CN106842834B - 一种用于热敏阳图ctp版的显影液 - Google Patents
一种用于热敏阳图ctp版的显影液 Download PDFInfo
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- CN106842834B CN106842834B CN201710236958.4A CN201710236958A CN106842834B CN 106842834 B CN106842834 B CN 106842834B CN 201710236958 A CN201710236958 A CN 201710236958A CN 106842834 B CN106842834 B CN 106842834B
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/322—Aqueous alkaline compositions
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
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Claims (9)
Priority Applications (1)
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CN201710236958.4A CN106842834B (zh) | 2017-04-12 | 2017-04-12 | 一种用于热敏阳图ctp版的显影液 |
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CN201710236958.4A CN106842834B (zh) | 2017-04-12 | 2017-04-12 | 一种用于热敏阳图ctp版的显影液 |
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CN106842834A CN106842834A (zh) | 2017-06-13 |
CN106842834B true CN106842834B (zh) | 2020-01-03 |
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CN201710236958.4A Active CN106842834B (zh) | 2017-04-12 | 2017-04-12 | 一种用于热敏阳图ctp版的显影液 |
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Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108363274A (zh) * | 2018-01-25 | 2018-08-03 | 上海宝士嘉印刷器材有限公司 | 耐uv油墨热敏ctp版显影液 |
CN111324020A (zh) * | 2018-12-17 | 2020-06-23 | 乐凯华光印刷科技有限公司 | 一种热敏阳图ctp版显影液 |
CN113253580A (zh) * | 2021-05-11 | 2021-08-13 | 绵阳艾萨斯电子材料有限公司 | 负性光刻胶显影液及其制备方法、应用 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4780396A (en) * | 1987-02-17 | 1988-10-25 | Hoechst Celanese Corporation | Organic solvent free developer compositions for lithographic plates having neutral pH comprising a lithium and potassium salt and an anionic surfactant |
JP2001105764A (ja) * | 1999-10-06 | 2001-04-17 | Chugai Photo Chemical Co Ltd | 平版印刷用湿し水組成物 |
CN101770186A (zh) * | 2008-12-30 | 2010-07-07 | 乐凯集团第二胶片厂 | 一种适用于阳图平印版材的显影液 |
CN102053508A (zh) * | 2010-11-09 | 2011-05-11 | 泰兴市东方实业公司 | 阳图热敏ctp版显影剂 |
CN102722092A (zh) * | 2012-06-06 | 2012-10-10 | 乐凯华光印刷科技有限公司 | 一种适用于光聚合型平版印刷版的显影液 |
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2017
- 2017-04-12 CN CN201710236958.4A patent/CN106842834B/zh active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4780396A (en) * | 1987-02-17 | 1988-10-25 | Hoechst Celanese Corporation | Organic solvent free developer compositions for lithographic plates having neutral pH comprising a lithium and potassium salt and an anionic surfactant |
JP2001105764A (ja) * | 1999-10-06 | 2001-04-17 | Chugai Photo Chemical Co Ltd | 平版印刷用湿し水組成物 |
CN101770186A (zh) * | 2008-12-30 | 2010-07-07 | 乐凯集团第二胶片厂 | 一种适用于阳图平印版材的显影液 |
CN102053508A (zh) * | 2010-11-09 | 2011-05-11 | 泰兴市东方实业公司 | 阳图热敏ctp版显影剂 |
CN102722092A (zh) * | 2012-06-06 | 2012-10-10 | 乐凯华光印刷科技有限公司 | 一种适用于光聚合型平版印刷版的显影液 |
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CN106842834A (zh) | 2017-06-13 |
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PB01 | Publication | ||
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SE01 | Entry into force of request for substantive examination | ||
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GR01 | Patent grant | ||
GR01 | Patent grant | ||
CP03 | Change of name, title or address | ||
CP03 | Change of name, title or address |
Address after: 242200 No. 37, Pengju Road, Guangde Economic Development Zone, Xuancheng City, Anhui Province Patentee after: Anhui Qiangbang New Material Co.,Ltd. Address before: 242200 No. 37, Pengju Road, Guangde Economic Development Zone, Xuancheng City, Anhui Province Patentee before: ANHUI STRONG STATE PRINTING MATERIAL Co.,Ltd. |
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PE01 | Entry into force of the registration of the contract for pledge of patent right | ||
PE01 | Entry into force of the registration of the contract for pledge of patent right |
Denomination of invention: A developer for thermal positive CTP plate Effective date of registration: 20211130 Granted publication date: 20200103 Pledgee: Industrial and Commercial Bank of China Limited Guangde sub branch Pledgor: Anhui Qiangbang New Material Co.,Ltd. Registration number: Y2021980013663 |
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PC01 | Cancellation of the registration of the contract for pledge of patent right | ||
PC01 | Cancellation of the registration of the contract for pledge of patent right |
Date of cancellation: 20230308 Granted publication date: 20200103 Pledgee: Industrial and Commercial Bank of China Limited Guangde sub branch Pledgor: Anhui Qiangbang New Material Co.,Ltd. Registration number: Y2021980013663 |