CN1044395C - 表面覆层的电镀方法 - Google Patents

表面覆层的电镀方法 Download PDF

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Publication number
CN1044395C
CN1044395C CN94190766A CN94190766A CN1044395C CN 1044395 C CN1044395 C CN 1044395C CN 94190766 A CN94190766 A CN 94190766A CN 94190766 A CN94190766 A CN 94190766A CN 1044395 C CN1044395 C CN 1044395C
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CN
China
Prior art keywords
current
current density
plating
described method
nucleus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
CN94190766A
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English (en)
Chinese (zh)
Other versions
CN1115583A (zh
Inventor
K·米尔
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Roman Bag Holding Open Co ltd
Original Assignee
Roman Bag Holding Open Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
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First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=6499571&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=CN1044395(C) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Priority claimed from DE4334122A external-priority patent/DE4334122C2/de
Application filed by Roman Bag Holding Open Co ltd filed Critical Roman Bag Holding Open Co ltd
Publication of CN1115583A publication Critical patent/CN1115583A/zh
Application granted granted Critical
Publication of CN1044395C publication Critical patent/CN1044395C/zh
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/625—Discontinuous layers, e.g. microcracked layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B17/00—Methods preventing fouling
    • B08B17/02—Preventing deposition of fouling or of dust
    • B08B17/06—Preventing deposition of fouling or of dust by giving articles subject to fouling a special shape or arrangement
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B17/00—Methods preventing fouling
    • B08B17/02—Preventing deposition of fouling or of dust
    • B08B17/06—Preventing deposition of fouling or of dust by giving articles subject to fouling a special shape or arrangement
    • B08B17/065—Preventing deposition of fouling or of dust by giving articles subject to fouling a special shape or arrangement the surface having a microscopic surface pattern to achieve the same effect as a lotus flower
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/18—Electroplating using modulated, pulsed or reversing current
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/605—Surface topography of the layers, e.g. rough, dendritic or nodular layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
CN94190766A 1993-10-07 1994-10-01 表面覆层的电镀方法 Expired - Lifetime CN1044395C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE4334122A DE4334122C2 (de) 1992-04-09 1993-10-07 Verfahren zum elektrochemischen Aufbringen einer Oberflächenbeschichtung und Anwendung des Verfahrens
DEP4334122.5 1993-10-07

Publications (2)

Publication Number Publication Date
CN1115583A CN1115583A (zh) 1996-01-24
CN1044395C true CN1044395C (zh) 1999-07-28

Family

ID=6499571

Family Applications (1)

Application Number Title Priority Date Filing Date
CN94190766A Expired - Lifetime CN1044395C (zh) 1993-10-07 1994-10-01 表面覆层的电镀方法

Country Status (17)

Country Link
EP (1) EP0722515B1 (pt)
JP (1) JP3293828B2 (pt)
KR (1) KR100332077B1 (pt)
CN (1) CN1044395C (pt)
AU (1) AU7784794A (pt)
BR (1) BR9405631A (pt)
CA (1) CA2172613C (pt)
CH (1) CH690273A5 (pt)
CZ (1) CZ286909B6 (pt)
DE (1) DE59405190D1 (pt)
ES (1) ES2114703T3 (pt)
FI (1) FI103674B1 (pt)
GR (1) GR3026689T3 (pt)
PL (1) PL177073B1 (pt)
SI (1) SI9420006B (pt)
SK (1) SK281999B6 (pt)
WO (1) WO1995009938A1 (pt)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19828545C1 (de) * 1998-06-26 1999-08-12 Cromotec Oberflaechentechnik G Galvanisches Bad, Verfahren zur Erzeugung strukturierter Hartchromschichten und Verwendung
US6478943B1 (en) 2000-06-01 2002-11-12 Roll Surface Technologies, Inc. Method of manufacture of electrochemically textured surface having controlled peak characteristics
CA2450283C (en) * 2001-07-05 2008-10-28 Roll Surface Technologies, Inc. Electrochemically textured surface having controlled peak characteristics and the method of manufacture
DE10255853A1 (de) 2002-11-29 2004-06-17 Federal-Mogul Burscheid Gmbh Herstellung strukturierter Hartchromschichten
DE10302107A1 (de) * 2003-01-21 2004-07-29 Fuchs Technology Ag Zylinderoberfläche
DE102004019370B3 (de) 2004-04-21 2005-09-01 Federal-Mogul Burscheid Gmbh Herstellung einer strukturierten Hartchromschicht und Herstellung einer Beschichtung
DE102008017270B3 (de) 2008-04-04 2009-06-04 Federal-Mogul Burscheid Gmbh Strukturierte Chrom-Feststoffpartikel-Schicht und Verfahren zu deren Herstellung sowie beschichtetes Maschinenelement
AT506076B1 (de) * 2008-06-03 2009-06-15 Vassilios Dipl Ing Polydoros Verfahren zur herstellung von nanostrukturierten chromschichten auf einem substrat
EP2149447A1 (de) 2008-07-29 2010-02-03 Alcan Technology & Management Ltd. Verfahren zur Herstellung einer Materialbahn mit Oberflächenstruktur
CN102877098B (zh) * 2012-10-29 2015-06-17 东莞市若美电子科技有限公司 一种多波段输出的脉冲电镀方法
EP3000918B1 (de) * 2014-09-24 2018-10-24 topocrom systems AG Verfahren zum galvanischen aufbringen einer oberflächenbeschichtung
CN105734631B (zh) * 2014-12-10 2019-03-19 上海宝钢工业技术服务有限公司 冷轧轧辊毛化处理的电镀方法
WO2017076456A1 (de) * 2015-11-05 2017-05-11 Topocrom Systems Ag Verfahren und vorrichtung zum galvanischen aufbringen einer oberflächenbeschichtung
CN110117802B (zh) * 2019-05-06 2020-05-22 浙江大学 一种多级三维微观结构的制备方法
CN111962120A (zh) * 2020-08-18 2020-11-20 重庆佰鸿机械设备有限公司 一种管件内壁表面处理工艺
EP4012074A1 (de) 2020-12-14 2022-06-15 topocrom systems AG Oberflächenbeschichtung und verfahren zu ihrer herstellung

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3307748A1 (de) * 1982-03-05 1983-09-15 Olin Corp., 62024 East Alton, Ill. Verfahren zum behandeln einer metallfolie zwecks verbesserung ihres haftvermoegens
US5185073A (en) * 1988-06-21 1993-02-09 International Business Machines Corporation Method of fabricating nendritic materials
DE4211881A1 (de) * 1992-04-09 1993-10-14 Wmv Ag Verfahren zum galvanischen Aufbringen einer Oberflächenbeschichtung

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DD134785A1 (de) * 1978-01-25 1979-03-21 Hans Skilandat Verfahren zur elektrolytischen erzeugung eines kupfernen haftbelages auf kupferfolie

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3307748A1 (de) * 1982-03-05 1983-09-15 Olin Corp., 62024 East Alton, Ill. Verfahren zum behandeln einer metallfolie zwecks verbesserung ihres haftvermoegens
US5185073A (en) * 1988-06-21 1993-02-09 International Business Machines Corporation Method of fabricating nendritic materials
DE4211881A1 (de) * 1992-04-09 1993-10-14 Wmv Ag Verfahren zum galvanischen Aufbringen einer Oberflächenbeschichtung

Also Published As

Publication number Publication date
SI9420006A (en) 1995-12-31
SK86195A3 (en) 1996-03-06
EP0722515A1 (de) 1996-07-24
BR9405631A (pt) 1999-09-08
CA2172613A1 (en) 1995-04-13
FI103674B (fi) 1999-08-13
DE59405190D1 (de) 1998-03-05
JPH09503550A (ja) 1997-04-08
GR3026689T3 (en) 1998-07-31
CZ286909B6 (en) 2000-08-16
WO1995009938A1 (de) 1995-04-13
SI9420006B (sl) 2002-02-28
FI952774A0 (fi) 1995-06-06
SK281999B6 (sk) 2001-10-08
FI952774A (fi) 1995-06-06
FI103674B1 (fi) 1999-08-13
CN1115583A (zh) 1996-01-24
JP3293828B2 (ja) 2002-06-17
PL309286A1 (en) 1995-10-02
PL177073B1 (pl) 1999-09-30
EP0722515B1 (de) 1998-01-28
ES2114703T3 (es) 1998-06-01
CZ144795A3 (en) 1996-07-17
CH690273A5 (de) 2000-06-30
KR100332077B1 (ko) 2002-10-31
AU7784794A (en) 1995-05-01
CA2172613C (en) 2003-06-17

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C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
C17 Cessation of patent right
CX01 Expiry of patent term

Expiration termination date: 20141001

Granted publication date: 19990728