CN106366552B - 一种解决塑料制件光腐蚀的abs合金材料及其制备方法 - Google Patents
一种解决塑料制件光腐蚀的abs合金材料及其制备方法 Download PDFInfo
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- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 18
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Abstract
本发明公开了一种解决塑料制件光腐蚀的ABS合金材料及其制备方法,其是将微纳半导体粉体与ABS树脂进行混合,再将除光阻隔剂外的其他物料混合均匀后,加入到挤出机中,再将光阻隔剂以侧喂料的方式加入,熔融后进行挤出、冷却、风干、切粒得到解决塑料制件光腐蚀的ABS合金材料。本发明方法制备方法简单,制得的ABS合金材料可以实现超高的清晰度和透度,颠覆了塑料隐藏显示制件透度提高的路径,成功解决塑料隐藏显示件透度与清晰度相互矛盾的囧途,同时从根本上解决塑料制件的光腐蚀现象,保证长期光照表面无任何印迹。本产品优异的抗光腐蚀性,解决了困扰家电行业十几年的光腐蚀现象,使得家电行业的隐藏显示设计不再受到局限。
Description
技术领域
本发明涉及一种解决塑料制件光腐蚀的ABS合金材料及其制备方法,属于高分子材料技术领域。
背景技术
目前,世界各国家电行业的发展越来越从人性出发,智慧家居正在慢慢走近我们的生活的方方面面,人类对于家电的需求不在满足于只是简简单单的电器功能使用,更希望家电成为生活装饰、健康等提高舒适感的一部分。“晨之美、食有度、居无忧、呼倍畅、享私厨、沐唤新、枕安眠”这种智慧的生活场景成为家电发展的必然趋势。
隐藏显示就是这场家电革命中闪现出的重要的一员大将,隐藏显示即可以保持家电面板的一体化,大大提高了外观的美感,同时防止了水和外界液体的浸入,提高了安全性。
然而LED灯长时间的光辐照,塑料树脂中的微量物质会发生一定变化,光路会被击穿,使得塑料树脂变白变紫,在制件表面显现出一个数字的印子,难以消退。这个瓶颈严重制约了家电的发展。
目前改善家电材料光腐蚀现象的文献只有锦湖日立有报道,但是以ABS为基材采用光致发光技术,同时采用光阻隔剂解决这一问题的文献的国内未见报道。专利号CN201410770776.1、名称为一种可改善空调面板光腐蚀现象的PC/ABS组合物及其制备方法,该专利中以PC/ABS为基材,未使用光阻隔剂,TIO2未经接枝和表面包覆处理,未使用光屏蔽剂,其只能改善空调面板的光腐蚀现象不能从根本上解决上述问题。
发明内容
为了解决现有技术的不足和缺陷,本发明提供了一种解决塑料制件光腐蚀的ABS合金材料,该材料具有较好的清晰度和透度,且从根本上解决了塑料制件的光腐蚀现象,保证长期光照表面无任何印迹,同时其外观具有同金属喷涂同样的美学效果,且其制备程序简单、无污染。
为了实现上述目的本发明采用如下技术方案:
本发明的一种解决塑料制件光腐蚀的ABS合金材料,由以下重量份的原料组分制成:
上述所述的一种解决塑料制件光腐蚀的ABS合金材料中,所述微纳半导体粉体为纳米ZnO和/或纳米ZnS。
上述所述的一种解决塑料制件光腐蚀的ABS合金材料中,所述光阻隔剂为使用硅烷偶联剂进行表面改性处理过的矿物,所述的矿物为超细滑石粉、纳米碳酸钙、硫酸钡、云母粉、硅灰石、聚酰胺纤维中的至少一种。
上述所述的一种解决塑料制件光腐蚀的ABS合金材料中,所选改性TiO2为经接枝和包覆处理的金红石型纳米级TIO2,粒径为10~100nm。所述接枝是指纳米级TIO2接枝丙烯晴单体得接枝产物,所述包覆是指接枝产物与偶联剂形成包覆产物。
接枝的方法可以为:在1000ML圆底烧瓶中加入纳米级TIO2、接枝单体丙烯晴单体、二甲苯(作为溶剂)和氧化苯甲酰或者过氧化环己酮引发剂,置于油浴恒温槽中,边搅拌边通入氮气,升温至110-130℃,进行接枝反应50-70min,得接枝产物;其中,TIO2、丙烯晴单体、二甲苯三者重量比2-3:1:5-10,引发剂用量可为上述三者总重量的0.1-0.5%。
包覆方法可以为:将上述接枝产物在高速搅拌下,升温至90~100℃时加入偶联剂(也可以是偶联剂的稀释溶液如重量浓度10-20t%偶联剂的丙酮溶液或二甲苯溶液等),碱调pH值为10-11,温度达到100-110℃,反应700-750h即得改性TiO2。
上述所述的一种解决塑料制件光腐蚀的ABS合金材料中,所用抗氧剂为受阻酚类抗氧剂、亚磷酸类抗氧剂或者复合型抗氧剂或者绿色抗氧剂。
所述的受阻酚类抗氧剂选自2,2-亚甲基-双(4-甲基-6-叔丁基酚)、N,N-[3-(3,5-二叔丁基-4-羟基苯基)丙酰]六甲撑二胺、4,4'-硫代双(6-叔丁基-3-甲基苯酚)或者3,9-双[1,1-二甲基-2-[(3-叔丁基-4-羟基-5-甲基苯基)丙酰氧基]乙基]-2,4,8,10-四氧杂螺[5.5]十;复合型抗氧剂为N,N’-双[3-(3’,5’-二叔丁基-4’-羟基苯基)丙酰己二胺;绿色抗氧剂为a-维生素E或者对甲苯酚与双环戊二烯丁基化合反应生成物。
上述所述的一种解决塑料制件光腐蚀的ABS合金材料中,所述润滑剂选自季戊四醇硬脂酸酯、N,N-已撑双硬脂酰胺、褐煤蜡、甘油单酯酸值、酰胺蜡、邻苯二甲酸二辛脂、丁基硬脂酸酯中的至少一种。
上述所述的一种解决塑料制件光腐蚀的ABS合金材料中,所述光稳定剂为受阻胺类、亚磷酸酯类光稳定剂和苯并三唑类光稳定剂中的至少一种。
上述所述的一种解决塑料制件光腐蚀的ABS合金材料中,所述光屏蔽剂为OnCapLight Shield、炭黑、二氧化钛、氧化锌、锌钡中的一种或者几种。炭黑是吸附剂,而氧化锌和二氧化钛稳定剂为白色颜料,可使光反射而呈现白色。
本发明还提供了上一种解决塑料制件光腐蚀的ABS合金材料的制备方法,其包括步骤:首先将微纳半导体粉体与ABS树脂在混料机中进行混合,再将除光阻隔剂外的其他物料加入混合均匀后,加到双螺杆挤出机的料斗中,同时将光阻隔剂以侧喂料的方式加入,经熔融共混挤出、冷却、风干、切粒成解决塑料制件光腐蚀的ABS合金材料。
本发明中所述微纳半导体粉体光致发光可吸收对材料危害最大的紫外波段,同时转化为可见光源,大大提高了材料本身的抗变色能力,使隐藏显示塑料件抗光腐蚀性大大提高,宏观表现为材料颜色不变。
本发明采用微纳半导体粉体,采用了二次光致发光技术,可在一定范围内将源头紫外光进行转变,降低了有害光的强度,同时加入自制的光阻隔剂和光屏蔽剂,阻止了有害紫外光的投射,大大降低了光在塑料制件中蚀刻强度,从而达到消除光的蚀刻材料现象。
本产品超高的清晰度和透度(透光度9-11%;雾度小于80),颠覆了塑料隐藏显示制件透度提高的路径,成功解决塑料隐藏显示件透度与清晰度相互矛盾的囧途,同时从根本上解决塑料制件的光腐蚀现象,保证长期光照表面无任何印迹,推动了家电行业尤其是空调业品质的变革。本产品优异的抗光腐蚀性,解决了困扰家电行业十几年的光腐蚀现象,使得家电行业的隐藏显示设计不再受到局限。
具体实施方式
下述实施例是对于本发明内容的进一步说明以作为对本发明技术内容的阐释,但本发明的实质内容并不仅限于下述实施例所述,本领域的普通技术人员可以且应当知晓任何基于本发明实质精神的简单变化或替换均应属于本发明所要求的保护范围。
所选改性TiO2为经接枝和包覆处理的金红石型纳米级TIO2,粒径为10~100nm。所述接枝是指纳米级TIO2接枝丙烯晴单体得接枝产物,所述包覆是指接枝产物与偶联剂形成包覆产物。具体为:在1000ML圆底烧瓶中加入纳米级TIO2、接枝单体丙烯晴单体、二甲苯、引发剂过氧化环己酮,置于油浴恒温槽中,边搅拌边通入氮气,升温至120℃,进行接枝反应60min,得接枝产物;其中,TIO2、丙烯晴单体、二甲苯三者重量比3:1:6,引发剂用量为上述三者总重量的0.2%;将上述接枝产物在高速搅拌下,升温至95℃时加入10wt%硅烷偶联剂的丙酮溶液,碱调pH值为11,温度达到105℃,反应720h即得改性TiO2。
实施例1:
上述光阻隔剂为硅烷偶联剂表面处理的超细滑石粉,抗氧剂为N,N’-双[3-(3’,5’-二叔丁基-4’-羟基苯基)丙酰己二胺,润滑剂为季戊四醇硬脂酸酯,光稳定剂为受阻胺类HS-944,光屏蔽剂为炭黑,微纳半导体粉体为纳米ZnO与纳米ZnS的混合。
制备方法如下:
首先将微纳半导体粉体与ABS树脂在混料机中进行混合,再将除光阻隔剂外的其他物料加入混合均匀后,加到双螺杆挤出机的料斗中,同时将光阻隔剂以侧喂料的方式加入,经熔融共混挤出、冷却、风干、切粒成解决塑料制件光腐蚀的ABS合金材料。
比较例1:(不添加微纳半导体粉体)
上述光阻隔剂为硅烷偶联剂表面处理的纳米碳酸钙,抗氧剂为2,2-亚甲基-双(4-甲基-6-叔丁基酚),润滑剂为N,N-已撑双硬脂酰胺,光稳定剂为苯并三唑类光稳定剂UV-5411,光屏蔽剂为OnCap Light Shield。
制备方法如下:
称取以上重量百分含量的各组分,并加入高混料机中混合,将混合好的物料加到双螺杆挤出机的料斗中,解决塑料制件光腐蚀的ABS合金材料.
比较例2:(不添加光阻隔剂)
上述光阻隔剂为硅烷偶联剂表面处理的纳米碳酸钙,抗氧剂为2,2-亚甲基-双(4-甲基-6-叔丁基酚),润滑剂为N,N-已撑双硬脂酰胺,光稳定剂为苯并三唑类光稳定剂UV-5411,光屏蔽剂为OnCap Light Shield。
制备方法如下:
首先将微纳半导体粉体与ABS树脂在混料机中进行混合,再将其他物料加入混合均匀后,加到双螺杆挤出机的料斗中,经熔融共混挤出、冷却、风干、切粒成解决塑料制件光腐蚀的ABS合金材料。
比较例3:(不添加光屏蔽剂)
上述光阻隔剂为硅烷偶联剂表面处理的纳米碳酸钙,抗氧剂为2,2-亚甲基-双(4-甲基-6-叔丁基酚),润滑剂为N,N-已撑双硬脂酰胺,光稳定剂为苯并三唑类光稳定剂UV-5411。
制备方法如下:
称取以上重量百分含量的各组分,并加入高混料机中混合,将混合好的物料加到双螺杆挤出机的料斗中,解决塑料制件光腐蚀的ABS合金材料.
表1合金材料主要物性指标:
实施例2
上述光阻隔剂为硅烷偶联剂表面处理的硫酸钡,抗氧剂为N,N’-双[3-(3’,5’-二叔丁基-4’-羟基苯基)丙酰己二胺,润滑剂为季戊四醇硬脂酸酯,光稳定剂为受阻胺类HS-944,光屏蔽剂为炭黑,微纳半导体粉体为纳米ZnO与纳米ZnS的混合。
制备方法同实施例1。
比较例4:
采用未改性的Tio2替换实施例2中的改性Tio2,其他同实施例2。
实施例3
上述光阻隔剂为硅烷偶联剂表面处理的超细滑石粉,抗氧剂为N,N’-双[3-(3’,5’-二叔丁基-4’-羟基苯基)丙酰己二胺,润滑剂为季戊四醇硬脂酸酯,光稳定剂为受阻胺类HS-944,光屏蔽剂为炭黑,微纳半导体粉体为纳米ZnO与纳米ZnS的混合。
制备方法同实施例1。
实施例4
上述光阻隔剂为硅烷偶联剂表面处理的超细滑石粉,抗氧剂为N,N’-双[3-(3’,5’-二叔丁基-4’-羟基苯基)丙酰己二胺,润滑剂为季戊四醇硬脂酸酯,光稳定剂为受阻胺类HS-944,光屏蔽剂为炭黑,微纳半导体粉体为纳米ZnO与纳米ZnS的混合。
制备方法同实施例1。
表2合金材料主要物性指标:
从以上表格中可以看出,实验可以显著解决困扰家电行业的光腐蚀现象。以上所述尽是本发明的优选方案,应当指出,对于本技术领域的普通技术人员,再不脱离本发明的前提下,还可以做出若干改进和补充,这些改进和补充也应视为本发明的保护范围。
Claims (7)
1.一种解决塑料制件光腐蚀的ABS合金材料,其特征在于,由以下重量份的原料组分制成:
ABS树脂 20-90份
光阻隔剂 2~10份
改性TiO2 0.1~0.8份
抗氧剂 0.1-0.8份
润滑剂 0.1-2份
光稳定剂 0.2-0.5份
光屏蔽剂 0.2-3份
微纳半导体粉体 2-5份;
所述微纳半导体粉体为纳米ZnO和/或纳米ZnS;
所述光阻隔剂为使用硅烷偶联剂进行表面改性处理过的矿物,所述的矿物为超细滑石粉、纳米碳酸钙、硫酸钡、云母粉、硅灰石、聚酰胺纤维中的至少一种;
所选改性TiO2为经接枝和包覆处理的金红石型纳米级TiO2,粒径为10~100nm。
2.根据权利要求1所述的一种解决塑料制件光腐蚀的ABS合金材料,其特征在于, 所述接枝是指纳米级TiO2接枝丙烯晴单体得接枝产物,所述包覆是指接枝产物与偶联剂形成包覆产物。
3.根据权利要求1所述的一种解决塑料制件光腐蚀的ABS合金材料,其特征在于,所用抗氧剂为受阻酚类抗氧剂、亚磷酸类抗氧剂或者复合型抗氧剂或者绿色抗氧剂。
4.根据权利要求1所述的一种解决塑料制件光腐蚀的ABS合金材料,其特征在于,所述润滑剂选自季戊四醇硬脂酸酯、N,N-已撑双硬脂酰胺、褐煤蜡、甘油单脂酸酯、酰胺蜡、邻苯二甲酸二辛脂、丁基硬脂酸酯中的至少一种。
5.根据权利要求1所述的一种解决塑料制件光腐蚀的ABS合金材料,其特征在于,所述光稳定剂为受阻胺类、亚磷酸酯类光稳定剂和苯并三唑类光稳定剂中的至少一种。
6.根据权利要求1所述的一种解决塑料制件光腐蚀的ABS合金材料,其特征在于,所述光屏蔽剂为OnCap Light Shield、 炭黑、二氧化钛、氧化锌、锌钡中的一种或者几种。
7.权利要求1-6任一项所述ABS合金材料的制备方法,其特征在于,包括下述步骤:首先将微纳半导体粉体与ABS树脂在混料机中进行混合,再将除光阻隔剂外的其他物料加入混合均匀后,加到双螺杆挤出机的料斗中,同时将光阻隔剂以侧喂料的方式加入,经熔融共混挤出、冷却、风干、切粒成解决塑料制件光腐蚀的ABS合金材料。
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