CN104865276B - 在带电粒子显微镜中检查样本的方法 - Google Patents

在带电粒子显微镜中检查样本的方法 Download PDF

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Publication number
CN104865276B
CN104865276B CN201510087134.6A CN201510087134A CN104865276B CN 104865276 B CN104865276 B CN 104865276B CN 201510087134 A CN201510087134 A CN 201510087134A CN 104865276 B CN104865276 B CN 104865276B
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sample
detector
vector field
subjected
charged particle
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Chinese (zh)
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CN104865276A (zh
Inventor
I.拉兹
E.G.T.博思
F.博格霍贝
B.布伊斯塞
K.S.塞德
S.拉扎
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FEI Co
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2446—Position sensitive detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2446—Position sensitive detectors
    • H01J2237/24465—Sectored detectors, e.g. quadrants
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2802—Transmission microscopes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261—Details
    • H01J37/265—Controlling the tube; circuit arrangements adapted to a particular application not otherwise provided, e.g. bright-field-dark-field illumination

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
CN201510087134.6A 2014-02-24 2015-02-25 在带电粒子显微镜中检查样本的方法 Active CN104865276B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP14156356.9A EP2911180A1 (en) 2014-02-24 2014-02-24 Method of examining a sample in a charged-particle microscope
EP14156356.9 2014-02-24

Publications (2)

Publication Number Publication Date
CN104865276A CN104865276A (zh) 2015-08-26
CN104865276B true CN104865276B (zh) 2017-07-21

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ID=50189504

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CN201510087134.6A Active CN104865276B (zh) 2014-02-24 2015-02-25 在带电粒子显微镜中检查样本的方法

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US (1) US9312098B2 (enExample)
EP (2) EP2911180A1 (enExample)
JP (1) JP6051245B2 (enExample)
CN (1) CN104865276B (enExample)

Families Citing this family (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ATE466349T1 (de) 1998-08-14 2010-05-15 3M Innovative Properties Co Rfid-leser
EP3070732A1 (en) * 2015-03-18 2016-09-21 Fei Company Apparatus and method of performing spectroscopy in a transmission charged-particle microscope
US10170274B2 (en) * 2015-03-18 2019-01-01 Battelle Memorial Institute TEM phase contrast imaging with image plane phase grating
US10109453B2 (en) 2015-03-18 2018-10-23 Battelle Memorial Institute Electron beam masks for compressive sensors
EP3082150B1 (en) 2015-04-15 2017-07-19 FEI Company Method and scanning transmission type charged-particle microscope for performing tomographic imaging
CN104865282B (zh) * 2015-04-30 2017-07-04 安泰科技股份有限公司 一种表征非晶合金微观结构的方法
JP6425096B2 (ja) * 2015-05-14 2018-11-21 国立大学法人 東京大学 電子顕微鏡および測定方法
EP3106862B1 (en) 2015-06-18 2019-01-16 FEI Company Method of ptychographic imaging
FR3049348B1 (fr) * 2016-03-23 2023-08-11 Commissariat Energie Atomique Procede de caracterisation d’une particule dans un echantillon
US10580614B2 (en) 2016-04-29 2020-03-03 Battelle Memorial Institute Compressive scanning spectroscopy
JP6702807B2 (ja) * 2016-06-14 2020-06-03 日本電子株式会社 電子顕微鏡および画像取得方法
US10685759B2 (en) * 2017-01-16 2020-06-16 Fei Company Statistical analysis in X-ray imaging
DE102017106984B4 (de) * 2017-03-31 2022-02-10 Carl Zeiss Microscopy Gmbh Lichtmikroskop und Verfahren zum Betreiben eines Lichtmikroskops mit optimierter Beleuchtungsgeometrie
US10295677B2 (en) 2017-05-08 2019-05-21 Battelle Memorial Institute Systems and methods for data storage and retrieval
JP6962757B2 (ja) * 2017-09-15 2021-11-05 日本電子株式会社 測定方法および電子顕微鏡
US10446366B1 (en) * 2018-02-13 2019-10-15 Fei Company Imaging technique in scanning transmission charged particle microscopy
EP3531439B1 (en) * 2018-02-22 2020-06-24 FEI Company Intelligent pre-scan in scanning transmission charged particle microscopy
EP3534391B1 (en) * 2018-03-01 2020-11-04 FEI Company Discriminative imaging technique in scanning transmission charged particle microscopy
CN108680344B (zh) * 2018-05-23 2020-04-03 中国科学技术大学 一种含百纳米尺寸通孔的光学高分辨率测试靶的制造方法
IL310722B2 (en) * 2018-07-13 2025-07-01 Asml Netherlands Bv SEM image enhancement systems and methods
JP7193694B2 (ja) * 2018-07-26 2022-12-21 国立研究開発法人理化学研究所 電子顕微鏡およびそれを用いた試料観察方法
DE102018007455B4 (de) * 2018-09-21 2020-07-09 Carl Zeiss Multisem Gmbh Verfahren zum Detektorabgleich bei der Abbildung von Objekten mittels eines Mehrstrahl-Teilchenmikroskops, System sowie Computerprogrammprodukt
CN109239915A (zh) * 2018-09-29 2019-01-18 南京理工大学 一种产生汉堡包型聚焦光场的方法
DE102019101155A1 (de) * 2019-01-17 2020-07-23 Carl Zeiss Microscopy Gmbh Verfahren zum Betreiben eines Teilchenstrahlsystems, Teilchenstrahlsystem und Computerprogrammprodukt
JP7008650B2 (ja) * 2019-02-01 2022-01-25 日本電子株式会社 荷電粒子線システム及び走査電子顕微鏡を用いた試料測定方法
US10607811B1 (en) 2019-02-28 2020-03-31 Fei Company Multi-beam scanning transmission charged particle microscope
EP3719831A1 (en) 2019-04-05 2020-10-07 ASML Netherlands B.V. Systems and methods for image enhancement for a multi-beam charged-particle inspection system
US11460419B2 (en) 2020-03-30 2022-10-04 Fei Company Electron diffraction holography
US11404241B2 (en) 2020-03-30 2022-08-02 Fei Company Simultaneous TEM and STEM microscope
CN116438622A (zh) * 2020-07-09 2023-07-14 牛津仪器纳米技术工具有限公司 使用多个检测器的材料分析
US11211223B1 (en) * 2020-08-25 2021-12-28 Fei Company System and method for simultaneous phase contrast imaging and electron energy-loss spectroscopy
EP4024037A1 (en) * 2020-12-30 2022-07-06 FEI Company Parallel image segmentation and spectral acquisition
JP7642524B2 (ja) * 2021-12-24 2025-03-10 株式会社日立製作所 干渉走査透過型電子顕微鏡
JP2025507253A (ja) 2022-02-09 2025-03-18 イエダ リサーチ アンド ディベロップメント カンパニー リミテッド 走査データからのサンプルの構造データの抽出のためのシステムおよび方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL7804037A (nl) * 1978-04-17 1979-10-19 Philips Nv Elektronenmikroskoop met ongedifferentieerde fase- beeldvorming.
JPH11307029A (ja) * 1998-04-24 1999-11-05 Hitachi Ltd 透過型電子顕微鏡
US20070194225A1 (en) * 2005-10-07 2007-08-23 Zorn Miguel D Coherent electron junction scanning probe interference microscope, nanomanipulator and spectrometer with assembler and DNA sequencing applications
EP2063450A1 (en) * 2007-11-21 2009-05-27 FEI Company Method for obtaining a scanning transmission image of a sample in a particle-optical apparatus
EP2584362A1 (en) * 2011-10-18 2013-04-24 FEI Company Scanning method for scanning a sample with a probe
EP2624278B1 (en) * 2012-01-31 2014-07-30 Hitachi High-Technologies Corporation Phase plate

Also Published As

Publication number Publication date
EP2866245A1 (en) 2015-04-29
US9312098B2 (en) 2016-04-12
US20150243474A1 (en) 2015-08-27
EP2866245B1 (en) 2016-11-02
JP2015159112A (ja) 2015-09-03
EP2911180A1 (en) 2015-08-26
CN104865276A (zh) 2015-08-26
JP6051245B2 (ja) 2016-12-27

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