CN102386244B - 一种CdTe电池过渡层及其制备方法及CdTe电池 - Google Patents

一种CdTe电池过渡层及其制备方法及CdTe电池 Download PDF

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CN102386244B
CN102386244B CN201010274863.XA CN201010274863A CN102386244B CN 102386244 B CN102386244 B CN 102386244B CN 201010274863 A CN201010274863 A CN 201010274863A CN 102386244 B CN102386244 B CN 102386244B
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邓瑞
周勇
曹文玉
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Abstract

本发明属于化合物太阳能电池技术领域,具体公开了一种CdTe太阳能电池过渡层。其包括ZnTe层和Cu层交替堆积的多层结构;多层结构中与CdTe层接触的为第一层,第一层为ZnTe层;多层结构中ZnTe层的厚度范围为10~40nm,多层结构中Cu层的厚度为1~10nm;多层结构的总厚度为25~120nm。本发明还公开了该CdTe电池过渡层的其制备方法及使用该过渡层的CdTe电池。本发明所提供的CdTe电池的过渡层,可以有效抑制Cu原子扩散所带来的电池性能衰减的问题,电池性能稳定。并且过渡层的制备方法简单,可以大规模流水线生产。并且条件参数易于控制。

Description

一种CdTe电池过渡层及其制备方法及CdTe电池
技术领域
本发明属于化合物太阳能电池技术领域,尤其涉及一种CdTe电池过渡层及其制备方法及CdTe电池。
背景技术
CdTe是一种化合物半导体,其能隙宽度最适合于光电能量转换。用这种半导体做成的太阳电池是一种将光能直接转变为电能的器件,有很高的理论转换效率。碲化镉容易沉积成大面积的薄膜,沉积速率也高。因此,相比于硅太阳能电池,碲化镉薄膜太阳电池的制造成本低,是应用前景广阔的新型太阳电池。
如图1所示,CdTe太阳能电池的一般结构为:从上到下依次为玻璃衬底1`、透明导电膜2`、n-CdS层3`、p-CdTe层4`、过渡层5`以及背电极6`。由于CdTe的功函数较高(5.5eV),过渡层可以改善CdTe与背电极的欧姆接触,从而极大的提高了CdTe太阳能电池的性能。
过渡层一般采用ZnTe:Cu过渡层。即Cu掺杂在ZnTe层中。但是ZnTe:Cu过渡层中Cu原子很容易进入到CdTe层中,从而导致电池性能急剧衰减。
并且现有制备ZnTe:Cu过渡层的方法为共沉积法:采用两个沉积源,即ZnTe沉积源和Cu沉积源,同时在CdTe上沉积。但是,共沉积法目前只适用于实验室研究,不适合于大规模的工业化流水线生产。并且共吃呢机设备复杂昂贵,操作程序复杂且难以控制。其次,共蒸镀法难以控制最后过渡层中Cu的掺杂比例。
发明内容
本发明所要解决的技术问题是,现有技术中CdTe电池的过渡层,导致电池性能衰减快,并且过渡层制备复杂,不适宜大规模工业生产;从而提供一种电池衰减慢、制备简单、适宜大规模生产的CdTe电池过渡层。
一种CdTe电池过渡层,包括ZnTe层和Cu层交替堆积的多层结构;多层结构中与CdTe层接触的为第一层,所述第一层为ZnTe层;所述多层结构中ZnTe层的厚度范围为10~40nm,所述多层结构中Cu层的厚度为1~10nm;所述多层结构的总厚度为25~120nm。
本发明的第二目的是提供了一种CdTe电池过渡层的制备方法。
一种CdTe电池过渡层的制备方法,其包括:先在CdTe层上沉积一层ZnTe层,然后交替沉积Cu层和ZnTe层;控制Cu层的厚度在1~10nm范围之内,ZnTe层在10~40nm范围之内,沉积的总厚度为25~120nm。
本发明的第三个目的是提供一种CdTe电池。
一种CdTe电池,其包括:依次层叠的玻璃衬底、透明导电层、CdS层、CdTe层、过渡层以及背电极层;其中,所述过渡层为本发明所提供的过渡层。
本发明所提供的CdTe电池的过渡层,可以有效抑制Cu原子扩散所带来的电池性能衰减的问题,电池性能稳定。并且,过渡层的制备方法简单,可以大规模流水线生产。并且条件参数易于控制。
附图说明
图1是现有技术的CdTe太阳能电池结构示意图。
图2是本发明所提供的CdTe电池过渡层的结构示意图。
具体实施方式
为了使本发明所解决的技术问题、技术方案及有益效果更加清楚明白,以下结合附图及实施例,对本发明进行进一步详细说明。应当理解,此处所描述的具体实施例仅仅用以解释本发明,并不用于限定本发明。
一种CdTe电池过渡层,包括ZnTe层和Cu层交替堆积的多层结构;多层结构中与CdTe层接触的为第一层,所述第一层为ZnTe层;所述多层结构中ZnTe层的厚度范围为10~40nm,所述多层结构中Cu层的厚度为1~10nm所述多层结构的总厚度为25~120nm。
多层结构具体参见图2,其中1代表ZnTe层,2代表Cu层。
优选情况下,本发明的多层结构的总层数优选为4~8层。这样既能保证形成良好的欧姆接触,又利于简化工序,实施以及操作相对简单。
本发明优选第一层ZnTe的厚度大于其他ZnTe层的厚度。
优选第一层的厚度为20~40nm。
这样可以更有效抑制Cu原子的扩散对CdTe电池性能的影响。
本发明优选在多层结构中,沿远离第一层的方向,即从CdTe到背电极的方向,ZnTe层的厚度依次递减。
或者本发明优选在多层结构中,沿远离第一层的方向,即从CdTe到背电极的方向,Cu层的厚度依次递增。
以上两种优选方式,可以使沿远离第一层的方法(即从CdTe到背电极的方向)的Cu的浓度变高,过渡层的电阻率逐渐变小,更有利于电子的导出,使过渡层的效果更好。
当然最好可以是在ZnTe层的厚度依次递减,同时Cu层的厚度依次递增。这样效果更佳。
本发明优选Cu层的厚度均小于与其相邻的两层ZnTe层的厚度。即两层ZnTe中间夹的Cu层均薄于这两层ZnTe层。这样有利于形成Cu原子在后期使用过程中均匀更扩散。
本发明的过渡层,Cu层与CdTe层之间间隔着第一层ZnTe层,ZnTe层可以有效防止Cu层中Cu原子扩散到CdTe层,从而避免了因Cu扩散引起的电池性能衰减。在后期的使用过程中,Cu原子随着光电作用而扩散,从而实现Cu和ZnTe的掺杂。并且其制备方法简单,可以用交替沉积来替代复杂的同时沉积形成掺杂的过程。Cu的原子比可以通过Cu层厚度来控制。
一种CdTe电池过渡层的制备方法,其包括:先在CdTe层上沉积一层ZnTe层,然后交替沉积Cu层和ZnTe层;控制Cu层的厚度在1~10nm范围之内,ZnTe层在10~40nm范围之内,沉积的总厚度为25~120nm。
其中,沉积可以采用本领域技术常采用的溅射、电子束蒸发和蒸镀来实现。
本发明的方法,采用的是单源沉积,设备简单、造价便宜。同时产物原子比可通过沉积膜厚控制,比较稳定,Cu层位于ZnTe膜层之后,通过控制ZnTe膜层厚度可控制Cu的扩散深度,使其不容易扩散进入其他膜层而形成楔形掺铜过渡层,有利于提高电池的短路电流,长时间使用也不会导致电池的衰降。
一种CdTe电池,其包括:依次层叠的玻璃衬底、透明导电层、CdS层、CdTe层、过渡层以及背电极层;其中,所述过渡层为本发明所提供的过渡层。
其中,玻璃衬底为本领域技术人员所公知的,其作用是提供透光性好,并且具有一定耐热性和强度的衬底。一般普通玻璃即可。
本发明的玻璃衬底优选采用超白玻璃。玻璃衬底的厚度优选为1~5mm。
透明导电层亦为本领域技术人员所公知的,其作用为:提供良好的导电性能使电子容易导出。一般采用掺Sn的氧化铟薄膜In2O3:Sn(ITO)、ZnO:Al(ZAO)、In2O3:Mo(IMO)、SnO2:F(FTO)等。本发明的玻璃衬底优选采用FTO。
透明导电层的厚度优选为1~10μm。
CdS层、CdTe层亦为本领域技术人员所公知的,其作用是形成CdTe太阳能电池形成P-N结。CdS层、CdTe层的纯度优选均在5N以上。
CdS层的厚度优选50~300nm,CdTe层的厚度优选1~10μm。
背电极主要起到导电作用,常采用导电性好、电阻小的金属物质,如Au、Ag、Ni、Cu、Mo等,本发明优选Ni、Mo。背电极的厚度优选为80~500nm。
以下结合具体实施例对本发明作进一步的阐述。
实施例1
一种CdTe太阳能电池,其包括依次层叠的玻璃衬底、透明导电层、CdS层、CdTe层、过渡层以及背电极层;
其中玻璃衬底为超白玻璃,厚2mm;透明导电层为FTO,厚1um;CdS层的纯度为5N,厚200nm;CdTe层的纯度为5N,厚5um。
过渡层是在CdTe层依次沉积30nm ZnTe层、4nm Cu层、25nm ZnTe层、5nm Cu层。
背电极层为Ni层,厚200nm。
电池记作A1。
实施例2
与实施例1所不同的是:过渡层是在CdTe层依次沉积25nm ZnTe层、3nmCu层、20nm ZnTe层、4nm Cu层、15nm ZnTe层、5nm Cu层。
其他部分同实施例1。
电池记作A2。
实施例3
与实施例1所不同的是:过渡层是在CdTe层依次沉积25nm ZnTe层、2nmCu层、20nm ZnTe层、3nm Cu层、15nm ZnTe层、4nm Cu层、10nm ZnTe层、5nm Cu层。
其他部分同实施例1。
电池记作A3。
实施例4
与实施例1所不同的是:过渡层是在CdTe层依次沉积20nm ZnTe层、5nmCu层、15nm ZnTe层、7nm Cu层、15nm ZnTe层、7nm Cu层。
其他部分同实施例1。
电池记作A4。
实施例5
与实施例1所不同的是:过渡层是在CdTe层依次沉积40nm ZnTe层、3nmCu层、10nm ZnTe层、4nm Cu层、10nm ZnTe层、4nm Cu层。
电池记作A5。
对比例1
与实施例1所不同的是:过渡层为共蒸发沉积的ZnTe:Cu,厚50nm。其他部分同实施例1。
性能测试:
对上述CdTe电池用芬兰endeas太阳模拟测试系统Quick Sun 120CA进行I-V测试,得出其填充子,开路电压,短路电流以及光电转化效率。将以上电池片晴天放在室外曝晒十五天以上(光强60KW/h),之后对比其输出功率变化值。结果见表1。
表1
Figure BSA00000260662000071
从表1可以看出,从实施例1-5相对于对比例1的光电转化效率等都有了大幅的提高,这说明本发明的过渡层可以具有良好的欧姆接触。暴晒后的功率变化值,可以看出实施例1-5相对于对比例1的光电转化效率下降幅度都相对较低,这说明本发明的过渡层可以有效的减缓CdTe太阳能电池转换效率的衰减。
以上所述仅为本发明的较佳实施例而已,并不用以限制本发明,凡在本发明的精神和原则之内所作的任何修改、等同替换和改进等,均应包含在本发明的保护范围之内。

Claims (9)

1.一种CdTe电池过渡层,包括ZnTe层和Cu层交替堆积的多层结构;多层结构中与CdTe层接触的为第一层,所述第一层为ZnTe层;所述多层结构中ZnTe层的厚度范围为10~40nm,所述多层结构中Cu层的厚度为1 ~10nm;所述多层结构的总厚度为25~120nm;
在所述多层结构中,沿远离第一层的方向,ZnTe层的厚度依次递减。
2.根据权利要求1所述的CdTe电池过渡层,其特征在于:所述多层结构的总层数为4~8层。
3.根据权利要求1所述的CdTe电池过渡层,其特征在于:在所述多层结构中,第一层的厚度大于其他ZnTe层的厚度。
4.根据权利要求3所述的CdTe电池过渡层,其特征在于:所述第一层的厚度为20~40nm。   
5.根据权利要求3所述的CdTe电池过渡层,其特征在于:在所述多层结构中,沿远离第一层的方向,Cu层的厚度依次递增。
6.一种权利要求1所述的CdTe电池过渡层的制备方法,其包括:先在CdTe层上沉积一层ZnTe层,然后交替沉积Cu层和ZnTe层;控制Cu层的厚度在1~10nm范围之内,ZnTe层在10~40nm范围之内,沉积的总厚度为25~120nm。 
7.根据权利要求6所述的CdTe电池过渡层的制备方法,其特征在于:所述沉积为溅射或者蒸镀。
8.一种CdTe电池,其包括:依次层叠的玻璃衬底、透明导电层、CdS层、CdTe层、过渡层以及背电极层;其特征在于:所述过渡层为权利要求1所述的CdTe电池过渡层。
9.根据权利要求8所述的CdTe电池,其特征在于:所述玻璃衬底的厚度为1~5mm,所述透明导电层的厚度为1~10μm,所述CdS层的厚度为50~300nm,所述CdTe层的厚度为1~10μm,所述背电极的厚度为80~500nm。
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* Cited by examiner, † Cited by third party
Title
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