CN108873622B - Double-side exposure machine with double loading parts and double-side exposure method - Google Patents

Double-side exposure machine with double loading parts and double-side exposure method Download PDF

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Publication number
CN108873622B
CN108873622B CN201810836043.1A CN201810836043A CN108873622B CN 108873622 B CN108873622 B CN 108873622B CN 201810836043 A CN201810836043 A CN 201810836043A CN 108873622 B CN108873622 B CN 108873622B
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CN
China
Prior art keywords
exposure
loading
exposed
double
component
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CN201810836043.1A
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Chinese (zh)
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CN108873622A (en
Inventor
汪孝军
廖平强
张胜
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中山新诺科技股份有限公司
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Priority to CN201810836043.1A priority Critical patent/CN108873622B/en
Publication of CN108873622A publication Critical patent/CN108873622A/en
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Publication of CN108873622B publication Critical patent/CN108873622B/en

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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70691Handling of masks or wafers
    • G03F7/70716Stages
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70691Handling of masks or wafers
    • G03F7/70716Stages
    • G03F7/70725Stages control
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70691Handling of masks or wafers
    • G03F7/70758Drive means, e.g. actuator, motor
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70691Handling of masks or wafers
    • G03F7/70775Position control

Abstract

The invention relates to a double-side exposure machine with double loading parts and a double-side exposure method. Comprises a workbench; the exposure mechanism comprises a first exposure component and a second exposure component which can move along the workbench, and an exposure area is formed on the workbench; the loading mechanism comprises a loading platform, the loading platform is provided with a first loading part and a second loading part, the first loading part and the second loading part are arranged at intervals, and the loading platform can move along the workbench and enables the first loading part or the second loading part to move to the exposure area. Through the setting of mobilizable first exposure subassembly and second exposure subassembly, during the exposure, the loading platform moves preset position, makes first loading portion or second loading portion be located the exposure area, and then first exposure subassembly and second exposure subassembly move to treat the exposure to the corresponding first piece that treats exposure or second and treat the exposure, owing to two-sided exposure simultaneously, avoided operations such as upset, reduced exposure flow and counterpoint the scheduling problem, improved exposure efficiency and exposure precision.

Description

Double-side exposure machine with double loading parts and double-side exposure method

Technical Field

The invention relates to the technical field of double-sided exposure, in particular to a double-sided exposure machine with double loading parts and a double-sided exposure method.

Background

In a conventional double-sided exposure machine, a film transfer is generally used to expose a double-sided circuit board. Before exposure, a film of a pattern to be transferred needs to be manufactured; then, fixing films with patterns on two sides on the upper and lower two-sided glass respectively; and then, clamping the circuit board to be transferred with the pattern between the upper glass and the lower glass, exposing by using a blue-violet high-brightness light source, transferring the circuit pattern onto the circuit board, and completing double-sided exposure. Whereas for a laser direct write exposure machine, single-sided exposure is generally employed. Exposing one surface of the circuit board, turning over after exposure is completed, then exposing the other surface of the circuit board, and finally completing double-sided exposure of the circuit board.

However, when the laser direct writing exposure machine performs double-sided exposure, the laser direct writing exposure machine needs to be turned over, and the turning operation inevitably causes the problem of alignment after turning over, so that not only is the exposure process increased, but also the exposure precision is affected due to the alignment precision problem, and the final exposure effect is affected.

Disclosure of Invention

Accordingly, it is necessary to provide a double-side exposure machine with a double loading unit and a double-side exposure method. The double-side exposure machine of the double loading parts does not need to be turned over during exposure, so that the exposure process is reduced, the exposure precision is improved, and the exposure imaging quality is further improved; the double-sided exposure method is applied to the double-sided exposure machine with the double loading parts, the exposure efficiency is higher, and the automatic operation is convenient to realize.

The technical scheme is as follows:

on one hand, the double-side exposure machine with the double loading parts comprises a workbench, wherein the workbench is provided with an exposure through hole; the exposure mechanism comprises a first exposure component and a second exposure component, the first exposure component and the second exposure component are respectively arranged on two sides of the workbench and can move along the workbench, the first exposure component and the second exposure component move and form an exposure area on the workbench, and the exposure area is arranged corresponding to the exposure through hole; and the loading mechanism comprises a loading platform, the loading platform is provided with a first loading part and a second loading part, the first loading part is used for loading a first part to be exposed, the second loading part is used for loading a second part to be exposed, the first loading part and the second loading part are arranged at intervals, the loading platform can move along the workbench and enables the first loading part or the second loading part to move to the exposure area, and the first exposure component and the second exposure component move and expose the first part to be exposed or the second part to be exposed in the exposure area.

Above-mentioned two-sided exposure machine of two loading portions, through the setting of mobilizable first exposure subassembly and the second exposure subassembly, during the exposure, the loading platform removes preset position, make first loading portion or second loading portion be located the exposure area, later first exposure subassembly and second exposure subassembly remove, thereby treat the exposure to corresponding first exposure piece or second and expose, because two-sided exposure simultaneously, operations such as upset have been avoided, exposure flow and counterpoint scheduling problem have been reduced, exposure efficiency and exposure precision have been improved.

The technical solution is further explained below:

in one embodiment, the exposure mechanism further comprises an exposure mounting frame and an exposure driver, the first exposure assembly and the second exposure assembly are arranged on the exposure mounting frame, and the exposure driver is used for driving the exposure mounting frame and enabling the exposure mounting frame to move along the workbench.

In one embodiment, the exposure mechanism further comprises a first mounting frame, a second mounting frame, a first driver and a second driver, the first exposure assembly is arranged on the first mounting frame, the second exposure assembly is arranged on the second mounting frame, the first driver is used for driving the first mounting frame to move along the workbench, and the second driver is used for driving the second mounting frame to move along the workbench.

In one embodiment, the loading mechanism further comprises a loading drive for driving the loading table and moving the loading table along the work table.

In one embodiment, the loading mechanism further comprises a lock for locking the loading table and positioning the first loading part or the second loading part in the exposure area.

In one embodiment, the device further comprises a sensing mechanism, wherein the sensing mechanism comprises a first sensing assembly and a second sensing assembly, the first sensing assembly is used for detecting the moving position of the first exposure assembly and the moving position of the second exposure assembly, and the second sensing assembly is used for detecting the moving position of the loading table.

In one embodiment, the first exposure assembly and the second exposure assembly both move along the workbench in a first direction, and the loading table moves along the workbench in the first direction; or the first exposure component and the second exposure component move along the workbench in the second direction, and the loading platform moves along the workbench in the third direction.

In one embodiment, the loading platform is provided with a first guide rail, and the workbench is provided with a first sliding chute matched with the first guide rail.

In one embodiment, the device further comprises a material taking and placing mechanism, wherein the material taking and placing mechanism comprises a first taking and placing device and a second taking and placing device, the first taking and placing device is used for taking and placing a first to-be-exposed part of the first loading part, and the second taking and placing device is used for taking and placing a second to-be-exposed part of the second loading part.

On the other hand, there is also provided a double-sided exposure method applicable to the double-sided exposure machine of the double loading part according to any one of the above-mentioned technical solutions, comprising the steps of:

(S1) the first exposure component is located at the first initial position, the second exposure component is located at the second initial position, the loading table is located at the second exposure position, and the first member to be exposed is loaded at the first loading part of the loading table;

(S2), the loading stage moves to the first exposure position and the first member to be exposed is located in the exposure region;

(S3), the first exposure component moves to a first preset position, the second exposure component moves to a second preset position, and the first exposure component is exposed to obtain a first exposure finished product; simultaneously loading a second member to be exposed on a second loading part;

(S4), the loading table moves to the second exposure position and the second member to be exposed is located in the exposure area;

(S5), the first exposure component moves to the first initial position, the second exposure component moves to the second initial position, and the second exposure component is exposed to obtain a second exposure finished product; simultaneously unloading the first exposure finished product of the first loading part and loading the next first piece to be exposed;

(S6), the loading stage moves to the first exposure position, and the second exposed product of the second loading section is unloaded.

According to the double-sided exposure method, the front side and the back side of the first part to be exposed or the second part to be exposed can be exposed simultaneously, the first part to be exposed is loaded while the second part to be exposed is loaded or the exposed second exposure finished product is unloaded, the time utilization rate is improved, the exposure efficiency is improved, and the automatic operation is convenient to realize.

Drawings

FIG. 1 is a flowchart illustrating a double-sided exposure method according to an embodiment;

FIG. 2 is a front view showing the whole structure of a double-side exposure machine of the double loader in the embodiment;

FIG. 3 is a plan view showing the whole structure of the double-side exposure machine of the double loader according to the embodiment.

Reference is made to the accompanying drawings in which:

100. the exposure device comprises a workbench, 110, an exposure area, 121, a first mounting frame, 122, a second mounting frame, 210, a first exposure assembly, 220, a second exposure assembly, 300, a loading platform, 310, a first loading part, 320 and a second loading part.

Detailed Description

Embodiments of the present invention are described in detail below with reference to the accompanying drawings:

it will be understood that when an element is referred to herein as being "secured" to another element, it can be directly on the other element or intervening elements may also be present. When an element is referred to as being "connected" to another element, it can be directly connected to the other element or intervening elements may also be present. In contrast, when an element is referred to as being "directly on" another element, there are no intervening elements present. The terms "vertical," "horizontal," "left," "right," and the like as used herein are for illustrative purposes only and do not represent the only embodiments.

Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. The terminology used herein in the description of the invention is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. As used herein, the term "and/or" includes any and all combinations of one or more of the associated listed items.

As shown in the embodiment of fig. 1 to 3, there is provided a double-sided exposure machine of a double loader, comprising a work table 100, the work table 100 being provided with an exposure through hole; the exposure mechanism comprises a first exposure component 210 and a second exposure component 220, the first exposure component 210 and the second exposure component 220 are respectively arranged on two sides of the workbench 100 and can move along the workbench 100, the first exposure component 210 and the second exposure component 220 both move and form an exposure area 110 on the workbench 100, and the exposure area 110 is arranged corresponding to the exposure through hole; and the loading mechanism comprises a loading platform 300, the loading platform 300 is provided with a first loading part 310 and a second loading part 320, the first loading part 310 is used for loading a first piece to be exposed, the second loading part 320 is used for loading a second piece to be exposed, the first loading part 310 and the second loading part 320 are arranged at intervals, the loading platform 300 can move along the workbench 100 and enables the first loading part 310 or the second loading part 320 to move to the exposure area 110, and the first exposure component 210 and the second exposure component 220 move and expose the first piece to be exposed or the second piece to be exposed in the exposure area 110.

Through the arrangement of the movable first exposure component 210 and the movable second exposure component 220, during exposure, the loading table 300 moves to a preset position, so that the first loading part 310 or the second loading part 320 is positioned in the exposure area 110, and then the first exposure component 210 and the second exposure component 220 move, so as to expose the corresponding first piece to be exposed or second piece to be exposed.

The traditional laser direct writing exposure machine can only expose a single side and can not expose two sides simultaneously, and needs to be turned over after one side is exposed so as to expose the other side; meanwhile, the traditional double-sided exposure mostly adopts film transfer printing, the process flow is also increased in the process of film manufacturing, the cost of film manufacturing is high, and the film needs to be replaced after being used for a period of time.

In this embodiment, the first exposure component 210 and the second exposure component 220 are respectively disposed on two sides of the workbench 100, and the exposure through hole disposed on the workbench 100 enables light emitted by the first exposure component 210 and the second exposure component 220 to pass through and forms an exposure area 110 in a specific area of the workbench 100, so that the first to-be-exposed piece on the first loading portion 310 or the second to-be-exposed piece on the second loading portion 320 can be exposed when being located in the exposure area 110; meanwhile, the first exposure component 210 and the second exposure component 220 can move on the workbench 100, so that when the loading platform 300 moves to the first exposure position or the second exposure position, double-side exposure of the first to-be-exposed piece or the second to-be-exposed piece is realized through the movement of the first exposure component 210 and the second exposure component 220, the exposure efficiency is higher, and the exposure precision is also higher.

Further, as shown in fig. 2, the first exposure component 210 and the second exposure component 220 are respectively disposed on the upper and lower sides of the workbench 100 and are correspondingly disposed, where the corresponding setting refers to a corresponding setting that can form the exposure region 110 and perform double-sided exposure, and a person skilled in the art can perform corresponding setting according to a specific corresponding setting manner in the prior art, which is not described herein again.

In addition, it should be noted that, when the first to-be-exposed member or the second to-be-exposed member is exposed in the exposure region 110, both the light emitted by the first exposure component 210 and the light emitted by the second exposure component 220 need to reach the first to-be-exposed member or the second to-be-exposed member, and therefore, the first loading portion 310 or the second loading portion 320 should be provided with a structure that allows the exposed front and back side regions of the first to-be-exposed member or the front and back side exposure region 110 of the second to-be-exposed member to leak outside, so as to meet the exposure requirement. If the first loading part 310 is arranged in a frame structure, the first piece to be exposed is arranged on the outer frame of the first loading part 310, so that the middle part of the frame is not shielded, and light can be irradiated to the front and back areas of the first piece to be exposed to perform normal front and back exposure; as another example, the first loading portion 310 is provided as a loading through slot, which is a structure that needs to be set by a person skilled in the art as needed, and any prior art that can meet the setting requirements can be used for specific setting, and details are not described here.

Further, the loading table 300 may be integrally provided, or may be provided with two parts, one part is provided for providing the first loading part 310, and the other part is provided for providing the second loading part 320, and the two parts are fixed together to form the loading table 300, thereby achieving the synchronous movement of the first loading part 310 and the second loading part 320.

As shown in fig. 2 and 3, the exposure mechanism further includes an exposure mounting frame, on which the first exposure component 210 and the second exposure component 220 are disposed, and an exposure driver for driving the exposure mounting frame and moving the exposure mounting frame along the work table 100.

In this embodiment, first exposure subassembly 210 and second exposure subassembly 220 all establish on the exposure mounting bracket, and when exposure driver drive exposure mounting bracket removed, the exposure mounting bracket drove first exposure subassembly 210 and second exposure subassembly 220 simultaneously and moved, improved the synchronous precision of the removal of first exposure subassembly 210 and second exposure subassembly 220, improved the exposure precision.

As shown in fig. 2 and 3, the exposure mechanism further includes a first mounting frame 121, a second mounting frame 122, a first driver and a second driver, the first exposure assembly 210 is disposed on the first mounting frame 121, the second exposure assembly 220 is disposed on the second mounting frame 122, the first driver is configured to drive the first mounting frame 121 to move along the worktable 100, and the second driver is configured to drive the second mounting frame 122 to move along the worktable 100.

As shown in fig. 2 and 3, in this embodiment, the first mounting frame 121 and the second mounting frame 122 are independently disposed, the first driver drives the first mounting frame 121 to move and drives the first exposure module 210 to move, and the second driver drives the second mounting frame 122 to move and drives the second exposure module 220 to move.

Here, the skilled person can match the first driver and the second driver in a controlled manner as required to synchronize the moving direction and the moving speed of the first exposure module 210 and the second exposure module 220.

Of course, if necessary, those skilled in the art can also match the first driver and the second driver in a controlled manner, so that the moving directions of the first exposure component 210 and the second exposure component 220 are opposite, for example, the upper first exposure component 210 moves towards the right, and the upper plate surface of the first to-be-exposed workpiece is exposed from left to right; the lower second exposure component 220 moves towards the left to expose the lower plate of the first to-be-exposed part from right to left, so as to meet the actual requirement, and the description is omitted here.

In addition, the exposure mounting bracket, the first mounting bracket 121 and the second mounting bracket 122 can be a marble beam structure when being specifically selected.

On the basis of any of the above embodiments, the loading mechanism further comprises a loading driver for driving the loading table 300 and moving the loading table 300 along the work table 100.

On the basis of any of the above embodiments, the loading mechanism further includes a locker for locking the loading table 300 and positioning the first loading part 310 or the second loading part 320 at the exposure region 110.

When the loading platform 300 moves to the first exposure position, the first loading portion 310 is located in the exposure area 110, the subsequent first exposure component 210 and the second exposure component 220 move and expose the first to-be-exposed workpiece of the first loading portion 310, and the position of the first loading portion 310 is unchanged, at this time, a locker is arranged to lock the loading platform 300 to prevent the loading platform 300 from moving, so that the position of the first loading portion 310 is unchanged, namely, the first to-be-exposed workpiece on the first loading portion 310 is stationary, and the exposure precision is prevented from being influenced by the shaking of the first to-be-exposed workpiece in the subsequent exposure process; when the exposure of the first member to be exposed is completed, the locker releases the loading stage 300, so that the loading stage 300 continues to operate next.

Further, the locking device can be a clasp or other locking devices.

On the basis of any of the above embodiments, the apparatus further comprises a sensing mechanism, wherein the sensing mechanism comprises a first sensing component and a second sensing component, the first sensing component is used for detecting the moving position of the first exposure component 210 and the moving position of the second exposure component 220, and the second sensing component is used for detecting the moving position of the loading platform 300.

On the basis of any of the above embodiments, the first exposure module 210 and the second exposure module 220 are both moved in the first direction along the table 100, and the loading table 300 is moved in the first direction along the table 100.

As shown in fig. 2 and 3, the first exposure module 210 and the second exposure module 220 move in synchronization and in the left-right direction, and the loading table 300 also moves in the left-right direction.

During exposure, the first loading part 310 loads a first to-be-exposed workpiece, the loading platform 300 moves to the left, the first to-be-exposed workpiece is located in the exposure area 110, the first exposure component 210 and the second exposure component 220 both move towards the right and expose the first to-be-exposed workpiece, meanwhile, the second loading part 320 loads a second to-be-exposed workpiece, after the exposure of the first to-be-exposed workpiece is completed, the loading platform 300 moves to the right, the second to-be-exposed workpiece is located in the exposure area 110, the first exposure component 210 and the second exposure component 220 both move towards the left and expose the second to-be-exposed workpiece, the exposed first exposure finished product is unloaded, the next first to-be-exposed workpiece is loaded, and the operation is repeated.

Of course, it may also be: the first exposure module 210 and the second exposure module 220 are both moved in the second direction along the table 100, and the loading table 300 is moved in the third direction along the table 100.

Optionally: the first exposure unit 210 and the second exposure unit 220 are synchronously moved back and forth along the table 100, and the loading table 300 is moved left and right along the table 100.

During exposure, the first loading part 310 loads a first workpiece to be exposed, the loading platform 300 moves to the left, the first workpiece to be exposed is located in the exposure area 110, the first exposure component 210 and the second exposure component 220 synchronously move forwards and expose the first workpiece to be exposed, meanwhile, the second loading part 320 loads a second workpiece to be exposed, after the exposure of the first workpiece to be exposed is completed, the loading platform 300 moves to the right, the second workpiece to be exposed is located in the exposure area 110, the first exposure component 210 and the second exposure component 220 synchronously move backwards and expose the second workpiece to be exposed, simultaneously unloads a first exposed finished product after the exposure is completed, and loads the next workpiece to be exposed, and the steps are repeated.

In addition to any of the above embodiments, the loading platform 300 is provided with a first guide rail, and the workbench 100 is provided with a first sliding chute matched with the first guide rail.

The first guide rail and the first sliding groove not only play a role in facilitating the matching and moving of the loading platform 300 and the workbench 100, but also can further improve the motion stability of the loading platform 300 and ensure the position stability of the first part to be exposed and the second part to be exposed, thereby improving the exposure accuracy.

On the basis of any of the above embodiments, the apparatus further includes a material pick and place mechanism, where the material pick and place mechanism includes a first pick and place device and a second pick and place device, the first pick and place device is used for picking and placing the first to-be-exposed part of the first loading portion 310, and the second pick and place device is used for picking and placing the second to-be-exposed part of the second loading portion 320.

Further, the first pick-and-place device and the second pick-and-place device adopt manipulators which are respectively arranged on the left side and the right side of the workbench 100, so that automatic operation is realized by matching with the left-and-right movement of the loading platform 300, and the automatic operation level is improved.

On the basis of any of the above embodiments, the first exposure component 210 includes a first exposure component and a second exposure component, the first exposure component has a plurality of first light source components, the first light source components are arranged in a row at intervals, the second exposure component has a plurality of second light source components, the second light source components are arranged in a row at intervals, the first light source components and the second light source components are arranged in parallel and staggered, and the arrangement position of one first light source component corresponds to the position of the gap between two second light source components; the second exposure module 220 can be configured similarly, and will not be described herein.

As shown in fig. 3, the first exposure component 210 includes a first exposure part and a second exposure part, the first exposure part and the second exposure part are arranged side by side in a left-right direction, six first light source parts are arranged on the first exposure part and are arranged in a row, six second light source parts are arranged on the second exposure part and are arranged in a row, the first exposure part and the second exposure part are arranged in a staggered manner, that is, the setting height of the first exposure part is higher than that of the second exposure part, so that the first light source part on the first exposure part corresponds to the setting position between two adjacent second light source parts on the second exposure part, when exposing, the exposure part between the first light source part and the second light source part on the first exposure part is spliced to form an exposure pattern, thereby realizing one-time exposure, without multiple exposure splicing, and improving the exposure efficiency.

Optionally, the first exposure module 210 and the second exposure module 220 form a maskless exposure system (DMD exposure system for short), the maskless exposure system amplifies an image through a projection objective lens to realize one-time exposure, the number of the first light source devices and the second light source devices of the DMD exposure system is determined according to the size of an exposure pattern, and the exposure precision is higher.

As shown in the embodiment of fig. 1, there is also provided a double-sided exposure method which can be applied to the double-sided exposure machine of the double loader according to any one of the above embodiments, including the steps of:

(S1), the first exposure module 210 is located at the first initial position, the second exposure module 220 is located at the second initial position, the loading stage 300 is located at the second exposure position, and the first to-be-exposed member is loaded on the first loading portion 310 of the loading stage 300;

(S2), the loading stage 300 moves to the first exposure position and the first to-be-exposed member is positioned in the exposure region 110;

(S3), the first exposure component 210 moves to the first preset position, and the second exposure component 220 moves to the second preset position, and the first exposure component is exposed to obtain a first exposure product; simultaneously, the second member to be exposed is loaded in the second loading part 320;

(S4), the loading stage 300 moves to the second exposure position and the second member to be exposed is located in the exposure region 110;

(S5), the first exposure component 210 moves to the first initial position and the second exposure component 220 moves to the second initial position, and the second exposure component is exposed to obtain a second exposure product; simultaneously unloading the first exposure finished product of the first loading part 310 and loading the next first to-be-exposed piece;

(S6), the loading stage 300 moves to the first exposure position, and the second exposure product of the second loading part 320 is unloaded.

Can treat the tow sides of exposing the piece to first piece or the second of exposing simultaneously and expose, and the first piece that exposes carries out the second simultaneously and treats loading of exposing the piece or the second finished product that has accomplished the exposure unloads, has improved time utilization, has improved exposure efficiency, and is convenient for realize automatic operation.

It should be noted that the steps (S1) to (S6) are for convenience of description, and those skilled in the art can make appropriate adjustments as needed to meet actual operation requirements during specific operations.

The second loading part 320 may also load the second member to be exposed as the initial time;

for example, the unloading of the first exposure completed product and the loading of the next first member to be exposed may be performed simultaneously while the second member to be exposed is exposed; or only loading the next first workpiece to be exposed during exposure, and completing unloading the first exposed finished product in the previous step; of course, the unloading of the first exposure finished product can also be carried out during exposure, and then the loading of the next first piece to be exposed is carried out;

the reasonable operation steps can be determined by the skilled person according to the needs so as to be convenient for production and operation, and the exposure time can be reasonably utilized to carry out other synchronous operations, thereby improving the exposure efficiency.

The technical features of the embodiments described above may be arbitrarily combined, and for the sake of brevity, all possible combinations of the technical features in the embodiments described above are not described, but should be considered as being within the scope of the present specification as long as there is no contradiction between the combinations of the technical features.

The above-mentioned embodiments only express several embodiments of the present invention, and the description thereof is more specific and detailed, but not construed as limiting the scope of the invention. It should be noted that, for a person skilled in the art, several variations and modifications can be made without departing from the inventive concept, which falls within the scope of the present invention. Therefore, the protection scope of the present patent shall be subject to the appended claims.

Claims (10)

1. A double-sided exposure machine of a double loading part, comprising:
the workbench is provided with an exposure through hole;
the exposure mechanism comprises a first exposure component and a second exposure component, the first exposure component and the second exposure component are respectively arranged on two sides of the workbench and can move along the workbench, the first exposure component and the second exposure component move and form an exposure area on the workbench, and the exposure area is arranged corresponding to the exposure through hole; and
the loading mechanism comprises a loading platform, the loading platform is provided with a first loading part and a second loading part, the first loading part is used for loading a first piece to be exposed, the second loading part is used for loading a second piece to be exposed, the first loading part and the second loading part are arranged at intervals, the loading platform can move along the workbench and enables the first loading part or the second loading part to move to the exposure area, and the first exposure component and the second exposure component move and expose the first piece to be exposed or the second piece to be exposed in the exposure area;
during exposure, the loading platform moves leftwards, the first piece to be exposed is located in the exposure area, the first exposure component and the second exposure component both move rightwards and expose the first piece to be exposed, and meanwhile, the second loading part loads the second piece to be exposed; and after the exposure of the first part to be exposed is finished, the loading platform moves to the right to enable the second part to be exposed to be positioned in the exposure area, the first exposure component and the second exposure component both move towards the left to expose the second part to be exposed, meanwhile, a first exposed finished product after the exposure is finished is unloaded, and the first loading part loads the next part to be exposed.
2. The double-sided exposure machine of claim 1, wherein the exposure mechanism further comprises an exposure mounting frame and an exposure driver, the first exposure component and the second exposure component are both disposed on the exposure mounting frame, and the exposure driver is configured to drive the exposure mounting frame and move the exposure mounting frame along the worktable.
3. The double-sided exposure machine of claim 1, wherein the exposure mechanism further comprises a first mounting frame, a second mounting frame, a first driver and a second driver, the first exposure component is disposed on the first mounting frame, the second exposure component is disposed on the second mounting frame, the first driver is configured to drive the first mounting frame to move along the worktable, and the second driver is configured to drive the second mounting frame to move along the worktable.
4. The double-loading-section double-sided exposure machine according to claim 1, wherein the loading mechanism further comprises a loading driver for driving the loading table and moving the loading table along the work table.
5. The double-side exposure machine according to claim 1, wherein the loading mechanism further comprises a lock for locking the loading stage and positioning the first loading part or the second loading part in the exposure region.
6. The double-sided exposure machine of a double loading section according to claim 1, further comprising a sensing mechanism including a first sensing member for detecting a moving position of the first exposure member and a moving position of the second exposure member and a second sensing member for detecting a moving position of the loading stage.
7. A double-side exposure machine of a double loader according to claim 1, wherein the first exposure module and the second exposure module each move in a first direction along the table, and the loader moves in the first direction along the table;
or the first exposure component and the second exposure component move along the workbench in a second direction, and the loading table moves along the workbench in a third direction.
8. A double-side exposure machine according to claim 1, wherein the loading stage is provided with a first guide rail, and the table is provided with a first chute engaged with the first guide rail.
9. A double-sided exposure machine according to any one of claims 1 to 8, further comprising a material pick and place mechanism including a first pick and place device for picking and placing the first member to be exposed of the first loading section and a second pick and place device for picking and placing the second member to be exposed of the second loading section.
10. A double-sided exposure method applicable to the double-sided exposure machine of the double loader according to any one of claims 1 to 9, comprising the steps of:
(S1) the first exposure component is located at the first initial position, the second exposure component is located at the second initial position, the loading platform is located at the second exposure position, and the first piece to be exposed is loaded at the first loading part of the loading platform;
(S2), the loading table is moved to the first exposure position and the first member to be exposed is located in the exposure area;
(S3), moving the first exposure component to a first preset position, moving the second exposure component to a second preset position, and exposing the first to-be-exposed piece to obtain a first exposed finished product; simultaneously loading a second member to be exposed on a second loading part;
(S4), the loading table is moved to the second exposure position and the second member to be exposed is located in the exposure area;
(S5), the first exposure component moves to the first initial position and the second exposure component moves to the second initial position, and the second exposure component is exposed to obtain a second exposure product; simultaneously unloading the first exposure finished product of the first loading part and loading the next first piece to be exposed;
(S6), the loading stage moves to the first exposure position, and the second exposed finished product of the second loading part is unloaded.
CN201810836043.1A 2018-07-26 2018-07-26 Double-side exposure machine with double loading parts and double-side exposure method CN108873622B (en)

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