CN101417520A - Multilayer medium double silver layer low-radiation film and production technique thereof - Google Patents
Multilayer medium double silver layer low-radiation film and production technique thereof Download PDFInfo
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- CN101417520A CN101417520A CNA2008101433457A CN200810143345A CN101417520A CN 101417520 A CN101417520 A CN 101417520A CN A2008101433457 A CNA2008101433457 A CN A2008101433457A CN 200810143345 A CN200810143345 A CN 200810143345A CN 101417520 A CN101417520 A CN 101417520A
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Abstract
A double silver-layer low-radiation film of a multi-layer medium and the producing technology pertain to the double silver-layer low-radiation film and the producing technology. The invention mainly aims at solving the technical problems that the product of the existing double silver-layer low-e film can not give consideration to two indicators of transmittance and sunshade coefficient simultaneously, and the like. The points of the technical proposal are as follows: the double silver-layer low-radiation film-coating product is made by the method of magnetron sputtering film-coating in vacuum. The product includes a substrate, a multi-layer medium film layer 1, an Ag layer, a barrier layer, a multi-layer medium film layer 2, the Ag layer, the barrier layer, the multi-layer medium film layer 3, and Si3N4. The composing mode of the multi-layer medium film layers 1, 2 or 3 includes TiOx/SnOy/ZnO: Al, SnOy/Si3N4/SnOy, ZnOx/SnOy/ZnOx, TiOx/SnOy/TiOx, or NbOy/Si3N4/NbOy. The technology has higher transmittance and lower sunshade coefficient simultaneously, thus being convenient to the adjustment the appearance color and the indoor color. The product can be widely applied in the fields of buildings and windscreens of vehicles and ships, and can also be used as a sticking film by being coated on the soft substrate.
Description
Technical field
The present invention relates to a kind of pair of silver low radiation film.
Background technology
At present, the low-emission coated product on the market can be divided into two big classes substantially: a class is a high visible light transmissivity, the high-sunshade coefficient; Another kind of is the low visible light transmitance, lower shading coefficient.Market also lacks a kind of product, has high visible light transmissivity, satisfies low shading coefficient simultaneously, promptly reaches higher selection coefficient.
The membrane structure of traditional low-emission coated product is generally:
Glass/bottom dielectric film/barrier layer/Ag layer/barrier layer/top layer dielectric layer;
Or: glass/bottom dielectric film/Ag layer/barrier layer/intermediate layer deielectric-coating/Ag layer/barrier layer/top layer dielectric layer.
In above-mentioned two kinds of structures, a common characteristic is arranged, deielectric-coating all adopts individual layer.Product can not be taken into account transmitance and two indexs of shading coefficient simultaneously, selects coefficient can only reach 1.4.
Summary of the invention
The purpose of this invention is to provide a kind of higher transmittance that has, have the multilayer medium double silver layer low-radiation film of low shading coefficient simultaneously.
The technical solution adopted for the present invention to solve the technical problems is: the rete that adopts following membrane structure to make: substrate/multilayer dielectricity rete 1/Ag layer/barrier layer/multilayer dielectricity rete 2/Ag layer/barrier layer/multilayer dielectricity rete 3/Si
3N
4Described multilayer dielectricity rete 1,2 or 3 compositional model comprise: TiOx/SnOy/ZnO:Al, SnOy/Si
3N
4/ SnOy, ZnOx/SnOy/ZnOx, TiOx/SnOy/TiOx or NbOy/Si
3N
4/ NbOy.Described multilayer dielectricity rete 1,2 adopts identical membrane structure with 3, promptly all adopts any one identical membrane structure.Described multilayer dielectricity rete 1,2 adopts different membrane structures with 3, and promptly described multilayer dielectricity rete 1,2 and 3 adopts respectively and comprises TiOx/SnOy/ZnO:Al, SnOy/Si
3N
4/ SnOy, ZnOx/SnOy/ZnOx, TiOx/SnOy/TiOx or NbOy/Si
3N
4Any 2 kinds or 3 kinds of membrane structures among/the NbOy.Described barrier layer 1 or 2 rete material comprise: NiCr, Nb, Ti, NiCrOx or NbOx.Described barrier layer 1 or 2 rete material adopt identical membrane structure, promptly all adopt any one identical membrane structure.Described barrier layer 1 or 2 rete material adopt different membrane structures, and promptly described barrier layer 1 or 2 rete material adopt any 2 kinds of membrane structures that comprise among NiCr, Nb, Ti, NiCrOx or the NbOx respectively.The material of described substrate comprises glass or plastics.
Another object of the present invention provides a kind of production technology that is used for described multilayer medium double silver layer low-radiation film, it is characterized in that using the vacuum magnetic-control sputtering film plating process to produce two silver low radiation plated film products, and concrete processing step is as follows:
(1) substrate cleans;
(2) enter the vacuum sputtering district;
(3) dual rotary negative electrode, TiOx ceramic target, intermediate frequency reaction magnetocontrol sputtering depositing Ti Ox rete, thickness 10-15nm;
(4) dual rotary negative electrode, Sn metal targets, intermediate frequency reaction magnetocontrol sputtering deposition SnOy rete, thickness 10-15nm;
(5) dual rotary negative electrode, ZnO:Al ceramic target (Al content 2wt%), intermediate frequency reaction magnetocontrol sputtering deposition ZnO:Al rete, thickness 10-15nm;
(6) single target bucket rotating cathode, magnetically controlled DC sputtering deposition Ag layer, thickness 11-13nm;
(7) single target bucket rotating cathode, magnetically controlled DC sputtering deposition NiCrOx layer, thickness 3-8nm;
(8) dual rotary negative electrode, TiOx ceramic target, intermediate frequency reaction magnetocontrol sputtering depositing Ti Ox rete, thickness 10-15nm;
(9) dual rotary negative electrode, Sn metal targets, intermediate frequency reaction magnetocontrol sputtering deposition SnOy rete, thickness 10-15nm;
(10) dual rotary negative electrode, ZnO:Al ceramic target (Al content 2wt%), intermediate frequency reaction magnetocontrol sputtering deposition ZnO:Al rete, thickness 10-15nm;
(11) single target bucket rotating cathode, magnetically controlled DC sputtering deposition Ag layer, thickness 11-13nm;
(12) single target bucket rotating cathode, magnetically controlled DC sputtering deposition NiCrOx layer, thickness 3-8nm;
(13) dual rotary negative electrode, TiOx ceramic target, intermediate frequency reaction magnetocontrol sputtering depositing Ti Ox rete, thickness 10-15nm;
(14) dual rotary negative electrode, Sn metal targets, intermediate frequency reaction magnetocontrol sputtering deposition SnOy rete, thickness 10-15nm;
(15) dual rotary negative electrode, ZnO:Al ceramic target (Al content 2wt%), intermediate frequency reaction magnetocontrol sputtering deposition ZnO:Al rete, thickness 10-15nm;
(16) dual rotary negative electrode, SiAl ceramic target, intermediate frequency reaction magnetocontrol sputtering deposition Si
3N
4Rete, thickness 20-25nm.
Thereby make the product membrane structure of making be: substrate/complex media rete/Ag layer/barrier layer/multilayer dielectricity rete/Ag layer/barrier layer/multilayer dielectricity rete/Si
3N
4
The invention has the beneficial effects as follows: it produces two silver low radiation plated film products by utilization vacuum magnetic-control sputtering film plating process.Promptly adopt dual rotary negative electrode, intermediate frequency reaction magnetocontrol sputtering deposit multilayer media coating, with single rotating cathode, magnetically controlled DC sputtering deposition Ag layer and barrier layer.But this membrane structure plated film is on glass, but also plated film on soft substrate.This product has higher transmittance, has lower shading coefficient simultaneously, and is convenient to the adjustment of appearance color and indoor color, and its transmitance reaches 81%; Shading coefficient reaches 0.4.It can be widely used in fields such as building field and car and boat window windshield; Also can be coated on the soft substrate, as the usefulness of pad pasting.
Description of drawings
Fig. 1 is a structural representation of the present invention.
Fig. 2 is the structural representation of embodiment 1.
The specific embodiment
That the invention will be further described is as follows below in conjunction with embodiment:
The present invention satisfies the demand of market to the two silver low radiation products of height selection coefficient, the invention provides a kind of two silver low radiation products of multilayer dielectric film.The membrane structure of this product is: glass or soft substrate/multilayer dielectricity rete 1/Ag layer 1/ barrier layer 1/ multilayer dielectricity rete 2/Ag layer, 2/ barrier layer, 2/ multilayer dielectricity rete 3/Si
3N
4Described multilayer dielectricity rete 1,2 or 3 composition can be: TiOx/SnOy/ZnO:Al, SnOy/Si
3N
4/ SnOy, ZnOx/SnOy/ZnOx, TiOx/SnOy/TiOx or NbOy/Si
3N
4/ NbOy etc.
The rete on described barrier layer can adopt: NiCr, Nb, Ti, NiCrOx or NbOx etc.
Embodiment 1, multilayer dielectricity rete of the present invention adopts: TiOx/SnOy/ZnO:Al, the rete on barrier layer adopts: NiCrOx constitutes membrane structure of the present invention and is: glass/TiOx/SnOy/ZnO:Al/Ag/NiCrOx/TiOx/SnOy/ZnO:Al/Ag/NiCrOx/Ti Ox/SnOy/ZnO:Al/Si
3N
4Should be with the production technology of example:
(1) substrate cleans;
(2) enter the vacuum sputtering district;
(3) dual rotary negative electrode, TiOx ceramic target, intermediate frequency reaction magnetocontrol sputtering depositing Ti Ox rete, thickness 10-15nm;
(4) dual rotary negative electrode, Sn metal targets, intermediate frequency reaction magnetocontrol sputtering deposition SnOy rete, thickness 10-15nm;
(5) dual rotary negative electrode, ZnO:Al ceramic target (Al content 2wt%), intermediate frequency reaction magnetocontrol sputtering deposition ZnO:Al rete, thickness 10-15nm;
(6) single target bucket rotating cathode, magnetically controlled DC sputtering deposition Ag layer, thickness 11-13nm;
(7) single target bucket rotating cathode, magnetically controlled DC sputtering deposition NiCrOx layer, thickness 3-8nm;
(8) dual rotary negative electrode, TiOx ceramic target, intermediate frequency reaction magnetocontrol sputtering depositing Ti Ox rete, thickness 10-15nm;
(9) dual rotary negative electrode, Sn metal targets, intermediate frequency reaction magnetocontrol sputtering deposition SnOy rete, thickness 10-15nm;
(10) dual rotary negative electrode, ZnO:Al ceramic target (Al content 2wt%), intermediate frequency reaction magnetocontrol sputtering deposition ZnO:Al rete, thickness 10-15nm;
(11) single target bucket rotating cathode, magnetically controlled DC sputtering deposition Ag layer, thickness 11-13nm;
(12) single target bucket rotating cathode, magnetically controlled DC sputtering deposition NiCrOx layer, thickness 3-8nm;
(13) dual rotary negative electrode, TiOx ceramic target, intermediate frequency reaction magnetocontrol sputtering depositing Ti Ox rete, thickness 10-15nm;
(14) dual rotary negative electrode, Sn metal targets, intermediate frequency reaction magnetocontrol sputtering deposition SnOy rete, thickness 10-15nm;
(15) dual rotary negative electrode, ZnO:Al ceramic target (Al content 2wt%), intermediate frequency reaction magnetocontrol sputtering deposition ZnO:Al rete, thickness 10-15nm;
(16) dual rotary negative electrode, SiAl ceramic target, intermediate frequency reaction magnetocontrol sputtering deposition Si
3N
4Rete, thickness 20-25nm;
By above-mentioned membrane structure and production technology, the basic parameter of the two silver low radiation products that go out at the plated film on glass of 6mm thickness is: transmitance 81%; Shading coefficient 0.4.Consult Fig. 1 and Fig. 2.
Embodiment 2, and multilayer dielectricity rete 1,2 of the present invention or 3 composition also can be: SnOy/Si
3N
4/ SnOy, ZnOx/SnOy/ZnOx, TiOx/SnOy/TiOx or NbOy/Si
3N
4/ NbOy etc., described multilayer dielectricity rete 1,2 and 3 both can be identical above-mentioned any one membrane structure, also can be different above-mentioned any 2 kinds or 3 kinds of membrane structures.Described barrier layer 1 or 2 rete can adopt: NiCr, Nb, Ti, NiCrOx or NbOx etc.Described barrier layer 1 or 2 rete both can be identical above-mentioned any one membrane structures, also can be different above-mentioned any 2 kinds of membrane structures.The material that described substrate adopts can comprise that glass, plastics and other soft substrate etc. can be for the materials of film forming.Consult Fig. 1 and Fig. 2, all the other are with embodiment 1.
Claims (9)
1, a kind of multilayer medium double silver layer low-radiation film is characterized in that its membrane structure is: substrate/multilayer dielectricity rete 1/Ag layer/barrier layer/multilayer dielectricity rete 2/Ag layer/barrier layer/multilayer dielectricity rete 3/Si
3N
4
2, multilayer medium double silver layer low-radiation film according to claim 1 is characterized in that: described multilayer dielectricity rete 1,2 or 3 compositional model comprise: TiOx/SnOy/ZnO:Al, SnOy/Si
3N
4/ SnOy, ZnOx/SnOy/ZnOx, TiOx/SnOy/TiOx or NbOy/Si
3N
4/ NbOy.
3, multilayer medium double silver layer low-radiation film according to claim 2 is characterized in that: described multilayer dielectricity rete 1,2 adopts identical membrane structure with 3, promptly all adopts any one identical membrane structure.
4, multilayer medium double silver layer low-radiation film according to claim 2 is characterized in that: described multilayer dielectricity rete 1,2 adopts different membrane structures with 3, and promptly described multilayer dielectricity rete 1,2 and 3 adopts respectively and comprises TiOx/SnOy/ZnO:Al, SnOy/Si
3N
4/ SnOy, ZnOx/SnOy/ZnOx, TiOx/SnOy/TiOx or NbOy/Si
3N
4Any 2 kinds or 3 kinds of membrane structures among/the NbOy.
5, multilayer medium double silver layer low-radiation film according to claim 1 is characterized in that: described barrier layer 1 or 2 rete material comprise: NiCr, Nb, Ti, NiCrOx or NbOx.
6, multilayer medium double silver layer low-radiation film according to claim 5 is characterized in that: described barrier layer 1 or 2 rete material adopt identical membrane structure, promptly all adopt any one identical membrane structure.
7, multilayer medium double silver layer low-radiation film according to claim 5, it is characterized in that: described barrier layer 1 or 2 rete material adopt different membrane structures, and promptly described barrier layer 1 or 2 rete material adopt any 2 kinds of membrane structures that comprise among NiCr, Nb, Ti, NiCrOx or the NbOx respectively.
8, multilayer medium double silver layer low-radiation film according to claim 1 is characterized in that: the material of described substrate comprises glass or plastics.
9, a kind of production technology that is used for the described multilayer medium double silver layer low-radiation film of claim 1 is characterized in that using the vacuum magnetic-control sputtering film plating process to produce two silver low radiation plated film products, and concrete processing step is as follows:
(1) substrate cleans;
(2) enter the vacuum sputtering district;
(3) dual rotary negative electrode, TiOx ceramic target, intermediate frequency reaction magnetocontrol sputtering depositing Ti Ox rete, thickness 10-15nm;
(4) dual rotary negative electrode, Sn metal targets, intermediate frequency reaction magnetocontrol sputtering deposition SnOy rete, thickness 10-15nm;
(5) dual rotary negative electrode, ZnO:Al ceramic target (Al content 2wt%), intermediate frequency reaction magnetocontrol sputtering deposition ZnO:Al rete, thickness 10-15nm;
(6) single target bucket rotating cathode, magnetically controlled DC sputtering deposition Ag layer, thickness 11-13nm;
(7) single target bucket rotating cathode, magnetically controlled DC sputtering deposition NiCrOx layer, thickness 3-8nm;
(8) dual rotary negative electrode, TiOx ceramic target, intermediate frequency reaction magnetocontrol sputtering depositing Ti Ox rete, thickness 10-15nm;
(9) dual rotary negative electrode, Sn metal targets, intermediate frequency reaction magnetocontrol sputtering deposition SnOy rete, thickness 10-15nm;
(10) dual rotary negative electrode, ZnO:Al ceramic target (Al content 2wt%), intermediate frequency reaction magnetocontrol sputtering deposition ZnO:Al rete, thickness 10-15nm;
(11) single target bucket rotating cathode, magnetically controlled DC sputtering deposition Ag layer, thickness 11-13nm;
(12) single target bucket rotating cathode, magnetically controlled DC sputtering deposition NiCrOx layer, thickness 3-8nm;
(13) dual rotary negative electrode, TiOx ceramic target, intermediate frequency reaction magnetocontrol sputtering depositing Ti Ox rete, thickness 10-15nm;
(14) dual rotary negative electrode, Sn metal targets, intermediate frequency reaction magnetocontrol sputtering deposition SnOy rete, thickness 10-15nm;
(15) dual rotary negative electrode, ZnO:Al ceramic target (Al content 2wt%), intermediate frequency reaction magnetocontrol sputtering deposition ZnO:Al rete, thickness 10-15nm;
(16) dual rotary negative electrode, SiAl ceramic target, intermediate frequency reaction magnetocontrol sputtering deposition Si
3N
4Rete, thickness 20-25nm.
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| CN2008101433457A CN101417520B (en) | 2008-10-17 | 2008-10-17 | Multilayer medium double silver layer low-radiation film and production technique thereof |
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| CN101417520B CN101417520B (en) | 2012-08-22 |
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| CN102501447A (en) * | 2011-11-07 | 2012-06-20 | 中山市格兰特实业有限公司火炬分公司 | Double-silver LOW-E glass |
| CN102950842A (en) * | 2012-11-26 | 2013-03-06 | 中山市创科科研技术服务有限公司 | Ultrahigh-transmittance single-silver low-radiation glass capable of being tempered |
| CN103879089A (en) * | 2012-12-21 | 2014-06-25 | 中国南玻集团股份有限公司 | High-performance three-silver-layer low-radiation glass and preparation method thereof |
| CN103879088A (en) * | 2012-12-21 | 2014-06-25 | 中国南玻集团股份有限公司 | High-performance double-silver-layer low-radiation glass and preparation method thereof |
| CN104355551A (en) * | 2014-10-30 | 2015-02-18 | 中山市亨立达机械有限公司 | Novel double-silver LOW-E coated glass |
| CN105236765A (en) * | 2015-09-28 | 2016-01-13 | 赛柏利安工业技术（苏州）有限公司 | Double silver energy-saving glass deposition method of sunlight selection light filtration film system |
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| CN102501447A (en) * | 2011-11-07 | 2012-06-20 | 中山市格兰特实业有限公司火炬分公司 | Double-silver LOW-E glass |
| CN102501447B (en) * | 2011-11-07 | 2014-06-11 | 中山市格兰特实业有限公司火炬分公司 | Double-silver LOW-E glass |
| CN102501451A (en) * | 2011-11-25 | 2012-06-20 | 林嘉宏 | Temperable di-silver low-emissivity coated glass and manufacturing process thereof |
| CN102950842A (en) * | 2012-11-26 | 2013-03-06 | 中山市创科科研技术服务有限公司 | Ultrahigh-transmittance single-silver low-radiation glass capable of being tempered |
| CN102950842B (en) * | 2012-11-26 | 2016-01-27 | 中山市创科科研技术服务有限公司 | One can the saturating single silver-layer low-radiation glass of tempering superelevation |
| CN103879089A (en) * | 2012-12-21 | 2014-06-25 | 中国南玻集团股份有限公司 | High-performance three-silver-layer low-radiation glass and preparation method thereof |
| CN103879088A (en) * | 2012-12-21 | 2014-06-25 | 中国南玻集团股份有限公司 | High-performance double-silver-layer low-radiation glass and preparation method thereof |
| CN104355551A (en) * | 2014-10-30 | 2015-02-18 | 中山市亨立达机械有限公司 | Novel double-silver LOW-E coated glass |
| CN105236765A (en) * | 2015-09-28 | 2016-01-13 | 赛柏利安工业技术（苏州）有限公司 | Double silver energy-saving glass deposition method of sunlight selection light filtration film system |
| CN105236765B (en) * | 2015-09-28 | 2018-06-29 | 赛柏利安工业技术（苏州）有限公司 | A kind of double silver-colored energy-saving glass deposition methods of sunlight selection optical filtering membrane system |
| CN105439467A (en) * | 2015-11-26 | 2016-03-30 | 黑龙江健中特种玻璃有限公司 | High-transmittance, double-silver and low-emissivity coated glass facilitating subsequent processing and production process of high-transmittance, double-silver and low-emissivity coated glass |
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| CN101417520B (en) | 2012-08-22 |
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