CN104276755A - 一种高化学耐久性的无碱硼铝硅酸盐玻璃 - Google Patents
一种高化学耐久性的无碱硼铝硅酸盐玻璃 Download PDFInfo
- Publication number
- CN104276755A CN104276755A CN201310528623.1A CN201310528623A CN104276755A CN 104276755 A CN104276755 A CN 104276755A CN 201310528623 A CN201310528623 A CN 201310528623A CN 104276755 A CN104276755 A CN 104276755A
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- CN
- China
- Prior art keywords
- glass
- alkali
- high chemical
- chemical durability
- temperature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000000126 substance Substances 0.000 title claims abstract description 30
- 239000004411 aluminium Substances 0.000 title claims abstract description 18
- 229910052782 aluminium Inorganic materials 0.000 title claims abstract description 18
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 title claims abstract description 18
- 239000005388 borosilicate glass Substances 0.000 title abstract 3
- 239000011521 glass Substances 0.000 claims abstract description 65
- 239000000203 mixture Substances 0.000 claims abstract description 15
- 239000003513 alkali Substances 0.000 claims description 21
- 229910052796 boron Inorganic materials 0.000 claims description 16
- 239000005368 silicate glass Substances 0.000 claims description 16
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 15
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 10
- 229910006404 SnO 2 Inorganic materials 0.000 claims description 7
- 239000000758 substrate Substances 0.000 abstract description 18
- 238000002844 melting Methods 0.000 abstract description 6
- 230000008018 melting Effects 0.000 abstract description 6
- 239000004973 liquid crystal related substance Substances 0.000 abstract description 4
- 239000010409 thin film Substances 0.000 abstract description 4
- 238000005516 engineering process Methods 0.000 abstract description 3
- 238000004519 manufacturing process Methods 0.000 abstract description 3
- 239000000463 material Substances 0.000 abstract description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 abstract 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 abstract 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract 1
- 229910052681 coesite Inorganic materials 0.000 abstract 1
- 229910052593 corundum Inorganic materials 0.000 abstract 1
- 229910052906 cristobalite Inorganic materials 0.000 abstract 1
- 238000005401 electroluminescence Methods 0.000 abstract 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
- 235000012239 silicon dioxide Nutrition 0.000 abstract 1
- 229910052682 stishovite Inorganic materials 0.000 abstract 1
- 229910052905 tridymite Inorganic materials 0.000 abstract 1
- 229910001845 yogo sapphire Inorganic materials 0.000 abstract 1
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 32
- 239000011787 zinc oxide Substances 0.000 description 16
- 230000003628 erosive effect Effects 0.000 description 7
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 238000002425 crystallisation Methods 0.000 description 5
- 230000008025 crystallization Effects 0.000 description 5
- 230000004927 fusion Effects 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- 238000004031 devitrification Methods 0.000 description 4
- 238000011161 development Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000004615 ingredient Substances 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- 206010018612 Gonorrhoea Diseases 0.000 description 2
- 208000037656 Respiratory Sounds Diseases 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 2
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 2
- 229910000287 alkaline earth metal oxide Inorganic materials 0.000 description 2
- 150000001342 alkaline earth metals Chemical class 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000007493 shaping process Methods 0.000 description 2
- 238000007088 Archimedes method Methods 0.000 description 1
- 241001269238 Data Species 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 229910001413 alkali metal ion Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 239000000156 glass melt Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000010309 melting process Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
- C03C3/093—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium containing zinc or zirconium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C4/00—Compositions for glass with special properties
- C03C4/20—Compositions for glass with special properties for chemical resistant glass
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Glass Compositions (AREA)
Abstract
Description
Claims (10)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201310528623.1A CN104276755B (zh) | 2013-10-31 | 2013-10-31 | 一种高化学耐久性的无碱硼铝硅酸盐玻璃 |
Applications Claiming Priority (1)
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CN201310528623.1A CN104276755B (zh) | 2013-10-31 | 2013-10-31 | 一种高化学耐久性的无碱硼铝硅酸盐玻璃 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN104276755A true CN104276755A (zh) | 2015-01-14 |
CN104276755B CN104276755B (zh) | 2017-02-15 |
Family
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Family Applications (1)
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CN201310528623.1A Active CN104276755B (zh) | 2013-10-31 | 2013-10-31 | 一种高化学耐久性的无碱硼铝硅酸盐玻璃 |
Country Status (1)
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CN (1) | CN104276755B (zh) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105837030A (zh) * | 2016-04-06 | 2016-08-10 | 东旭科技集团有限公司 | 一种玻璃用组合物和玻璃及其制备方法和应用 |
CN110818251A (zh) * | 2019-11-19 | 2020-02-21 | 蚌埠中光电科技有限公司 | 一种玻璃组合物及玻璃的制备方法 |
CN112250306A (zh) * | 2020-10-22 | 2021-01-22 | 淄博宝特化工科技有限公司 | 一种高温高压耐酸碱瓷釉及其制备方法 |
Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0577119A2 (en) * | 1992-07-02 | 1994-01-05 | Corning Incorporated | Process for vitrifying incinerator ash |
JPH0948632A (ja) * | 1995-08-02 | 1997-02-18 | Nippon Electric Glass Co Ltd | 無アルカリガラス基板 |
EP0787693A1 (de) * | 1996-02-02 | 1997-08-06 | Schott Glaswerke | Alkalifreies Aluminoborosilicatglas und dessen Verwendung |
DE19617344C1 (de) * | 1996-04-30 | 1997-08-07 | Schott Glaswerke | Alkalifreies Aluminoborosilicatglas und seine Verwendung |
JPH10114538A (ja) * | 1996-08-21 | 1998-05-06 | Nippon Electric Glass Co Ltd | 無アルカリガラス及びその製造方法 |
CN1224699A (zh) * | 1997-09-11 | 1999-08-04 | 肖特玻璃厂 | 无碱金属的铝硼硅酸盐玻璃及其用途 |
DE19601922C2 (de) * | 1996-01-13 | 2001-05-17 | Schott Glas | Zinn- und zirkonoxidhaltige, alkalifreie Erdalkali-Alumo-Borosilicatgläser und deren Verwendung |
CN1443143A (zh) * | 2000-07-19 | 2003-09-17 | 肖特玻璃制造厂 | 铝硅酸盐玻璃的生产方法 |
CN1192982C (zh) * | 1999-08-21 | 2005-03-16 | 肖特玻璃制造厂 | 无碱铝硼硅酸盐玻璃及其应用 |
-
2013
- 2013-10-31 CN CN201310528623.1A patent/CN104276755B/zh active Active
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0577119A2 (en) * | 1992-07-02 | 1994-01-05 | Corning Incorporated | Process for vitrifying incinerator ash |
JPH0948632A (ja) * | 1995-08-02 | 1997-02-18 | Nippon Electric Glass Co Ltd | 無アルカリガラス基板 |
DE19601922C2 (de) * | 1996-01-13 | 2001-05-17 | Schott Glas | Zinn- und zirkonoxidhaltige, alkalifreie Erdalkali-Alumo-Borosilicatgläser und deren Verwendung |
EP0787693A1 (de) * | 1996-02-02 | 1997-08-06 | Schott Glaswerke | Alkalifreies Aluminoborosilicatglas und dessen Verwendung |
DE19617344C1 (de) * | 1996-04-30 | 1997-08-07 | Schott Glaswerke | Alkalifreies Aluminoborosilicatglas und seine Verwendung |
JPH10114538A (ja) * | 1996-08-21 | 1998-05-06 | Nippon Electric Glass Co Ltd | 無アルカリガラス及びその製造方法 |
CN1224699A (zh) * | 1997-09-11 | 1999-08-04 | 肖特玻璃厂 | 无碱金属的铝硼硅酸盐玻璃及其用途 |
CN1192982C (zh) * | 1999-08-21 | 2005-03-16 | 肖特玻璃制造厂 | 无碱铝硼硅酸盐玻璃及其应用 |
CN1443143A (zh) * | 2000-07-19 | 2003-09-17 | 肖特玻璃制造厂 | 铝硅酸盐玻璃的生产方法 |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105837030A (zh) * | 2016-04-06 | 2016-08-10 | 东旭科技集团有限公司 | 一种玻璃用组合物和玻璃及其制备方法和应用 |
CN110818251A (zh) * | 2019-11-19 | 2020-02-21 | 蚌埠中光电科技有限公司 | 一种玻璃组合物及玻璃的制备方法 |
CN112250306A (zh) * | 2020-10-22 | 2021-01-22 | 淄博宝特化工科技有限公司 | 一种高温高压耐酸碱瓷釉及其制备方法 |
CN112250306B (zh) * | 2020-10-22 | 2022-07-19 | 淄博宝特化工科技有限公司 | 一种高温高压耐酸碱瓷釉及其制备方法 |
Also Published As
Publication number | Publication date |
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CN104276755B (zh) | 2017-02-15 |
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CB03 | Change of inventor or designer information |
Inventor after: Shen Yuguo Inventor after: Xu Xingjun Inventor after: Zhang Guangtao Inventor after: Li Heran Inventor after: Li Junfeng Inventor after: Yan Dongcheng Inventor after: Wang Lihong Inventor after: Hou Jianwei Inventor before: Shen Yuguo Inventor before: Xu Xingjun Inventor before: Zhang Guangtao Inventor before: Li Junfeng Inventor before: Yan Dongcheng Inventor before: Wang Lihong Inventor before: Hou Jianwei |
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COR | Change of bibliographic data | ||
C14 | Grant of patent or utility model | ||
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Effective date of registration: 20191212 Granted publication date: 20170215 |
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Date of cancellation: 20221212 Granted publication date: 20170215 |
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Effective date of registration: 20230417 Address after: 102200 201, floor 2, No. 2, yard 91, shashun Road, Changping District, Beijing Patentee after: Beijing Yuanda Xinda Technology Co.,Ltd. Address before: 050000 no.369 Zhujiang Avenue, hi tech Zone, Shijiazhuang City, Hebei Province Patentee before: TUNGHSU GROUP Co.,Ltd. |