CN104114747A - 金属材料、表面处理方法及装置 - Google Patents

金属材料、表面处理方法及装置 Download PDF

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Publication number
CN104114747A
CN104114747A CN201380009686.4A CN201380009686A CN104114747A CN 104114747 A CN104114747 A CN 104114747A CN 201380009686 A CN201380009686 A CN 201380009686A CN 104114747 A CN104114747 A CN 104114747A
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CN
China
Prior art keywords
metallic substance
cathode electrode
pending
base material
anode electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201380009686.4A
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English (en)
Chinese (zh)
Inventor
名越正泰
佐藤馨
野吕寿人
马场和彦
渡边精一
吉田壮贵
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JFE Steel Corp
Original Assignee
JFE Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by JFE Steel Corp filed Critical JFE Steel Corp
Publication of CN104114747A publication Critical patent/CN104114747A/zh
Pending legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00—Electrolytic etching or polishing
    • C25F3/02—Etching
    • C25F3/06—Etching of iron or steel

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • ing And Chemical Polishing (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Electroluminescent Light Sources (AREA)
CN201380009686.4A 2012-02-24 2013-02-21 金属材料、表面处理方法及装置 Pending CN104114747A (zh)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
JP2012-038553 2012-02-24
JP2012038557 2012-02-24
JP2012-038557 2012-02-24
JP2012038555 2012-02-24
JP2012-038555 2012-02-24
JP2012038553 2012-02-24
PCT/JP2013/054413 WO2013125658A1 (ja) 2012-02-24 2013-02-21 金属材料、表面処理方法及び装置

Publications (1)

Publication Number Publication Date
CN104114747A true CN104114747A (zh) 2014-10-22

Family

ID=49005835

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201380009686.4A Pending CN104114747A (zh) 2012-02-24 2013-02-21 金属材料、表面处理方法及装置

Country Status (7)

Country Link
EP (1) EP2818579A4 (https=)
JP (1) JP5817907B2 (https=)
KR (1) KR101687462B1 (https=)
CN (1) CN104114747A (https=)
IN (1) IN2014KN01697A (https=)
TW (1) TWI472424B (https=)
WO (1) WO2013125658A1 (https=)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111805022A (zh) * 2020-06-04 2020-10-23 南方科技大学 等离子体辅助电解加工方法及实施装置
CN112548922A (zh) * 2019-09-25 2021-03-26 施耐宝公司 紧固件保持和防滑脱工具钻头

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6498091B2 (ja) * 2015-09-25 2019-04-10 Ｊｘ金属株式会社 表面処理金属箔、積層体、プリント配線板、半導体パッケージ、電子機器

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0218043B2 (https=) * 1983-06-09 1990-04-24 Taishi Shokuhin Kogyo Kk
JPH04136198A (ja) * 1990-09-26 1992-05-11 Nau Chem:Yugen 電気めっき方法
JPH09241865A (ja) * 1996-03-01 1997-09-16 Kawasaki Steel Corp フィルム密着性、耐食性に優れたラミネート鋼板
CN1559081A (zh) * 2000-08-10 2004-12-29 ж� 利用外部影响在工件的上表面和空腔表面放置的添加剂之间产生差别的电镀方法和设备
US20100089759A1 (en) * 2007-02-15 2010-04-15 National University Corporation Hokkaido University Method for producing conductor fine particles
JP2010287648A (ja) * 2009-06-10 2010-12-24 Seiko Epson Corp 半導体装置の製造方法
CN102041540A (zh) * 2011-01-13 2011-05-04 中国科学院苏州纳米技术与纳米仿生研究所 三维渐变孔阵列纳米结构阳极氧化铝模板及其制备方法
CN103124809A (zh) * 2010-08-26 2013-05-29 杰富意钢铁株式会社 表面改性的导电性材料的制造方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06297252A (ja) * 1993-04-09 1994-10-25 Sony Corp 微細加工方法及びその装置
AUPR129900A0 (en) * 2000-11-08 2000-11-30 Chang, Chak Man Thomas Plasma electroplating
EP1371748A4 (en) * 2001-03-14 2009-07-29 Nippon Mining Co SPUTTERTARGET, WHICH PRODUCES VERY LITTLE PARTICLES, BACK PLATE OR APPARATUS IN SPUTTER DEVICE, AND SPARKLING METHOD THROUGH SPARK EROSION
JP2005329451A (ja) * 2004-05-21 2005-12-02 Fuji Photo Film Co Ltd アルミニウム板の表面加工方法及び平版印刷版用支持体並びに平版印刷版
JP5010966B2 (ja) * 2006-08-21 2012-08-29 株式会社神戸製鋼所 撥水性塗料および撥水金属板
JP5323677B2 (ja) * 2007-03-02 2013-10-23 古河電気工業株式会社 表面粗化銅板の製造方法及び装置、並びに表面粗化銅板

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0218043B2 (https=) * 1983-06-09 1990-04-24 Taishi Shokuhin Kogyo Kk
JPH04136198A (ja) * 1990-09-26 1992-05-11 Nau Chem:Yugen 電気めっき方法
JPH09241865A (ja) * 1996-03-01 1997-09-16 Kawasaki Steel Corp フィルム密着性、耐食性に優れたラミネート鋼板
CN1559081A (zh) * 2000-08-10 2004-12-29 ж� 利用外部影响在工件的上表面和空腔表面放置的添加剂之间产生差别的电镀方法和设备
US20100089759A1 (en) * 2007-02-15 2010-04-15 National University Corporation Hokkaido University Method for producing conductor fine particles
JP2010287648A (ja) * 2009-06-10 2010-12-24 Seiko Epson Corp 半導体装置の製造方法
CN103124809A (zh) * 2010-08-26 2013-05-29 杰富意钢铁株式会社 表面改性的导电性材料的制造方法
CN102041540A (zh) * 2011-01-13 2011-05-04 中国科学院苏州纳米技术与纳米仿生研究所 三维渐变孔阵列纳米结构阳极氧化铝模板及其制备方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112548922A (zh) * 2019-09-25 2021-03-26 施耐宝公司 紧固件保持和防滑脱工具钻头
CN112548922B (zh) * 2019-09-25 2023-08-25 施耐宝公司 紧固件保持和防滑脱工具钻头
CN111805022A (zh) * 2020-06-04 2020-10-23 南方科技大学 等离子体辅助电解加工方法及实施装置

Also Published As

Publication number Publication date
TWI472424B (zh) 2015-02-11
WO2013125658A1 (ja) 2013-08-29
EP2818579A4 (en) 2015-11-11
TW201341176A (zh) 2013-10-16
IN2014KN01697A (https=) 2015-10-23
KR101687462B1 (ko) 2016-12-16
EP2818579A1 (en) 2014-12-31
KR20140112559A (ko) 2014-09-23
JP5817907B2 (ja) 2015-11-18
JPWO2013125658A1 (ja) 2015-07-30

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Application publication date: 20141022