CN104206003B - 电阻加热器 - Google Patents
电阻加热器 Download PDFInfo
- Publication number
- CN104206003B CN104206003B CN201380015871.4A CN201380015871A CN104206003B CN 104206003 B CN104206003 B CN 104206003B CN 201380015871 A CN201380015871 A CN 201380015871A CN 104206003 B CN104206003 B CN 104206003B
- Authority
- CN
- China
- Prior art keywords
- shape
- heater
- cross
- section
- resistance heater
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/10—Heater elements characterised by the composition or nature of the materials or by the arrangement of the conductor
- H05B3/12—Heater elements characterised by the composition or nature of the materials or by the arrangement of the conductor characterised by the composition or nature of the conductive material
- H05B3/14—Heater elements characterised by the composition or nature of the materials or by the arrangement of the conductor characterised by the composition or nature of the conductive material the material being non-metallic
- H05B3/141—Conductive ceramics, e.g. metal oxides, metal carbides, barium titanate, ferrites, zirconia, vitrous compounds
- H05B3/143—Conductive ceramics, e.g. metal oxides, metal carbides, barium titanate, ferrites, zirconia, vitrous compounds applied to semiconductors, e.g. wafers heating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67115—Apparatus for thermal treatment mainly by radiation
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/10—Heater elements characterised by the composition or nature of the materials or by the arrangement of the conductor
- H05B3/12—Heater elements characterised by the composition or nature of the materials or by the arrangement of the conductor characterised by the composition or nature of the conductive material
- H05B3/14—Heater elements characterised by the composition or nature of the materials or by the arrangement of the conductor characterised by the composition or nature of the conductive material the material being non-metallic
- H05B3/145—Carbon only, e.g. carbon black, graphite
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/20—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater
- H05B3/22—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible
- H05B3/24—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible heating conductor being self-supporting
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
- H05B2203/017—Manufacturing methods or apparatus for heaters
Abstract
Description
Claims (12)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US13/424,947 US8993939B2 (en) | 2008-01-18 | 2012-03-20 | Resistance heater |
US13/424,947 | 2012-03-20 | ||
PCT/US2013/033139 WO2013142594A1 (en) | 2012-03-20 | 2013-03-20 | Resistance heater |
Publications (2)
Publication Number | Publication Date |
---|---|
CN104206003A CN104206003A (zh) | 2014-12-10 |
CN104206003B true CN104206003B (zh) | 2016-10-12 |
Family
ID=49223322
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201380015871.4A Active CN104206003B (zh) | 2012-03-20 | 2013-03-20 | 电阻加热器 |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP2829155B1 (zh) |
JP (1) | JP6537964B2 (zh) |
CN (1) | CN104206003B (zh) |
WO (1) | WO2013142594A1 (zh) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113678570A (zh) * | 2018-09-13 | 2021-11-19 | 德卢卡炉灶技术有限责任公司 | 包含用于高速烤箱的初级导体的加热器元件 |
US11873098B2 (en) * | 2018-10-22 | 2024-01-16 | Goodrich Corporation | Heater design for carbon allotrope ice protection systems |
CA3054177A1 (en) * | 2018-10-22 | 2020-04-22 | Goodrich Corporation | Heater design for carbon allotrope ice protection systems |
CN113474313A (zh) * | 2018-12-27 | 2021-10-01 | 迈图高新材料石英股份有限公司 | 包括氮化硼和二硼化钛的陶瓷复合物加热器 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6285011B1 (en) * | 1999-10-12 | 2001-09-04 | Memc Electronic Materials, Inc. | Electrical resistance heater for crystal growing apparatus |
CN101023197A (zh) * | 2004-03-31 | 2007-08-22 | 东京毅力科创株式会社 | 晶片加热器组件 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4147888A (en) * | 1977-07-20 | 1979-04-03 | Seiki Sato | Electric heating element for electric resistance furnaces |
JP4671262B2 (ja) * | 2003-01-21 | 2011-04-13 | 日本碍子株式会社 | 半導体加熱装置 |
JP4690297B2 (ja) * | 2006-12-01 | 2011-06-01 | モメンティブ・パフォーマンス・マテリアルズ・ジャパン合同会社 | ヒータ |
US8164028B2 (en) * | 2008-01-18 | 2012-04-24 | Momentive Performance Materials Inc. | Resistance heater |
EP2141490B1 (en) * | 2008-07-02 | 2015-04-01 | Stichting IMEC Nederland | Chemical sensing microbeam device |
-
2013
- 2013-03-20 CN CN201380015871.4A patent/CN104206003B/zh active Active
- 2013-03-20 EP EP13764286.4A patent/EP2829155B1/en active Active
- 2013-03-20 WO PCT/US2013/033139 patent/WO2013142594A1/en active Application Filing
- 2013-03-20 JP JP2015501882A patent/JP6537964B2/ja active Active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6285011B1 (en) * | 1999-10-12 | 2001-09-04 | Memc Electronic Materials, Inc. | Electrical resistance heater for crystal growing apparatus |
CN101023197A (zh) * | 2004-03-31 | 2007-08-22 | 东京毅力科创株式会社 | 晶片加热器组件 |
Also Published As
Publication number | Publication date |
---|---|
CN104206003A (zh) | 2014-12-10 |
EP2829155A4 (en) | 2015-07-15 |
EP2829155A1 (en) | 2015-01-28 |
EP2829155B1 (en) | 2022-09-07 |
JP2015518627A (ja) | 2015-07-02 |
WO2013142594A1 (en) | 2013-09-26 |
JP6537964B2 (ja) | 2019-07-03 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C53 | Correction of patent of invention or patent application | ||
CB03 | Change of inventor or designer information |
Inventor after: MORIKAWA YUJI Inventor after: MATSUI YOSHIHIKO Inventor after: Tall and magnificent Inventor after: Higuchi Takashi Inventor after: Fujimura Kesuke Inventor after: Lu Zhonghao Inventor before: MORIKAWA YUJI Inventor before: MATSUI YOSHIHIKO Inventor before: OTAKA AKINOBU Inventor before: Tong Kouwu Inventor before: Fujimura Kensuke Inventor before: Chung en Lu |
|
COR | Change of bibliographic data |
Free format text: CORRECT: INVENTOR; FROM: MORIKAWA YUJI? MATSUI YOSHIHIKO OTAKA AKINOBU HIGUCHI TAKESHI? FUJIMURA KENSUKE ZHONG-HAO?LU TO: MORIKAWA YUJI? MATSUI YOSHIHIKO OTAKA AKINOBU HIGUCHI TAKESHI? FUJIMURA KENSUKE LU ZHONGHAO |
|
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant |