CN105906829A - 一种耐污防静电离型膜 - Google Patents
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Abstract
本发明所述的一种耐污防静电离型膜,其特征在于,包括基膜层,基膜层上设置有离型层,离型层由离型剂涂覆而成,离型剂包含下述质量份数的各组分:乙烯基有机硅树脂:10‑20份;聚对苯二甲酸乙二醇酯:15‑30份;纳米二氧化硅:0.5‑4份;纳米二氧化钛:2‑6份;导电聚合物:3‑8份;低表面张力助剂:0.1‑0.6份;偶联剂:1‑3.5份;消泡剂:0.5‑1.5份;溶剂:18‑40份。所述耐污防静电离型膜,使得到的离型膜在与接触的粘着带或者胶粘带分离时不产生粘连;同时添加有纳米二氧化钛及低表面张力助剂,能够分解附着在离型膜表面的油污,增强离型膜的耐污性能。
Description
技术领域
本发明涉及一种离型膜,特别涉及一种耐污防静电离型膜。
背景技术
离型膜又称防粘膜,是以聚对苯二甲酸乙二醇酯塑料(简称PET)、双向拉伸聚丙烯薄膜塑料(简称BOPP)、聚乙烯塑料(简称PE)、碳酸酯塑料(简称PC)、聚苯乙烯塑料(简称PS)、聚丙烯塑料(简称CPP)为基材制作的一种表面具有低表面能的特性的材料。将紧邻的黏胶从离型面剥离时,可以轻易剥离或移取离型材料,而不伤害黏胶物性。离型膜的特点是表面平整、洁净度高,后续加工尺寸稳定,透明度及颜色可调整,薄膜的厚度与基材的种类可选择的范围广。利用离型膜这些特点可以向光学与电子领域的零部件的深加工发展,从而适应这一领域越来越多的自动化生产工艺过程,目前,离型膜能够广泛应用于覆铜板、印刷电路板、电子胶黏剂等领域。
离型膜包含基材膜和离型层。基材膜表面至少一面设置有离型层,以提供较低的表面能量。基材膜多采用纸、塑料薄膜作为材料,离型层主要采用硅混合物构成。一般多用于产业用粘着带或者胶粘带等的,对离型膜的性能要求较低,只需要其具有高密着性和残留胶粘率,但是随着工业领域的迅速发展,离型膜的使用范围越来越广,对其其他性能也有了一定要求。
然而,现有的离型膜大多耐污染性能差,进而影响离型膜的使用和存储,导致与粘着带或者胶粘带等的分离效果不佳,因此需要一种具有耐污性能的离型膜。
发明内容
为解决上述存在的问题,本发明的目的在于提供一种耐污防静电离型膜。所述耐污防静电离型膜,各组分相互配合,使得得到的离型层能够均匀涂布于基膜层上,进而使得到的离型膜在与接触的粘着带或者胶粘带分离时不产生粘连;同时添加有纳米二氧化钛及低表面张力助剂,纳米二氧化钛具有优异的光催化性能,能够分解附着在离型膜表面的油污,增强离型膜的耐污性能;此外还添加有导电聚合物,赋予离型膜优良的防静电性能,避免灰尘及污染物静电吸附在离型膜表面。
为达到上述目的,本发明的技术方案是:
一种耐污防静电离型膜,包括基膜层,所述基膜层上设置有离型层,所述离型层由离型剂涂覆而成,所述离型剂包含下述质量份数的各组分:乙烯基有机硅树脂:10-20份;聚对苯二甲酸乙二醇酯:15-30份;纳米二氧化硅:0.5-4份;纳米二氧化钛:2-6份;导电聚合物:3-8份;低表面张力助剂:0.1-0.6份;偶联剂:1-3.5份;消泡剂:0.5-1.5份;溶剂:18-40份。
进一步地,所述离型剂包含下述重量百分含量的各组分:乙烯基有机硅树脂:12-18份;聚对苯二甲酸乙二醇酯:20-30份;纳米二氧化硅:1.5-4份;纳米二氧化钛:3-5份;导电聚合物:5.5-8份;低表面张力助剂:0.2-0.5份;偶联剂:1-2份;消泡剂:0.8-1.2份;溶剂:18-30份。
进一步地,所述离型剂包含下述重量百分含量的各组分:乙烯基有机硅树脂:16份;聚对苯二甲酸乙二醇酯:22份;纳米二氧化硅:3.2份;纳米二氧化钛:4.8份;导电聚合物:6份;低表面张力助剂:0.4份;偶联剂:1.5份;消泡剂:1.1份;溶剂:27份。
再有,所述基膜层材料为PE、PET、TPX、PMMA、BOPP或PS中的任一种。
且有,所述纳米二氧化硅的粒径为40-200nm。
另,所述纳米二氧化钛的粒径为10-100nm。
同时,所述导电聚合物为聚乙炔、聚噻吩、聚吡咯、聚苯胺或聚苯撑中的任一种。
且,所述低表面张力助剂为聚硅氧烷聚醚共聚物;所述偶联剂为硅烷偶联剂;所述消泡剂为乙二醇二硬脂酸酯或聚氧丙烯聚氧乙烯甘油醚。
本发明的有益效果在于:
本发明提供的一种耐污防静电离型膜,各组分相互配合,使得得到的离型层能够均匀涂布于基膜层上,进而使得到的离型膜在与接触的粘着带或者胶粘带分离时不产生粘连;同时添加有纳米二氧化钛及低表面张力助剂,纳米二氧化钛具有优异的光催化性能,能够分解附着在离型膜表面的油污,增强离型膜的耐污性能;此外还添加有导电聚合物,赋予离型膜优良的防静电性能,避免灰尘及污染物静电吸附在离型膜表面。
具体实施方式
为了使本发明的目的、技术方案及优点更加清楚明白,以下结合实施例进一步详细说明。
实施例1
一种耐污防静电离型膜,包括基膜层,所述基膜层上设置有离型层,所述离型层由离型剂涂覆而成,所述离型剂包含下述质量份数的各组分:乙烯基有机硅树脂:10份;聚对苯二甲酸乙二醇酯:18份;纳米二氧化硅:1份;纳米二氧化钛:2份;导电聚合物:3份;低表面张力助剂:0.1份;偶联剂:1份;消泡剂:0.5份;溶剂:18份。
其中,所述基膜层材料为TPX,所述纳米二氧化硅的粒径为40nm,所述纳米二氧化钛的粒径为30nm,所述导电聚合物为聚吡咯,所述低表面张力助剂为聚硅氧烷聚醚共聚物;所述偶联剂为硅烷偶联剂;所述消泡剂为聚氧丙烯聚氧乙烯甘油醚。
实施例2
一种耐污防静电离型膜,包括基膜层,所述基膜层上设置有离型层,所述离型层由离型剂涂覆而成,所述离型剂包含下述质量份数的各组分:乙烯基有机硅树脂:12份;聚对苯二甲酸乙二醇酯:15份;纳米二氧化硅:0.5份;纳米二氧化钛:3份;导电聚合物:4份;低表面张力助剂:0.2份;偶联剂:1.5份;消泡剂:0.8份;溶剂:22份。
其中,所述基膜层材料为PMMA,所述纳米二氧化硅的粒径为40nm,所述纳米二氧化钛的粒径为10nm,所述导电聚合物为聚苯胺,所述低表面张力助剂为聚硅氧烷聚醚共聚物;所述偶联剂为硅烷偶联剂;所述消泡剂为乙二醇二硬脂酸酯。
实施例3
一种耐污防静电离型膜,包括基膜层,所述基膜层上设置有离型层,所述离型层由离型剂涂覆而成,所述离型剂包含下述质量份数的各组分:乙烯基有机硅树脂:16份;聚对苯二甲酸乙二醇酯:22份;纳米二氧化硅:3.2份;纳米二氧化钛:4.8份;导电聚合物:6份;低表面张力助剂:0.4份;偶联剂:1.5份;消泡剂:1.1份;溶剂:27份。
其中,所述基膜层材料为PE,所述纳米二氧化硅的粒径为100nm,所述纳米二氧化钛的粒径为50nm,所述导电聚合物为聚吡咯,所述低表面张力助剂为聚硅氧烷聚醚共聚物;所述偶联剂为硅烷偶联剂;所述消泡剂为聚氧丙烯聚氧乙烯甘油醚。
实施例4
一种耐污防静电离型膜,包括基膜层,所述基膜层上设置有离型层,所述离型层由离型剂涂覆而成,所述离型剂包含下述质量份数的各组分:乙烯基有机硅树脂:18份;聚对苯二甲酸乙二醇酯:26份;纳米二氧化硅:3.8份;纳米二氧化钛:5份;导电聚合物:8份;低表面张力助剂:0.6份;偶联剂:2份;消泡剂:1.5份;溶剂:33份。
其中,所述基膜层材料为BOPP,所述纳米二氧化硅的粒径为150nm,所述纳米二氧化钛的粒径为100nm,所述导电聚合物为聚苯胺,所述低表面张力助剂为聚硅氧烷聚醚共聚物;所述偶联剂为硅烷偶联剂;所述消泡剂为乙二醇二硬脂酸酯。
实施例5
一种耐污防静电离型膜,包括基膜层,所述基膜层上设置有离型层,所述离型层由离型剂涂覆而成,所述离型剂包含下述质量份数的各组分:乙烯基有机硅树脂:20份;聚对苯二甲酸乙二醇酯:30份;纳米二氧化硅:4份;纳米二氧化钛:6份;导电聚合物:5份;低表面张力助剂:0.4份;偶联剂:3.5份;消泡剂:1.2份;溶剂:40份。
其中,所述基膜层材料为PS,所述纳米二氧化硅的粒径为200nm,所述纳米二氧化钛的粒径为80nm,所述导电聚合物为聚噻吩,所述低表面张力助剂为聚硅氧烷聚醚共聚物;所述偶联剂为硅烷偶联剂;所述消泡剂为聚氧丙烯聚氧乙烯甘油醚。
为了对实施例1-5中一种耐污防静电离型膜的离型力进行测试,使用FINAT-10,在各实施例离型膜上附着宽50mm×长175mm的标准带(TESA7475-丙烯酰氯类)。接着,利用FINAT-10试验辊(2Kg载荷),以10mm/sec的速度往返两次把标准带压紧,用两块平整的金属板夹住离型膜,一边加上70g/cm2的压力,在大约25℃的温度下保持20h。之后,卸掉压力,4h后把离型膜固定到治具,将标准带从180°的方向按照300mm/min的速度剥离、测试,反复测试5次取平均值,结果见表1。
利用表面阻抗测试仪器对实施例1-5中一种耐污防静电离型膜的表面阻抗性能进行测试,测量标准方法为ASTM-D257,结果见表1。
表1实施例1-5中离型膜的性能测试结果
从上表可知,实施例1-5中耐污防静电离型膜的表面阻抗皆在105-109Ω范围内,表明该离型膜具备优良的抗静电能力;同时,各组分相互配合,使得得到的离型层能够均匀涂布于基膜层上,进而使得到的离型膜在与接触的粘着带或者胶粘带分离时不产生粘连;此外添加有纳米二氧化钛及低表面张力助剂,纳米二氧化钛具有优异的光催化性能,能够分解附着在离型膜表面的油污,增强离型膜的耐污性能。
需要说明的是,以上实施例仅用以说明本发明的技术方案而非限制。尽管参照较佳实施例对本发明进行了详细说明,本领域的普通技术人员应当理解,可以对发明的技术方案进行修改或者等同替换,而不脱离本发明技术方案的范围,其均应涵盖在本发明的权利要求范围中。
Claims (8)
1.一种耐污防静电离型膜,其特征在于,包括基膜层,所述基膜层上设置有离型层,所述离型层由离型剂涂覆而成,所述离型剂包含下述质量份数的各组分:乙烯基有机硅树脂:10-20份;聚对苯二甲酸乙二醇酯:15-30份;纳米二氧化硅:0.5-4份;纳米二氧化钛:2-6份;导电聚合物:3-8份;低表面张力助剂:0.1-0.6份;偶联剂:1-3.5份;消泡剂:0.5-1.5份;溶剂:18-40份。
2.根据权利要求1所述的一种耐污防静电离型膜,其特征在于,所述离型剂包含下述重量百分含量的各组分:乙烯基有机硅树脂:12-18份;聚对苯二甲酸乙二醇酯:20-30份;纳米二氧化硅:1.5-4份;纳米二氧化钛:3-5份;导电聚合物:5.5-8份;低表面张力助剂:0.2-0.5份;偶联剂:1-2份;消泡剂:0.8-1.2份;溶剂:18-30份。
3.根据权利要求1所述的一种耐污防静电离型膜,其特征在于,所述离型剂包含下述重量百分含量的各组分:乙烯基有机硅树脂:16份;聚对苯二甲酸乙二醇酯:22份;纳米二氧化硅:3.2份;纳米二氧化钛:4.8份;导电聚合物:6份;低表面张力助剂:0.4份;偶联剂:1.5份;消泡剂:1.1份;溶剂:27份。
4.根据权利要求1所述的一种耐污防静电离型膜,其特征在于,所述基膜层材料为PE、PET、TPX、PMMA、BOPP或PS中的任一种。
5.根据权利要求1所述的一种耐污防静电离型膜,其特征在于,所述纳米二氧化硅的粒径为40-200nm。
6.根据权利要求1所述的一种耐污防静电离型膜,其特征在于,所述纳米二氧化钛的粒径为10-100nm。
7.根据权利要求1所述的一种耐污防静电离型膜,其特征在于,所述导电聚合物为聚乙炔、聚噻吩、聚吡咯、聚苯胺或聚苯撑中的任一种。
8.根据权利要求1所述的一种耐污防静电离型膜,其特征在于,所述低表面张力助剂为聚硅氧烷聚醚共聚物;所述偶联剂为硅烷偶联剂;所述消泡剂为乙二醇二硬脂酸酯或聚氧丙烯聚氧乙烯甘油醚。
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