CN104823293B - 具有最小顶板寄生电容的可堆叠高密度金属-氧化物-金属电容器 - Google Patents
具有最小顶板寄生电容的可堆叠高密度金属-氧化物-金属电容器 Download PDFInfo
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- CN104823293B CN104823293B CN201380062002.7A CN201380062002A CN104823293B CN 104823293 B CN104823293 B CN 104823293B CN 201380062002 A CN201380062002 A CN 201380062002A CN 104823293 B CN104823293 B CN 104823293B
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- 239000003990 capacitor Substances 0.000 title claims abstract description 91
- 239000002184 metal Substances 0.000 title description 10
- 230000003071 parasitic effect Effects 0.000 title description 8
- 239000004020 conductor Substances 0.000 claims abstract description 741
- 239000000758 substrate Substances 0.000 claims abstract description 80
- 238000000034 method Methods 0.000 claims description 42
- 239000004744 fabric Substances 0.000 claims 1
- 238000003491 array Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
Classifications
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D1/00—Resistors, capacitors or inductors
- H10D1/60—Capacitors
- H10D1/68—Capacitors having no potential barriers
- H10D1/692—Electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/002—Details
- H01G4/005—Electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/002—Details
- H01G4/228—Terminals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/38—Multiple capacitors, i.e. structural combinations of fixed capacitors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
- H01L23/5222—Capacitive arrangements or effects of, or between wiring layers
- H01L23/5223—Capacitor integral with wiring layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D1/00—Resistors, capacitors or inductors
- H10D1/01—Manufacture or treatment
- H10D1/041—Manufacture or treatment of capacitors having no potential barriers
- H10D1/042—Manufacture or treatment of capacitors having no potential barriers using deposition processes to form electrode extensions
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D1/00—Resistors, capacitors or inductors
- H10D1/60—Capacitors
- H10D1/68—Capacitors having no potential barriers
- H10D1/692—Electrodes
- H10D1/711—Electrodes having non-planar surfaces, e.g. formed by texturisation
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D1/00—Resistors, capacitors or inductors
- H10D1/60—Capacitors
- H10D1/68—Capacitors having no potential barriers
- H10D1/692—Electrodes
- H10D1/711—Electrodes having non-planar surfaces, e.g. formed by texturisation
- H10D1/714—Electrodes having non-planar surfaces, e.g. formed by texturisation having horizontal extensions
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D1/00—Resistors, capacitors or inductors
- H10D1/60—Capacitors
- H10D1/68—Capacitors having no potential barriers
- H10D1/692—Electrodes
- H10D1/711—Electrodes having non-planar surfaces, e.g. formed by texturisation
- H10D1/716—Electrodes having non-planar surfaces, e.g. formed by texturisation having vertical extensions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/002—Details
- H01G4/018—Dielectrics
- H01G4/06—Solid dielectrics
- H01G4/08—Inorganic dielectrics
- H01G4/10—Metal-oxide dielectrics
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Power Engineering (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Semiconductor Integrated Circuits (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Design And Manufacture Of Integrated Circuits (AREA)
- Structure Of Printed Boards (AREA)
Abstract
Description
Claims (16)
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201261730716P | 2012-11-28 | 2012-11-28 | |
US61/730,716 | 2012-11-28 | ||
US14/086,154 | 2013-11-21 | ||
US14/086,154 US9450041B2 (en) | 2012-11-28 | 2013-11-21 | Stackable high-density metal-oxide-metal capacitor with minimum top plate parasitic capacitance |
PCT/US2013/071367 WO2014085209A1 (en) | 2012-11-28 | 2013-11-22 | Stackable high-density metal-oxide-metal capacitor with minimum top plate parasitic capacitance |
Publications (2)
Publication Number | Publication Date |
---|---|
CN104823293A CN104823293A (zh) | 2015-08-05 |
CN104823293B true CN104823293B (zh) | 2018-06-01 |
Family
ID=50772522
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201380062002.7A Expired - Fee Related CN104823293B (zh) | 2012-11-28 | 2013-11-22 | 具有最小顶板寄生电容的可堆叠高密度金属-氧化物-金属电容器 |
Country Status (5)
Country | Link |
---|---|
US (1) | US9450041B2 (zh) |
KR (1) | KR102145456B1 (zh) |
CN (1) | CN104823293B (zh) |
TW (1) | TWI583005B (zh) |
WO (1) | WO2014085209A1 (zh) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109037211B (zh) | 2017-06-12 | 2020-10-16 | 扬智科技股份有限公司 | 电容阵列结构 |
CN108198802A (zh) * | 2017-12-28 | 2018-06-22 | 上海华力微电子有限公司 | 电容器 |
US10726191B2 (en) * | 2018-09-28 | 2020-07-28 | Taiwan Semiconductor Manufacturing Company Ltd. | Method and system for manufacturing a semiconductor device |
WO2020211093A1 (zh) | 2019-04-19 | 2020-10-22 | 深圳市汇顶科技股份有限公司 | 电容器及其制作方法 |
US10867904B1 (en) | 2019-06-14 | 2020-12-15 | Taiwan Semiconductor Manufacturing Company Ltd. | Integrated circuit structure of capacitive device |
TWI774364B (zh) * | 2021-05-11 | 2022-08-11 | 瑞昱半導體股份有限公司 | 能夠朝向布局邊緣形成寄生電容的半導體電容陣列布局 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1459123A (zh) * | 2000-09-14 | 2003-11-26 | 加州理工学院 | 具有增强匹配特性的高效电容器结构 |
US7456462B1 (en) * | 2006-03-07 | 2008-11-25 | Alvand Technologies, Inc. | Fabricated U-shaped capacitor for a digital-to-analog converter |
CN101410978A (zh) * | 2006-05-18 | 2009-04-15 | 国际商业机器公司 | 可调节的芯片上子电容器设计 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4525965B2 (ja) * | 2004-01-06 | 2010-08-18 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
FR2870042B1 (fr) * | 2004-05-07 | 2006-09-29 | St Microelectronics Sa | Structure capacitive de circuit integre |
TWI258865B (en) * | 2005-03-29 | 2006-07-21 | Realtek Semiconductor Corp | Longitudinal plate capacitor structure |
US8536677B2 (en) * | 2005-10-04 | 2013-09-17 | Infineon Technologies Ag | Capacitor structure |
US7561407B1 (en) * | 2005-11-28 | 2009-07-14 | Altera Corporation | Multi-segment capacitor |
US8076752B2 (en) | 2006-03-20 | 2011-12-13 | Standard Microsystems Corporation | Fringe capacitor using bootstrapped non-metal layer |
US7518850B2 (en) * | 2006-05-18 | 2009-04-14 | International Business Machines Corporation | High yield, high density on-chip capacitor design |
US7456463B2 (en) * | 2007-02-06 | 2008-11-25 | International Business Machines Corporation | Capacitor having electrodes at different depths to reduce parasitic capacitance |
JP5139171B2 (ja) * | 2008-02-05 | 2013-02-06 | 日本特殊陶業株式会社 | ビアアレイ型積層セラミックコンデンサ及びその製造方法、コンデンサ内蔵配線基板 |
JP5324247B2 (ja) * | 2009-02-09 | 2013-10-23 | 日本特殊陶業株式会社 | 積層セラミックコンデンサ |
US9111689B2 (en) * | 2009-07-02 | 2015-08-18 | Taiwan Semiconductor Manufacturing Company, Ltd. | Vertical interdigitated semiconductor capacitor |
US8493708B2 (en) * | 2011-02-21 | 2013-07-23 | International Business Machines Corporation | Capacitor structure |
US8970002B2 (en) | 2011-05-09 | 2015-03-03 | Marvell World Trade Ltd. | Metal oxide metal capacitor structures |
-
2013
- 2013-11-21 US US14/086,154 patent/US9450041B2/en active Active
- 2013-11-22 WO PCT/US2013/071367 patent/WO2014085209A1/en active Application Filing
- 2013-11-22 KR KR1020157016772A patent/KR102145456B1/ko active IP Right Grant
- 2013-11-22 CN CN201380062002.7A patent/CN104823293B/zh not_active Expired - Fee Related
- 2013-11-27 TW TW102143279A patent/TWI583005B/zh not_active IP Right Cessation
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1459123A (zh) * | 2000-09-14 | 2003-11-26 | 加州理工学院 | 具有增强匹配特性的高效电容器结构 |
US7456462B1 (en) * | 2006-03-07 | 2008-11-25 | Alvand Technologies, Inc. | Fabricated U-shaped capacitor for a digital-to-analog converter |
CN101410978A (zh) * | 2006-05-18 | 2009-04-15 | 国际商业机器公司 | 可调节的芯片上子电容器设计 |
Non-Patent Citations (1)
Title |
---|
Capacity Limits and Matching Properties of Integrated Capacitors;Roberto Aparicio et al.;《IEEE journal of solid-state circuits》;20020807;第37卷(第3期);第384-393页 * |
Also Published As
Publication number | Publication date |
---|---|
KR102145456B1 (ko) | 2020-08-19 |
TWI583005B (zh) | 2017-05-11 |
TW201436246A (zh) | 2014-09-16 |
US9450041B2 (en) | 2016-09-20 |
WO2014085209A1 (en) | 2014-06-05 |
KR20150088846A (ko) | 2015-08-03 |
US20140145304A1 (en) | 2014-05-29 |
CN104823293A (zh) | 2015-08-05 |
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Legal Events
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PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant | ||
TR01 | Transfer of patent right |
Effective date of registration: 20200430 Address after: Ford street, Grand Cayman, Cayman Islands Patentee after: Kaiwei international Co. Address before: Hamilton, Bermuda Patentee before: Marvell International Ltd. Effective date of registration: 20200430 Address after: Singapore City Patentee after: Marvell Asia Pte. Ltd. Address before: Ford street, Grand Cayman, Cayman Islands Patentee before: Kaiwei international Co. Effective date of registration: 20200430 Address after: Hamilton, Bermuda Patentee after: Marvell International Ltd. Address before: Babado J San Mega Le Patentee before: MARVELL WORLD TRADE Ltd. |
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TR01 | Transfer of patent right | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20180601 Termination date: 20211122 |
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CF01 | Termination of patent right due to non-payment of annual fee |