CN106687852B - 光照射装置和光照射方法 - Google Patents

光照射装置和光照射方法 Download PDF

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Publication number
CN106687852B
CN106687852B CN201580048521.7A CN201580048521A CN106687852B CN 106687852 B CN106687852 B CN 106687852B CN 201580048521 A CN201580048521 A CN 201580048521A CN 106687852 B CN106687852 B CN 106687852B
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China
Prior art keywords
light
wavelength
spatial
modulator
condensing
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CN201580048521.7A
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English (en)
Chinese (zh)
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CN106687852A (zh
Inventor
泷口优
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Hamamatsu Photonics KK
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Hamamatsu Photonics KK
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
    • B23K26/0648—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms comprising lenses
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
    • B23K26/0643—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms comprising mirrors
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
    • B23K26/0652—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms comprising prisms
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/067—Dividing the beam into multiple beams, e.g. multi-focusing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/073—Shaping the laser spot
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/0102—Constructional details, not otherwise provided for in this subclass
    • G02F1/0105—Illuminating devices
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2203/00—Function characteristic
    • G02F2203/12—Function characteristic spatial light modulator

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Nonlinear Science (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
  • Liquid Crystal (AREA)
  • Laser Beam Processing (AREA)
CN201580048521.7A 2014-09-10 2015-08-26 光照射装置和光照射方法 Active CN106687852B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2014184020A JP2016055319A (ja) 2014-09-10 2014-09-10 光照射装置および光照射方法
JP2014-184020 2014-09-10
PCT/JP2015/074061 WO2016039148A1 (ja) 2014-09-10 2015-08-26 光照射装置および光照射方法

Publications (2)

Publication Number Publication Date
CN106687852A CN106687852A (zh) 2017-05-17
CN106687852B true CN106687852B (zh) 2021-06-08

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CN201580048521.7A Active CN106687852B (zh) 2014-09-10 2015-08-26 光照射装置和光照射方法

Country Status (5)

Country Link
US (1) US10576580B2 (https=)
EP (1) EP3193207B1 (https=)
JP (1) JP2016055319A (https=)
CN (1) CN106687852B (https=)
WO (1) WO2016039148A1 (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016055319A (ja) * 2014-09-10 2016-04-21 浜松ホトニクス株式会社 光照射装置および光照射方法
US11179802B2 (en) 2016-07-14 2021-11-23 Mitsubishi Electric Corporation Laser machining head and laser machining apparatus
JP7149857B2 (ja) * 2019-01-08 2022-10-07 浜松ホトニクス株式会社 データ作成装置、光制御装置、データ作成方法、及びデータ作成プログラム
JP7450413B2 (ja) * 2020-03-09 2024-03-15 株式会社ディスコ レーザー加工装置およびレーザー加工装置の調整方法
CN111796439B (zh) * 2020-06-11 2023-04-21 杭州奥创光子技术有限公司 一种飞秒脉冲的整形压缩装置及其使用方法
JPWO2023228548A1 (https=) * 2022-05-24 2023-11-30

Family Cites Families (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3594384B2 (ja) * 1995-12-08 2004-11-24 ソニー株式会社 半導体露光装置、投影露光装置及び回路パターン製造方法
JP2001311877A (ja) * 2000-04-27 2001-11-09 Hamamatsu Photonics Kk 撮像装置
US7151609B2 (en) * 2000-07-06 2006-12-19 Filmetrics, Inc. Determining wafer orientation in spectral imaging
US20050174583A1 (en) * 2000-07-06 2005-08-11 Chalmers Scott A. Method and apparatus for high-speed thickness mapping of patterned thin films
US20050174584A1 (en) * 2000-07-06 2005-08-11 Chalmers Scott A. Method and apparatus for high-speed thickness mapping of patterned thin films
US7450618B2 (en) 2001-01-30 2008-11-11 Board Of Trustees Operating Michigan State University Laser system using ultrashort laser pulses
US7609731B2 (en) * 2001-01-30 2009-10-27 Board Of Trustees Operating Michigan State University Laser system using ultra-short laser pulses
US6781691B2 (en) * 2001-02-02 2004-08-24 Tidal Photonics, Inc. Apparatus and methods relating to wavelength conditioning of illumination
JP2002273583A (ja) * 2001-03-19 2002-09-25 Inst Of Physical & Chemical Res 透明媒質加工装置
ES2600876T3 (es) * 2003-09-04 2017-02-13 The Uab Research Foundation Procedimiento y aparato de detección de adaptación a oscuridad deteriorada
JP2005084266A (ja) * 2003-09-05 2005-03-31 Kawasaki Heavy Ind Ltd 光制御装置および光制御方法
JP2007526521A (ja) * 2004-03-02 2007-09-13 ボード オブ トラスティーズ オペレーティング ミシガン ステート ユニヴァーシティ 超短レーザーパルスを使用するレーザー装置
JP4716663B2 (ja) * 2004-03-19 2011-07-06 株式会社リコー レーザ加工装置、レーザ加工方法、及び該加工装置又は加工方法により作製された構造体
US7787779B2 (en) * 2005-05-06 2010-08-31 Purdue Research Foundation Photonic time-domain electromagnetic signal generator and system using the same
JP2007114278A (ja) * 2005-10-18 2007-05-10 Fuji Xerox Co Ltd 光アドレス型空間光変調素子の駆動方法、および光アドレス型空間光変調素子駆動装置
US9018562B2 (en) * 2006-04-10 2015-04-28 Board Of Trustees Of Michigan State University Laser material processing system
US7430071B2 (en) * 2006-05-16 2008-09-30 Coherent, Inc. Adjustable pulse-shaper
JP4402708B2 (ja) * 2007-08-03 2010-01-20 浜松ホトニクス株式会社 レーザ加工方法、レーザ加工装置及びその製造方法
US7813390B2 (en) * 2007-08-29 2010-10-12 Pavilion Integration Corporation Injection-seeded monolithic laser
US8239165B1 (en) * 2007-09-28 2012-08-07 Alliance For Sustainable Energy, Llc Ultra-fast determination of quantum efficiency of a solar cell
US7576907B1 (en) * 2008-05-12 2009-08-18 Colorado State University Research Foundation Phase and amplitude light pulse shaping using a one-dimensional phase mask
JP5692969B2 (ja) * 2008-09-01 2015-04-01 浜松ホトニクス株式会社 収差補正方法、この収差補正方法を用いたレーザ加工方法、この収差補正方法を用いたレーザ照射方法、収差補正装置、及び、収差補正プログラム
CN101349871B (zh) 2008-09-05 2010-09-15 上海微电子装备有限公司 光刻照明装置
US7894493B2 (en) * 2008-10-02 2011-02-22 Coherent, Inc. Ultrashort seed-pulse generating laser with integral pulse shaping
JP2010151948A (ja) 2008-12-24 2010-07-08 Hamamatsu Photonics Kk 光制御装置および光制御方法
EP2211430A3 (en) * 2009-01-23 2015-05-27 Board of Trustees of Michigan State University Laser autocorrelation system
JP5643329B2 (ja) * 2009-11-18 2014-12-17 ザ リージェンツ オブ ザ ユニバーシティ オブ カリフォルニア 多重パルスインパルシブ誘導ラマン分光装置および測定方法
US20130076861A1 (en) * 2010-01-21 2013-03-28 Shmuel Sternklar Method and apparatus for probing an object, medium or optical path using noisy light
US8630322B2 (en) * 2010-03-01 2014-01-14 Board Of Trustees Of Michigan State University Laser system for output manipulation
US9052239B2 (en) * 2011-03-14 2015-06-09 Wisconsin Alumni Research Foundation Multidimensional spectrometer
JP5802110B2 (ja) 2011-10-26 2015-10-28 浜松ホトニクス株式会社 光変調制御方法、制御プログラム、制御装置、及びレーザ光照射装置
US9137874B2 (en) * 2011-12-02 2015-09-15 Biological Illumination, Llc Illumination and grow light system and associated methods
JP5575200B2 (ja) * 2012-09-28 2014-08-20 浜松ホトニクス株式会社 レーザ加工装置及びその製造方法
JP2016055319A (ja) * 2014-09-10 2016-04-21 浜松ホトニクス株式会社 光照射装置および光照射方法

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
Dawn N. Vitek etc..Temporally focused femtosecond laser pulses for low numerical aperture micromachining through optically transparent materials.《OPTICS EXPRESS》.2010,第18卷(第17期), *
Guanghao Zhu etc..Simultaneous spatial and temporal focusing of femtosecond pulses.《OPTICS EXPRESS》.2005,第13卷(第6期), *

Also Published As

Publication number Publication date
EP3193207A1 (en) 2017-07-19
EP3193207B1 (en) 2022-05-11
US20170259374A1 (en) 2017-09-14
US10576580B2 (en) 2020-03-03
WO2016039148A1 (ja) 2016-03-17
EP3193207A4 (en) 2018-05-02
JP2016055319A (ja) 2016-04-21
CN106687852A (zh) 2017-05-17

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