CN105714355B - 一种多孔阳极氧化铝膜的制备方法 - Google Patents
一种多孔阳极氧化铝膜的制备方法 Download PDFInfo
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- CN105714355B CN105714355B CN201610262276.6A CN201610262276A CN105714355B CN 105714355 B CN105714355 B CN 105714355B CN 201610262276 A CN201610262276 A CN 201610262276A CN 105714355 B CN105714355 B CN 105714355B
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- electrochemical polish
- fine aluminium
- pure aluminum
- alumina films
- anodic alumina
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- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 title claims abstract description 27
- 238000002360 preparation method Methods 0.000 title claims abstract description 13
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 50
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 50
- 239000004411 aluminium Substances 0.000 claims abstract description 34
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 claims abstract description 32
- 238000007254 oxidation reaction Methods 0.000 claims abstract description 20
- 230000003647 oxidation Effects 0.000 claims abstract description 17
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical class CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 claims abstract description 8
- 235000013772 propylene glycol Nutrition 0.000 claims abstract description 8
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 9
- 239000003792 electrolyte Substances 0.000 claims description 9
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 7
- 239000012530 fluid Substances 0.000 claims description 7
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 6
- 238000005406 washing Methods 0.000 claims description 6
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 4
- 229910017604 nitric acid Inorganic materials 0.000 claims description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 3
- 239000010439 graphite Substances 0.000 claims description 3
- 229910002804 graphite Inorganic materials 0.000 claims description 3
- 229910052697 platinum Inorganic materials 0.000 claims description 3
- 230000005611 electricity Effects 0.000 claims description 2
- 238000005498 polishing Methods 0.000 claims description 2
- 239000000126 substance Substances 0.000 claims description 2
- 239000007788 liquid Substances 0.000 claims 3
- 229910052799 carbon Inorganic materials 0.000 claims 1
- 238000004506 ultrasonic cleaning Methods 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 abstract description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 22
- 239000000243 solution Substances 0.000 description 16
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 11
- 229940117975 chromium trioxide Drugs 0.000 description 10
- WGLPBDUCMAPZCE-UHFFFAOYSA-N chromium trioxide Inorganic materials O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 10
- GAMDZJFZMJECOS-UHFFFAOYSA-N chromium(6+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Cr+6] GAMDZJFZMJECOS-UHFFFAOYSA-N 0.000 description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- 239000007864 aqueous solution Substances 0.000 description 6
- 238000009826 distribution Methods 0.000 description 6
- 239000011148 porous material Substances 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- 238000007743 anodising Methods 0.000 description 4
- 238000005868 electrolysis reaction Methods 0.000 description 4
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 230000002378 acidificating effect Effects 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 239000008367 deionised water Substances 0.000 description 3
- 229910021641 deionized water Inorganic materials 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910019142 PO4 Inorganic materials 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 238000010306 acid treatment Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 230000005518 electrochemistry Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 239000010452 phosphate Substances 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 2
- 235000011121 sodium hydroxide Nutrition 0.000 description 2
- 239000003513 alkali Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 238000000280 densification Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000008151 electrolyte solution Substances 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 235000011194 food seasoning agent Nutrition 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000002086 nanomaterial Substances 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000007781 pre-processing Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
- C25D11/06—Anodisation of aluminium or alloys based thereon characterised by the electrolytes used
- C25D11/08—Anodisation of aluminium or alloys based thereon characterised by the electrolytes used containing inorganic acids
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
- C25D11/16—Pretreatment, e.g. desmutting
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/16—Polishing
- C25F3/18—Polishing of light metals
- C25F3/20—Polishing of light metals of aluminium
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
Abstract
Description
实施例1 | 实施例2 | 实施例3 | 实施例4 | |
电化学抛光溶液 | 1,2-丙二醇∶高氯酸4∶1 | 1,2-丙二醇∶高氯酸5∶1 | 1,2-丙二醇∶高氯酸6∶1 | 1,2-丙二醇∶高氯酸2∶1 |
阴阳极间距 | 60mm | 60mm | 60mm | 70mm |
电流密度 | 120mA/cm2 | 150mA/cm2 | 100mA/cm2 | 160mA/cm2 |
电化学抛光温度 | 10℃ | 5℃ | 0℃ | 30℃ |
电化学抛光时间 | 60s | 50s | 40s | 90s |
处理液 | 每升含20g三氧化铬和30mL磷酸 | 每升含15g三氧化铬和25mL磷酸 | 每升含25g三氧化铬和35mL磷酸 | 每升含10g三氧化铬和30mL磷酸 |
处理温度 | 60℃ | 60℃ | 70℃ | 80℃ |
处理时间 | 3h | 2h | 5h | 4h |
电解液 | 0.4mol/L | 0.3mol/L | 0.6mol/L | 0.4mol/L |
阳极氧化电压 | 110V | 90V | 80V | 100V |
阳极氧化温度 | 5℃ | 10℃ | 10℃ | 5℃ |
实施例5 | 实施例6 | 实施例7 | 实施例8 | |
电化学抛光溶液 | 无水乙醇∶高氯酸4∶1 | 无水乙醇∶高氯酸5∶1 | 无水乙醇∶高氯酸6∶1 | 无水乙醇∶高氯酸10∶1 |
电化学抛光电压 | 20V | 20V | 25V | 25V |
电化学抛光时间 | 30s | 20s | 10s | 30s |
处理液 | 每升含20g三氧化铬和30mL磷酸 | 每升含15g三氧化铬和25mL磷酸 | 每升含25g三氧化铬和35mL磷酸 | 每升含10g三氧化铬和30mL磷酸 |
处理温度 | 60℃ | 60℃ | 70℃ | 80℃ |
处理时间 | 3h | 2h | 5h | 4h |
电解液 | 0.4mol/L | 0.2mol/L | 0.3mol/L | 0.5mol/L |
阳极氧化电压 | 110V | 90V | 80V | 100V |
阳极氧化温度 | 5℃ | 10℃ | 10℃ | 5℃ |
Claims (1)
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CN201610262276.6A CN105714355B (zh) | 2013-05-17 | 2013-05-17 | 一种多孔阳极氧化铝膜的制备方法 |
CN201310188114.9A CN103225096B (zh) | 2013-05-17 | 2013-05-17 | 多孔阳极氧化铝膜的制备方法 |
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CN201310188114.9A Division CN103225096B (zh) | 2013-05-17 | 2013-05-17 | 多孔阳极氧化铝膜的制备方法 |
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CN105714355A CN105714355A (zh) | 2016-06-29 |
CN105714355B true CN105714355B (zh) | 2017-09-29 |
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CN108360036A (zh) * | 2018-03-07 | 2018-08-03 | 大连理工大学 | 一种高纯铝表面获得规则三维微纳米结构的方法 |
CN108277519A (zh) * | 2018-03-16 | 2018-07-13 | 华南理工大学 | 一种多孔阳极氧化铝膜的制备方法 |
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CN1880516B (zh) * | 2006-04-30 | 2010-06-23 | 浙江工业大学 | 一种用于制备纳米材料的模板及其制备和应用 |
CN101603192A (zh) * | 2009-07-14 | 2009-12-16 | 桂林理工大学 | 一种利用工业纯铝制备多孔阳极氧化铝膜的方法 |
CN101624717A (zh) * | 2009-07-28 | 2010-01-13 | 同济大学 | 制备有序多孔氧化铝模板的方法及装置 |
CN102162115B (zh) * | 2011-01-20 | 2012-05-02 | 浙江大学 | 基于多孔氧化铝和单原子沉积技术的颜色调控方法 |
CN102776542A (zh) * | 2012-07-25 | 2012-11-14 | 华南理工大学 | 一种通孔阳极氧化铝膜的制备方法 |
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