CN106974756A - 具有足部三维运动控制及足压分散的装置 - Google Patents

具有足部三维运动控制及足压分散的装置 Download PDF

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CN106974756A
CN106974756A CN201710013193.8A CN201710013193A CN106974756A CN 106974756 A CN106974756 A CN 106974756A CN 201710013193 A CN201710013193 A CN 201710013193A CN 106974756 A CN106974756 A CN 106974756A
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刘克涛
杨世伟
陈宗欣
小林永芳
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Abstract

本发明提供一种具有足部三维运动控制及足压分散的装置,当人体在行进动作时用以控制足部关节三维运动及足压分散,可支撑足弓,及调整足部各关节因着地时的运动及地面反作用力所造成的异常足压。其包括足弓支撑本体,用以支撑足部的内侧纵弓、横弓与外侧纵弓。在行进时用以控制中、前足的关节运动,分散前足足压。足弓支撑本体后端至少一侧向相对应的后足足跟部延伸形成后足运动调整部,用以调整后足内外翻角度,加强足跟软组织的吸震度,提供后足着地运动的稳定度,进而降低足跟足压。在足弓支撑部上另有刚性加强部,用以加强控制不同型态的足部过度或不足旋前运动。

Description

具有足部三维运动控制及足压分散的装置
技术领域
本发明涉及一种用于控制人体运动时足踝关节动作、足压调整的足部三维支撑及运动控制的装置。
背景技术
足部是人体支撑的底座,它包含了28块骨头、107条韧带、32条肌肉及57个关节面,是人体最复杂的骨骼肌肉系统。其主要关节包含了踝关节(ankle joint)、距骨下关节(subtalar joint)、横跗关节(transverse tarsal joint)、跖趾关节(metatarsophalangeal joint)与趾间关节(interphalangeal joint)。
人体的足部根据足弓高低,可分为高弓足、正常足、扁平足三种。扁平足的人在一般行走时,因为足弓的下陷,会造成后足部在脚跟着地至站立中期有较大的旋前运动(overpronatioin)导致推进期有过多的旋后运动(over supination)。因此,在足跟及跖骨区有较一般正常值大的足底压力值。在一般的正常时间活动下,并不会有特别症状发生;但长期下来,足部往往较正常人易于产生疲劳及疼痛,甚至引起足底病变,且会导致膝、脊椎等关节的伤害。对于扁平足的人而言,由于足部在旋前运动(pronation)的时间过长,容易造成足部关节、踝关节及下肢承受过大应变,及髋关节补偿性的过度内转,进而导致膑骨内侧的过多压力及外侧拉力,造成膑骨疼痛、慢性足部拉伤、肌腱炎、足底筋膜炎、跖痛等等伤害。
步行时为了维持身体的平衡与前进的稳定,足部与其各关节所产生的相对运动是非常复杂的。足部为了行走时的稳定及适应不同的外在环境,通过足部的肌腱、韧带与其它软组织调整足部各关节的运动,以维持行走时的稳定。人体步行或运动时,下肢足踝与地面的相对运动可分为三期:跟骨摇摆期(heel rocker);足踝摇摆期(ankle rocker);前足摇摆期(forefoot rocker)。当足部与地面接触时反作用力,在踏脚期(heel strike)初期(initial contact)快速作用在后脚跟骨上,此时的作用力会在0.05秒内达到40%的体重,在0.13秒(着重期-loading response)达到110~120%体重。随着身体前向摆动,压力中心(center of pressure)从后足向前移动,在推进期时(push off)前足作用力达120%以上体重,而跑步时更大。
中足外侧会与地面适度的接触但通常并不大,此区的受力值通常只有10%的身体重。跖骨区的压力会随着个体间的差异而有所不同,通常最大的压力值会出现在第二与第三跖骨头间。高弓足者则在大脚趾、第一跖骨有较高足压;低弓足或扁平足者通常在第一、第二与第三跖骨、足跟区足压较高。
高弓足者在步行时因胫骨内转角度不足(insufficient tibial internalrotation),影响足的旋前(under pronation),在推进前有过大的旋后运动(oversupination),导致走路姿势僵硬,造成了高弓足肌肉骨骼问题。在站立期中后期(anklerocker)的踝关节背曲动作较大,以代偿跖骨过度跖曲角度,以增加推进期足尖离地高度。高弓足有较高的足部疼痛比率,主要为跖骨痛及足底筋膜炎。此外,高弓足跑者所承受的冲击力明显大于低弓足跑者。
膝内翻与膝外翻:腿部是由股骨(femur)、胫骨(tibia)、腓骨(fibula)、髌骨(patella)所构成。而X光摄影研究时,冠状面观察正常的胫骨与股骨骨干的夹角约为外翻六度。角度过大或过小则称之为膝外翻(X型腿)或膝内翻(O型腿),临床上简易的观察方式乃让个案双膝朝前及双脚内踝并拢,若双膝间可放入两指以上的手指宽度时,称之为膝内翻,此型步行时常伴随过多的胫骨外转(tibia external rotation)及前足过多的旋后运动(forefoot supination),下肢肌群不正常作用,进而导致膝内侧及足外跖骨疼痛甚至退化性膝关节炎。若个案双膝并拢,但双脚内踝可以放入两指以上的手指宽度时,称之为膝外翻,此型在举步前进时会造成膝盖与脚踝向内旋转,长期可能导致外侧关节不适及足底筋膜炎。
定制化足矫可以增加接触面积,使力量重新分配而降低足底压力。近年来,许多因足部结构上的不良或者是其它骨骼肌肉系统的问题,所造成的足部功能障碍,皆已广泛使用足矫来修正、辅助步行。早在1983年即有论文证实足部辅具有可以明显降低下肢症状,它对减轻足底筋膜炎的疼痛有80%的成效,并可以加速受伤的跑者功能的恢复。
使用足部辅具有另一个十分重要的目的是希望使下肢的生物力学表现趋近于正常,许多研究皆显示足部辅具有可以减少足部旋前(pronation)或后足活动速度与发生时间。在跑步时足弓垫对下肢运动有最大的影响,在站立期前50%期间可降低胫骨内转2°,影响胫骨轴向旋转与跟骨内外翻关系可以降低胫骨的内外转速度及减少胫骨内转角度,进而可降低第一趾骨头与内侧足跟处的足底压力多达30~40%。
现有的足弓垫主要透过鞋垫在舟状骨下方配置一定隆起的高度来补偿高弓足或是扁平足的足弓高度,进而使足部能进行吸收冲力及分散人体重量的作用。虽现有的足弓垫对因扁平足或高弓足而造成的肌肉酸痛确实有帮助,但此方法仅垫高了舟状骨的内侧中足部(midfoot),仅能用于改善中、前足的相对运动,对足跟外翻过多的扁平足及旋前不足的高弓足患者,无法有效改善其距骨下关节的运动。使用现有足弓垫者在长期运动下,还是存在前述的骨骼肌肉系统的伤害。
本发明的发明人有鉴于现有技术的不足,在此揭示一种具有足部三维运动控制及足压分散的装置,该具有足部三维运动控制及足压分散的装置用以支撑足弓部及跟骨部,不占用过多鞋内空间,且可调整过多的距骨下关节的内外翻(valgus,varus),及足踝的旋后及旋前运动角度,减少下肢肌肉的不当动作,改善步行或跑步时肌肉疲劳,减少骨骼肌肉的伤害。
发明内容
本发明目的在于克服上述现有技术中的不足,提供一种具有足部三维运动控制及足压分散的装置,用以有效控制足部关节的相对运动,调整足底相对足压,减少不当的下肢肌肉作用。
一种具有足部三维运动控制及足压分散的装置,用以有效控制足部关节的相对运动以调整足跟着地角度及调整足底相对足压,其包括足弓支撑本体,该足弓支撑本体用以支撑足部的内侧纵弓、横弓与外侧纵弓,该足弓支撑本体后端至少一侧向相应足部的跟骨位置延伸;后足运动调整部,用以调整足跟着地角度,该足弓支撑本体为该内侧纵弓、横弓与外侧纵弓的弧度匹配形成的立体结构。
在实施例当中,该后足运动调整部于该足弓支撑本体后端由相应骰骨侧向后延伸至跟骨处。
在实施例当中,该后足运动调整部于该足弓支撑本体后端由相应足舟骨侧向后延伸至跟骨处。
在实施例当中,该后足运动调整部包括第一后足运动调整部及第二后足运动调整部,该第一后足运动调整部于该足弓支撑本体后端相应足舟骨侧向后延伸至跟骨处,该第二后足运动调整部于该足弓支撑本体后端处相应骰骨侧向后延伸至跟骨处。
在实施例当中,具有足部三维运动控制及足压分散的装置包括刚性加强部,设置于该足弓支撑本体表面,其由该足弓支撑本体的后端中部一直延伸至相应足部的外侧纵弓处。
在实施例当中,具有足部三维运动控制及足压分散的装置包括刚性加强部,设置于该足弓支撑本体表面,其由该足弓支撑本体的后端中部一直延伸至相应足部的内侧纵弓处。
在实施例当中,具有足部三维运动控制及足压分散的装置包括刚性加强部,设置于该足弓支撑本体表面,其由该足弓支撑本体的后端中部一直向前端中部延伸。
在实施例当中,该后足运动调整部大致成勾状。
在实施例当中,该足弓支撑本体相应足部的第一跖骨处设有近端跖骨支撑部。
在实施例当中,该足弓支撑本体及后足运动调整部可为塑料、玻璃纤维、碳纤维混纺或金属材质。
在综上所述,本发明的具有足部三维运动控制及足压分散的装置,其可具有下述优点:
(1)当人体在行进动作时,具有足部三维运动控制及足压分散的装置能够有效控制距骨下关节的运动,以调整过多的旋后及旋前运动角度,透过后足运动调整部的刚性支撑使足部关节的过多或不足的旋前及旋后角度得以控制在正常范围,进而调整及分散了足底各区的相对足压。借此,减少下肢肌肉的不当动作,改善步行或跑步时肌肉疲劳,减少骨骼肌肉的伤害。
(2)具有足部三维运动控制及足压分散的装置,在运动时随着地面反作用力的冲击速率,韵律式的调整足弓高度,控制中、前足运动,降低异常足压,同时不增加足弓部的支撑厚度,因此不占用过多鞋内空间,使穿戴舒适。
上述发明内容并非用以限制所主张标的范畴,本发明的各种样态的详细概观,在下述实施方式段落会做更进一步描述。
附图说明
图1A是人体右足部的足弓与相应骨头的位置的示意图一;
图1B是人体右足部的足弓与相应骨头的位置的示意图二;
图2是本发明一种具有足部三维运动控制及足压分散的装置的示意图,其对应右足部并且为后足外翻过多(excessive valgus)及过多旋前运动(over pronation)的足踝关节运动,如:扁平足或低弓足脚型专用;
图3是图2中扁平足者的具有足部三维运动控制及足压分散的装置的使用示意图;
图4是本发明一种具有足部三维运动控制及足压分散的装置的实施例中的示意图,其对应右足部并且为后足过多内翻(excessive varus),旋前不足(under pronation)的足踝运动,如:高弓足足脚型专用;
图5是图4中高弓足脚型者的具有足部三维运动控制及足压分散的装置的使用示意图;
图6是本发明一种具有足部三维运动控制及足压分散的装置的实施例中的示意图,其对应正常足弓脚型专用;
图7是图6中正常足弓脚型的具有足部三维运动控制及足压分散的装置的使用示意图。
【符号说明】
1 具有足部三维运动控制及足压分散的装置
10 足弓支撑本体
10a 前端
10b 后端
100 足弓
110 内侧纵弓
120 横弓
130 外侧纵弓
11 近端跖骨支撑部
12 刚性加强部
20 后足运动调整部
200 第一后足运动调整部
201 第二后足运动调整部
M 内侧
L 外侧
900 足弓鞋垫
具体实施方式
为详细说明本发明的技术内容、构造特征、所达成的目的及功效,以下现例举实施例并配合附图详予说明。
本发明的主要目的提供一种具有足部三维运动控制及足压分散的装置,用以有效控制足部关节的相对运动以调整足跟着地角度及调整足底相对足压,减少不当的下肢肌肉作用。
请参阅图1A与图1B,人体足部上具有足弓100(plantar arch)可吸收冲力且能分散人体重量,该足弓100包含足部的第一跖骨、第一楔形骨、舟状骨与距骨沿足部内缘拱起形成的内侧纵弓110(medial arch),第一跖骨至第五跖骨间形成的横弓120(transversearch),该第五跖骨与跟骨间形成的外侧纵弓130(lateral arch)。当人体走动时,该内侧纵弓110、横弓120与外侧纵弓130共同吸收冲力且能分散人体重量,而当该足弓100过高就会造成高弓足(pes cavus or higharch)或是过低造成扁平足(flatfoot or lowarch)的现象使足底压力不正常。
请参阅图1A、图1B及图2,为了达成上述目的,本发明提供具有足部三维运动控制及足压分散的装置1,包括:足弓支撑本体10及后足运动调整部20。该足弓支撑本体10为根据人体的该内侧纵弓110、横弓120与外侧纵弓130的弧度匹配形成的立体结构,用以支撑该内侧纵弓110、横弓120与外侧纵弓130。该足弓支撑本体10包括前端10a及后端10b,该后足运动调整部20由该足弓支撑本体10的该后端10b的至少一侧向后延伸至相应足部的跟骨位置所形成,用以调整足跟着地角度,控制后足运动。本发明的具有足部三维运动控制及足压分散的装置1也可设置于足弓鞋垫900上。
该足弓支撑本体10的该前端10a相对应足部的第一跖骨处设有近端跖骨支撑部11,该近端跖骨支撑部11作为第一跖骨头的近端支撑,用于提供足踝在推进期前足的稳定度及减少脚趾的受力。该足弓支撑本体10及该后足运动调整部20可为具有支撑力的化工或金属素材,如:金属、塑料、玻璃纤维或碳纤维混纺等。
请参阅图2,该后足运动调整部20由该足弓支撑本体10的该后端10b相应足舟骨侧向后延伸至跟骨处且大致成勾状,其用以调整低弓足或扁平足脚型的足跟着地角度。
因人体在行走过程踝关节会阶段性发生旋后(supination)或旋前(pronation)的三度空间动作,足弓高度过高或过低会使行走的过程产生过度的旋前或旋后运动,如高弓足脚型可能伴随O型腿,在足跟着地时,会产生过度旋后(over supination),使承重期时(loading response)的踝关节过多的内翻动作(excessive varus)。扁平足脚型则可能伴随X型腿,在足部着地时,产生过度旋前(over pronation),而承重期的踝关节过多的外翻动作(excessive valgus)。不足与过多都会产生异常足底压力,此影响对人体造成的伤害甚巨,则该后足运动调整部20可使足部在接触地面时,补偿过多的内翻或外翻角度,以防止对人体的伤害。
进一步说明,足跟着地角度是透过该后足运动调整部20的支撑调整,可调整足部关节的相对运动,踩踏时,因扁平足脚型的踝关节会向内侧M(medial)偏移,呈现过度旋前(over pronation);透过该后足运动调整部20的刚性支撑足部进而使踝关节向外侧L(Lateral)偏移,以使踩踏时维持踝关正常的角度,如图3所示,进而调整扁平足足底的压力分布。再者,足部在接触地面后受该后足运动调整部20的刚性支撑,足跟将被调整至鞋垫较柔软的部位,借此改变了踝关节着地角度,以防止扁平足对人体造成的伤害。
请参阅图4,在实施例中,该后足运动调整部20于该足弓支撑本体10的该后端10b相应骰骨侧向后延伸至跟骨处且大致成勾状,用以支撑高弓足足脚型的足部。踩踏时,高弓足足脚型的踝关节会过度向外侧L(lateral)偏移,呈现过度旋后(over supination);透过该后足运动调整部20的刚性支撑足部进而使踝关节向内侧M(medial)偏移,以使踩踏时维持踝关节正常的角度,如图5所示,进而调整足部关节的相对运动。再者,足部在接触地面后受该后足运动调整部20的刚性支撑,足跟将被调整至鞋垫较柔软的部位,借此改变了踝关节旋前不足的运动,以防止高弓足足对人体造成的伤害。
请参阅图6,在另一实施例中,该后足运动调整部20包括第一后足运动调整部200及第二后足运动调整部201,该第一后足运动调整部200于该足弓支撑本体10相应足舟骨侧向后延伸至跟骨中部附近,该第二后足运动调整部201于该足弓支撑本体10相应骰骨侧向后延伸至跟骨中部附近,用以支撑正常足弓脚型的足部,如图7所示。该第一后足运动调整部200及该第二后足运动调整部201不限于延伸至跟骨中部,其是在设于跟骨两侧,用以对足跟提供支撑。当踩踏时,人体可能因重心不稳而使足部触地角度改变,通过第一后足运动调整部200及第二后足运动调整部201的支撑能够稳定足部。
进一步的,该内侧纵弓110、横弓120与外侧纵弓130的弧度匹配形成的足弓支撑本体10可通过设置刚性加强部12控制足部的动态运动稳定,该刚性加强部12为足弓支撑本体10表面的向上凸出体或是固体结合于足弓支撑本体10表面。请参阅图2,针对扁平足脚型的该刚性加强部12设置于足弓支撑本体10表面,其由足弓支撑本体10的后端10b中部一直延伸至相应足部的内侧纵弓110处,因此可使足部内侧支撑的刚性大于足部外侧,可借此增加刚性也降低动态时足部内侧纵弓110下降的程度。
请参阅图4,针对高弓足足脚型的该刚性加强部12其由足弓支撑本体10的后端10b中部一直延伸至相应足部的外侧纵弓130处,因此足部外侧支撑的刚性大于足部内侧,可借此增加刚性也降低动态时足部外侧纵弓130下降的程度。
请参阅图6,针对正常足弓脚型的该刚性加强部12其由足弓支撑本体10的后端10b中部一直向前端10a中部延伸,可借此增加足部中间部分支撑的刚性,因足弓支撑本体10相应足部的内侧纵弓110处及外侧纵弓130处厚度大致相同刚性也大致相同,因此中间部分的刚性大于内、外侧也使动态时足部的内侧纵弓110处及外侧纵弓130处下降的程度大致相同。
进一步说明,足弓支撑本体10表面的该刚性加强部12也可使过度旋前及过度旋后的踝关节调整为正常的着地角度,通过该刚性加强部12所设置位置的不同,可控制足弓支撑本体10表面刚性的分布,借此减少相对应足弓处的下降程度进而调整及控制足底压力分布。
人体走路时,步态周期大致会分成摇摆期与站立期,其中站立期占整个步态周期约百分之六十的时间,因此维持站立期的稳定很重要,本发明的具有足部三维运动控制及足压分散的装置1在第一阶段的脚跟着地时,即可调整旋前或旋后的角度,为接下来的站立期提供稳定的步态。
当人体在行进动作时,具有足部三维运动控制及足压分散的装置1能够有效控制距骨下关节的运动,以调整过多的旋后及旋前运动角度,透过后足运动调整部20的刚性支撑使足部关节的过多或不足的旋前及旋后角度得以控制在正常范围,进而调整及分散足底各区的相对足压。借此,减少下肢肌肉的不当动作,改善步行或跑步时肌肉疲劳,减少骨骼肌肉的伤害。
具有足部三维运动控制及足压分散的装置,在运动时随着地面反作用力的冲击速率,韵律式的调整足弓高度,控制中、前足运动,降低异常足压,同时不增加足弓部的支撑厚度,因此不占用过多鞋内空间,使穿戴舒适。
综上所述,本发明的具有足部三维运动控制及足压分散的装置提供一种有效控制足部关节相对运动的方式,透过本发明结构,足部在运动状态下可呈现稳定的步态,进而使人体的动态稳定,提升运动效能,能够满足一般人至专业跑者的需求。
虽然本发明已具体实施例揭示如上,然而其所揭示的具体实施例并非用以限定本发明,任何熟悉本领域技术人员,在不脱离本发明的精神和范围内,当可作各种的更动与润饰,其所作的更动与润饰皆属于本发明的范畴,本发明的保护范围应当以权利要求书所界定的范围为准。

Claims (10)

1.一种具有足部三维运动控制及足压分散的装置,用以有效控制足部关节的相对运动以调整足跟着地角度及调整足底相对足压,其特征在于,包括:
足弓支撑本体,该足弓支撑本体用以支撑足部的内侧纵弓、横弓与外侧纵弓,该足弓支撑本体后端至少一侧向相应足部的跟骨位置延伸;
后足运动调整部,用以调整足跟着地角度,该足弓支撑本体为该内侧纵弓、横弓与外侧纵弓的弧度匹配形成的立体结构。
2.如权利要求1所述的具有足部三维运动控制及足压分散的装置,其特征在于,该后足运动调整部于该足弓支撑本体后端由相应骰骨侧向后延伸至跟骨处。
3.如权利要求1所述的具有足部三维运动控制及足压分散的装置,其特征在于,该后足运动调整部于该足弓支撑本体后端由相应足舟骨侧向后延伸至跟骨处。
4.如权利要求1所述的具有足部三维运动控制及足压分散的装置,其特征在于,该后足运动调整部包括第一后足运动调整部及第二后足运动调整部,该第一后足运动调整部于该足弓支撑本体后端相应足舟骨侧向后延伸至跟骨处,该第二后足运动调整部于该足弓支撑本体后端相应骰骨侧向后延伸至跟骨处。
5.如权利要求2所述的具有足部三维运动控制及足压分散的装置,其特征在于,还包括刚性加强部,该刚性加强部设置于该足弓支撑本体表面,其由该足弓支撑本体的后端中部一直延伸至相应足部的外侧纵弓处。
6.如权利要求3所述的具有足部三维运动控制及足压分散的装置,其特征在于,包括刚性加强部,该刚性加强部设置于该足弓支撑本体表面,其由该足弓支撑本体的后端中部一直延伸至相应足部的内侧纵弓处。
7.如权利要求4所述的具有足部三维运动控制及足压分散的装置,其特征在于,包括刚性加强部,该刚性加强部设置于该足弓支撑本体表面,其由该足弓支撑本体的后端中部一直向前端中部延伸。
8.如权利要求1至3中任一项所述的具有足部三维运动控制及足压分散的装置,其特征在于,该后足运动调整部成勾状。
9.如权利要求1至4中任一项所述的具有足部三维运动控制及足压分散的装置,其特征在于,该足弓支撑本体相应足部的第一跖骨处设有近端跖骨支撑部。
10.如权利要求1至4中任一项所述的具有足部三维运动控制及足压分散的装置,其特征在于,该足弓支撑本体及后足运动调整部可为塑料、玻璃纤维、碳纤维混纺或金属材质。
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US20170202299A1 (en) 2017-07-20
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