CN105676538A

CN105676538A - Photo-alignment apparatus and photo-alignment method

Info

Publication number: CN105676538A
Application number: CN201510886104.1A
Authority: CN
Inventors: 石井正; 石井一正
Original assignee: Ushio Denki KK
Current assignee: Ushio Denki KK
Priority date: 2014-12-06
Filing date: 2015-12-04
Publication date: 2016-06-15
Anticipated expiration: 2035-12-04
Also published as: KR20160068651A; JP2016109879A; TWI588576B; KR101768777B1; JP5773053B1; CN105676538B; CN105068322A; TW201629599A

Abstract

An optical orientation device and an optical orientation method are provided. In the field of optical orientation, production rate and quality are to be improved. Two workbenches (21, 22) are provided with a baseplate (S). By use of a workbench moving mechanism (3), the two workbenches (21, 22) are alternately reciprocated to go through an irradiated area (R) irradiated by polarized light sent from an irradiation unit (1).A control unit (4) is used for controlling the workbench moving mechanism (3) and keeps a low speed or a constant setting passing through speed when the workbenches (21, 22) pass through the irradiated area (R).The first workbench (21) moves between the first baseplate carrying and recovering position and the irradiated area (R)at a high speed or a setting carrying speed; The second workbench (22) moves between the second baseplate carrying and recovering position and the irradiated area (R) at a high speed or a setting carrying speed.

Description

Light aligning device and process for optical alignment

Technical field

The application's invention relates to the technology that known light is orientated as obtaining the method for alignment films.

Background technology

In recent years, mend in the alignment films, the angle of visual field that obtain with the liquid crystal display cells headed by liquid crystal panelWhile repaying the oriented layer of film, adopt the technology that is called as light orientation being orientated by irradiation.Below, the film, the layer that produce orientation by irradiation are referred to as to optical alignment film. In addition, " orientation " isRefer to and give directionality to a certain character of object to " orientation process ".

Light orientation is irradiated polarised light by the film (hereinafter referred to as membrane material) that optical alignment film is used and is carried out.Membrane material is for example the such resin of polyimides, in desirable direction (direction that should be orientated)The polarizing light irradiation of polarization is to membrane material. The irradiation of the polarised light by provision wavelengths, membrane material pointSon structure (for example side chain) is formed as the state consistent with polarization direction of light, obtains optical alignment film.

Optical alignment film with its maximize together with the maximization of the liquid crystal panel that used. And, forProduce multiple liquid crystal display cells from a crystal liquid substrate, large-scale as the crystal liquid substrate of handling object thingChange, follow in this, need to carry out light orientation process for large subject area. Due to such situation,The width wide cut of the irradiation area of the polarised light requiring in light orientation and reach 1500mm and evenMore than 1500mm. As the light orientation dress that irradiates polarised light in the wide irradiation area of such widthPut, for example, have the disclosed device of patent documentation 1. This device possesses: length and irradiation areaThe bar-shaped light source that width is suitable, and make the wire grid polarization element from the light polarization of this light source, rightIrradiate polarised light along the membrane material being handled upside down with the orthogonal direction of the long side direction of light source.

Patent documentation 1: No. 5344105 communique of Japanese Patent

In such light aligning device, as workpiece, exist for membrane material connected strip continuouslyThe situation of workpiece, and workpiece is the situation that membrane material has been arranged at the substrate with membrane material on substrate.

Wherein, following technology being disclosed: will be provided with the liquid crystal display of membrane material in patent documentation 1The substrate that element is used as work piece configuration in workbench, thereby make movable workbench substrate pass through irradiated regionTerritory, carries out light orientation thus. The device of the document uses two workbench, and it is alternately passed throughIrradiation area also carries out polarizing light irradiation, therefore, can realize the shortening based on producing interval timeHigh production rate.

Summary of the invention

The application's invention problem to be solved is, is considering to realize in the lump above-mentioned patent documentation 1Disclosed based on producing on the basis of the high production rate operation shortening interval time, further improve rawProductive rate, or further improve the quality of light orientation process.

In order to solve above-mentioned problem, the invention that the application's technical scheme 1 is recorded has following structure:

Possess: illumination unit, is radiated at the polarization of the direction polarization of regulation to the irradiation area settingLight;

Workbench, mounting substrate; And

Movable workbench mechanism, by making workbench make partially to move by the mode of irradiation areaShake irradiation to the substrate on workbench,

Be provided with the first workbench, these two workbench of the second workbench as workbench,

Movable workbench mechanism makes the first workbench take from the first substrate of the side that is set in irradiation areaCarry position and move to irradiation area, and make second workbench from being set in the opposite side of irradiation areaSecond substrate loading position moves to irradiation area,

The substrate of movable workbench mechanism on the first workbench makes the first workbench after by irradiation areaReturn to and be located at first substrate towards a side and reclaim position, and substrate on the second workbench is logicalCross and make after irradiation area the second workbench return and be located at second substrate and reclaim position towards opposite side,

In the first workbench and the irradiation that are positioned at first substrate loading position or first substrate recovery positionBetween region, guarantee that the substrate on the second workbench keeps out of the way sky by more than the amount of irradiation area firstBetween, in the second workbench and the irradiation that are positioned at second substrate loading position or second substrate recovery positionBetween region, guarantee that the substrate on the first workbench keeps out of the way sky by more than the amount of irradiation area secondBetween,

Be provided with the control module of controlling movable workbench mechanism,

In control module, the Speed Setting as substrate during by irradiation area has setting Negotiation speed,

Control module for the first workbench the movement from first substrate loading position to irradiation area andFrom irradiation area to first substrate, reclaim moving forward into of position and exercise this speed moving than setting by speedSpend fast control, and the movement from second substrate loading position to irradiation area for the second workbenchAnd this speed moving of enforcement that moves forward into that reclaims position from irradiation area to second substrate is led to than settingCross fireballing control,

The first workbench, the second workbench carry out vacuum suction and keep substrate substrate when mobile,

Control module is the movement from first substrate loading position to irradiation area and at the first workbenchThe movement of two workbench from second substrate loading position to irradiation area, make mobile speed for everyControl below the above 600mm of 300mm second.

And in order to solve above-mentioned problem, the invention that technical scheme 2 is recorded has following structure:

In the structure of technique scheme 1, above-mentioned setting Negotiation speed is set to constant speed,

Above-mentioned control module carries out following control: from above-mentioned first substrate loading position to above-mentioned photographDuring move in the outlet of penetrating region, the moving direction front edge of the substrate on above-mentioned the first workbench arrivesBefore reaching above-mentioned irradiation area, make the speed of above-mentioned the first workbench be decelerated to above-mentioned setting Negotiation speed,Arrive at the moving direction front edge from this substrate that above-mentioned irradiation area starts until moving direction rearEdge by above-mentioned irradiation area till during maintain above-mentioned setting Negotiation speed, moving of this substrateMoving direction rearward edges is slowed down to return towards an above-mentioned side after by above-mentioned irradiation area,

Above-mentioned control module carries out following control: from above-mentioned second substrate loading position to above-mentioned photographDuring move in the outlet of penetrating region, the moving direction front edge of the substrate on above-mentioned the second workbench arrivesBefore reaching above-mentioned irradiation area, make the speed of above-mentioned the second workbench be decelerated to above-mentioned setting Negotiation speed,Arrive at the moving direction front edge from this substrate that above-mentioned irradiation area starts until moving direction rearEdge by above-mentioned irradiation area till during maintain above-mentioned setting Negotiation speed, moving of this substrateMoving direction rearward edges is slowed down to return towards above-mentioned opposite side after by above-mentioned irradiation area.

And in order to solve above-mentioned problem, the invention that technical scheme 3 is recorded has following structure:

In the structure of technical scheme 2, above-mentioned illumination unit is in above-mentioned the first workbench, the second workThe both sides that platform carries out outlet when while moving and return road moves are irradiated polarization to the substrate on above-mentioned each workbenchLight,

In above-mentioned control module, above-mentioned the first workbench carries out the setting Negotiation speed of outlet while movingCarry out the setting Negotiation speed of return road while moving with above-mentioned the first workbench and be set to identical speed,Above-mentioned the second workbench carries out setting Negotiation speed and above-mentioned second workbench of outlet while moving and returnsSetting Negotiation speed when move on road is set to identical speed.

And in order to solve above-mentioned problem, the invention that technical scheme 4 is recorded has following structure:

In the structure of technique scheme 3, in above-mentioned control module,

The speed of above-mentioned the first workbench from above-mentioned first substrate loading position to the movement of above-mentioned irradiation areaThe speed of degree and the movement from above-mentioned irradiation area to above-mentioned first substrate recovery position, is set to phaseSame speed,

The speed of above-mentioned the second workbench from above-mentioned second substrate loading position to the movement of above-mentioned irradiation areaThe speed of degree and the movement from above-mentioned irradiation area to above-mentioned second substrate recovery position, is set to phaseSame speed,

Passing through towards above-mentioned setting above-mentioned the first workbench moves the above-mentioned irradiation area of middle arrival during in outletOn the deceleration towards above-mentioned setting Negotiation speed of speed and above-mentioned the first workbench pass through in move in return roadThe acceleration from above-mentioned setting Negotiation speed of stating after irradiation area is set to identical gradient,

Passing through towards above-mentioned setting above-mentioned the second workbench moves the above-mentioned irradiation area of middle arrival during in outletOn the deceleration towards above-mentioned setting Negotiation speed of speed and above-mentioned the second workbench pass through in move in return roadThe acceleration from above-mentioned setting Negotiation speed of stating after irradiation area is set to identical gradient.

And in order to solve above-mentioned problem, the invention that technical scheme 5 is recorded has following structure:

In the structure of technique scheme 4, in above-mentioned control module,

Passing through towards above-mentioned setting above-mentioned the first workbench moves the above-mentioned irradiation area of middle arrival during in outletThe deceleration of speed and above-mentioned the first workbench in move in return road by after above-mentioned irradiation area from above-mentionedThe acceleration of setting Negotiation speed is set to identical gradient,

Passing through towards above-mentioned setting above-mentioned the second workbench moves the above-mentioned irradiation area of middle arrival during in outletThe deceleration of speed and above-mentioned the second workbench in move in return road by after above-mentioned irradiation area from above-mentionedThe acceleration of setting Negotiation speed is set to identical gradient.

And in order to solve above-mentioned problem, the invention that technical scheme 6 is recorded has following structure:

Workbench, mounting substrate; And

Movable workbench mechanism, by making workbench to be moved and to be made polarization by the mode of irradiation areaIrradiation is to the substrate on workbench,

Be provided with the control module of controlling movable workbench mechanism,

In control module, the speed as substrate during by irradiation area is set with to be set by speedDegree,

Set Negotiation speed and be set to constant speed,

Control module carries out following control: in the outlet from first substrate loading position to irradiation areaIn movement, the moving direction front edge of the substrate on the first workbench makes before arriving irradiation areaThe speed of the first workbench is decelerated to setting Negotiation speed, at the moving direction front edge from this substrateArrive that irradiation area starts until moving direction rearward edges maintains during by irradiation area establishesDetermine Negotiation speed, after the moving direction rearward edges of this substrate is by irradiation area, slow down so thatReturn towards an above-mentioned side,

Control module carries out following control: in the outlet from second substrate loading position to irradiation areaIn movement, the moving direction front edge of the substrate on the second workbench makes before arriving irradiation areaThe speed of the second workbench is decelerated to above-mentioned setting Negotiation speed, in the moving direction front from this substrateEdge arrival irradiation area starts until moving direction rearward edges is passed through to tie up during irradiation areaHold setting Negotiation speed, after the moving direction rearward edges of this substrate is by irradiation area, slow downTo return towards above-mentioned opposite side,

Illumination unit is in above-mentioned the first workbench, above-mentioned the second workbench while moving and the return road of carrying out outletBoth sides when mobile are irradiated polarised light to the substrate on each workbench,

In first keeps out of the way space, be set with First Speed buffer path, and first keeps out of the way space and comprisesFirst avoids collision with space, and the first length of keeping out of the way on the moving direction in space is on the second workbenchThe moving direction of substrate on length add that the length and first of First Speed buffer path avoids touchingHit by the length more than length behind space,

In second keeps out of the way space, be set with second speed buffer path, and second keeps out of the way space and comprisesSecond avoids collision with space, and the above-mentioned second length of keeping out of the way on the moving direction in space is above-mentioned firstLength on the moving direction of the substrate on workbench adds the length and of second speed buffer pathTwo avoid collision the length more than length behind space,

Control module carries out following control: making the first workbench carry out outlet while moving, firstThe moving direction rearward edges of the substrate on workbench is by after irradiation area, on second speed buffering roadIn footpath, make the first workbench slow down from setting Negotiation speed, and, the first workbench is being set inAfter the first backward position reversion of opposite side, carry out return road while moving, in second speed buffer pathThe first workbench is accelerated and the moving direction front edge of substrate on the first workbench arrives and irradiatesMake the first workbench arrive to set Negotiation speed before region, and on the limit, moving direction rear of this substrateEdge maintains setting Negotiation speed before by irradiation area,

Control module carries out following control: making the second workbench carry out outlet while moving, secondThe moving direction rearward edges of the substrate on workbench is by after irradiation area, on First Speed buffering roadIn footpath, make the second workbench slow down from setting Negotiation speed, and, the second workbench is being set inAfter the second backward position reversion of one side, carry out return road while moving, in First Speed buffer path, makeThe second workbench accelerates and the moving direction front edge of substrate on the second workbench arrives irradiated regionMake the second workbench arrive to set Negotiation speed before territory, and in the moving direction rearward edges of this substrateBy maintaining setting Negotiation speed before irradiation area,

First to avoid collision be the space of setting as follows with space: arrival the second backward positionThe second workbench not can with reclaim at first substrate loading position or first substrate the first work that position stopsDo platform collision,

Second to avoid collision be the space of setting as follows with space: arrival the first backward positionThe first workbench not can with reclaim at second substrate loading position or second substrate the second work that position stopsDo platform collision.

And in order to solve above-mentioned problem, the invention that technical scheme 7 is recorded has following structure:

Possess: irradiation process, is radiated at the polarization of the direction polarization of regulation to the irradiation area settingLight;

Carry operation, on the first workbench, these two workbench of the second workbench, load respectively substrate;

Mobile process, to make each workbench alternately utilize movable workbench by the mode of irradiation areaMechanism makes each movable workbench, makes thus polarizing light irradiation to the substrate on each workbench; And

Recovery process, will be removed from each workbench by the each substrate after polarizing light irradiation,

In mobile process, the first workbench from be set in irradiation area a side first substrate carryPosition moves to irradiation area, and the second workbench is from being set in the second substrate of opposite side of irradiation areaLoading position moves to irradiation area,

In mobile process, the substrate on the first workbench is by the first workbench court after irradiation areaOne side is returned and is positioned at first substrate recovery position, and the substrate on the second workbench passes through irradiation areaRear the second workbench towards opposite side return and be positioned at second substrate reclaim position,

Speed Setting as substrate during by irradiation area has setting Negotiation speed,

In mobile process, the moving from first substrate loading position to irradiation area for the first workbenchMove and reclaim moving forward into of position and exercise velocity ratio setting that this moves from irradiation area to first substrateThe control that Negotiation speed is fast, and for the second workbench from second substrate loading position to irradiation areaMovement and from irradiation area to second substrate reclaim position move forward into exercise this velocity ratio movingSet the fast control of Negotiation speed,

Mobile process is that the first workbench, the second workbench are carrying out vacuum suction and keeping base substrateThe operation moving under the state of plate, the first workbench is from first substrate loading position to irradiation areaTranslational speed and the translational speed of the second workbench from second substrate loading position to irradiation area be everyBelow the above 600mm of 300mm second.

And in order to solve above-mentioned problem, the invention that technical scheme 8 is recorded has following structure:

In the structure of technique scheme 7, above-mentioned setting Negotiation speed is set to constant speed,

The control of carrying out in above-mentioned mobile process is following control: carrying from above-mentioned first substrateDuring move to the outlet of above-mentioned first workbench of above-mentioned irradiation area position, at above-mentioned the first workbenchOn the moving direction front edge of substrate arrive the speed that makes above-mentioned the first workbench before irradiation areaBe decelerated to above-mentioned setting Negotiation speed, arrive above-mentioned irradiation at the moving direction front edge from this substrateRegion starts until moving direction rearward edges remains above-mentioned during by above-mentioned irradiation area establishesDetermine Negotiation speed, after the moving direction rearward edges of this substrate is by above-mentioned irradiation area, carry out forThe deceleration of returning towards an above-mentioned side,

The control of carrying out in above-mentioned mobile process is following control: carrying from above-mentioned second substrateDuring move to the outlet of above-mentioned second workbench of above-mentioned irradiation area position, at above-mentioned the second workbenchOn the moving direction front edge of substrate make above-mentioned the second work during arriving before above-mentioned irradiation areaThe speed of making platform is decelerated to above-mentioned setting Negotiation speed, the moving direction front edge from this substrate toReach that above-mentioned irradiation area starts until moving direction rearward edges by during above-mentioned irradiation areaMaintain above-mentioned setting Negotiation speed, pass through above-mentioned irradiation area in the moving direction rearward edges of this substrateAfter carry out the deceleration for returning towards above-mentioned opposite side.

And in order to solve above-mentioned problem, the invention that technical scheme 9 is recorded has following structure:

In the structure of technique scheme 8, above-mentioned mobile process is at above-mentioned the first workbench,Two workbench carry out outlet while moving and carry out return road irradiating polarization towards the substrate on each workbench while movingThe operation of light,

In above-mentioned mobile process, above-mentioned the first workbench carries out the setting Negotiation speed of outlet while movingCarrying out the setting Negotiation speed of return road while moving with above-mentioned the first workbench is identical speed, above-mentionedTwo workbench carry out the setting Negotiation speed of outlet while moving and above-mentioned the second workbench and carry out return road and moveTime setting Negotiation speed be identical speed.

And in order to solve above-mentioned problem, the invention that technical scheme 10 is recorded has following structure:

In the structure of technique scheme 9, above-mentioned mobile process is following operation: above-mentioned firstWorkbench reverses at the first backward position in order to return towards a side after by above-mentioned irradiation area, onState the second workbench after by above-mentioned irradiation area in order to return towards opposite side at the second backward positionReversion,

Deceleration when above-mentioned the first workbench arrives the first backward position after by above-mentioned irradiation area andAcceleration when above-mentioned the first workbench arrives above-mentioned irradiation area in the first backward position reversion is identicalGradient,

Deceleration when above-mentioned the second workbench arrives the second backward position after by above-mentioned irradiation area andAcceleration when above-mentioned the second workbench arrives above-mentioned irradiation area in the second backward position reversion is identicalGradient.

And in order to solve above-mentioned problem, the invention that technical scheme 11 is recorded has following structure:

In the structure of technique scheme 10, in above-mentioned mobile process,

The translational speed of above-mentioned the first workbench from above-mentioned first substrate loading position to above-mentioned irradiation areaThe translational speed that reclaims position from above-mentioned irradiation area to above-mentioned first substrate with above-mentioned the first workbench isIdentical speed,

The translational speed of above-mentioned the second workbench from above-mentioned second substrate loading position to above-mentioned irradiation areaThe translational speed that reclaims position from above-mentioned irradiation area to above-mentioned second substrate with above-mentioned the second workbench isIdentical speed,

Passing through towards above-mentioned setting above-mentioned the first workbench moves the above-mentioned irradiation area of middle arrival during in outletThe deceleration of speed and above-mentioned the first workbench in move in return road by after above-mentioned irradiation area from above-mentionedThe acceleration of setting Negotiation speed is identical gradient,

Passing through towards above-mentioned setting above-mentioned the second workbench moves the above-mentioned irradiation area of middle arrival during in outletThe deceleration of speed and above-mentioned the second workbench in move in return road by after above-mentioned irradiation area from above-mentionedThe acceleration of setting Negotiation speed is identical gradient.

And in order to solve above-mentioned problem, the invention that technical scheme 12 is recorded has following structure:

Set Negotiation speed and be set to constant speed,

The control of carrying out in mobile process is following control: from first substrate loading position to photographDuring move in the outlet of penetrating first workbench in region, before the moving direction of the substrate on the first workbenchMethod, edge arrives before irradiation area and makes the speed of the first workbench be decelerated to setting Negotiation speed, fromThe moving direction front edge of this substrate arrives irradiation area to start until moving direction rearward edges is passed throughDuring till irradiation area, maintain setting Negotiation speed, logical in the moving direction rearward edges of this substrateAfter crossing irradiation area, carry out the deceleration for returning towards a side,

The control of carrying out in mobile process is following control: from second substrate loading position to photographDuring move in the outlet of penetrating second workbench in region, before the moving direction of the substrate on the second workbenchDuring before method, edge arrival irradiation area, make the speed of the second workbench be decelerated to setting by speedDegree, arrives irradiation area at the moving direction front edge from this substrate and starts until moving direction rearEdge by irradiation area till during maintain setting Negotiation speed, after the moving direction of this substrateMethod, edge carries out the deceleration for returning towards opposite side after by irradiation area,

When mobile process moves for carry out outlet at the first workbench, the second workbench and when return road is movedSubstrate on each workbench is irradiated to the operation of polarised light,

In second keeps out of the way space, be set with second speed buffer path, and second keeps out of the way space and comprisesSecond avoids collision with space, and the second length of keeping out of the way on the moving direction in space is on the first workbenchThe moving direction of substrate on length add that the length and second of second speed buffer path avoids touchingHit by the length more than length behind space,

The control of carrying out in mobile process is following control: move making the first workbench carry out outletWhen moving, the moving direction rearward edges of the substrate on the first workbench is by after irradiation area, theIn two speed buffer paths, make the first workbench slow down from setting Negotiation speed, and, make the first workMake platform after the first backward position reversion that is set in opposite side, in second speed buffer path, make theOne workbench accelerates and the moving direction front edge of substrate on the first workbench arrives irradiation areaMake the first workbench arrive before and set Negotiation speed, and logical in the moving direction rearward edges of this substrateBefore crossing irradiation area, maintain setting Negotiation speed,

The control of carrying out in mobile process is following control: move making the second workbench carry out outletWhen moving, the moving direction rearward edges of the substrate on the second workbench is by after irradiation area, theIn one speed-buffering path, make the second workbench slow down from setting Negotiation speed, and, make the second workMake platform after the second backward position reversion that is set in a side, in First Speed buffer path, make above-mentionedThe second workbench accelerates and the moving direction front edge of substrate on the second workbench arrives irradiated regionMake the second workbench arrive to set Negotiation speed before territory, and in the moving direction rearward edges of this substrateBy maintaining setting Negotiation speed before above-mentioned irradiation area,

Invention effect

As described below, the invention of recording according to the application's technical scheme 1 or 7,For each workbench, due to carry out from substrate loading position to photograph than setting Negotiation speed fast speedPenetrate the movement in region and from irradiation area to substrate, reclaim the movement of position, therefore can realize productionThe light orientation procedure that interval time is shorter and productivity ratio is higher.

And, the invention of recording according to technical scheme 2 or 8, except above-mentioned effect, byThe speed of each point in the surf zone of substrate during by irradiation area remains constant all the time, therefore canEnough in being easy to control the inner evenness that improves light orientation process.

And the invention of recording according to technical scheme 3,4,5,9,10 or 11, except upperState outside effect, also carry out polarizing light irradiation in return road, therefore, can boost productivity by this point.

Brief description of the drawings

Fig. 1 is the three-dimensional skeleton diagram of the related light aligning device of the first embodiment.

Fig. 2 is that the master of the light aligning device shown in Fig. 1 looks skeleton diagram.

Fig. 3 illustrates between the position of the workbench in the device of the first embodiment and translational speedThe skeleton diagram of relation, illustrates the situation of going to irradiation area from substrate lift-launch recovery position.

Fig. 4 illustrates between the position of the workbench in the device of the first embodiment and translational speedThe skeleton diagram of relation, illustrates that returning to substrate from irradiation area carries the situation that reclaims position.

Fig. 5 is the translational speed in space and this space illustrating between irradiation area and backward positionThe skeleton diagram of control, illustrate from irradiation area and go to the speed control the situation of backward position.

Fig. 6 is the translational speed in space and this space illustrating between irradiation area and backward positionThe skeleton diagram of control, illustrate from backward position and go to the speed control the situation of irradiation area.

Fig. 7 is the skeleton diagram that the sequential control of the translational speed of the each workbench in control module is shown.

Fig. 8 is the stereogram that the summary of base plate alignment device 6 is shown.

Fig. 9 is the skeleton diagram that the action of the light aligning device of the first embodiment is shown.

Figure 10 is the skeleton diagram that the action of the light aligning device of the first embodiment is shown.

Figure 11 illustrates that productivity ratio is further carried than setting Negotiation speed is high by making to set transporting velocityThe figure of high point.

Figure 12 is the major part that light aligning device that the second embodiment is related and method are shownSkeleton diagram.

Label declaration

1: illumination unit

11: light source

14: polarizer

21: the first workbench

22: the second workbench

3: movable workbench mechanism

31: Linear guide

32: linear motor workbench

33: platen

4: control module

6: base plate alignment device

S: substrate

R: irradiation area

Detailed description of the invention

Next, the mode for implementing the present application (hereinafter referred to as embodiment) is saidBright.

Fig. 1 is the three-dimensional skeleton diagram of the related light aligning device of the first embodiment. Shown in Fig. 1Light aligning device possesses: the illumination unit 1 that irradiates polarised light towards the irradiation area R setting; For baseThe workbench 21,22 of plate S mounting; And by workbench 21,22 is moved at irradiation area RAnd make the movable workbench mechanism 3 of polarizing light irradiation to the crystal liquid substrate S on workbench 21,22.

Illumination unit 1 is with the patterned illumination polarised light of essentially rectangular, and the region of this pattern is irradiation areaR. Irradiation area R is set to the region in horizontal plane.

Movable workbench mechanism 3 is to make workbench 21,22 by the mode of above-mentioned irradiation area RMobile mechanism. In this embodiment, workbench 21,22 is with horizontal attitude configuration, moving directionFor horizontal direction.

Fig. 2 is that the master of the light aligning device shown in Fig. 1 looks skeleton diagram. As shown in Figure 2, illumination unit 1By light source 11, be arranged on speculum 12 behind of light source 11, light source 11 or speculum 12 receivedIn formations such as inner lampshade 13, polarizers 14.

Light source 11 uses bar-shaped lamp. In the present embodiment, because the light that utilizes ultraviolet range entersRow light orientation, is therefore used high-pressure mercury-vapor lamp or in mercury, has added the metal halide of other metalsLamp etc. Wavelength region is for example 200～400nm left and right. Also can be by radiating ultraviolet rangeThe LED of light of necessary wavelength arrange multiple and obtain long irradiation pattern.

In addition be the liquid that is formed with membrane material on surface in this embodiment as the substrate S of workpiece,Brilliant substrate. As membrane material, be known to the membrane material that is orientated with the photoinduction of wavelength 254nm, withThe photoinduction of wavelength 313nm and the membrane material that is orientated, the film being orientated with the photoinduction of wavelength 365nmMaterial etc. According to the wavelength using in light orientation, suitably selected light 11. Also exist at light source11 and substrate S between configure wave filter, the situation selecting wavelength and process suitably.

Speculum 12 is the parts for carrying out efficiently polarizing light irradiation, and Usage profile is formed as ellipseOr the eaves gutter shape speculum of the shape of a parabolical part. By the pair of right and left speculum of strip12 configure in the mode that is formed with slit, thereby form the roughly speculum of eaves gutter shape. In addition light source,11 and speculum 12 with along the horizontal direction vertical with the moving direction of workbench 21,22 (following,Be called width) extend mode configure. Therefore, irradiation area R is grow at width largeCause rectangular region.

Polarizer 14 is to be orientated needed polarization for the light radiating from light source 11 is formed as to lightThe parts of light. As polarizer 14, can use on transparency carrier and arrange and be situated between by the electricity of striatedThe fine grid that matter, conductor or semiconductor form and grid polarizer. Lampshade 13 has lightIrradiate mouth, polarizer 14 is configured in the position between light source 11 and illumination loophole.

Polarizer 14 is to make the direction of polarizing axis of emitted polarised light with at irradiation area RThe moving direction (being actually the direction of Linear guide 31) of the substrate S passing through becomes for benchmarkThe mode of the direction of regulation configures. This is nothing but the polarization in order to pass through substrate S to irradiate prescribed directionLight and regulation direction carry out light orientation.

In addition, in a most situation of polarizer 14, be the small components of rectangle, conventionally adopt polarizationElement 14 is arranged structures multiple and that irradiation area R is irradiated to polarised light at the long side direction of light source 11.In this case, each polarizer 14 is to become regulation with respect to the moving direction of workbench 21,22The mode of direction configure.

And also there is the unit (polarizer adopting as different from lampshade 13 in polarizer 14Unit) and be installed on the situation of the structure of lampshade 13.

As shown in Figure 1, the device of this embodiment in a mobile route, possess two workbench 21,22. Because mobile route is one, therefore a side workbench cannot surmount the opposing party's workbench,Both sides' workbench can not interlock. Below, two workbench 21,22 are made as the first workbench 21,The second workbench 22. In Fig. 2 by the movable workbench mechanism shown in Fig. 13 and its control system in the lumpIllustrate.

Movable workbench mechanism 3 can adopt various mechanisms, can employing same with patent documentation 1 byThe mechanism that ball-screw and Linear guide form, but in this embodiment, adopt by linear guideThe mechanism that part 31 and linear motor workbench 32 form. There are all kinds in linear motor workbench,But in embodiment, adopt the linear motor workbench of grader (sorter) type. For this linearityMotor operations platform, as the structure of driving side, is called as the basal disc 33 of platen to prolong along moving directionThe state setting of stretching. Although omit diagram in detail, platen 33 is formed as the table at flat partsFace is provided with for example, ferromagnetism body by little bulk (rectangular-shaped) to be the latticed mode of chessboardThe structure of the salient pole forming. Be workbench 21,22 with respect to platen 33 with by gas by driving sideThe state configuration that float in gap slightly, and be provided with the linear motor work that comprises electromagnet at lower surfacePlatform 32. Magnetic pole is switched in control by electromagnet, and thus, workbench 21,22 is on platen 33Float and move with arbitrary speed along the direction of Linear guide 31. In addition, as shown in Figure 1, respectivelyThe both sides of the lower surface of workbench 21,22 are fixed with sliding part 211,221, this sliding part 211,221With Linear guide 31 chimeric and on Linear guide 31 slide.

In addition, also can adopt the linear motor workbench as Types Below: in magnetic orbital (different magnetic polesThe track alternately existing along moving direction) upper configuration effort platform, and electromagnet is set at its lower surface andDrive, make thus workbench move along magnetic orbital.

In addition, each workbench 21,22 possesses substrate S is carried out to the not shown of vacuum suction at upper surfaceVacuum adsorption mechanism. Vacuum adsorption mechanism is the many of upper surface from being formed at each workbench 21,22Individual adsorption hole attracts (formation negative pressure) thereby substrate S is kept in order to avoid its mechanism moving.

As shown in Figure 2, the light aligning device of embodiment possesses the control of controlling installing entiretyUnit 4. Control module 4 has: storage is controlled the action of movable workbench mechanism 3 each several parts such as gradeStorage part 41, the arithmetic processing section 42 of execution sequence program etc. of the sequential programme of system. Single from controllingUnit's control signal of 4 is carried by the each several part of device of the drive division towards comprising movable workbench mechanism 3.

For the device of embodiment, utilize movable workbench mechanism 3 make first, second workbench 21,22 move, and make it alternately by irradiation area R, thus to the substrate S on each workbench 21,22Alternately irradiate polarised light. Thus, can realize based on producing the high production rate work that shorten interval timeOrder. Now, compared with the device of the device of embodiment and patent documentation 1, can realize further lifeProduce and shorten interval time, thereby can realize further high production rate operation, and can realize lightThe further raising of the inner evenness of orientation process. Below, this point is described.

Also same with patent documentation 1 in the device of this embodiment, substrate S is towards the first workbench 21A side that is mounted in irradiation area R carry out, make the first workbench 21 move to irradiation area ROpposite side after make its reversion and return to a side (moving back and forth), carry out thus light orientation process.Substrate S carries out towards the opposite side that is mounted in irradiation area R of the second workbench 22, makes the second workThe rear flank that platform 22 moves to irradiation area R makes its reversion and returns to opposite side, carries out thus light and getsTo processing. In each side, carry out substrate carry action position and carry out substrate reclaim action position notNeed to be identical, (below, be called substrate and carry recovery but be formed as in this embodiment same positionPosition).

Control based on control module 4 also comprises the control of movable workbench mechanism 3 as mentioned above, butIn control module 4, be set with two speed as the translational speed of each workbench 21,22. One isSpeed (following, to be called and to set Negotiation speed) during by irradiation area R. Another is that substrate carriesReclaim the translational speed between position and irradiation area R, carry and reclaim position and irradiation area with substrateThe transporting velocity of substrate S between R is (following, to be called and to set transporting velocity) quite.

In the device of embodiment, set transporting velocity and set for than setting the high speed of Negotiation speed.That is, be configured to: compared with the speed when by irradiation area R, make each workbench with speed fast21,22 arrive irradiation area R, return to substrate with speed fast from irradiation area R and carry and reclaim positionPut.

The Negotiation speed of substrate S according to and the required accumulative total exposure of light orientation process between relation establishFixed. For some accumulative total exposure at place on substrate S, by the polarised light in irradiation area RIllumination is made as I, and Negotiation speed (being average Negotiation speed strictly speaking) is made as to V, will be from movement sideWhile being made as L to the length of the irradiation area R observing, accumulative total exposure Q represents with Q=IL/V.Thereby, according to and required accumulative total exposure Q between relation calculate in advance and set Negotiation speed V.

Inventor carries out the movement of workbench 21,22 at first all the time with constant setting Negotiation speed, butCan not produce substrate S in work even if find to make workbench 21,22 move than this fireballing speed yetMake on platform 21,22 problem of skew etc., thereby expected carrying out than setting the fast speed of Negotiation speedIrradiation area R-substrate carries the structure that reclaims the movement between position.

In the case of carrying out the movement of workbench 21,22 with two different speed as mentioned above, thoughSo in mobile process, be accompanied by and accelerate and slow down, but be to make substrate S from main points nowThereby the exposure at each point place evenly the higher viewpoint of inner evenness of light orientation process is set out,Be formed as: about all points in the surface of substrate S, when by irradiation area R, make its guarantorHold constant setting Negotiation speed, accelerate on this basis, slow down. About this point, use Fig. 3And Fig. 4 describes.

Fig. 3 and Fig. 4 be position that the workbench 21,22 in the device of the first embodiment is shown withThe skeleton diagram of the relation between translational speed. Wherein, Fig. 3 illustrates that carrying recovery position from substrate goes toThe situation of irradiation area R, Fig. 4 illustrates that returning to substrate from irradiation area R carries the situation that reclaims position.In Fig. 3 and Fig. 4, the situation of the first workbench 21 is shown as an example. At Fig. 3 andIn Fig. 4, for the additional chart of describing, the longitudinal axis represents speed, and transverse axis is illustrated in the movement side of substratePosition (displacement) upwards. In order to understand, transverse axis is the limit, moving direction front of the substrate of movementThe position of edge, therefore figure expresses the variation of the speed at the moving direction front edge place of substrate.

As shown in Fig. 3 (1), (2), in the time going to irradiation area R from substrate lift-launch recovery position,The first workbench 21 moves to set transporting velocity. And, nearby reducing speed now of irradiation area R,By in the process of irradiation area R, move with constant setting Negotiation speed.

Now main points are: as shown in Fig. 3 (1), the substrate S's on the first workbench 21Before moving direction front edge arrives irradiation area R, finish towards the deceleration of setting Negotiation speed. FalseIf if carry out the speed control at the some place of the moving direction central authorities of for example substrate, arrive and shine at central pointPenetrate before the R of region and be decelerated to and set Negotiation speed, as shown in Fig. 3 (2), substrate SMoving direction front edge and near surf zone after entering slightly irradiation area R, slow downTo setting Negotiation speed. , the moving direction front edge of substrate S and near surf zone thereof withThan setting, the fast speed of Negotiation speed is mobile slightly in irradiation area R is reduced to setting afterwards by speedDegree also moves with this speed. In this case, near the table moving direction front edge of substrate SFace region, accumulative total exposure reduces compared with other regions, and the deficiency that can produce light orientation process (is locatedThe uneven homogenize of reason). On the other hand, as shown in Fig. 3 (1), if at the moving direction of substrate SFront edge is decelerated to setting Negotiation speed before arriving irradiation area R, does not have such problem.

And, as shown in Fig. 4 (1), from irradiation area R towards substrate carry reclaim position returnTime, the first workbench 21 accelerates to setting transporting velocity from setting Negotiation speed, to set transporting velocityArrive substrate and carry recovery position. Now main points are: the substrate S on the first workbench 21 movesMoving direction rearward edges starts to accelerate after by irradiation area R. Be shown in as Fig. 4 (2) if supposeThe moving direction rearward edges of substrate S is by starting acceleration before irradiation area R, substrate S'sNear surf zone moving direction rearward edges, with than setting the fast speed of Negotiation speed at irradiated regionIn the R of territory, move slightly, same, can produce the light orientation causing because of the minimizing of accumulative total exposure not enough.On the other hand, as shown in Fig. 4 (2), if pass through to irradiate in the moving direction rearward edges of substrate SAfter the R of region, start to accelerate, do not have such problem.

And the device of embodiment makes each workbench 21,22 move back and forth as mentioned above. Back and forthThe position (following, to be only called backward position) of the reversion in movement, speed is zero certainly, therefore, depositsIn the deceleration towards backward position (outlet), from the control of the acceleration (return road) of backward position. TheseControl also equally with the situation of above-mentioned Fig. 3 and Fig. 4, realize the substrate S on each workbench 21,22Surf zone in the inhomogeneity raising of light orientation process. Wherein, with above-mentioned Fig. 3 and Fig. 4, for the movement between irradiation area R and backward position, not only there is speed in shown situation differenceThe problem of controlling, but also there is the problem on the space between irradiation area R and backward position.

Use Fig. 5 and Fig. 6 to describe above-mentioned point. Fig. 5 and Fig. 6 illustrate irradiation areaThe skeleton diagram of the control of the translational speed in the space between R and backward position and this space. Wherein,Fig. 5 illustrates from irradiation area R and goes to the speed control the situation of backward position, and Fig. 6 illustrates from insteadThe speed control in the situation of going to irradiation area R is put in transposition. Equally, Fig. 5 and Fig. 6 are as oneIndividual example illustrates the situation of the first workbench 21.

In the device of embodiment, at the first workbench 21 that is positioned at first substrate lift-launch recovery positionAnd between irradiation area R, guarantee that the substrate S on the second workbench 22 passes through the amount of irradiation area RAbove space, at the second workbench 22 and irradiation area R that is positioned at second substrate lift-launch recovery positionBetween, guarantee that the substrate S on the first workbench 21 passes through the space more than amount of irradiation area R. ShouldPoint is same with the device of patent documentation 1. Below, by for being called and moving back by the space of irradiation area RBetween empty avoiding.

The situation in " by the space more than amount of irradiation area R " also comprises guarantees workbench 21,22Moving direction Length Quantity space and prevent the situation in the space slightly of colliding use. Be, to be positioned atFirst substrate carries space and the second work between the first workbench 21 and the irradiation area R that reclaims positionThe length of making platform 22 is roughly consistent, be positioned at second substrate carry the second workbench 22 of reclaiming position withRoughly consistent situation of the length of the space between irradiation area R and the first workbench 21. This situation alsoSubstrate S on each workbench 21,22 can be by being excellent on irradiation area R and this aspect of save spaceizationChoosing. But, in this configuration, cannot guarantee the movement of the deceleration for going to backward positionPath and for carrying out going to from backward position the mobile route of the acceleration of irradiation area R, therefore depositsCannot realize the problem of raising of inner evenness of light orientation process.

As shown in Fig. 5 (2), for example, about the first workbench 21, be positioned at second substrate and carry recoveryDistance between edge and the irradiation area R of the irradiation area R side of the second workbench 22 of position becomesBe first to keep out of the way the length in space. In this case, if the first length of keeping out of the way space is only the first workBe used as the length and the amount of avoiding the space slightly of colliding, the substrate S on the first workbench 21 of platform 21Must before completely by irradiation area R, reduce speed now. , the substrate from the first workbench 21The mobile rearward edges of the S still state in irradiation area R rises and reduces speed now. In this case,Near the surf zone moving direction rearward edges of substrate S is with more logical than setting the slow speed of Negotiation speedCross, therefore totally irradiate quantitative change many, the inner evenness of accumulative total exposure reduces. As a result, light orientationThe inner evenness of processing also reduces.

Therefore,, for the inner evenness that prevents light orientation process reduces, first to keep out of the way space be only theThe length of one workbench 21+avoid collision still inadequate with space, must comprise for carrying out from setting logicalCross the amount of the mobile route of the deceleration of speed. If comprise the mobile route for slowing down, as Fig. 5(1) shown in, even if the moving direction rearward edges of the substrate S on the first workbench 21 is passed throughAfter irradiation area R, reduce speed now, also can stop at backward position, can prevent light orientation processInner evenness reduces.

And, in the situation that moving from backward position towards irradiation area R too. From speed zeroDuring reaching the acceleration of setting till Negotiation speed and moving, due to the not enough Negotiation speed of setting still, because ofThese are as shown in Fig. 6 (2), if first keep out of the way the length that space is only the first workbench 21+avoidedThe amount in space for collision, near the surf zone moving direction front edge of substrate S is established with deficiencyThe speed of determining Negotiation speed is local mobile in irradiation area R. Therefore, equal in the face of light orientation processEven property reduces. As shown in Fig. 6 (1), if first keep out of the way space than the width of the first workbench 21+ avoid collision long with space, be provided with the mobile route of the sufficient length for accelerating, canEnough set Negotiation speed to reach in the time that the moving direction front edge of substrate S arrives irradiation area RMode is carried out speed control, can prevent that the inner evenness of light orientation process from reducing. In addition, like thisFor the mobile route that slows down, be referred to as at this description for the mobile route acceleratingFor " speed-buffering path ".

More than the situation of the first workbench 21, but also opposite direction only of the situation of the second workbench 22,Substantially be same.

Control module 4 comprises arithmetic processing section 41, storage part 42 as PLC, and order is installedControl program. Sequence control program is the program of carrying out the order that comprises above-mentioned speed control. Fig. 7It is the skeleton diagram that the sequential control of the translational speed of the each workbench 21,22 in control module 4 is shown.

The transverse axis of Fig. 7 represents the position (displacement) of moving direction, and the longitudinal axis represents speed. At transverse axisIn, carry and reclaim position as initial point using substrate. In addition, transverse axis is substrate S as an exampleThe position of the point of moving direction central authorities on moving direction.

In order to monitor the carrying of substrate S of the movement based on each workbench 21,22 as above, realThe device of executing form possesses several sensors. This point uses Fig. 2 to describe.

First, in each workbench 21,22, be provided with the mounting that detects substrate S sensor (withUnder be called substrate sensor) 71. And, in movable workbench mechanism 3, dispose: detect firstWhether workbench 21 is positioned at first substrate carries the sensor that reclaims position (hereinafter referred to as the first loading positionPut sensor) 72; Detect the sensor whether the first workbench 21 be positioned at backward position (hereinafter referred to asThe first backward position sensor) 73; Detect the second workbench 22 and whether be positioned at second substrate lift-launch recoveryThe sensor (hereinafter referred to as the second " loaded " position sensor) 74 of position; And detection the second workbenchWhether 22 be positioned at the sensor (hereinafter referred to as the second backward position sensor) 75 of backward position. TheseThe output of sensor 71～75 is sent to control module 4. Each sensor 71～75 can suitably selectSelect and use noncontacting proximity sensor, the such mechanical sensor of limit switch, or photoelectric sensorDeng.

And the device of embodiment possesses and regulates the position, direction of substrate S to correctly carry outThe base plate alignment device 6 of the polarizing light irradiation being orientated for light. As mentioned above, polarizer 14 is configured toSubstrate S is irradiated to the polarised light of polarizing axis towards the direction of regulation. Draw as this selection of reference frame linearityThe length direction of guiding element 31. Base plate alignment device makes the length of substrate S with respect to Linear guide 31Direction becomes the attitude of regulation, guarantees the precision of the directionality of light orientation.

Fig. 8 is the stereogram that the summary of base plate alignment device 6 is shown. In Fig. 8, as an exampleThe base plate alignment device 6 that is arranged at the first workbench 21 is shown, but the second workbench 22 too.

As shown in Figure 8, the first workbench 21 by fixed pedestal 20A and fixed pedestal 20A canThe formations such as moving pedestal 20B. Movable workbench mechanism 3 is the mechanisms that directly make fixed pedestal 20A move.

In movable base 20B, be provided with XY θ travel mechanism 62, make the movable base 20B canOn fixed pedestal 20A, move along the direction of XY θ. Loading in the substrate of workbench 21,2221On S, be applied with alignment mark S1, base plate alignment device 6 is mainly by the aligning sensing of taking alignment mark S1Device 61, above-mentioned XY θ travel mechanism 62 and according to the output from alignment sensor 61 to XYWhat θ travel mechanism 62 controlled forms mutatis mutandis control part 63. The knot of such aligning control partStructure can be identical with the disclosed structure of patent documentation 1, therefore omits detailed explanation.

Next, use the action of Fig. 9 and the light aligning device of Figure 10 to the first embodiment to carry outExplanation. Fig. 9 and Figure 10 are the skeleton diagrams that the action of the light aligning device of the first embodiment is shown.The following description also doubles as the explanation into the process for optical alignment of embodiment.

In the original state starting in the running of device, as shown in Fig. 9 (1), the first workbench 21Be positioned at first substrate and carry recovery position, the second workbench 22 is positioned at second substrate and carries recovery position.Under this state, first not shown robot loads substrate S in the first workbench 21. If firstSubstrate sensor 71 in workbench 21 detects the mounting of substrate S and this signal is sent to and controls listUnit 4, the base plate alignment device 6 that sequential programme is used the substrate S on the first workbench 21 moves. KnotReally, thus position and attitude that movable base 20B moves substrate S along XY θ direction become regulationSituation.

Next, control module 4 transmits control signal towards movable workbench mechanism 3, as Fig. 9 (1)In with shown in arrow, make the first workbench 21 first with set transporting velocity advance, i.e. high-speed mobile.And then, as shown in Fig. 9 (2), arrive irradiation area at the substrate S than on the first workbench 21The position of R is slightly decelerated to setting Negotiation speed near front position, transits to low speed and moves. Control singleUnit 4 maintains constant setting Negotiation speed while makes the first workbench 21 by irradiation area R,As shown in Fig. 9 (3), the moving direction rearward edges of the substrate S on the first workbench 21 is logicalCross after irradiation area R, further slow down and stop at backward position.

If utilize the first backward position sensor 73 to confirm that the first workbench 21 arrives backward position,Control module 4 reverses the first workbench 21, and it is moved in reverse order in the opposite direction., the moving direction front edge of the substrate S of control module 4 on the first workbench 21 arrives and irradiatesBefore the R of region, make it reach setting Negotiation speed, and it is moved with constant setting Negotiation speed low speedMoving. And, as shown in Fig. 9 (4), if the moving direction of the substrate S on the first workbench 21Rearward edges is by irradiation area R, and control module 4 accelerates the first workbench 21 and becomes settingTransporting velocity, makes it transit to high-speed mobile. Afterwards, the first workbench 21 is taken at arrival first substrateAfter carrying recovery position, stop moving.

During this period, carry and reclaim position at second substrate, carry out substrate S towards the second workbench 22Carry action. , robot utilization is from the control signal of control module 4 and interval official hourInterval loads substrate S in the second workbench 22. In the second workbench 22, pass at substrate equallySensor 71 confirms after the mounting of substrate S, and control module 4 makes the substrate S on the second workbench 22With base plate alignment device 6 move and aim at. As shown in Fig. 9 (4), at the first workbench 21Return to first substrate and carry while reclaiming position, the aligning in the second workbench 22 finishes.

Next, control module 4 transmits control signal towards movable workbench mechanism 3, as Fig. 9 (5)In with shown in arrow, first to set, transporting velocity is advanced, i.e. high-speed mobile to make the second workbench 22.And then, as shown in Figure 10 (1), arrive irradiation area at the substrate S than on the second workbench 22The position of R is slightly decelerated to setting Negotiation speed near front position, and transits to low speed and move. ContinueWith constant setting Negotiation speed, the second workbench 22 is moved, as shown in Figure 10 (2),The moving direction rearward edges of substrate S on one workbench 22, by after irradiation area R, makes it enter oneStep is slowed down and is stopped at the second backward position.

If utilize the second backward position sensor 75 to confirm that the second workbench 21 arrives backward position,Control module 4 makes the second workbench 22 reverse equally, and makes it in reverse order in the opposite directionMobile. , the moving direction front edge of the substrate S of control module 4 on the second workbench 22 arrivesBefore reaching irradiation area R, make it reach setting Negotiation speed, and it is moved to set Negotiation speed low speedMoving. And, as shown in Figure 10 (3), if the moving direction of the substrate S on the second workbench 22Rearward edges is by irradiation area R, and make the second workbench 22 accelerate and become setting transporting velocity,Make it transit to high-speed mobile. Afterwards, the second workbench 22 arrives second substrate lift-launch recovery positionAfter stop mobile.

During this period, carry and reclaim position at first substrate, utilizing the first " loaded " position sensor 72Confirm the first workbench 21 and return behind first substrate lift-launch recovery position, carry out substrate S from the first workDo the recovery and the lift-launch of next substrate S towards the first workbench 21 of platform 21. , robot is from firstWorkbench 21 is removed substrate S, and next substrate S is equipped on to the first workbench 21.

And, as shown in Figure 10 (4), return to second substrate at the second workbench 22 and carry recovery, become the lift-launch release of next substrate S towards the first workbench 21 when the position, and for this substrateThe state that the aligning of S finishes. Control module 4 is again towards movable workbench mechanism 3 transmitted signals,Make after the first workbench 21 high-speed mobile, as Figure 10 (5) are shown according to penetrating region R slightly closeBefore position make it transit to low speed to move, and make it pass through irradiated region with constant setting Negotiation speedTerritory R.

During this period, carry and reclaim position at second substrate, utilizing the second " loaded " position sensor 74Confirm the second workbench 22 and return behind second substrate lift-launch recovery position, carry out substrate S towards the second workDo right towards the lift-launch of the second workbench 22, the second workbench 22 of the recovery, next substrate S of platform 22Accurate.

Later action is same, with install repeatedly carry out such action and two workbench 21,The mode of alternately carrying out light orientation on 22 is programmed to sequential programme. In addition, substrate S by AGV,The such carrying mechanism of conveyer is carried to robot, is carrying out, after light orientation, utilizing carrying mechanism to removeBe transported to the position of the device for carrying out subsequent processing.

According to above-mentioned structure and move light aligning device or the method for related embodiment,By make two workbench 21,22 alternately by irradiation have polarised light irradiation area R and to each workThe substrate S doing on platform 21,22 irradiates polarised light, therefore can realize the light orientation procedure that productivity ratio is high.Now, although set Negotiation speed be according to and required accumulative total exposure between relation set,But the movement between irradiation area R and substrate lift-launch recovery position is with the speed faster than setting Negotiation speedSet transporting velocity and carry out, therefore can realize shortening production shorter interval time, and productivity ratio is highLight orientation procedure.

Figure 11 is the figure for making easily to understand above-mentioned point, is to illustrate by making to set transporting velocity ratioSet Negotiation speed high and productivity ratio further improves the figure of this point. Wherein, Figure 11 (1) illustratesProduction interval time in the situation (embodiment) of setting transporting velocity > setting Negotiation speed, figure11 (2) illustrate between the production in the situation (comparative example) of setting transporting velocity=setting Negotiation speedInterval. In Figure 11 (1), (2), the longitudinal axis is speed, and transverse axis is time (different from Fig. 7).

In Figure 11 (1), (2), the time point of speed vanishing means and arrives reversion halfwayThe time point of position. The length of both sides' irradiation area R is identical, as shown in Figure 11 (1), (2)The value of setting Negotiation speed is also identical. Therefore be, identical as the accumulative total exposure of polarised light.

(1) to Figure 11, (2) compare known, according to the device of embodiment and method,Produce and significantly reduce interval time, productivity ratio significantly improves. If an example is shown, although set logicalThe speed of crossing is according to required accumulative total exposure and difference, but is 50～200mm left and right per second. Setting is removedRunning speed degree (for example there will not be substrate S unfavorable condition such as skew on workbench 21,22 as far as possibleScope in) be the fastest speed. This depends on the guarantor on size, the workbench 21,22 of substrate SHold power etc., but be 300～600mm left and right per second. If it is per second that setting Negotiation speed is made as to 100mm,Setting transporting velocity is made as to 400mm per second, (figure in the situation that setting transporting velocity is not setIn the situation of 11 (2)), produce and exceed 100 seconds interval time, but setting transporting velocity is being setSituation under (in the situation of Figure 11 (1)), produce interval time become below 70 seconds, produceShorten interval time more than 30 seconds. In addition, for the production interval time in this situation, if for example pinConcerning the first workbench 21, be carry from first substrate reclaim position, at backward positionReverse and return to first substrate and carry the time of reclaiming till position and (, remove and carry out taking of substrate SThe time of carrying and reclaiming).

As mentioned above, according to light aligning device and the process for optical alignment of embodiment, because setting is removedRunning speed degree is than setting Negotiation speed fast speed, therefore producing and become shorter interval time, can be withHigher productivity ratio is carried out light orientation process. Now, between backward position and irradiation area R, guaranteeThere is the space of keeping out of the way more than length+speed-buffering path of moving direction of workbench, from setting carryingSpeed arrives irradiation area R to the deceleration of setting Negotiation speed at the moving direction front edge of substrate SCarry out, the acceleration from setting Negotiation speed towards setting transporting velocity is the moving direction of substrate S beforeMethod, edge is undertaken by after irradiation area R. , the each point in the surface of substrate S is passing through irradiationDuring the R of region, move with constant setting Negotiation speed all the time. Therefore, in the surface of substrate SThe accumulative total exposure of the polarised light at each point place is constant, and the inner evenness of light orientation process improves.

In addition, for by the moving direction of guaranteeing the workbench between backward position and irradiation area RLength+speed-buffering path more than keep out of the way space and the inner evenness of the light orientation process that realizesRaising, except using two workbench 21,22 and make as the device of embodiment and methodSubstrate S is alternately beyond the situation of the structure by irradiation area R, only uses a workbench and makesIts situation about moving back and forth is also suitable for this. Using only a workbench in the situation that, in productivity ratioAspect variation compared with using the situation of two workbench 21,22, but by backward position withBetween irradiation area R, guarantee more than length+speed-buffering path of moving direction of workbench keeping out of the wayIt is same that space can be improved on this aspect of inner evenness of light orientation process.

And, not only also substrate S is irradiated to this way of polarised light in outlet but also in return road and is acceleratingThe aspect of the setting Negotiation speed while obtaining required accumulative total exposure is significant, at that point alsoContribute to boosting productivity. But, in the time implementing the present application, can be also only in outletCarry out polarizing light irradiation, and do not carry out the situation of polarizing light irradiation in return road. In this case, shiningPenetrate that unit 1 is interior arranges shutter etc. and blocking light. In this case, in return road can with polarizing light irradiationIndependently make workbench 21,22 move, therefore in most cases make it with faster than setting Negotiation speedSpeed is passed through just down illumination unit 1.

Next, use device and the method for Figure 12 to the second embodiment to describe. Figure 12It is the skeleton diagram that the major part of light aligning device that the second embodiment is related and method is shown.

In the first embodiment, as the control of inner evenness that improves light orientation process, to work asThe surperficial each point of substrate S maintains constant setting Negotiation speed during by irradiation area R at each point placeMode control, but as the structure of inner evenness for improving light orientation process, except thisCan also consider in addition other several structures, the example of one shown in Figure 12. Shown in Figure 12Control in be formed as following control: by during irradiation area R, in outlet on one side with perseveranceFixed braking (deceleration) is slowed down and each workbench 21,22 is moved on one side, in return road, on one side withThe velocity variations of the velocity variations symmetry in outlet is accelerated in irradiation area R, to move on one side.

More specifically describe, the longitudinal axis of Figure 12 is speed, and transverse axis is the position on moving direction(displacement). The position that the central speed of transverse axis is zero is backward position. Same with Fig. 7, realOn border, return from backward position, but for illustrated convenience, keep intact and transverse axis is extended and describe.

In Figure 12, figure expresses variation (the mobile road of the speed at the lip-deep each point place of substrate SVariation on footpath). Solid line illustrates the variation of the speed of moving direction centre, and single-point line illustrates movementThe variation of the speed of the edge of one side of direction, double dot dash line illustrates the edge of moving direction opposite sideThe variation of the speed at place.

As can be seen from Figure 12, in this embodiment, by during irradiation area R, with in outletControl by, the mode passed through with constant acceleration in return road with constant deceleration. And,The gradient of deceleration is identical with the gradient of acceleration. And, when the moving direction central authorities at substrate SIn the situation that some place is observed, acceleration and the velocity variations of slowing down clip the lucky line symmetry of backward position.

When in the case of the velocity variations by substrate S during irradiation area R, as previously described,If the length on moving direction of irradiation area is made as to L, illumination is made as to I, the accumulative total of certain pointIf it is IL/VA (supposing that illumination I is constant in length L) that average speed is made as VA by exposure.In this case, as can be seen from Figure 12, average speed VA is the speed (speed of constant deceleration) in outletWith the two average speed of the speed (speed of constant acceleration) in return road. As can be seen from Figure 12, in outlet,The edge of moving direction one side of substrate S passes through irradiation area R, moving direction with relatively fast speedThe edge of opposite side passes through irradiation area R with slow speed, but this relation is just the opposite in return road. CauseThis, the speed after outlet and return road are average is all consistent with the average speed at the some place of moving direction central authorities.That is, the average speed at each point place is consistent, and therefore the accumulative total exposure at each point place is even. According to suchThe uniformity that structure also can realize light orientation process improves.

In the control module 4 of constituent apparatus, the sequential control of carrying out control is as shown in figure 12 installedProgram. In outlet, the timing reducing speed now from constant setting transporting velocity is the movement side of substrate SArrive irradiation area R timing before to the edge of a side, slow down and arrive anti-with constant decelerationTransposition is put. In return road, move with constant acceleration, pass through to irradiate at the edge of moving direction one sideAfter the R of region, reach and set transporting velocity and maintain this speed. And, as shown in figure 12, at least shiningPenetrate in the R of region, be formed as the velocity variations of full symmetric centered by backward position. In addition, at figureIn 12, arrive maintain former state by the deceleration during irradiation area R in backward position, will be from insteadThe acceleration that transposition is put maintains former state and passes through irradiation area R, but also can make irradiation area R and reversionDeceleration between position or accelerate from deceleration by during irradiation area R or accelerate different.

In the structure of the second embodiment, set transporting velocity than by during irradiation area RSpeed (average speed) is fast, therefore produces and shortens interval time, and productivity ratio improves. And, due toThe accumulative total exposure at the surperficial each point place of substrate S is even, and therefore the uniformity of light orientation process improves.In addition, compared with the situation of the first embodiment, need to control accurately by irradiation area R's,Each timing and the gradient of acceleration during this time and deceleration, therefore control and become slightly complicated. Do not depositingAspect such complexity, the device of the first embodiment and method are excellent.

In addition for example, in the case of as Fig. 3 (2), pass through about exceeding in outlet to set,The moving direction front edge near zone of the substrate S of speed, can compensate in the following manner withRealize homogenising: while going to backward position deviating from irradiation area R, than this region from irradiated regionThe slightly forward moment in the moment that territory R deviates from reduces speed now. Also same for the situation that Fig. 4 (2) are suchSample, in the time going to irradiation area R from backward position, by make before the moving direction of substrate SThe moment that method, edge enters irradiation area R slightly become that the mode of setting Negotiation speed is controlled andCompensate, can realize thus homogenising.

In each embodiment, about the first workbench 21, the loading position of substrate S and recovery positionIdentical position in a side of irradiation area R, but as long as a side, without being identical positionPut. For the second workbench 22 too. For example, in a side, first substrate reclaims position also canBe set in from first substrate loading position and observe the position near irradiation area R. In this case,The substrate S being orientated by light reclaims position at substrate and is removed from the first workbench 21, then the first workPlatform 21 is advanced further and arrives substrate loading position, carries herein next substrate S.

Above-mentioned in the situation that, reclaim position about first substrate, even if existence is not guaranteed aforementioned yetThe also not in-problem situation of space of keeping out of the way of amount. , for example can be at the first workbench 21 fromOne substrate reclaims position and moves under the state of first substrate loading position and guarantee moving back of the second workbench 22Between empty avoiding. Or, also can be formed as following structure: be positioned at first substrate at the first workbench 21Reclaim the space of keeping out of the way of guaranteeing the second workbench 22 under the state of position, the first work comparing this stateMake the position mounted board S of platform 21 near irradiation area R. , if a side workbench 21,22 are positioned at the work of guaranteeing the opposing party under the state of position of lift-launch for carrying out substrate S or recoveryPlatform 21,22 keep out of the way space.

In addition, also exist record as patent documentation 1 multiple illumination units 1 along workbench21, the situation that 22 moving direction is arranged side by side. In this case, envelope is from each illumination unit 1The region of irradiation area R of polarised light be called as overall irradiation area R. To the irradiation of this entiretyRegion R carries out any in aforesaid each control.

And in the present application, the term of " workbench " need to be explained than conventionally wider. ,There is following situation: substrate S is loaded in having on multiple pins of the such adsorption hole of vacuum suctionAnd substrate S is adsorbed on above-mentioned multiple pin, by multiple pin one are moved, substrate S is passed throughIrradiation area R. Thereby " workbench " is as long as keeping substrate S while substrate S is movedMoving parts, are not limited to the parts of platform shape.

In addition, as substrate S imagination be pasted with the substrate used for liquid crystal display element of membrane material, butAlso the substrate that exists the display element beyond liquid crystal display cells to use carries out light orientation as objectSituation, also there is the object in order to carry out angle of visual field correction and carry out the situation of light orientation. Except this withWhen carry out light orientation with various objects, also can use device and the method for the present application outward.And self-evident, the invention of process for optical alignment can be served as the invention of the manufacture method of optical alignment filmTreat.

Claims

1. a light aligning device, is characterized in that, possesses:

Illumination unit, is radiated at the polarised light of the direction polarization of regulation to the irradiation area setting;

Workbench, mounting substrate; And

Be provided with the control module of controlling movable workbench mechanism,

2. smooth aligning device according to claim 1, is characterized in that,

Above-mentioned setting Negotiation speed is set to constant speed,

3. smooth aligning device according to claim 2, is characterized in that,

Above-mentioned illumination unit is in above-mentioned the first workbench, the second workbench while moving and the return road of carrying out outletBoth sides when mobile are irradiated polarised light to the substrate on above-mentioned each workbench,

4. smooth aligning device according to claim 3, is characterized in that,

In above-mentioned control module, be set with: above-mentioned the first workbench is passing through after irradiation area for courtOne side is returned and i.e. the first backward position in the position of reversing, and above-mentioned the second workbench is passing through irradiated regionThe position of reversing in order to return towards opposite side behind territory i.e. the second backward position,

In above-mentioned control module, above-mentioned the first workbench arrives first after by above-mentioned irradiation areaDeceleration when backward position and above-mentioned the first workbench arrive above-mentioned irradiation in the first backward position reversionAcceleration when region is set to identical gradient,

In above-mentioned control module, above-mentioned the second workbench arrives second after by above-mentioned irradiation areaDeceleration when backward position and above-mentioned the second workbench arrive above-mentioned irradiation in the second backward position reversionAcceleration when region is set to identical gradient.

5. smooth aligning device according to claim 4, is characterized in that,

In above-mentioned control module,

The translational speed of above-mentioned the first workbench from above-mentioned first substrate loading position to above-mentioned irradiation areaTranslational speed with reclaim position from above-mentioned irradiation area to above-mentioned first substrate, is set to identicalSpeed,

The translational speed of above-mentioned the second workbench from above-mentioned second substrate loading position to above-mentioned irradiation areaTranslational speed with reclaim position from above-mentioned irradiation area to above-mentioned second substrate, is set to identicalSpeed,

6. a light aligning device, is characterized in that, possesses:

Workbench, mounting substrate; And

Be provided with the control module of controlling movable workbench mechanism,

Set Negotiation speed and be set to constant speed,

7. a process for optical alignment, is characterized in that, possesses:

Irradiation process, is radiated at the polarised light of the direction polarization of regulation to the irradiation area setting;

8. process for optical alignment according to claim 7, is characterized in that,

Above-mentioned setting Negotiation speed is set to constant speed,

9. process for optical alignment according to claim 8, is characterized in that,

10. process for optical alignment according to claim 9, is characterized in that,

Above-mentioned mobile process is following operation: above-mentioned the first workbench is passing through after above-mentioned irradiation areaIn order to return towards a side, in the first backward position reversion, above-mentioned the second workbench is by above-mentioned irradiationBehind region, reverse at the second backward position in order to return towards opposite side,

11. process for optical alignment according to claim 10, is characterized in that,

In above-mentioned mobile process,

12. 1 kinds of process for optical alignment, is characterized in that possessing:

Set Negotiation speed and be set to constant speed,