CN105917255B - 制造反射镜元件的方法 - Google Patents

制造反射镜元件的方法 Download PDF

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Publication number
CN105917255B
CN105917255B CN201580004334.9A CN201580004334A CN105917255B CN 105917255 B CN105917255 B CN 105917255B CN 201580004334 A CN201580004334 A CN 201580004334A CN 105917255 B CN105917255 B CN 105917255B
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China
Prior art keywords
substrate
mirror elements
mirror
layer
curvature
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CN201580004334.9A
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English (en)
Chinese (zh)
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CN105917255A (zh
Inventor
H.恩基希
P.休伯
S.斯特罗贝尔
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Carl Zeiss SMT GmbH
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Carl Zeiss SMT GmbH
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0816—Multilayer mirrors, i.e. having two or more reflecting layers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0891—Ultraviolet [UV] mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/09—Multifaceted or polygonal mirrors, e.g. polygonal scanning mirrors; Fresnel mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/10—Mirrors with curved faces
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/062—Devices having a multilayer structure
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/064—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements having a curved surface

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
CN201580004334.9A 2014-01-30 2015-01-29 制造反射镜元件的方法 Active CN105917255B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102014201622.3A DE102014201622A1 (de) 2014-01-30 2014-01-30 Verfahren zum Herstellen eines Spiegelelements
DE102014201622.3 2014-01-30
PCT/EP2015/051791 WO2015114043A1 (de) 2014-01-30 2015-01-29 Verfahren zum herstellen eines spiegelelements

Publications (2)

Publication Number Publication Date
CN105917255A CN105917255A (zh) 2016-08-31
CN105917255B true CN105917255B (zh) 2019-10-25

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Application Number Title Priority Date Filing Date
CN201580004334.9A Active CN105917255B (zh) 2014-01-30 2015-01-29 制造反射镜元件的方法

Country Status (6)

Country Link
US (1) US10423073B2 (https=)
EP (1) EP3100083B1 (https=)
JP (1) JP6550066B2 (https=)
CN (1) CN105917255B (https=)
DE (1) DE102014201622A1 (https=)
WO (1) WO2015114043A1 (https=)

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DE102015225510A1 (de) 2015-12-16 2017-01-12 Carl Zeiss Smt Gmbh Spiegelelement, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage
FR3065536B1 (fr) * 2017-04-20 2019-07-12 Alpao Miroir deformable a courbure variable et procede de fabrication d'un miroir associe
CN107143756B (zh) * 2017-06-14 2020-05-08 上海安茗科技中心(有限合伙) 灯具
DE102019202222B4 (de) * 2019-02-19 2023-08-10 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Ablenkspiegel aus Diamant sowie Verfahren zur Herstellung
EP3703114A1 (en) * 2019-02-26 2020-09-02 ASML Netherlands B.V. Reflector manufacturing method and associated reflector
DE102023200603A1 (de) 2023-01-26 2024-08-01 Carl Zeiss Smt Gmbh Verfahren zum Herstellen einer Spiegelanordnung, sowie Beschichtungsanlage
DE102023205340A1 (de) 2023-06-07 2024-12-12 Carl Zeiss Smt Gmbh Verfahren zum Herstellen eines optischen Elements, sowie optisches Element und Beschichtungsanlage
DE102023206689A1 (de) 2023-07-13 2025-01-16 Carl Zeiss Smt Gmbh Aktuierbare Spiegel-Baugruppe
DE102023210486A1 (de) * 2023-10-24 2025-04-24 Carl Zeiss Smt Gmbh Optisches Element und EUV-Lithographiesystem
JP7519150B1 (ja) 2024-04-11 2024-07-19 合同会社北海道環境・エネルギー研究所 柱面体作製方法及びその作製方法を用いて作製された柱面体
DE102024205025A1 (de) * 2024-05-29 2025-12-04 Carl Zeiss Smt Gmbh Mikro-elektro-mechanisch bewegbares Element und System
DE102024207651A1 (de) * 2024-08-12 2026-02-12 Carl Zeiss Smt Gmbh Verfahren zur Herstellung eines Mikrospiegelelements und mikro-elektro-mechanisches System

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Also Published As

Publication number Publication date
EP3100083A1 (de) 2016-12-07
WO2015114043A1 (de) 2015-08-06
CN105917255A (zh) 2016-08-31
EP3100083B1 (de) 2019-08-14
US10423073B2 (en) 2019-09-24
JP2017506363A (ja) 2017-03-02
DE102014201622A1 (de) 2015-08-20
JP6550066B2 (ja) 2019-07-24
US20160342093A1 (en) 2016-11-24

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