CN104130714A - 一种含有磨料的适用于金属的混合抛光液及其制备方法 - Google Patents
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Abstract
本发明公开了一种含有磨料的适用于金属的混合抛光液，其特征在于，由下列重量份的原料制成：氧化铝3-5、氧化铈8-10、碳化硅2-4、水杨酸钠1-2、硝酸钾4-6、咪唑啉3-5、硬脂酸钠3-5、聚二甲基硅氧烷2-4、冰醋酸3-5、蛋氨酸1-2、助剂5-7、去离子水300；本发明通过添加表面活性剂等成分对碳化硅等磨粒制备时进行改性，从而获得较高的抛光速率；添加助剂，具有良好的耐磨、分散、润滑、成膜性，在工件表面就形成一个阻隔空气层，可以阻止空气腐蚀；本发明抛光液属于水基抛光液，能大幅降低抛光时摩擦产生的温度，避免材料表面发生烧伤现象，适合铜、钢铁、不锈钢等金属。
Description
技术领域
本发明涉及表面处理技术领域，特别是一种含有磨料的适用于金属的混合抛光液及其制备方法。
背景技术
在绝大多数抛光液中，往往采用各种无机或有机颗粒作为磨料，例如二氧化硅、氧化铝、二氧化锆、氧化铈、氧化铁、聚合物颗粒或者混合物等。由于这些无机或有机颗粒具有不同的粒径、硬度、表面化学基团等特性，对各种抛光基材往往表现出不同的抛光性能，尤其在对基材的抛光速率和选择比上会有很大的差异。金属器具加工成形后表面通常会附着一层油污或其它化学制剂，器具使用一段时间后由使用环境的腐蚀，在表面会产生锈迹，为了美观和延长使用寿命，常用专用的金属清洗剂或抛光剂来清理表面的污物，现有的混合抛光液存在抛光性能较弱，容易产生气味、抛光后表面挂灰、抛光后容易生锈，需要做工序间防锈处理等问题，本发明即对该混合抛光液的技术改进。
发明内容
本发明的目的是提供一种含有磨料的适用于金属的混合抛光液及其制备方法。
为了实现本发明的目的，本发明通过以下方案实施：
一种含有磨料的适用于金属的混合抛光液，由下列重量份的原料制成：氧化铝3-5、氧化铈8-10、碳化硅2-4、水杨酸钠1-2、硝酸钾4-6、咪唑啉3-5、硬脂酸钠3-5、聚二甲基硅氧烷2-4、冰醋酸3-5、蛋氨酸1-2、助剂5-7、去离子水300；
所述助剂由以下重量份的原料制成：三氧化二铝4-6、纳米二氧化钛5-7、硅酸钠1-2、丙二醇甲醚醋酸酯3-4、十二碳醇酯2-3、丙烯酸甲酯2-4、交联羧甲基纤维素钠2-3、乳化剂BP4-5、水50-54；制备方法是首先将三氧化二铝、纳米二氧化钛、交联羧甲基纤维素钠、乳化剂BP加入一半量的水中，研磨1-2小时，然后缓慢加入其余剩余成分，缓慢加热至70℃-80℃，在300-500转/分条件下搅拌反应30-50分钟，冷却至室温即得。
本发明所述一种含有磨料的适用于金属的混合抛光液，由以下具体步骤制成：
(1)将氧化铈、碳化硅、硬脂酸钠混合均匀，加入适量的去离子水，加热至30℃-35℃，研磨25-35分钟，得到混合A料；
（2）将除助剂之外的其余剩余成分加入到反应釜中，搅拌混合均匀，缓慢加热至35℃-45℃，保温1-1.5小时，得到混合B料；
（3）将保温的混合B料边搅拌边缓慢加入到混合A料中，充分搅拌后加入助剂，继续搅拌20-30分钟，冷却至室温即得。
本发明的优异效果是：本发明通过添加表面活性剂等成分对碳化硅等磨粒制备时进行改性，从而获得较高的抛光速率；添加助剂，具有良好的耐磨、分散、润滑、成膜性，在工件表面就形成一个阻隔空气层，可以阻止空气腐蚀；本发明抛光液属于水基抛光液，能大幅降低抛光时摩擦产生的温度，避免材料表面发生烧伤现象，适合铜、钢铁、不锈钢等金属。
具体实施方式
下面通过具体实例对本发明进行详细说明。
一种含有磨料的适用于金属的混合抛光液，由下列重量份（公斤）的原料制成：氧化铝3、氧化铈8、碳化硅2、水杨酸钠1、硝酸钾4、咪唑啉3、硬脂酸钠3、聚二甲基硅氧烷2、冰醋酸3、蛋氨酸1、助剂5、去离子水300；
所述助剂由以下重量份（公斤）的原料制成：三氧化二铝4、纳米二氧化钛5、硅酸钠1、丙二醇甲醚醋酸酯3、十二碳醇酯2、丙烯酸甲酯2、交联羧甲基纤维素钠2、乳化剂BP4、水50；制备方法是首先将三氧化二铝、纳米二氧化钛、交联羧甲基纤维素钠、乳化剂BP加入一半量的水中，研磨1-2小时，然后缓慢加入其余剩余成分，缓慢加热至70℃-80℃，在300-500转/分条件下搅拌反应30-50分钟，冷却至室温即得。
本发明所述一种含有磨料的适用于金属的混合抛光液，由以下具体步骤制成：
(1)将氧化铈、碳化硅、硬脂酸钠混合均匀，加入适量的去离子水，加热至30℃-35℃，研磨25-35分钟，得到混合A料；
（2）将除助剂之外的其余剩余成分加入到反应釜中，搅拌混合均匀，缓慢加热至35℃-45℃，保温1-1.5小时，得到混合B料；
（3）将保温的混合B料边搅拌边缓慢加入到混合A料中，充分搅拌后加入助剂，继续搅拌20-30分钟，冷却至室温即得。
实验检测结果：肉眼观察各工件的表面，工件表面外观均匀、无异色或有轻微色差、且无雪花；采用微型光泽仪A-4430（德国BYK公司）测试各抛光工件表面的光泽度，光泽度为49 Gu。
Claims (2)
1.一种含有磨料的适用于金属的混合抛光液，其特征在于，由下列重量份的原料制成：氧化铝3-5、氧化铈8-10、碳化硅2-4、水杨酸钠1-2、硝酸钾4-6、咪唑啉3-5、硬脂酸钠3-5、聚二甲基硅氧烷2-4、冰醋酸3-5、蛋氨酸1-2、助剂5-7、去离子水300；
所述助剂由以下重量份的原料制成：三氧化二铝4-6、纳米二氧化钛5-7、硅酸钠1-2、丙二醇甲醚醋酸酯3-4、十二碳醇酯2-3、丙烯酸甲酯2-4、交联羧甲基纤维素钠2-3、乳化剂BP4-5、水50-54；制备方法是首先将三氧化二铝、纳米二氧化钛、交联羧甲基纤维素钠、乳化剂BP加入一半量的水中，研磨1-2小时，然后缓慢加入其余剩余成分，缓慢加热至70℃-80℃，在300-500转/分条件下搅拌反应30-50分钟，冷却至室温即得。
2.根据权利要求1所述一种含有磨料的适用于金属的混合抛光液，其特征在于，由以下具体步骤制成：
(1)将氧化铈、碳化硅、硬脂酸钠混合均匀，加入适量的去离子水，加热至30℃-35℃，研磨25-35分钟，得到混合A料；
（2）将除助剂之外的其余剩余成分加入到反应釜中，搅拌混合均匀，缓慢加热至35℃-45℃，保温1-1.5小时，得到混合B料；
（3）将保温的混合B料边搅拌边缓慢加入到混合A料中，充分搅拌后加入助剂，继续搅拌20-30分钟，冷却至室温即得。
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Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105385412A (zh) * | 2015-10-16 | 2016-03-09 | 珠海东锦石英科技有限公司 | 研磨液、研磨液制备工艺及研磨液的使用添加方法 |
| CN106318220A (zh) * | 2016-08-18 | 2017-01-11 | 江苏锦阳不锈钢制品有限公司 | 一种不锈钢表面加工用抛光液 |
| CN106318222A (zh) * | 2016-08-18 | 2017-01-11 | 江苏锦阳不锈钢制品有限公司 | 一种高精度抛光液的制备方法 |
| CN106467970A (zh) * | 2016-08-30 | 2017-03-01 | 宁波市鄞州伴佰精密机械有限公司 | 用于精密机械不锈钢零件的抛光液的制备方法 |
| EP3710549A4 (en) * | 2017-11-15 | 2021-08-18 | Saint-Gobain Ceramics&Plastics, Inc. | COMPOSITION FOR THE PERFORMANCE OF MATERIAL DISPOSAL OPERATIONS AND ITS PROCESS FOR ITS FORMATION |
| CN115247026A (zh) * | 2021-04-26 | 2022-10-28 | 福建晶安光电有限公司 | 一种蓝宝石抛光液及其制备方法 |
| CN117904636A (zh) * | 2024-01-19 | 2024-04-19 | 揭阳市潜信不锈钢制品有限公司 | 一种五金餐具高效抛光工艺 |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001310256A (ja) * | 2000-04-26 | 2001-11-06 | Hitachi Chem Co Ltd | 半導体用基板の研磨方法 |
| US20020032989A1 (en) * | 1998-12-21 | 2002-03-21 | Showa Denko K.K. | Cerium oxide slurry for polishing, process for preparing the slurry, and process for polishing with the slurry |
| US6428721B1 (en) * | 1998-12-01 | 2002-08-06 | Fujimi Incorporated | Polishing composition and polishing method employing it |
| CN101302404A (zh) * | 2008-07-01 | 2008-11-12 | 上海大学 | 纳米氧化铈复合磨粒抛光液的制备方法 |
| EP2063461A1 (en) * | 2006-09-13 | 2009-05-27 | Asahi Glass Company, Limited | Polishing agent for semiconductor integrated circuit device, polishing method, and method for manufacturing semiconductor integrated circuit device |
| CN101857775A (zh) * | 2010-06-13 | 2010-10-13 | 北京国瑞升科技有限公司 | 一种铌酸锂晶体抛光液及制备方法 |
| CN102533124A (zh) * | 2010-12-31 | 2012-07-04 | 上海硅酸盐研究所中试基地 | 碳化硅衬底用抛光液 |
-
2014
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Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6428721B1 (en) * | 1998-12-01 | 2002-08-06 | Fujimi Incorporated | Polishing composition and polishing method employing it |
| US20020032989A1 (en) * | 1998-12-21 | 2002-03-21 | Showa Denko K.K. | Cerium oxide slurry for polishing, process for preparing the slurry, and process for polishing with the slurry |
| JP2001310256A (ja) * | 2000-04-26 | 2001-11-06 | Hitachi Chem Co Ltd | 半導体用基板の研磨方法 |
| EP2063461A1 (en) * | 2006-09-13 | 2009-05-27 | Asahi Glass Company, Limited | Polishing agent for semiconductor integrated circuit device, polishing method, and method for manufacturing semiconductor integrated circuit device |
| CN101302404A (zh) * | 2008-07-01 | 2008-11-12 | 上海大学 | 纳米氧化铈复合磨粒抛光液的制备方法 |
| CN101857775A (zh) * | 2010-06-13 | 2010-10-13 | 北京国瑞升科技有限公司 | 一种铌酸锂晶体抛光液及制备方法 |
| CN102533124A (zh) * | 2010-12-31 | 2012-07-04 | 上海硅酸盐研究所中试基地 | 碳化硅衬底用抛光液 |
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| CN106467970A (zh) * | 2016-08-30 | 2017-03-01 | 宁波市鄞州伴佰精密机械有限公司 | 用于精密机械不锈钢零件的抛光液的制备方法 |
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| CN117904636A (zh) * | 2024-01-19 | 2024-04-19 | 揭阳市潜信不锈钢制品有限公司 | 一种五金餐具高效抛光工艺 |
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