CN106083061A - 一种激光烧结快速成型碳化硅陶瓷的制备方法 - Google Patents

一种激光烧结快速成型碳化硅陶瓷的制备方法 Download PDF

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CN106083061A
CN106083061A CN201610453397.9A CN201610453397A CN106083061A CN 106083061 A CN106083061 A CN 106083061A CN 201610453397 A CN201610453397 A CN 201610453397A CN 106083061 A CN106083061 A CN 106083061A
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何金玲
林文松
刘浩
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Zhejiang Light Tough Composite Materials Co ltd
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Abstract

本发明涉及一种激光烧结快速成型碳化硅陶瓷的制备方法,该方法具体包括以下步骤:(1)制备激光烧结快速成型碳化硅陶瓷粉末;(2)采用基于激光选择性烧结的3D打印技术将激光烧结快速成型碳化硅陶瓷粉末制成粗坯;(3)将粗坯埋在硅粉与氮化硼粉末组成的混合粉料中,在真空环境中进行反应烧结,得到烧结坯;(4)将烧结坯浸泡在碱性溶液中,以脱除烧结坯表面多余的金属硅,即得到所述的激光烧结快速成型碳化硅陶瓷。与现有技术相比,本发明不需要模具,工艺简单,条件易于控制,可制造各种形状的碳化硅零件,在小批量制造、特种零件制造上有独特的优越性。

Description

一种激光烧结快速成型碳化硅陶瓷的制备方法
技术领域
本发明属于快速成型材料技术领域,涉及一种激光烧结快速成型碳化硅陶瓷的制备方法。
背景技术
快速成型技术是近年来得到高度重视和高速发展的先进制造技术之一,它的基本原理可以概括为:分层制造和逐层叠加,因此有时也被称为3D打印技术。该类技术通过接收产品计算机辅助设计的分层数据,利用激光选择性烧结技术,直接成形制备各种形状的陶瓷零件,不需要借助模具成形,对于缩短新产品的开发周期并降低开发成本具有非常重要的意义。
碳化硅密度低、硬度高、化学稳定性好、导热性较好、热膨胀率低,在机械、冶金、电子、航天等多个工业领域得到广泛应用。在众多的应用领域中,碳化硅产品经常会被制备成各种复杂的形状。由于碳化硅陶瓷韧性差、脆性大、加工性能差,难以制备成形状特殊、结构功能一体化的零件,一般只能采用模压成形。但对于试制新产品而言,复杂产品所需要的模具加工费用非常高昂。
发明内容
本发明的目的就是为了克服上述现有技术存在的缺陷而提供一种不需预制模具、方便快捷的激光烧结快速成型碳化硅陶瓷的制备方法。
本发明的目的可以通过以下技术方案来实现:
一种激光烧结快速成型碳化硅陶瓷的制备方法,该方法具体包括以下步骤:
(1)制备激光烧结快速成型碳化硅陶瓷粉末;
(2)采用基于激光选择性烧结的3D打印技术将激光烧结快速成型碳化硅陶瓷粉末制成粗坯;
(3)将粗坯埋在硅粉与氮化硼粉末组成的混合粉料中,在真空环境中进行反应烧结,得到烧结坯;
(4)将烧结坯浸泡在碱性溶液中,以脱除烧结坯表面多余的金属硅,即得到所述的激光烧结快速成型碳化硅陶瓷。
步骤(1)所述的激光烧结快速成型碳化硅陶瓷粉末的制备方法具体包括以下步骤:
(1-1)按照以下组分及重量份含量进行备料:
碳化硅粉末75-82份、酚醛树脂4-9份、炭黑2-4份、聚乙烯醇2-5份及丙酮8-11份;
(1-2)将步骤(1)中各组分加入至研磨机中进行研磨处理;
(1-3)依次进行喷雾制粒及干燥处理,即制得激光烧结快速成型碳化硅陶瓷粉末。
其中,步骤(1-1)所述的碳化硅粉末的粒径为0.1-0.5μm。
作为优选的技术方案,步骤(1-1)中所述的酚醛树脂与炭黑的质量比为2-2.5:1。
步骤(1-2)所述的研磨处理的条件为:控制研磨机的转速为200-300r/min,研磨时间为2-4h。
步骤(1-3)所述的喷雾制粒及干燥处理的温度均为80-90℃。
步骤(2)所述的激光选择性烧结过程中,所述的激光为CO2激光,该CO2激光的功率为20-30W,铺粉厚度为0.1-0.2mm,预热温度为50-60℃。
步骤(3)所述的硅粉的粒径为0.1-2mm,并且所述的硅粉与氮化硼粉末的质量比为1.5-2.5:1。
所述的反应烧结的具体方法为:以5-10℃/min的升温速率将粗坯升温至750-850℃,保温0.5-2h,再以5-10℃/min的升温速率继续升温至1500-1600℃,保温0.5-2h。
步骤(4)所述的碱性溶液为NaOH溶液,该NaOH溶液的质量浓度为150-180g/L。
步骤(4)中,浸泡温度为50-90℃,浸泡时间为0.5-1h。
本发明通过制备适合激光选区烧结的碳化硅陶瓷混合粉末,而后根据3D打印原理,经激光烧结,不需预制模具,方便快捷地成形尺寸精密、形状复杂的零件坯,再经反应熔渗和残留硅去除处理得到性能优良的碳化硅陶瓷。
与现有技术相比,本发明具有以下特点:
1)本发明制得的激光烧结快速成型碳化硅陶瓷粉末的平均粒径为100-500μm,工艺性能稳定,在激光烧结下可直接成型,能够方便快捷地制备成尺寸精密的薄壁、细小或者各种复杂形状的零部件;
2)本发明不需预制模具即可方便快捷地制备出全致密碳化硅陶瓷,具有制备工艺简单、适应范围广及产品性能优越的特点,在小批量制造及特种零件制造方面有独特的优越性。
具体实施方式
下面结合具体实施例进一步说明本发明。但实施例具体细节仅是为了说明本发明,并不代表本发明构思下的全部技术方案,因此不应理解为对本发明的技术方案的限定。一些不偏离本发明构思的非实质性改动,例如以具有相同或相似技术效果的技术特征简单改变或替换,均属本发明权利保护范围。
实施例1:
(1)在研磨机中,按质量百分比加入下列粉末,将平均粒径为0.25μm的碳化硅粉末78份,酚醛树脂7份,炭黑3份,聚乙烯醇4份,丙酮8份。研磨机转速250r/min,研磨4h,然后进行喷雾制粒和干燥处理,喷雾干燥的进风温度为85℃,得到激光烧结快速成型碳化硅陶瓷混合粉末;
(2)采用居于激光选择性烧结的3D打印技术将所述碳化硅粉末制成粗坯,激光烧结规程为:CO2激光,功率为25W,铺粉厚度为0.1mm,预热温度60℃;
(3)将粗坯进行反应烧结,具体工艺规程为:将粗坯埋在硅粉和氮化硼粉末组成的混合粉料中,硅粉与氮化硼粉末的质量比例为2:1,在真空环境中将压坯升温至800℃保温1h,而后再升温至1560℃保温1h,升温速度为5~10℃/min,得到烧结坯;
(4)将烧结坯浸泡在NaOH溶液1h,NaOH浓度为155g/L,处理温度为70℃,脱除烧结坯表面多余的金属硅,得到碳化硅零件。
实施例2:
(1)在研磨机中,按质量百分比加入下列粉末,将颗粒度为0.5μm的碳化硅粉末78份,酚醛树脂6份,炭黑2.5份,聚乙烯醇3.5份,丙酮10份。研磨机转速250r/min,研磨3h,然后进行喷雾制粒和干燥处理,喷雾干燥的进风温度为85℃,得到激光烧结快速成型碳化硅陶瓷混合粉末;
(2)采用居于激光选择性烧结的3D打印技术将所述碳化硅粉末制成粗坯,激光烧结规程为:CO2激光,功率为30W,铺粉厚度为0.2mm,预热温度60℃;
(3)将粗坯进行反应烧结,具体工艺规程为:将粗坯埋在硅粉和氮化硼粉末组成的混合粉料中,硅粉与氮化硼粉末的质量比例为1.5:1,在真空环境中将压坯升温至800℃保温1h,而后再升温至1600℃保温1h,升温速度为10℃/min,得到烧结坯;
(4)将烧结坯浸泡在NaOH溶液0.5h,NaOH浓度为180g/L,处理温度为80℃,脱除烧结坯表面多余的金属硅,得到碳化硅零件。
实施例3:
本实施例激光烧结快速成型碳化硅陶瓷的制备方法,具体包括以下步骤:
(1)制备激光烧结快速成型碳化硅陶瓷粉末;
(2)采用基于激光选择性烧结的3D打印技术将激光烧结快速成型碳化硅陶瓷粉末制成粗坯;
(3)将粗坯埋在硅粉与氮化硼粉末组成的混合粉料中,在真空环境中进行反应烧结,得到烧结坯;
(4)将烧结坯浸泡在碱性溶液中,以脱除烧结坯表面多余的金属硅,即得到所述的激光烧结快速成型碳化硅陶瓷。
其中,步骤(1)中激光烧结快速成型碳化硅陶瓷粉末的制备方法具体包括以下步骤:
(1-1)按照以下组分及重量份含量进行备料:
碳化硅粉末75份、酚醛树脂4份、炭黑2份、聚乙烯醇2份及丙酮8份;
(1-2)将步骤(1)中各组分加入至研磨机中进行研磨处理;
(1-3)依次进行喷雾制粒及干燥处理,即制得激光烧结快速成型碳化硅陶瓷粉末。
步骤(1-1)中,碳化硅粉末的粒径为0.1μm;步骤(1-2)研磨处理的条件为:控制研磨机的转速为200r/min,研磨时间为4h;步骤(1-3)中喷雾制粒及干燥处理的温度均为80℃。
步骤(2)中,激光选择性烧结过程中,激光为CO2激光,该CO2激光的功率为20W,铺粉厚度为0.1mm,预热温度为50℃。
步骤(3)中,硅粉的粒径为0.1mm,并且硅粉与氮化硼粉末的质量比为1.5:1。反应烧结的具体方法为:以5℃/min的升温速率将粗坯升温至750℃,保温2h,再以5℃/min的升温速率继续升温至1500℃,保温2h。
步骤(4)中,碱性溶液为NaOH溶液,该NaOH溶液的质量浓度为150g/L,浸泡温度为50℃,浸泡时间为0.5h。
实施例4:
本实施例激光烧结快速成型碳化硅陶瓷的制备方法,具体包括以下步骤:
(1)制备激光烧结快速成型碳化硅陶瓷粉末;
(2)采用基于激光选择性烧结的3D打印技术将激光烧结快速成型碳化硅陶瓷粉末制成粗坯;
(3)将粗坯埋在硅粉与氮化硼粉末组成的混合粉料中,在真空环境中进行反应烧结,得到烧结坯;
(4)将烧结坯浸泡在碱性溶液中,以脱除烧结坯表面多余的金属硅,即得到所述的激光烧结快速成型碳化硅陶瓷。
其中,步骤(1)中激光烧结快速成型碳化硅陶瓷粉末的制备方法具体包括以下步骤:
(1-1)按照以下组分及重量份含量进行备料:
碳化硅粉末82份、酚醛树脂9份、炭黑4份、聚乙烯醇5份及丙酮11份;
(1-2)将步骤(1)中各组分加入至研磨机中进行研磨处理;
(1-3)依次进行喷雾制粒及干燥处理,即制得激光烧结快速成型碳化硅陶瓷粉末。
步骤(1-1)中,碳化硅粉末的粒径为0.5μm;步骤(1-2)研磨处理的条件为:控制研磨机的转速为300r/min,研磨时间为2h;步骤(1-3)中喷雾制粒及干燥处理的温度均为90℃。
步骤(2)中,激光选择性烧结过程中,激光为CO2激光,该CO2激光的功率为30W,铺粉厚度为0.2mm,预热温度为60℃。
步骤(3)中,硅粉的粒径为2mm,并且硅粉与氮化硼粉末的质量比为2.5:1。反应烧结的具体方法为:以10℃/min的升温速率将粗坯升温至850℃,保温0.5h,再以10℃/min的升温速率继续升温至1600℃,保温0.5h。
步骤(4)中,碱性溶液为NaOH溶液,该NaOH溶液的质量浓度为180g/L,浸泡温度为90℃,浸泡时间为1h。
实施例5:
本实施例激光烧结快速成型碳化硅陶瓷的制备方法,具体包括以下步骤:
(1)制备激光烧结快速成型碳化硅陶瓷粉末;
(2)采用基于激光选择性烧结的3D打印技术将激光烧结快速成型碳化硅陶瓷粉末制成粗坯;
(3)将粗坯埋在硅粉与氮化硼粉末组成的混合粉料中,在真空环境中进行反应烧结,得到烧结坯;
(4)将烧结坯浸泡在碱性溶液中,以脱除烧结坯表面多余的金属硅,即得到所述的激光烧结快速成型碳化硅陶瓷。
其中,步骤(1)中激光烧结快速成型碳化硅陶瓷粉末的制备方法具体包括以下步骤:
(1-1)按照以下组分及重量份含量进行备料:
碳化硅粉末80份、酚醛树脂6份、炭黑3份、聚乙烯醇4份及丙酮10份;
(1-2)将步骤(1)中各组分加入至研磨机中进行研磨处理;
(1-3)依次进行喷雾制粒及干燥处理,即制得激光烧结快速成型碳化硅陶瓷粉末。
步骤(1-1)中,碳化硅粉末的粒径为0.3μm;步骤(1-2)研磨处理的条件为:控制研磨机的转速为260r/min,研磨时间为3h;步骤(1-3)中喷雾制粒及干燥处理的温度均为85℃。
步骤(2)中,激光选择性烧结过程中,激光为CO2激光,该CO2激光的功率为25W,铺粉厚度为0.15mm,预热温度为56℃。
步骤(3)中,硅粉的粒径为0.8mm,并且硅粉与氮化硼粉末的质量比为2:1。反应烧结的具体方法为:以8℃/min的升温速率将粗坯升温至800℃,保温1h,再以8℃/min的升温速率继续升温至1520℃,保温1h。
步骤(4)中,碱性溶液为NaOH溶液,该NaOH溶液的质量浓度为160g/L,浸泡温度为80℃,浸泡时间为0.5h。
实施例6:
本实施例激光烧结快速成型碳化硅陶瓷的制备方法,具体包括以下步骤:
(1)制备激光烧结快速成型碳化硅陶瓷粉末;
(2)采用基于激光选择性烧结的3D打印技术将激光烧结快速成型碳化硅陶瓷粉末制成粗坯;
(3)将粗坯埋在硅粉与氮化硼粉末组成的混合粉料中,在真空环境中进行反应烧结,得到烧结坯;
(4)将烧结坯浸泡在碱性溶液中,以脱除烧结坯表面多余的金属硅,即得到所述的激光烧结快速成型碳化硅陶瓷。
其中,步骤(1)中激光烧结快速成型碳化硅陶瓷粉末的制备方法具体包括以下步骤:
(1-1)按照以下组分及重量份含量进行备料:
碳化硅粉末76份、酚醛树脂8份、炭黑2份、聚乙烯醇3份及丙酮9份;
(1-2)将步骤(1)中各组分加入至研磨机中进行研磨处理;
(1-3)依次进行喷雾制粒及干燥处理,即制得激光烧结快速成型碳化硅陶瓷粉末。
步骤(1-1)中,碳化硅粉末的粒径为0.2μm;步骤(1-2)研磨处理的条件为:控制研磨机的转速为240r/min,研磨时间为2.5h;步骤(1-3)中喷雾制粒及干燥处理的温度均为88℃。
步骤(2)中,激光选择性烧结过程中,激光为CO2激光,该CO2激光的功率为28W,铺粉厚度为0.16mm,预热温度为52℃。
步骤(3)中,硅粉的粒径为1.2mm,并且硅粉与氮化硼粉末的质量比为1.8:1。反应烧结的具体方法为:以7℃/min的升温速率将粗坯升温至770℃,保温1h,再以7℃/min的升温速率继续升温至1580℃,保温1h。
步骤(4)中,碱性溶液为NaOH溶液,该NaOH溶液的质量浓度为175g/L,浸泡温度为78℃,浸泡时间为0.5h。
上述的对实施例的描述是为便于该技术领域的普通技术人员能理解和使用发明。熟悉本领域技术的人员显然可以容易地对这些实施例做出各种修改,并把在此说明的一般原理应用到其他实施例中而不必经过创造性的劳动。因此,本发明不限于上述实施例,本领域技术人员根据本发明的揭示,不脱离本发明范畴所做出的改进和修改都应该在本发明的保护范围之内。

Claims (10)

1.一种激光烧结快速成型碳化硅陶瓷的制备方法,其特征在于,该方法具体包括以下步骤:
(1)制备激光烧结快速成型碳化硅陶瓷粉末;
(2)采用基于激光选择性烧结的3D打印技术将激光烧结快速成型碳化硅陶瓷粉末制成粗坯;
(3)将粗坯埋在硅粉与氮化硼粉末组成的混合粉料中,在真空环境中进行反应烧结,得到烧结坯;
(4)将烧结坯浸泡在碱性溶液中,以脱除烧结坯表面多余的金属硅,即得到所述的激光烧结快速成型碳化硅陶瓷。
2.根据权利要求1所述的一种激光烧结快速成型碳化硅陶瓷的制备方法,其特征在于,步骤(1)所述的激光烧结快速成型碳化硅陶瓷粉末的制备方法具体包括以下步骤:
(1-1)按照以下组分及重量份含量进行备料:
碳化硅粉末75-82份、酚醛树脂4-9份、炭黑2-4份、聚乙烯醇2-5份及丙酮8-11份;
(1-2)将步骤(1)中各组分加入至研磨机中进行研磨处理;
(1-3)依次进行喷雾制粒及干燥处理,即制得激光烧结快速成型碳化硅陶瓷粉末。
3.根据权利要求2所述的一种激光烧结快速成型碳化硅陶瓷的制备方法,其特征在于,步骤(1-1)所述的碳化硅粉末的粒径为0.1-0.5μm。
4.根据权利要求2所述的一种激光烧结快速成型碳化硅陶瓷的制备方法,其特征在于,步骤(1-2)所述的研磨处理的条件为:控制研磨机的转速为200-300r/min,研磨时间为2-4h。
5.根据权利要求2所述的一种激光烧结快速成型碳化硅陶瓷的制备方法,其特征在于,步骤(1-3)所述的喷雾制粒及干燥处理的温度均为80-90℃。
6.根据权利要求1所述的一种激光烧结快速成型碳化硅陶瓷的制备方法,其特征在于,步骤(2)所述的激光选择性烧结过程中,所述的激光为CO2激光,该CO2激光的功率为20-30W,铺粉厚度为0.1-0.2mm,预热温度为50-60℃。
7.根据权利要求1所述的一种激光烧结快速成型碳化硅陶瓷的制备方法,其特征在于,步骤(3)所述的硅粉的粒径为0.1-2mm,并且所述的硅粉与氮化硼粉末的质量比为1.5-2.5:1。
8.根据权利要求7所述的一种激光烧结快速成型碳化硅陶瓷的制备方法,其特征在于,所述的反应烧结的具体方法为:以5-10℃/min的升温速率将粗坯升温至750-850℃,保温0.5-2h,再以5-10℃/min的升温速率继续升温至1500-1600℃,保温0.5-2h。
9.根据权利要求1所述的一种激光烧结快速成型碳化硅陶瓷的制备方法,其特征在于,步骤(4)所述的碱性溶液为NaOH溶液,该NaOH溶液的质量浓度为150-180g/L。
10.根据权利要求1所述的一种激光烧结快速成型碳化硅陶瓷的制备方法,其特征在于,步骤(4)中,浸泡温度为50-90℃,浸泡时间为0.5-1h。
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CN106966732A (zh) * 2017-03-09 2017-07-21 平顶山学院 一种细粉碳化硅陶瓷及其制备方法
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