JP2003149791A - Automatic mask cleaning device for automatic exposure device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an automatic mask cleaning device for an exposure device, which automatically cleans wastes of resist, etc., sticking on a mask to facilitate cleaning operation. SOLUTION: A mask M held by exposure mechanisms 3A and 3B is brought into contact with a substrate W held by substrate holder mechanisms 3A and 3B of exposure processing parts 1A and 1B of an automatic exposure device and the substrate W is automatically exposed to a specified pattern through the mask W. It is made possible to clean the top surface of the mask M after the exposure processing by the automatic mask cleaning device 10. This automatic mask cleaning device 10 is equipped with a cleaning unit 20 which is movement controlled in the longitudinal and lateral directions of the mask M and a cleaning roller 23 which can abut against the top surface of the mask M while pivoted rotatably on the cleaning unit 20.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a mask automatic cleaning device of an automatic exposure device in which a predetermined pattern is exposed on a substrate by ultraviolet rays through a mask.

[0002]

2. Description of the Related Art In a conventional automatic exposure apparatus, a predetermined pattern is automatically exposed on a substrate carried by a substrate carrying mechanism by irradiating ultraviolet rays of a predetermined wavelength through a mask. There is. Such an automatic exposure apparatus holds a substrate and a mask in a vertical state, and performs the aligning work and the exposing work, so-called,
A vertical exposure apparatus or a horizontal exposure apparatus that performs alignment work and exposure work in a horizontal state of a substrate and a mask has been proposed.

Since such an automatic exposure apparatus performs exposure processing on a large number of substrates with a single mask, dust or dust, or resist debris may adhere to the mask. Had to be done on a regular basis.

Therefore, conventionally, the mask is removed from the frame frame for the mask holder, or the mask set on the frame frame for the mask holder is made in a cleanable state, and then the surface of the mask is cleaned with a handy type cleaning roller. The current situation is that the cleaning is done manually by hand using one by one.

[0005]

However, in the conventional automatic exposure apparatus, when the cleaning operation is performed, the mask is removed from the frame frame for the mask holder and the like. Therefore, after cleaning, the mask and the substrate are not removed again. Excessive adjustment work has occurred when the mask is removed from the frame frame for the mask holder, such as the necessity of adjusting the alignment.

Further, since the mask is manually cleaned, the worker who performs the cleaning work has various criteria for cleaning, and the cleaning cannot be performed on a stable basis.

Further, when the mask is taken out and the surface is regularly cleaned, there is a problem that the cleaning work is very troublesome because there is not enough working space for the worker to carry out the cleaning work.

The present invention has been made in view of the above-mentioned circumstances, and enables automatic cleaning without taking out the mask and simplifies the cleaning operation. The purpose is to provide.

[0009]

In order to solve the above-mentioned problems, the present invention makes a substrate held on the substrate transfer section side of an exposure processing section face a mask held on the substrate imaging section side. A mask automatic cleaning device used in an automatic exposure device which exposes a predetermined pattern on the substrate through the mask, wherein the cleaning unit is brought into contact with the surface of the mask for cleaning, and the cleaning unit is moved. A drive control means for controlling is provided.

That is, according to the present invention, by adopting the above-mentioned structure, the mask control surface can be moved by the drive control means while the cleaning unit is in contact with the mask surface. For this reason, the resist residue and the like that adhere to the surface of the mask are automatically cleaned.

Further, according to the present invention, in the mask automatic cleaning device of the exposure apparatus, the drive control means moves the cleaning unit in accordance with the vertical width dimension range of the mask and the cleaning unit moves the cleaning unit of the mask. It is characterized in that it is provided with a second moving means for moving according to the width dimension range.

That is, according to the present invention, by adopting the above-described structure, the cleaning unit is moved in the vertical direction according to the vertical width dimension range of the mask to the portion having a large mask area by the first moving means. Then, the second moving unit allows the cleaning unit to be moved in the lateral direction according to the lateral width dimension range of the mask.

Further, according to the present invention, in the mask automatic cleaning device of the automatic exposure device, the cleaning unit faces the mask holder frame and the mask held by the mask holder frame. Thus, it is characterized in that it is installed so as to be retractable from the frame for a substrate holder that holds the substrate.

That is, according to the present invention, by adopting the above-mentioned structure, the cleaning unit installed at the corresponding position between the frame frame for the mask holder and the frame frame for the substrate holder can be used for the mask holder during standby. The mask is arranged at a position distant from the inside of the frame, and when cleaning the mask, the mask can be moved to a position facing the mask to clean the mask.

Further, in the invention, in the mask automatic cleaning device of the automatic exposure device, the cleaning unit suspends the cleaning roller and both end shaft portions of the cleaning roller so as to be independently swingably supported. It is characterized by comprising a pair of swing arms.

That is, according to the present invention, by adopting the above-mentioned structure, the cleaning roller can be always brought into uniform contact with the surface state of the mask.

Further, according to the present invention, in the mask automatic cleaning device of the exposure device, one of the mask holder frame and the cleaning unit is moved in the contacting / separating direction between the mask and the cleaning roller. And

That is, according to the present invention, by adopting the above-described structure, the cleaning roller is separated from the surface of the mask particularly when the cleaning unit is moved in the horizontal direction of the substrate after cleaning in the vertical direction of the substrate. It will be possible. Accordingly, the cleaning unit can be smoothly and easily moved in the widthwise direction of the substrate.

Further, the present invention is the mask automatic cleaning device of the above-mentioned exposure apparatus, wherein the cleaning roller is axially supported by the cleaning unit via an urging means for urging the mask surface in a direction to press the mask surface via a swing arm. It is characterized by being done.

That is, according to the present invention, by adopting the above-mentioned constitution, it becomes possible to bring the cleaning roller into close contact with the surface of the mask through the biasing means at the time of cleaning. This absorbs and relaxes the impact when the mask and the cleaning roller are brought into contact with each other.

Furthermore, the present invention is characterized in that in the mask automatic cleaning device of the above-mentioned automatic exposure device, it is provided with a dirt removing means which comes into contact with and separates from the surface of the cleaning roller at the standby position of the cleaning unit.

That is, according to the present invention, by adopting the above-mentioned structure, when the cleaning unit is moved to the standby position after cleaning the mask by the cleaning roller, the cleaning roller comes into contact with the dirt removing mechanism, for example, the adhesive tape roller. To do. In this state, when the adhesive tape roller is rotated, it becomes possible to automatically remove dust such as resist dust attached to the surface of the cleaning roller.

[0023]

BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described in detail below with reference to the drawings. FIG. 1 is a plan view schematically showing the overall configuration of a vertical automatic exposure apparatus as one embodiment of the automatic exposure apparatus. FIG. 2 is an enlarged side view of essential parts of the vertical automatic exposure apparatus. FIG. 3 is a schematic front view of the mask automatic cleaning device. FIG. 4 is a main part perspective view showing the overall configuration of the cleaning unit. FIG. 5 (a),
FIG. 6B is a schematic side view of a main part showing a contact state of the cleaning unit with the mask.

As shown in FIG. 1, the automatic exposure apparatus 1 includes a first exposure processing section 1A for performing exposure processing on the front surface side of a substrate W,
Second exposure processing unit 1B for performing exposure processing on the back surface side of the substrate W
And mask automatic cleaning devices 10 and 10 which are respectively installed in the first and second exposure processing units 1A and 1B to automatically clean the mask M.

That is, in the automatic exposure apparatus 1, the substrate W loaded in the substrate transport direction X1 by the substrate transport mechanism 2A.
From the horizontal state to the vertical state, the first substrate holder mechanism 3
While holding it on the frame frame 4A for the substrate holder of A,
By horizontally rotating the substrate holder mechanism 3A, the substrate holder mechanism 3A is transported to the exposure position of the first exposure mechanism 5A and the transfer-in position for the second substrate holder mechanism 3B. On the other hand, similarly, the second substrate holder mechanism 3B also holds the substrate W from the first substrate holder mechanism 3A in a vertical state in the substrate holder frame 4B. In this state,
By horizontally rotating the second substrate holder mechanism 3B,
Of the substrate W after being exposed to the exposure mechanism 5B and transferred to the substrate unloading mechanism 2B.
It is configured to be carried out toward.

A mask M is vertically held by the first or second exposure mechanism 5A, 5B via mask holder frame frames 6A, 6B. The mask M has a first or second substrate. The substrates W transferred from the holder mechanisms 3A and 3B face each other in a facing state. Further, at the time of exposure and alignment, the contacting / separating direction Y is set by the first or second drive mechanism 7A, 7B so that the mask M contacts the substrate W.
Is controlled to move. Then, in such a close contact state of the mask M on the substrate W, the optical system 8 performs the exposure process on the substrate W.

Further, in the first and second exposure processing sections 1A and 1B of the automatic exposure apparatus 1 described above, the frame frames 6A and 6 for mask holders of the first and second exposure mechanisms 5A and 5B are provided.
An automatic mask automatic mask cleaning device 10 for automatically cleaning the surface of the mask M held by B is provided.

This mask automatic cleaning device 10 is
As shown in FIG. 3, a cleaning unit 20 described later is provided.
Are frame frames 4A and 4B for the substrate holder of the first and second substrate holder mechanisms 3A and 3B, and frame frames 6A and 6B for the mask holder of the first and second exposure mechanisms 5A and 5B holding the mask M. It is installed so as to correspond to between and.

That is, this cleaning unit 20
Is installed between the substrate holder frame frames 3A and 3B and the mask holder frame frames 6A and 6B so as to be retractable.
When the cleaning unit 20 is on standby, the movement of the mask holder frame frames 6A and 6B is not hindered.

As shown in FIG. 3, the automatic mask cleaning device 10 includes a pair of left and right guide frames 11A, 11A.
B, an elevating frame 12 which is vertically laid between the guide frames 11A and 11B so as to be vertically movable along the vertical width direction Z1 of the mask M, and the elevating frame 12 is provided via a pair of left and right timing belts 13A and 13B. The first servo motor 14A for driving the elevator frame up and down, and the elevator frame 12
Of the mask M, and a pair of left and right sliding frames 16A and 16B supported by the guide shaft 15 and slidable in the lateral width direction Z2 of the mask M. The ball screw 17 for controlling the movement in the lateral direction Z2 and the second servomotor 14B for rotationally driving the ball screw 17 constitute a drive control means for moving the cleaning unit 20 described later.

As shown in FIG. 4, the cleaning unit 20 includes a pair of left and right sliding frames 16A and 16B.
(See FIG. 3) The fulcrum shaft 21 and the fulcrum shaft 2
A pair of left and right swing arms 22 swingably supported by
A and 22B, and a cleaning roller 23 rotatably suspended between the swing arms 22A and 22B.

As shown in FIG. 5 (a), a bracket 24 is fixed to a fulcrum shaft 21 which is horizontally mounted on swinging arms 22A and 22B which pivotally support a cleaning roller 23 of the cleaning unit 20. The bracket 24 is provided with a stopper piece 25, and a pair of upper and lower stoppers 26A, 26B provided on the swing arm 22A, 22B side with the stopper piece 25 interposed therebetween are arranged so as to be adjustable in interval. There is. These stoppers 26A and 26B are
The rotation range of the cleaning roller 23 due to the swing of the swing arms 22A and 22B is restricted. A spring 27 is interposed between the swing arms 22A and 22B and the stopper piece 25 of the bracket 24, and the biasing force of the spring 27 keeps the cleaning roller 23 in contact with the surface of the mask M. I am urged to be done.

That is, the pair of right and left swing arms 22A,
The cleaning roller 23 suspended between 22B is shown in FIG.
As shown in (b), the mask M is connected to the first or second driving mechanism 7A, 7B (see FIG. 1) via the first or second driving mechanism 7A, 7B.
Frame 6 for the mask holder of the exposure mechanisms 5A and 5B
When they come into contact with each other due to the movement of A and 6B, they have a cushioning function of rotating so as to absorb the pressing force. The swing arms 22A and 22B that pivotally support the shaft portions at both ends of the cleaning roller 23 are pivotally supported by the fulcrum shaft 21 so as to swing independently of each other. As a result, even when the surface of the cleaning roller 23 is not in parallel contact with the surface of the mask M, the swinging action of the swinging arms 22A and 22B causes the cleaning roller 23 to move. It is possible to always adhere the mask M in parallel and evenly.

On the other hand, the lowermost portion of the automatic mask cleaning device 10, that is, the first and second exposure mechanisms 5A and 5B.
As shown in FIG. 3, at a position apart from the cleaning roller 23 of the cleaning unit 20, after the mask M is cleaned, a dirt removing mechanism for removing resist residue or the like adhering to the cleaning roller 23 of the cleaning unit 20. 30 are installed.

The dirt removing mechanism 30 includes an adhesive tape roller 31 with which the cleaning roller 23 comes into contact when the cleaning unit 20 moves downward, a support frame 32 for rotatably supporting the adhesive tape roller 31, and this support frame. A pressure cylinder 33 for vertically driving 32,
The third servo motor 14C is configured to rotate the adhesive tape roller 31 pivotally supported by the support frame 32.

In this case, the pressure cylinder 33 adjusts the contact pressure of the adhesive tape roller 31 with respect to the cleaning roller 23 by raising the support frame 32 when the cleaning roller 23 and the adhesive tape roller 31 are in contact with each other. Has become. Also, the adhesive tape roller 31
For example, one or a plurality of adhesive tapes may be wound around the roller body so that they can be peeled off and replaced.

Next, the procedure for cleaning the surface of the mask M by the automatic mask cleaning device 10 will be described with reference to FIG.
And FIG. 7 will be described. FIG. 6 is a schematic front view showing a cleaning control state of the mask surface by enlarging a main part. FIG. 7 is an explanatory view schematically showing the movement control state of the mask in the contact / separation direction with respect to the cleaning roller due to the movement of the exposure mechanism during the mask cleaning.

In this case, the first and second exposure mechanisms 5A,
Automatic mask cleaning device 10 installed in 5B
The operation of is the same, so only one will be described. First, after the exposure of the substrate W by the optical system 8 is completed, the vertical width of the mask M is displayed on a controller panel (not shown) in a separated state between the first exposure mechanism 5A and the first substrate holder mechanism 3A by the first drive mechanism 7A. And the data in which the width dimension range is set, and the cleaning operation by the cleaning unit 20 is set according to the height dimension and width dimension range of the mask M.

At this time, the cleaning unit 20 is
A position away from the mask holder frame 6A of the first exposure mechanism 5A, for example, in the vicinity of a contact position between the cleaning roller 23 and the adhesive tape roller 31 shown in FIGS. 3 and 6, that is, as shown in FIGS. It is positioned below the first exposure mechanism 5A as indicated by the dotted line, and stands by so that it can freely project and retract toward the surface of the mask M held by the mask holder frame frame 6A.

At this standby position, the elevating frame 12 is raised by driving the first servomotor 14A via the timing belts 13A and 13B. As a result, the cleaning unit 20 provided on the elevating frame 12 also rises, and the cleaning roller 23 pivotally supported by the cleaning unit 20 rises to the uppermost end of the mask M.
Then, by rotating the ball screw 17 by driving the second servo motor 14B, the cleaning unit 20 is positioned corresponding to one end of the mask M in the lateral width direction Z2.

Then, the first exposure mechanism 5A is moved forward by the first drive mechanism 7A toward the first substrate holder mechanism 3A side, and the mask M held by the mask holder frame 6A is transferred to the cleaning roller 23. After abutting against the urging force of the spring 27, the timing belts 13A and 13B are driven by the driving of the first servomotor 14A to lower the elevating frame 12. At this time, the cleaning unit 20 provided on the elevating frame 12 also descends, and the cleaning roller 23 follows and rotates while elastically contacting the surface of the mask M by the urging force of the spring 27. Next, the cleaning unit 20 is lowered to the lowermost end side of the mask M, so that the surface of the mask M is cleaned.

When the cleaning unit 20 reaches the lowermost end side of the mask M, the driving of the first servomotor 14A is stopped, and the cleaning operation by the cleaning unit 20 is temporarily stopped.

In this case, when the length of the cleaning roller 23 is shorter than the dimension of the mask M in the widthwise direction Z2,
As shown in FIG. 7, the first exposure mechanism 5A is driven by the first drive mechanism 7A to be temporarily retracted, the mask M is separated from the cleaning roller 23, and their contact state is released. Then, in this state, the first servomotor 1
Drive timing belts 13A and 13B at 4A,
The cleaning unit 20 is raised, and the cleaning roller 23 at the lowermost position of the mask M is again raised to the uppermost end of the mask M. Next, by rotating the ball screw 17 by driving the second servo motor 14B, the cleaning unit 20 is moved toward the other side of the mask M in the lateral width direction Z2, and the cleaning roller 23 is moved to the remaining cleaning range. Mask M
Position corresponding to the surface of.

Then, the first exposure mechanism 5A is moved forward again by the drive of the first drive mechanism 7A, and the mask M is brought into contact with the leaning roller 23 again. Then, the timing belts 13A and 13B are driven by the first servomotor 14A, the cleaning unit 20 is lowered in the vertical width direction Z1 of the mask M, and the cleaning roller 23 is rotated again following the horizontal width of the mask M. Cleaning of the remaining cleaning range in the direction Z2 is performed. As a result, the entire surface of the mask M is cleaned.

After completion of such cleaning work, as shown in FIGS. 6 and 7, the cleaning unit 20 is lowered to a position (standby position) corresponding to the lowermost portion outside the first exposure mechanism 5A for cleaning. The roller 23 is brought into contact with the adhesive tape roller 31 of the stain removing mechanism 30 and stopped. In this state, the adhesive tape roller 31 is rotated by the driving of the third servomotor 14C, and the cleaning roller 23 is rotated following the rotation of the adhesive tape roller 31 to remove the resist adhered to the surface of the cleaning roller 23. Dust such as dust is transferred and removed to the adhesive tape roller 31 side, and the cleaning roller 23 is cleaned.

In this case, the contact pressure between the cleaning roller 23 and the adhesive tape roller 31 depends on the adhesive tape roller 31.
It is adapted to be adjusted by an elevating operation by a pressurizing cylinder 33 that elevates and lowers the support frame 32 that pivotally supports.

When the dimension of the mask M in the widthwise direction Z2 is shorter than the length of the cleaning roller 23, the cleaning roller 23 is lowered without moving in the widthwise direction Z2 of the mask M and the surface of the mask M is moved down. Perform backward cleaning. After cleaning, the cleaning unit 20 is replaced with the cleaning roller 2
3 is stopped at the position corresponding to the lowermost part where the adhesive tape roller 31 comes into contact. In this state, the third servo motor 1
By driving 4C, the adhesive tape roller 31 is rotated, and dust such as resist residue attached to the surface of the cleaning roller 23 is transferred and removed to the adhesive tape roller 31, and the cleaning roller 23 is cleaned.

By the way, the cleaning roller 23
Has a length of 300 mm and a diameter of 50 mm, and is set to about ½ of the diameter of the adhesive tape roller 31. The adhesive tape roller 31 efficiently removes dust and the like adhering to the surface of the cleaning roller 23. I am trying.
The mask M has a thickness of 100 to 200 μm,
The entire circumference of the substrate W is set to be larger than the maximum size, for example, 530 × 630 mm by about 1 inch, and the substrate W is vertically or horizontally long with respect to the mask holder frame frame 6A.

Further, as shown in FIGS. 6 and 7, the first
The spacers S attached to the surface of the mask M held by the frame frame 6A for the mask holder of the exposure mechanism 5A depending on the size of the substrate W have a thickness of several millimeters for a thickness of 100 to 200 μ of the mask M. Thick ones are placed. In this case, the cleaning roller 23 is set by the operation panel so as to run at a position where the spacer S attached to the surface of the mask M is avoided.

In the above embodiment, the first
The contact and separation operation of the mask M held by the mask holder frame frames 6A and 6B of the second exposure mechanisms 5A and 5B and the cleaning roller 23 of the cleaning unit 20 is performed by the first and second substrate holder mechanisms 3A and 3B. An example using the movement control of the first and second exposure mechanisms 5A and 5B with respect to the substrate W held on the substrate holder frame frames 4A and 4B has been described. However, the present invention is not limited to this, and the movement of the automatic mask cleaning device 10 or the cleaning unit 20 is controlled by a separate drive mechanism so that the cleaning roller 23 of the cleaning unit 20 comes into contact with or separates from the mask M. You may make it the structure which carries out movement control.

Further, in the above-described embodiment, the cleaning unit 20 of the automatic mask cleaning device 10 is moved up and down in the vertical direction corresponding to the vertical width direction Z1 of the mask M to be projected and retracted, but left and right corresponding to the horizontal direction Z2 of the substrate. You may make it appear and disappear by moving in a direction.

Further, in the above-described embodiment, the vertical type automatic exposure apparatus has been described as an example, but the present invention can be applied to a horizontal type automatic exposure apparatus. Needless to say, various modifications can be made without departing from the scope of the present invention.

[0053]

As described above, the mask automatic cleaning device of the automatic exposure apparatus according to the present invention has the following excellent effects.

Since the automatic mask cleaning device of the automatic exposure device is equipped with a cleaning unit for contacting the surface of the mask for cleaning and a drive control means for controlling the movement of the cleaning unit, it is removed from the mask holder frame. Without this, it is possible to automatically clean the residue and the like of the resist adhering to the mask. As a result, the regular manual cleaning work is omitted as in the prior art, so that the cleaning work can be simplified. Further, the mask can be cleaned under stable cleaning conditions.

Further, in the automatic mask cleaning apparatus of the automatic exposure apparatus, the drive control means is provided with the first and second moving means for moving the cleaning unit according to the vertical and horizontal width dimension ranges of the mask. Regardless of its size, its surface can be properly cleaned.

Further, in the automatic mask cleaning device of the automatic exposure apparatus, since the cleaning unit is installed so as to be retractable between the mask holder frame and the facing substrate holder frame, the cleaning unit is in the standby state. The mask holder frame can be arranged at a position apart from the inside of the mask holder frame, and does not hinder the movement of the mask holder frame.

Further, in the automatic mask cleaning device of the automatic exposure device, since the cleaning roller is pivotally supported by the rocking arm, the cleaning roller is always brought into contact with the mask evenly according to the surface condition of the mask. It can be cleaned while standing.

Further, in the mask automatic cleaning device of the automatic exposure device, one of the mask holder frame and the cleaning unit is moved in the contact and separation direction between the mask and the cleaning roller. The cleaning roller can be separated from the surface of the mask when the cleaning unit is moved in the width direction of the mask after cleaning in the width direction. As a result, the cleaning unit can be smoothly and easily moved in the widthwise direction of the mask.

Further, in the automatic mask cleaning device of the automatic exposure device, the cleaning roller is axially supported by the cleaning unit through the biasing means for biasing the cleaning roller in the direction of pressing the mask surface through the swing arm. At the time of cleaning, the cleaning roller can be brought into close contact with the surface of the mask uniformly, and the impact when the mask and the cleaning roller are brought into contact with each other can be absorbed and mitigated without damaging the surface of the mask.

Furthermore, since the mask automatic cleaning device of the automatic exposure device is provided with the dirt removing means which comes into contact with and separates from the surface of the cleaning roller at the standby position of the cleaning unit, cleaning is performed after cleaning the mask by the cleaning roller. It is possible to automatically remove dust such as resist dust attached to the surface of the roller.

[Brief description of drawings]

FIG. 1 is a plan view schematically showing an overall configuration of a vertical automatic exposure apparatus as an embodiment of an automatic exposure apparatus applied to the present invention.

FIG. 2 is an enlarged side view of essential parts of a vertical automatic exposure apparatus according to the present invention.

FIG. 3 is an enlarged explanatory view of a main part schematically showing the overall configuration of the automatic mask cleaning device according to the present invention.

FIG. 4 is a main part perspective view showing the overall configuration of a cleaning unit according to the present invention.

5A and 5B are enlarged views of a cleaning unit according to the present invention, FIG. 5A is a schematic side view of a main part, and FIG. 5B is a schematic side view of a main part showing a state where a cleaning roller is in contact with and separated from a mask. .

FIG. 6 is a schematic front view showing an enlarged main part of a cleaning control state of a mask surface by a cleaning roller of a cleaning unit according to the present invention.

FIG. 7 is an explanatory view schematically showing a movement control state of a mask with respect to a cleaning roller in a contact / separation direction by movement of an exposure mechanism during mask cleaning according to the present invention.

[Explanation of symbols]

1 ... Automatic exposure device 1A ... first exposure processing section 1B ... second exposure processing section 2A: substrate transfer mechanism 2B: Substrate unloading mechanism 3A ... first substrate holder mechanism 3B ... second substrate holder mechanism 4A: Frame frame for substrate holder 4B: Frame frame for substrate holder 5A ... first exposure mechanism 5B ... second exposure mechanism 6A: Frame frame for mask holder 6B: Frame frame for mask holder 7A ... first drive mechanism 7B ... second drive mechanism 8: Optical system 10: Automatic mask cleaning device 11A ... Guide frame 11B ... Guide frame 12 ... Lifting frame 13A ... Timing belt 13B ... Timing belt 14A ... first servo motor 14B ... second servo motor 14C: third servo motor 15 ... Guide shaft 16A …… Sliding frame 16B …… Sliding frame 17 ... Ball screw 20 ... Cleaning unit 21 ... fulcrum axis 22A ... Swinging arm 22B ... Swinging arm 23 ... Cleaning roller 24 …… Bracket 25: Stopper piece 26A ... Stopper 26B ... Stopper 27 ... Biasing means (spring) 30: dirt removing means (dirt removing mechanism) 31 ... Adhesive tape roller 32 ... Support frame 33 ... Pressure cylinder M: Mask S: Spacer W: substrate X1 ... Board transfer direction X2: Board unloading direction Y: Direction of contact Z1 ... Mask vertical direction Z2: Mask width direction

Claims (7)

[Claims] 1. A substrate held on the substrate transfer unit side of an exposure processing unit is opposed to a mask held on the substrate imaging unit side, and a predetermined pattern is exposed on the substrate through this mask. A mask automatic cleaning apparatus used in an automatic exposure apparatus, comprising: a cleaning unit that abuts on a surface of the mask for cleaning; and a drive control unit that controls movement of the cleaning unit. Mask automatic cleaning device. 2. The drive control means comprises: first moving means for moving the cleaning unit according to a vertical width dimension range of the mask; and first moving means for moving the cleaning unit according to a horizontal width dimension range of the mask. 2. The automatic mask cleaning device for an automatic exposure apparatus according to claim 1, further comprising two moving means. 3. The substrate frame frame for holding the substrate, wherein the cleaning unit holds the substrate so that the mask holder frame holding the mask and the mask held by the mask holder frame face each other. The mask automatic cleaning device of the automatic exposure apparatus according to claim 1 or 2, wherein the mask automatic cleaning device is installed so as to be retractable between and. 4. The cleaning unit comprises: a cleaning roller; and a pair of swing arms that suspend and support the shaft portions of both ends of the cleaning roller so as to swing independently. An automatic mask cleaning apparatus for an automatic exposure apparatus according to any one of claims 1 to 3. 5. The method according to claim 3, wherein any one of the mask holder frame and the cleaning unit is moved in a contacting / separating direction between the mask and the cleaning roller. Mask automatic cleaning device for automatic exposure equipment. 6. The cleaning roller is pivotally supported on the cleaning unit via a biasing means for biasing the mask surface in a direction of pressing the mask surface via the swing arm. Alternatively, the mask automatic cleaning device of the automatic exposure device according to claim 5. 7. The automatic apparatus according to claim 4, further comprising a dirt removing unit that comes into contact with and separates from a surface of the cleaning roller at a standby position of the cleaning unit. Automatic mask cleaning device for exposure equipment.