CN106024962A - 一种多结层状薄膜太阳能电池 - Google Patents

一种多结层状薄膜太阳能电池 Download PDF

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CN106024962A
CN106024962A CN201610533532.0A CN201610533532A CN106024962A CN 106024962 A CN106024962 A CN 106024962A CN 201610533532 A CN201610533532 A CN 201610533532A CN 106024962 A CN106024962 A CN 106024962A
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thin layer
knot
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laminar film
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陈平
陈一平
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Wuxi Baolai Battery Co
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Wuxi Baolai Battery Co
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/04Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
    • H01L31/06Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier
    • H01L31/068Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the PN homojunction type, e.g. bulk silicon PN homojunction solar cells or thin film polycrystalline silicon PN homojunction solar cells
    • H01L31/0687Multiple junction or tandem solar cells
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/04Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
    • H01L31/042PV modules or arrays of single PV cells
    • H01L31/0445PV modules or arrays of single PV cells including thin film solar cells, e.g. single thin film a-Si, CIS or CdTe solar cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/544Solar cells from Group III-V materials

Abstract

一种多结层状薄膜太阳能电池,包括顶层和末层的正、负电极层,在顶层电极层与末层电极层之间设有多个PN结薄膜层,各PN结薄膜层之间设有连接层。本发明是基于碳、硅等普通绿色材料的、高光电转换效率的太阳能薄膜叠层电池,应用前景无限。

Description

一种多结层状薄膜太阳能电池
技术领域
本发明涉及太阳能电池,尤其涉及一种多结层状薄膜太阳能电池。
背景技术
开发利用太阳能是人类解决能源危机、环境危机的最主要途径之一,而绿色高效太阳能电池开发是广泛应用太阳能的关键技术与环节。当前硅基电池包括薄膜电池与硅片电池的光电转换效率不高,使用价值有限,而稳定效率达到23%以上的太阳能电池,如叠层砷化镓或铜铟镓硒或锗基等薄膜电池,都存在材料稀缺或有毒等问题,而且工艺复杂,没有社会广泛应用潜力。
发明内容
本发明的目的,就是为了解决上述问题,提供一种多结层状薄膜太阳能电池。
为了达到上述目的,本发明采用了以下技术方案:一种多结层状薄膜太阳能电池,
包括顶层正电极层和末层负电极层,在顶层电极层与末层电极层之间设有多个PN 结薄膜层,各PN 结薄膜层之间设有连接层。
所述多个PN 结薄膜层各PN 结的P 区与N 区次序相同,即所有PN 结的方向一致。
所述各PN 结薄膜层是硅基掺杂的非晶或微晶P 型半导体和N 型半导体的同质结,
或是由硅基P 型或N 型掺杂的非晶或微晶半导体和碳化硅N 型或P 型掺杂的非晶或微晶半导体组成的异质结。
所述多个PN 结薄膜层中每个PN 结薄膜层的厚度在3 ~ 2000 纳米之间,并且前一层PN 结薄膜层的厚度为后一层PN 结薄膜层的厚度的1/3-1/20。
所述连接层为半导体材料、透明导电材料、氧化物或金属,厚度为0 ~ 2000 纳米但不为零。
所述半导体材料包括本征硅或碳化硅;所述透明导电材料包括TCO、ITO 等;所述
氧化物包括氧化铝、氧化硅等;所述金属包括铜、铝、银、镁、钨、镍等纯金属或其合金等。
本发明是基于碳、硅等普通绿色材料的、高光电转换效率的太阳能薄膜叠层电池,应用前景无限。
附图说明
图1 是本发明多结层状薄膜太阳能电池的基本结构示意图。
具体实施方式
参见图1,本发明多结层状薄膜太阳能电池,包括顶层电极层1 和末层电极层2,在顶层电极层1 与末层电极层2 之间设有多个PN 结薄膜层3,各PN 结薄膜层之本发明中的多个PN 结薄膜层各PN 结的P 区与N 区次序相同,即所有PN 结的方向一致;各PN 结薄膜层是硅基掺杂的非晶或微晶P 型半导体和N 型半导体的同质结,或是由硅基P 型或N 型掺杂的非晶或微晶半导体和碳化硅N 型或P 型掺杂的非晶或微晶半导体组成的异质结。
本发明中的多个PN 结薄膜层中每个PN 结薄膜层的厚度在3 ~ 2000 纳米之间,并且前一层PN 结薄膜层的厚度为后一层PN 结薄膜层的厚度的1/3-1/20。
本发明中的连接层为半导体材料、透明导电材料、氧化物或金属,厚度为0 ~ 2000
纳米但不为零;半导体材料包括本征硅或碳化硅;透明导电材料包括TCO 或ITO ;氧化物包括氧化铝、氧化硅等;金属包括铜、铝、银、镁、钨、镍等纯金属或其合金等。
本发明中的多个PN 结薄膜层主要由高真空条件下的电磁控物理蒸镀、溅射及化气相沉积工艺制成。

Claims (6)

1. 一种多结层状薄膜太阳能电池,包括顶层电极层和末层电极层,其特征在于,在顶层电极层与末层电极层之间设有多个PN 结薄膜层,各PN 结薄膜层之间设有连接层。
2. 如权利要求1 所述的多结层状薄膜太阳能电池,其特征在于:所述多个PN 结薄膜层各PN 结的P 区与N 区次序相同,即所有PN 结的方向一致。
3. 如权利要求1 所述的多结层状薄膜太阳能电池,其特征在于:所述各PN 结薄膜层是硅基掺杂的非晶或微晶P 型半导体和N 型半导体的同质结,或是由硅基P 型或N 型掺杂的非晶或微晶半导体和碳化硅N 型或P 型掺杂的非晶或微晶半导体组成的异质结。
4. 如权利要求1 所述的多结层状薄膜太阳能电池,其特征在于:所述多个PN 结薄膜层中每个PN 结薄膜层的厚度在3 ~ 2000 纳米之间,并且前一层PN 结薄膜层的厚度为后一层PN 结薄膜层的厚度的1/3-1/20。
5. 如权利要求1 所述的多结层状薄膜太阳能电池,其特征在于:所述连接层为半导体材料、透明导电材料、氧化物或金属,厚度为0 ~ 2000 纳米但不为零。
6. 如权利要求1 所述的多结层状薄膜太阳能电池,其特征在于:所述半导体材料包括本征硅或碳化硅;所述透明导电材料包括TCO 或ITO ;所述氧化物包括氧化铝或氧化硅;所述金属包括铜、铝、银、镁、钨、镍或其合金。
CN201610533532.0A 2016-07-08 2016-07-08 一种多结层状薄膜太阳能电池 Pending CN106024962A (zh)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107180887A (zh) * 2017-06-20 2017-09-19 上海日岳新能源有限公司 一种多结叠层薄膜太阳能电池内部结之间耦合连接工艺
CN110534607A (zh) * 2018-05-25 2019-12-03 中国电子科技集团公司第十八研究所 一种GaInP/GaAs/μc-Si:H三结叠层太阳电池

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060162767A1 (en) * 2002-08-16 2006-07-27 Angelo Mascarenhas Multi-junction, monolithic solar cell with active silicon substrate
CN104681651A (zh) * 2013-11-27 2015-06-03 宋太伟 硅基多结太阳能电池
CN104681653A (zh) * 2013-11-27 2015-06-03 上海建冶科技工程股份有限公司 多结层状薄膜太阳能电池
CN104733559A (zh) * 2013-12-18 2015-06-24 宋太伟 多层扩展pn结薄膜太阳能电池

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060162767A1 (en) * 2002-08-16 2006-07-27 Angelo Mascarenhas Multi-junction, monolithic solar cell with active silicon substrate
CN104681651A (zh) * 2013-11-27 2015-06-03 宋太伟 硅基多结太阳能电池
CN104681653A (zh) * 2013-11-27 2015-06-03 上海建冶科技工程股份有限公司 多结层状薄膜太阳能电池
CN104733559A (zh) * 2013-12-18 2015-06-24 宋太伟 多层扩展pn结薄膜太阳能电池

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107180887A (zh) * 2017-06-20 2017-09-19 上海日岳新能源有限公司 一种多结叠层薄膜太阳能电池内部结之间耦合连接工艺
CN110534607A (zh) * 2018-05-25 2019-12-03 中国电子科技集团公司第十八研究所 一种GaInP/GaAs/μc-Si:H三结叠层太阳电池

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