CN106847891A - It is a kind of to control to tie the RC IGBT devices of terminal integral body diode by MOSFET - Google Patents

It is a kind of to control to tie the RC IGBT devices of terminal integral body diode by MOSFET Download PDF

Info

Publication number
CN106847891A
CN106847891A CN201710099683.4A CN201710099683A CN106847891A CN 106847891 A CN106847891 A CN 106847891A CN 201710099683 A CN201710099683 A CN 201710099683A CN 106847891 A CN106847891 A CN 106847891A
Authority
CN
China
Prior art keywords
igbt
mosfet
collector
diode
termination environment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN201710099683.4A
Other languages
Chinese (zh)
Other versions
CN106847891B (en
Inventor
陈伟中
郭乔
贺利军
黄义
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Yang Lihua
Original Assignee
Chongqing University of Post and Telecommunications
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chongqing University of Post and Telecommunications filed Critical Chongqing University of Post and Telecommunications
Priority to CN201710099683.4A priority Critical patent/CN106847891B/en
Publication of CN106847891A publication Critical patent/CN106847891A/en
Application granted granted Critical
Publication of CN106847891B publication Critical patent/CN106847891B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/70Bipolar devices
    • H01L29/72Transistor-type devices, i.e. able to continuously respond to applied control signals
    • H01L29/739Transistor-type devices, i.e. able to continuously respond to applied control signals controlled by field-effect, e.g. bipolar static induction transistors [BSIT]
    • H01L29/7393Insulated gate bipolar mode transistors, i.e. IGBT; IGT; COMFET
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/40Electrodes ; Multistep manufacturing processes therefor
    • H01L29/41Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
    • H01L29/417Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions carrying the current to be rectified, amplified or switched
    • H01L29/41708Emitter or collector electrodes for bipolar transistors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/40Electrodes ; Multistep manufacturing processes therefor
    • H01L29/41Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
    • H01L29/423Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions not carrying the current to be rectified, amplified or switched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/66007Multistep manufacturing processes
    • H01L29/66075Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
    • H01L29/66227Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
    • H01L29/66234Bipolar junction transistors [BJT]
    • H01L29/66325Bipolar junction transistors [BJT] controlled by field-effect, e.g. insulated gate bipolar transistors [IGBT]

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)

Abstract

The present invention relates to RC IGBT, belong to field of semiconductor, including the cathode layer, N drift regions, N cushions and the collecting zone that set from top to bottom, collecting zone includes the N collector region and P collector region that are set with layer, some polygate electrodes are arranged at intervals with cathode layer, each gate electrode is by SiO2Gate oxide is surrounded;RC IGBT devices are from left to right active area, transition region and knot termination environment, and knot termination environment bottom is made up of N collector region completely.The present invention is integrated with body diode using termination environment is tied, and ties the field limiting ring P ring of terminal as the anode of diode, ties the N collector region of termination environment bottom as the negative electrode of diode, and its conducting state is received to be integrated in controlling for the MOSFET of transition region.RC IGBT devices proposed by the invention can thoroughly eliminate snapback phenomenons under forward conduction IGBT patterns, and forward conduction voltage drop reduces 19.4%, and this structure substantially increases the performance of RC IGBT.

Description

It is a kind of to control to tie the RC-IGBT devices of terminal integral body diode by MOSFET
Technical field
The present invention relates to field of semiconductor, and in particular to a kind of to control knot terminal conglomerate two by MOSFET The RC-IGBT devices of pole pipe.
Background technology
IGBT (Insulated Gate Bipolar Transistor, insulated gate bipolar transistor) is pressure-resistant etc. because of its Level can be widely used in the fields such as high ferro, new energy development, household electrical appliance, intelligent grid from 600V span to 6500V. But IGBT is an one way conducting device, two back-to-back diodes are equivalent to during reverse-conducting so as to turn on. It is accomplished by one fly-wheel diode FWD of inverse parallel (Free Wheeling Diode) to make in IGBT typical case's inverter circuit applications Protective effect.RC-IGBT (Reverse-Conducting Insulated Gate Bipolar Transistor, inverse conductivity type Insulated gate bipolar transistor) the part colelctor electrode P-Collector of IGBT is replaced with N-Collector, colelctor electrode P- It is as shown in Figure 1 that Collector and N-Collector are spaced its structure.So that two back-to-back diodes in original IGBT P-body/N-drift, N-buffer/P-Collector become P-body/N-drift, N-buffer/N-Collector One diode structure, realizes the integrated of IGBT internal body diodes.The integrated level for not only increasing chip can also be saved into This, eliminates the temperature difference existed between igbt chip and diode chip for backlight unit, improves reliability.
But tradition RC-IGBT has in the presence of some shortcomings of itself:On the one hand due to the introducing of N-Collector, from MOS The electronics of outflow flows first to the N-Collector of low potential barrier when colelctor electrode is flowed to, and in the PN junction (P- of bottom Collector/N-buffer produce an electrical potential difference VPN as shown in Figure 2 on).Work as VPN<Only have electronics to participate in during 0.7V conductive, RC-IGBT is operated under unipolarity conduction mode.As VPN >=0.7V, P-Collector injects hole, RC- to drift region IGBT is operated under bipolarity conduction mode.Because the conversion of two kinds of conduction modes result in the prominent of Current Voltage on curve of output Become, that is, occur in that negative resistance Snapback phenomenons.This phenomenon causes that RC-IGBT some devices when used in parallel can not enter completely Enter the mode of operation of IGBT, then device burns some devices caused by the excessive temperature of electric current is too high, ultimately results in whole circuit system System collapse.
On the other hand, traditional RC-IGBT element layouts are as shown in figure 3, because N-Collector is used as the negative electrode of FWD, its Upper area be FWD areas, P-Collector as IGBT anode, its upper area be IGBT areas, traditional RC-IGBT's IGBT and FWD is blended in same active area (Active region).No matter so tradition RC-IGBT is being operated in IGBT just To conduction mode or FWD reverse conduction modes, all only active area conducting electric currents, and tie termination environment (Edge Termination) area is very big as shown in Fig. 1 Fig. 3, an effect for bearing breakdown reverse voltage is but only served, without electric conduction Stream flows through, and causes CURRENT DISTRIBUTION uneven and chip utilization rate is low.
The content of the invention
In view of this, knot terminal integral body diode is controlled by MOSFET it is an object of the invention to provide a kind of RC-IGBT devices.
The purpose of the present invention is achieved through the following technical solutions, a kind of to control knot terminal conglomerate by MOSFET The RC-IGBT devices of diode, including cathode layer, N- drift regions 6, N cushions 7 and the collecting zone for setting from top to bottom, it is described Collecting zone includes the N collector region 8 and P collector region 9 that are set with layer, and some polygate electrodes are arranged at intervals with the cathode layer 2, active emitter 4 is formed between two neighboring polygate electrodes, each polygate electrodes is by SiO2Gate oxide 3 is surrounded; A P-body area 5 is provided with below each active emitter, P-body areas 5 are located at the top of N- drift regions 6, P-body areas The N+ active areas 1 being connected with active emitter are provided with 5;Insulated gate bipolar transistor is from left to right divided into active Area, transition region and knot termination environment, the bottom of the knot termination environment are made up of N collector region 8 completely.
Further, some SiO are arranged at intervals with the cathode layer in the knot termination environment2Field oxide 15, it is two neighboring SiO2Field oxide connects a field spacing ring P-ring14, and spacing ring P-ring in field is located in N- drift regions, field spacing ring P- The anode of the body diode that ring is internally integrated with RC-IGBT is connected, the body diode that N collector region is internally integrated with RC-IGBT Negative electrode connection.
Further, MOSFET is provided with the equal potential belt 10 of the transition region, the source electrode 11 of MOSFET and drain electrode 12 are located at In the equal potential belt 10 of transition region, the grid 13 of MOSFET is located at SiO2In gate oxide 3;The source electrode 11 of MOSFET and knot termination environment Metal be connected, drain electrode 12 is connected with the cathodic metal of active area, the cathodic metal phase of grid 13 and drain 12 and active area Even, the raceway groove between source electrode and drain electrode is opened and controlled by MOSFET grids 13 with off state.
There is advantages below due to using above technical scheme, the present invention:
A kind of RC-IGBT devices by MOSFET control knot terminal integral body diodes proposed by the invention, just To snapback phenomenons are completely eliminated under conducting IGBT patterns, and forward conduction voltage drop reduces 19.4%.In reverse-conducting Under FWD patterns, body diode is integrated with by tying terminal, the diode has soft anti-recovery characteristics, and whole Reverse recovery During no current and voltage fluctuation.In sum, this new construction RC-IGBT substantially increases the comprehensive of traditional RC-IGBT Close performance.
Brief description of the drawings
In order that the object, technical solutions and advantages of the present invention are clearer, below in conjunction with accompanying drawing the present invention is made into The detailed description of one step, wherein:
Fig. 1 is traditional RC-IGBT structural representations;
Fig. 2 is two kinds of conduction modes present in traditional RC-IGBT forward conductions process;Wherein colelctor electrode P- Voltage difference V between Collector and cushion n-bufferPN<During 0.7V, traditional RC-IGBT is operated in unipolarity conduction mould Formula, works as VPN>During 0.7V, traditional RC-IGBT is operated in bipolarity conduction mode;
Fig. 3 is the domain structure of traditional RC-IGBT;Wherein the part colelctor electrode P-Collector of tradition RC-IGBT is by N- Collector is replaced, and P-Collector and N-Collector is spaced on colelctor electrode, P-Collector tops area Domain is IGBT areas, and N-Collector upper areas are FWD areas, therefore IGBT is mixed with FWD, i.e., diode has been integrated in Source region;
Fig. 4 is a kind of RC-IGBT devices by MOSFET control knot terminal integral body diodes proposed by the present invention;
Fig. 5 is the domain structure of new construction RC-IGBT;New construction RC-IGBT is by the P-Collector of traditional RC-IGBT With N-Collector integrate after and separate, now N-Collector be distributed in knot terminal area, as the negative electrode of FWD, Its upper area is FWD areas, and P-Collector is distributed in active area, and used as the anode of IGBT, its upper area is IGBT areas, Realize FWD to be separated with IGBT active areas, i.e., diode is integrated in knot termination environment;
Fig. 6 is a kind of topological structure of the RC-IGBT devices that knot terminal integral body diode is controlled by MOSFET, i.e., should For groove grid trench structures RC-IGBT;
Fig. 7 is a kind of topological structure of the RC-IGBT devices that knot terminal integral body diode is controlled by MOSFET, i.e., should For Super-junction structures RC-IGBT;
Fig. 8 be at room temperature T=300K when, length is the new construction RC-IGBT and tradition RC-IGBT of 450um in forward direction Conducting IGBT patterns compare figure with the Current Voltage emulation under reverse-conducting FWD patterns;Wherein IGBT mode are forward conduction IGBT patterns, DIODE mode are reverse-conducting FWD patterns;
Fig. 9 is that new construction RC-IGBT, traditional RC-IGBT under forward conduction and reverse-conducting state, work as electric current respectively Density reaches 150A/cm2When current distributing figure;Wherein A points represent CURRENT DISTRIBUTIONs of the tradition RC-IGBT in forward conduction, B Point represents CURRENT DISTRIBUTIONs of the new construction RC-IGBT in forward conduction, and C points represent electricity of the tradition RC-IGBT in reverse-conducting Flow distribution, D points represent CURRENT DISTRIBUTIONs of the new construction RC-IGBT in reverse-conducting;
Figure 10 is the reverse recovery current voltage wave of new construction RC-IGBT, traditional RC-IGBT and traditional PIN diode Shape compares figure;Wherein vignette is the computational methods of the softness factor, and Snap-off is the unexpected termination of electric current;
Figure 11 be new construction RC-IGBT, traditional RC-IGBT and traditional PIN diode reversely restoring process in device Internal current profiles versus scheme;Wherein Hole Injection represent new construction RC-IGBT and traditional RC-IGBT and are reversely taking out During obtaining current, P-Collector represents traditional PI N to hole, Without Hole Injection is constantly injected in drift region Diode in reversely restoring process, injects due in the absence of P-Collector without hole;
Wherein, 1 is N+ active areas, and 2 is groove gate polysilicon electrode, and 3 is groove grid silicon dioxide layer, and 4 is active emitter, 5 It is P-body areas, 6 is N- drift regions, and 7 is N cushions, and 8 is N collector region, and 9 is P collector region, and 10 is transition region equal potential belt, and 11 are The source electrode (being connected with knot terminal metal) of MOS control pipes, 12 is the drain electrode (being connected with the cathodic metal of IGBT) of MOS control pipes, 13 is the grid (being connected with the cathodic metal of IGBT) of MOS control pipes, and 14 is knot terminal field limiting ring P-ring, and 15 is field oxidation Layer, 16 is superjunction P posts.
Specific embodiment
Below in conjunction with accompanying drawing, the preferred embodiments of the present invention are described in detail.
A kind of RC-IGBT devices by MOSFET control knot terminal integral body diodes proposed by the present invention, its structure As shown in figure 4, laying out pattern is as shown in Figure 5.
RC-IGBT devices, including cathode layer, N- drift regions 6, N cushions 7 and the collecting zone for setting from top to bottom, it is described Collecting zone includes the N collector region 8 and P collector region 9 that are set with layer, and some polygate electrodes are arranged at intervals with the cathode layer 2, active emitter 4 is formed between two neighboring polygate electrodes, each polygate electrodes is by SiO2Gate oxide 3 is surrounded; A P-body area 5 is provided with below each active emitter, P-body areas 5 are located at the top of N- drift regions 6, P-body areas The N+ active areas 1 being connected with active emitter are provided with 5;RC-IGBT devices are from left to right divided into active area, transition region With knot termination environment, the bottom of the knot termination environment is made up of N collector region 8 completely.
Some SiO are arranged at intervals with cathode layer in the knot termination environment2Field oxide 15, two neighboring SiO2Field oxygen Change layer and connect a field spacing ring 14, field spacing ring is located in N- drift regions, the body two that field spacing ring is internally integrated with RC-IGBT The anode connection of pole pipe, the negative electrode of the body diode that N collector region is internally integrated with RC-IGBT is connected.
MOSFET is provided with the equal potential belt 10 of the transition region, the source electrode 11 of MOSFET and drain electrode 12 are located at transition region In equal potential belt 10, the grid 13 of MOSFET is located at SiO2In gate oxide 3;The source electrode 11 of MOSFET and the metal phase for tying termination environment Even, drain electrode 12 is connected with the cathodic metal of active area, and grid 13 is connected with the cathodic metal of drain 12 and active area, source electrode and Raceway groove between drain electrode is opened and controlled by MOSFET grids 13 with off state.
The present invention is on the basis of traditional RC-IGBT, first by the original P collector areas (P- for separating arrangement Collector) 9 combine and be integrated in active area, form IGBT areas;By the original N collector areas (N- for separating arrangement Collector) 8 combine and be integrated in knot terminal area, form diode FWD areas.Its effect has three:Firstth, positive guide In logical mechanism, resistance per square on P collector areas (P-Collector) is integrated into a very big resistance by new construction RC-IGBT RanodeSo that the resistance of its PNP (P-body/n-drift, n-buffer/P-Collector) transistor base emitter stage RanodeIt is very big, emitter to base voltage VPNEasily reaching 0.7V makes transistor enter bipolarity conduction mode.Due to only existing A kind of conductive mechanism, in the absence of traditional RC-IGBT from unipolarity to bipolarity conduction mode transition process, therefore can effectively disappear Except Snapback phenomenons.Secondth, on laying out pattern, new construction RC-IGBT is by the P-Collector and N- of traditional RC-IGBT Collector integrate after and separate.Now N-Collector as FWD negative electrode, its upper area be FWD areas, P- Collector as IGBT anode, its upper area be IGBT areas, realize FWD and separated with IGBT active areas, carry significantly The utilization rate of chip high.In 3rd structure, the anode of the body diode FWD that traditional RC-IGBT is internally integrated is to use P- Body areas, negative electrode uses N-Collector, and the anode of the body diode FWD that new construction RC-IGBT is internally integrated is to adopt Field limiting ring P-ring is used, negative electrode still uses N-Collector, therefore integrated diode structure is different, due to field Limit ring P-ring is the structure for tying termination environment (Edge termination), therefore new construction RC-IGBT is successfully using tying termination set Into body diode;Secondly, the reverse blocking performance in order to not influence whole device, new construction is in active area (Active Region) MOSFET structure is introduced in transition region and knot termination environment (Edge termination) between, this The source electrode 11 of MOSFET is connected with knot terminal metal, and drain electrode 12 is connected with the cathodic metal of IGBT active areas, the ditch between source and drain Road is opened and controlled by metal-oxide-semiconductor grid 13 with off state, and metal-oxide-semiconductor grid 13 is golden with the negative electrode of drain electrode 12 and IGBT active areas Symbolic animal of the birth year connects, therefore metal-oxide-semiconductor grid need not add extra, and its signal is synchronous with IGBT active area cathode signals.At RC-IGBT When reverse-conducting, IGBT active area negative electrodes add positive voltage i.e. MOSFET grids plus positive voltage, and raceway groove is formed, and MOSFET is opened Open, source and drain is connected, now the electric current on the negative electrode of IGBT active areas passes through again after MOSFET channel flows through knot terminal metal The anode P-ring of FWD is downwardly towards N-Collector, and FWD is in the conduction state for this process.Together should IGBT active areas the moon Signal on pole tension revocation MOSFET is disappeared, and raceway groove is closed source and drain and disconnected, the source electrode of MOSFET and knot terminal metal with And the anode P-ring of FWD is connected, now the anode of FWD disconnects and is in blocking state.Therefore by introducing in transition region MOSFET structure can directly control to tie the working condition of the integrated body diode FWD in termination environment, and MOSFET is only equivalent to one Individual switch is as shown in Fig. 4 equivalent electrical diagrams.To sum up, new construction RC-IGBT devices of the invention are by tying terminal conglomerate Diode FWD, and the mode of operation of FWD is controlled by MOSFET, the new structure for introducing is carried out on the basis of traditional RC-IGBT Improve, but working mechanism there occurs great variety.It is positive that this new RC-IGBT not only can thoroughly eliminate traditional RC-IGBT The existing Snpaback phenomenons of conducting, while using tying terminal area integral body diode so that chip area obtains abundant profit With controlling body diode by MOSFET so that FWD in forward conduction can normal work, do not influence device in reverse blocking The blocking of part is pressure-resistant, and the combination property of device is greatly improved.
Further illustrate, new construction of the invention can be with except can be used in planar gate RC-IGBT (such as Fig. 4) Among the RC-IGBT (such as Fig. 6) and superjunction super junction RC-IGBT (such as Fig. 7) of groove grid trench structures.
Can be obtained by MEDICI simulation softwares, to the traditional RC-IGBT as shown in Figure 1 for being provided, as shown in Figure 4 is new Structure RC-IGBT has carried out emulation and has compared, the 600V resistance to RC-IGBT that arbitrarily downgrades, traditional RC-IGBT of the manufacture of analogue simulation thin slice technique Simulation parameter with new construction RC-IGBT is consistent, and wherein N- drift region thickness is 60um, and doping concentration is 7 × 1013cm-3, carry The sub- life-span is flowed for 10us, and environment temperature is 300K, and length is 450um.
Fig. 8 be at room temperature T=300K when, length is the new construction RC-IGBT and tradition RC-IGBT of 450um in forward direction Current Voltage analogous diagram under conducting IGBT patterns and reverse-conducting FWD patterns.From Fig. 8 simulation results, in forward conduction State is Vg=15V, Vcathode=0V, VanodeDuring=(+V), there is snapback in traditional RC-IGBT when electric current is 5A or so Phenomenon, the degree Δ V that snapback phenomenons occurSB=1.8V.For new construction RC-IGBT, whole forward conduction process without Snapback phenomenons occur, and its principle analysis can as above therefore by integrating the length of P-Collector be eliminated well Snapback phenomenons;In addition when forward conduction electric current reaches 150A/cm2, the forward conduction voltage drop of traditional RC-IGBT is 2.06V As shown in A points in Fig. 8, the forward conduction voltage drop of corresponding new construction RC-IGBT is 1.66V as shown in B points in Fig. 8, relative biography System RC-IGBT, new construction RC-IGBT conduction voltage drops reduce 19.4%.To sum up new construction RC-IGBT is not only eliminated Snapback phenomenons, are also greatly reduced forward conduction voltage drop and reduce forward conduction loss.Equally can by Fig. 8 simulation results Know, be V in reverse-conducting stateg=0V, Vcathode=(+V), VanodeDuring=0v, traditional RC-IGBT and new construction RC-IGBT The reverse-conducting curve of diode FWD be consistent substantially, when reverse-conduction current reaches -150A/cm2, two kinds of RC-IGBT Reverse-conducting pressure drop be respectively at D points and C points in Fig. 8, both do not have essential distinction, i.e., new construction RC-IGBT is to traditional RC- The reverse-conducting performance impact of IGBT less, can be ignored.
Fig. 9 is new construction RC-IGBT, and traditional RC-IGBT under forward conduction and reverse-conducting state, works as electric current respectively Density reaches 150A/cm2When current distributing figure, the A in figure, B, C, D point is corresponding with Fig. 8.From simulation result:It is positive During conducting, the part P-Collector of traditional RC-IGBT is replaced by N-Collector, therefore no current distribution in the left side in figure, Conducting electric current is mainly distributed on the top i.e. IGBT areas of P-Collector.New construction RC-IGBT is whole due to N-Collector Close knot terminal area, P-Collector is distributed in whole active area, thus during forward conduction CURRENT DISTRIBUTION in whole IGBT areas, Relatively conventional RC-IGBT, CURRENT DISTRIBUTION is more uniform.During reverse-conducting, the negative electrode of the diode FWD of traditional RC-IGBT is N- Collector, anode is P-body, therefore reverse-conduction current is distributed in N-Collector tops and is distributed in active area.New knot The negative electrode of the diode FWD of structure RC-IGBT is N-Collector, and anode is P-ring, because N-Collector is integrated into Event reverse-conduction current in knot terminal area is distributed in knot termination environment.
Figure 10 is new construction RC-IGBT, the reverse recovery current voltage wave of traditional RC-IGBT and traditional PIN diode Shape compares figure, can be seen that the softness factor of three kinds of devices is respectively 1.2,1.3,0.75 by current curve in figure, therefore this new The softness factor of the RC-IGBT of structure is suitable with tradition RC-IGBT, and relatively conventional PIN diode softness factor lifting 37%. Soft Reverse recovery is when the softness factor is more than 1.Traditional PIN diode is not only very hard Reverse recovery, but also is existed The phenomenon such as Snap-off and current fluctuation, and for new construction RC-IGBT and traditional RC-IGBT then in the absence of Snap-off and Current fluctuation phenomenon.Can be seen that, except the RC-IGBT of this new construction, other are all present by Reverse recovery voltage curve in figure Situations such as voltage overshoot and fluctuation, for traditional PIN diode, this phenomenon reason is due to the Snap-off of electric current and high What di/dt was caused, and for traditional RC-IGBT, the mechanism of the fluctuation of backward voltage is because in reversely restoring process, exhaust Layer imbalance caused by, and basic reason be electric current in device skewness, in taking out for Reverse recovery carrier The concussion of Current Voltage is result in during taking..
Figure 11 is new construction RC-IGBT, device in traditional RC-IGBT and the reversely restoring process of traditional PIN diode Internal current profiles versus scheme, as seen from the figure new construction RC-IGBT and traditional RC-IGBT reversely extract electric current when, due to P-Collector can be extracted this prevents carrier in drift region to hole is constantly injected in drift region by moment, it is ensured that Reverse recovery current is slowly reduced, this also explains new construction RC-IGBT in Figure 11 and traditional RC-IGBT Reverse recoveries electricity Stream does not exist Snap-off and current fluctuation phenomenon.And traditional PIN diode is due in the absence of P-Collector, reversely extensive During multiple, the carrier in drift region extracts by moment, thus causes the mutation of Current Voltage, that is, there is electric current The overshoot phenomenon of Snap-off phenomenons and voltage.
In sum, a kind of RC-IGBT by MOSFET control knot terminal integral body diodes proposed by the invention Device, snapback phenomenons, and forward conduction voltage drop reduction are completely eliminated through simulating, verifying under forward conduction IGBT patterns 19.4%.Under reverse-conducting FWD patterns, body diode is integrated with by tying terminal.The diode has soft anti-recovery The fluctuation of no current and voltage in characteristic, and whole reversely restoring process.In sum, this new construction RC-IGBT is carried significantly The combination property of traditional RC-IGBT high.
A kind of RC-IGBT devices by MOSFET control knot terminal integral body diodes proposed by the present invention, to illustrate As a example by Fig. 4, its concrete methods of realizing includes:Choose N-type<100>Crystal orientation zone melting single-crystal is padded, field oxidation, etches active area, long Grid oxygen, deposit Poly grid (grid 13 of metal-oxide-semiconductor is synchronously completed), the injection of P body, the N+ active areas injection (source electrode of MOSFET 11 synchronously complete with drain electrode 12), BPSG is deposited, emitter metal is punched and deposits, emitter metal exposes and etches, back surface field Stop layer injects, backside collector N-Collector (8) and colelctor electrode P-Collector (9) ion implanting and annealing respectively. Back face metalization, passivation etc..
During implementation, according to the design requirement of specific device, one kind proposed by the present invention is by MOSFET controls The RC-IGBT devices of terminal integral body diode are tied, its surface MOS areas and drift region are variable, can be used for groove grid In the RC-IGBT (such as Fig. 6) and superjunction super junction RC-IGBT (such as Fig. 7) of trench structures.In specific making, Backing material also can use the semi-conducting materials such as carborundum, GaAs, indium phosphide or germanium silicon to replace body except that can use silicon Si materials Silicon.
Finally illustrate, preferred embodiment above is merely illustrative of the technical solution of the present invention and unrestricted, although logical Cross above preferred embodiment to be described in detail the present invention, it is to be understood by those skilled in the art that can be Various changes are made to it in form and in details, without departing from claims of the present invention limited range.

Claims (3)

  1. It is 1. a kind of to control to tie the RC-IGBT devices of terminal integral body diode by MOSFET, it is characterised in that:Including from up to The cathode layer of lower setting, N- drift regions (6), N cushions (7) and collecting zone, the collecting zone include the N collector region set with layer (8) some polygate electrodes (2), two neighboring polysilicon gate electricity and P collector region (9), are arranged at intervals with the cathode layer Interpolar forms active emitter (4), and each polygate electrodes is by SiO2Gate oxide (3) is surrounded;Each active emitter Lower section is provided with a P-body area (5), and P-body areas (5) are set positioned at the top of N- drift regions (6) in P-body areas (5) There are the N+ active areas (1) being connected with active emitter;Inverse conductivity type insulated gate bipolar transistor is from left to right divided into active Area, transition region and knot termination environment, the bottom of the knot termination environment are made up of N collector region (8) completely.
  2. 2. it is according to claim 1 it is a kind of by MOSFET control knot terminal integral body diode RC-IGBT devices, its It is characterised by:Some SiO are arranged at intervals with cathode layer in the knot termination environment2Field oxide (15), two neighboring SiO2 Oxide layer connects field spacing ring P-ring (14), and spacing ring P-ring in field is located in N- drift regions, field spacing ring P-ring The anode of the body diode being internally integrated with RC-IGBT is connected, the body two that inverse conductivity type insulated gate bipolar transistor is internally integrated The negative electrode of pole pipe is connected with N collector region.
  3. 3. it is according to claim 2 it is a kind of by MOSFET control knot terminal integral body diode RC-IGBT devices, its It is characterised by:MOSFET is provided with the equal potential belt (10) of the transition region, the source electrode (11) of MOSFET and drain electrode (12) are located at In the equal potential belt (10) of transition region, the grid (13) of MOSFET pipes is positioned at SiO2In gate oxide (3);The source electrode (11) of MOSFET Metal with knot termination environment is connected, and drain electrode (12) is connected with the cathodic metal of active area, and grid (13) (12) and has with draining The cathodic metal of source region is connected, and the raceway groove between source electrode and drain electrode is opened and controlled by MOSFET grids (13) with off state.
CN201710099683.4A 2017-02-23 2017-02-23 A kind of RC-IGBT device controlling knot terminal integral body diode by MOSFET Active CN106847891B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201710099683.4A CN106847891B (en) 2017-02-23 2017-02-23 A kind of RC-IGBT device controlling knot terminal integral body diode by MOSFET

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201710099683.4A CN106847891B (en) 2017-02-23 2017-02-23 A kind of RC-IGBT device controlling knot terminal integral body diode by MOSFET

Publications (2)

Publication Number Publication Date
CN106847891A true CN106847891A (en) 2017-06-13
CN106847891B CN106847891B (en) 2019-09-03

Family

ID=59134565

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201710099683.4A Active CN106847891B (en) 2017-02-23 2017-02-23 A kind of RC-IGBT device controlling knot terminal integral body diode by MOSFET

Country Status (1)

Country Link
CN (1) CN106847891B (en)

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109256422A (en) * 2017-07-12 2019-01-22 中芯国际集成电路制造(上海)有限公司 A kind of semiconductor devices and its manufacturing method and electronic device
CN109742090A (en) * 2019-01-10 2019-05-10 重庆邮电大学 A kind of compound RC-LIGBT device of integrating with LDMOS and LIGBT
CN109755303A (en) * 2017-11-01 2019-05-14 苏州东微半导体有限公司 A kind of IGBT power device
CN110610986A (en) * 2019-10-09 2019-12-24 重庆邮电大学 RC-IGBT device integrating transverse freewheeling diode by using junction terminal
CN111668212A (en) * 2019-03-07 2020-09-15 三菱电机株式会社 Semiconductor device with a plurality of semiconductor chips
CN111834449A (en) * 2020-07-27 2020-10-27 重庆邮电大学 Quick turn-off RC-IGBT device with back double-MOS structure
CN112204431A (en) * 2018-06-27 2021-01-08 棱镜传感器公司 X-ray sensor, method of constructing an X-ray sensor and X-ray imaging system comprising such an X-ray sensor
CN112234098A (en) * 2020-10-27 2021-01-15 瑞能半导体科技股份有限公司 Insulated gate bipolar transistor terminal
WO2021103114A1 (en) * 2019-11-29 2021-06-03 苏州东微半导体有限公司 Igbt device
CN116314276A (en) * 2023-05-12 2023-06-23 深圳市威兆半导体股份有限公司 Semiconductor device with a semiconductor layer having a plurality of semiconductor layers
CN117577675A (en) * 2024-01-15 2024-02-20 汉轩微电子制造(江苏)有限公司 IGBT device embedded with FRD and manufacturing method thereof
CN117650163A (en) * 2023-10-31 2024-03-05 海信家电集团股份有限公司 Semiconductor device with a semiconductor device having a plurality of semiconductor chips

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103489908A (en) * 2013-09-16 2014-01-01 电子科技大学 RC-IGBT capable of eliminating negative resistance effect
CN204155935U (en) * 2013-03-26 2015-02-11 英飞凌科技奥地利有限公司 Semiconductor device
CN104779279A (en) * 2015-04-10 2015-07-15 电子科技大学 RC-IGBT (reverse-conducting insulated gate bipolar translator) capable of inhibiting snapback effect
US20160027866A1 (en) * 2014-07-22 2016-01-28 Fuji Electric Co., Ltd. Semiconductor device

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN204155935U (en) * 2013-03-26 2015-02-11 英飞凌科技奥地利有限公司 Semiconductor device
CN103489908A (en) * 2013-09-16 2014-01-01 电子科技大学 RC-IGBT capable of eliminating negative resistance effect
US20160027866A1 (en) * 2014-07-22 2016-01-28 Fuji Electric Co., Ltd. Semiconductor device
CN104779279A (en) * 2015-04-10 2015-07-15 电子科技大学 RC-IGBT (reverse-conducting insulated gate bipolar translator) capable of inhibiting snapback effect

Cited By (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109256422A (en) * 2017-07-12 2019-01-22 中芯国际集成电路制造(上海)有限公司 A kind of semiconductor devices and its manufacturing method and electronic device
CN109256422B (en) * 2017-07-12 2022-04-29 中芯国际集成电路制造(上海)有限公司 Semiconductor device, manufacturing method thereof and electronic device
CN109755303A (en) * 2017-11-01 2019-05-14 苏州东微半导体有限公司 A kind of IGBT power device
CN112204431A (en) * 2018-06-27 2021-01-08 棱镜传感器公司 X-ray sensor, method of constructing an X-ray sensor and X-ray imaging system comprising such an X-ray sensor
CN112204431B (en) * 2018-06-27 2024-04-16 棱镜传感器公司 X-ray sensor, method of constructing an X-ray sensor and X-ray imaging system comprising such an X-ray sensor
CN109742090A (en) * 2019-01-10 2019-05-10 重庆邮电大学 A kind of compound RC-LIGBT device of integrating with LDMOS and LIGBT
CN109742090B (en) * 2019-01-10 2020-09-01 重庆邮电大学 Composite RC-LIGBT device integrating LDMOS and LIGBT
CN111668212A (en) * 2019-03-07 2020-09-15 三菱电机株式会社 Semiconductor device with a plurality of semiconductor chips
CN111668212B (en) * 2019-03-07 2023-09-29 三菱电机株式会社 Semiconductor device with a semiconductor device having a plurality of semiconductor chips
CN110610986B (en) * 2019-10-09 2023-03-14 重庆邮电大学 RC-IGBT device integrating transverse freewheeling diode by using junction terminal
CN110610986A (en) * 2019-10-09 2019-12-24 重庆邮电大学 RC-IGBT device integrating transverse freewheeling diode by using junction terminal
WO2021103114A1 (en) * 2019-11-29 2021-06-03 苏州东微半导体有限公司 Igbt device
US11688799B2 (en) 2019-11-29 2023-06-27 Suzhou Oriental Semiconductor Co., Ltd. IGBT device
CN111834449B (en) * 2020-07-27 2024-04-16 重庆邮电大学 Quick turn-off RC-IGBT device with back double MOS structure
CN111834449A (en) * 2020-07-27 2020-10-27 重庆邮电大学 Quick turn-off RC-IGBT device with back double-MOS structure
CN112234098A (en) * 2020-10-27 2021-01-15 瑞能半导体科技股份有限公司 Insulated gate bipolar transistor terminal
CN116314276B (en) * 2023-05-12 2023-07-28 深圳市威兆半导体股份有限公司 Semiconductor device with a semiconductor layer having a plurality of semiconductor layers
CN116314276A (en) * 2023-05-12 2023-06-23 深圳市威兆半导体股份有限公司 Semiconductor device with a semiconductor layer having a plurality of semiconductor layers
CN117650163A (en) * 2023-10-31 2024-03-05 海信家电集团股份有限公司 Semiconductor device with a semiconductor device having a plurality of semiconductor chips
CN117650163B (en) * 2023-10-31 2024-09-06 海信家电集团股份有限公司 Semiconductor device with a semiconductor device having a plurality of semiconductor chips
CN117577675B (en) * 2024-01-15 2024-04-12 汉轩微电子制造(江苏)有限公司 IGBT device embedded with FRD and manufacturing method thereof
CN117577675A (en) * 2024-01-15 2024-02-20 汉轩微电子制造(江苏)有限公司 IGBT device embedded with FRD and manufacturing method thereof

Also Published As

Publication number Publication date
CN106847891B (en) 2019-09-03

Similar Documents

Publication Publication Date Title
CN106847891B (en) A kind of RC-IGBT device controlling knot terminal integral body diode by MOSFET
CN105322002B (en) Reverse conduction IGBT
CN103383958B (en) A kind of RC-IGBT device and making method thereof
CN106067480B (en) A kind of binary channels RC-LIGBT device and preparation method thereof
CN102169892B (en) Enhancement mode planar insulated gate bipolar transistor (IGBT)
CN107195678B (en) A kind of superjunction IGBT of carrier storage enhancing
CN107256864A (en) A kind of carborundum TrenchMOS devices and preparation method thereof
CN110459598A (en) A kind of superjunction MOS type power semiconductor and preparation method thereof
CN110504310A (en) A kind of RET IGBT and preparation method thereof with automatic biasing PMOS
CN103178120A (en) Fast recovery epitaxial diode (FRED) and preparation method thereof
CN106024876A (en) Reverse conducting lateral insulated gate bipolar transistor device for eliminating hysteresis phenomenon
CN106098762A (en) A kind of RC IGBT device and preparation method thereof
CN108461537A (en) A kind of trench gate charge storage type IGBT and preparation method thereof
CN106129110B (en) A kind of binary channels RC-IGBT device and preparation method thereof
CN107425068A (en) A kind of carborundum TrenchMOS devices and preparation method thereof
CN107305909A (en) A kind of inverse conductivity type IGBT back structure and preparation method thereof
CN108899363A (en) The trench gate IGBT device of conduction voltage drop and turn-off power loss can be reduced
CN105845718B (en) A kind of 4H-SiC trench-type insulated gate bipolar transistor
CN106098764B (en) A kind of binary channels RC-LIGBT device and preparation method thereof
CN103872097B (en) Power semiconductor device and its manufacture method
Minato et al. Making a bridge from SJ-MOSFET to IGBT via RC-IGBT structure Concept for 600V class SJ-RC-IGBT in a single chip solution
CN104779279B (en) It is a kind of to suppress the RC IGBT of negative resistance effect
CN105047704B (en) A kind of high pressure IGBT and its manufacture method with communicate-type accumulation layer
CN104795438B (en) It is a kind of to suppress the SA LIGBT of negative resistance effect
CN106067481A (en) A kind of binary channels RC IGBT device and preparation method thereof

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant
TR01 Transfer of patent right
TR01 Transfer of patent right

Effective date of registration: 20220126

Address after: 518000 18J, building 6, weipeng garden, Futian District, Shenzhen, Guangdong

Patentee after: Yang Lihua

Address before: 400065 Chongqing Nan'an District huangjuezhen pass Chongwen Road No. 2

Patentee before: CHONGQING University OF POSTS AND TELECOMMUNICATIONS