JP6262453B2 - 粒子光学装置での薄片の調製及び可視化方法 - Google Patents
粒子光学装置での薄片の調製及び可視化方法 Download PDFInfo
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Description
− 粒子光学装置は、集束イオンビームを生成するように試料チャンバ上に設けられた集束イオンビーム鏡筒を有する。
− 薄い試料を調製する手順は、前記集束イオンビームに対して前記試料を位置設定する手順、及び、前記集束イオンビームを用いて前記試料を薄くする手順を含む。
− 第1像の生成後、前記試料の層が前記集束イオンビームにより除去され、かつ、前記電子鏡筒を用いて第2電子像が生成される。
− 前記試料の層が除去された後、前記試料の第2タイコグラフィック像が生成される。
− 前記試料は、少なくとも前記試料が前記集束イオンビームによって薄くされることによって調製されるときから、前記第2電子像が取得されるまでの間真空環境下で保たれる。
101 試料
102 試料チャンバ
110 カメラシステム
120 電子鏡筒
122 電子ビーム
124 電子源
126-i レンズ
128-i 偏向器
130 対物レンズ
140 イオンビーム鏡筒
142 イオンビーム
144イオン源
146-i レンズ
148-i 偏向器
150 対物レンズ
160 マニピュレータ
Claims (7)
- 粒子光学装置を用いて試料を調製及び可視化する方法であって、
当該粒子光学装置は:
前記試料に照射される電子ビームを生成するように排気可能な試料チャンバに設けられる電子鏡筒;
前記試料を透過する電子によって生じる回折パターンの電子像を生成するカメラシステム;及び、
前記試料チャンバ内での前記電子ビームに対する前記試料の位置を設定するマニピュレータ;
を備え、
当該方法は:
前記試料を調製する手順;
前記試料チャンバ内での前記電子ビームに対する前記試料の位置を設定する手順;
前記電子鏡筒を用いて前記カメラシステム上に第1電子像を生成する手順;及び、
前記第1電子像から前記試料が推定される反復収束処理の結果である第1タイコグラフィック像を得る手順;
を有し、
当該粒子光学装置は、前記試料を加工する集束イオンビームを生成するように試料チャンバと接する状態で設けられた集束イオンビーム鏡筒を有し、
前記試料を調製する手順は、前記集束イオンビームに対して前記試料を位置設定する手順、及び、前記集束イオンビームを用いて前記試料を薄くする手順を含み、
前記第1電子像の生成後、前記試料の層が前記集束イオンビームにより除去され、かつ、前記電子鏡筒を用いて第2電子像が生成され、
前記試料の層が除去された後、前記試料の第2タイコグラフィック像が生成され、
前記試料は、少なくとも前記試料が前記集束イオンビームによって薄くされることによって調製されるときから、前記第2電子像が取得されるまでの間真空環境下で保たれ、
前記第1タイコグラフィック像又は該第1タイコグラフィック像を生成する反復集束処理における複数の推定のうちの最初の推定を除く一の推定が、前記第2タイコグラフィック像の再構成用のシード層として用いられる、
ことを特徴とする方法。 - 前記第1及び第2タイコグラフィック像又は前記第1及び第2電子像を用いる前記の除去された層の再構成された像が、前記の除去された層のタイコグラフィック像を生成する、請求項1に記載の方法。
- 前記第1及び第2タイコグラフィック像のうちの一が、前記試料での場所依存位相シフトを決定し、かつ、前記位相シフトから前記試料の内部ポテンシャルを位置の関数として導くのに用いられ、
その後ドーパント濃度を導く手順が実行される、
請求項1又は2に記載の方法。 - 前記第2タイコグラフィック像が、いつ前記試料中の構造が表面に到達するのかを決定するのに用いられる、請求項1乃至3のうちいずれか一項に記載の方法。
- 前記イオンビームは、前記試料にわたって走査することが可能な集束イオンビームである、請求項1乃至4のうちいずれか一項に記載の方法。
- 前記試料の材料が、極低温での半導体材料、結晶材料、多結晶材料、又は生体材料である、請求項1乃至5のうちいずれか一項に記載の方法。
- 前記試料の複数のタイコグラフィック像を生成する手順をさらに有し、
前記複数のタイコグラフィック像は、前記試料を前記電子ビームに対して様々な向きに設置することによって生成され、
その後前記試料の断層撮影像の3D再構成が行われる、
請求項1乃至6のうちいずれか一項に記載の方法。
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EP12178060.5A EP2690648B1 (en) | 2012-07-26 | 2012-07-26 | Method of preparing and imaging a lamella in a particle-optical apparatus |
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US8742361B2 (en) * | 2012-06-07 | 2014-06-03 | Fei Company | Focused charged particle column for operation at different beam energies at a target |
EP2690648B1 (en) * | 2012-07-26 | 2014-10-15 | Fei Company | Method of preparing and imaging a lamella in a particle-optical apparatus |
US8624184B1 (en) * | 2012-11-28 | 2014-01-07 | Western Digital Technologies, Inc. | Methods for spatially resolved alignment of independent spectroscopic data from scanning transmission electron microscopes |
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2012
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2013
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Cited By (2)
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JP7031558B2 (ja) | 2018-10-29 | 2022-03-08 | オムロン株式会社 | ネジ長判定システム、ネジ締めシステムおよびプログラム |
JP7186905B2 (ja) | 2020-01-27 | 2022-12-09 | 三菱電機株式会社 | 自動ねじ締め方法および自動ねじ締め装置 |
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JP2014011157A (ja) | 2014-01-20 |
CN103531427B (zh) | 2017-05-31 |
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EP2690648B1 (en) | 2014-10-15 |
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