CN105097960A - 具有异质结构的变容二极管 - Google Patents

具有异质结构的变容二极管 Download PDF

Info

Publication number
CN105097960A
CN105097960A CN201510249636.4A CN201510249636A CN105097960A CN 105097960 A CN105097960 A CN 105097960A CN 201510249636 A CN201510249636 A CN 201510249636A CN 105097960 A CN105097960 A CN 105097960A
Authority
CN
China
Prior art keywords
layer
semiconductor device
thickness
ground floor
collector
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201510249636.4A
Other languages
English (en)
Chinese (zh)
Inventor
陶更明
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Qorvo US Inc
Original Assignee
Triquint Semiconductor Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Triquint Semiconductor Inc filed Critical Triquint Semiconductor Inc
Publication of CN105097960A publication Critical patent/CN105097960A/zh
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D1/00Resistors, capacitors or inductors
    • H10D1/60Capacitors
    • H10D1/62Capacitors having potential barriers
    • H10D1/64Variable-capacitance diodes, e.g. varactors 
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D1/00Resistors, capacitors or inductors
    • H10D1/01Manufacture or treatment
    • H10D1/045Manufacture or treatment of capacitors having potential barriers, e.g. varactors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/13Semiconductor regions connected to electrodes carrying current to be rectified, amplified or switched, e.g. source or drain regions
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/80Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
    • H10D62/82Heterojunctions
    • H10D62/824Heterojunctions comprising only Group III-V materials heterojunctions, e.g. GaN/AlGaN heterojunctions
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D8/00Diodes
    • H10D8/01Manufacture or treatment
    • H10D8/053Manufacture or treatment of heterojunction diodes or of tunnel diodes

Landscapes

  • Electrodes Of Semiconductors (AREA)
  • Bipolar Transistors (AREA)
  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
CN201510249636.4A 2014-05-16 2015-05-15 具有异质结构的变容二极管 Pending CN105097960A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US14/280,404 2014-05-16
US14/280,404 US10263125B2 (en) 2014-05-16 2014-05-16 Varactor diode with heterostructure

Publications (1)

Publication Number Publication Date
CN105097960A true CN105097960A (zh) 2015-11-25

Family

ID=54361767

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201510249636.4A Pending CN105097960A (zh) 2014-05-16 2015-05-15 具有异质结构的变容二极管

Country Status (5)

Country Link
US (1) US10263125B2 (enExample)
CN (1) CN105097960A (enExample)
DE (1) DE102015005831A1 (enExample)
FR (1) FR3021160B1 (enExample)
TW (1) TWI654768B (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113013261A (zh) * 2021-02-23 2021-06-22 温州大学 纳米硅/非晶碳化硅异质结多势垒变容二极管及制备方法

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5150185A (en) * 1990-04-18 1992-09-22 Fujitsu Limited Semiconductor device
JP2000106370A (ja) * 1998-07-27 2000-04-11 Advantest Corp 負性抵抗を有するバイポ―ラトランジスタ
CN1574388A (zh) * 2003-05-28 2005-02-02 株式会社东芝 半导体器件
CN1619830A (zh) * 2003-11-18 2005-05-25 Nec化合物半导体器件株式会社 半导体器件
CN1638142A (zh) * 2004-01-07 2005-07-13 松下电器产业株式会社 半导体器件
CN1698210A (zh) * 2003-01-06 2005-11-16 日本电信电话株式会社 P型氮化物半导体结构以及双极晶体管
US20100308211A1 (en) * 2009-06-04 2010-12-09 Samsung Electronics Co., Ltd. Optoelectronic shutter, method of operating the same and optical apparatus including the optoelectronic shutter
US20140110761A1 (en) * 2012-10-19 2014-04-24 Yuefei Yang Monolithic HBT with Wide-Tuning Range Varactor

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103443988B (zh) * 2011-03-25 2017-03-22 株式会社杰士汤浅国际 圆筒形电池
US8963289B2 (en) * 2012-05-08 2015-02-24 Eta Semiconductor Inc. Digital semiconductor variable capacitor
US9099518B1 (en) * 2014-02-04 2015-08-04 Triquint Semiconductor, Inc. Electrostatic discharge protection device

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5150185A (en) * 1990-04-18 1992-09-22 Fujitsu Limited Semiconductor device
JP2000106370A (ja) * 1998-07-27 2000-04-11 Advantest Corp 負性抵抗を有するバイポ―ラトランジスタ
CN1698210A (zh) * 2003-01-06 2005-11-16 日本电信电话株式会社 P型氮化物半导体结构以及双极晶体管
CN1574388A (zh) * 2003-05-28 2005-02-02 株式会社东芝 半导体器件
CN1619830A (zh) * 2003-11-18 2005-05-25 Nec化合物半导体器件株式会社 半导体器件
CN1638142A (zh) * 2004-01-07 2005-07-13 松下电器产业株式会社 半导体器件
US20100308211A1 (en) * 2009-06-04 2010-12-09 Samsung Electronics Co., Ltd. Optoelectronic shutter, method of operating the same and optical apparatus including the optoelectronic shutter
US20140110761A1 (en) * 2012-10-19 2014-04-24 Yuefei Yang Monolithic HBT with Wide-Tuning Range Varactor

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113013261A (zh) * 2021-02-23 2021-06-22 温州大学 纳米硅/非晶碳化硅异质结多势垒变容二极管及制备方法

Also Published As

Publication number Publication date
US10263125B2 (en) 2019-04-16
DE102015005831A1 (de) 2015-11-19
FR3021160A1 (enExample) 2015-11-20
TW201547033A (zh) 2015-12-16
US20150333192A1 (en) 2015-11-19
FR3021160B1 (fr) 2018-05-18
TWI654768B (zh) 2019-03-21

Similar Documents

Publication Publication Date Title
US10535784B2 (en) Dual stack varactor
US20130099284A1 (en) Group iii-nitride metal-insulator-semiconductor heterostructure field-effect transistors
US10636897B2 (en) Semiconductor device having a collector layer including first-conductivity-type semiconductor layers
US10418468B2 (en) Semiconductor device with multiple HBTS having different emitter ballast resistances
US20220375927A1 (en) Semiconductor device and manufacturing method thereof
US9029914B2 (en) Group III-nitride-based transistor with gate dielectric including a fluoride -or chloride- based compound
US9608084B2 (en) Emitter contact epitaxial structure and ohmic contact formation for heterojunction bipolar transistor
US9202905B1 (en) Digital alloy layer in a III-nitrade based heterojunction field effect transistor
US20220375928A1 (en) Semiconductor device and manufacturing method thereof
US8350295B1 (en) Device structure including high-thermal-conductivity substrate
US9099518B1 (en) Electrostatic discharge protection device
US20130119404A1 (en) Device structure including high-thermal-conductivity substrate
US20220375925A1 (en) Semiconductor device and manufacturing method thereof
TW201513345A (zh) 線性高電子移動率電晶體
US10756206B2 (en) High power compound semiconductor field effect transistor devices with low doped drain
US10263125B2 (en) Varactor diode with heterostructure
US20160133758A1 (en) Dual stack varactor
Parvais et al. Advanced transistors for high frequency applications
Barsky et al. 190 GHz InP HEMT MMIC LNA with dry etched backside vias
JP6489701B2 (ja) 検波ダイオード
Miyamoto Recent progress in compound semiconductor electron devices
Liu et al. Improved n+-GaAs/p+-In 0.49 Ga 0.51 P/n-GaAs camel-like gate structure for high-breakdown, low-leakage, and high-temperature applications
JP6303915B2 (ja) 化合物半導体装置及びその製造方法
Webster et al. AlGaAsSb/InGaAs/AlGaAsSb metamorphic HEMTs
HK40018392A (en) High power compound semiconductor field effect transistor devices with low doped drain

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
TA01 Transfer of patent application right
TA01 Transfer of patent application right

Effective date of registration: 20161222

Address after: North Carolina

Applicant after: Qorvo American company

Address before: oregon

Applicant before: Triquint Semiconductor Inc

SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
RJ01 Rejection of invention patent application after publication
RJ01 Rejection of invention patent application after publication

Application publication date: 20151125