CN104217910B - 在透射电子显微镜中使用相位片的方法 - Google Patents
在透射电子显微镜中使用相位片的方法 Download PDFInfo
- Publication number
- CN104217910B CN104217910B CN201410170093.2A CN201410170093A CN104217910B CN 104217910 B CN104217910 B CN 104217910B CN 201410170093 A CN201410170093 A CN 201410170093A CN 104217910 B CN104217910 B CN 104217910B
- Authority
- CN
- China
- Prior art keywords
- phase plate
- film
- phase
- sample
- electron microscope
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000000034 method Methods 0.000 title claims abstract description 25
- 230000005540 biological transmission Effects 0.000 title claims abstract description 15
- 239000010408 film Substances 0.000 claims abstract description 40
- 230000010363 phase shift Effects 0.000 claims abstract description 21
- 238000010894 electron beam technology Methods 0.000 claims abstract description 17
- 239000010409 thin film Substances 0.000 claims abstract description 14
- 238000011109 contamination Methods 0.000 claims abstract description 9
- 230000001678 irradiating effect Effects 0.000 claims abstract description 8
- 239000000463 material Substances 0.000 claims description 18
- 238000003384 imaging method Methods 0.000 claims description 10
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 5
- 229910052799 carbon Inorganic materials 0.000 claims description 5
- 238000002360 preparation method Methods 0.000 claims description 5
- 229910003481 amorphous carbon Inorganic materials 0.000 claims description 2
- 239000000523 sample Substances 0.000 description 27
- 238000001493 electron microscopy Methods 0.000 description 7
- 239000000126 substance Substances 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 5
- 230000003287 optical effect Effects 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 239000002019 doping agent Substances 0.000 description 3
- 239000012528 membrane Substances 0.000 description 3
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- 201000009310 astigmatism Diseases 0.000 description 2
- 230000003750 conditioning effect Effects 0.000 description 2
- 238000012937 correction Methods 0.000 description 2
- 238000010893 electron trap Methods 0.000 description 2
- 238000012886 linear function Methods 0.000 description 2
- 238000000386 microscopy Methods 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 1
- 230000004308 accommodation Effects 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 239000012472 biological sample Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000004093 laser heating Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 238000010186 staining Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/261—Details
- H01J37/263—Contrast, resolution or power of penetration
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/285—Emission microscopes, e.g. field-emission microscopes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/2614—Holography or phase contrast, phase related imaging in general, e.g. phase plates
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Sampling And Sample Adjustment (AREA)
Applications Claiming Priority (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP13165356.0A EP2797100A1 (en) | 2013-04-25 | 2013-04-25 | Method of using a phase plate in a transmission electron microscope |
| EP13165356.0 | 2013-04-25 | ||
| EP13180361 | 2013-08-14 | ||
| EP13180361.1 | 2013-08-14 | ||
| EP13190405.4 | 2013-10-28 | ||
| EP13190405 | 2013-10-28 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN104217910A CN104217910A (zh) | 2014-12-17 |
| CN104217910B true CN104217910B (zh) | 2017-09-12 |
Family
ID=50489030
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410170093.2A Active CN104217910B (zh) | 2013-04-25 | 2014-04-25 | 在透射电子显微镜中使用相位片的方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US9129774B2 (enExample) |
| EP (1) | EP2797101B1 (enExample) |
| JP (1) | JP6286270B2 (enExample) |
| CN (1) | CN104217910B (enExample) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102013019297A1 (de) * | 2013-11-19 | 2015-05-21 | Fei Company | Phasenplatte für ein Transmissionselektronenmikroskop |
| EP2881970A1 (en) | 2013-12-04 | 2015-06-10 | Fei Company | Method of producing a freestanding thin film of nano-crystalline carbon |
| CN106796862B (zh) * | 2014-07-30 | 2018-12-25 | 于利奇研究中心有限公司 | 用于带电粒子成像系统的可调式安培相板 |
| EP3007201B1 (en) | 2014-10-08 | 2016-09-28 | Fei Company | Aligning a featureless thin film in a TEM |
| US10170274B2 (en) * | 2015-03-18 | 2019-01-01 | Battelle Memorial Institute | TEM phase contrast imaging with image plane phase grating |
| WO2016149676A1 (en) * | 2015-03-18 | 2016-09-22 | Battelle Memorial Institute | Electron beam masks for compressive sensors |
| EP3104155A1 (en) * | 2015-06-09 | 2016-12-14 | FEI Company | Method of analyzing surface modification of a specimen in a charged-particle microscope |
| US10504695B2 (en) | 2015-12-25 | 2019-12-10 | Hitachi High-Technologies Corporation | Charged particle beam device and phase plate |
| WO2017189212A1 (en) | 2016-04-29 | 2017-11-02 | Battelle Memorial Institute | Compressive scanning spectroscopy |
| KR102329054B1 (ko) | 2016-12-19 | 2021-11-22 | 에이에스엠엘 네델란즈 비.브이. | 접지되지 않은 샘플들의 하전 입자 빔 검사 |
| US10295677B2 (en) | 2017-05-08 | 2019-05-21 | Battelle Memorial Institute | Systems and methods for data storage and retrieval |
| EP3474308A1 (en) * | 2017-10-17 | 2019-04-24 | Universiteit Antwerpen | Spatial phase manipulation of charged particle beam |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1573985A (zh) * | 2003-05-23 | 2005-02-02 | 日本胜利株式会社 | 光拾波装置和光记录媒体驱动装置 |
Family Cites Families (31)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3908124A (en) | 1974-07-01 | 1975-09-23 | Us Energy | Phase contrast in high resolution electron microscopy |
| JPH067048A (ja) | 1992-06-25 | 1994-01-18 | Masaki Ueno | 養液栽培装置および同養液栽培装置に用いる苗の育苗器 |
| US5814815A (en) | 1995-12-27 | 1998-09-29 | Hitachi, Ltd. | Phase-contrast electron microscope and phase plate therefor |
| JP2000268765A (ja) | 1999-03-16 | 2000-09-29 | Jeol Ltd | 透過型電子顕微鏡 |
| JP2001084938A (ja) | 1999-09-13 | 2001-03-30 | Hitachi Ltd | 透過形電子顕微鏡及び透過電子顕微鏡像観察方法 |
| JP3773389B2 (ja) * | 2000-03-27 | 2006-05-10 | 日本電子株式会社 | 位相差電子顕微鏡用薄膜位相板並びに位相差電子顕微鏡及び位相板帯電防止法 |
| JP3942363B2 (ja) | 2001-02-09 | 2007-07-11 | 日本電子株式会社 | 透過電子顕微鏡の位相板用レンズシステム、および透過電子顕微鏡 |
| US6548810B2 (en) | 2001-08-01 | 2003-04-15 | The University Of Chicago | Scanning confocal electron microscope |
| JP4328044B2 (ja) | 2001-09-25 | 2009-09-09 | 日本電子株式会社 | 差分コントラスト電子顕微鏡および電子顕微鏡像のデータ処理方法 |
| DE10200645A1 (de) | 2002-01-10 | 2003-07-24 | Leo Elektronenmikroskopie Gmbh | Elektronenmikroskop mit ringförmiger Beleuchtungsapertur |
| DE10206703A1 (de) | 2002-02-18 | 2003-08-28 | Max Planck Gesellschaft | Phasenplatte für die Elektronenmikroskopie und elektronenmikroskopische Bildgebung |
| JP2005116365A (ja) | 2003-10-08 | 2005-04-28 | Jeol Ltd | 位相板と位相板用レンズ系を備えた透過電子顕微鏡 |
| WO2006017252A1 (en) | 2004-07-12 | 2006-02-16 | The Regents Of The University Of California | Electron microscope phase enhancement |
| JP4625317B2 (ja) | 2004-12-03 | 2011-02-02 | ナガヤマ アイピー ホールディングス リミテッド ライアビリティ カンパニー | 位相差電子顕微鏡用位相板及びその製造方法並びに位相差電子顕微鏡 |
| DE102005040267B4 (de) | 2005-08-24 | 2007-12-27 | Universität Karlsruhe | Verfahren zum Herstellen einer mehrschichtigen elektrostatischen Linsenanordnung, insbesondere einer Phasenplatte und derartige Phasenplatte |
| US7851757B2 (en) | 2005-11-04 | 2010-12-14 | Nagayama Ip Holdings, Llc | Phase plate for electron microscope and method for manufacturing same |
| JPWO2007058182A1 (ja) | 2005-11-15 | 2009-04-30 | 大学共同利用機関法人自然科学研究機構 | 位相差電子顕微鏡装置 |
| DE102006011615A1 (de) | 2006-03-14 | 2007-09-20 | Carl Zeiss Nts Gmbh | Phasenkontrast-Elektronenmikroskop |
| DE102006055510B4 (de) | 2006-11-24 | 2009-05-07 | Ceos Corrected Electron Optical Systems Gmbh | Phasenplatte, Bilderzeugungsverfahren und Elektronenmikroskop |
| DE102007007923A1 (de) | 2007-02-14 | 2008-08-21 | Carl Zeiss Nts Gmbh | Phasenschiebendes Element und Teilchenstrahlgerät mit phasenschiebenden Element |
| EP2091062A1 (en) | 2008-02-13 | 2009-08-19 | FEI Company | TEM with aberration corrector and phase plate |
| GB0805819D0 (en) | 2008-03-31 | 2008-04-30 | Edgecombe Christopher | Phase plate for electron microscope |
| EP2131385A1 (en) | 2008-06-05 | 2009-12-09 | FEI Company | Hybrid phase plate |
| US7977633B2 (en) | 2008-08-27 | 2011-07-12 | Max-Planck-Gesellschaft Zur Foerderung Der Wissenschaften E. V. | Phase plate, in particular for an electron microscope |
| JP4896106B2 (ja) * | 2008-09-30 | 2012-03-14 | 株式会社日立ハイテクノロジーズ | 電子顕微鏡 |
| WO2011071819A1 (en) | 2009-12-07 | 2011-06-16 | Regents Of The University Of California | Optical-cavity phase plate for transmission electron microscopy |
| US8785850B2 (en) * | 2010-01-19 | 2014-07-22 | National Research Counsel Of Canada | Charging of a hole-free thin film phase plate |
| EP2400522A1 (en) | 2010-06-24 | 2011-12-28 | Fei Company | Blocking member for use in the diffraction plane of a TEM |
| EP2485239A1 (en) | 2011-02-07 | 2012-08-08 | FEI Company | Method for centering an optical element in a TEM comprising a contrast enhancing element |
| EP2667399A1 (en) | 2012-05-23 | 2013-11-27 | FEI Company | Improved phase plate for a TEM |
| EP2704178B1 (en) | 2012-08-30 | 2014-08-20 | Fei Company | Imaging a sample in a TEM equipped with a phase plate |
-
2014
- 2014-04-18 JP JP2014086240A patent/JP6286270B2/ja active Active
- 2014-04-23 EP EP14165529.0A patent/EP2797101B1/en active Active
- 2014-04-25 CN CN201410170093.2A patent/CN104217910B/zh active Active
- 2014-04-25 US US14/262,340 patent/US9129774B2/en active Active
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1573985A (zh) * | 2003-05-23 | 2005-02-02 | 日本胜利株式会社 | 光拾波装置和光记录媒体驱动装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN104217910A (zh) | 2014-12-17 |
| EP2797101B1 (en) | 2017-05-31 |
| JP2014216319A (ja) | 2014-11-17 |
| US9129774B2 (en) | 2015-09-08 |
| EP2797101A1 (en) | 2014-10-29 |
| JP6286270B2 (ja) | 2018-02-28 |
| US20140326876A1 (en) | 2014-11-06 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN104217910B (zh) | 在透射电子显微镜中使用相位片的方法 | |
| JP6262453B2 (ja) | 粒子光学装置での薄片の調製及び可視化方法 | |
| Tromp et al. | A new aberration-corrected, energy-filtered LEEM/PEEM instrument II. Operation and results | |
| Williams et al. | Electron microscopy of tobacco mosaic virus under conditions of minimal beam exposure | |
| Danev et al. | Transmission electron microscopy with Zernike phase plate | |
| JP2009193963A (ja) | 収差補正器及び位相板を備えたtem | |
| US7737412B2 (en) | Electron microscope phase enhancement | |
| US8569693B2 (en) | Distortion free stigmation of a TEM | |
| JPH02295040A (ja) | 集束イオンビーム装置 | |
| JP2004087174A (ja) | イオンビーム装置およびイオンビーム加工方法 | |
| Carlson et al. | Low-dose imaging techniques for transmission electron microscopy | |
| CN210429729U (zh) | 带电粒子束布置及扫描电子装置 | |
| Sun et al. | Role of electron and ion irradiation in a reliable lift-off process with electron beam evaporation and a bilayer PMMA resist system | |
| EP2797100A1 (en) | Method of using a phase plate in a transmission electron microscope | |
| JPS5847826B2 (ja) | 粒子線装置を用いて低倍率で詩料を結像させる方法 | |
| JP6636061B2 (ja) | Tem内での特徴のない薄膜の位置合わせ | |
| US6541783B1 (en) | Stencil reticle incorporating scattering features for electron beam projection lithography | |
| US6004726A (en) | Method of forming a lithographic pattern utilizing charged beam particles between 0.1 and 5.0 ev | |
| Meijer et al. | Microprobe as implanter for semiconductor devices | |
| Rauscher et al. | Optimum mode of operation for a low energy focused ion beam system | |
| Shichi et al. | Development a projection ion beam instrument that uses a gas ion source for metal-contamination-free microsampling | |
| Bussmann et al. | Stronger field-emission science via coupling novel nanoscale imaging techniques | |
| de la Cruz et al. | A method to minimize condenser lens-induced hysteresis effects in a JEOL JEM-3200FSC microscope to enable stable cryoEM low-dose operations | |
| Myasishchev | Focused ion beam assisted semiconductor sample preparation for subsequent transmission electron microscope examination | |
| JPS6235622A (ja) | イオンビ−ム露光装置 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |