CN104303103B - 用于薄膜嵌段共聚物的取向控制的酸酐共聚物的面涂层 - Google Patents

用于薄膜嵌段共聚物的取向控制的酸酐共聚物的面涂层 Download PDF

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Publication number
CN104303103B
CN104303103B CN201380011365.8A CN201380011365A CN104303103B CN 104303103 B CN104303103 B CN 104303103B CN 201380011365 A CN201380011365 A CN 201380011365A CN 104303103 B CN104303103 B CN 104303103B
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block copolymer
layer
polymer
surface energy
film
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Expired - Fee Related
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Chinese (zh)
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CN104303103A (zh
Inventor
C·G·威尔森
C·J·艾里森
T·濑下
J·卡申
C·M·巴特斯
L·迪安
L·J·桑托斯
E·L·劳施
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University of Texas at Austin
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/002—Processes for applying liquids or other fluent materials the substrate being rotated
    • B05D1/005—Spin coating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
    • B05D7/50—Multilayers
    • B05D7/52—Two layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
    • B05D7/50—Multilayers
    • B05D7/56—Three layers or more
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
    • B81C1/00023—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems without movable or flexible elements
    • B81C1/00031—Regular or irregular arrays of nanoscale structures, e.g. etch mask layer
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D137/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a heterocyclic ring containing oxygen; Coating compositions based on derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D167/00—Coating compositions based on polyesters obtained by reactions forming a carboxylic ester link in the main chain; Coating compositions based on derivatives of such polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D2252/00—Sheets
    • B05D2252/02—Sheets of indefinite length
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2201/00—Manufacture or treatment of microstructural devices or systems
    • B81C2201/01—Manufacture or treatment of microstructural devices or systems in or on a substrate
    • B81C2201/0101—Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning
    • B81C2201/0147—Film patterning
    • B81C2201/0149—Forming nanoscale microstructures using auto-arranging or self-assembling material
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31652—Of asbestos
    • Y10T428/31663—As siloxane, silicone or silane
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31855—Of addition polymer from unsaturated monomers

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Analytical Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Theoretical Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Laminated Bodies (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
CN201380011365.8A 2012-02-10 2013-02-07 用于薄膜嵌段共聚物的取向控制的酸酐共聚物的面涂层 Expired - Fee Related CN104303103B (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201261597327P 2012-02-10 2012-02-10
US61/597,327 2012-02-10
US13/761,918 US9157008B2 (en) 2012-02-10 2013-02-07 Anhydride copolymer top coats for orientation control of thin film block copolymers
PCT/US2013/025174 WO2013119832A1 (en) 2012-02-10 2013-02-07 Anhydride copolymer top coats for orientation control of thin film block copolymers
US13/761,918 2013-02-07

Publications (2)

Publication Number Publication Date
CN104303103A CN104303103A (zh) 2015-01-21
CN104303103B true CN104303103B (zh) 2019-04-26

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Country Status (6)

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US (2) US9157008B2 (https=)
JP (1) JP6258227B2 (https=)
KR (1) KR102018932B1 (https=)
CN (1) CN104303103B (https=)
SG (1) SG11201404414SA (https=)
WO (1) WO2013119832A1 (https=)

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US10457088B2 (en) 2013-05-13 2019-10-29 Ridgefield Acquisition Template for self assembly and method of making a self assembled pattern
TWI658055B (zh) * 2013-06-19 2019-05-01 德州大學董事會 用於薄膜嵌段共聚物之定向控制之酸酐共聚物面塗層
US9093263B2 (en) 2013-09-27 2015-07-28 Az Electronic Materials (Luxembourg) S.A.R.L. Underlayer composition for promoting self assembly and method of making and using
US9181449B2 (en) 2013-12-16 2015-11-10 Az Electronic Materials (Luxembourg) S.A.R.L. Underlayer composition for promoting self assembly and method of making and using
TWI648320B (zh) * 2014-01-23 2019-01-21 東京應化工業股份有限公司 含相分離結構之結構體之製造方法、圖型形成方法、微細圖型形成方法
WO2015142641A1 (en) * 2014-03-15 2015-09-24 Board Of Regents, The Univrsity Of Texas System Ordering block copolymers
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JP6325320B2 (ja) * 2014-04-09 2018-05-16 東京応化工業株式会社 相分離構造を含む構造体の製造方法及びトップコート膜の成膜方法
JP2016107211A (ja) * 2014-12-05 2016-06-20 Jsr株式会社 自己組織化膜の形成方法、パターン形成方法及び自己組織化膜形成用組成物
FR3037070B1 (fr) * 2015-06-02 2019-05-31 Arkema France Procede de controle de l'energie de surface a l'interface entre un copolymere a blocs et un autre compose
FR3037071B1 (fr) * 2015-06-02 2019-06-21 Arkema France Procede de reduction de la defectivite d'un film de copolymere a blocs
JP6039028B1 (ja) * 2015-09-11 2016-12-07 株式会社東芝 自己組織化材料及びパターン形成方法
TWI612108B (zh) * 2015-10-31 2018-01-21 Rohm And Haas Electronic Materials Llc 嵌段共聚物及圖案處理組合物以及方法
WO2018033559A1 (en) 2016-08-18 2018-02-22 AZ Electronic Materials (Luxembourg) S.à.r.l. Polymer compositions for self-assembly applications
JP6835969B2 (ja) 2016-12-21 2021-02-24 メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフツングＭｅｒｃｋ Ｐａｔｅｎｔ Ｇｅｓｅｌｌｓｃｈａｆｔ ｍｉｔ ｂｅｓｃｈｒａｅｎｋｔｅｒ Ｈａｆｔｕｎｇ ブロックコポリマーの自己組織化のための新規組成物及び方法
FR3069339B1 (fr) * 2017-07-21 2021-05-14 Arkema France Procede de controle de l'orientation des nano-domaines d'un copolymere a blocs
FR3069340A1 (fr) 2017-07-21 2019-01-25 Arkema France Procede de controle de l'orientation des nano-domaines d'un copolymere a blocs
FR3074179B1 (fr) 2017-11-24 2021-01-01 Arkema France Procede de controle de la planeite d'un empilement polymerique
FR3074180B1 (fr) * 2017-11-24 2021-01-01 Arkema France Procede de controle de la planeite d'un empilement polymerique
CN113490696B (zh) 2018-12-07 2022-12-23 默克专利股份有限公司 用于聚苯乙烯-b-聚(甲基丙烯酸甲酯)二嵌段共聚物的接触孔自组装的快速可交联中性底层及其配制剂
KR102136470B1 (ko) * 2018-12-24 2020-07-22 (주)서영 기판과 평행방향으로 자기조립된 실린더 블록공중합체를 이용한 대면적 나노패턴 제조 방법
FR3096281A1 (fr) 2019-05-20 2020-11-27 Université De Bordeaux procédé de préparation d’un film de copolymère à blocs destiné à la création d’un masque de nanolithographie
FR3105786A1 (fr) * 2019-12-31 2021-07-02 Arkema France Procédé de nanostructuration d’un substrat
US12072987B1 (en) * 2020-04-10 2024-08-27 Google Llc Private counting from anonymous messages: near-optimal accuracy with vanishing communication overhead

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KR102018932B1 (ko) 2019-09-05
JP6258227B2 (ja) 2018-01-10
US20130280497A1 (en) 2013-10-24
KR20140130146A (ko) 2014-11-07
WO2013119832A1 (en) 2013-08-15
US10139724B2 (en) 2018-11-27
US9157008B2 (en) 2015-10-13
JP2015516891A (ja) 2015-06-18
CN104303103A (zh) 2015-01-21
US20150370159A1 (en) 2015-12-24
SG11201404414SA (en) 2014-08-28

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