CN106409786A - 一种双向esd防护二极管的dfn封装结构及制造方法 - Google Patents

一种双向esd防护二极管的dfn封装结构及制造方法 Download PDF

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CN106409786A
CN106409786A CN201611097226.3A CN201611097226A CN106409786A CN 106409786 A CN106409786 A CN 106409786A CN 201611097226 A CN201611097226 A CN 201611097226A CN 106409786 A CN106409786 A CN 106409786A
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chip
elargol
dfn
framework
plastic packaging
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薛维平
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SHANGHAI CORE STONE MICRO-ELECTRONIC Co Ltd
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SHANGHAI CORE STONE MICRO-ELECTRONIC Co Ltd
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Priority to CN201611097226.3A priority Critical patent/CN106409786A/zh
Publication of CN106409786A publication Critical patent/CN106409786A/zh
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/31Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
    • H01L23/3107Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H01L21/56Encapsulations, e.g. encapsulation layers, coatings
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/495Lead-frames or other flat leads
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16245Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation

Abstract

常规双向ESD防护二极管的芯片电极一个从正面引出,一个从背面引出,DFN封装时,芯片背面和框架用银胶连接,正面打金属线连接,常规结构的局限性是芯片尺寸要小于框架尺寸,芯片需要减薄至150微米以下,且背面需要金属化,此发明所使用的双向ESD防护二极管的芯片,其两个电极可以都从正面引出,两个电极都通过银胶和框架连接,芯片只需要使用单晶片制造,不再用外延片,降低成本;芯片厚度只需做到200微米,降低碎片率;背面无需金属化,减少工艺;芯片尺寸可以是原来的1.5‑2倍,给超低电容芯片、更强抗浪涌能力芯片提供了更多的设计空间。

Description

一种双向ESD防护二极管的DFN封装结构及制造方法
技术领域
本发明属于一种DFN封装的制造,适用于双向ESD防护二极管芯片的DFN封装。
背景技术
半导体电路集成度不断提高,ESD防护二极管的封装尺寸也随之变小,从原来的SOD523、SOD723到SOD923,再到DFN1006、DFN0603、 DFN0201,乃至将来的CSP封装,封装尺寸不断在缩小,但是对ESD防护二极管的性能要求却越来越高,抗浪涌能力,低电容,低电压等等参数标准不断提升,怎么样在更小的芯片上实现更强大的功能逐渐成为难题,由于最开始的ESD防护二极管是用在SOD523,SOD723封装上的,发展到后来,DFN封装仍然延续了SOD封装的工艺,即背面银胶连接,正面打金属线连接,目的是不改变最开始芯片的设计。随着封装尺寸变的越来越小,当到达DFN0603封装时,打线工艺已经占去了1/4的封装体高度空间,产生很多工艺上的难题,芯片厚度需要做到小于100微米,芯片尺寸也要做到小于200微米×200微米,芯片的成品率下降,封装的成品率同时也在下降,本发明的封装结构,两个芯片电极可以都是从正面引出,两个电极都通过银胶和框架连接,抛弃了正面打线工艺,芯片厚度只需做到200微米,而且省去了背面金属化,此结构提升了芯片成品率,提升了封装成品率,减少了芯片制造工艺,最重要的是芯片尺寸可以是原来的1.5-2倍,为超低电容产品、更强抗浪涌能力产品提供更大的芯片设计空间。
发明内容
1、一种双向ESD防护二极管的DFN封装结构,其结构包括:DFN框架上(105)连接银胶(104),银胶连接芯片电极(103),两个芯片电极都是从芯片(102)正面引出,芯片厚度小于200微米。
2、一种双向ESD防护二极管的DFN封装的制造方法,其方法包括:
A、将晶圆芯片通过划片切割成单个芯片,然后通过倒片使芯片正面与蓝膜粘接;
B、使用点胶机和固晶机,将芯片与框架通过银胶连接,然后固化银胶;
C、使用塑封机将载有芯片的框架塑封;
D、将塑封后裸露在外部的框架表面通过电镀,镀上银或者金;
E、将整个电镀好的塑封模块切割成单个的DFN封装体。
附图说明
图1是双向ESD防护二极管的DFN封装的截面图。
编号说明
101:DFN封装体;
102:双向ESD防护二极管芯片,厚度小于200微米;
103:芯片电极,金属,一般情况下是铝或者银,不局限于铝和银;
104:银胶,导电的胶状物,内含有银粉成分,高温固化;
105:框架,金属,一般情况下是铜,不局限于铜。
具体实施方式
1.芯片划片及倒片,芯片背面贴蓝膜,用划片机将整个的晶圆芯片,切割成单个芯片,切割完成后,用倒片机,将蓝膜上的芯片倒到另外一张蓝膜上,此时芯片的正面与蓝膜接触。
2.芯片与框架连接,用点胶机将银胶点到框架上,固晶机将单个芯片从蓝膜上取下,放在银胶上,芯片电极和银胶连接,进入固化炉固化。
3.塑封,将载有芯片的框架,放入塑封机进行塑封。
4.电镀,将漏在外部的框架电镀,一般镀银或者金。
5.塑封切割,将整个塑封模块切割成单个的DFN封装体。
6.测试包装。
通过上述实施例阐述了本发明,同时也可以采用其它实施例实现本发明,本发明不局限于上述具体实施例,因此本发明由所附权利要求范围限定。

Claims (2)

1.一种双向ESD防护二极管的DFN封装结构,其结构包括:DFN封装体(101)的框架(105)上连接银胶(104),银胶连接芯片电极(103),两个芯片电极都是从芯片(102)正面引出,芯片厚度小于200微米。
2.一种双向ESD防护二极管的DFN封装的制造方法,其方法包括:
A、将晶圆芯片通过划片切割成单个芯片,然后通过倒片使芯片正面与蓝膜粘接;
B、使用点胶机和固晶机,将芯片与框架通过银胶连接,然后固化银胶;
C、使用塑封机将载有芯片的框架塑封;
D、将塑封后裸露在外部的框架表面通过电镀,镀上银或者金;
E、将整个电镀好的塑封模块切割成单个的DFN封装体。
CN201611097226.3A 2016-12-02 2016-12-02 一种双向esd防护二极管的dfn封装结构及制造方法 Pending CN106409786A (zh)

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Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101764114A (zh) * 2009-12-30 2010-06-30 上海凯虹电子有限公司 一种倒装式封装结构及其制作方法
CN102820276A (zh) * 2011-06-10 2012-12-12 南茂科技股份有限公司 四方扁平无接脚封装及其制造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101764114A (zh) * 2009-12-30 2010-06-30 上海凯虹电子有限公司 一种倒装式封装结构及其制作方法
CN102820276A (zh) * 2011-06-10 2012-12-12 南茂科技股份有限公司 四方扁平无接脚封装及其制造方法

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Application publication date: 20170215