CN105388165B - 偏光膜的缺陷监控方法 - Google Patents

偏光膜的缺陷监控方法 Download PDF

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Publication number
CN105388165B
CN105388165B CN201510546614.4A CN201510546614A CN105388165B CN 105388165 B CN105388165 B CN 105388165B CN 201510546614 A CN201510546614 A CN 201510546614A CN 105388165 B CN105388165 B CN 105388165B
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China
Prior art keywords
defect
polarizing film
spot
light polarizing
value
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Chinese (zh)
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CN105388165A (zh
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李银珪
严东桓
朴宰贤
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Dongwoo Fine Chem Co Ltd
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Dongwoo Fine Chem Co Ltd
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/89—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/892—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles characterised by the flaw, defect or object feature examined
    • G01N21/896—Optical defects in or on transparent materials, e.g. distortion, surface flaws in conveyed flat sheet or rod
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/89—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/892—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles characterised by the flaw, defect or object feature examined
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/89—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/892—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles characterised by the flaw, defect or object feature examined
    • G01N21/894—Pinholes
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/93—Detection standards; Calibrating baseline adjustment, drift correction
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/94—Investigating contamination, e.g. dust
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/958—Inspecting transparent materials or objects, e.g. windscreens
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/20008—Constructional details of analysers, e.g. characterised by X-ray source, detector or optical system; Accessories therefor; Preparing specimens therefor
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N5/00—Analysing materials by weighing, e.g. weighing small particles separated from a gas or liquid
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N9/00—Investigating density or specific gravity of materials; Analysing materials by determining density or specific gravity
    • G01N9/26—Investigating density or specific gravity of materials; Analysing materials by determining density or specific gravity by measuring pressure differences
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • General Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Engineering & Computer Science (AREA)
  • Textile Engineering (AREA)
  • Optics & Photonics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Polarising Elements (AREA)
CN201510546614.4A 2014-09-01 2015-08-31 偏光膜的缺陷监控方法 Active CN105388165B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020140115246A KR101702841B1 (ko) 2014-09-01 2014-09-01 편광 필름의 결함 모니터링 방법
KR10-2014-0115246 2014-09-01

Publications (2)

Publication Number Publication Date
CN105388165A CN105388165A (zh) 2016-03-09
CN105388165B true CN105388165B (zh) 2019-05-03

Family

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Family Applications (1)

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CN201510546614.4A Active CN105388165B (zh) 2014-09-01 2015-08-31 偏光膜的缺陷监控方法

Country Status (4)

Country Link
JP (1) JP2016050939A (ko)
KR (1) KR101702841B1 (ko)
CN (1) CN105388165B (ko)
TW (1) TW201610418A (ko)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI588470B (zh) * 2016-06-28 2017-06-21 住華科技股份有限公司 缺陷檢測裝置
JP6470457B1 (ja) * 2017-09-13 2019-02-13 日東電工株式会社 偏光膜、偏光板、および偏光膜の製造方法
JP6470455B1 (ja) * 2017-09-13 2019-02-13 日東電工株式会社 偏光膜、偏光板、および偏光膜の製造方法
TWI743373B (zh) * 2017-09-13 2021-10-21 日商日東電工股份有限公司 偏光膜、偏光板、及偏光膜之製造方法
JP6470456B1 (ja) * 2017-09-13 2019-02-13 日東電工株式会社 偏光膜、偏光板、および偏光膜の製造方法
TWI748108B (zh) * 2017-09-13 2021-12-01 日商日東電工股份有限公司 偏光膜、偏光板、及偏光膜之製造方法
CN109187577A (zh) * 2018-08-29 2019-01-11 深圳市盛波光电科技有限公司 一种偏光片隐性缺陷光线检测装置及方法
JP6890160B2 (ja) * 2018-10-15 2021-06-18 日東電工株式会社 位相差層付偏光板およびそれを用いた画像表示装置
KR20200140639A (ko) * 2019-06-07 2020-12-16 주식회사 엘지화학 편광판의 접착제얼룩 검사장치 및 편광판의 접착제얼룩 검사방법

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1508536A (zh) * 2002-12-17 2004-06-30 住友化学工业株式会社 粘有保护膜的偏光板的缺陷检查方法
GB2376827B (en) * 2001-04-30 2005-07-06 Hewlett Packard Co Method for compensation for dust for an image scanner with a moving document
CN1920539A (zh) * 2005-08-26 2007-02-28 精工爱普生株式会社 缺陷检测方法与缺陷检测装置
CN101360989A (zh) * 2006-01-11 2009-02-04 日本电工株式会社 层叠薄膜的制造方法、层叠薄膜的缺陷检测方法、层叠薄膜的缺陷检测装置、层叠薄膜、以及图像显示装置
CN102156137A (zh) * 2011-03-21 2011-08-17 明基材料有限公司 偏光片的亮点瑕疵检测方法与门槛值产生方法及其装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100749954B1 (ko) * 2004-12-27 2007-08-16 주식회사 넥스트아이 편광필름의 검사방법 및 이에 적용되는 편광필름의 검사장치
JP2008008787A (ja) 2006-06-29 2008-01-17 Nireco Corp 透明固体の検査方法及び透明固体の検査装置
KR101676333B1 (ko) * 2008-03-28 2016-11-15 후지필름 가부시키가이샤 결함 검출 방법 및 장치
KR20100024753A (ko) 2008-08-26 2010-03-08 주식회사 에이스 디지텍 라인 형태의 이물 검출방법
JP5274622B2 (ja) * 2011-06-27 2013-08-28 富士フイルム株式会社 欠陥検査装置及び方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2376827B (en) * 2001-04-30 2005-07-06 Hewlett Packard Co Method for compensation for dust for an image scanner with a moving document
CN1508536A (zh) * 2002-12-17 2004-06-30 住友化学工业株式会社 粘有保护膜的偏光板的缺陷检查方法
CN1920539A (zh) * 2005-08-26 2007-02-28 精工爱普生株式会社 缺陷检测方法与缺陷检测装置
CN101360989A (zh) * 2006-01-11 2009-02-04 日本电工株式会社 层叠薄膜的制造方法、层叠薄膜的缺陷检测方法、层叠薄膜的缺陷检测装置、层叠薄膜、以及图像显示装置
CN102156137A (zh) * 2011-03-21 2011-08-17 明基材料有限公司 偏光片的亮点瑕疵检测方法与门槛值产生方法及其装置

Also Published As

Publication number Publication date
KR20160026400A (ko) 2016-03-09
KR101702841B1 (ko) 2017-02-06
JP2016050939A (ja) 2016-04-11
CN105388165A (zh) 2016-03-09
TW201610418A (zh) 2016-03-16

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