CN107024836A - Roll-to-roll double-side exposal device - Google Patents
Roll-to-roll double-side exposal device Download PDFInfo
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- CN107024836A CN107024836A CN201710059526.0A CN201710059526A CN107024836A CN 107024836 A CN107024836 A CN 107024836A CN 201710059526 A CN201710059526 A CN 201710059526A CN 107024836 A CN107024836 A CN 107024836A
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- mask
- mentioned
- roll
- cleaning roller
- roller
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/201—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by an oblique exposure; characterised by the use of plural sources; characterised by the rotation of the optical device; characterised by a relative movement of the optical device, the light source, the sensitive system or the mask
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
- G03F7/2032—Simultaneous exposure of the front side and the backside
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2059—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a scanning corpuscular radiation beam, e.g. an electron beam
- G03F7/2063—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a scanning corpuscular radiation beam, e.g. an electron beam for the production of exposure masks or reticles
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7096—Arrangement, mounting, housing, environment, cleaning or maintenance of apparatus
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Public Health (AREA)
- Epidemiology (AREA)
- Atmospheric Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Plasma & Fusion (AREA)
- Environmental & Geological Engineering (AREA)
- Toxicology (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Cleaning In General (AREA)
- Body Structure For Vehicles (AREA)
- Projection-Type Copiers In General (AREA)
Abstract
A kind of roll-to-roll double-side exposal device can enter the practical composition of the cleaning of line mask there is provided in roll-to-roll mode and the exposure device of progress two sides exposure.The plate shape substrates (S) of roll are pulled out by handling system (1) and carried in exposure area by ground, by a pair of light sources (2), optical system (3) and the mask (41,42) of the both sides for being arranged on exposure area, plate shape substrates (S) are exposed according to the pattern irradiation light of mask (41,42).In the gap of exposure, elevating mechanism (51,52) is each mask (41,42) lifting, there is the state that a pair of cleaning rollers (61,62) of adhered layer are contacted as each mask (41,42) and surface, each cleaning roller (61,62) is rotated on each mask (41,42) and integratedly moved by roller travel mechanism (63), and thus each mask (41,42) is cleaned.
Description
Technical field
The present invention relates to the roll-to-roll double-side exposal device of the manufacture for flexible printing substrate etc..
Background technology
The exposure device that the light of predetermined pattern is irradiated to object and is exposed, is used as the key element skill of the core of photoetching
Art is used in a variety of applications where.Wherein, on to substrate (hereinafter referred to as plate shape substrates) soft as flexible printing substrate
The exposure device being exposed, it is known to the device being exposed by roll-to-roll while being carried to plate shape substrates.
In this device, exist to the two sides of plate shape substrates while the device for the type being exposed, one example is to two sides
Carry out the exposure device of the flexible printing substrate of circuit formation.
The exposure device for carrying out the roll-to-roll of two sides exposure is configured to, and irradiates and provides from both sides for some region set
The light of pattern.Then, the plate shape substrates of roll are pulled out and it is gradually stopped in this region, and entered in stopping from both sides
Row exposure.When the amount of thickness to plate shape substrates is accounted for, the region of some setting turns into (to expose with two parallel planes
Smooth surface) region (hereinafter referred to as exposure area).
Patent document 1：Japanese Unexamined Patent Publication 2007-25436 publications
Patent document 2：Japanese Unexamined Patent Publication 2015-49356 publications
In exposure device as described above, in order to carry out the fine quality without shape defect pattern transfer, it is necessary to
Regularly clean mask.When the foreign matters such as dust, dust are attached on mask, the defect of the pattern as the light irradiated is held
The reason for product for easily turning into final is bad.In exposure device, the fraction of flash at the edge of such as plate shape substrates peel off or
A part for coated resist is peeled off and turns into foreign matter on person's plate shape substrates, and may be attached on mask.Accordingly, it would be desirable to
Regularly clean mask.
In patent document 1, patent document 2, the technology for the cleaning for entering line mask in such exposure device is disclosed.
Wherein, in patent document 1, the skill for carrying out dedusting to mask by Sticking roller in the exposure device of individual processing formula is disclosed
Art.In addition, in patent document 2, disclosing in the exposure device of roll-to-roll mode by cleaning roller to mask progress dedusting
Technology.
The dedusting technology of mask disclosed in these patent documents, be one side mode exposure device in technology.
In the case of double-side exposal device, due to being configured with mask in both sides relative to plate shape substrates, it is therefore desirable to which its both sides is carried out
Cleaning, but these patent documents are the document of one side Exposure mode, even if therefore reality can not be expected with reference to these documents
Construction.
For example, in patent document 1, cleaning roller be installed on plate shape substrates are taken out of take out of hand, with plate shape substrates
The action that takes out of synchronously move and enter the dedusting of line mask.However, in the device of roll-to-roll, due in the absence of individual processing
The carrying-in/carrying-out of substrate as the device of formula is acted, for this mechanism, therefore cannot function as reference.In addition, in patent text
Offer in 2, illustrate that plate shape substrates side opposite with mask is being provided with drive mechanism, cleaning roller is made by the drive mechanism
It is mobile, thus enter the dedusting of line mask, but in the case of double-side exposal device, mask is similarly configured with opposite side,
It is difficult to configure such mechanism.
The content of the invention
The present invention be in view of the situation of such prior art and carry out, its object is to providing in roll-to-roll mode and
In the exposure device for carrying out two sides exposure, the practical composition of the cleaning of line mask can be entered.
In order to solve above-mentioned problem, the composition that the invention that the technical scheme 1 of the application is recorded has is, a kind of roll-to-roll two
Face exposure device, the plate shape substrates of roll are pulled out and irradiates the light of predetermined pattern to the two sides of the plate shape substrates and is exposed
Light, it possesses：
Handling system, the plate shape substrates of roll are pulled out and carried in exposure area by ground；
A pair of masks, across exposure area configuration；And
A pair of masks are cleaned by mask wiper mechanism,
Mask wiper mechanism possesses：
A pair of cleaning rollers, surface has adhered layer；And
Roller travel mechanism, makes each cleaning roller rotate side movement in each mask top, thus removes foreign matter from each mask,
Roller travel mechanism is to exist to make in the state of plate shape substrates each cleaning roller lateral another from the one of each mask between
The mechanism moved to the side same time.
In addition, in order to solve above-mentioned problem, the composition that the invention that technical scheme 2 is recorded has is, in above-mentioned technical proposal 1
Composition in, above-mentioned roller travel mechanism is the mechanism for making above-mentioned each cleaning roller integratedly move.
In addition, in order to solve above-mentioned problem, the composition that the invention that technical scheme 3 is recorded has is, in above-mentioned technical proposal 1
Or 2 composition in, above-mentioned each cleaning roller possess make elastic reaction when being contacted with above-mentioned each mask and improve to mask by
The elastomer of pressure.
In addition, in order to solve above-mentioned problem, the composition that the invention that technical scheme 4 is recorded has is, in above-mentioned technical proposal 1
Or 2 composition in, be provided with mask travel mechanism, the mask travel mechanism is so that above-mentioned each mask is towards above-mentioned plate shape substrates
Move and above-mentioned each mask is moved from the remote mode of above-mentioned plate shape substrates,
Above-mentioned each cleaning roller is located at than above-mentioned each mask closer to the side of above-mentioned plate shape substrates,
Mask travel mechanism is that above-mentioned each mask can be made to be moved towards above-mentioned plate shape substrates and make itself and above-mentioned each cleaning
The mechanism of roller contact.
In addition, in order to solve above-mentioned problem, the composition that the invention that technical scheme 5 is recorded has is, in above-mentioned technical proposal 4
Composition in, above-mentioned each cleaning roller possesses elastomer,
Above-mentioned mask travel mechanism is, when making above-mentioned each mask be contacted with above-mentioned each cleaning roller, can to make above-mentioned each mask
Positioned at by elastomer compress and improve above-mentioned each cleaning roller to the mechanism of the position of the pressing force of above-mentioned each mask, and be can be right
The position of above-mentioned each mask is adjusted and mechanism that the decrement to elastomer is adjusted.
In addition, in order to solve above-mentioned problem, the composition that the invention that technical scheme 6 is recorded has is, in above-mentioned technical proposal 1
Or 2 composition in, above-mentioned each cleaning roller be located at than above-mentioned each mask closer to the side of above-mentioned plate shape substrates,
Above-mentioned a pair of cleaning rollers are interconnected by framework,
Above-mentioned mask travel mechanism is following mechanism：By making a direction of above-mentioned a pair of masks close to above-mentioned sheet base
The direction movement of plate, and makes it be contacted with a side of above-mentioned a pair of cleaning rollers, also, mask via a side and a side
Cleaning roller moves the cleaning roller of the opposing party, thus enables that the cleaning roller of the opposing party is contacted with the mask of the opposing party.
In addition, in order to solve above-mentioned problem, the composition that the invention that technical scheme 7 is recorded has is, in above-mentioned technical proposal 6
Composition in, above-mentioned a pair of cleaning rollers via elastomer joint,
Above-mentioned mask travel mechanism is above-mentioned by making via the mask of one side and the cleaning roller of one side
The cleaning roller movement of the opposing party, when the cleaning roller of the opposing party is contacted with the mask of above-mentioned the opposing party, above-mentioned one can be made
The mask of side, which is located at, to be compressed by elastomer and improves above-mentioned each cleaning roller to the mechanism of the position of the pressing force of above-mentioned each mask, and
It is that the position of the mask of one side can be adjusted and mechanism that the decrement to elastomer is adjusted.
In addition, in order to solve above-mentioned problem, the composition that the invention that technical scheme 8 is recorded has is, in above-mentioned technical proposal 4
Into any one of 7 composition, above-mentioned mask travel mechanism is above-mentioned each mask is contacted with above-mentioned plate shape substrates or with rule
The opposed mechanism in fixed gap ground.
In addition, in order to solve above-mentioned problem, the composition that the invention that technical scheme 9 is recorded has is, in above-mentioned technical proposal 1
Into any one of 8 composition, a pair of the transferring rollers that can be contacted with above-mentioned a pair of cleaning rollers are provided with,
Each transferring roller has the higher adhered layer of adherence force compared with the adhered layer of above-mentioned each cleaning roller on the surface.
In addition, in order to solve above-mentioned problem, the composition that the invention that technical scheme 10 is recorded has is, in above-mentioned technical proposal
In any one of 1 to 9 composition, the surface to above-mentioned each mask before above-mentioned each cleaning roller is contacted with above-mentioned each mask is provided with
What is be de-energized removes electrical equipment.
In addition, in order to solve above-mentioned problem, the composition that the invention that technical scheme 11 is recorded has is, in above-mentioned technical proposal
It is above-mentioned except electrical equipment is supplies the electro-dissociator that ion is de-energized to the surface of above-mentioned each mask in 10 composition,
Electro-dissociator is configured at the front in the direction of the movement of above-mentioned roller travel mechanism relative to above-mentioned each cleaning roller,
Above-mentioned roller travel mechanism is the mechanism for making electro-dissociator integratedly be moved with above-mentioned each cleaning roller.
The effect of invention
As described below, there are plate shape substrates between in the invention recorded according to the technical scheme 1 of the application
Under state, a pair of cleaning rollers it is with rotating the side same time mobile a pair of mask tops, thus cleaned, therefore offer can not
The practical composition cleaned with hindering productivity ratio.
In addition, the invention recorded according to technical scheme 2, on the basis of the effect above, a pair of cleaning rollers are integratedly moved,
Mobile mechanism is thus be accordingly used in be simplified.
In addition, the invention recorded according to technical scheme 3, on the basis of the effect above, each cleaning roller is pressed to each mask
Pressure is enhanced, therefore the effect of cleaning is further improved.
In addition, the invention recorded according to technical scheme 4, on the basis of the effect above, mask travel mechanism is used for making
Each cleaning roller is contacted with each mask, therefore makes mechanism simplifying by this point.
In addition, the invention recorded according to technical scheme 5, on the basis of the effect above, by mask travel mechanism to bullet
Property body decrement be adjusted, therefore cleaning become it is insufficient or damage mask possibility disappear.
In addition, the invention recorded according to technical scheme 6, on the basis of the effect above, mask travel mechanism is used for making
Each cleaning roller is contacted with each mask, therefore makes mechanism simplifying by this point.
In addition, the invention recorded according to technical scheme 7, on the basis of the effect above, by mask travel mechanism to bullet
Property body decrement be adjusted, therefore cleaning become it is insufficient or damage mask possibility disappear.In addition, elastomer
For one, therefore mechanism simplifying is made by this point.
In addition, the invention recorded according to technical scheme 8, the same of the way of contact or the exposure of neighbouring mode can carried out
When, obtain above-mentioned each effect.
In addition, the invention recorded according to technical scheme 9, on the basis of the effect above, due to being provided with transferring roller, therefore
The maintenance frequency of each cleaning roller can be reduced.
In addition, the invention recorded according to technical scheme 10, on the basis of the effect above, due to being provided with before washing
What the surface of each mask was de-energized removes electrical equipment, therefore, it is possible to further improve the effect of cleaning.
In addition, the invention recorded according to technical scheme 11, on the basis of the effect above, roller travel mechanism is used for except electricity
Device is the movement of electro-dissociator, therefore makes mechanism simplifying by this point.
Brief description of the drawings
Fig. 1 is the main view section skeleton diagram of the roll-to-roll double-side exposal device of first embodiment.
Fig. 2 is the perspective sketch of the mask wiper mechanism of first embodiment.
Fig. 3 is the main view section skeleton diagram of the action for the roll-to-roll double-side exposal device for representing first embodiment.
Fig. 4 is the perspective sketch of the major part for the roll-to-roll double-side exposal device for representing second embodiment.
Fig. 5 is the main view section skeleton diagram of the action for the roll-to-roll double-side exposal device for representing second embodiment.
Fig. 6 is the perspective sketch of the major part of the roll-to-roll double-side exposal device of the 3rd embodiment.
The explanation of symbol
1 handling system
2 light sources
3 optical systems
41 upside masks
42 downside masks
51 upside elevating mechanisms
52 downside elevating mechanisms
6 mask wiper mechanisms
61 upside cleaning rollers
62 downside cleaning rollers
63 roller travel mechanisms
64 movable frameworks
7 as elastomer helical spring
Remove electrical equipment in 81 upsides
Remove electrical equipment in 82 downsides
Embodiment
Next, being illustrated to the mode (hereinafter referred to as embodiment) for implementing the present invention.
Fig. 1 is the main view section skeleton diagram of the roll-to-roll double-side exposal device of first embodiment.Device tool shown in Fig. 1
It is standby：Handling system 1, the plate shape substrates S of roll is pulled out and carried；Light source 2；Optical system 3, to the plate shape substrates S pulled out
In be located at exposure area part, irradiate the light from light source 2 and be exposed；And mask 41,42, configure in optical system
Between 3 and exposure area.
Handling system 1 by by be wound as roll plate shape substrates S pull out hold-down roller 11, winding be exposed after sheet base
The plate S grade of take-up roll 12 is constituted.Device possesses control unit (not shown), and handling system 1 is by control unit control.
Exposure area is the region with horizontal plane of exposure, and plate shape substrates S is carried with the posture of level to exposure area.
The face (hereinafter referred to as carrying face) that plate shape substrates S is passed through when carrying is level, and the optical axis of optical system 3 is relative to carrying
Face is vertical.
Carrying of the handling system 1 to plate shape substrates S is intermittent, is repeated row as defined in plate shape substrates S conveyings
Journey and make its stop action (gradually carrying action).Defined stroke is the stroke corresponding with the size of exposure area.Expose
Light is carried out in plate shape substrates S stopping, the light of the pattern of the size in irradiation exposure region.Thus, the row that gradually carrying is acted
Journey (hereinafter referred to as carrying stroke) and the length for carrying the exposure area on direction are roughly the same.
The device of present embodiment carries out two sides exposure, therefore light source 2, optical system 3 and mask 41,42 are across exposure
Region and be respectively configured with one group both sides (being in the present embodiment the upper side and lower side).Hereinafter, for convenience of description, by a pair
Mask 41,42 is referred to as upside mask 41, downside mask 42.
Light source 2 and optical system 3 can arbitrarily be selected from various light sources and optical system, but for example can
Using following composition：Using the ultraviolet lamp of short-arc type as light source 2, turning into the light of uniform intensity distribution by integration lens
After beam, directional light is turned into by collimation lens and irradiated to mask 41,42.In addition, each optical system 3 is comprising (not shown) fast
Door, each shutter is controlled by control unit (not shown).
In addition, the device of present embodiment carries out so-called contact exposure.Thus, mask travel mechanism 51,52 is provided with,
The mask travel mechanism 51,52 makes mask 41,42 carry out the shifting for being close to plate shape substrates S or being left from plate shape substrates S
It is dynamic.In the present embodiment, the plate shape substrates S in exposure area is horizontal posture, therefore mask travel mechanism 51,52 turns into
The mechanism for making mask 41,42 move along the vertical direction.Hereinafter, the mechanism 51 that upside mask 41 is lifted will be made to be referred to as upside lift
Structure, will make the mechanism 52 that downside mask 42 is lifted be referred to as downside elevating mechanism.
Each mask 41,42 is the tabular of horizontal posture.Be provided with the behind of each mask 41,42 mask pedestal 411,
421.Each mask 41,42 is carried before each mask pedestal 411,421.Each elevating mechanism 51,52 turns into by making each mask
Pedestal 411,421 lifts to make the mechanism that each mask 41,42 is close to plate shape substrates S or left from plate shape substrates S.
Specifically, each elevating mechanism 51,52 is following mechanism：Make each mask 41,42 towards plate shape substrates S move and with
Plate shape substrates S is close to, and makes each mask 41,42 during the carrying of the plate shape substrates S after end exposure to remote from plate shape substrates S
From direction movement.Each elevating mechanism 51,52 can use arbitrary straight-moving mechanism, but in the present embodiment, in order to increase
The free degree of the stop position of big each mask 41,42, and use the combination of servo motor and ball-screw.Eliminate in Fig. 1
Details, but each elevating mechanism 51,52 turns into following mechanism：Drive shaft above and below possessing in left and right, makes each mask pedestal
411st, 421 lifted along the linear guides of above-below direction.
In addition, for convenience of description, vertical direction is set into Z-direction, plate shape substrates S carrying direction is set to X-direction,
The horizontal direction vertical with X-direction is set to Y-direction.Each mask 41,42 be using XY directions as each side square tabular.
The roll-to-roll double-side exposal device of such embodiment, possesses the foreign matter removing that will attach to each mask 41,42
Mask wiper mechanism 6.Hereinafter, reference picture 1 and Fig. 2 are illustrated to mask wiper mechanism 6.Fig. 2 is first embodiment
Mask wiper mechanism perspective sketch.
Mask wiper mechanism 6 has the practical composition for cleaning a pair of masks 41,42 simultaneously.Specifically, mask is cleaned
Mechanism 6 possesses：Surface has a pair of cleaning rollers 61,62 of adhered layer；And by the state of being abutted with each mask 41,42
The roller travel mechanism 63 for being cleaned each movement of cleaning roller 61,62.
In each cleaning roller 61,62, the adhered layer on surface has enough adherence forces, so as to will be attached by adherence force
The foreign matter in mask 41,42 is removed from mask 41,42.As shown in Figure 2, each cleaning roller 61,62 is cylindrical shape, by inserting
Enter columned plug (ellipsis) to be kept by plug.Each cleaning roller 61,62 is configured along the Y direction.
Roller travel mechanism 63 includes：Maintain the framework 64 of a pair of cleaning rollers 61,62；It is installed on a pair of sliding blocks of framework 64
65；A pair of the linear guides 66 extended parallel to each other with X-direction；And each sliding block 65 is moved along each linear guides 66
Dynamic linear drives source 67 etc..Framework 64 is movable by linear drives source 67, therefore hereinafter is referred to as movable framework.
Movable framework 64 has a pair of column sections (the hereinafter referred to as dedusting pillar being supported to each cleaning roller 61,62
Portion) 641.Each dedusting column sections 641 are supported via bearing (ellipsis) to the two ends of the plug of each cleaning roller 61,62.
Thus, each cleaning roller 61,62 can be around the driven rotation of central shaft extended along Y-direction.As shown in Figure 2, by dedusting branch
A pair of cleaning rollers 61,62 that post portion 641 is kept are separated in z-direction, and plate shape substrates S carrying face is set with in-between.By
This, plate shape substrates S is disposed between under the operating state of device.
It is used as linear drives source 67, combination or linear motor using servo motor and ball-screw etc..Based on straight line
The shift motion of the sliding block 65 of driving source 67, for the length somewhat long degree of the mask 41,42 than X-direction.
In addition, mask wiper mechanism 6 possesses transferring roller 68.The purpose for setting transferring roller 68 is, makes to be attached to cleaning roller
61st, 62 foreign matter transfer, reduces the maintenance frequency of cleaning roller 61,62.
Same with cleaning roller 61,62, each transferring roller 68 is the Sticking roller on surface with adhered layer.Each transferring roller 68 and family
It is same that the rubbish in front yard removes to take Sticking roller, to be wound with the construction of adhesive tape (adhesive paper), in foreign matter to transferring roller 68
In the case of adhering to quantitative change more, by the way that one layer of adhesive tape on surface is peelled off, thus regenerate adhesive force.But, with cleaning
Roller 61,62 is compared, and the adherence force of each transferring roller 68 is at a relatively high degree.
As shown in Figure 2, each transferring roller 68 by from supporting cleaning roller 61,62 the different framework of movable framework 64 (with
Under, referred to as fixed frame) 681 keep.Fixed frame 681 has a pair of column sections (hereinafter referred to as shifting column sections) 682.Respectively
Transferring roller 68 also has plug, and the two ends of plug are supported in each transfer column sections 682 via bearing (ellipsis).
Each transferring roller 68 is provided with rotary driving source 683, and is rotated around central shaft.As shown in Figure 2, upside
The height that is supported of transferring roller 68, be the almost identical height of cleaning roller 61,62 with upside, the transferring roller 68 of downside is propped up
The height of support, is the almost identical height of cleaning roller 61,62 with downside.Thus, moved by each cleaning roller 61,62, thus
Each transferring roller 68 can be contacted with each cleaning roller 61,62.
The action of the roll-to-roll double-side exposal device of first embodiment is illustrated as 3 pairs of reference picture.Fig. 3 is table
Show the main view section skeleton diagram of the action of the roll-to-roll double-side exposal device of first embodiment.
Control unit (not shown) sends control signal to handling system 1, by the distance of plate shape substrates S carrying strokes
Stop it.Then, it is exposed by each light source 2 and each optical system 3.That is, control unit moves each elevating mechanism 51,52
Make, and as shown in Fig. 3 (1), each mask 41,42 is close to plate shape substrates S.In this condition, control unit is by each optics
Shutter in system 3 is opened, and the light L from each light source 2 is by each optical system 3 by each mask 41,42 and to sheet base
Two sides, is thus exposed by plate S two sides irradiation simultaneously.In addition, in exposure, each cleaning roller 61,62 is located at position of readiness.
Position of readiness is, relative to the side (such as being left side as shown in Figure 3) that each mask 41,42 is set in X-direction.
When the end exposure of stipulated time, control unit acts each elevating mechanism 51,52, and as shown in Fig. 3 (2) that
Sample, makes each mask 41,42 be separated from plate shape substrates S.
Next, control unit carries out the cleaning action of each mask 41,42 by mask wiper mechanism 6.Control unit is, first
First, linear drives source 67 is acted, movable framework 64 is moved in X direction.Displacement now, be a pair of cleaning rollers 61,
62 the front of each mask 41,42 by and reach cleaning starting position required for displacement.In the present embodiment,
For region that pattern should be exposed and formed in each mask 41,42, (hereinafter referred to as area of the pattern, uses R tables in Fig. 1
Show) to be cleaned, cleaning starting position is the figure towards opposite side (being viewed as side opposite with position of readiness from each mask 41,42)
The position in the somewhat outside of case region R end.As shown in Fig. 3 (3), a pair of cleaning rollers 61,62 when arrival, open by the cleaning
During beginning position, then stop.
Next, control unit sends control signal to each elevating mechanism 51,52, make each mask 41,42 to close to each other
Move in direction.Displacement now, for upside elevating mechanism 51 be below the mask 41 of upside with upside cleaning roller
The distances of 61 contacts, for downside elevating mechanism 52 be contacted above the mask 42 of downside with downside cleaning roller 62 away from
From.
By movement, as shown in Fig. 3 (4), the state contacted as each mask 41,42 with each cleaning roller 61,62.
Under the state, control unit sends control signal to the linear drives source 67 of roller travel mechanism 63, makes movable framework 64 to phase negative side
To stroke as defined in rectilinear movement.Defined stroke refers to, the length with the X-direction than the area of the pattern R in each mask 41,42
The somewhat suitable stroke of long distance.As a result, as shown in Fig. 3 (5), each cleaning roller 61,62 reaches the figure of each mask 41,42
The somewhat outside of the end of case region R side.In the rectilinear movement, each cleaning roller 61,62 is contacted simultaneously with each mask 41,42
And integratedly moved linearly with movable framework 64.Now, by the frictional force between each cleaning roller 61,62 and each mask 41,42,
The driven rotation of each cleaning roller 61,62.In the case of foreign matter being attached with mask 41,42, each cleaning roller 61,62 of driven rotation
It is attached to itself by adherence force, and removed from mask 41,42.
In addition, in period during from the state shown in Fig. 3 (2) untill as the state shown in Fig. 3 (5),
Control unit sends control signal to handling system 1, and the one with each cleaning roller 61,62 is mobile concurrently, gone according to carrying
The plate shape substrates S of journey carrying.As a result, it is located at exposure as the region that pattern transfer next should be carried out in plate shape substrates S
The state in region.It is generally shorter than time required for cleaning in addition, gradually carry the required time, the state in Fig. 3 (5)
Under gradually carry terminate.
From the state of Fig. 3 (5), control unit sends control signal to upside elevating mechanism 51 and made on the mask 41 of upside
Rise, send control signal to downside elevating mechanism 52 and decline downside mask 42.As a result, as shown in Fig. 3 (6), respectively cover
Film 41,42 returns to the height of initial position of readiness.
Then, control unit makes movable framework 64 further be moved linearly to the side of fixed frame 681.As shown in Fig. 3 (6) that
Sample, now displacement is the distance of the state contacted as each cleaning roller 61,62 with each transferring roller 68.In this condition, control
Portion processed acts the rotary driving source 683 of each transferring roller 68, rotates each transferring roller 68.In each transferring roller 68 and each cleaning roller
61st, there is larger frictional force between 62, therefore by the rotation of each transferring roller 68, and the driven rotation of each cleaning roller 61,62.This
When, the adherence force of the adhered layer on surface of the adherence force than cleaning roller 61,62 of the adhered layer on the surface of transferring roller 68 is higher, therefore
The foreign matter for being attached to cleaning roller 61,62 is shifted and adhered to transferring roller 68.
Then, control unit makes the direction movement that movable framework 64 leaves to each cleaning roller 61,62 from each transferring roller 68, and making can
Dynamic framework 64 returns to initial position of readiness.On the other hand, it is terminated in the cleaning of each cleaning roller 61,62 pairs of each masks 41,42
Afterwards, control unit makes mask 41,42 be close to plate shape substrates S, sends control signal to the shutter of each optical system 3 and beats shutter
Open, make its exposure actions of progress next time.Thus, during exposure actions next time, each transferring roller 68 is from each cleaning
Roller 61,62 shifts foreign matter.Before at the end of the exposure actions next time, transfer action terminates, and movable framework 64 returns initial
Position.Then, the action shown in Fig. 3 (2)~Fig. 3 (6) is similarly repeated.
According to such composition and the embodiment of action, there is provided each in the double-side exposal device of roll-to-roll mode
Mask 41,42 is retained as the practical composition of the state of cleaning.That is, exist between and respectively clean in the state of plate shape substrates S
Roller 61,62 is abutted and rotated with each mask 41,42, and foreign matter is removed.When directly using patent document 1, the construction of patent document 2
When, plate shape substrates S, which turns into, to be hindered, it is therefore necessary to cleaned after temporarily plate shape substrates S is wound.In this composition, arrive
Very time consuming labour before the beginning of cleaning, and the frequency cleaned has to become very low.When excellent in order to carry out
The processing of quality and when improving the frequency of cleaning, can significantly hinder productivity ratio.On the other hand, according to the composition of embodiment,
Each mask 41,42 is cleaned in the state of plate shape substrates S is located in carrying face, therefore, it is possible at the interval of each exposure
Cleaned in (when gradually carrying), in the absence of problem as described above.
In addition, the composition that the cleaning 42 to the opposing party when cleaned in the mask 41 to a side after is cleaned
When, the overall time required for cleaning is elongated, and the influence that productivity ratio is assigned is become unable to enough ignore.However, in embodiment party
In the device of formula, a pair of cleaning rollers 61,62 same times it is mobile and cleaned, therefore the problem of be not present such.
In addition, in the present embodiment, being realized by making a pair of cleaning rollers 61,62 integratedly move of the same period clear
Wash, but this be not necessarily it is necessary.Even if a pair of cleaning rollers 61,62 are moved respectively, as long as but its move the same time carry out,
The problem of can then avoiding hindering productivity ratio.But, as according to the above description, in situation about integratedly moving
Under, move by a mechanism cleaning roller 61,62 of both sides, therefore have the advantages that mechanism is simplified.
In addition, in the above description, illustrate to clean in the interval for plate shape substrates S each exposure, but
It is that the frequency of cleaning can be adjusted for the attachment of each mask 41,42 according to foreign matter.Sometimes often carry out for several times~it is tens of
Secondary exposure and carry out 1 cleaning.
In addition, as the elevating mechanism of mask travel mechanism be used for making each cleaning roller 61,62 relative to each mask 41,
42 contacts.Also for making, device is simplified in mechanism to have contribution to this point.In order that each cleaning roller 61,62 and each mask 41,
42 contacts, can also use the mechanism different from elevating mechanism, but in this case, mechanism becomes complicated, and cost also rises.
In embodiments, in the absence of it is such the problem of.
Also, each cleaning roller 61,62 in the present embodiment, is provided with transferring roller 68, be attached to each cleaning roller 61,
62 foreign matter is shifted to transferring roller 68, therefore the maintenance period of each cleaning roller 61,62 is elongated.Each cleaning roller 61,62 is, attached
More foreign matter and in the case of the removing ability reduction of foreign matter, be removed and cleaned with water and recover ability.
In present embodiment, each cleaning roller 61,62 regularly contacts and carried out the transfer of foreign matter with transferring roller 68.In foreign matter to transferring roller
In the case that 68 attachment quantitative change is more, pass through the maintenance for peelling off one layer of adhesive tape on surface.Therefore, each cleaning roller
61st, the frequency of 62 water cleaning is relatively low, becomes very small to the influence that productivity ratio is produced.
Next, being illustrated to the roll-to-roll double-side exposal device of second embodiment.
Fig. 4 is the perspective sketch of the major part for the roll-to-roll double-side exposal device for representing second embodiment.This
The device of two embodiments and the difference of first embodiment be, the installation constitution of each cleaning roller 61,62 and for phase
The construction contacted for each mask 41,42.
Specifically describe, in this second embodiment, the end of the plug of a pair of cleaning rollers 61,62 is also by dedusting column sections
641 supports.Dedusting column sections 641 are different from first embodiment, and the state of the helical spring 7 as elastomer is clipped between
Under a pair of cleaning rollers 61,62 are supported.That is, a pair of cleaning rollers 61,62 link via helical spring 7.In addition, in Fig. 4,
Omit the diagram of each transferring roller, the fixed frame supported etc..
In each dedusting column sections 641, be provided with up and down a pair of brackets (hereinafter referred to as upper bracket, lower bracket) 71,
72, a pair of connected states of bracket 71,72 are provided with helical spring 7.As shown in Figure 5, a pair of brackets 71,72 with from
The state prominent to X-direction of dedusting column sections 641 is set, and the two ends of the plug to extending along Y-direction are fastened and kept.
In addition, the side of the side protruded in each dedusting column sections 641, a pair of brackets 71,72 is referred to as guide rail.Each bracket
71st, 72 can in the vertical direction it be slided along the guide rail.In addition, the construction of each dedusting column sections 641 is to have in bottom
Bearing plate (ellipsis), in the standby state, lower bracket 72 is carried on bearing plate, and by helical spring 7 by upside
Bracket 71 links with it.Although by upper bracket 71 and the upside cleaning roller 61 supported weight and at helical spring 7
In the state being somewhat compressed, but essentially become the length of drift.
In addition, be provided with limiter 75 in the upper end of each dedusting column sections 641, so that downside mask 42 will not be more than limit
Ground rises.
On construction other than the above, the device of second embodiment is substantially the same with first embodiment.A pair clear
Washing roller 61,62 can integratedly move with movable framework 64, and be provided with fixed frame 681 a pair of transferring rollers 68.
The action of the roll-to-roll double-side exposal device of second embodiment is illustrated as 5 pairs of reference picture.Fig. 5 is table
Show the main view section skeleton diagram of the action of the roll-to-roll double-side exposal device of second embodiment.
As shown in Fig. 5 (1), in this second embodiment, each mask 41,42 is set to be close to plate shape substrates S, by each
Optical system 3 makes the light L from each light source 2 be irradiated by each mask 41,42 and carry out two sides exposure.The exposure once it
Afterwards, as shown in Fig. 5 (2), each mask 41,42 is returned to the position of readiness separated from plate shape substrates S.Then, line mask is entered
The preparation operation of cleaning.
That is, as shown in Fig. 5 (2), roller travel mechanism 63 makes movable framework 64 be moved to X-direction and make a pair of cleaning rollers
61st, 62 positioned at the opposite side of mask 41,42.In the case where observing in X direction, the position should be entered in each mask 41,42
The position of the end in the region of row cleaning.
In this condition, control unit to downside elevating mechanism 52 send control signal, make downside mask 42 rise regulation away from
From.Now, first, as shown in Fig. 5 (3), downside mask 42 is contacted with downside cleaning roller 62.Under downside elevating mechanism 52 makes
Side mask 42 is further up.
Now, downside mask 42 is contacted with downside cleaning roller 62, downside cleaning roller 62 by movable framework 64 with it is upper
Side cleaning roller 61 links, therefore downside elevating mechanism 52 turns into the downside cleaning roller 62 for making to be carried on downside mask 42 and upside
The state that cleaning roller 61 integratedly rises.In addition, now, lower bracket 72 is left and risen from bearing plate.
Then, when the upside cleaning roller 61 as shown in Fig. 5 (4) is abutted with upside mask 41 and is somewhat risen afterwards,
Downside elevating mechanism 52 stops the rising of downside mask 42.The position of upside mask 41 is fixed by upside elevating mechanism 51, because
Rising after cleaning roller 61 is abutted with upside mask 41 on the upside of this, can revolt the elasticity of helical spring 7.That is, upside cleaning roller
61 collide with upside mask 41 and somewhat compress helical spring 7, and downside elevating mechanism 52 make downside mask 42 somewhat on
Rise.
In the state of shown in Fig. 5 (4), as the elasticity by helical spring 7, downside cleaning roller 62 is pressed against down
Side mask 42 and upside cleaning roller 61 are pressed against the state of upside mask 41.In this condition, control unit is to roller moving machine
Structure 63 sends control signal, movable framework 64 is moved predetermined distance round about in X direction.Displacement now, be
Each cleaning roller 61,62 is by the distance required for the area of the pattern R of each mask 41,42.As shown in Fig. 5 (5), when the distance
Mobile end when, control unit to roller travel mechanism 63 send control signal and make to move stopping.When so far mobile,
Each cleaning roller 61,62 driven rotation on each mask 41,42, the foreign matter that will attach to each mask 41,42 is removed.
Next, control unit sends control signal to downside elevating mechanism 52, as shown in Fig. 5 (6), make downside mask
42 drop to initial height.As a result, upside cleaning roller 61 is left from upside mask 41, and downside cleaning roller 62 is from downside mask 42
Leave.In addition, lower bracket 72 turns into the state for being carried on bearing plate, helical spring 7 turns into substantially drift.
Then, same with first embodiment, control unit makes movable framework 64 further move in X direction, and such as Fig. 5
(6) each cleaning roller 61,62 is made to be contacted with each transferring roller 68 shown in like that.Then, move the rotary driving source 683 of each transferring roller 68
Make, the foreign matter in each cleaning roller 61,62 is shifted to each transferring roller 68.Then, control unit makes movable framework 64 be treated to initial
Put return in seat in the plane.Then, when ensuing end exposure once, same cleaning action is repeated.In addition, implementing with first
Mode is same, and the carrying with the plate shape substrates S at the interval exposed every time overlappingly carries out above-mentioned cleaning action in time.
According to it is such composition and action second embodiment roll-to-roll double-side exposal device, cleaning when, respectively
Cleaning roller 61,62 is suitably adjusted relative to the press pressure of each mask 41,42 by helical spring 7.That is, upside cleaning roller 61
The rising of downside mask 42 after being abutted with upside mask 41, the elastic form as resistance helical spring 7, therefore pass through
The climb is suitably adjusted, thus the elastic force of helical spring 7 is adjusted, to each cleaning roller 61,62 to each mask
41st, 42 abutting pressure is adjusted.Therefore, it will not be unable to be sufficiently carried out the removing of foreign matter due to insufficient pressure, or
Person damages mask 41,42 due to excessive pressure.
In the first embodiment, by as making each cleaning roller 61,62 be held in dedusting column sections 641 via elastomer
Construction, can also obtain same effect.But, compared with first embodiment, the construction of second embodiment is only to lead to
Cross rises downside mask 42 using downside elevating mechanism 52, it becomes possible to each cleaning roller 61,62 is abutted with each mask 41,42,
Helical spring 7 is one.Therefore, constructively become succinct.
Next, being illustrated to the 3rd embodiment.
Fig. 8 is the perspective sketch of the major part of the roll-to-roll double-side exposal device of the 3rd embodiment.3rd implements
The device of mode and the difference of first, second embodiment are that cleaning device possesses except electrical equipment 81,82.Except electrical equipment 81,82
It is the utensil for before washing removing the electrostatic on each mask 41,42 surfaces.In the present embodiment, except electrical equipment 81,82 is electricity
From device.Electro-dissociator is to irradiate ion to mask 41,42 and make it with charging neutrality to be de-energized.There are various sides in electro-dissociator
Formula, can suitably select and use, for example, can use the type for releasing air ionization by DC or AC electric discharges.
As shown in Figure 8, except electrical equipment 81,82 is as generally bar-shaped part, alongst it is provided with releasing
Multiple nozzles 83 of ion.In the present embodiment, used as upside mask 41 and be provided with upside and remove electrical equipment 81, be used as downside
Mask 42 is used and is provided with downside and removes electrical equipment 82.Upside remove electrical equipment 81 so that each nozzle 83 towards upside posture configure, downside
Except electrical equipment 82 so that each nozzle 83 is set towards the posture of downside.Equally supported except electrical equipment 81,82 by movable framework 64 for a pair, energy
It is enough integratedly to be moved with the movement of movable framework 64.In addition, a pair are arranged at carrying face positioned at its it except motor 81,82
Between height.Thus, in the action of device, as there is plate shape substrates S state between motor 81,82 is removed for a pair.
In the third embodiment, be also each time exposure interval in wiper mechanism 6 acted.Control unit is each clear
Wash in the state of roller 61,62 is abutted with each mask 41,42 movable framework 64 is moved in X direction and make each cleaning roller 61,62 from
Dynamic rotation, is thus cleaned.Now, control unit makes respectively except electrical equipment 81,82 is acted.As understood according to Fig. 8, respectively except electricity
Device 81,82 is arranged in front of moving direction, therefore respectively except electrical equipment 81,82 is first in each mask 41,42 compared with each cleaning roller 61,62
Front pass through.That is, before each cleaning roller 61,62 is cleaned, by the table for respectively removing electrical equipment 81,82 pairs of each masks 41,42
Face is de-energized.Therefore, the cleaning performance of each cleaning roller 61,62 is further improved.
Further illustrate, mask 41,42 is glass system as quartz glass, and can be powered.Thus, sometimes by electricity
The foreign matter Electrostatic Absorption of medium formation is also adsorbed with foreign matter as powered dust sometimes in mask 41,42.Such different
In the case of thing, the adhesive force to mask 41,42 is stronger, it is thus possible to which existing only can not by rotating cleaning roller 61,62
Situation about enough removing.In the present embodiment, except electrical equipment 81,82 enters the electricity that removes on the surface of line mask 41,42, therefore foreign matter in advance
Electrostatic Absorption be released from or as very small absorption affinity.Therefore, it is possible to reliable by the adherence force of cleaning roller 61,62
Ground is removed.
In addition, it is same with first embodiment, it is also that movable framework 64 (is moved in movement toward road in the third embodiment
It is dynamic) to each cleaning roller 61,62 towards the somewhat position in outside in the area of the pattern R of an each mask 41,42 square end portion after,
Contact and cleaned with each mask 41,42 during reversion retrogressing (multiple road movement).Thus, it is possible to each toward making during the movement of road
Except electrical equipment 81,82 is acted, it can also act it in the both sides moved toward road and multiple road is moved.
Anyway, in the third embodiment, roller travel mechanism 63 is used for the movement of deduster 81,82, therefore
Mechanism simplifying can also be made by this point.
In the respective embodiments described above, the length (length of Y-direction of the part with adhered layer of each cleaning roller 61,62
Degree), it is suitable with the length of the area of the pattern R of each mask 41,42 Y-direction, and only area of the pattern R is cleaned, but
Each cleaning roller 61,62 can be made elongated and make displacement elongated, thus area of the pattern R bigger region is cleaned.
Alternatively, it is also possible to make in not only being moved on multiple road but also also each cleaning roller 61,62 and each mask in being moved toward road
41st, 42 contact and cleaned.But, when compared with the situation with being only moved to cleaning starting position, respectively cleaned in cleaning
Roller 61,62 can be moved with slower speed.Therefore, when by it is reciprocal it is mobile cleaned when, production interval time is elongated.By
This, when considering productivity ratio, in the case of unwanted, preferably as only by toward road or only passing through the cleaning on multiple road.
In addition, in the present invention or by being close to for being evacuated between each mask 41,42 and plate shape substrates S
The way of contact being exposed under state.In the case of the way of contact being evacuated, due to easily assembling the foreign matter of surrounding,
Therefore the meaning of mask wiper mechanism 6 is larger as possessing each embodiment.In addition, for carry out each mask 41,42 with
The device of the exposure for the neighbouring mode being exposed as defined in being formed between plate shape substrates S while small gap, the present invention is same
Sample can be implemented.
In addition, in the respective embodiments described above, each cleaning roller 61,62 carries out driven rotation, but it is also possible to possess rotation and drive
Dynamic source and carry out active rotation.In this case, additionally it is possible in view of following composition：Driven by the rotation of such active rotation
It is dynamic, thus utilize the frictional force between each mask 41,42 to move.But, in the case where carrying out active rotation, hold
Larger reaction, frictional force easily are applied to each mask, damage of each mask etc., therefore preferably driven rotation is easily produced.
In addition, in the case where each cleaning roller 61,62 possesses rotary driving source, in the contact with each transferring roller 68, each transfer sometimes
Roller 68 is used as driven voller.
Claims (12)
1. a kind of roll-to-roll double-side exposal device, the plate shape substrates of roll are pulled out and regulation are irradiated to the two sides of the plate shape substrates
The light of pattern and be exposed, it is characterised in that possess：
Handling system, the plate shape substrates of roll are pulled out and carried in exposure area by ground；
A pair of masks, across exposure area configuration；And
A pair of masks are cleaned by mask wiper mechanism,
Mask wiper mechanism possesses：
A pair of cleaning rollers, surface has adhered layer；And
Roller travel mechanism, makes each cleaning roller rotate side movement in each mask top, thus removes foreign matter from each mask,
Roller travel mechanism is to exist to make each cleaning roller same from a lateral opposite side of each mask in the state of plate shape substrates between
The mechanism moved to period.
2. roll-to-roll double-side exposal device as claimed in claim 1, it is characterised in that
Above-mentioned roller travel mechanism is the mechanism for making above-mentioned each cleaning roller integratedly move.
3. roll-to-roll double-side exposal device as claimed in claim 1 or 2, it is characterised in that
Above-mentioned each cleaning roller possesses the elasticity for making elastic reaction when being contacted with above-mentioned each mask and improving the pressing force to mask
Body.
4. roll-to-roll double-side exposal device as claimed in claim 1 or 2, it is characterised in that
Mask travel mechanism is provided with, the mask travel mechanism is so that above-mentioned each mask is moved and made towards above-mentioned plate shape substrates
Above-mentioned each mask is moved from the remote mode of above-mentioned plate shape substrates,
Above-mentioned each cleaning roller is located at than above-mentioned each mask closer to the side of above-mentioned plate shape substrates,
Mask travel mechanism is that above-mentioned each mask can be made to be moved towards above-mentioned plate shape substrates and it is connect with above-mentioned each cleaning roller
Tactile mechanism.
5. roll-to-roll double-side exposal device as claimed in claim 4, it is characterised in that
Above-mentioned each cleaning roller possesses elastomer,
Above-mentioned mask travel mechanism is, when making above-mentioned each mask be contacted with above-mentioned each cleaning roller, can be located at above-mentioned each mask
By elastomer compress and improve above-mentioned each cleaning roller to the mechanism of the position of the pressing force of above-mentioned each mask, and be can be to above-mentioned
The position of each mask is adjusted and mechanism that the decrement to elastomer is adjusted.
6. roll-to-roll double-side exposal device as claimed in claim 1 or 2, it is characterised in that
Above-mentioned each cleaning roller is located at than above-mentioned each mask closer to the side of above-mentioned plate shape substrates,
Above-mentioned a pair of cleaning rollers are interconnected by framework,
Above-mentioned mask travel mechanism is following mechanism：By making a direction of above-mentioned a pair of masks close to above-mentioned plate shape substrates
Direction is moved, and it is contacted with a side of above-mentioned a pair of cleaning rollers, also, the mask via a side and the cleaning of a side
Roller moves the cleaning roller of the opposing party, thus enables that the cleaning roller of the opposing party is contacted with the mask of the opposing party.
7. roll-to-roll double-side exposal device as claimed in claim 6, it is characterised in that
Above-mentioned a pair of cleaning rollers via elastomer joint,
Above-mentioned mask travel mechanism is above-mentioned another by making via the mask of one side and the cleaning roller of one side
The cleaning roller movement of side, when the cleaning roller of the opposing party is contacted with the mask of above-mentioned the opposing party, one side can be made
Mask, which is located at, to be compressed by elastomer and improves above-mentioned each cleaning roller to the mechanism of the position of the pressing force of above-mentioned each mask, and is energy
Enough positions to the mask of one side are adjusted and mechanism that the decrement to elastomer is adjusted.
8. roll-to-roll double-side exposal device as claimed in claim 4, it is characterised in that
Above-mentioned mask travel mechanism make above-mentioned each mask contacted with above-mentioned plate shape substrates or with specified gap it is opposed
Mechanism.
9. roll-to-roll double-side exposal device as claimed in claim 1, it is characterised in that
A pair of the transferring rollers that can be contacted with above-mentioned a pair of cleaning rollers are provided with,
Each transferring roller has the higher adhered layer of adherence force compared with the adhered layer of above-mentioned each cleaning roller on the surface.
10. roll-to-roll double-side exposal device as claimed in claim 1, it is characterised in that
Be provided with the surface of above-mentioned each mask is de-energized before above-mentioned each cleaning roller is contacted with above-mentioned each mask except electricity
Device.
11. roll-to-roll double-side exposal device as claimed in claim 10, it is characterised in that
Above-mentioned is the electro-dissociator being de-energized to the surface of above-mentioned each mask supply ion except electrical equipment,
Electro-dissociator is configured at the front in the direction of the movement of above-mentioned roller travel mechanism relative to above-mentioned each cleaning roller,
Above-mentioned roller travel mechanism is the mechanism for making electro-dissociator integratedly be moved with above-mentioned each cleaning roller.
12. roll-to-roll double-side exposal device as claimed in claim 6, it is characterised in that
Above-mentioned mask travel mechanism make above-mentioned each mask contacted with above-mentioned plate shape substrates or with specified gap it is opposed
Mechanism.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016018399A JP6811015B2 (en) | 2016-02-02 | 2016-02-02 | Roll-to-roll double-sided exposure device |
| JP2016-018399 | 2016-08-30 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN107024836A true CN107024836A (en) | 2017-08-08 |
| CN107024836B CN107024836B (en) | 2021-01-12 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710059526.0A Active CN107024836B (en) | 2016-02-02 | 2017-01-24 | Roll-to-roll double-side exposure device |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP6811015B2 (en) |
| KR (2) | KR102324021B1 (en) |
| CN (1) | CN107024836B (en) |
| TW (1) | TWI672564B (en) |
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| CN106232867B (en) * | 2014-04-18 | 2019-01-08 | 株式会社尼康 | Film forms equipment, substrate processing apparatus and device producing method |
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- 2017-01-24 CN CN201710059526.0A patent/CN107024836B/en active Active
- 2017-02-01 KR KR1020170014435A patent/KR102324021B1/en active IP Right Grant
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- 2020-08-26 KR KR1020200107903A patent/KR102443971B1/en active IP Right Grant
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| JP2015034846A (en) * | 2013-08-07 | 2015-02-19 | 株式会社清和光学製作所 | Vertical type film exposure apparatus |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN107561873A (en) * | 2017-08-23 | 2018-01-09 | 江西凯强实业有限公司 | A kind of ink exposure technology for lifting aligning accuracy efficiency |
| CN107971261A (en) * | 2017-11-23 | 2018-05-01 | 深圳市华星光电技术有限公司 | Cleaning device |
| CN107971261B (en) * | 2017-11-23 | 2021-03-02 | Tcl华星光电技术有限公司 | Cleaning device |
| CN110769608A (en) * | 2019-11-11 | 2020-02-07 | 江苏上达电子有限公司 | Method and equipment for quickly removing residual copper at two ends of COF substrate |
Also Published As
| Publication number | Publication date |
|---|---|
| KR102324021B1 (en) | 2021-11-09 |
| KR20200103606A (en) | 2020-09-02 |
| KR20170092119A (en) | 2017-08-10 |
| CN107024836B (en) | 2021-01-12 |
| TW201740210A (en) | 2017-11-16 |
| JP6811015B2 (en) | 2021-01-13 |
| JP2017138415A (en) | 2017-08-10 |
| TWI672564B (en) | 2019-09-21 |
| KR102443971B1 (en) | 2022-09-16 |
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