CN104841660B - Gas-liquid two-phase atomization cleaner and cleaning method - Google Patents
Gas-liquid two-phase atomization cleaner and cleaning method Download PDFInfo
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- CN104841660B CN104841660B CN201510261375.8A CN201510261375A CN104841660B CN 104841660 B CN104841660 B CN 104841660B CN 201510261375 A CN201510261375 A CN 201510261375A CN 104841660 B CN104841660 B CN 104841660B
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
- B08B3/022—Cleaning travelling work
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B2203/00—Details of cleaning machines or methods involving the use or presence of liquid or steam
- B08B2203/02—Details of machines or methods for cleaning by the force of jets or sprays
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- Cleaning Or Drying Semiconductors (AREA)
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Abstract
The invention provides a kind of gas-liquid two-phase atomization cleaner, it is related to technical field of semiconductor wafer technology, including gas pipeline, fluid pipeline and gas-liquid two-phase atomizer, one end of gas pipeline and fluid pipeline is arranged in swing arm, to form atomizing particle, swing arm drives gas-liquid two-phase atomizer to do circular arc reciprocating motion between Waffer edge and center wafer to its other end connection gas-liquid two-phase atomizer.The present invention passes through gas-liquid two-phase atomizing nozzle structure, high-speed liquid stream is made sufficiently to interact with high velocity gas stream, and by adjusting gas flow rate and low flow rate liquid flow velocity, form the homogeneous ultra micro atomized drop of particle size, after high velocity gas stream accelerates, it is injected in wafer surface, complete to clean, present invention facilitates transmission of the impurity to bodies of fluid in groove, improve the efficiency of cleaning, improve cleaning performance, as the quality of atomizing particle is little, reduce the damage to wafer topography structure.
Description
Technical field
The invention belongs to technical field of semiconductor wafer technology, specially a kind of gas-liquid two-phase atomization cleaner and cleaning side
Method.
Background technology
The deep-submicron stage is being entered into integrated circuit feature size, required in IC wafer manufacturing process
Wafer surface cleanliness factor more and more harsher, in order to ensure the cleanliness factor on wafer material surface, the manufacturing process of integrated circuit
In there are hundreds of road mattings, matting account for the 30% of whole manufacture process.
In semiconductor cleaning process, when cleaning medicinal liquid is with very high velocity shock chip, a thing can be produced to chip
Reason active force, the active force can accelerate the mechanism for cleaning medicinal liquid and wafer surface impurity and pollutant, promote impurity and
Pollutant are corroded by liquid phase fluid, are dissolved or are suspended in liquid phase fluid.Under the centrifugal action that wafer rotational is produced, comprising
There are impurity and the cleaning medicinal liquid of pollutant to depart from wafer surface, complete the process that cleans.
But the further reduction with wafer topography feature size, the liquid phase fluid of injection can be to chip at a high speed
The graphic structure on surface causes serious damage.Traditional cleaning spraying technique generally existing large-sized liquid-phase particle or
Liquid phase injection stream, for 65 nanometers and following process wafer surfacial pattern damage very serious, while the profit of liquid phase fluid
Relatively low with rate, cause the profligacy of resource.
In order to reduce the damage to wafer topography, the size for further reducing the liquid particles for ejecting is needed, such as
Injection liquid nano granule, reduces damage of the liquid particles to pattern side wall and corner.Therefore, those skilled in the art need badly
Research and development are a kind of to reduce gas-liquid two-phase atomization cleaner and the cleaning method that wafer topography is damaged.
Content of the invention
In place of for the deficiencies in the prior art, the purpose of the present invention is for wafer topography during minimizing cleaning
Damage, there is provided a kind of gas-liquid two-phase atomization cleaner, and provide a kind of based on the clear of the gas-liquid two-phase atomization cleaner
Washing method, improves cleaning efficiency, improves cleaning performance.
The object of the invention is realized by following technical proposals：
The invention provides a kind of gas-liquid two-phase atomization cleaner, described device include gas pipeline, fluid pipeline with
And one end of gas-liquid two-phase atomizer, the gas pipeline and fluid pipeline is arranged in swing arm, its other end connection is described
To form atomizing particle, the swing arm drives the gas-liquid two-phase atomizer in Waffer edge and crystalline substance to gas-liquid two-phase atomizer
Circular arc reciprocating motion is done between piece center；Wherein, gas-liquid two-phase atomizer includes jet element liquid main line, jet element
Gas piping, liquid liquid outlet and gas venthole；Described jet element liquid main line one end connects the fluid pipeline,
The other end has some in divergent shape and the jet element liquid branch pipeline that equidistantly distributes, the jet element liquid branch pipeline
There is the end face that the axial direction with the gas-liquid two-phase atomizer is inclined in predetermined angle, if having on the end face intervening
If the liquid liquid outlet of diameter, the jet element gas tube trackside wall is provided with gas piping interface to connect the gas tube
Road, has horizontally disposed fan-shaped outlet web plate between each jet element liquid branch pipeline, and the outlet web plate is provided with some
The gas venthole of preset diameters.
Preferably, the angle between the axial direction of the end face and the gas-liquid two-phase atomizer is 10 °～80 °.
Preferably, the lower end of the gas-liquid two-phase atomizer is provided with atomizing particle pilot conduits, to remove and the gas
The uneven atomizing particle of the biphase atomizer axial direction of liquid.
Preferably, nozzle rotary part is provided with above the gas-liquid two-phase atomizer, to adjust the gas-liquid two-phase
The spray angle of atomizer.
Preferably, the gas pipeline is provided with the gas flow regulating valve for adjusting gas flow, and/or the liquid
Body pipeline is provided with for adjusting the first liquid flow control valve of fluid flow.
Preferably, the preset diameters of the gentle body venthole of the liquid liquid outlet are 1～300 μm.
Preferably, be additionally provided with the swing arm clean pipeline for the liquid phase of liquid phase fluid is sprayed to chip.
Preferably, liquid phase cleaning pipeline is provided with for adjusting the second liquid flow control valve of fluid flow.
Preferably, the gas for controlling switch is equipped with the gas pipeline, fluid pipeline and liquid phase cleaning pipeline
Dynamic valve.
Present invention also offers a kind of cleaning method based on gas-liquid two-phase atomization cleaner, first turns on liquid phase cleaning
The pneumatic operated valve of pipeline so that one layer of liquid film of crystal column surface uniform fold；Subsequently the gas pipeline and liquid line are opened simultaneously
The pneumatic operated valve in road, forms atomizing particle, is injected in the liquid film of crystal column surface.
Beneficial effects of the present invention：
1st, the present invention makes high-speed liquid stream with the sufficient phase interaction of high velocity gas stream by gas-liquid two-phase atomizing nozzle structure
With, and by adjusting gas flow rate and low flow rate liquid flow velocity, the homogeneous ultra micro atomized drop of particle size is formed, through at a high speed
After gas stream accelerates, wafer surface is injected in, completes to clean.
2nd, present invention airflow direction and wafer surface in technical process is perpendicular, promotes the impurity in surface grooves figure
To the transmission of bodies of fluid, the efficiency of cleaning is improved, improves cleaning performance.Meanwhile, be conducive to saving liquid phase fluid.
3rd, the present invention using size uniformity atomizing particle rinse wafer surface, due to the quality of atomizing particle little, and
Wafer surface has one layer and is cleaned the liquid lamella that duct injection is formed by liquid phase, reduces the impact to wafer surface structure
Power, while decrease the damage to wafer topography structure.
4th, the atomizing particle guide pipe in the present invention can play certain filtration, only retain the direction of motion and gas-liquid
The parallel atomizing particle of biphase atomizer axial direction, reduces transversely acting of the atomizing particle to wafer topography structure
Power, prevents the damage of graphic structure.
Description of the drawings
For the technical scheme being illustrated more clearly that in the embodiment of the present invention, below by to be used needed for embodiment
Accompanying drawing is briefly described, it should be apparent that, drawings in the following description are only some embodiments of the present invention, for ability
For the those of ordinary skill of domain, on the premise of not paying creative work, can be other attached to be obtained according to these accompanying drawings
Figure.
Fig. 1 is the structural representation of the preferred embodiment of gas-liquid two-phase atomization cleaner in the present invention；
Fig. 2 is the movement locus schematic diagram of swing arm in the present invention；
Fig. 3 is the mplifying structure schematic diagram of gas-liquid two-phase atomization cleaner in the present invention；
Fig. 4 is the perspective view of gas-liquid two-phase atomizer preferred embodiment in the present invention；
Fig. 5 is the cross-sectional view of gas-liquid two-phase atomizer preferred embodiment in the present invention；
Fig. 6 is the cross-sectional structure schematic diagram of gas-liquid two-phase atomizer preferred embodiment in the present invention；
Fig. 7 is the partial structural diagram of gas-liquid two-phase atomizer preferred embodiment in the present invention；
Fig. 8 is the partial structural diagram of gas-liquid two-phase atomizer preferred embodiment in the present invention；
Fig. 9 is the structural representation that gas-liquid two-phase atomizer forms atomizing particle in the present invention.
In figure, label is described as follows：
10th, gas pipeline；20th, fluid pipeline；30th, gas-liquid two-phase atomizer；31st, jet element liquid main line；32、
Jet element gas piping；33rd, liquid liquid outlet；34th, gas venthole；35th, jet element liquid branch pipeline；36th, gas tube
Road interface；37th, outlet web plate；38th, atomizing particle pilot conduits；40th, swing arm；50th, chip；60th, nozzle rotary part；70th, gas
Body flow control valve；80th, first liquid flow control valve；90th, liquid phase cleaning pipeline；100th, second liquid flow control valve；
110th, holder；120th, rotary body；130th, motor.
Specific embodiment
For making present disclosure more clear understandable, below in conjunction with Figure of description, present disclosure is made into one
Step explanation.The specific embodiment, the general replacement known to those skilled in the art the invention is not limited in certainly
Cover within the scope of the present invention.Secondly, the present invention has carried out detailed statement using schematic diagram, real the present invention is described in detail
During example, for convenience of description, schematic diagram, should not be in this, as limitation of the invention not according to general ratio partial enlargement.
It should be noted that in following embodiments, the structural representation using Fig. 1～9 is to by the gas in the present invention
The biphase atomization cleaner of liquid has carried out detailed statement.When embodiments of the present invention are described in detail, for convenience of description, respectively show
Be intended to partial enlargement is not drawn and has been carried out according to general ratio and omission is processed, therefore, should avoid in this, as to the present invention
Restriction.
As shown in Figure 1 to Figure 3, the invention provides a kind of gas-liquid two-phase atomization cleaner, for being carried on rotation
Chip 50 on body 120 is cleaned, and the holder 110 on rotary body 120 is used for holding chip 50, and rotary body 120 is by motor
130 drive and drive chip 50 to rotate.Gas-liquid two-phase atomization cleaner include gas pipeline 10, fluid pipeline 20 with
And gas-liquid two-phase atomizer 30.One end of gas pipeline 10 and fluid pipeline 20 is arranged in swing arm 40, its other end connection
To form atomizing particle, swing arm 40 drives gas-liquid two-phase atomizer 30 in 50 edge of chip and crystalline substance to gas-liquid two-phase atomizer 30
Circular arc is done between 50 center of piece moves back and forth (as shown in Figure 2).
In the present embodiment, for the ease of regulating and controlling gas flow and fluid flow, gas pipeline 10 is provided with for adjusting gas
The gas flow regulating valve 70 of body flow, and/or fluid pipeline 20 is provided with for adjusting the first liquid flow of fluid flow
Regulating valve 80.
Additionally, be additionally provided with swing arm 40 cleaning pipeline 90, liquid phase cleaning pipe for spraying the liquid phase of liquid phase fluid to chip
Road 90 is provided with for adjusting the second liquid flow control valve 100 of fluid flow, and swing arm 40 can also drive liquid phase cleaning pipeline
90 do circular arc reciprocating motion between 50 center of 50 edge of chip and chip.
The keying of pipeline 90, gas pipeline 10, liquid is cleaned to control gas pipeline 10, fluid pipeline 20 and liquid phase
The pneumatic operated valve (not shown) for controlling switch is equipped with pipeline 20 and liquid phase cleaning pipeline 90.
The gas in gas pipeline 10 in the present embodiment is preferably N2、CO2, compressed air etc., fluid pipeline 20 and liquid
Mutually the liquid in cleaning pipeline 90 is preferably chemical liquid or ultra-pure water etc., and gas and liquid can be decided according to the actual requirements.
It is as follows that gas-liquid two-phase atomization swings the corresponding operation principle of cleaning system：Chip 50 is solid by holder 110
It is scheduled on rotary body 120, is rotated with certain speed under the drive of motor 130；By first liquid Flow-rate adjustment
Valve 80 and gas flow regulating valve 70 set the flow of fluid pipeline 20 and gas pipeline 10, to adjust gas-liquid two-phase atomization
The size of granule.Preset the movement locus of swing arm 40, the cleaning time, 30 spray angle of gas-liquid two-phase atomizer,
After the relevant informations such as liquid proportion, fluid temperature, cleaning is proceeded by.Cleaning medicinal liquid cleans pipeline 90 by liquid phase first and flows
Go out, be completely covered on the surface of rotation chip 50, form a thin layer liquid.After Preset Time, fluid pipeline 20 and gas pipeline
10 open, and form aerosolized liquid particles in gas-liquid two-phase atomizer 30, and then by atomization under the drive of high-speed gas
Granule pilot conduits 38 are ejected, and are injected in the cleaning medicinal liquid thin layer on 50 surface of chip, physics of the increasing action on pollutant
Active force, while driving the vibration of cleanout fluid thin layer, accelerates pollutant to the transmittance process of cleaning medicinal liquid fluid, improves cleaning effect
Rate, preferably completes cleaning.
Fig. 4 to Fig. 8 is refer to, structural representations of the Fig. 4 to Fig. 8 for gas-liquid two-phase atomizer 30, gas-liquid two-phase are atomized
Nozzle 30 includes jet element liquid main line 31, jet element gas piping 32, liquid liquid outlet 33 and gas venthole
34；31 one end of jet element liquid main line connects fluid pipeline 20, and the other end has and some in divergent shape and equidistantly distributes
Jet element liquid branch pipeline 35, jet element liquid branch pipeline 35 has and with the axial direction of gas-liquid two-phase atomizer is in
The end face that predetermined angle is inclined, the liquid liquid outlet 33 on end face with some preset diameters, 32 side of jet element gas piping
Wall is provided with gas piping interface 36 to connect gas pipeline 10, has horizontally disposed between each jet element liquid branch pipeline 35
Fan-shaped outlet web plate 37, outlet web plate 37 is provided with the gas venthole 34 of some preset diameters.
Specifically, in the present embodiment, the angle between the axial direction of end face and gas-liquid two-phase atomizer 30 is preferably
10 °～80 °, the preset diameters of liquid liquid outlet 33 and gas venthole 34 are 1～300 μm.
In preferred version, the lower end of gas-liquid two-phase atomizer 30 is provided with atomizing particle pilot conduits 38, with removal and gas
The uneven atomizing particle of biphase 30 axial direction of atomizer of liquid.Atomizing particle guide pipe 38 can play certain filtration and make
With, only retaining the direction of motion atomizing particle parallel with 30 axial direction of gas-liquid two-phase atomizer, minimizing atomizing particle is to crystalline substance
The horizontal force of piece surface pattern structure, prevents the damage of graphic structure.
For adjusting the angle of atomizing particle injection, the top of gas-liquid two-phase atomizer 30 is provided with nozzle rotary part 60,
To adjust the spray angle of gas-liquid two-phase atomizer 30.By arranging nozzle rotary part 60, gas-liquid two-phase mist can be adjusted
Change the spray angle of nozzle 30, the liquid that the injection of pipeline 90 is preferably cleaned with liquid phase is coordinated, and is conducive to will be disengaged from wafer surface
Impurity take wafer surface scope out of, prevent the generation of impurity secondary pollution.
The principle that gas-liquid two-phase atomizer 30 in the present embodiment forms atomizing particle is as follows：Clear in fluid pipeline 20
Wash liquid enters the jet element liquid branch pipeline 35 in divergent shape along jet element liquid main line 31, from liquid liquid outlet
33 spray, and as the gross area of liquid liquid outlet 33 is less than the sectional area of fluid pipeline 20, cleans medicinal liquid and produce acceleration, while quilt
Several diameters are divided in the liquid flow of micron dimension, with the oblique injection of default angle.Likewise, the gas of gas pipeline 10
Body is projected by the gas venthole 34 in jet element gas piping 32, forms gas of several diameters in micron dimension
Stream, the axial direction along gas-liquid two-phase atomizer 30 are projected.Gas stream is occurred in the lower section of gas venthole with liquid flow
Effect, liquid flow are broken up to form ultra micro atomizing particle.After ultra micro atomizing particle is formed, in the presence of gas stream, downwards
Accelerate.Uneven ultra micro atomizing particle can be impinged upon the direction of motion with the axial direction of gas-liquid two-phase atomizer 30
In atomizing particle pilot conduits 38, converging again becomes big drop, is flowed down by tube wall, ensures to be oriented to from atomizing particle with this
The direction of motion uniformity of the atomizing particle that the outlet of pipeline 38 is ejected.
Present invention also offers a kind of cleaning method based on gas-liquid two-phase atomization cleaner, first turns on liquid phase cleaning
The pneumatic operated valve of pipeline 90 so that one layer of liquid film of crystal column surface uniform fold；Subsequently the gas pipeline 10 and liquid are opened simultaneously
The pneumatic operated valve of body pipeline 20, forms atomizing particle, is injected in the liquid film of crystal column surface.
In sum, the present invention makes high-speed liquid stream abundant with high velocity gas stream by gas-liquid two-phase atomizing nozzle structure
Interaction, and by adjusting gas flow rate and low flow rate liquid flow velocity, form the homogeneous ultra micro atomized drop of particle size,
After high velocity gas stream accelerates, wafer surface is injected in, completes to clean.Due to the quality of atomizing particle little, and chip
Surface has one layer and is cleaned the liquid lamella that duct injection is formed by liquid phase, reduces the impulsive force to wafer surface structure, with
When decrease damage to wafer topography structure.Additionally, airflow direction is perpendicular with wafer surface in technical process, promote
Enter transmission of the impurity to bodies of fluid in surfacial pattern groove, improve the efficiency of cleaning, improve cleaning performance.Meanwhile, be conducive to
Save liquid phase cleansing medium.
Described above illustrates and describes some preferred embodiments of the present invention, but as previously mentioned, it should be understood that the present invention
Be not limited to form disclosed herein, be not to be taken as the exclusion to other embodiment, and can be used for various other combinations,
Modification and environment, and can be in invention contemplated scope described herein, by above-mentioned teaching or the technology or knowledge of association area
It is modified.And change that those skilled in the art are carried out and change be without departing from the spirit and scope of the present invention, then all should be at this
In the protection domain of bright claims.
Claims (10)
1. a kind of gas-liquid two-phase atomization cleaner, it is characterised in that described device includes gas pipeline, fluid pipeline and gas
One end of the biphase atomizer of liquid, the gas pipeline and fluid pipeline is arranged in swing arm, and its other end connects the gas-liquid
To form atomizing particle, the swing arm drives the gas-liquid two-phase atomizer in Waffer edge with chip to biphase atomizer
Circular arc reciprocating motion is done between the heart；Wherein,
The gas-liquid two-phase atomizer include jet element liquid main line, jet element gas piping, liquid liquid outlet with
And gas venthole；Described jet element liquid main line one end connects the fluid pipeline, and the other end has some in diverging
Shape and the jet element liquid branch pipeline for equidistantly distributing, the jet element liquid branch pipeline have and the gas-liquid two-phase mist
Change the end face that the axial direction of nozzle is inclined in predetermined angle, there is on the end face liquid liquid outlet of some preset diameters,
The jet element gas tube trackside wall is provided with gas piping interface to connect the gas pipeline, each jet element liquid point
There is between pipeline horizontally disposed fan-shaped outlet web plate, the outlet web plate to be provided with the gas outlet of some preset diameters
Hole.
2. gas-liquid two-phase atomization cleaner according to claim 1, it is characterised in that the end face and the gas-liquid two
Angle between the axial direction of phase atomizer is 10 °～80 °.
3. gas-liquid two-phase atomization cleaner according to claim 1, it is characterised in that the gas-liquid two-phase atomizer
Lower end be provided with atomizing particle pilot conduits, with remove uneven with the gas-liquid two-phase atomizer axial direction atomization
Grain.
4. gas-liquid two-phase atomization cleaner according to claim 1, it is characterised in that the gas-liquid two-phase atomizer
Top be provided with nozzle rotary part, to adjust the spray angle of the gas-liquid two-phase atomizer.
5. gas-liquid two-phase atomization cleaner according to claim 1, it is characterised in that the gas pipeline is provided with use
In the gas flow regulating valve of adjusting gas flow, and/or the fluid pipeline is provided with for adjusting the first of fluid flow
Liquid flow regulating valve.
6. gas-liquid two-phase atomization cleaner according to claim 1, it is characterised in that the gentle body of the liquid liquid outlet
The preset diameters of venthole are 1～300 μm.
7. gas-liquid two-phase atomization cleaner according to claim 5, it is characterised in that be additionally provided with the swing arm for
To the liquid phase cleaning pipeline that chip sprays liquid phase fluid.
8. gas-liquid two-phase atomization cleaner according to claim 7, it is characterised in that set on the liquid phase cleaning pipeline
Have for adjusting the second liquid flow control valve of fluid flow.
9. gas-liquid two-phase atomization cleaner according to claim 7, it is characterised in that the gas pipeline, liquid line
The pneumatic operated valve for controlling switch is equipped with road and liquid phase cleaning pipeline.
10. a kind of cleaning method of the gas-liquid two-phase atomization cleaner based on described in claim 9, it is characterised in that first
Open the pneumatic operated valve that liquid phase cleans pipeline so that one layer of liquid film of wafer surface uniform fold；Subsequently the gas tube is opened simultaneously
Road and the pneumatic operated valve of fluid pipeline, form atomizing particle, are injected in the liquid film of wafer surface.
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| CN201510261375.8A CN104841660B (en) | 2015-05-21 | 2015-05-21 | Gas-liquid two-phase atomization cleaner and cleaning method |
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| CN201510261375.8A CN104841660B (en) | 2015-05-21 | 2015-05-21 | Gas-liquid two-phase atomization cleaner and cleaning method |
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| CN104841660B true CN104841660B (en) | 2017-03-15 |
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| CN204746945U (en) * | 2015-05-21 | 2015-11-11 | 北京七星华创电子股份有限公司 | Gas -liquid two -phase belt cleaning device that atomizes |
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