CN105439467A - High-transmittance, double-silver and low-emissivity coated glass facilitating subsequent processing and production process of high-transmittance, double-silver and low-emissivity coated glass - Google Patents
High-transmittance, double-silver and low-emissivity coated glass facilitating subsequent processing and production process of high-transmittance, double-silver and low-emissivity coated glass Download PDFInfo
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- CN105439467A CN105439467A CN201510843711.XA CN201510843711A CN105439467A CN 105439467 A CN105439467 A CN 105439467A CN 201510843711 A CN201510843711 A CN 201510843711A CN 105439467 A CN105439467 A CN 105439467A
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3626—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer one layer at least containing a nitride, oxynitride, boronitride or carbonitride
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3636—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer one layer at least containing silicon, hydrogenated silicon or a silicide
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3639—Multilayers containing at least two functional metal layers
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3652—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the coating stack containing at least one sacrificial layer to protect the metal from oxidation
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3657—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties
- C03C17/366—Low-emissivity or solar control coatings
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3681—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating being used in glazing, e.g. windows or windscreens
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
- C03C2218/156—Deposition methods from the vapour phase by sputtering by magnetron sputtering
Abstract
The invention discloses high-transmittance, double-silver and low-emissivity coated glass facilitating subsequent processing and a production process of the high-transmittance, double-silver and low-emissivity coated glass. For severe cold regions in northeast China, common double-silver glass prevents most sunlight from entering a room due to very low shading coefficient of the glass, and the energy-saving effect of the glass in winter is not ideal. The high-transmittance, double-silver and low-emissivity coated glass comprises a glass substrate (1) which is deposited with a magnetron sputtering coating technology; a first base layer dielectric medium composite layer (2), a second base layer dielectric medium composite layer (3), a first silver layer (4), a first barrier layer (5), an interlayer dielectric medium composite layer (6), a second silver layer (7), a second barrier layer (8), a first upper layer dielectric medium composite layer (9), a second upper layer dielectric medium composite layer (10) and a protection layer (11) are arranged from inside to outside sequentially. The invention applies to the high-transmittance, double-silver and low-emissivity coated glass facilitating subsequent processing and the production process of the high-transmittance, double-silver and low-emissivity coated glass.
Description
technical field:
the present invention relates to a kind of can height thoroughly two silver low-radiation coated glass and the production technique thereof of following process.
background technology:
low emissivity (Low-E) glass is a kind of coated glass.By having the functional membrane of Low emissivity characteristic on float glass substrate plated surface, reduce the radiant ratio of glass surface thus the energy-efficient performance of raising glass.Low radiation coated glass can intercept the secondary rays heat sent after object is shined upon in summer, can reduce indoor heat same winter and outwards run off, thus play the object of heat insulation heat preservation energy-saving consumption reduction.Low emissivity glass is described as 21 century optimal building glass material with the energy-conserving and environment-protective performance of its excellence.Along with improving constantly of requiring decorating building, the usage quantity of low emissivity glass in building trade also constantly increases.Low emissivity glass common is on the market mainly Dan Yin and two silver at present, and wherein the application of Dan Yin is occupied an leading position.Relative to single silver products, two silver-layer low-radiation glass has better photo-thermal Selection radio, lower radiant ratio, more excellent energy-saving effect and comfortableness.Along with the continuous increase of social energy consumption, the continuous appearance of relevant energy saving policy, more and more tighter at energy-saving monitoring, today that power conservation requirement is more and more higher, single silver-colored Low-E double glazing can not be satisfied the demand well, and domestic construction energy-saving glass has formed the trend to two silver-colored Low-E glass development.In severe cold area, China northeast, common two silver, due to its very low shading coefficient, prevent most of sunlight to enter indoor, so its winter saving energy effect is unsatisfactory.So the height researching and developing severe cold area, a applicable northeast is saturating, shading coefficient is high, and two silver low-radiation coated glass that radiant ratio is low are imperative.
summary of the invention:
the object of this invention is to provide a kind of can height thoroughly two silver low-radiation coated glass and the production technique thereof of following process.
above-mentioned object is realized by following technical scheme:
a kind of can height thoroughly two silver low-radiation coated glass of following process; its composition comprises: glass substrate; described glass substrate adopts magnetron sputtering plating process deposits, is provided with first basic unit's dielectric combination layer, second basic unit's dielectric combination layer, the first silver layer, the first blocking layer, interlayer dielectric combination layer, the second silver layer, the second blocking layer, the first upper strata dielectric combination layer, the second upper strata dielectric combination layer, protective layer from inside to outside successively.
described can height two silver low-radiation coated glass thoroughly of following process, described glass substrate is common white glass or low iron ultra-clear glasses, and thickness is 4 ~ 12mm.
described can height two silver low-radiation coated glass thoroughly of following process, first described basic unit's dielectric combination layer, second basic unit's dielectric combination layer, interlayer dielectric combination layer, first upper strata dielectric combination layer, second upper strata dielectric combination layer is made up of metal oxide or nonmetal oxide or metal nitride or non-metal nitride, the thickness of first described basic unit's dielectric combination layer is 15 ~ 25nm, the thickness of second described basic unit's dielectric combination layer is 10 ~ 25nm, the thickness of described interlayer dielectric combination layer is 50 ~ 90nm, the thickness of the first described upper strata dielectric combination layer is 5 ~ 15nm, the thickness of the second described upper strata dielectric combination layer is 20 ~ 35nm.
described can height two silver low-radiation coated glass thoroughly of following process, the thickness of the first described silver layer is 7 ~ 15nm, and the thickness of the second described silver layer is 7 ~ 15nm.
described can height two silver low-radiation coated glass thoroughly of following process, the first described blocking layer, second layer blocking layer is metal or metal oxide or metal nitride, and the thickness on the first described blocking layer is 0.5 ~ 1.5nm, and the thickness on the second described blocking layer is 0.5 ~ 1.5nm.
described can height two silver low-radiation coated glass thoroughly of following process, described protective layer is metal oxide or nonmetal oxide or several hopcalite, and the thickness of described protective layer is 1.5 ~ 3nm.
described can the production technique of height two silver low-radiation coated glass thoroughly of following process, the method comprises the steps:
(1) cleaned up by 4mm ~ 12mm glass substrate, and the background vacuum of off-line magnetron sputtering equipment is arranged on 10-6mbar, linear velocity is set to 4.0m/min;
(2) glass substrate is conveyed in plated film chamber, dual rotary negative electrode, MF reactive magnetron sputtering deposit first basic unit's dielectric combination layer, arranging power is 90 ~ 150kW, and dual rotary negative electrode, MF reactive magnetron sputtering deposit second basic unit's dielectric combination layer, and arranging power is 30 ~ 70kW;
(3) planar cathode or rotating cathode, direct current or direct current add pulsed magnetron sputtering and deposit the first silver layer, and arranging power is 5 ~ 10kW, and planar cathode or rotating cathode, direct current or direct current add pulsed magnetron sputtering and deposit the first blocking layer, and arranging power is 8 ~ 24kW;
(4) dual rotary negative electrode, MF reactive magnetron sputtering deposition interlayer dielectric combination layer, arranging power is 200 ~ 280kW;
(5) planar cathode or rotating cathode, direct current or direct current add pulsed magnetron sputtering and deposit the second silver layer, and arranging power is 5 ~ 10kW, and planar cathode or rotating cathode, direct current or direct current add pulsed magnetron sputtering and deposit the second blocking layer, and arranging power is 8 ~ 24kW;
(6) dual rotary negative electrode, MF reactive magnetron sputtering deposit the first upper strata dielectric combination layer, and arranging power is 20 ~ 30kW, and dual rotary negative electrode, MF reactive magnetron sputtering deposit the second upper strata dielectric combination layer, and arranging power is 120 ~ 200kW;
(7) dual rotary negative electrode, MF reactive magnetron sputtering Deposition of protective layer, arranging power is 20 ~ 40kW.
described can the production technique of height two silver low-radiation coated glass thoroughly of following process, continue to carry out between described step (2) to (7).
described can the production technique of height two silver low-radiation coated glass thoroughly of following process, described dual rotary negative electrode, MF reactive magnetron sputtering carry out in argon nitrogen or argon oxygen environment, argon oxygen is than being 200sccm:1000sccm, argon nitrogen is than being 400sccm:800sccm, after passing into working gas, operating air pressure is 3.0 × 10-3 ~ 5.5 × 10-3mbar.
described can the production technique of height two silver low-radiation coated glass thoroughly of following process, described planar cathode or rotating cathode, direct current or direct current add that pulsed magnetron sputtering carries out in argon gas or argon nitrogen or argon oxygen environment, after passing into working gas, operating air pressure is 2.0 × 10-3 ~ 3.5 × 10-3mbar.
beneficial effect of the present invention:
1, the present invention is by controlling the particular design on blocking layer and coating growth, makes it have better provide protection to Ag layer, solves the problem that Ag layer is easily destroyed in the process of Post isothermal treatment.
, the present invention reasonably designed by metal or nonmetal oxide or layer of nitride film, make whole rete transmitance reach more than 78%, shading coefficient reaches more than 0.48.
, the present invention by appropriate design to infrared reflecting layer silver layer, make whole rete have the radiant ratio (≤0.06) lower than traditional double silver while high permeability, very high-sunshade coefficient very much reaching.
, the present invention by controlling the design of protective layer and coating growth, make rete corrosion-resistant, wear resistance, scratch resistant performance improves greatly, is convenient to follow-up deep processing process.
, provided by the invention can following process height thoroughly two silver low-radiation coated glass outward appearance be muted color, stable optical performance, during conjunction hollow, coated glass can put two, also can put three.
accompanying drawing illustrates:
accompanying drawing 1 is structural representation of the present invention.
accompanying drawing 2 is 300 ~ 2500nm optical transmission spectra figure of the present invention.
accompanying drawing 3 is 300 ~ 800nm optical transmission spectra figure of the embodiment of the present invention 12.
accompanying drawing 4 is 300 ~ 800nm glass surface reflectance spectrum figure of the embodiment of the present invention 12.
embodiment:
embodiment 1:
a kind of can height thoroughly two silver low-radiation coated glass of following process; its composition comprises: glass substrate; described glass substrate adopts magnetron sputtering plating process deposits, is provided with first basic unit's dielectric combination layer, second basic unit's dielectric combination layer, the first silver layer, the first blocking layer, interlayer dielectric combination layer, the second silver layer, the second blocking layer, the first upper strata dielectric combination layer, the second upper strata dielectric combination layer, protective layer from inside to outside successively.
embodiment 2:
according to embodiment 1 can height thoroughly two silver low-radiation coated glass of following process, described glass substrate is common white glass or low iron ultra-clear glasses, and thickness is 4 ~ 12mm.
embodiment 3:
according to embodiment 1 or 2 can height thoroughly two silver low-radiation coated glass of following process, first described basic unit's dielectric combination layer, second basic unit's dielectric combination layer, interlayer dielectric combination layer, first upper strata dielectric combination layer, second upper strata dielectric combination layer is made up of metal oxide or nonmetal oxide or metal nitride or non-metal nitride, such as ZnSnOx, ZnO, AZO, SnO2, TiO2, SiO2, BiO2, Al2O3, ZnAl2O4, Nb2O5, Si3N4 etc., the thickness of first described basic unit's dielectric combination layer is 15 ~ 25nm, the thickness of second described basic unit's dielectric combination layer is 10 ~ 25nm, the thickness of described interlayer dielectric combination layer is 50 ~ 90nm, the thickness of the first described upper strata dielectric combination layer is 5 ~ 15nm, the thickness of the second described upper strata dielectric combination layer is 20 ~ 35nm.
embodiment 4:
according to embodiment 1 or 2 or 3 or 4 can height thoroughly two silver low-radiation coated glass of following process, the thickness of the first described silver layer is 7 ~ 15nm, and the thickness of the second described silver layer is 7 ~ 15nm.
embodiment 5:
according to embodiment 1 or 2 or 3 or 4 or 5 can height thoroughly two silver low-radiation coated glass of following process, the first described blocking layer, second layer blocking layer is metal or metal oxide or metal nitride, such as Ti, TiOx, NiCr, NiCrOx, NiCrNx, NbNx, Nb2O5 etc., the thickness on the first described blocking layer is 0.5 ~ 1.5nm, and the thickness on the second described blocking layer is 0.5 ~ 1.5nm.
embodiment 6:
according to embodiment 1 or 2 or 3 or 4 or 5 can height thoroughly two silver low-radiation coated glass of following process; described protective layer is metal oxide or nonmetal oxide or several hopcalite; such as; TiO2, Al2O3, SiO2, ZrO2, ZrSiOxNy etc., the thickness of described protective layer is 1.5 ~ 3nm.
embodiment 7:
what one of embodiment 1-6 was described can the production technique of height two silver low-radiation coated glass thoroughly of following process, and the method comprises the steps:
(1) cleaned up by 4mm ~ 12mm glass substrate, and the background vacuum of off-line magnetron sputtering equipment is arranged on 10-6mbar, linear velocity is set to 4.0m/min;
(2) glass substrate is conveyed in plated film chamber, dual rotary negative electrode, MF reactive magnetron sputtering deposit first basic unit's dielectric combination layer, arranging power is 90 ~ 150kW, and dual rotary negative electrode, MF reactive magnetron sputtering deposit second basic unit's dielectric combination layer, and arranging power is 30 ~ 70kW;
(3) planar cathode or rotating cathode, direct current or direct current add pulsed magnetron sputtering and deposit the first silver layer, and arranging power is 5 ~ 10kW, and planar cathode or rotating cathode, direct current or direct current add pulsed magnetron sputtering and deposit the first blocking layer, and arranging power is 8 ~ 24kW;
(4) dual rotary negative electrode, MF reactive magnetron sputtering deposition interlayer dielectric combination layer, arranging power is 200 ~ 280kW;
(5) planar cathode or rotating cathode, direct current or direct current add pulsed magnetron sputtering and deposit the second silver layer, and arranging power is 5 ~ 10kW, and planar cathode or rotating cathode, direct current or direct current add pulsed magnetron sputtering and deposit the second blocking layer, and arranging power is 8 ~ 24kW;
(6) dual rotary negative electrode, MF reactive magnetron sputtering deposit the first upper strata dielectric combination layer, and arranging power is 20 ~ 30kW, and dual rotary negative electrode, MF reactive magnetron sputtering deposit the second upper strata dielectric combination layer, and arranging power is 120 ~ 200kW;
(7) dual rotary negative electrode, MF reactive magnetron sputtering Deposition of protective layer, arranging power is 20 ~ 40kW.
embodiment 8:
according to embodiment 7 can the production technique of the saturating single silver low-radiation coated glass of height of following process, continue to carry out between described step (2) to (7).
embodiment 9:
according to embodiment 7 or 8 can the production technique of the saturating two silver low-radiation coated glass of height of following process, described dual rotary negative electrode, MF reactive magnetron sputtering carry out in argon nitrogen or argon oxygen environment, argon oxygen is than being 200sccm:1000sccm, argon nitrogen is than being 400sccm:800sccm, after passing into working gas, operating air pressure is 3.0 × 10-3 ~ 5.5 × 10-3mbar.
embodiment 10:
according to embodiment 7 or 8 or 9 can the production technique of the saturating two silver low-radiation coated glass of height of following process, described planar cathode or rotating cathode, direct current or direct current add that pulsed magnetron sputtering carries out in argon gas or argon nitrogen or argon oxygen environment, after passing into working gas, operating air pressure is 2.0 × 10-3 ~ 3.5 × 10-3mbar.
embodiment 11:
described can height two silver low-radiation coated glass thoroughly of following process, for visible ray (wavelength is from 380nm-780nm) transmitance between 78% ~ 81%, glass surface reflection≤8.0%; Under 6Low-E#2-12A-6C configuration, U value < 1.7, radiant ratio≤0.06, sunshade Sc>=0.48, is applicable to severe cold area, northeast and uses; Under 6C-12A-6Low-E#3 configuration, U value < 1.7, radiant ratio≤0.06, sunshade Sc>=0.56, is applicable to severe cold area, northeast and uses.
embodiment 12:
described can height two silver low-radiation coated glass thoroughly of following process, select glass substrate/Si3N4/ZnSnOx/Ag/Ti/ZnSnOx/Ag/Ti/ZnSnOx/Si3N4/ZrO2;
wherein, the thickness of glass substrate is 6mm common white glass;
first basic unit's dielectric combination layer is silicon nitride (Si3N4), and thicknesses of layers is 20 ~ 22nm;
second basic unit's dielectric combination layer is zinc-tin oxide (ZnSnOx), and thicknesses of layers is 17 ~ 19nm;
first silver layer thicknesses of layers is 8.5 ~ 9nm;
first blocking layer is titanium (Ti), and thicknesses of layers is 0.8 ~ 1.0nm;
interlayer dielectric barrier is zinc-tin oxide (ZnSnOx), and thicknesses of layers is 76 ~ 78nm;
second silver layer thicknesses of layers is 10.5 ~ 11nm;
second blocking layer is titanium (Ti), and thicknesses of layers is 1.0 ~ 1.1nm;
first upper strata dielectric combination layer is zinc-tin oxide (ZnSnOx), and thicknesses of layers is 8 ~ 8.5nm;
second upper strata dielectric combination layer is silicon nitride (Si3N4), and thicknesses of layers is 27 ~ 28nm;
protective layer is zirconium white (ZrO2), and thicknesses of layers is 2.4nm.
the complete processing of above-mentioned rete is:
film plating substrate adopts 6mm common white glass, and filming equipment is many negative electrodes magnetron sputtering film production line, and glass substrate needs before entering plated film chamber to clean up with ultrapure water, and magnetron sputtering plating chamber base vacuum is set to 10-6mbar.Linear velocity is set to 4m/min;
all silicon nitrides (Si3N4) series of strata adopt intermediate frequency power supply to add rotating cathode sputtering sedimentation in argon nitrogen atmosphere, argon nitrogen ratio is 400sccm:800sccm, it is 120kw that first basic unit's dielectric combination layer arranges power, and it is 160kw that the second upper strata dielectric combination layer arranges power;
all zinc oxide (ZnO), zinc-tin oxide (ZnSnOx) series of strata adopt intermediate frequency power supply to add rotating cathode sputtering sedimentation in argon oxygen atmosphere, argon oxygen ratio is 200sccm:1000sccm, second basic unit's dielectric combination layer arranges power 50kw, interlayer dielectric combination layer arranges power 240kw, and it is 24kw that the first upper strata dielectric combination layer arranges power;
zirconium white (ZrO2) series of strata adopt intermediate frequency power supply to add rotating cathode sputtering sedimentation in argon oxygen atmosphere, and argon oxygen ratio is 600sccm:200sccm, and it is 30kw that protective layer arranges power;
silver (Ag) layer adopts direct supply to add planar cathode sputtering sedimentation in argon atmosphere, and argon gas intake is 800sccm, and it is 6kw that the first silver medal (Ag) layer arranges power, and it is 7.5kw that the second silver medal (Ag) layer arranges power.
titanium (Ti) layer adopts direct supply to add planar cathode sputtering sedimentation in argon atmosphere, and argon gas intake is 800sccm, and it is 8kw that the first titanium (Ti) layer arranges power, and it is 7.5kw that the second titanium (Ti) layer arranges power.
the present embodiment provide can the height of following process thoroughly two silver low-radiation coated glass (6mm common white glass) test result is as follows:
| Color value | Before tempering | After tempering |
| T | 70.2% | 80.5% |
| a*t | -2.8 | -1.6 |
| b*t | -1.5 | -0.4 |
| Rg | 6.8% | 7.2% |
| a*g | 3.6 | 1.1 |
| b*g | -10.0 | -6.0 |
| Rf | 5.3% | 6.2% |
| a*f | -2.9 | -3.2 |
| b*f | -5.8 | -3.8 |
300 ~ 800nm optical transmission spectra figure is shown in accompanying drawing 3, and glass surface reflectance spectrum figure is shown in accompanying drawing 4.Under 6Low-E#2-12A-6C configuration, visible light transmissivity is 71.7%, and outdoor reflectivity 13%, U value is 1.66, and shading coefficient is 0.50; Under 6C-12A-6Low-E3# configuration, visible light transmissivity is 71.7%, and outdoor reflectivity 14%, U value is 1.66, and shading coefficient is 0.57.
Claims (10)
1. one kind can height thoroughly two silver low-radiation coated glass of following process; its composition comprises: glass substrate; it is characterized in that: described glass substrate adopts magnetron sputtering plating process deposits, is provided with first basic unit's dielectric combination layer, second basic unit's dielectric combination layer, the first silver layer, the first blocking layer, interlayer dielectric combination layer, the second silver layer, the second blocking layer, the first upper strata dielectric combination layer, the second upper strata dielectric combination layer, protective layer from inside to outside successively.
2. according to claim 1 can height thoroughly two silver low-radiation coated glass of following process, it is characterized in that: described glass substrate is common white glass or low iron ultra-clear glasses, and thickness is 4 ~ 12mm.
3. according to claim 1 and 2 can height thoroughly two silver low-radiation coated glass of following process, it is characterized in that: first described basic unit's dielectric combination layer, second basic unit's dielectric combination layer, interlayer dielectric combination layer, first upper strata dielectric combination layer, second upper strata dielectric combination layer is made up of metal oxide or nonmetal oxide or metal nitride or non-metal nitride, the thickness of first described basic unit's dielectric combination layer is 15 ~ 25nm, the thickness of second described basic unit's dielectric combination layer is 10 ~ 25nm, the thickness of described interlayer dielectric combination layer is 50 ~ 90nm, the thickness of the first described upper strata dielectric combination layer is 5 ~ 15nm, the thickness of the second described upper strata dielectric combination layer is 20 ~ 35nm.
4. according to claim 1 or 2 or 3 can height thoroughly two silver low-radiation coated glass of following process, it is characterized in that: the thickness of the first described silver layer is 7 ~ 15nm, the thickness of the second described silver layer is 7 ~ 15nm.
5. according to claim 1 or 2 or 3 or 4 can height thoroughly two silver low-radiation coated glass of following process, it is characterized in that: the first described blocking layer, second layer blocking layer is metal or metal oxide or metal nitride, the thickness on the first described blocking layer is 0.5 ~ 1.5nm, and the thickness on the second described blocking layer is 0.5 ~ 1.5nm.
6. according to claim 1 or 2 or 3 or 4 or 5 can height thoroughly two silver low-radiation coated glass of following process; it is characterized in that: described protective layer is metal oxide or nonmetal oxide or several hopcalite, and the thickness of described protective layer is 1.5 ~ 3nm.
7. what one of claim 1-6 was described can the production technique of height two silver low-radiation coated glass thoroughly of following process, it is characterized in that: the method comprises the steps:
(1) cleaned up by 4mm ~ 12mm glass substrate, and the background vacuum of off-line magnetron sputtering equipment is arranged on 10-6mbar, linear velocity is set to 4.0m/min;
(2) glass substrate is conveyed in plated film chamber, dual rotary negative electrode, MF reactive magnetron sputtering deposit first basic unit's dielectric combination layer, arranging power is 90 ~ 150kW, and dual rotary negative electrode, MF reactive magnetron sputtering deposit second basic unit's dielectric combination layer, and arranging power is 30 ~ 70kW;
(3) planar cathode or rotating cathode, direct current or direct current add pulsed magnetron sputtering and deposit the first silver layer, and arranging power is 5 ~ 10kW, and planar cathode or rotating cathode, direct current or direct current add pulsed magnetron sputtering and deposit the first blocking layer, and arranging power is 8 ~ 24kW;
(4) dual rotary negative electrode, MF reactive magnetron sputtering deposition interlayer dielectric combination layer, arranging power is 200 ~ 280kW;
(5) planar cathode or rotating cathode, direct current or direct current add pulsed magnetron sputtering and deposit the second silver layer, and arranging power is 5 ~ 10kW, and planar cathode or rotating cathode, direct current or direct current add pulsed magnetron sputtering and deposit the second blocking layer, and arranging power is 8 ~ 24kW;
(6) dual rotary negative electrode, MF reactive magnetron sputtering deposit the first upper strata dielectric combination layer, and arranging power is 20 ~ 30kW, and dual rotary negative electrode, MF reactive magnetron sputtering deposit the second upper strata dielectric combination layer, and arranging power is 120 ~ 200kW;
(7) dual rotary negative electrode, MF reactive magnetron sputtering Deposition of protective layer, arranging power is 20 ~ 40kW.
8. according to claim 7 can the production technique of the saturating two silver low-radiation coated glass of height of following process, it is characterized in that: continue to carry out between described step (2) to (7).
9. according to claim 7 or 8 can the production technique of the saturating two silver low-radiation coated glass of height of following process, it is characterized in that: described dual rotary negative electrode, MF reactive magnetron sputtering carry out in argon nitrogen or argon oxygen environment, argon oxygen is than being 200sccm:1000sccm, argon nitrogen is than being 400sccm:800sccm, after passing into working gas, operating air pressure is 3.0 × 10-3 ~ 5.5 × 10-3mbar.
10. according to claim 7 or 8 or 9 can the production technique of the saturating two silver low-radiation coated glass of height of following process, it is characterized in that: described planar cathode or rotating cathode, direct current or direct current add that pulsed magnetron sputtering carries out in argon gas or argon nitrogen or argon oxygen environment, after passing into working gas, operating air pressure is 2.0 × 10-3 ~ 3.5 × 10-3mbar.
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112125534A (en) * | 2020-09-02 | 2020-12-25 | 湖北亿钧耀能新材股份公司 | Preparation method of coated glass |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101417520A (en) * | 2008-10-17 | 2009-04-29 | 湖南玉丰真空科学技术有限公司 | Multilayer medium double silver layer low-radiation film and production technique thereof |
| CN101830643A (en) * | 2010-05-28 | 2010-09-15 | 中航三鑫股份有限公司 | Double silver coating glass and manufacturing method thereof |
| CN201817406U (en) * | 2010-09-01 | 2011-05-04 | 林嘉宏 | Double silver low emissivity glass capable of being processed in different places |
| CN104494237A (en) * | 2014-12-01 | 2015-04-08 | 上海北玻镀膜技术工业有限公司 | High-transmission low-radiation double silver coated glass and manufacturing method thereof |
-
2015
- 2015-11-26 CN CN201510843711.XA patent/CN105439467A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101417520A (en) * | 2008-10-17 | 2009-04-29 | 湖南玉丰真空科学技术有限公司 | Multilayer medium double silver layer low-radiation film and production technique thereof |
| CN101830643A (en) * | 2010-05-28 | 2010-09-15 | 中航三鑫股份有限公司 | Double silver coating glass and manufacturing method thereof |
| CN201817406U (en) * | 2010-09-01 | 2011-05-04 | 林嘉宏 | Double silver low emissivity glass capable of being processed in different places |
| CN104494237A (en) * | 2014-12-01 | 2015-04-08 | 上海北玻镀膜技术工业有限公司 | High-transmission low-radiation double silver coated glass and manufacturing method thereof |
Non-Patent Citations (2)
| Title |
|---|
| 杨修春: "《新型建筑玻璃》", 31 January 2009, 中国电力出版社 * |
| 白振中: "《工程玻璃深加工技术手册》", 30 April 2014, 中国建材工业出版社 * |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112125534A (en) * | 2020-09-02 | 2020-12-25 | 湖北亿钧耀能新材股份公司 | Preparation method of coated glass |
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