CN107002223B - 材料沉积系统和用于在材料沉积系统中沉积材料的方法 - Google Patents
材料沉积系统和用于在材料沉积系统中沉积材料的方法 Download PDFInfo
- Publication number
- CN107002223B CN107002223B CN201480083861.9A CN201480083861A CN107002223B CN 107002223 B CN107002223 B CN 107002223B CN 201480083861 A CN201480083861 A CN 201480083861A CN 107002223 B CN107002223 B CN 107002223B
- Authority
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- Prior art keywords
- substrate
- vacuum
- deposition system
- vacuum chamber
- arrangement
- Prior art date
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- 239000000463 material Substances 0.000 title claims abstract description 247
- 230000008021 deposition Effects 0.000 title claims abstract description 140
- 238000000034 method Methods 0.000 title claims abstract description 32
- 239000000758 substrate Substances 0.000 claims abstract description 284
- 238000000151 deposition Methods 0.000 claims abstract description 155
- 238000001771 vacuum deposition Methods 0.000 claims abstract description 78
- 238000009826 distribution Methods 0.000 claims description 74
- 238000001704 evaporation Methods 0.000 claims description 21
- 238000012545 processing Methods 0.000 claims description 10
- 239000012530 fluid Substances 0.000 claims description 7
- 238000004891 communication Methods 0.000 claims description 5
- 229910052571 earthenware Inorganic materials 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 1
- 239000011368 organic material Substances 0.000 description 19
- 238000004519 manufacturing process Methods 0.000 description 13
- 238000012423 maintenance Methods 0.000 description 7
- 230000008020 evaporation Effects 0.000 description 6
- 238000000576 coating method Methods 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 4
- 238000013461 design Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 230000008901 benefit Effects 0.000 description 3
- 238000005137 deposition process Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 230000000873 masking effect Effects 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000013519 translation Methods 0.000 description 2
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- NRCMAYZCPIVABH-UHFFFAOYSA-N Quinacridone Chemical compound N1C2=CC=CC=C2C(=O)C2=C1C=C1C(=O)C3=CC=CC=C3NC1=C2 NRCMAYZCPIVABH-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 239000004917 carbon fiber Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000010549 co-Evaporation Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 230000003750 conditioning effect Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- -1 etc.) Substances 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000011796 hollow space material Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 239000011364 vaporized material Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/568—Transferring the substrates through a series of coating stations
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Physical Vapour Deposition (AREA)
- Electroluminescent Light Sources (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/EP2014/076747 WO2016087005A1 (en) | 2014-12-05 | 2014-12-05 | Material deposition system and method for depositing material in a material deposition system |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN107002223A CN107002223A (zh) | 2017-08-01 |
| CN107002223B true CN107002223B (zh) | 2019-11-05 |
Family
ID=52130229
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201480083861.9A Active CN107002223B (zh) | 2014-12-05 | 2014-12-05 | 材料沉积系统和用于在材料沉积系统中沉积材料的方法 |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP6550464B2 (enExample) |
| KR (1) | KR101932943B1 (enExample) |
| CN (1) | CN107002223B (enExample) |
| TW (1) | TWI619823B (enExample) |
| WO (1) | WO2016087005A1 (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106637091B (zh) * | 2017-02-24 | 2019-08-30 | 旭科新能源股份有限公司 | 用于薄膜太阳能电池制造的高温蒸发炉 |
| WO2019037858A1 (en) * | 2017-08-24 | 2019-02-28 | Applied Materials, Inc. | APPARATUS AND METHOD FOR CONTACTLESS TRANSPORT OF A DEVICE IN A VACUUM TREATMENT SYSTEM |
| CN111344433A (zh) * | 2017-11-16 | 2020-06-26 | 应用材料公司 | 冷却沉积源的方法、用于冷却沉积源的腔室和沉积系统 |
| CN111902563A (zh) * | 2018-03-28 | 2020-11-06 | 应用材料公司 | 真空处理设备以及用于处理基板的方法 |
| CN111663104A (zh) * | 2020-06-24 | 2020-09-15 | 武汉华星光电半导体显示技术有限公司 | 蒸镀系统及蒸镀方法 |
| WO2022107945A1 (ko) * | 2020-11-23 | 2022-05-27 | 엘지전자 주식회사 | 자가조립장치 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20060094711A (ko) * | 2005-02-25 | 2006-08-30 | 삼성에스디아이 주식회사 | 격벽을 구비하는 측면 분사형 선형 증발원 및 그 증발원을구비하는 증착장치 |
| CN101845612A (zh) * | 2008-12-18 | 2010-09-29 | 维易科精密仪器国际贸易(上海)有限公司 | 线沉积源 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8900366B2 (en) * | 2002-04-15 | 2014-12-02 | Samsung Display Co., Ltd. | Apparatus for depositing a multilayer coating on discrete sheets |
| JP4013859B2 (ja) * | 2003-07-17 | 2007-11-28 | 富士電機ホールディングス株式会社 | 有機薄膜の製造装置 |
| JP4685404B2 (ja) * | 2003-10-15 | 2011-05-18 | 三星モバイルディスプレイ株式會社 | 有機電界発光素子の垂直蒸着方法，その装置，及び有機電界発光素子の垂直蒸着装置に使用される蒸着源 |
| KR100784953B1 (ko) * | 2006-05-23 | 2007-12-11 | 세메스 주식회사 | 다수의 도가니를 이용한 유기발광소자 박막 제작을 위한선형증발원 |
| US20080131587A1 (en) * | 2006-11-30 | 2008-06-05 | Boroson Michael L | Depositing organic material onto an oled substrate |
| US8119204B2 (en) * | 2007-04-27 | 2012-02-21 | Semiconductor Energy Laboratory Co., Ltd. | Film formation method and method for manufacturing light-emitting device |
| KR101097737B1 (ko) * | 2009-03-31 | 2011-12-22 | 에스엔유 프리시젼 주식회사 | 박막 증착 장치와 박막 증착 방법 및 박막 증착 시스템 |
| US20110052795A1 (en) * | 2009-09-01 | 2011-03-03 | Samsung Mobile Display Co., Ltd. | Thin film deposition apparatus and method of manufacturing organic light-emitting display device by using the same |
| KR101708420B1 (ko) * | 2010-09-15 | 2017-02-21 | 삼성디스플레이 주식회사 | 기판 증착 시스템 및 이를 이용한 증착 방법 |
| JP2014005478A (ja) * | 2010-10-08 | 2014-01-16 | Kaneka Corp | 蒸着装置 |
| WO2013026493A1 (en) * | 2011-08-25 | 2013-02-28 | Applied Materials, Inc. | Corner cut mask |
| JP2013163837A (ja) * | 2012-02-09 | 2013-08-22 | Canon Tokki Corp | 蒸着装置並びに蒸着装置を用いた成膜方法 |
| EP3187618A1 (en) * | 2013-12-10 | 2017-07-05 | Applied Materials, Inc. | Evaporation source for organic material, deposition apparatus for depositing organic materials in a vacuum chamber having an evaporation source for organic material, and method for evaporating organic material |
-
2014
- 2014-12-05 JP JP2017530018A patent/JP6550464B2/ja active Active
- 2014-12-05 CN CN201480083861.9A patent/CN107002223B/zh active Active
- 2014-12-05 KR KR1020177018668A patent/KR101932943B1/ko active Active
- 2014-12-05 WO PCT/EP2014/076747 patent/WO2016087005A1/en not_active Ceased
-
2015
- 2015-12-01 TW TW104140033A patent/TWI619823B/zh not_active IP Right Cessation
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20060094711A (ko) * | 2005-02-25 | 2006-08-30 | 삼성에스디아이 주식회사 | 격벽을 구비하는 측면 분사형 선형 증발원 및 그 증발원을구비하는 증착장치 |
| CN101845612A (zh) * | 2008-12-18 | 2010-09-29 | 维易科精密仪器国际贸易(上海)有限公司 | 线沉积源 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN107002223A (zh) | 2017-08-01 |
| JP6550464B2 (ja) | 2019-07-24 |
| KR20170092670A (ko) | 2017-08-11 |
| TW201631185A (zh) | 2016-09-01 |
| JP2017538039A (ja) | 2017-12-21 |
| WO2016087005A1 (en) | 2016-06-09 |
| TWI619823B (zh) | 2018-04-01 |
| KR101932943B1 (ko) | 2018-12-27 |
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| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |