1*5 beam splitting grating for double-ridge fused quartz of TE (tangent elevation) polarization - Google Patents
1*5 beam splitting grating for double-ridge fused quartz of TE (tangent elevation) polarization Download PDFInfo
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Abstract
The invention relates to a 1*5 beam splitting grating for double-ridge fused quartz of TE (tangent elevation) polarization, which is used for an 800-nanometer wavelength, wherein the grating period of the beam splitting grating is 1830-1850 nanometers; the widths of two ridges in each grating period are respectively 143-146 nanometers and 500-508 nanometers; a distance between the two ridges is 594-597 nanometers; the depth of ridges is 872-875 nanometers; when TE polarized light vertically enters, the transmission light is divided into 5 beams of lights, which have constant strength; and the diffraction efficiency of the beams of lights is more than 96% and the uniformity is above 5%. The 1*5 beam splitting grating for double-ridge fused quartz of TE polarization provided by the invention is formed by processing an electron beam direct writing device with a micro-electronic deep etching process. The materials are conveniently taken, the manufacturing cost is low, and the beam splitting grating can be produced in bath and has important practical prospect.
Description
Technical field
This patent relates to the transmission beam-splitting optical grating, particularly a kind of two ridge fused quartz 1 * 5 beam-splitting optical gratings that are used for the TE polarization of 800 nano wave lengths.
Background technology
Beam splitter is the primary element in the optical system, and important use is arranged in optical system.In optical communication, optical information processing, photometry calculation, holography or the like system, irreplaceable effect is arranged.Traditional multi-layer film structure beam splitter, and since complex process, the cost costliness, and also laser-damaged threshold value is not high.The photonic crystal that rises this year exists the cost height too as beam splitter, makes shortcomings such as difficulty.Fused quartz is a kind of desirable grating material, and it has high optical quality: stable performance, high damage threshold and from deep ultraviolet to far wide transmission spectrum, and design and produce the high-level efficiency beam-splitting optical grating by fused quartz, simple in structure, technological process is simple.Therefore, the high-density deeply etched fused quartz grating of etching is with a wide range of applications as novel beam splitting device.To fused quartz grating, it is as light incident under Littrow condition the most commonly in the research of beam splitter, and promptly incident angle is a Bragg angle.High-density deeply etched grating under Littrow condition has fabulous polarization correlatedly, can be used to make polarization beam apparatus, 1/4 slide in broadband etc.For the rectangle channeled grating, another comparatively common light incident mode is a vertical incidence, and promptly incident angle is a zero degree.
People such as Jiangjun Zheng have designed the high-level efficiency transmission-type triangle fused quartz beam-splitting optical grating under a kind of Bragg angle incident, its TE and TM ripple efficiency of transmission are higher than 97%[technology 1:J.Zheng et al. formerly in 140 nanometer wavelength range, Opt.Lett.33,1554-1556 (2008)].People such as Jijun Feng have designed high-level efficiency transmission-type rectangle fused quartz polarization irrelevant 1 * 2 beam-splitting optical grating under a kind of Bragg angle incident, its even performance very good [formerly technology 2:J.Feng et al., Appl.Opt.48,5636-5641 (2009)].People such as Jijun Feng have designed high-level efficiency transmission-type rectangle fused quartz polarization irrelevant 1 * 3 beam-splitting optical grating under a kind of smooth vertical incidence, its TE and TM ripple efficiency of transmission all are higher than 97%[technology 3:J.Feng et al. formerly, Appl.Opt.47,6638-6643 (2008)].Above grating all is based on single ridge structure, and promptly a grating has only a ridge in the cycle.Want to increase and divide beam port, a valid approach is to adopt two ridge structures, and two ridges are promptly arranged in the one-period.
Rectangular raster is to utilize the deep etching technique of microelectronics, the grating with rectangle flute profile that processes in substrate.The diffraction theory of high density rectangular raster can not be explained by simple scalar optical grating diffraction equation, and must adopt the Maxwell equation of vector form and in conjunction with boundary condition, accurately calculate the result by calculation of coding machine program.People such as Moharam have provided the algorithm [formerly technology 4:M.G.Moharam et al., J.Opt.Soc.Am.A.12,1077 (1995)] of rigorous coupled wave theory, can solve the diffraction problem of this class high dencity grating.So far, also having no talent is given in 1 * 5 pair of ridge beam-splitting optical grating of TE polarization of making on the fused quartz substrate at 800 nano wave lengths commonly used but as far as we know.
Summary of the invention
The technical problem to be solved in the present invention provides a kind of two ridge fused quartz 1 * 5 beam-splitting optical gratings that are used for the TE polarization of 800 nano wave lengths.When TE polarized light vertical incidence, this grating can make incident light be divided into the equicohesive transmitted light of 5 bundles, and the total efficiency of this 5 bundle transmitted light is greater than 96%, and homogeneity is better than 5%.Therefore, this beam-splitting optical grating has important practical value.
Technical solution of the present invention is as follows:
A kind of two ridge fused quartz 1 * 5 beam-splitting optical gratings that are used for the TE polarization of 800 nano wave lengths, the grating cycle that it is characterized in that this beam-splitting optical grating is 1830～1850 nanometers, two wide 143～146 nanometers and 500～508 nanometers of being respectively of ridge in each grating cycle, apart from being 594～597 nanometers, ridge is 872～875 nanometers deeply between two ridges.
The grating cycle of best beam-splitting optical grating is 1840 nanometers, two wide 144.6 nanometers and 504.2 nanometers of being respectively of ridge in each grating cycle, and the edge is apart from being 595.3 nanometers between ridge, ridge is 873.8 nanometers deeply.
Technique effect of the present invention is as follows:
Particularly the grating cycle when beam-splitting optical grating is 1840 nanometers, two wide 144.6 and 504.2 nanometers that are respectively of ridge, the edge distance is 595.3 nanometers between ridge, when ridge is 873.8 nanometers deeply, if when considering that the TE polarized light of 800 nanometers impinges perpendicularly on grating, the total efficiency of this grating transmitted light is greater than 96%, and homogeneity is better than 0.3%.That the present invention has is flexible and convenient to use, homogeneity better, diffraction efficiency is than advantages such as height, it is a kind of very desirable diffraction optical element, utilize the direct electronic beam write device in conjunction with the deep etching technique of microelectronics, can be in enormous quantities, produce at low cost, grating stable performance after the etching, reliable has important practical prospect.
Description of drawings
Fig. 1 is the geometry of two ridge fused quartz 1 * 5 beam-splitting optical gratings of TE polarization high-level efficiency of the present invention's 800 nano wave lengths.
Among the figure, 1 represents zone 1, and (refractive index is n
1), 2 represent zone 2, and (refractive index is n
2), 3 represent grating, and 4 represent the incident light under the TE polarization mode, 5,6,7,8,9 represent respectively under the TE pattern+2 ,+1,0 ,-1 ,-2 order diffraction light.D is the grating cycle, x
1And x
2Wide for ridge, x is an edge distance between ridge, and h is the grating degree of depth.
Fig. 2 be embodiment+2 in the claimed range of the present invention ,+total 1,0 ,-1 ,-2 grade of diffraction efficiency is with the curve of wavelength variations.
Fig. 3 is the curve of the homogeneity of embodiment among Fig. 2 with wavelength variations.
Embodiment
The invention will be further described below in conjunction with embodiment and accompanying drawing, but should not limit protection scope of the present invention with this.
See also Fig. 1 earlier, Fig. 1 is the geometry of 1 * 5 pair of ridge fused quartz of TE polarization of the present invention beam-splitting optical grating.Among the figure, zone 1,2 all is uniformly, is respectively air (refractive index n
1=1) and fused quartz (refractive index n
2=1.45).Perpendicular to the plane of incidence, it impinges perpendicularly on grating to the TE polarized incident light corresponding to the direction of vibration of electric field intensity.As seen from the figure, the present invention is used for the two ridge fused quartz transmission beam-splitting optical gratings of TE polarization that wavelength is 800 nano wavebands, the grating cycle of this beam-splitting optical grating is 1830～1850 nanometers, two wide 143～146 nanometers and 500～508 nanometers of being respectively of ridge in each grating cycle, apart from being 594～597 nanometers, ridge is 872～875 nanometers deeply between two ridges.
Under optical grating construction as shown in Figure 1, the present invention adopts rigorous coupled wave theory [formerly technology 4] to calculate the diffraction efficiency of two ridge fused quartz gratings at 800 nano wavebands.We utilize rigorous coupled wave theory [formerly technology 4] to obtain the grating initial configuration, and adopt simulated annealing rule [technology 5:W.Goffe et al. formerly, J.Econometrics 60,65-99 (1994)] be optimized, thus obtain the two ridge fused quartz beam-splitting optical gratings of this high-level efficiency.
Table 1 has provided a series of embodiment of the present invention, and d is the grating cycle in the table, x
1And x
2Wide for ridge, x is an edge distance between ridge, and h is the grating degree of depth, and λ is an incident wavelength, and Unifromity is the diffraction homogeneity of 5 ports, and η is a diffraction efficiency.Be used for the process of two ridge fused quartz 1 * 5 beam-splitting optical gratings of the TE polarization of 800 nano wave lengths making the present invention, suitable selective light grid cycle, ridge are wide, edge distance and etching depth just can obtain high-diffraction efficiency and homogeneity transmission 1 * 5 beam-splitting optical gratings preferably in certain bandwidth between ridge.
Fig. 2 be embodiment+2 in the claimed range of the present invention ,+total 1,0 ,-1 ,-2 grade of diffraction efficiency is with the curve of wavelength variations.
Fig. 3 is the curve of the homogeneity of embodiment among Fig. 2 with wavelength variations.
The two ridge fused quartz transmission beam-splitting optical gratings of TE polarization high-level efficiency of the present invention, have flexible and convenient to use, homogeneity better, diffraction efficiency is than advantages such as height, it is a kind of very desirable diffraction optical element, utilize the direct electronic beam write device in conjunction with the deep etching technique of microelectronics, can be in enormous quantities, produce at low cost, grating stable performance after the etching, reliable has important practical prospect.
The light of different wave length is in the total diffraction efficiency and the homogeneity of 5 ports during table 1 TE polarized light vertical incidence.
Claims (2)
1. two ridge fused quartz 1 * 5 beam-splitting optical gratings that are used for the TE polarization of 800 nano wave lengths, the grating cycle that it is characterized in that this beam-splitting optical grating is 1830～1850 nanometers, two wide 143～146 nanometers and 500～508 nanometers of being respectively of ridge in each grating cycle, apart from being 594～597 nanometers, ridge is 872～875 nanometers deeply between two ridges.
2. two ridge fused quartz 1 * 5 beam-splitting optical gratings of TE polarization according to claim 1, the grating cycle that it is characterized in that described beam-splitting optical grating is 1840 nanometers, two wide 144.6 nanometers and 504.2 nanometers of being respectively of ridge in each grating cycle, the edge is apart from being 595.3 nanometers between ridge, and ridge is 873.8 nanometers deeply.
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102289013A (en) * | 2011-09-15 | 2011-12-21 | 中国科学院上海光学精密机械研究所 | Double-ridge metal wire grating polarization beam splitter |
| CN107272099A (en) * | 2017-07-14 | 2017-10-20 | 中国科学院上海光学精密机械研究所 | The beam-splitting optical grating of single ridge structure 1 × 5 of TE polarizations |
| CN108387961A (en) * | 2018-05-16 | 2018-08-10 | 德州尧鼎光电科技有限公司 | A kind of deep ultraviolet spike filter |
| CN110716255A (en) * | 2019-10-11 | 2020-01-21 | 中国科学院上海光学精密机械研究所 | Three-layer all-dielectric rectangular grating for realizing-2-level broadband high efficiency |
| CN111522084A (en) * | 2020-04-22 | 2020-08-11 | 深圳珑璟光电技术有限公司 | Grating structure and near-to-eye display system |
| CN114740572A (en) * | 2022-04-07 | 2022-07-12 | 中国科学院上海光学精密机械研究所 | Broadband vertical coupling multi-ridge grating coupler for flat-plate integrated optical system |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1786751A (en) * | 2005-12-27 | 2006-06-14 | 中国科学院光电技术研究所 | Three step splitting beam grating and its mfg. method |
| CN101149444A (en) * | 2007-11-14 | 2008-03-26 | 中国科学院上海光学精密机械研究所 | Fused silica transmission 1*2 beam-dividing grating |
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2011
- 2011-04-26 CN CN2011101056956A patent/CN102156315B/en not_active Expired - Fee Related
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN1786751A (en) * | 2005-12-27 | 2006-06-14 | 中国科学院光电技术研究所 | Three step splitting beam grating and its mfg. method |
| CN101149444A (en) * | 2007-11-14 | 2008-03-26 | 中国科学院上海光学精密机械研究所 | Fused silica transmission 1*2 beam-dividing grating |
Non-Patent Citations (3)
| Title |
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| 《APPLIED OPTICS》 20081210 Jijun Feng et al Three-port beam splitter of a binary fused-silica grating 第6638-6648页 1-2 第47卷, 第35期 2 * |
| 《APPLIED OPTICS》 20090510 Jijun Feng et al Dual-function beam splitter of a subwavelength fused-silica grating 第2697-2701页 1-2 第48卷, 第14期 2 * |
| 《Optics Communications》 20081231 Jijun Feng et al Modal analysis of deep-etched low-contrast two-port beam splitter grating 第5298-5301页 1-2 第281卷, 2 * |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102289013A (en) * | 2011-09-15 | 2011-12-21 | 中国科学院上海光学精密机械研究所 | Double-ridge metal wire grating polarization beam splitter |
| CN107272099A (en) * | 2017-07-14 | 2017-10-20 | 中国科学院上海光学精密机械研究所 | The beam-splitting optical grating of single ridge structure 1 × 5 of TE polarizations |
| CN108387961A (en) * | 2018-05-16 | 2018-08-10 | 德州尧鼎光电科技有限公司 | A kind of deep ultraviolet spike filter |
| CN110716255A (en) * | 2019-10-11 | 2020-01-21 | 中国科学院上海光学精密机械研究所 | Three-layer all-dielectric rectangular grating for realizing-2-level broadband high efficiency |
| CN110716255B (en) * | 2019-10-11 | 2021-09-07 | 中国科学院上海光学精密机械研究所 | Three-layer all-dielectric rectangular grating for realizing-2-level broadband high efficiency |
| CN111522084A (en) * | 2020-04-22 | 2020-08-11 | 深圳珑璟光电技术有限公司 | Grating structure and near-to-eye display system |
| CN114740572A (en) * | 2022-04-07 | 2022-07-12 | 中国科学院上海光学精密机械研究所 | Broadband vertical coupling multi-ridge grating coupler for flat-plate integrated optical system |
| CN114740572B (en) * | 2022-04-07 | 2024-04-12 | 中国科学院上海光学精密机械研究所 | Broadband vertical coupling multi-ridge grating coupler for flat integrated optical system |
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