CN106149018A - A kind of process for pcb board electro-coppering - Google Patents

A kind of process for pcb board electro-coppering Download PDF

Info

Publication number
CN106149018A
CN106149018A CN201610648970.1A CN201610648970A CN106149018A CN 106149018 A CN106149018 A CN 106149018A CN 201610648970 A CN201610648970 A CN 201610648970A CN 106149018 A CN106149018 A CN 106149018A
Authority
CN
China
Prior art keywords
washing
copper
electroplating
plating
pcb board
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201610648970.1A
Other languages
Chinese (zh)
Inventor
袁胜巧
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ANHUI GUANGDE WEIZHENG OPTOELECTRONIC TECHNOLOGY Co Ltd
Original Assignee
ANHUI GUANGDE WEIZHENG OPTOELECTRONIC TECHNOLOGY Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ANHUI GUANGDE WEIZHENG OPTOELECTRONIC TECHNOLOGY Co Ltd filed Critical ANHUI GUANGDE WEIZHENG OPTOELECTRONIC TECHNOLOGY Co Ltd
Priority to CN201610648970.1A priority Critical patent/CN106149018A/en
Publication of CN106149018A publication Critical patent/CN106149018A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/38Electroplating: Baths therefor from solutions of copper
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1633Process of electroless plating
    • C23C18/1655Process features
    • C23C18/1664Process features with additional means during the plating process
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/1803Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces
    • C23C18/1806Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces by mechanical pretreatment, e.g. grinding, sanding
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
    • C23C18/38Coating with copper
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/02Tanks; Installations therefor

Abstract

The present invention provides a kind of process for pcb board electro-coppering, and process is largely divided into following steps: 1) deburring, including enter plate, nog plate, high-pressure washing, dry ejecting plate again;2) copper is sunk, including upper plate, bulk, for the first time washing, desmearing, second time washing, preneutralization, third time washing, neutralization, ultrasonic wave water washing, oil removing, rear oil removing, wash for the 4th time, gently erosion, the 5th washing, preimpregnation, activation, acceleration, the 6th washing, electroless copper plating, pickling, wash for the 7th time;3) copper is thickeied, including upper plate, oil removing, washing, acidleach, thickening plating, high-order washing, lower plate.The present invention, by adding shaking device in heavy copper, can be obviously improved the situation of Kong Wutong;It simultaneously in the link thickening copper, by the particular design of electroplating cell body, is possible not only to ensure the activity of electroplating liquid medicine, is additionally favorable for the uniformity of plating, the synergy of liquid medicine and electroplating bath simultaneously, optimal electroplating evenness and electroplating efficiency can be obtained.

Description

A kind of process for pcb board electro-coppering
Technical field
The present invention relates to the plating link in pcb board manufacturing process, be specifically related to a kind of technique for pcb board electro-coppering Method.
Background technology
PCB (Printed Circuit Board), Chinese is printed wiring board, for electricity in electronic devices and components Form the connection of predetermining circuit between sub-parts, play the effect of relay transmission, be the critical electronic cross tie part of electronic product.With The fast development of high-tech industry, world's printed wiring board (PCB) industry is also rapidly progressed.2011, PCB in China The rate of increasing output value is 9.2%, accounts for the 39.8% of the global gross output value, reaches 23,000,000,000 dollars.Therefore the pcb board of China also has very The big development rising space.
In the manufacturing process of pcb board, there is a lot of operation all can relate to plating, such as electroless copper, the plating of whole plate, image Plating, thickening and being plated with and electrotinning etc., these electroplating process play very important effect in PCB production technology, affect PCB The electric conductivity of plate.And electroplating process is to carry out in electroplating bath, therefore designs and meet technological requirement, environmental friendliness, and Ensure by the electroplating bath of plating piece uniformly-coating it is very important.For current electroplating bath cell body, due to the size of plating piece Size less than positive plate sometimes, accordingly, it is possible to cause electric field action uneven so that the thickness of plating piece upper and lower each several part coating Spending uneven, the especially upper and lower two ends of workpiece and middle variable thickness causes, and plated item will be caused quality problem occur;Sometimes Due to the difference of each electroplating site in electric field, thus electric field action also differs, it is possible to can cause electroplating non-uniform phenomenon Generation, cause plating thickness uneven.
Content of the invention
The present invention is directed to the deficiencies in the prior art, provide a kind of process for pcb board electro-coppering.
The present invention can be achieved through the following technical solutions:
A kind of process for pcb board electro-coppering, process is largely divided into following steps: 1) use flash trimmer Deburring, including enter plate, nog plate, high-pressure washing, dry ejecting plate again;2) sink copper, including upper plate, bulk, wash for the first time, go to bore Dirty, second time washing, preneutralization, third time washing, neutralizations, ultrasonic wave water washing, oil removing, rear oil removing, wash for the 4th time, gently lose, 5th washing, preimpregnation, activation, acceleration, the 6th washing, electroless copper plating, pickling, the 7th washing;3) copper is thickeied, including on Plate, oil removing, washing, acidleach, thickening plating, high-order washing, lower plate.
Further, step 2) in electroless copper plating when any one or two kinds that shake with electroshock, gas shock both.
Further, the thickening plating in step (3) is to carry out in electroplating bath, and the upper end of electroplating cell body is anode, negative electrode Vertical range with anode is 240mm.
Further, the area of described electroplating bath negative electrode and anode can adjust.
Further, adding electroplating liquid medicine in described electroplating bath, liquid medicine composition includes copper sulphate, dilute sulfuric acid, dilute salt Acid, brightener and activator Pd.
Further, described brightener is PM-501, any one or two kinds of in permanent emigrant's ST-2000 series.
Further, copper sulphate in described liquid medicine composition: the mol ratio of dilute sulfuric acid: watery hydrochloric acid: brightener: Pd is 2:1: 3:0.5:0.5。
What the present invention obtained has the beneficial effect that 1) deburring in pre-treatment can ensure that the smooth of plate face, after being conducive to The carrying out of continuous technological operation;2) adding shaking device in heavy copper, vibrations strengthen being obviously improved the situation of Kong Wutong, are beneficial to sink Copper is more uniform;3) in the link thickening copper, by the particular design of electroplating cell body, adjustable anode and cathode area, not only may be used It to ensure the activity of electroplating liquid medicine, is additionally favorable for the uniformity of plating;4) adjustment of electroplating liquid medicine and anode and cathode area is passed through, it is thus achieved that Optimal electroplating evenness and electroplating efficiency.
Detailed description of the invention
Made an explanation by the detailed description of the invention to the present invention for the embodiment below.
Embodiment
A kind of process for pcb board electro-coppering, uses vertical continuous formula electroplating operations, and process is main It is divided into following steps: 1) use flash trimmer deburring, to ensure the smooth of plate face, beneficially the carrying out of later processing operation, The process of deburring includes into plate, nog plate, high-pressure washing, dries ejecting plate again;2) heavy copper, first upper plate, then resin, fall in bulk hole Bonded energy between low resinous polymer so that it is form open structure, be beneficial to potassium permanganate and sting the surface losing into micro-rough, connect For the first time washing and go the removal of impurity, wiping Drill dirt cleaning, carry out that second time is washed, preneutralization, third time are washed, neutralize, entered again One step ultrasonic wave water washing makes foreign material remove thoroughly, and oil removing, with cleaner plate face, adjusts the electronegative group of hole wall resin residue, removes afterwards Oil, the 4th washing, utilize dilute sulfuric acid by light for end copper eating away 0.7um, make that end copper is rough, surface area increases, thus strengthens end copper With the adhesion of chemistry layers of copper, wash for the 5th time, presoak, activate, accelerate the palladium group to dissipate unreal and palladium ion and atom etc., Carry out the 6th washing again, then open shaking device, make vibration frequency slowly increase, then carry out electroless copper plating, pickling, the 7th Secondary washing;3) copper is thickeied, including upper plate, oil removing, washing, acidleach, the vertical range with negative electrode and anode are 240mm and permissible The liquid medicine that the electroplating bath of the area of regulation anode of electrolytic cell and negative electrode adds in carrying out thickening plating, electroplating bath according to actual needs In copper sulphate containing 0.2mol, the dilute sulfuric acid of 0.1mol, the watery hydrochloric acid of 0.3mol and brightener PM-5010.05mol and The Pd activator of 0.05mol, the removal of impurity, last lower plate are gone in then high-order washing.
Copper facing uniformity can be made to reach 93% by said method.
The foregoing is only highly preferred embodiment of the present invention, not in order to limit the present invention, all essences in the present invention Any modification, equivalent and the improvement etc. made within god and principle, should be included within the scope of the present invention.

Claims (7)

1. the process for pcb board electro-coppering, uses vertical continuous formula electroplating operations, it is characterised in that work Process is largely divided into following steps: 1) use flash trimmer deburring, including enter plate, nog plate, high-pressure washing, drying go out again Plate;2) sink copper, including upper plate, bulk, for the first time washing, desmearing, second time washing, preneutralization, third time are washed, neutralization, Ultrasonic wave water washing, oil removing, rear oil removing, the 4th washing, light erosion, the 5th washing, preimpregnation, activation, accelerate, the 6th washing, Electroless copper plating, pickling, the 7th washing;3) thicken copper, including upper plate, oil removing, washing, acidleach, thickening plating, high-order washing, under Plate.
2. a kind of process for pcb board electro-coppering according to claim 1, it is characterised in that step 2) in During electroless copper plating with electroshock, gas shock one or both.
3. a kind of process for pcb board electro-coppering according to claim 1, it is characterised in that in step (3) Thickening plating is to carry out in electroplating bath, and the upper end of electroplating cell body is anode, and negative electrode is 240mm with the vertical range of anode.
4. a kind of process for pcb board electro-coppering according to claim 3, it is characterised in that described plating The area of groove negative electrode and anode can adjust.
5. a kind of process for pcb board electro-coppering according to claim 3, it is characterised in that described plating Adding electroplating liquid medicine in groove, liquid medicine composition includes copper sulphate, dilute sulfuric acid, watery hydrochloric acid, brightener and activator Pd.
6. a kind of process for pcb board electro-coppering according to claim 5, it is characterised in that described light Agent is PM-501, and perseverance resides abroad one or both in ST-2000 series.
7. a kind of process for pcb board electro-coppering according to claim 5, it is characterised in that described liquid medicine The mol ratio of copper sulphate in composition: dilute sulfuric acid: watery hydrochloric acid: brightener: Pd is 2:1:3:0.5:0.5.
CN201610648970.1A 2016-08-09 2016-08-09 A kind of process for pcb board electro-coppering Pending CN106149018A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201610648970.1A CN106149018A (en) 2016-08-09 2016-08-09 A kind of process for pcb board electro-coppering

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201610648970.1A CN106149018A (en) 2016-08-09 2016-08-09 A kind of process for pcb board electro-coppering

Publications (1)

Publication Number Publication Date
CN106149018A true CN106149018A (en) 2016-11-23

Family

ID=57329457

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201610648970.1A Pending CN106149018A (en) 2016-08-09 2016-08-09 A kind of process for pcb board electro-coppering

Country Status (1)

Country Link
CN (1) CN106149018A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109413873A (en) * 2018-12-12 2019-03-01 东莞市若美电子科技有限公司 Ameliorative way of the high aspect ratio PCB aperture without copper
CN112566389A (en) * 2020-11-10 2021-03-26 深圳市昶东鑫线路板有限公司 Multilayer circuit board manufacturing method with high aspect ratio blind hole and multilayer circuit board
CN113710010A (en) * 2021-08-23 2021-11-26 广州广合科技股份有限公司 Processing method for preventing copper deposition and copper surface of PCB from being rough
CN115058749A (en) * 2021-12-22 2022-09-16 江苏本川智能电路科技股份有限公司 Electroplating processing method with high thickness-diameter ratio
CN117241478A (en) * 2023-11-15 2023-12-15 深圳市宇通瑞特科技有限公司 Horizontal electroplating process for double-sided and multi-layer PCB (printed circuit board)

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5174886A (en) * 1991-02-22 1992-12-29 Mcgean-Rohco, Inc. High-throw acid copper plating using inert electrolyte
JP2002161391A (en) * 2000-11-21 2002-06-04 Toppan Printing Co Ltd Electroplating method and method for manufacturing wiring board therewith
CN102647862A (en) * 2012-04-25 2012-08-22 博敏电子股份有限公司 Blind via filling plating method using different current parameter combinations
CN103228112A (en) * 2013-04-03 2013-07-31 深圳崇达多层线路板有限公司 Electroless copper plating method for PCBs (printed circuit boards) with high aspect ratios
CN104152874A (en) * 2014-07-20 2014-11-19 烟台恒迪克能源科技有限公司 Printed circuit board chemical copper plating activation solution
CN104378930A (en) * 2013-08-14 2015-02-25 四川海英电子科技有限公司 Electric manufacturing method for two-sided copper deposition plate of PCB
CN104735927A (en) * 2013-12-20 2015-06-24 深圳崇达多层线路板有限公司 PCB glue removing method in mode of vertically depositing copper wires
CN105188282A (en) * 2015-10-23 2015-12-23 清远市富盈电子有限公司 Copper deposition manufacturing process for PCB with high aspect ratio
CN105695964A (en) * 2014-11-28 2016-06-22 重庆基石机械有限公司 Copper deposition process

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5174886A (en) * 1991-02-22 1992-12-29 Mcgean-Rohco, Inc. High-throw acid copper plating using inert electrolyte
JP2002161391A (en) * 2000-11-21 2002-06-04 Toppan Printing Co Ltd Electroplating method and method for manufacturing wiring board therewith
CN102647862A (en) * 2012-04-25 2012-08-22 博敏电子股份有限公司 Blind via filling plating method using different current parameter combinations
CN103228112A (en) * 2013-04-03 2013-07-31 深圳崇达多层线路板有限公司 Electroless copper plating method for PCBs (printed circuit boards) with high aspect ratios
CN104378930A (en) * 2013-08-14 2015-02-25 四川海英电子科技有限公司 Electric manufacturing method for two-sided copper deposition plate of PCB
CN104735927A (en) * 2013-12-20 2015-06-24 深圳崇达多层线路板有限公司 PCB glue removing method in mode of vertically depositing copper wires
CN104152874A (en) * 2014-07-20 2014-11-19 烟台恒迪克能源科技有限公司 Printed circuit board chemical copper plating activation solution
CN105695964A (en) * 2014-11-28 2016-06-22 重庆基石机械有限公司 Copper deposition process
CN105188282A (en) * 2015-10-23 2015-12-23 清远市富盈电子有限公司 Copper deposition manufacturing process for PCB with high aspect ratio

Non-Patent Citations (4)

* Cited by examiner, † Cited by third party
Title
MING WANG等: "Fabrication and performances of a novel copper-ordered-reinforced polymer composite interposer", 《J. MICROMECH. MICROENG.》 *
刘仁志: "《印制板电镀》", 30 September 2008, 国防工业出版社 *
朱凤鹃等: "印制电路板电镀铜添加剂的研究进展", 《电镀与精饰》 *
王尚义: "《汽车塑料件电镀工艺》", 31 August 2009, 机械工业出版社 *

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109413873A (en) * 2018-12-12 2019-03-01 东莞市若美电子科技有限公司 Ameliorative way of the high aspect ratio PCB aperture without copper
CN112566389A (en) * 2020-11-10 2021-03-26 深圳市昶东鑫线路板有限公司 Multilayer circuit board manufacturing method with high aspect ratio blind hole and multilayer circuit board
CN113710010A (en) * 2021-08-23 2021-11-26 广州广合科技股份有限公司 Processing method for preventing copper deposition and copper surface of PCB from being rough
CN115058749A (en) * 2021-12-22 2022-09-16 江苏本川智能电路科技股份有限公司 Electroplating processing method with high thickness-diameter ratio
CN117241478A (en) * 2023-11-15 2023-12-15 深圳市宇通瑞特科技有限公司 Horizontal electroplating process for double-sided and multi-layer PCB (printed circuit board)
CN117241478B (en) * 2023-11-15 2024-02-23 深圳市宇通瑞特科技有限公司 Horizontal electroplating process for double-sided and multi-layer PCB (printed circuit board)

Similar Documents

Publication Publication Date Title
CN106149018A (en) A kind of process for pcb board electro-coppering
CN104499021B (en) Printed wiring board and its copper plating process
CN101979709B (en) Novel chemical copper plating method
CN109972180B (en) New use of 2, 2' -dithiodipyridine, electroplating hole-filling additive using the same and electroplating method using the additive
CN108118341A (en) A kind of environment-friendly type tin copper coating decoating liquid and its strip method
CN105208781B (en) A kind of outer layer engraving method of thickness copper coin
CN102647858A (en) Processing method of printed circuit board (PCB)
CN103343366A (en) Electrotinning method for printed circuit board
CN101896039A (en) Post treatment neutralizer for removing smears from alkaline permanganate in printed circuit board manufacture
CN111020586A (en) Environment-friendly rack stripping solution for stripping copper and tin and copper and tin stripping method using environment-friendly rack stripping solution
CN104080278B (en) The production technology of wiring board conductive polymer fenestra technique and its collocation graphic plating
CN105734571A (en) Metal surface micro-etching liquid
CN101994105A (en) Preparing substrates containing polymers for metallization
CN111485264A (en) Copper electroplating pretreatment liquid with corrosion inhibition function and pretreatment process
CN104270893A (en) PCB surface processing technology
CN110832060B (en) Cleaning solution for cleaning metal surfaces
CN1592548A (en) Method for mfg. printed circuitboard
CN103572264A (en) Circuit board surface treatment method
CN104213170A (en) Copper plating method for high-order high-density circuit board
CN110993506B (en) IC carrier plate through hole filling process
CN105603472B (en) Acid copper-plating series additive
CN107385487A (en) A kind of HDI plates copper plating rapidly pretreatment liquid and its pre-treating technology
CN107231753A (en) A kind of golden method of the heavy nickel for improving plating leakage
CN103643269A (en) Process of ultrasonic wave electroplating of copper foil
US7063800B2 (en) Methods of cleaning copper surfaces in the manufacture of printed circuit boards

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
RJ01 Rejection of invention patent application after publication
RJ01 Rejection of invention patent application after publication

Application publication date: 20161123