CN106373899A - 一种集成电路点胶封装装置 - Google Patents
一种集成电路点胶封装装置 Download PDFInfo
- Publication number
- CN106373899A CN106373899A CN201610865258.7A CN201610865258A CN106373899A CN 106373899 A CN106373899 A CN 106373899A CN 201610865258 A CN201610865258 A CN 201610865258A CN 106373899 A CN106373899 A CN 106373899A
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- CN
- China
- Prior art keywords
- falling
- type
- integrated circuit
- packaging device
- gas circuit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
- 238000004806 packaging method and process Methods 0.000 title claims abstract description 18
- 239000003292 glue Substances 0.000 claims description 16
- 238000010438 heat treatment Methods 0.000 claims description 9
- 230000008520 organization Effects 0.000 claims description 9
- 238000005259 measurement Methods 0.000 claims description 3
- 239000011148 porous material Substances 0.000 claims description 3
- 238000007789 sealing Methods 0.000 claims description 3
- 238000005516 engineering process Methods 0.000 abstract description 5
- 238000003466 welding Methods 0.000 abstract description 4
- 238000009434 installation Methods 0.000 abstract 3
- 238000000034 method Methods 0.000 description 6
- 238000005538 encapsulation Methods 0.000 description 3
- 101150038956 cup-4 gene Proteins 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 238000010923 batch production Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67115—Apparatus for thermal treatment mainly by radiation
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Package Closures (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Abstract
Description
Claims (7)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201610865258.7A CN106373899B (zh) | 2016-09-25 | 2016-09-25 | 一种集成电路点胶封装装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201610865258.7A CN106373899B (zh) | 2016-09-25 | 2016-09-25 | 一种集成电路点胶封装装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN106373899A true CN106373899A (zh) | 2017-02-01 |
CN106373899B CN106373899B (zh) | 2018-11-23 |
Family
ID=57897300
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201610865258.7A Expired - Fee Related CN106373899B (zh) | 2016-09-25 | 2016-09-25 | 一种集成电路点胶封装装置 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN106373899B (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111889310A (zh) * | 2020-07-17 | 2020-11-06 | 常州铭赛机器人科技股份有限公司 | 点胶机及其点胶方法 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02240940A (ja) * | 1989-03-15 | 1990-09-25 | Matsushita Electric Ind Co Ltd | 集積回路装置の製造方法 |
CN204144299U (zh) * | 2014-10-11 | 2015-02-04 | 陕西众森电能科技有限公司 | 一种新型太阳电池片加热吸附装置 |
CN104400420A (zh) * | 2014-10-30 | 2015-03-11 | 芜湖杰诺科技有限公司 | 一种半自动装配线 |
CN104843427A (zh) * | 2015-03-24 | 2015-08-19 | 昆山德友机械设备有限公司 | 一种电子管座的轨道运输机构 |
CN105742217A (zh) * | 2016-04-19 | 2016-07-06 | 刘宁 | 一种电子标签封装热压机构 |
-
2016
- 2016-09-25 CN CN201610865258.7A patent/CN106373899B/zh not_active Expired - Fee Related
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02240940A (ja) * | 1989-03-15 | 1990-09-25 | Matsushita Electric Ind Co Ltd | 集積回路装置の製造方法 |
CN204144299U (zh) * | 2014-10-11 | 2015-02-04 | 陕西众森电能科技有限公司 | 一种新型太阳电池片加热吸附装置 |
CN104400420A (zh) * | 2014-10-30 | 2015-03-11 | 芜湖杰诺科技有限公司 | 一种半自动装配线 |
CN104843427A (zh) * | 2015-03-24 | 2015-08-19 | 昆山德友机械设备有限公司 | 一种电子管座的轨道运输机构 |
CN105742217A (zh) * | 2016-04-19 | 2016-07-06 | 刘宁 | 一种电子标签封装热压机构 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111889310A (zh) * | 2020-07-17 | 2020-11-06 | 常州铭赛机器人科技股份有限公司 | 点胶机及其点胶方法 |
Also Published As
Publication number | Publication date |
---|---|
CN106373899B (zh) | 2018-11-23 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20181011 Address after: 402660 Chongqing Tongnan Industrial Park Phase 1, standard building 6, 1, 2 storey, 3 storey, 1/4 floor, building No. 5. Applicant after: CHONGQING ANYIDA ELECTRONICS Co.,Ltd. Address before: 523000 productivity building 406, high tech Industrial Development Zone, Songshan Lake, Dongguan, Guangdong Applicant before: Dongguan Lianzhou Intellectual Property Operation Management Co.,Ltd. |
|
TA01 | Transfer of patent application right | ||
GR01 | Patent grant | ||
GR01 | Patent grant | ||
CP03 | Change of name, title or address |
Address after: 402660 No.1 and No.2 buildings of phase III standard workshop of Zitong Street Industrial Park, Tongnan District, Chongqing Patentee after: Chongqing Guanyang Technology Co.,Ltd. Address before: 402660 Chongqing Tongnan Industrial Park Phase 1, standard building 6, 1, 2 storey, 3 storey, 1/4 floor, building No. 5. Patentee before: CHONGQING ANYIDA ELECTRONICS Co.,Ltd. |
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CP03 | Change of name, title or address | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20181123 |