CN104591271B - 一种制备二氧化钛微孔薄膜的方法 - Google Patents
一种制备二氧化钛微孔薄膜的方法 Download PDFInfo
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- CN104591271B CN104591271B CN201510067121.2A CN201510067121A CN104591271B CN 104591271 B CN104591271 B CN 104591271B CN 201510067121 A CN201510067121 A CN 201510067121A CN 104591271 B CN104591271 B CN 104591271B
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- titanium dioxide
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- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 title claims abstract description 174
- 239000004408 titanium dioxide Substances 0.000 title claims abstract description 80
- 238000000034 method Methods 0.000 title claims abstract description 31
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims abstract description 79
- 239000006185 dispersion Substances 0.000 claims abstract description 61
- SOQBVABWOPYFQZ-UHFFFAOYSA-N oxygen(2-);titanium(4+) Chemical compound [O-2].[O-2].[Ti+4] SOQBVABWOPYFQZ-UHFFFAOYSA-N 0.000 claims abstract description 49
- 239000000758 substrate Substances 0.000 claims abstract description 31
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 23
- 239000002904 solvent Substances 0.000 claims abstract description 16
- 239000002105 nanoparticle Substances 0.000 claims abstract description 13
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 40
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 20
- 238000003756 stirring Methods 0.000 claims description 16
- 238000006243 chemical reaction Methods 0.000 claims description 15
- 239000007788 liquid Substances 0.000 claims description 15
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 12
- 238000001035 drying Methods 0.000 claims description 12
- 239000012046 mixed solvent Substances 0.000 claims description 10
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 9
- 238000009835 boiling Methods 0.000 claims description 9
- 239000011521 glass Substances 0.000 claims description 9
- 239000010409 thin film Substances 0.000 claims description 9
- 239000008367 deionised water Substances 0.000 claims description 7
- 229910021641 deionized water Inorganic materials 0.000 claims description 7
- 238000004528 spin coating Methods 0.000 claims description 7
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 3
- 239000010936 titanium Substances 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 2
- 238000001816 cooling Methods 0.000 claims description 2
- 229910052710 silicon Inorganic materials 0.000 claims description 2
- 239000010703 silicon Substances 0.000 claims description 2
- 238000005245 sintering Methods 0.000 claims description 2
- 238000004506 ultrasonic cleaning Methods 0.000 claims description 2
- 239000012982 microporous membrane Substances 0.000 claims 6
- FPCJKVGGYOAWIZ-UHFFFAOYSA-N butan-1-ol;titanium Chemical compound [Ti].CCCCO.CCCCO.CCCCO.CCCCO FPCJKVGGYOAWIZ-UHFFFAOYSA-N 0.000 claims 3
- 125000004836 hexamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 claims 2
- 230000000873 masking effect Effects 0.000 claims 2
- 239000002253 acid Substances 0.000 claims 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 claims 1
- 238000001704 evaporation Methods 0.000 claims 1
- 229910052573 porcelain Inorganic materials 0.000 claims 1
- 238000004062 sedimentation Methods 0.000 claims 1
- 238000010792 warming Methods 0.000 claims 1
- 238000005406 washing Methods 0.000 claims 1
- 239000003795 chemical substances by application Substances 0.000 abstract description 8
- 238000004519 manufacturing process Methods 0.000 abstract description 7
- 238000002360 preparation method Methods 0.000 abstract description 6
- 238000005516 engineering process Methods 0.000 abstract description 2
- 229910010272 inorganic material Inorganic materials 0.000 abstract description 2
- 239000011147 inorganic material Substances 0.000 abstract description 2
- 238000012805 post-processing Methods 0.000 abstract description 2
- 239000010408 film Substances 0.000 description 67
- YHWCPXVTRSHPNY-UHFFFAOYSA-N butan-1-olate;titanium(4+) Chemical compound [Ti+4].CCCC[O-].CCCC[O-].CCCC[O-].CCCC[O-] YHWCPXVTRSHPNY-UHFFFAOYSA-N 0.000 description 20
- 238000010992 reflux Methods 0.000 description 16
- 239000000047 product Substances 0.000 description 15
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 10
- 238000010438 heat treatment Methods 0.000 description 10
- 239000010453 quartz Substances 0.000 description 10
- 238000004140 cleaning Methods 0.000 description 9
- 239000011148 porous material Substances 0.000 description 9
- 239000002244 precipitate Substances 0.000 description 7
- 238000009826 distribution Methods 0.000 description 6
- 238000001179 sorption measurement Methods 0.000 description 6
- 238000002441 X-ray diffraction Methods 0.000 description 4
- 239000007810 chemical reaction solvent Substances 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 239000000376 reactant Substances 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 239000007772 electrode material Substances 0.000 description 2
- 239000002243 precursor Substances 0.000 description 2
- 230000000630 rising effect Effects 0.000 description 2
- 238000001338 self-assembly Methods 0.000 description 2
- 239000000654 additive Substances 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 238000006056 electrooxidation reaction Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- JYVHOGDBFNJNMR-UHFFFAOYSA-N hexane;hydrate Chemical group O.CCCCCC JYVHOGDBFNJNMR-UHFFFAOYSA-N 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000013032 photocatalytic reaction Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000001954 sterilising effect Effects 0.000 description 1
- 238000004659 sterilization and disinfection Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000003075 superhydrophobic effect Effects 0.000 description 1
- -1 tetrabutyl titanate Ester Chemical class 0.000 description 1
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- Inorganic Compounds Of Heavy Metals (AREA)
Abstract
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CN109206339B (zh) * | 2017-06-29 | 2021-04-27 | 湘潭大学 | 一种环己胺氧化制备环己酮肟的方法 |
CN107935036B (zh) * | 2017-11-30 | 2020-02-07 | 重庆文理学院 | 一种致密二氧化钛薄膜的室温成膜制备方法 |
CN109524497B (zh) * | 2018-11-07 | 2020-10-27 | 西安交通大学 | 一种透明超快响应自供能紫外探测器及其制备方法 |
CN110918079B (zh) * | 2019-12-19 | 2022-09-02 | 延安大学 | 一种纳米粉体二氧化钛薄膜耐酸材料及其制备方法 |
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CN100539199C (zh) * | 2006-12-22 | 2009-09-09 | 比亚迪股份有限公司 | 一种二氧化钛双元纳晶多孔薄膜及其制备方法 |
CN101585552B (zh) * | 2009-06-26 | 2011-08-10 | 上海大学 | 由TiO2纳米晶水溶胶制备TiO2多孔薄膜的方法 |
CN103000297A (zh) * | 2011-09-15 | 2013-03-27 | 中国科学院生态环境研究中心 | 一种在低温下制备纳米金属氧化物半导体薄膜电极的方法 |
CN103730259B (zh) * | 2013-12-27 | 2016-08-17 | 沈阳工业大学 | 一种双尺度孔隙结构的纳米晶二氧化钛薄膜及其制备方法 |
CN103833074B (zh) * | 2014-03-19 | 2015-08-19 | 吉林大学 | 一种制备二氧化钛纳米粒子的方法 |
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Effective date of registration: 20181229 Address after: Room 511, 5th floor, Area A, 2499 Weishan Road, Changchun High-tech Zone, Jilin Province, 130012 Patentee after: Jilin University Science Park Development Center Address before: 130012 No. 2699 Qianjin Street, Jilin, Changchun Patentee before: Jilin University |
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Effective date of registration: 20190926 Address after: 130012 Jilin province Changchun high tech District No. 3333 North Street North Grand Changchun science and technology park a first floor of building C2-1 Patentee after: Jilin Jida Incubator Co. Ltd. Address before: 130012, room 5, building 2499, A District, 511 Wei Shan Road, Changchun hi tech Zone, Jilin, China Patentee before: Jilin University Science Park Development Center |
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Effective date of registration: 20191118 Address after: Room 005, room 801, floor 8, building b1-1, industrial phase I, Beihu science and Technology Park, No. 3333, Shengbei street, Beihu science and Technology Development Zone, Changchun City, Jilin Province Patentee after: Jilin runzhen Separation Technology Co., Ltd Address before: 130012 Jilin province Changchun high tech District No. 3333 North Street North Grand Changchun science and technology park a first floor of building C2-1 Patentee before: Jilin Jida Incubator Co. Ltd. |