CN106133605B - 感光性树脂组合物、平版印刷版原版及平版印刷版的制作方法 - Google Patents

感光性树脂组合物、平版印刷版原版及平版印刷版的制作方法 Download PDF

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Publication number
CN106133605B
CN106133605B CN201580015989.6A CN201580015989A CN106133605B CN 106133605 B CN106133605 B CN 106133605B CN 201580015989 A CN201580015989 A CN 201580015989A CN 106133605 B CN106133605 B CN 106133605B
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CN
China
Prior art keywords
structural unit
group
resin composition
printing plate
photosensitive resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201580015989.6A
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English (en)
Chinese (zh)
Other versions
CN106133605A (zh
Inventor
浅野耕太郎
野崎敦靖
佐藤尚志
向山怜菜
岛田和人
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Fujifilm Corp
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Fujifilm Corp
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Publication date
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Publication of CN106133605A publication Critical patent/CN106133605A/zh
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Expired - Fee Related legal-status Critical Current
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/02—Positive working, i.e. the exposed (imaged) areas are removed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/06—Developable by an alkaline solution
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Thermal Sciences (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
CN201580015989.6A 2014-03-31 2015-02-19 感光性树脂组合物、平版印刷版原版及平版印刷版的制作方法 Expired - Fee Related CN106133605B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2014074366 2014-03-31
JP2014-074366 2014-03-31
PCT/JP2015/054633 WO2015151632A1 (ja) 2014-03-31 2015-02-19 感光性樹脂組成物、平版印刷版原版及び平版印刷版の作製方法

Publications (2)

Publication Number Publication Date
CN106133605A CN106133605A (zh) 2016-11-16
CN106133605B true CN106133605B (zh) 2019-07-12

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Family Applications (1)

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CN201580015989.6A Expired - Fee Related CN106133605B (zh) 2014-03-31 2015-02-19 感光性树脂组合物、平版印刷版原版及平版印刷版的制作方法

Country Status (6)

Country Link
US (1) US10338469B2 (enExample)
EP (1) EP3128369B1 (enExample)
JP (1) JP6154065B2 (enExample)
CN (1) CN106133605B (enExample)
BR (1) BR112016022650B1 (enExample)
WO (1) WO2015151632A1 (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6185187B2 (ja) 2014-09-26 2017-08-23 富士フイルム株式会社 感光性樹脂組成物、平版印刷版原版、平版印刷版の作製方法、及び、高分子化合物
EP3260917B1 (en) * 2015-02-19 2020-06-10 Fujifilm Corporation Photosensitive resin composition, planographic printing original plate, method for producing planographic printing plate, and polymer compound
JP6396601B2 (ja) * 2015-09-28 2018-09-26 富士フイルム株式会社 ネガ型感光性樹脂組成物、ネガ型平版印刷版原版、及び、平版印刷版の作製方法
JPWO2018003405A1 (ja) * 2016-06-29 2019-01-10 富士フイルム株式会社 ポジ型感光性樹脂組成物、ポジ型平版印刷版原版、及び、平版印刷版の作製方法
WO2018061708A1 (ja) 2016-09-29 2018-04-05 富士フイルム株式会社 ポジ型平版印刷版原版及びその製造方法、並びに、平版印刷版の作製方法
CN109690403A (zh) * 2016-09-29 2019-04-26 富士胶片株式会社 正型平板印刷版原版及平板印刷版的制作方法
CN106444108B (zh) * 2016-11-18 2020-05-15 合肥工业大学 一种红外光禁带可调谐的胆甾相液晶器件的制备方法
JP6809315B2 (ja) * 2017-03-15 2021-01-06 東京エレクトロン株式会社 半導体装置の製造方法及び真空処理装置
JP6661567B2 (ja) * 2017-03-28 2020-03-11 富士フイルム株式会社 ポジ型感光性樹脂組成物、ポジ型平版印刷版原版、及び、平版印刷版の作製方法
CN109996683B (zh) 2017-10-31 2020-05-19 富士胶片株式会社 平版印刷版原版、平版印刷版的制造方法、印刷方法及铝支撑体的制造方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005091703A (ja) * 2003-09-17 2005-04-07 Fuji Photo Film Co Ltd 平版印刷版原版
JP2005091429A (ja) * 2003-09-12 2005-04-07 Fuji Photo Film Co Ltd 平版印刷版原版
JP2005106910A (ja) * 2003-09-29 2005-04-21 Fuji Photo Film Co Ltd 平版印刷版原版

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2522693B2 (ja) 1988-12-08 1996-08-07 富士写真フイルム株式会社 感光性組成物
JP4308687B2 (ja) * 2004-03-11 2009-08-05 富士フイルム株式会社 平版印刷版原版
JP2011138042A (ja) * 2009-12-28 2011-07-14 Fujifilm Corp 平版印刷版の作製方法
JP5301015B2 (ja) * 2011-07-25 2013-09-25 富士フイルム株式会社 感光性平版印刷版原版及び平版印刷版の作製方法
JP2013130726A (ja) * 2011-12-21 2013-07-04 Eastman Kodak Co ポジ型平版印刷版原版及び平版印刷版の製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005091429A (ja) * 2003-09-12 2005-04-07 Fuji Photo Film Co Ltd 平版印刷版原版
JP2005091703A (ja) * 2003-09-17 2005-04-07 Fuji Photo Film Co Ltd 平版印刷版原版
JP2005106910A (ja) * 2003-09-29 2005-04-21 Fuji Photo Film Co Ltd 平版印刷版原版

Also Published As

Publication number Publication date
WO2015151632A1 (ja) 2015-10-08
US10338469B2 (en) 2019-07-02
BR112016022650B1 (pt) 2022-03-03
JP6154065B2 (ja) 2017-06-28
EP3128369B1 (en) 2018-03-28
EP3128369A4 (en) 2017-09-06
US20170017153A1 (en) 2017-01-19
EP3128369A1 (en) 2017-02-08
JPWO2015151632A1 (ja) 2017-04-13
BR112016022650A2 (enExample) 2017-08-15
CN106133605A (zh) 2016-11-16

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Granted publication date: 20190712