CN104241230A - 半导体器件、显示装置模块及其制造方法 - Google Patents
半导体器件、显示装置模块及其制造方法 Download PDFInfo
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- CN104241230A CN104241230A CN201410250149.5A CN201410250149A CN104241230A CN 104241230 A CN104241230 A CN 104241230A CN 201410250149 A CN201410250149 A CN 201410250149A CN 104241230 A CN104241230 A CN 104241230A
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 142
- 238000000034 method Methods 0.000 title claims abstract description 16
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 7
- 239000000758 substrate Substances 0.000 claims description 31
- 239000011521 glass Substances 0.000 claims description 29
- 239000002245 particle Substances 0.000 claims description 10
- 239000004020 conductor Substances 0.000 claims description 6
- 239000000853 adhesive Substances 0.000 claims description 3
- 230000001070 adhesive effect Effects 0.000 claims description 3
- 239000010410 layer Substances 0.000 description 27
- 239000010931 gold Substances 0.000 description 13
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 8
- 229910052737 gold Inorganic materials 0.000 description 8
- 239000000463 material Substances 0.000 description 8
- 238000010586 diagram Methods 0.000 description 7
- 239000012528 membrane Substances 0.000 description 7
- 239000004973 liquid crystal related substance Substances 0.000 description 6
- MAKDTFFYCIMFQP-UHFFFAOYSA-N titanium tungsten Chemical compound [Ti].[W] MAKDTFFYCIMFQP-UHFFFAOYSA-N 0.000 description 6
- 230000002093 peripheral effect Effects 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000007747 plating Methods 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 239000011229 interlayer Substances 0.000 description 2
- 238000001465 metallisation Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- -1 and utilizes ACF51 Substances 0.000 description 1
- 239000007767 bonding agent Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
Classifications
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- H01L2224/83139—Guiding structures on the body
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- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/8319—Arrangement of the layer connectors prior to mounting
- H01L2224/83192—Arrangement of the layer connectors prior to mounting wherein the layer connectors are disposed only on another item or body to be connected to the semiconductor or solid-state body
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- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/832—Applying energy for connecting
- H01L2224/83201—Compression bonding
- H01L2224/83203—Thermocompression bonding, e.g. diffusion bonding, pressure joining, thermocompression welding or solid-state welding
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- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/838—Bonding techniques
- H01L2224/8385—Bonding techniques using a polymer adhesive, e.g. an adhesive based on silicone, epoxy, polyimide, polyester
- H01L2224/83851—Bonding techniques using a polymer adhesive, e.g. an adhesive based on silicone, epoxy, polyimide, polyester being an anisotropic conductive adhesive
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- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/83986—Specific sequence of steps, e.g. repetition of manufacturing steps, time sequence
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- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/91—Methods for connecting semiconductor or solid state bodies including different methods provided for in two or more of groups H01L2224/80 - H01L2224/90
- H01L2224/92—Specific sequence of method steps
- H01L2224/921—Connecting a surface with connectors of different types
- H01L2224/9211—Parallel connecting processes
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- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/10—Bump connectors ; Manufacturing methods related thereto
- H01L24/12—Structure, shape, material or disposition of the bump connectors prior to the connecting process
- H01L24/13—Structure, shape, material or disposition of the bump connectors prior to the connecting process of an individual bump connector
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- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/10—Bump connectors ; Manufacturing methods related thereto
- H01L24/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L24/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
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- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L24/81—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector
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- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/12—Passive devices, e.g. 2 terminal devices
- H01L2924/1204—Optical Diode
- H01L2924/12044—OLED
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- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/156—Material
- H01L2924/15786—Material with a principal constituent of the material being a non metallic, non metalloid inorganic material
- H01L2924/15788—Glasses, e.g. amorphous oxides, nitrides or fluorides
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- Engineering & Computer Science (AREA)
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- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Geometry (AREA)
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- Wire Bonding (AREA)
- Semiconductor Integrated Circuits (AREA)
Abstract
Description
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JP2013-121233 | 2013-06-07 | ||
JP2013121233A JP6334851B2 (ja) | 2013-06-07 | 2013-06-07 | 半導体装置、表示デバイスモジュール、及び、表示デバイスモジュールの製造方法 |
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CN104241230A true CN104241230A (zh) | 2014-12-24 |
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US (1) | US9385096B2 (zh) |
JP (1) | JP6334851B2 (zh) |
CN (1) | CN104241230B (zh) |
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US20190041685A1 (en) * | 2016-02-10 | 2019-02-07 | Sharp Kabushiki Kaisha | Semiconductor device and display device |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
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CN1579019A (zh) * | 2001-03-30 | 2005-02-09 | 英特尔公司 | 用于电源布线和接地布线的由交错凸起冶金法制成的条 |
CN1945817A (zh) * | 2005-10-07 | 2007-04-11 | 株式会社瑞萨科技 | 半导体器件及其制造方法 |
TWI311346B (zh) * | 2002-08-29 | 2009-06-21 | Hitachi Ltd | |
US20090283904A1 (en) * | 2008-05-15 | 2009-11-19 | Lsi Logic Corporation | Flipchip bump patterns for efficient i-mesh power distribution schemes |
Family Cites Families (6)
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US8072035B2 (en) * | 2007-06-11 | 2011-12-06 | Renesas Electronics Corporation | Semiconductor device and method of manufacturing the same |
JP5291917B2 (ja) * | 2007-11-09 | 2013-09-18 | ルネサスエレクトロニクス株式会社 | 半導体装置およびその製造方法 |
BRPI1012742A2 (pt) | 2009-06-16 | 2019-09-24 | Sharp Kk | "chip semicondutor módulo de cristal líquido e estrutura de montagem do chip semicondutor" |
JP5503208B2 (ja) | 2009-07-24 | 2014-05-28 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
KR101883379B1 (ko) * | 2012-06-08 | 2018-07-30 | 삼성전자주식회사 | 반도체 장치 |
KR101395636B1 (ko) * | 2012-09-12 | 2014-05-15 | 엘지디스플레이 주식회사 | 전원링크배선을 포함하는 표시장치 |
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2013
- 2013-06-07 JP JP2013121233A patent/JP6334851B2/ja active Active
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2014
- 2014-05-13 US US14/276,872 patent/US9385096B2/en active Active
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Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1579019A (zh) * | 2001-03-30 | 2005-02-09 | 英特尔公司 | 用于电源布线和接地布线的由交错凸起冶金法制成的条 |
TWI311346B (zh) * | 2002-08-29 | 2009-06-21 | Hitachi Ltd | |
CN1945817A (zh) * | 2005-10-07 | 2007-04-11 | 株式会社瑞萨科技 | 半导体器件及其制造方法 |
US20090283904A1 (en) * | 2008-05-15 | 2009-11-19 | Lsi Logic Corporation | Flipchip bump patterns for efficient i-mesh power distribution schemes |
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Publication number | Publication date |
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US9385096B2 (en) | 2016-07-05 |
US20140361429A1 (en) | 2014-12-11 |
JP6334851B2 (ja) | 2018-05-30 |
CN104241230B (zh) | 2018-11-09 |
JP2014239164A (ja) | 2014-12-18 |
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