CN107011813B - 各向异性导电膜的组成物、各向异性导电膜以及使用所述各向异性导电膜的连接结构 - Google Patents
各向异性导电膜的组成物、各向异性导电膜以及使用所述各向异性导电膜的连接结构 Download PDFInfo
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Abstract
Description
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KR1020150173398A KR101900544B1 (ko) | 2015-12-07 | 2015-12-07 | 이방 도전성 필름용 조성물, 이방 도전성 필름 및 이를 이용한 접속 구조체 |
KR10-2015-0173398 | 2015-12-07 |
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JP6776609B2 (ja) | 2016-02-22 | 2020-10-28 | デクセリアルズ株式会社 | 異方性導電フィルム |
CN108130029A (zh) * | 2017-12-22 | 2018-06-08 | 烟台德邦科技有限公司 | 一种uv延迟固化的导电银胶及其制备方法 |
CN109096227B (zh) * | 2018-08-02 | 2022-07-08 | 江苏泰特尔新材料科技股份有限公司 | 一种己内酯改性3,4-环氧环己基甲基-3’,4’-环氧环己基甲酸酯及其制备方法 |
JP7264662B2 (ja) * | 2019-02-13 | 2023-04-25 | シーカ・ハマタイト株式会社 | 導電性組成物 |
JP2021001966A (ja) * | 2019-06-21 | 2021-01-07 | セイコーエプソン株式会社 | 電気光学装置、及び電子機器 |
CN110564337B (zh) * | 2019-09-12 | 2021-06-29 | 天津伟景诺兰达科技有限公司 | 一种acf导电胶带及其制备工艺和应用 |
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US7785488B2 (en) * | 2005-12-08 | 2010-08-31 | Chisso Corporation | Lateral oxirane compound and polymer thereof |
KR101127098B1 (ko) * | 2008-11-19 | 2012-03-23 | 제일모직주식회사 | 이방 전도성 접착필름용 조성물 및 이를 이용한 이방 전도성 필름 |
KR101403846B1 (ko) | 2009-11-05 | 2014-06-03 | 히타치가세이가부시끼가이샤 | 열 중합계 개시제 시스템 및 접착제 조성물 |
JP5561199B2 (ja) | 2011-02-17 | 2014-07-30 | 日立化成株式会社 | 接着剤組成物、回路接続材料、接続体及びその製造方法、並びに半導体装置 |
WO2013089100A1 (ja) * | 2011-12-16 | 2013-06-20 | 株式会社スリーボンド | 硬化性樹脂組成物 |
KR20150092077A (ko) | 2012-12-06 | 2015-08-12 | 세키스이가가쿠 고교가부시키가이샤 | 도전 재료, 접속 구조체 및 접속 구조체의 제조 방법 |
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Non-Patent Citations (1)
Title |
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Current-Induced Degradation of Isotropically;Stefan Kotthaus;《IEEE Transactions on Components, Packaging, and Manufacturing Technology: Part A》;19980630;第21卷(第2期);第259-265页 * |
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US10224303B2 (en) | 2019-03-05 |
KR20170067031A (ko) | 2017-06-15 |
TW201720888A (zh) | 2017-06-16 |
US20170162531A1 (en) | 2017-06-08 |
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Effective date of registration: 20191115 Address after: 61 jiashanwei Er Road, Jinchuan District, Seoul 08588, South Korea Applicant after: GUKTOH CHEMICAL Co.,Ltd. Address before: South Korea Gyeonggi Do Yongin Giheung tribute District Road No. 150-20 Applicant before: Samsung SDI Co.,Ltd. |
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Effective date of registration: 20220920 Address after: Gyeonggi Do, South Korea Patentee after: Guo Dujianduansucai Address before: 61 jiashanwei Er Road, Jinchuan District, Seoul 08588, South Korea Patentee before: GUKTOH CHEMICAL Co.,Ltd. |