TW201610418A - 偏光薄膜缺陷監測方法 - Google Patents

偏光薄膜缺陷監測方法 Download PDF

Info

Publication number
TW201610418A
TW201610418A TW104123700A TW104123700A TW201610418A TW 201610418 A TW201610418 A TW 201610418A TW 104123700 A TW104123700 A TW 104123700A TW 104123700 A TW104123700 A TW 104123700A TW 201610418 A TW201610418 A TW 201610418A
Authority
TW
Taiwan
Prior art keywords
defect
polarizing film
stain
value
monitoring
Prior art date
Application number
TW104123700A
Other languages
English (en)
Chinese (zh)
Inventor
Eun-Gyu Lee
Dong-Hwan Eom
Jae-Hyun Park
Original Assignee
Dongwoo Fine Chem Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dongwoo Fine Chem Co Ltd filed Critical Dongwoo Fine Chem Co Ltd
Publication of TW201610418A publication Critical patent/TW201610418A/zh

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/89—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/892—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles characterised by the flaw, defect or object feature examined
    • G01N21/896—Optical defects in or on transparent materials, e.g. distortion, surface flaws in conveyed flat sheet or rod
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/89—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/892—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles characterised by the flaw, defect or object feature examined
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/89—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/892—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles characterised by the flaw, defect or object feature examined
    • G01N21/894—Pinholes
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/93—Detection standards; Calibrating baseline adjustment, drift correction
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/94—Investigating contamination, e.g. dust
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/958—Inspecting transparent materials or objects, e.g. windscreens
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/20008—Constructional details of analysers, e.g. characterised by X-ray source, detector or optical system; Accessories therefor; Preparing specimens therefor
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N5/00—Analysing materials by weighing, e.g. weighing small particles separated from a gas or liquid
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N9/00—Investigating density or specific gravity of materials; Analysing materials by determining density or specific gravity
    • G01N9/26—Investigating density or specific gravity of materials; Analysing materials by determining density or specific gravity by measuring pressure differences
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • General Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Engineering & Computer Science (AREA)
  • Textile Engineering (AREA)
  • Optics & Photonics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Polarising Elements (AREA)
TW104123700A 2014-09-01 2015-07-22 偏光薄膜缺陷監測方法 TW201610418A (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020140115246A KR101702841B1 (ko) 2014-09-01 2014-09-01 편광 필름의 결함 모니터링 방법

Publications (1)

Publication Number Publication Date
TW201610418A true TW201610418A (zh) 2016-03-16

Family

ID=55420694

Family Applications (1)

Application Number Title Priority Date Filing Date
TW104123700A TW201610418A (zh) 2014-09-01 2015-07-22 偏光薄膜缺陷監測方法

Country Status (4)

Country Link
JP (1) JP2016050939A (ko)
KR (1) KR101702841B1 (ko)
CN (1) CN105388165B (ko)
TW (1) TW201610418A (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI588470B (zh) * 2016-06-28 2017-06-21 住華科技股份有限公司 缺陷檢測裝置

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6470457B1 (ja) * 2017-09-13 2019-02-13 日東電工株式会社 偏光膜、偏光板、および偏光膜の製造方法
JP6470455B1 (ja) * 2017-09-13 2019-02-13 日東電工株式会社 偏光膜、偏光板、および偏光膜の製造方法
TWI743373B (zh) * 2017-09-13 2021-10-21 日商日東電工股份有限公司 偏光膜、偏光板、及偏光膜之製造方法
JP6470456B1 (ja) * 2017-09-13 2019-02-13 日東電工株式会社 偏光膜、偏光板、および偏光膜の製造方法
TWI748108B (zh) * 2017-09-13 2021-12-01 日商日東電工股份有限公司 偏光膜、偏光板、及偏光膜之製造方法
CN109187577A (zh) * 2018-08-29 2019-01-11 深圳市盛波光电科技有限公司 一种偏光片隐性缺陷光线检测装置及方法
JP6890160B2 (ja) * 2018-10-15 2021-06-18 日東電工株式会社 位相差層付偏光板およびそれを用いた画像表示装置
KR20200140639A (ko) * 2019-06-07 2020-12-16 주식회사 엘지화학 편광판의 접착제얼룩 검사장치 및 편광판의 접착제얼룩 검사방법

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7183532B2 (en) * 2001-04-30 2007-02-27 Hewlett-Packard Development Company, L.P. Detecting a defect in an image scanner
JP2004198163A (ja) * 2002-12-17 2004-07-15 Sumitomo Chem Co Ltd 保護フィルム粘着偏光板の欠陥検査方法
KR100749954B1 (ko) * 2004-12-27 2007-08-16 주식회사 넥스트아이 편광필름의 검사방법 및 이에 적용되는 편광필름의 검사장치
JP4882529B2 (ja) * 2005-08-26 2012-02-22 セイコーエプソン株式会社 欠陥検出方法および欠陥検出装置
JP5051874B2 (ja) * 2006-01-11 2012-10-17 日東電工株式会社 積層フィルムの製造方法、積層フィルムの欠陥検出方法、積層フィルムの欠陥検出装置
JP2008008787A (ja) 2006-06-29 2008-01-17 Nireco Corp 透明固体の検査方法及び透明固体の検査装置
KR101676333B1 (ko) * 2008-03-28 2016-11-15 후지필름 가부시키가이샤 결함 검출 방법 및 장치
KR20100024753A (ko) 2008-08-26 2010-03-08 주식회사 에이스 디지텍 라인 형태의 이물 검출방법
CN102156137A (zh) * 2011-03-21 2011-08-17 明基材料有限公司 偏光片的亮点瑕疵检测方法与门槛值产生方法及其装置
JP5274622B2 (ja) * 2011-06-27 2013-08-28 富士フイルム株式会社 欠陥検査装置及び方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI588470B (zh) * 2016-06-28 2017-06-21 住華科技股份有限公司 缺陷檢測裝置

Also Published As

Publication number Publication date
KR20160026400A (ko) 2016-03-09
KR101702841B1 (ko) 2017-02-06
JP2016050939A (ja) 2016-04-11
CN105388165A (zh) 2016-03-09
CN105388165B (zh) 2019-05-03

Similar Documents

Publication Publication Date Title
TW201610418A (zh) 偏光薄膜缺陷監測方法
TWI603074B (zh) 光學薄膜缺陷辨識方法及其系統
JP5538220B2 (ja) 画像分析を用いた偏光板のムラ検査方法及びこれを用いた偏光板のムラ自動検査システム
JPWO2014017066A1 (ja) 液晶表示パネルの検査方法、および液晶表示パネルの検査装置
JP5645142B2 (ja) 色差分析を用いた偏光板のムラ自動検査装置及び検査方法
US8842270B2 (en) Method and inspection device for bright spot defect detection of a polarizer
TW201500731A (zh) 光學薄膜缺陷鑑別方法
US9052295B2 (en) Panel inspection method and apparatus
JP2010181328A (ja) 太陽電池ウェハ表面の検査装置，太陽電池ウェハ表面の検査用プログラム，太陽電池ウェハ表面の検査方法
US8914754B2 (en) Database-driven cell-to-cell reticle inspection
JP5634390B2 (ja) ガラス容器の欠陥検査方法及び装置
JP6168834B2 (ja) 光学フィルムの欠陥判別方法
KR101440975B1 (ko) 색차 분석을 이용한 편광판 얼룩 자동 검사 장치
JP2017207288A (ja) 表面検査装置用校正板及び表面検査装置の校正方法
TWI493177B (zh) 一種檢測具週期性結構光學薄膜的瑕疵檢測方法及其檢測裝置
JP6248819B2 (ja) 検査装置及び検査方法
KR101697071B1 (ko) 광학 필름의 결함 판별 방법
KR101998081B1 (ko) 복합 필름의 결함 판별 방법
KR101349662B1 (ko) 광학 필름의 결함 판별 방법
KR101315103B1 (ko) 광학 필름의 결함 판별 방법
CN106019864B (zh) 重工方法及重工系统
Son Automatic inspection method for macro defects in TFT-LCD color filter fabrication process
JP2009162642A (ja) 基板検査装置および基板検査方法