CN106198397A - A kind of photoelectric detection system, method and photoresist coating equipment - Google Patents

A kind of photoelectric detection system, method and photoresist coating equipment Download PDF

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Publication number
CN106198397A
CN106198397A CN201610675863.8A CN201610675863A CN106198397A CN 106198397 A CN106198397 A CN 106198397A CN 201610675863 A CN201610675863 A CN 201610675863A CN 106198397 A CN106198397 A CN 106198397A
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China
Prior art keywords
path difference
transparency carrier
light
optical path
measurement
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CN106198397B (en
Inventor
齐发
徐海涛
刘超
钱娟娟
彭亮亮
欧阳欠
江涛
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BOE Technology Group Co Ltd
Hefei BOE Optoelectronics Technology Co Ltd
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BOE Technology Group Co Ltd
Hefei BOE Optoelectronics Technology Co Ltd
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Priority to CN201610675863.8A priority Critical patent/CN106198397B/en
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16Coating processes; Apparatus therefor

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)

Abstract

The present invention provides a kind of photoelectric detection system, method and photoresist coating equipment, relates to display fabrication techniques field, wastes time and energy and easily occurs judging inaccurate problem during for solving and detecting shell mura.This photoelectric detection system includes: light source, is used for producing detection light beam and detection light beam being projected to transparency carrier;It is relatively fixed and is positioned at the reception processor at light source rear with light source, reflect light for receiving to be reflected by the upper surface of transparency carrier to detect the first reflection light of light beam generation and reflected the second of detection light beam generation by the lower surface of transparency carrier and obtain measurement of optical path difference;Wherein, measurement of optical path difference is the difference of light path of the light path of the first reflection light and the second reflection light;Receive processor to be additionally operable to judge whether measurement of optical path difference meets pre-conditioned and confirm have water ripples on transparency carrier when measurement of optical path difference does not meets pre-conditioned.The present invention is for the detection of shell mura.

Description

A kind of photoelectric detection system, method and photoresist coating equipment
Technical field
The present invention relates to display fabrication techniques field, particularly relate to a kind of photoelectric detection system, method and photoresist and be coated with Coating equipment.
Background technology
Photoresist coating is that (English full name: Thin Film Transistor, is called for short: TFT) photoetching work thin film transistor (TFT) In skill, vital one arrives operation.At present, what in TFT photoetching process, photoresist coating commonly used is that slot coated is (English Title: Slit Coating) mode.
Slot coated generally includes: the steps such as the coating of base-plate cleaning, photoresist, drying under reduced pressure, heated baking.It is in photoetching In glue coating procedure, transparency carrier is static, relies on the scraper with a slit to be coated, and has the scraper of slit by controlling Distance to substrate surface controls the uniformity of photoresist film layer.Although substrate can be carried out before coating photoresist And vac sorb, if but being stained with impurity particle on photoresist coating unit or the transparency carrier back side, still because of impurity particle The stress of generation form water ripples (English name: shell mura) at substrate surface, thus in photoresist coating procedure Cause the problem that thicknesses of layers is uneven, in turn result in the resolution in subsequent technique, line width difference, cause direct reaction Defect on picture.In prior art to shell mura monitoring be after completing whole photoetching process by board carrying to examine Tested by human eye on measurement equipment, and human eye shell mura is tested human eye waste time and energy and easily occur judge Inaccurate problem, therefore, the most accurately detects that the shell mura on substrate is that those skilled in the art are urgently to be resolved hurrily Technical problem.
Summary of the invention
Embodiments of the invention provide a kind of shell mura detection device, method and photoresist coating equipment, are used for solving Waste time and energy and easily occur judging inaccurate problem when certainly shell mura being detected.
For reaching above-mentioned purpose, embodiments of the invention adopt the following technical scheme that
First aspect, it is provided that a kind of photoelectric detection system, including:
Light source, is used for producing detection light beam and described detection light beam being projected to transparency carrier;
Receiving processor, described reception processor is relatively fixed with described light source and along described photoelectric detection system to described Direction of motion during transparency carrier detection, described reception processor is positioned at described light source front;Described reception processor is used for connecing Receive and reflected the first reflection light of described detection light beam generation and by under described transparency carrier by the upper surface of described transparency carrier Surface is reflected the second reflection light of described detection light beam generation and obtains measurement of optical path difference;Wherein, described measurement of optical path difference is institute State the light path of the first reflection light and the difference of the light path of described second reflection light;
It is pre-conditioned and in described measurement that described reception processor is additionally operable to judge whether described measurement of optical path difference meets Confirm, on described transparency carrier, there are water ripples when optical path difference does not meets pre-conditioned.
Optionally, described reception processes implement body for calculating the ratio of described measurement of optical path difference and reference light path difference;Sentence Whether the ratio of disconnected described measurement of optical path difference and reference light path difference is in preset range;If it is not, then confirm on described transparency carrier There are water ripples;
Wherein, described water ripples include projection and depression.
Optionally, the ratio that described reception processor is additionally operable to according to described measurement of optical path difference with reference light path difference obtains institute State the size of water ripples.
Optionally, described light source includes: laser instrument, collimates module, expand module and scalable slit;
Described laser instrument produces laser beam;
Described collimation module collimates for the laser beam producing laser instrument;
The described module that expands is for expanding the laser beam after described collimation module collimates;
Described scalable slit expands between the light-emitting window of module and described transparency carrier described in being arranged at, be used for making through Described expand the laser beam after module expands and form linear beam spot on the substrate.
Optionally, described linear beam spot is parallel to each other with at least one limit of described transparency carrier and length is equal.
Optionally, described reception processor is also used in the ratio of described measurement of optical path difference and reference light path difference when being 1, confirms Described transparency carrier is normal;
When the ratio of described measurement of optical path difference with reference light path difference is more than 1, confirm described transparency carrier and described light source The side that relative side has protruding or described transparency carrier relative with described reception processor has depression;
When the ratio of described measurement of optical path difference with reference light path difference is less than 1, confirm described transparency carrier and described reception The side that the side that processor is relative has protruding or described transparency carrier relative with described light source has depression.
Second aspect, it is provided that a kind of photoelectric detecting method, including:
Produce detection light beam and described detection light beam is projected to transparency carrier;
Receive and reflected the first reflection light of described detection light beam generation and by described by the upper surface of described transparency carrier The lower surface of bright substrate reflects the second reflection light that described light beam produces;
Obtain measurement of optical path difference;Wherein, described measurement of optical path difference is the light path of described first reflection light and described second anti- Penetrate the difference of the light path of light;
Judge whether described measurement of optical path difference meets pre-conditioned;
If it is not, confirm, on described transparency carrier, there are water ripples.
Optionally, described to judge whether described measurement of optical path difference meets pre-conditioned, including:
Calculate the ratio of described measurement of optical path difference and reference light path difference;
Judge that the ratio of described measurement of optical path difference and reference light path difference is whether in preset range;
On the described transparency carrier of described confirmation, there are water ripples, including:
Confirm to have on described transparency carrier projection and/or depression.
Optionally, described method also includes:
For obtaining the size of described water ripples according to the ratio of described measurement of optical path difference with reference light path difference.
Optionally, described method also includes:
When the ratio of described measurement of optical path difference Yu reference light path difference is 1, confirm that described transparency carrier is normal;
When the ratio of described measurement of optical path difference with reference light path difference is more than 1, confirm described transparency carrier and described light source The side that relative side has protruding or described transparency carrier relative with described reception processor has depression;
When the ratio of described measurement of optical path difference with reference light path difference is less than 1, confirm described transparency carrier and described reception The side that the side that processor is relative has protruding or described transparency carrier relative with described light source has depression.
The third aspect, it is provided that a kind of photoresist coating equipment, it is characterised in that including: shower nozzle and any one of first aspect Described photoelectric detection system;
Described shower nozzle and described photoelectric detection system fix and described along described shower nozzle on substrate, coat photoresist time The direction of motion, described photoelectric detection system is positioned at described shower nozzle front.
Optionally, described shower nozzle and described photoelectric detection system interval predeterminable range.
Optionally, described equipment also includes controller;
Described controller connects described photoelectric detection system, for confirming described transparency carrier at described photoelectric detection system On to control described photoresist coating unit when having water ripples out of service.
Optionally, described equipment also includes: alarm device;
Described controller connects described photoelectric detection system, for confirming described transparency carrier at described photoelectric detection system On report to the police time there are water ripples.
The photoelectric detection system that the embodiment of the present invention provides, including: light source and reception processor, wherein light source can produce Detection light beam is also projected to transparency carrier by detection light beam, receives processor and is able to receive that the upper surface reflection by transparency carrier The lower surface reflection of the first reflection light and transparency carrier that detect light beam generation detects the second of light beam generation and reflects light and obtain The light path of the first reflection light and the difference of the light path of the second reflection light, anti-finally by the light path and second judging the first reflection light The difference of the light path penetrating light whether meet on pre-conditioned confirmation transparency carrier, there is shell mura, the i.e. embodiment of the present invention can Confirm, on transparency carrier, whether there is shell mura, phase with the optical path difference utilizing upper surface of base plate and lower surface to generate reflection light Ratio is in prior art, and the embodiment of the present invention is without manually carrying out the detection of shell mura, so the embodiment of the present invention can solve Arduously and easily occur judging inaccurate problem when certainly shell mura being detected.
Accompanying drawing explanation
In order to be illustrated more clearly that the embodiment of the present invention or technical scheme of the prior art, below will be to embodiment or existing In having technology to describe, the required accompanying drawing used is briefly described, it should be apparent that, the accompanying drawing in describing below is only this Some embodiments of invention, for those of ordinary skill in the art, on the premise of not paying creative work, it is also possible to Other accompanying drawing is obtained according to these accompanying drawings.
The schematic diagram of the photoelectric detection system that Fig. 1 provides for the embodiment of the present invention;
The schematic diagram of the light source that Fig. 2 provides for the embodiment of the present invention;
The schematic diagram of the linear beam spot that Fig. 3 provides for the embodiment of the present invention;
The side that transparency carrier that Fig. 4 provides for the embodiment of the present invention is relative with light source has the schematic diagram of projection;
The side that the transparency carrier that Fig. 5 provides for the embodiment of the present invention is relative with receiving processor has the signal of projection Figure;
The flow chart of steps of the photoelectric detecting method that Fig. 6 provides for the embodiment of the present invention;
The schematic diagram of the photoresist coating equipment that Fig. 7 provides for the embodiment of the present invention.
Detailed description of the invention
Below in conjunction with the accompanying drawing in the embodiment of the present invention, the technical scheme in the embodiment of the present invention is carried out clear, complete Describe, it is clear that described embodiment is only a part of embodiment of the present invention rather than whole embodiments wholely.Based on Embodiment in the present invention, it is every other that those of ordinary skill in the art are obtained under not making creative work premise Embodiment, broadly falls into the scope of protection of the invention.
It should be noted that for the ease of the technical scheme clearly describing the embodiment of the present invention, at embodiments of the invention In, have employed the printed words such as " first ", " second " and function is made a distinction with the essentially identical identical entry of effect or similar item, ability Field technique personnel are appreciated that the printed words such as " first ", " second " are not to be defined quantity and execution order.
The embodiment of the present invention provides a kind of photoelectric detection system, concrete, shown in reference Fig. 1, and this photoelectric detection system bag Include: light source 11 and reception processor 12.
Wherein, light source 11 is used for producing detection light beam 10 and detection light beam 10 being projected to transparency carrier 100.
Concrete, the light source in the embodiment of the present invention is specifically as follows LASER Light Source, infrared light supply or other visible rays Light source;Corresponding, detection light beam is specifically as follows laser beam, infrared light or other visible light beams.The present invention is real Execute in example and the type of light source and the structure of light source are not construed as limiting, so that can produce can be by transparency carrier upper surface and following table The detection light beam of face reflection is as the criterion.
Receive when processor 12 is relatively fixed with light source 11 and detects transparency carrier 100 along photoelectric detection system and move Direction, receives processor 12 and is positioned at described light source 11 front;Receive processor 12 for receiving by the upper surface of transparency carrier 100 101 reflection detection light beams 10 produce first reflection light 20 and by the lower surface 102 of transparency carrier reflect detection light beam 10 produce The second reflection light 30 obtain measurement of optical path difference d;Wherein, measurement of optical path difference d is the light path of the first reflection light 20 and second anti- Penetrate the difference of the light path of light 30.
Exemplary, above-mentioned reception processes implement body can be by a Charged Couple (English full name: charge coupled Device, is called for short: CCD) camera and a processor composition.Wherein, CCD camera receives the first reflection light and the second reflection respectively Light also records the first reflection light and the second position of being transmitted through in CCD camera of reflection light, and processor is according to the first reflection light and the The position calculation first that two reflection light are transmitted through in CCD camera reflects light and the optical path difference of the second reflection light.Certainly, this area skill Art personnel can also be anti-by reception the first reflection light and the time difference of the second reflection light or reception the first reflection light and second The differential seat angle penetrating light obtains the first reflection light and the optical path difference of the second reflection, to this not to restriction in the embodiment of the present invention.
Receiving processor 12, to be additionally operable to judge whether measurement of optical path difference d meets pre-conditioned and in measurement of optical path difference d not Confirm, on transparency carrier 100, there are water ripples (English name: shell mura) when meeting pre-conditioned.
Concrete, when there is not shell mura on transparency carrier, measurement of optical path difference d is steady state value, and when transparent base When having shell mura on plate, the value of measurement of optical path difference d can change along with the difference of shell mura.Therefore, it is judged that survey Whether amount optical path difference d meets pre-conditioned and confirms have on transparency carrier 100 when measurement of optical path difference d does not meets pre-conditioned Shell mura at least can be realized by following several ways:
1, judge that the value of measurement of optical path difference d is the most constant, confirm on transparency carrier 100 when fluctuation occurs in measurement of optical path difference Tool shell mura.
When 2, will not have shell mura on real-time measurement of optical path difference d and transparency carrier, first reflects light and the second reflection light Optical path difference poor, judge the most within the specific limits according to difference;When difference is beyond preset range, then confirm transparency carrier Shell mura is had on 100.
When 3, will not have shell mura on real-time measurement of optical path difference d and transparency carrier, first reflects light and the second reflection light Optical path difference make ratio, judge the most within the specific limits according to ratio;When ratio is beyond preset range, then confirm transparency carrier Shell mura is had on 100.
Additionally, when detecting light beam and being vertical with transparency carrier, the reflection light that the upper and lower surface of transparency carrier produces Can converge, and then impact obtaining detection optical path difference.So preferential, detection light beam and transparency carrier out of plumb.
Also, it should be noted above several implementations are only implementation possible in the embodiment of the present invention, but this Inventive embodiments is not limited to this, and on the basis of above-described embodiment, those skilled in the art can also be pre-by setting other If condition, and according to judging whether to meet on pre-conditioned confirmation transparency carrier whether there is shell mura, but this broadly falls into The reasonable work-around solution of the embodiment of the present invention, the most all because belonging to the protection domain of the embodiment of the present invention within.
The photoelectric detection system that the embodiment of the present invention provides, including: light source and reception processor, wherein light source can produce Detection light beam is also projected to transparency carrier by detection light beam, receives processor and is able to receive that the upper surface reflection by transparency carrier The lower surface reflection of the first reflection light and transparency carrier that detect light beam generation detects the second of light beam generation and reflects light and obtain The light path of the first reflection light and the difference of the light path of the second reflection light, anti-finally by the light path and second judging the first reflection light The difference of the light path penetrating light whether meet on pre-conditioned confirmation transparency carrier, there is shell mura, the i.e. embodiment of the present invention can Confirm, on transparency carrier, whether there is shell mura, phase with the optical path difference utilizing upper surface of base plate and lower surface to generate reflection light Ratio is in prior art, and the embodiment of the present invention is without manually carrying out the detection of shell mura, so the embodiment of the present invention can solve Arduously and easily occur judging inaccurate problem when certainly shell mura being detected.
Preferably, the processor 12 ratio specifically for computation and measurement optical path difference d Yu reference light path difference is received;Judge to measure Whether the ratio of optical path difference d and reference light path difference is in preset range;If it is not, then confirm, on transparency carrier, there is water ripples (English Literary fame claims: shell mura).
Wherein, water ripples include projection and depression.That is, water ripples may be protruding and/or depression.
Wherein, when reference light path difference is not have shell mura on transparency carrier, first reflects the light of light and the second reflection light Path difference.The calculating of reference light path difference can be: from the initial end of transparency carrier, light source sends detection light beam, receives by transparent The first reflection light that upper surface of base plate reflection detection light beam is formed, and the light path of the first reflection light is designated as λ1, receive by transparent The second reflection light that base lower surface reflection detection light beam is formed, and the light path of the second reflection light is designated as λ2.First reflection light Optical path difference λ with the second reflection light021.Choose multiple point of measuring the most on the transparent substrate to measure, when the first reflection When light and second reflects the optical path difference steady state value of light, using steady state value as reference light path difference, if the first reflection light and the second reflection The optical path difference of light produces change, has shell mura, then choose and most light paths occur at certain test point of description selection Difference is as reference light path difference.Additionally, the calculating of reference light path difference can be: obtain detection light beam and the angle of substrate and transparent The refractive index of substrate, and then utilize the law of refraction of light and detect light beam and the angle of substrate and the index meter of transparency carrier Calculate reference light path difference.
Just reference light path difference is designated as λ0, the light path of the first reflection light during detection is designated as λ3, during detection second reflection light Light path be designated as λ4, then measurement of optical path difference λ '043;Measurement of optical path difference and the ratio △ λ=λ ' of reference light path difference00
In actual applications, the detection light beam that light source produces there may be fluctuation, and then the precision that impact is measured, above-mentioned reality Execute in example by judging that the ratio of measurement of optical path difference and reference light path difference, whether in preset range, and passes through to measure light Path difference judges to eliminate the impact detecting light beam fluctuation to certainty of measurement with the ratio of reference light path difference, and therefore the present invention is real Execute example can improve photoelectric detection system in certainty of measurement, and then the performance of photoelectric detection system.
On the basis of above-described embodiment, receive processor 12 be additionally operable to the ratio according to measurement of optical path difference and reference light path difference Value obtains the size of water ripples.
Concrete, measurement of optical path difference is the biggest with the absolute value of the ratio of reference light path difference and the difference of 1, and shell is described The size of mura is the biggest, and measurement of optical path difference is the least with the absolute value of the ratio of reference light path difference and the difference of 1, and shell is described The size of mura is the least.
Exemplary, with reference to shown in Fig. 2, the light source 11 in above-described embodiment specifically may include that laser instrument 111, collimation Module 112, expand module 113 and scalable slit 114.
Laser instrument 111 is with producing laser beam.
Collimation module 112 collimates for the laser beam producing laser instrument 111.
The laser beam that laser instrument 111 produces has certain dispersion angle, it is therefore desirable to by collimation module 112 to laser The laser beam that device 111 produces collimates, thus avoids the dispersion angle impact on certainty of measurement of laser beam.
Expand module 113 for the laser beam after collimation module 112 collimation is expanded.
Laser beam energy density after collimation module 112 collimation is relatively big, can form one when exposing to transparency carrier The circular light spot that individual area is less, transparency carrier of easily burning, therefore before by laser beam irradiation to transparency carrier, also reply swashs Light light beam expands, and increases the facula area that laser beam is formed the energy density reducing laser beam, and then avoids burning Hinder transparency carrier.
Expand module additionally, the embodiment of the present invention does not limit laser beam is expanded multiple, according to the actual requirements, this Neck technical staff can expand the optical lens of module by regulation and optical clear position adjustments in expanding module is sharp Light light beam expand multiple.
Scalable slit 114 is arranged between light-emitting window and the transparency carrier expanding module 113, is used for making through expanding mould Laser beam after group expands forms linear beam spot on substrate.
Circle can be formed when direct irradiation to transparency carrier by the laser beam expanding the injection of module 113 light-emitting window Hot spot, if directly carrying out detecting by circular light spot, is that transparency carrier is carried out pointwise detection, it is understood that there may be detection omit and Relatively time consuming, above-described embodiment arranges between the light-emitting window expanding module 113 and transparency carrier scalable slit 114, enters And make to expand the laser beam after module 113 expands on substrate, form linear beam spot, therefore by arranging scalable slit 114 Can make photoelectric detection system that transparency carrier is detected line by line, shorten detection elapsed time and detection can be avoided to lose Leakage.
Additionally, the slit in above-described embodiment is scalable slit, so in use can be according to the actual requirements by line Property hot spot length adjustment be detection need length.Preferably, shown in reference Fig. 3, linear beam spot 31 and transparency carrier 100 Article one, limit 32 is parallel to each other and length is equal.
If linear beam spot 31 is parallel to each other with transparency carrier 100 limit 32 and length is equal, then by making linear light Speckle 31 is along the limit mobile detection on the transparent substrate being parallel to each other with it and length is equal, it is possible to achieve to whole transparency carrier be The no shell of having mura detects.
Further, although transparency carrier shell mura can be detected by above-described embodiment, but confirming After having shell mura on transparency carrier, staff also needs to further manual confirmation shell mura on the transparent substrate Position, and shell mura may be difficult to find, therefore on the basis of above-described embodiment, the embodiment of the present invention is further Thering is provided a kind of is the scheme that position is fed back to shell mura.Concrete, the program is:
Receive processor 12 and be also used in the ratio of measurement of optical path difference and reference light path difference when being 1, confirm that transparency carrier is normal.
That is, when Δ λ=1, illustrating that measurement of optical path difference is identical with reference light path difference herein, transparency carrier does not has shell mura。
When the ratio of measurement of optical path difference and reference light path difference is more than 1, confirm that transparency carrier 100 is relative with light source 11 one The side that side has projection or transparency carrier 100 relative with receiving processor 12 has depression.
With reference to shown in Fig. 4, wherein, d represents that measurement of optical path difference, D represent reference light path difference;As Δ λ > 1, i.e. measure light path When difference d is more than reference light path difference D, with transparency carrier 100 with receive the relative side of processor 12 as reference plane, then 100 and The side that light source 11 is relative has a projection, otherwise and the side relative with light source 11 with transparency carrier 100 is as reference plane, then The side that transparency carrier 100 is relative with receiving processor 12 has depression.
When the ratio of measurement of optical path difference with reference light path difference is less than 1, confirm that transparency carrier is relative with receiving processor The side that side has protruding or described transparency carrier 100 relative with light source 11 has depression.
With reference to shown in Fig. 5, wherein, d represents that measurement of optical path difference, D represent reference light path difference;When Δ λ < when 1, i.e. measures light path When difference d is less than reference light path difference D, illustrate that the side that transparency carrier is relative with receiving processor has protruding or described transparent base The side that plate 100 is relative with described light source 11 has depression.
Further, yet another embodiment of the invention provides a kind of photoelectric detecting method, and this photoelectric detecting method can conduct The using method of the photoelectric detection system that any of the above-described embodiment provides.Concrete, with reference to shown in Fig. 6, the method includes as follows Step:
Detection light beam is also projected to transparency carrier by S61, generation detection light beam.
S62, reception are reflected the first reflection light of detection light beam generation and by transparency carrier by the upper surface of transparency carrier The second reflection light that lower surface reflection light beam produces.
S63, acquisition measurement of optical path difference.
Wherein, measurement of optical path difference is the difference of light path of the light path of the first reflection light and the second reflection light;
S64, to judge whether measurement of optical path difference meets pre-conditioned;
In step S64, if measurement of optical path difference is unsatisfactory for presetting regulation, perform step S65, if measurement of optical path difference meets Pre-conditioned, then proceed detection, i.e. return step S61.
On S65, confirmation transparency carrier, there are water ripples.
The photoelectric detecting method that the embodiment of the present invention provides, first produces detection light beam and is projected to transparent by detection light beam Substrate;Secondly, receive and reflected by the upper surface of transparency carrier under the first reflection light and the transparency carrier detecting light beam generation The second of surface reflection detection light beam generation is reflected light and obtains the light path of the first reflection light and the difference of the light path of the second reflection light Whether value, meet pre-conditioned confirmation finally by the difference judging the first light path reflecting light and the second light path reflecting light saturating Having shell mura, the i.e. embodiment of the present invention on bright substrate can utilize upper surface of base plate and lower surface to generate the light of reflection light Path difference confirms whether have shell mura on transparency carrier, and compared to prior art, the embodiment of the present invention is without manually carrying out The detection of shell mura, so arduously and easily occurring when the embodiment of the present invention can solve to detect shell mura Judge inaccurate problem.
Optionally, judging whether measurement of optical path difference meets pre-conditioned in above-mentioned steps S64, concrete steps realize can be as Under:
S641, computation and measurement optical path difference and the ratio of reference light path difference.
S642, judge that the ratio of measurement of optical path difference and reference light path difference is whether in preset range;
Step S65 confirms have water ripples on transparency carrier, including:
Confirm to have on described transparency carrier projection and/or depression.
Optionally, the photoelectric detecting method that above-described embodiment provides also includes:
For obtaining the size of water ripples according to the ratio of measurement of optical path difference with reference light path difference.
Optionally, method also includes:
When the ratio of measurement of optical path difference Yu reference light path difference is 1, confirm that transparency carrier is normal;
When the ratio of measurement of optical path difference with reference light path difference is more than 1, confirm the side tool that transparency carrier is relative with light source The side having protruding or described transparency carrier relative with described reception processor has depression;
When the ratio of measurement of optical path difference with reference light path difference is less than 1, confirm that transparency carrier is relative with receiving processor The side that side has protruding or described transparency carrier relative with described light source has depression.
The position of Shellmura can also be carried out instead by photoelectric detecting method further that i.e. provided by the embodiment of the present invention Feedback.
Yet another embodiment of the invention provides a kind of photoresist coating equipment, shown in reference Fig. 7, and this photoresist coating equipment bag Include: the photoelectric detection system 72 that shower nozzle 71 and any of the above-described embodiment provide.
Wherein, moving when shower nozzle 71 is fixed with photoelectric detection system 72 and coats photoresist on substrate 100 along shower nozzle Direction (direction shown in arrow in Fig. 7), photoelectric detection system 72 is positioned at shower nozzle 71 front.
It should be noted that shower nozzle 71 and photoelectric detection system 72 refer to shower nozzle 71 and light electric-examination in above-described embodiment when fixing Survey the relative position of device 72 not change;Shower nozzle 71 and photoelectric detection system 72 directly can be connected to one by rigid device Rise, it is also possible to be not directly connected to.Such as: shower nozzle 71 and photoelectric detection system 72 are arranged at running the ad-hoc location of guide rail On.
In prior art detecting shell mura is after completing whole photoetching process, if now finding to there is shell Mura, then needing does over again the photo-mask process completed before reforms.Photoelectric detection system 72 is arranged at by the embodiment of the present invention Shower nozzle 71 front, so transparency carrier can be detected before transparency carrier 100 sprays photoresist at shower nozzle 71, so Can be patterned technique after repairing when shell mura being detected, therefore the embodiment of the present invention can be avoided detecting During shell mura, photo-mask process is done over again and reform.
Exemplary, above-mentioned photoresist coating equipment can be slot coated mode (English name: slit coating) Photoresist coating equipment.
Preferably, shower nozzle 71 and photoelectric detection system 72 are spaced predeterminable range.
Wherein, make shower nozzle 71 and photoelectric detection system 72 be spaced predeterminable range, can be that photoelectric detection system 72 detects There is on transparency carrier shell mura and reserve certain time.Those skilled in the art can run according to photoresist coating equipment The factors such as response time when speed, stopping determine the concrete length of predeterminable range.
Optionally, equipment also includes controller;
Controller connects photoelectric detection system, for confirming have water ripples time control on transparency carrier at photoelectric detection system Photoresist coating unit processed is out of service.
The operation of photoresist coating unit coating equipment can be stopped by controller in time, and then avoid shower nozzle to transparent base There is on plate the position coating photoresist of shell mura.
Optionally, equipment also includes: alarm device;
Controller connects photoelectric detection system, for entering when photoelectric detection system confirms and has water ripples on transparency carrier Row is reported to the police.
Exemplary, alarm device can be buzzer and/or light-emitting diode light, and corresponding warning is specifically as follows and sends Acoustical signal and/or send light signal.
The above, the only detailed description of the invention of the present invention, but protection scope of the present invention is not limited thereto, and any Those familiar with the art in the technical scope that the invention discloses, the change that can readily occur in or replacement, all answer Contain within protection scope of the present invention.Therefore, protection scope of the present invention should be as the criterion with scope of the claims.

Claims (14)

1. a photoelectric detection system, it is characterised in that including:
Light source, is used for producing detection light beam and described detection light beam being projected to transparency carrier;
Receiving processor, described reception processor is relatively fixed with described light source and along described photoelectric detection system to described transparent Direction of motion during substrate detection, described reception processor is positioned at described light source front;Described reception processor for receive by The upper surface of described transparency carrier reflects the first reflection light and lower surface by described transparency carrier that described detection light beam produces Reflect the second reflection light of described detection light beam generation and obtain measurement of optical path difference;Wherein, described measurement of optical path difference is described The light path of one reflection light and the difference of the light path of described second reflection light;
It is pre-conditioned and at described measurement light path that described reception processor is additionally operable to judge whether described measurement of optical path difference meets Difference confirms have water ripples on described transparency carrier when not meeting pre-conditioned.
Device the most according to claim 1, it is characterised in that described reception processes implement body and is used for calculating described measurement light Path difference and the ratio of reference light path difference;Judge that the ratio of described measurement of optical path difference and reference light path difference is whether in preset range; If it is not, then confirm, on described transparency carrier, there are water ripples;
Wherein, described water ripples include projection and depression.
Device the most according to claim 2, it is characterised in that described reception processor is additionally operable to according to described measurement light path The ratio of difference and reference light path difference obtains the size of described water ripples.
Device the most according to claim 1, it is characterised in that described light source includes: laser instrument, collimate module, expand mould Group and scalable slit;
Described laser instrument produces laser beam;
Described collimation module collimates for the laser beam producing laser instrument;
The described module that expands is for expanding the laser beam after described collimation module collimates;
Described scalable slit expands between the light-emitting window of module and described transparency carrier described in being arranged at, and is used for making through described Expand the laser beam after module expands and form linear beam spot on the substrate.
Device the most according to claim 4, it is characterised in that a limit phase of described linear beam spot and described transparency carrier The most parallel and length is equal.
Device the most according to claim 3, it is characterised in that described reception processor be also used in described measurement of optical path difference with When the ratio of reference light path difference is 1, confirm that described transparency carrier is normal;
When the ratio of described measurement of optical path difference with reference light path difference is more than 1, confirm that described transparency carrier is relative with described light source The side that there is protruding or described transparency carrier relative with described reception processor, side there is depression;
When the ratio of described measurement of optical path difference with reference light path difference is less than 1, confirm that described transparency carrier processes with described reception The side that the side that device is relative has protruding or described transparency carrier relative with described light source has depression.
7. a photoelectric detecting method, it is characterised in that including:
Produce detection light beam and described detection light beam is projected to transparency carrier;
Receive and reflected the first reflection light of described detection light beam generation and by described transparent base by the upper surface of described transparency carrier The lower surface of plate reflects the second reflection light that described light beam produces;
Obtain measurement of optical path difference;Wherein, described measurement of optical path difference is the light path of described first reflection light and described second reflection light The difference of light path;
Judge whether described measurement of optical path difference meets pre-conditioned;
If it is not, confirm, on described transparency carrier, there are water ripples.
Method the most according to claim 7, it is characterised in that described judge that whether described measurement of optical path difference meets and preset bar Part, including:
Calculate the ratio of described measurement of optical path difference and reference light path difference;
Judge that the ratio of described measurement of optical path difference and reference light path difference is whether in preset range;
On the described transparency carrier of described confirmation, there are water ripples, including:
Confirm to have on described transparency carrier projection and/or depression.
Method the most according to claim 8, it is characterised in that described method also includes:
Ratio according to described measurement of optical path difference with reference light path difference obtains the size of described water ripples.
Method the most according to claim 8, it is characterised in that described method also includes:
When the ratio of described measurement of optical path difference Yu reference light path difference is 1, confirm that described transparency carrier is normal;
When the ratio of described measurement of optical path difference with reference light path difference is more than 1, confirm that described transparency carrier is relative with described light source The side that there is protruding or described transparency carrier relative with described reception processor, side there is depression;
When the ratio of described measurement of optical path difference with reference light path difference is less than 1, confirm that described transparency carrier processes with described reception The side that the side that device is relative has protruding or described transparency carrier relative with described light source has depression.
11. 1 kinds of photoresist coating equipments, it is characterised in that including: the light electric-examination described in shower nozzle and any one of claim 1-6 Survey device;
Described shower nozzle fix with described photoelectric detection system and described along described shower nozzle on substrate, coat photoresist time move Direction, described photoelectric detection system is positioned at described shower nozzle front.
12. equipment according to claim 11, it is characterised in that described shower nozzle and described photoelectric detection system interval are preset Distance.
13. equipment according to claim 11, it is characterised in that described equipment also includes controller;
Described controller connects described photoelectric detection system, for confirming have on described transparency carrier at described photoelectric detection system Described photoresist coating unit is controlled out of service when having water ripples.
14. equipment according to claim 11, it is characterised in that described equipment also includes: alarm device;
Described controller connects described photoelectric detection system, for confirming have on described transparency carrier at described photoelectric detection system Report to the police when having water ripples.
CN201610675863.8A 2016-08-16 2016-08-16 Photoelectric detection device and method and photoresist coating equipment Expired - Fee Related CN106198397B (en)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107321557A (en) * 2017-08-17 2017-11-07 京东方科技集团股份有限公司 One kind coating detection means, coating apparatus and coating detection method
CN108803241A (en) * 2017-04-28 2018-11-13 上海微电子装备(集团)股份有限公司 Light-sensitive lacquer sprayer alignment device, method and photoresist coating unit
CN110581082A (en) * 2019-09-06 2019-12-17 上海华力集成电路制造有限公司 Method for monitoring wafer defects by using defect detection machine

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5779404A (en) * 1980-11-04 1982-05-18 Nippon Steel Corp Detecting method for local faulty thickness of plate of metallic belt type material
US5943126A (en) * 1997-03-11 1999-08-24 Lucent Technologies Inc. Method and apparatus for detecting surface qualities on an optical fiber
CN1692269A (en) * 2002-08-06 2005-11-02 康宁股份有限公司 Fringe pattern discriminator for grazing incidence interferometer
CN101652625A (en) * 2007-02-21 2010-02-17 康宁股份有限公司 Apparatus for measuring defects in a glass sheet
CN101932903A (en) * 2007-11-09 2010-12-29 康宁股份有限公司 Method and apparatus for measuring surface shape profile
CN203190948U (en) * 2013-04-22 2013-09-11 北京京东方光电科技有限公司 Device for detecting thickness of transparent substrate

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5779404A (en) * 1980-11-04 1982-05-18 Nippon Steel Corp Detecting method for local faulty thickness of plate of metallic belt type material
US5943126A (en) * 1997-03-11 1999-08-24 Lucent Technologies Inc. Method and apparatus for detecting surface qualities on an optical fiber
CN1692269A (en) * 2002-08-06 2005-11-02 康宁股份有限公司 Fringe pattern discriminator for grazing incidence interferometer
CN101652625A (en) * 2007-02-21 2010-02-17 康宁股份有限公司 Apparatus for measuring defects in a glass sheet
CN101932903A (en) * 2007-11-09 2010-12-29 康宁股份有限公司 Method and apparatus for measuring surface shape profile
CN203190948U (en) * 2013-04-22 2013-09-11 北京京东方光电科技有限公司 Device for detecting thickness of transparent substrate

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108803241A (en) * 2017-04-28 2018-11-13 上海微电子装备(集团)股份有限公司 Light-sensitive lacquer sprayer alignment device, method and photoresist coating unit
CN107321557A (en) * 2017-08-17 2017-11-07 京东方科技集团股份有限公司 One kind coating detection means, coating apparatus and coating detection method
CN110581082A (en) * 2019-09-06 2019-12-17 上海华力集成电路制造有限公司 Method for monitoring wafer defects by using defect detection machine

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