JP2008018517A - Method and device for washing substrate - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a method for washing a substrate while polishing the surface of the substrate by the polishing sheet, which miniaturizes and saves on weight, and simplifies the feed mechanism of a polishing sheet while reducing costs, and which is suitable for a small-sized substrate such as a small-sized liquid crystal panel. <P>SOLUTION: A sheet unit 41, in which the polishing sheet 49 is tightly wound around the periphery of a circular roll-like supporting member 47, is moved across the entire face of the substrate 1 while being gradually moved circularly in the state where the polishing sheet 49 contacts with the surface of the substrate, thereby performing washing operation to a plurality of substrates 1 repeatedly. The supporting member 47 is rotated by a prescribed angle periodically, thereby changing the contact part of the polishing sheet 49 to the substrate 1 and continuing the operation in the method for washing the substrate. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  The present invention relates to a substrate cleaning method and apparatus using an abrasive sheet, and more specifically, a cleaning method suitable for cleaning a small substrate such as a small liquid crystal panel in which the head portion is downsized and the abrasive sheet is easily fed. And an apparatus.

  Conventionally, in a process of manufacturing a liquid crystal panel, after bonding two glass substrates, a process of cutting the glass substrate into a predetermined size is performed. At this time, glass waste called cullet adheres to the liquid crystal panel.

  If the sealant adheres to the surface of the liquid crystal panel during the subsequent liquid crystal injection / sealing operation, the cullet and the sealant are hardened and cannot be easily removed.

  In order to remove the cullet, the surface of the liquid crystal panel is polished and cleaned with a sheet-like polishing member, and subsequently subjected to a washing step with washing water and a drying step, followed by a polarizing plate attaching step. .

As an example of such a cleaning device, a roll-like polishing sheet is supplied from a supply reel, and while being wound around the take-up reel, it is pressed by a support member that makes line contact from the back side of the sheet, and the supply reel and the take-up reel An apparatus for cleaning a substrate by rotating the substrate integrally is disclosed (for example, Patent Document 1).
JP 2002-66899 A

  By the way, recently, mobile devices have been developed, and substrates such as liquid crystal panels used for mobile phones and the like have been produced in many small sizes such as 0.5 to 6 inches. Therefore, a manufacturing apparatus for manufacturing these small liquid crystals is also available. Miniaturization has been demanded.

  However, the conventional sheet cleaning machine as disclosed in Patent Document 1 supplies a roll-shaped polishing sheet from a supply reel, passes through a cleaning portion, and is wound around a recovery reel. There is a problem that a mechanism is necessary, the apparatus itself is enlarged, and miniaturization is difficult.

  In addition, there is a problem that the weight of the cleaning head itself is increased, the output of the driving mechanism of the cleaning unit is required and the cost is increased, and the head of the cleaning unit is increased in size. There is also the problem of many restrictions.

  Further, since the cleaning portion is pressed by the support member together with the two reels of the supply reel and the recovery reel, there is a problem that the sheet feeding mechanism becomes complicated and the replacement work of the sheet takes time.

  In addition, a support member is used for the purpose of bringing the polishing sheet into line contact with the substrate. However, because the support member has a width, the polishing sheet is strictly in surface contact, and the substrate is damaged by dragging foreign matter at the polishing portion. There was also a problem.

  Further, since the feeding of the polishing sheet is adjusted by the supply reel and the take-up reel, there is a problem that the sheet is easily slackened when the balance of the feeding amount is out of order, and cleaning is not performed efficiently.

  Further, since it is necessary to rotate the entire take-up sheet during a polishing motion for polishing, there is a problem that it is not suitable for cleaning a small substrate such as a small liquid crystal panel.

  On the other hand, as another method for reducing the size of the apparatus, there is a method in which a polishing sheet is attached to a flat polishing sheet support member and the polishing sheet is periodically replaced. However, the polishing sheet is in surface contact. Therefore, there is a problem that the substrate is damaged by dragging the foreign material when the foreign material is caught, and there is a problem that the replacement frequency of the polishing sheet is increased and it is not suitable for mass production.

  Accordingly, an object of the present invention is to solve the above-described problems, reduce the size and weight of the polishing sheet feeding mechanism, simplify the feeding of the polishing sheet, and is suitable for a small substrate such as a small liquid crystal panel. It is an object of the present invention to provide a substrate cleaning method and apparatus which are costly.

  In order to solve the above problems, the invention of claim 1 is a substrate cleaning method in which cleaning is performed while polishing the substrate surface with the polishing sheet, and the polishing sheet is closely attached to the outer periphery of the circular roll-shaped support member. Repeatedly wash the sheet unit while moving it over the entire surface of the substrate while making a small circular motion while the polishing sheet is in contact with the surface of the substrate. In this configuration, the work is continued by rotating the support member by a predetermined angle to change the contact portion of the polishing sheet with the substrate.

  According to a second aspect of the present invention, there is provided a substrate cleaning apparatus having an adsorption table for adsorbing and fixing a substrate, and a driving mechanism for performing a polishing movement while bringing the polishing sheet into contact with the substrate surface on the adsorption table. It is provided in a sheet unit that can be freely attached to and detached from, and is normally wound and wound in close contact with the outer periphery of a circular roll-shaped support member that can be rotated by a predetermined angle by an appropriate means. A configuration is adopted in which the unit can be moved over the entire surface of the substrate while making a circular motion.

  According to a third aspect of the present invention, in the substrate cleaning apparatus according to the second aspect, the sheet unit rotates in conjunction with the rotation of the support member, and the engagement force against the gear is biased against the engagement force. There is a fixed claw that can be detached from the gear, and a rack that engages the gear and a mechanism that disengages the fixed claw from the gear are provided outside the seat unit, and the gear and the rack of the seat unit are engaged. At the same time, with the fixed claw detached from the gear, the seat unit and the rack are moved relative to each other to rotate the gear so that the support member is rotated at a predetermined angle.

  According to the invention of claim 1, since the support member of the polishing sheet is formed in a circular roll shape, the polishing sheet is in contact with the substrate in a line contact state, and the sheet unit is cleaned by making a small circular motion. Therefore, even if a foreign object is bitten, it is not dragged and the substrate is not damaged.

  Further, since the polishing sheet is fixed in close contact with the support member, the polishing sheet does not sag, and the substrate surface can be effectively cleaned.

  Furthermore, by periodically rotating the support member, it is possible to change the portion of the abrasive sheet used, and since the abrasive sheet is used in a line contact state, the rotation angle for feeding the abrasive sheet is small. In addition, the frequency of exchanging the polishing sheet can be reduced, and the work loss during the exchange can be reduced.

  According to the invention of claim 2, since the supporting member of the polishing sheet is formed in a circular roll shape, the polishing sheet is in contact with the substrate in a line contact state, and the sheet unit is cleaned by making a small circular motion. Therefore, even if a foreign object is bitten, it is not dragged and the substrate is not damaged.

  Further, since the polishing sheet is fixed in close contact with the support member, the polishing sheet does not sag, and the substrate surface can be effectively cleaned.

  Further, since the support member is normally fixed and can be rotated at a predetermined angle by an appropriate means, it is possible to change the used part of the abrasive sheet at an appropriate timing, and the abrasive sheet is used in a line contact state. Therefore, the rotation angle for feeding the polishing sheet can be small, the frequency of replacement of the polishing sheet can be reduced, and the work loss at the time of replacement can be reduced.

  Further, since the sheet supply reel and the sheet take-up reel as in the conventional apparatus are eliminated and the sheet unit having the abrasive sheet is made detachable, it is possible to reduce the size without mounting a driving mechanism on the cleaning head unit. The cost can be reduced.

  Furthermore, since the seat unit is detachable, maintenance can be easily performed after removing the seat unit even if the device is downsized, and the polishing sheet can be replaced within the seat unit, replacing the conventional roll-shaped sheet. The sheet can be exchanged more simply than when passing the sheet.

  According to the invention of claim 3, since a mechanism such as a rack for feeding the abrasive sheet is provided in a portion other than the sheet unit, the sheet unit can be reduced in size and weight, and the washing operation can be liberated. Maintenance is also improved.

  In addition, since the support member is rotated by a predetermined angle by relatively moving the seat unit and the rack, by using the moving mechanism for the substrate of the seat unit as it is, placing the rack and gear release mechanism on the extension line, The pitch of the polishing sheet can be easily fed at a low cost.

  FIG. 1 shows an embodiment to which the cleaning device of the present invention is applied. The liquid crystal panel 1 is transported by the transport conveyor 2 from the previous step on the left side in the figure, and appropriate means such as pressing the guide plate at the positioning portion 3. After the positioning is performed, the suction table 6 is transferred to the suction table 6 by the suction transport line 5 that sucks and transports the liquid crystal panel 1 on the machine base 4, and the suction tables 6 are rotated as much as 180 ° by one set. Provided at both ends of the arm, the arm is rotated 180 ° while the liquid crystal panel 1 is adsorbed on the upper surface, and sent to the cutter cleaning unit 7 that removes the cullet on the surface of the liquid crystal panel 1 by the cutter blade.

  The liquid crystal panel 1 cleaned by the cutter cleaning unit 7 returns to the original position by the rotation of the arm provided with the suction table 6 by 180 °, and is again transferred to the suction table 8 by the suction conveyance line 5. The suction table 8 has the same structure as the suction table 6, and the liquid crystal panel 1 is sent to the sheet cleaning unit 9 by rotating the arm 180 ° while the liquid crystal panel 1 is suctioned on the upper surface. The cullet on the surface of the liquid crystal panel 1 is removed by the cleaning using the polishing sheet by the inventive device.

  The liquid crystal panel 1 cleaned by the sheet cleaning unit 9 returns to the original position by 180 ° rotation of the arm of the suction table 8, and is sent to an appropriate reversing mechanism (not shown) by the suction conveyance line 5. The front and back sides are reversed by the mechanism, and then the back side of the liquid crystal panel 1 is cleaned by the same cutter cleaning unit and sheet cleaning unit, and is carried to the next step.

  In addition, the suction tables 6 and 8 are provided at both ends of the rotating arm, respectively, and one set of two units, and while one side is performing the cleaning operation by the cutter cleaning unit 7 and the sheet cleaning unit 9, respectively, On the other side, the delivery of the liquid crystal panel 1 after the work to the suction conveyance line 5 and the reception of the liquid crystal panel 1 to be worked on are performed, and a continuous washing work can be performed in each washing section.

  FIGS. 2 to 4 show the apparatus of the present invention in the sheet cleaning unit 9. The flat machine frame 10 that stands vertically on the machine base 4 has upper and lower parts provided horizontally on the front side. A pair of rail bases 11 are provided, and rails 12 are provided on the rail bases 11 in the horizontal direction.

  Provided on the front side of the machine frame 10 is a support frame 14 that has a slider 13 on the back surface that fits and slides on the two rails 12 and that can be moved laterally along the rails 12. A nut member 15 is provided between the sliders 13 and 13 on the back surface of the support frame 14, and a ball screw 16 provided along the rail 12 is pivotally supported between the rail bases 11 of the machine frame 10. The support frame 14 is laterally moved along the rail 12 in accordance with forward and reverse rotation of a motor 17 that drives the ball screw 16.

  Two rails 18 provided along the vertical direction are provided on the front surface of the support frame 14, and a slider 19 that fits and slides on the rail 18 is provided on the rear surface of the support frame 14. An elevating base 20 that can be freely moved in the vertical direction along the rail 18 is provided, and the cylinder shaft of the elevating cylinder 21 provided on the upper portion of the support frame 14 is connected to the elevating base 20. The lifting base 20 moves up and down with respect to the support frame 14 in accordance with the action of the cylinder 21.

  A drive motor 23 is provided above a fixed frame 22 protruding from the front side of the elevating base 20, and a drive shaft 24 of the drive motor 23 extends below the fixed frame 22 and is connected to a rotary shaft 26 via a coupling 25. The rotary shaft 26 is connected to a fixed base 27 protruding forward at the lower end of the elevating base 20, and is rotatably supported by a bearing 28, and protrudes below the fixed base 27.

  Two X-axis direction slide shafts 29 extending in the left-right direction are fixed below the fixed base 27 so as to sandwich the rotation shaft 26, and the X-axis direction is slidable along the X-axis direction slide shaft 29. A moving frame 31 having slide guides 30 on both front and rear sides and slidable in the X-axis direction is provided, and the rotating shaft 26 is inserted into an opening portion 32 penetrating vertically provided in a central portion of the moving frame 31. Communicates.

  A pair of left and right Y-axis slide shafts 33 extending in the front-rear direction are fixed below the moving frame 31, and Y-axis direction slide guides 34 slidable along the Y-axis direction slide shaft 33 are provided on both sides. An eccentric frame 35 that is slidable in the Y-axis direction with respect to the moving frame 31 is provided.

  An eccentric shaft 36 whose axial center is different from the rotational shaft 26 is connected to the lowermost end of the rotational shaft 26, and the eccentric shaft 36 is rotatably supported on the eccentric frame 35 by a bearing 37. Yes.

  The eccentric frame 35 is configured as described above. When the rotary shaft 26 is rotated by driving the drive motor 23, the eccentric shaft 36 performs a small circular motion with a circular locus while rotating, and the eccentric shaft 36 is moved to the eccentric shaft 36. The eccentric frame 35 connected by the bearing 37 is allowed to move along the Y-axis direction slide shaft 33 in the Y-axis direction, and the moving frame 31 provided with the Y-axis direction slide shaft 33 is arranged in the X-axis direction. By allowing movement along the X-direction slide axis 29, the movements in the X-axis and Y-axis directions are combined, and the entire eccentric frame 35 does not rotate in the θ direction (without changing the direction). A small circular motion in which the trajectory is a circle similar to the eccentric shaft 36 is performed.

  A single swinging shaft 38 extending in the left-right direction is fixed to the lower part of the eccentric frame 35, and a seat unit fixing frame 39 is fixed to the swinging shaft 38 so as to swing back and forth. Further, a pair of fixing bolts 40 for adjusting the level of the seat unit fixing frame 39 are provided between the eccentric frame 35 on both sides of the shaft support portion of the seat unit fixing frame 39 to the swing shaft 38. Yes.

  The sheet unit 41 fixed to the sheet unit fixing frame 39 will be described with reference to FIGS. 5 and 6 as well. A flat fixing frame 42 and an upper surface thereof are arranged in the front-rear direction of the sheet unit fixing frame 39. There is a slide portion 43 that fits into a groove provided in the lower opening (see FIG. 5), and a stopper for stopping the positioning of the seat unit 41 by contacting the seat unit fixing frame 39 at one end portion of the slide portion 43 44 is provided.

  Further, although not shown, the sheet unit fixing frame 39 is provided with a lever that protrudes into the groove, for example, and the flat portion of the slide portion 43 of the sheet unit 41 that has entered the groove is pushed in and fixed as appropriate. Means can be used.

  A shaft 46 rotatably supported by bearings 45 having both ends fixed to the fixed frame 42 is provided at the lower portion of the fixed frame 42, and the shaft 46 is made of a resin concentric with a shaft 46 around the shaft 46. A support member 47 and a rubber roll 48 made of silicon rubber or the like are provided on the outer peripheral surface of the support member 47, and a polishing sheet 49 covers the periphery of the rubber roll 48.

  The polishing sheet 49 is fixed to the supporting member 47 by passing the polishing sheet 49 through the L-shaped slit 51 provided on the fixing plate 50 on the upper side of the supporting member 47 and then attaching the supporting member 47 and the fixing plate 50 to each other. This is done by fastening with the fixing bolt 52.

  In addition, the means for restricting the rotation of the shaft 46 and fixing the polishing position which is the lowermost part of the polishing sheet 49 during polishing can be described with reference to FIGS. 46 is provided on one extension side of 46, and a fixing claw 55 is provided on the support frame 42 so as to be pivotally supported by a shaft 54 so as to be able to mesh with the gear of the gear 53. A spring 58 stretched between the fixed pin 56 and the fixed pin 57 on the fixed claw 55 side urges the force of the fixed claw 55 in the meshing direction with the gear 53 to restrict the rotation of the gear 53. As a result, the rotation of the polishing sheet 49 around the shaft 46 is prevented.

  The operation of replacing the polishing sheet 49 in the sheet unit 41 will be described. First, as shown in FIG. 5A, the entire sheet unit 41 is fixed by sliding the slide portion 43 of the sheet unit 41 in the direction of the arrow. Remove from the frame 39.

  Next, the locking claw 55 is unlocked from the gear 53 by lifting the fixing claw 55 by hand against the force of the spring 58, and the portion of the polishing sheet 49 is rotated by rotating the shaft 46. As shown in FIG. 5B, the fixing plate 50 is turned sideways, and then the fixing bolt 52 is loosened, the fastening of the support member 47 and the fixing plate 50 is released, and the polishing sheet 49 is removed.

  When attaching a new abrasive sheet 49, the abrasive sheet 49 is wound around the outer periphery of the support member 47, and the abrasive sheet 49 is attached to the slits 51 on both sides of the fixed plate 50, as shown in FIGS. Both ends are inserted from the lower side and are passed through to the side, and while being pulled by one side of the polishing sheet 49, it is screwed onto the support member 47 through the fixing bolt 52 from above the fixing plate 50.

  Then, as shown in FIGS. 6C and 6D, the fixing plate 50 and the support member 47 are fastened, and the polishing sheet 49 wound around the support member 47 is sandwiched between the fixing plate 50 and the support member 47. As both ends are pulled, the rubber roll 48 on the outer periphery of the support member 47 is tightly fixed.

  When the liquid crystal panel 1 adsorbed on the suction table 8 is polished by the polishing sheet 49, the mechanism for flowing cleaning water to the polishing surface is the tip of the cleaning nozzle fixing frame 59 extending downward from the side of the support frame 14. A cleaning nozzle 60 is provided in the part, and cleaning water 61 is sprayed toward a portion where the upper surface of the suction panel 8 is polished by the polishing sheet 49.

  A rack 62 and a cylinder 63 are provided as a polishing sheet feeding mechanism for changing the portion of the polishing sheet 49 to be used, immediately below the portion of the support frame 14 moved to the right along the rail 12 shown by a two-dot chain line in FIG. The cylinder 63 has a cylinder shaft 64 protruding upward, and a ball is embedded in the tip of the cylinder shaft 64.

  Next, the operation of the polishing apparatus according to the present invention will be described. The liquid crystal panel 1 transported by the transporting conveyor 2 and positioned by the positioning unit 3 is sucked onto the suction table 6 by the suction transporting line 5 and then the cutter cleaning unit. After the cleaning by the cutter blade in 7, the sheet is sent to the suction table 8 and sent to the sheet cleaning unit 9 while being sucked on the suction table 8.

  In the sheet cleaning section 9, the elevating cylinder 21 acts to lower the support frame 14, and the polishing sheet 49 of the sheet unit 41 is moved from the solid line position in FIG. 2 to the surface of the liquid crystal panel 1 on the suction table 8 at the two-dot chain line position. It descends until it comes into contact.

  Simultaneously with the lowering operation of the polishing sheet 49, the drive motor 23 is driven, the entire sheet unit 41 starts an eccentric circular motion, and further, cleaning water is ejected from the cleaning nozzle 60 and cleaning starts from one end of the liquid crystal panel 1. Is done.

  After the start of cleaning, the support frame 14 is moved to the right by driving the motor 17, so that the sheet unit 41 is also moved to the right, and the polishing sheet 49 is moved over the entire surface of the liquid crystal panel 1 while performing an eccentric circular movement. Thus, caret removal on the surface of the liquid crystal panel 1 is performed.

  FIG. 9 is a top view of the movement of the sheet unit 41 with respect to the liquid crystal panel 1. The sheet unit 41 is moved up and down by the amount of the eccentric distance a of the axis B of the eccentric shaft 36 with respect to the axis A of the rotating shaft 26. The left and right directions do not change and the trajectory performs a circular motion with a small radius of eccentricity a, and the polishing sheet 49 at the lowermost end contacting the liquid crystal panel 1 in a line contact state also has a small radius of eccentric distance a as a whole. The sheet unit 41 moves from the solid line polishing start position to the polishing end position indicated by the two-dot chain line on the right side while performing a smooth circular movement and polishing the surface of the liquid crystal panel 1.

As an example of conditions in the cleaning operation of this embodiment, the eccentric shaft 36 is driven at an eccentric radius a of 0.5 mm and a rotational speed of 2000 rpm, and the pressure applied to the liquid crystal panel 1 is 2 kgf / cm ^2. The polishing sheet 49 uses cerium oxide having a particle size of about 0.5 μm, and removes surface cullet and the like by chemical reaction with glass and physical polishing. The washing water 61 is warm water of 40 to 60 ° C.

  The cleaning conditions of the present invention are not particularly limited, and can be changed as appropriate in consideration of the type and size of the substrate to be cleaned and the purpose of cleaning. For example, the polishing sheet 49 is physically treated with alumina abrasive grains. It is also possible to perform polishing.

  After the entire liquid crystal panel 1 is cleaned by polishing, the suction table 8 that sucks the liquid crystal panel 1 rotates and the paired suction table 8 sucks the liquid crystal panel 1 that performs the next cleaning, and is shown in the figure. The seat unit 41 also moves upward and moves to the left by the action of the elevating cylinder 21 and the drive of the motor 17 to return to the start position, and then starts the next cleaning operation.

  After the cleaning operation for the predetermined number of liquid crystal panels 1 is performed, the polishing position of the polishing sheet 49 is changed.

  The operation of changing the polishing position of the polishing sheet will be described with reference to FIG. 7. First, the support frame 14 shown by the solid line position in FIG. 2 and the components connected thereto are moved to the rail by the rotation of the ball screw 16 driven by the motor 17. 12 to the position of a two-dot chain line immediately above the right rack 62.

  Following the lateral movement of the support frame 14, the lift base 20 is lowered by the operation of the lift cylinder 21, so that the seat unit 41 moves from the position of the two-dot chain line to the solid line position in FIG. The gear 53 comes into contact with and meshes with the rack 62.

  Next, as shown in FIG. 7B, the cylinder shaft 64 is raised by the action of the cylinder 63, and the lower surface portion of the fixed claw 55 is pushed up, so that the fixed claw 55 rotates about the shaft 54 and springs. While extending 58, the engagement with the gear 53 is released.

  When the ball screw 16 is rotated by the rotation of the motor 17 with the cylinder shaft 64 extended, and the support frame 14 is moved to the right side by a small distance, the seat unit 41 is also moved to the right as shown in FIG. According to this movement, the gear 53 meshing with the rack 62 rotates to the right.

  As a result, the support member 47 directly connected to the gear 53 by the shaft 46 also rotates, so that the portion of the lowermost liquid crystal panel 1 on the surface of the polishing sheet 49 is polished.

  At this time, the lower end of the fixed claw 55 with which the tip of the cylinder shaft 64 is in contact is moved. However, since the tip of the cylinder shaft 64 is ball-shaped, the sliding resistance accompanying the movement of the fixed claw 55 is Does not grow.

  After the surface of the polishing sheet 49 is moved, the cylinder shaft 64 is lowered by the action of the cylinder 63 and returned to the position where the fixing claw 55 is engaged with the gear 53 by the action of the spring 58, and the gear 53 is fixed. 2 returns to the position shown by the solid line in FIG. 2 immediately above the suction table 8 by the rise by the action of the lifting cylinder 21 and the lateral movement by the rotation of the motor 17, and performs the sheet cleaning operation by the subsequent polishing.

Each of α ₁ , α ₂ , and α _{3 in} FIG. 8 shows an example of a single feed amount of the polishing sheet 49 by the rotation of the gear 53 of the sheet unit 41, and the rotation angles α ₁ , α ₂ , α ₃ Corresponds to one pitch of the gear 53 and is about 8 to 9 °. However, the portion of the polishing sheet 49 that contacts the liquid crystal panel 1 is a straight line parallel to the shaft 46, so that it can be moved by a slight angle. It is sufficient to use the polishing sheet 49 attached to the sheet unit 41 without changing the polishing sheet 49 over a number of times, that is, α ₁ , α ₂ , α _3. The position can be changed.

  The embodiment of the present invention is as described above. However, the present invention is not limited to the above-described embodiment, and can be implemented with appropriate modifications within the scope of the object of the present invention.

  For example, in the above embodiment, when changing the use position of the polishing sheet 49, the sheet unit 41 is moved to face the rack 62 or the cylinder 63, but the rack or cylinder may be moved to the sheet unit 41 side. Further, the use position changing mechanism of the polishing sheet 49 may be other than the engagement of the gear 53 of the sheet unit 41 and the rack 62. In short, the support member 47 of the sheet unit 41 is moved by a predetermined pitch about the shaft 46. Any mechanism may be used.

  In this embodiment, a concentric roll-shaped member is used as the support member 47 for fixing the polishing sheet 49. However, the present invention is not limited to this shape, and support members 47 having various polygonal shapes can also be used. However, it is preferable to use a concentric roll in the sense that the contact with the substrate is a line contact.

  The entire liquid crystal panel 1 is cleaned by moving the sheet unit 41. However, the suction table 8 holding the liquid crystal panel 1 and the like and the sheet unit 41 only need to move relatively, and only the suction table 8 side. Alternatively, the liquid crystal panel 1 can be cleaned by moving both the suction table 8 and the sheet unit 41.

  Furthermore, the substrate to which the present invention can be applied is not limited to the small-sized liquid crystal panel 1 of the embodiment, and can be applied to cleaning methods and apparatuses using polishing sheets on various substrates.

  Further, in this embodiment, cleaning is performed by a small circular motion, but it is also possible to employ a configuration in which the cleaning head itself is appropriately fully rotated according to the shape of the substrate and the like.

It is a top view which shows one Embodiment to which this invention apparatus is applied. It is a front view of this invention apparatus. It is a partially notched front view showing this invention apparatus. It is the IV-IV direction arrow side view of FIG. 2 showing this invention apparatus. (A) (b) is explanatory drawing showing polishing sheet exchange of this invention. BRIEF DESCRIPTION OF THE DRAWINGS It is explanatory drawing showing polishing sheet replacement | exchange of this invention apparatus, (a) (c) is a partially cutaway side view, (b) (d) is front sectional drawing. (A) (b) (c) is explanatory drawing showing an example of polishing sheet feeding of this invention apparatus. It is an enlarged view showing polishing sheet feeding. It is explanatory drawing showing the washing | cleaning method of this invention.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Liquid crystal panel 2 Conveyor 3 Positioning part 4 Machine stand 5 Suction conveyance line 6 Suction table 7 Cutter washing part 8 Suction table 9 Sheet washing part 10 Machine frame 11 Rail stand 12 Rail 13 Slider 14 Support frame 15 Nut member 16 Ball screw 17 Motor 18 Rail 19 Slider 20 Lifting Base 21 Lifting Cylinder 22 Fixed Frame 23 Drive Motor 24 Drive Shaft 25 Coupling 26 Rotating Shaft 27 Fixed Base 28 Bearing 29 X Direction Slide Shaft 30 X Direction Slide Guide 31 Moving Frame 32 Opening 33 Y Direction Slide shaft 34 Y-direction slide guide 35 Eccentric frame 36 Eccentric shaft 37 Bearing 38 Oscillating shaft 39 Seat unit fixing frame 40 Fixing bolt 41 Sheet unit 42 Fixing frame 43 Slide portion 44 Stopper 45 Bearing 46 Shaft 47 Support member 48 Rubber roll 9 Polishing sheet 50 Fixing plate 51 Slit part 52 Fixing bolt 53 Gear 54 Shaft 55 Fixing claw 56 Fixing pin 57 Fixing pin 58 Spring 59 Cleaning nozzle fixing frame 60 Cleaning nozzle 61 Cleaning water 62 Rack 63 Cylinder 64 Cylinder axis A Rotating shaft axis Core B Eccentric shaft axis a eccentric distance

Claims (3)

  In a method for cleaning a substrate, in which the substrate surface is cleaned while polishing the substrate surface with the polishing sheet, the polishing sheet contacts the surface of the substrate with the sheet unit wound in close contact with the outer periphery of the circular roll-shaped support member. In this state, the cleaning operation is repeatedly performed on a plurality of substrates while moving the entire surface of the substrate while performing a small circular motion, and the support member is periodically rotated by a predetermined angle to contact the polishing sheet with the substrate. A method for cleaning a substrate, characterized in that the operation is continued while changing.   In a substrate cleaning apparatus having an adsorption table for adsorbing and fixing a substrate, and a drive mechanism that performs a polishing motion while bringing the polishing sheet into contact with the substrate surface on the adsorption table, the polishing sheet is detachable from the drive mechanism. It is fixed to the outer periphery of a circular roll-shaped support member that is normally fixed and can be rotated at a predetermined angle by an appropriate means. A substrate cleaning apparatus characterized in that it can be moved over the entire surface of the substrate.   The seat unit includes a gear that rotates in conjunction with the rotation of the support member, and a fixing claw that is urged to engage with the gear and can be detached from the gear against the engaging force. A rack that engages with the gear and a mechanism that disengages the fixing claw from the gear are provided so that the gear of the seat unit and the rack are engaged, and the seat unit and the rack are separated from the gear. 3. The substrate cleaning apparatus according to claim 2, wherein a rotation of a predetermined angle is given to the support member by rotating the gear by relative movement.

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