CN107249873B - 阻气性膜 - Google Patents
阻气性膜 Download PDFInfo
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- CN107249873B CN107249873B CN201680011616.6A CN201680011616A CN107249873B CN 107249873 B CN107249873 B CN 107249873B CN 201680011616 A CN201680011616 A CN 201680011616A CN 107249873 B CN107249873 B CN 107249873B
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- layer
- gas barrier
- silicon
- barrier film
- atom
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- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B15/08—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B9/00—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/02—Details
- H05B33/04—Sealing arrangements, e.g. against humidity
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Laminated Bodies (AREA)
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015035040 | 2015-02-25 | ||
| JP2015-035040 | 2015-02-25 | ||
| PCT/JP2016/055527 WO2016136842A1 (fr) | 2015-02-25 | 2016-02-24 | Film barrière contre les gaz |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN107249873A CN107249873A (zh) | 2017-10-13 |
| CN107249873B true CN107249873B (zh) | 2019-05-21 |
Family
ID=56789620
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201680011616.6A Expired - Fee Related CN107249873B (zh) | 2015-02-25 | 2016-02-24 | 阻气性膜 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPWO2016136842A1 (fr) |
| CN (1) | CN107249873B (fr) |
| WO (1) | WO2016136842A1 (fr) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
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| JP2019010736A (ja) * | 2015-11-24 | 2019-01-24 | コニカミノルタ株式会社 | ガスバリアー性フィルム及びこれを備えた電子デバイス |
| JP2019010730A (ja) * | 2015-11-24 | 2019-01-24 | コニカミノルタ株式会社 | ガスバリアー性フィルム及び電子デバイス |
| CN109477202A (zh) * | 2016-07-28 | 2019-03-15 | 柯尼卡美能达株式会社 | 气体阻隔性膜、使用它的气体阻隔性膜材和使用它们的电子设备、以及气体阻隔性膜的制造方法 |
| TW201823501A (zh) | 2016-11-16 | 2018-07-01 | 美商陶氏全球科技有限責任公司 | 用於製造膜上之薄塗層之方法 |
| JP2019177645A (ja) * | 2018-03-30 | 2019-10-17 | 東洋製罐グループホールディングス株式会社 | 電子デバイス用バリアフィルム |
| KR102294027B1 (ko) * | 2018-10-26 | 2021-08-27 | 주식회사 엘지화학 | 배리어 필름 |
| KR102294031B1 (ko) * | 2018-10-26 | 2021-08-27 | 주식회사 엘지화학 | 배리어 필름 |
| CN111871152B (zh) * | 2020-07-30 | 2021-10-08 | 浙江大学 | 一种功能化离子液体及其制备方法和应用 |
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| JP4930140B2 (ja) * | 2006-07-26 | 2012-05-16 | 住友ベークライト株式会社 | 透明積層体 |
| JP5394867B2 (ja) * | 2009-09-17 | 2014-01-22 | 富士フイルム株式会社 | ガスバリア膜およびガスバリアフィルム |
| WO2014097997A1 (fr) * | 2012-12-19 | 2014-06-26 | コニカミノルタ株式会社 | Dispositif électronique |
| JP5929775B2 (ja) * | 2013-02-08 | 2016-06-08 | コニカミノルタ株式会社 | ガスバリア性フィルムおよびその製造方法、ならびに前記ガスバリア性フィルムを含む電子デバイス |
| JP2014201033A (ja) * | 2013-04-08 | 2014-10-27 | コニカミノルタ株式会社 | ガスバリア性フィルムおよびその製造方法 |
| JP2014201032A (ja) * | 2013-04-08 | 2014-10-27 | コニカミノルタ株式会社 | ガスバリア性フィルムおよびその製造方法 |
| JP2015003464A (ja) * | 2013-06-21 | 2015-01-08 | コニカミノルタ株式会社 | ガスバリア性フィルム、その製造方法、およびこれを用いた電子デバイス |
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| JPWO2016136842A1 (ja) | 2017-12-14 |
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