CN104070518B - A kind of Three-degree-of-freeprecision precision adjustment device based on eccentric structure - Google Patents
A kind of Three-degree-of-freeprecision precision adjustment device based on eccentric structure Download PDFInfo
- Publication number
- CN104070518B CN104070518B CN201410277880.7A CN201410277880A CN104070518B CN 104070518 B CN104070518 B CN 104070518B CN 201410277880 A CN201410277880 A CN 201410277880A CN 104070518 B CN104070518 B CN 104070518B
- Authority
- CN
- China
- Prior art keywords
- eccentric
- rectilinear motion
- motion
- base plate
- positioning component
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 230000033001 locomotion Effects 0.000 claims abstract description 171
- 238000009434 installation Methods 0.000 claims abstract description 58
- 238000006073 displacement reaction Methods 0.000 claims abstract description 15
- 238000005259 measurement Methods 0.000 claims abstract description 14
- 230000036316 preload Effects 0.000 claims abstract description 14
- 239000000758 substrate Substances 0.000 claims abstract description 4
- 239000000919 ceramic Substances 0.000 claims description 3
- 210000003734 kidney Anatomy 0.000 claims description 3
- 238000002604 ultrasonography Methods 0.000 claims description 3
- 238000001259 photo etching Methods 0.000 abstract description 8
- 238000007654 immersion Methods 0.000 description 6
- 230000005484 gravity Effects 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 230000007246 mechanism Effects 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 3
- 230000001413 cellular effect Effects 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000002360 explosive Substances 0.000 description 1
- 238000000671 immersion lithography Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
Landscapes
- Transmission Devices (AREA)
Abstract
The invention discloses a kind of Three-degree-of-freeprecision precision adjustment device based on eccentric structure.Motion platform is extended with three support arms along motion platform radial direction along side face is uniform, and the arm end of three support arms all has eccentric orfice, and the eccentric orfice of three support arms is respectively connected on installation base plate by the movement branched chain that structure is identical; Motherboard bottom surface is arranged on for the preload component of location and installation substrate, positioning component, positioning component and three preload components are looped around the installation base plate side between movement branched chain, and three levels are fixedly mounted on the motherboard bottom surface of positioning component side to displacement measurement assembly.The present invention fixes in order to the installation realizing immersed photoetching machine submergence unit and spatial pose regulates, and realizes submergence unit submicron order location; Rigidity of the present invention is high, and adjustable range is large, and motor imagination is fast, and adopt modularized design, compact conformation, equipment adjustment is simple and easy, and the three-freedom degree precision that can be used for beyond immersed photoetching machine under other occasion regulates.
Description
Technical field
The present invention relates to a kind of three degree of freedom regulating device, especially relate to a kind of Three-degree-of-freeprecision precision adjustment device based on eccentric structure.
Background technology
In immersed photoetching machine, in the end there is one deck immersion flow field between a slice projection objective and silicon chip.Immersion flow field is produced by submergence unit, and in order to prevent immersion flow field from leaking, and requires that gap between submergence unit and silicon chip is within 1mm, has strict depth of parallelism requirement to this gap simultaneously; Need in liquid immersion lithography process to carry out range of motion control to submergence unit, and in submergence unit motion controls, require that immersion flow field still meets condition of work requirement.This just needs a kind of accurate pose adjusting device to regulate the pose of submergence unit to meet the requirement of immersed photoetching machine.
In addition, for the pose governor motion of submergence unit, requirements of installation space is harsh.Because the litho machine equipment mechanism that to be a kind of height that the optical system of complexity and corresponding match mechanism will be grouped together in a limited space integrated, wherein all parts has strict installing space restriction.
Now conventional pose governor motion has a lot, divides substantially can be divided into tandem, parallel and hybrid three classes by frame for movement.Parallel pose governor motion has compared with other two kinds of governor motions that rigidity is high, working space is little, load capacity is strong, inertia is little, Dynamics, low cost and other advantages.Traditional pose adjustment structure in parallel adopts the side chain of general motion pair composition parallel institution, and such governor motion has three shortcomings, that is: conventional parallel structure takes up space greatly, and kinematic pair exists gap, and within the scope of micrometric displacement, mechanism exists creeping phenomenon.
Summary of the invention
In order to realize the fine adjustment of submergence unit pose in immersed photoetching machine, the object of the present invention is to provide a kind of Three-degree-of-freeprecision precision adjustment device based on eccentric structure, have that installing space is little, rigidity is high, response is fast, kinematic accuracy advantages of higher, motion platform [TZ can be realized, RX, RY] fine adjustment of Three Degree Of Freedom, Z axis is along installation base plate centre hole axis line upward direction, X, Y, Z axis meets Descartes's rectangular coordinate system, free degree TZ represents the translation along Z-direction, and free degree RX and RY represents the rotation around X and Y-axis respectively.
Technical scheme of the present invention is as follows:
Adjusting device of the present invention is arranged between motherboard and submergence unit, this adjusting device comprises three preload components, positioning component, three levels to displacement measurement assembly, installation base plate, motion platform and three movement branched chain, motion platform is extended with three support arms along motion platform radial direction along side face is uniform, the arm end of three support arms all has eccentric orfice, and the eccentric orfice of three support arms is respectively connected on installation base plate by the movement branched chain that structure is identical; Motherboard bottom surface is arranged on for the preload component of location and installation substrate, positioning component, positioning component and three preload components are looped around the installation base plate side between movement branched chain, and three levels are fixedly mounted on the motherboard bottom surface of positioning component side to displacement measurement assembly.
Described positioning component comprises X to positioning component and Y-direction positioning component, and X is positioned at installation base plate side to positioning component and Y-direction positioning component along orthogonal orientation and positions; Three levels are arranged on the motherboard bottom surface of Y-direction positioning component side to one of them of displacement measurement assembly, and two other is arranged on the motherboard bottom surface of X to positioning component both sides respectively.
Described level comprises proximity transducer, proximity transducer fixture to displacement measurement assembly, and proximity transducer is fixedly connected on motherboard bottom surface by proximity transducer fixture, and proximity transducer is towards installation base plate side.
Described movement branched chain comprises linear motion component, spherical bearing assembly and eccentric shaft thin-wall bearing assembly; Linear motion component top is arranged on installation base plate side, is connected bottom linear motion component with spherical bearing assembly, and spherical bearing assembly is enclosed within eccentric shaft thin-wall bearing assembly, and eccentric shaft thin-wall bearing assembly is contained in the eccentric orfice of motion platform support arm.
Described linear motion component: comprise rectilinear motion pair, connecting rod and connecting rod securing member, rectilinear motion pair comprises the secondary slide block of rectilinear motion, the secondary fixture of rectilinear motion, crossed roller guide rail, drive motors and balanced adjustment assembly, the secondary slide block both sides of rectilinear motion are connected to outside the secondary fixture of rectilinear motion by crossed roller slide, the end face normal direction that crossed roller guide rail is connected along motion platform with installation base plate is installed, installation base plate side is fixed on inside the secondary fixture of rectilinear motion, through hole is had along glide direction in the middle part of the secondary slide block of rectilinear motion, balanced adjustment assembly is provided with in through hole, drive motors is arranged on the secondary slide block side of rectilinear motion, drive motors drives the secondary slide block of rectilinear motion to move along crossed roller guide rail direction, connecting rod upper end is fixedly connected on the secondary slider bottom of rectilinear motion, and connecting rod lower end cover is had the spherical bearing of spherical bearing assembly and fixed by connecting rod securing member,
Described spherical bearing assembly: comprise spherical bearing and spherical bearing end cap; Spherical bearing is enclosed within connecting rod lower end, and spherical bearing is enclosed within eccentric shaft, and spherical bearing upper surface is fixedly connected with the eccentric shaft upper surface of eccentric shaft thin-wall bearing assembly vertically by spherical bearing end cap;
Described eccentric shaft thin-wall bearing assembly: comprise eccentric shaft, two thin-wall bearings and two thin-wall bearing end caps; Eccentric shaft side face is contained in eccentric orfice through two thin-wall bearings, two thin-wall bearings respectively by two thin-wall bearing end caps vertically location and installation in eccentric orfice.
Described balanced adjustment assembly comprises spring stop, ball, Compress Spring, spring cushion block and caging bolt; Through hole in the middle part of the secondary slide block of rectilinear motion is equipped with spring stop, ball, Compress Spring and spring cushion block downwards successively from end face, caging bolt is fixedly connected with the secondary fixture of rectilinear motion through the kidney slot on the secondary slide block of rectilinear motion, and spring cushion block lower end is pressed on caging bolt by Compress Spring.
Described drive motors is ultrasound piezoelectric ceramic motor.
Be provided with the electric limiting assembly for straight limit kinematic pair slide block movement stroke near the secondary bottom surface of each rectilinear motion described and installation base plate junction, electric limiting assembly comprises electric limiting baffle plate and electric switch; Electric limiting baffle plate one end is fixedly mounted on the bottom of the secondary slide block of rectilinear motion, and the electric limiting baffle plate other end is positioned at electric switch groove, and electric switch is fixedly mounted on installation base plate.
Two described thin-wall bearings are clamped on the both sides of eccentric shaft intermediate flange.
The beneficial effect that the present invention has is:
1. in the present invention, three groups of movement branched chain move up and down, the corresponding support arm of brought into motion platform is in diverse location in Z-direction, determine a plane at 3, therefore after three groups of movement branched chain motions stop, just the spatial pose of motion platform can be determined, the motion of three groups of movement branched chain can realize motion platform [TZ, RX, RY] fine adjustment of Three Degree Of Freedom, [the TZ of fixing submergence unit on the moving platform can be realized like this, RX, RY] three-freedom degree precision adjustment, the precision positioning of submergence unit submicron order can be realized.
2. the present invention adopts parallel-connection structure, and kinematic pair adopts Classical Motion secondary, and mechanism kinematic resistance is little, motor direct-drive, and decrease the add up error of motion, speed responsive is fast.
3. kinematic pair structure interference fit of the present invention, utilizes the gravity unbalance loading of motion platform, reduces pair clearance, increases kinematic accuracy.
4. use eccentric shaft structure in the present invention, with thin-wall bearing rotating shaft for revolute pair center, with the spherical bearing center in eccentric shaft for typed ball bearing pair center, realize the motion mode of typed ball bearing pair and revolute pair, eccentric structure is utilized to realize the motion structure of typed ball bearing pair, revolute pair, make system architecture simply compact, reduce device installation dimension, make device be easy to equipment adjustment.
5. the present invention adopts modular mentality of designing, based on Three-degree-of-freeprecision precision adjustment device and other device in immersed photoetching machine not being coupled functionally of eccentric structure, except the pose that can be used for submergence unit in immersed photoetching machine regulates, also can be used for having other pose of identical requirement to regulate occasion.
Accompanying drawing explanation
Fig. 1 is the schematic diagram of the present invention installation site in immersed photoetching machine.
Fig. 2 is three-dimensional view of the present invention.
Fig. 3 is explosive view of the present invention.
Fig. 4 is the sectional view of movement branched chain of the present invention.
Fig. 5 is the eccentric structure view in the present invention.
In figure: S1, optical system, S2, the present invention, S3, submergence unit, 1, motherboard, 2, immersion flow field, 3, silicon chip, 4, installation base plate, 4A, installation base plate installing hole, 4B, installation base plate side, 4C, construction bolt, 5, linear motion component, 5A, rectilinear motion is secondary, 5A1, the secondary slide block of rectilinear motion, 5A2, the secondary fixture of rectilinear motion, 5A3, crossed roller guide rail, 5A4, drive motors, 5B, connecting rod, 5C, connecting rod securing member, 5A5, balanced adjustment assembly, 5A5a, spring stop, 5A5b, ball, 5A5c, Compress Spring, 5A5d, spring cushion block, 5A5e, caging bolt, 6, spherical bearing assembly, 6A, spherical bearing, 6B, spherical bearing end cap, 7, eccentric shaft thin-wall bearing assembly, 7A, eccentric shaft, 7B, thin-wall bearing, 7C, thin-wall bearing end cap, 8, motion platform, 8A, submergence cellular installation hole, 8B, eccentric orfice, 9, electric limiting assembly, 9A, electric limiting baffle plate, 9B, electric switch, 10A, X are to positioning component, 10B, Y-direction positioning component, 11, level to displacement measurement assembly, 11A, proximity transducer, 11B, proximity transducer fixture, 12, preload component.
Detailed description of the invention
Below in conjunction with drawings and Examples, the present invention is described further.
As shown in Figure 1 and Figure 2, S2 of the present invention is arranged between motherboard 1 and submergence cell S 3, and optical system S1 runs through motherboard 1, S2 of the present invention and submergence cell S 3, exposes the silicon chip 3 being in bottom through immersion flow field 2.S2 of the present invention uses construction bolt 4C to be installed on motherboard 1 by installation base plate installing hole 4A, and adjust, locate and monitor the position of installation base plate 4, submergence cell S 3 is installed on motion platform 8 lower surface by submergence cellular installation hole 8A.
As shown in Figure 2 and Figure 3, S2 of the present invention comprises three preload components 12, positioning component, three levels to displacement measurement assembly 11, installation base plate 4, motion platform 8 and three movement branched chain, motion platform 8 is extended with three support arms along motion platform 8 radial direction along side face is uniform, the arm end of three support arms all has eccentric orfice 8B, the eccentric orfice 8B of three support arms is respectively connected on installation base plate 4 by the movement branched chain that structure is identical, and three movement branched chain are uniform is arranged on installation base plate side 4B; Motherboard 1 bottom surface is arranged on for the preload component 12 of location and installation substrate 4, positioning component, positioning component and three preload components 12 are looped around the installation base plate side 4B between movement branched chain, and three levels are fixedly mounted on motherboard 1 bottom surface of positioning component side to displacement measurement assembly 11.
Be connected with parallel way by the movement branched chain that three groups of structures are identical between installation base plate 4 and three support arms of motion platform 8, three groups of movement branched chain circle distribution centered by installation base plate 4 centre bore, is arranged on the installation base plate side 4B of installation base plate 4.
As shown in Figure 2 and Figure 3, positioning component comprises X and is positioned at installation base plate side 4B to positioning component 10A and Y-direction positioning component 10B, X to positioning component 10A and Y-direction positioning component 10B along orthogonal orientation and positions; Preload component 12 is arranged on all the other positions of 4B, installation base plate side, makes positioning component, preload component 12 is looped around around installation base plate 4; Three levels are arranged on motherboard 1 bottom surface of Y-direction positioning component 10B side to one of them of displacement measurement assembly 11, and two other is arranged on motherboard 1 bottom surface of X to positioning component 10A both sides respectively.
As shown in Figure 3, level comprises proximity transducer 11A, proximity transducer fixture 11B to displacement measurement assembly 11, proximity transducer 11A is fixedly connected on motherboard 1 bottom surface by proximity transducer fixture 11B, and proximity transducer 11A is towards installation base plate side 4B.
As shown in Figure 3, Figure 4, three groups of movement branched chain structures are identical, often organize movement branched chain and comprise linear motion component 5, spherical bearing assembly 6 and eccentric shaft thin-wall bearing assembly 7; Linear motion component 5 top is arranged on installation base plate side 4B, be connected with spherical bearing assembly 6 bottom linear motion component 5, spherical bearing assembly 6 is enclosed within eccentric shaft thin-wall bearing assembly 7, and eccentric shaft thin-wall bearing assembly 7 is contained in the eccentric orfice 8B of motion platform 8 support arm.
As shown in Figure 4, linear motion component 5: comprise rectilinear motion secondary 5A, connecting rod 5B and connecting rod securing member 5C, rectilinear motion secondary 5A comprises the secondary slide block 5A1 of rectilinear motion, the secondary fixture 5A2 of rectilinear motion, crossed roller guide rail 5A3, drive motors 5A4 and balanced adjustment assembly 5A5, the secondary slide block 5A1 both sides of rectilinear motion are slidably connected at outside the secondary fixture 5A2 of rectilinear motion by crossed roller guide rail 5A3, crossed roller guide rail 5A3 is along motion platform 8 end face normal direction, installation base plate side 4B is fixed on inside the secondary fixture 5A2 of rectilinear motion, through hole is had along glide direction in the middle part of the secondary slide block 5A1 of rectilinear motion, balanced adjustment assembly 5A5 is provided with in through hole, drive motors 5A4 is arranged on the secondary slide block 5A1 side of rectilinear motion, drive motors 5A4 drives the secondary slide block 5A1 of rectilinear motion to move along crossed roller guide rail 5A3 direction, connecting rod 5B upper end is fixedly connected on bottom the secondary slide block 5A1 of rectilinear motion, and connecting rod 5B lower end cover is had the spherical bearing 6A of spherical bearing assembly 6 and fixed by connecting rod securing member 5C.
As shown in Figure 4, spherical bearing assembly 6: comprise spherical bearing 6A and spherical bearing end cap 6B; Spherical bearing 6A is enclosed within connecting rod 5B lower end and is fixed by connecting rod securing member 5C, spherical bearing 6A is enclosed within eccentric shaft 7A, and spherical bearing 6A upper surface is fixedly connected with the eccentric shaft 7A upper surface of eccentric shaft thin-wall bearing assembly 7 vertically by spherical bearing end cap 6B.
As shown in Figure 4, eccentric shaft thin-wall bearing assembly 7: comprise eccentric shaft 7A, two thin-wall bearing 7B and two thin-wall bearing end cap 7C; Eccentric shaft 7A is enclosed within outside spherical bearing 6A, and eccentric shaft 7A side face is contained in eccentric orfice 8B through two thin-wall bearing 7B, two thin-wall bearing 7B respectively by two thin-wall bearing end cap 7C vertically location and installation in eccentric orfice 8B.
As shown in Figure 4, balanced adjustment assembly 5A5: comprise spring stop 5A5a, ball 5A5b, Compress Spring 5A5c, spring cushion block 5A5d and caging bolt 5A5e; Through hole in the middle part of the secondary slide block 5A1 of rectilinear motion is equipped with spring stop 5A5a, ball 5A5b, Compress Spring 5A5c and spring cushion block 5A5d downwards successively from end face, caging bolt 5A5e is fixedly connected with the secondary fixture 5A2 of rectilinear motion through the kidney slot on the secondary slide block 5A1 of rectilinear motion, and spring cushion block 5A5d lower end is pressed on caging bolt 5A5e by spring 5A5c; By regulating Compress Spring 5A5c, making spring force equal motion platform gravity, reaching initial equilibrium conditions.
Drive motors 5A4 is ultrasound piezoelectric ceramic motor.
The electric limiting assembly 9 for straight limit kinematic pair slide block 5A1 movement travel is provided with near each rectilinear motion secondary 5A bottom surface and installation base plate 4 junction.
Electric limiting assembly 9: comprise electric limiting baffle plate 9A and electric switch 9B; Electric limiting baffle plate 9A one end is fixedly mounted on the secondary slide block 5A1's of rectilinear motion, and the electric limiting baffle plate 9A other end is positioned at electric switch 9B groove, and electric switch 9B is fixedly mounted on installation base plate 4.
Two thin-wall bearing 7B are clamped on the both sides of eccentric shaft 7A intermediate flange.The present invention utilizes the eccentric structure at thin-wall bearing center and spherical bearing center to realize kinematic pair, makes more compact structure, has saved installing space, and gravity unbalance loading greatly reduces pair clearance.
Often organize in movement branched chain, the secondary slide block 5A1 of drive motors 5A4 Direct driver rectilinear motion moves along crossed roller guide rail 5A3 direction, the connecting rod 5B be connected with the secondary slide block 5A1 of rectilinear motion transmits and moves to spherical bearing 6A and thin-wall bearing 7B, it is made to rotate, and then the support arm motion of the corresponding respective straight moving parts 5 of brought into motion platform 8; In range of movement, often organizing movement branched chain can independently drive motion platform 8 correspondence perpendicular to the motion of support arm, three groups of movement branched chain and the respective vertical position of adjustable three motion platforms 8, often organizing movement branched chain can independently drive motion platform to move, determine a plane, namely determined the pose of motion platform 8 by this principle for 3.
As shown in Figure 5, during the present invention specifically implements, the support arm that three are stretched out on motion platform 8 with often organize the corresponding position of linear motion component 5 and have an eccentric orfice 8B, eccentric throw is 2.5mm, hole eccentric throw in eccentric shaft 7A is also 2.5mm, thin-wall bearing 7B spindle central (i.e. revolute pair position) and the spherical bearing 6A centre of gyration (i.e. typed ball bearing pair position) eccentric throw is 2.5mm.
The specific embodiment of the invention course of work is as follows:
As shown in Figure 1, Figure 2, Figure 3 shows, be connected by the movement branched chain that three groups of structures are identical between motion platform 8 and installation base plate 4, often organize in movement branched chain, use drive motors 5A4 as Direct driver source, two thin-wall bearing 7B fixed eccentric shaft 7A are in the eccentric orfice 8B of motion platform 8, and connecting rod 5B is through the spherical bearing 6A be fixed in eccentric shaft 7A hole; Utilize eccentric shaft structure; the distance of thin-wall bearing 7B spindle central (i.e. revolute pair position) and the spherical bearing 6A centre of gyration (i.e. typed ball bearing pair position) is the eccentric throw 2.5mm of eccentric shaft; utilize eccentric shaft structure to realize the parallel institution of S pair and R pair; to make more compact structure, reduce system installing space; Each kinematic pair adopts Classical Motion secondary, and the resistance of motion is less; Thin-wall bearing interference fit, motion platform gravity unbalance loading, eliminates the minim gap between bearing, reduces kinematic error; By the Compress Spring 5A5c in adjustment adjustment assembly 5A5, make spring force equal motion platform gravity, reach initial equilibrium conditions; The secondary slide block 5A1 of drive motors 5A4 Direct driver rectilinear motion is along moving along crossed roller guide rail 5A3 direction, the connecting rod 5B transmission be connected with the secondary slide block 5A1 of rectilinear motion moves to spherical bearing 6A and thin-wall bearing 7B and rotates, and then the support arm motion of brought into motion platform 8 line correspondence moving parts 5; Like this in range of movement, often organize movement branched chain and independently can drive the corresponding support arm motion of motion platform 8, the position of the support arm of three groups of movement branched chain and adjustable three motion platforms 8, determine a plane at 3, namely determined the pose of motion platform 8 by this principle, and then determine the pose of the submergence cell S 3 be connected on motion platform 8; Regulate the motion of three groups of movement branched chain can realize the fine adjustment of motion platform 8 at [TZ, RX, RY] Three Degree Of Freedom, the positioning precision often organizing movement branched chain can reach submicron order, therefore whole device can realize [TZ, RX, RY] the three submicron order pose adjustment freely of motion platform 8.
Above-mentioned detailed description of the invention is used for explaining and the present invention is described, instead of limits the invention, and in the protection domain of spirit of the present invention and claim, any amendment make the present invention and change, all fall into protection scope of the present invention.
Claims (9)
1. the Three-degree-of-freeprecision precision adjustment device based on eccentric structure, this adjusting device (S2) is arranged between motherboard (1) and submergence unit (S3), it is characterized in that: this adjusting device (S2) comprises three preload components (12), positioning component, three levels are to displacement measurement assembly (11), installation base plate (4), motion platform (8) and three movement branched chain, motion platform (8) is extended with three support arms along motion platform (8) radial direction along side face is uniform, the arm end of three support arms all has eccentric orfice (8B), the eccentric orfice (8B) of three support arms is respectively connected on installation base plate (4) by the movement branched chain that structure is identical, motherboard (1) bottom surface is arranged on for the preload component (12) of location and installation substrate (4), positioning component, positioning component and three preload components (12) are looped around the installation base plate side (4B) between movement branched chain, and three levels are fixedly mounted on motherboard (1) bottom surface of positioning component side to displacement measurement assembly (11).
2. a kind of Three-degree-of-freeprecision precision adjustment device based on eccentric structure according to claim 1, it is characterized in that: described positioning component comprises X to positioning component (10A) and Y-direction positioning component (10B), X is positioned at installation base plate side (4B) to positioning component (10A) and Y-direction positioning component (10B) along orthogonal orientation and positions; Three levels are arranged on motherboard (1) bottom surface of Y-direction positioning component (10B) side to one of them of displacement measurement assembly (11), and two other is arranged on motherboard (1) bottom surface of X to positioning component (10A) both sides respectively.
3. a kind of Three-degree-of-freeprecision precision adjustment device based on eccentric structure according to claim 1, it is characterized in that: described level comprises proximity transducer (11A), proximity transducer fixture (11B) to displacement measurement assembly (11), proximity transducer (11A) is fixedly connected on motherboard (1) bottom surface by proximity transducer fixture (11B), and proximity transducer (11A) is towards installation base plate side (4B).
4. a kind of Three-degree-of-freeprecision precision adjustment device based on eccentric structure according to claim 1, is characterized in that: described movement branched chain comprises linear motion component (5), spherical bearing assembly (6) and eccentric shaft thin-wall bearing assembly (7); Linear motion component (5) top is arranged on installation base plate side (4B), linear motion component (5) bottom is connected with spherical bearing assembly (6), spherical bearing assembly (6) is enclosed within eccentric shaft thin-wall bearing assembly (7), and eccentric shaft thin-wall bearing assembly (7) is contained in the eccentric orfice (8B) of motion platform (8) support arm.
5. a kind of Three-degree-of-freeprecision precision adjustment device based on eccentric structure according to claim 4, is characterized in that: described linear motion component (5): comprise rectilinear motion pair (5A), connecting rod (5B) and connecting rod securing member (5C), rectilinear motion pair (5A) comprises the secondary slide block (5A1) of rectilinear motion, the secondary fixture (5A2) of rectilinear motion, crossed roller guide rail (5A3), drive motors (5A4) and balanced adjustment assembly (5A5), secondary slide block (5A1) both sides of rectilinear motion are slidably connected at secondary fixture (5A2) outside of rectilinear motion by crossed roller guide rail (5A3), the end face normal direction that crossed roller guide rail (5A3) is connected along motion platform (8) with installation base plate (4) is installed, secondary fixture (5A2) inner side of rectilinear motion is fixed on installation base plate side (4B), secondary slide block (5A1) middle part of rectilinear motion has through hole along glide direction, balanced adjustment assembly (5A5) is provided with in through hole, drive motors (5A4) is arranged on secondary slide block (5A1) side of rectilinear motion, drive motors (5A4) drives the secondary slide block (5A1) of rectilinear motion to move along crossed roller guide rail (5A3) direction, connecting rod (5B) upper end is fixedly connected on secondary slide block (5A1) bottom of rectilinear motion, and connecting rod (5B) lower end cover is had the spherical bearing (6A) of spherical bearing assembly (6) and fixed by connecting rod securing member (5C),
Described spherical bearing assembly (6): comprise spherical bearing (6A) and spherical bearing end cap (6B); Spherical bearing (6A) is enclosed within connecting rod (5B) lower end, spherical bearing (6A) is enclosed within eccentric shaft (7A), and spherical bearing (6A) upper surface is fixedly connected with eccentric shaft (7A) upper surface of eccentric shaft thin-wall bearing assembly (7) vertically by spherical bearing end cap (6B);
Described eccentric shaft thin-wall bearing assembly (7): comprise eccentric shaft (7A), two thin-wall bearings (7B) and two thin-wall bearing end caps (7C); Eccentric shaft (7A) side face is contained in eccentric orfice (8B) through two thin-wall bearings (7B), two thin-wall bearings (7B) respectively by two thin-wall bearing end caps (7C) vertically location and installation in eccentric orfice (8B).
6. a kind of Three-degree-of-freeprecision precision adjustment device based on eccentric structure according to claim 5, is characterized in that: described balanced adjustment assembly (5A5) comprises spring stop (5A5a), ball (5A5b), Compress Spring (5A5c), spring cushion block (5A5d) and caging bolt (5A5e); The through hole at secondary slide block (5A1) middle part of rectilinear motion is equipped with spring stop (5A5a), ball (5A5b), Compress Spring (5A5c) and spring cushion block (5A5d) downwards successively from end face, caging bolt (5A5e) is fixedly connected with the secondary fixture (5A2) of rectilinear motion through the kidney slot on the secondary slide block (5A1) of rectilinear motion, and spring cushion block (5A5d) lower end is pressed on caging bolt (5A5e) by Compress Spring (5A5c).
7. a kind of Three-degree-of-freeprecision precision adjustment device based on eccentric structure according to claim 5, is characterized in that: described drive motors (5A4) is ultrasound piezoelectric ceramic motor.
8. a kind of Three-degree-of-freeprecision precision adjustment device based on eccentric structure according to claim 5, it is characterized in that: be provided with the electric limiting assembly (9) for straight limit kinematic pair slide block (5A1) movement travel near each described rectilinear motion pair (5A) bottom surface and installation base plate (4) junction, electric limiting assembly (9) comprises electric limiting baffle plate (9A) and electric switch (9B); Electric limiting baffle plate (9A) one end is fixedly mounted on the bottom of the secondary slide block (5A1) of rectilinear motion, and electric limiting baffle plate (9A) other end is positioned at electric switch (9B) groove, and electric switch (9B) is fixedly mounted on installation base plate (4).
9. a kind of Three-degree-of-freeprecision precision adjustment device based on eccentric structure according to claim 5, is characterized in that: two described thin-wall bearings (7B) are clamped on the both sides of eccentric shaft (7A) intermediate flange.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410277880.7A CN104070518B (en) | 2014-06-20 | 2014-06-20 | A kind of Three-degree-of-freeprecision precision adjustment device based on eccentric structure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410277880.7A CN104070518B (en) | 2014-06-20 | 2014-06-20 | A kind of Three-degree-of-freeprecision precision adjustment device based on eccentric structure |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN104070518A CN104070518A (en) | 2014-10-01 |
| CN104070518B true CN104070518B (en) | 2015-09-02 |
Family
ID=51592336
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410277880.7A Expired - Fee Related CN104070518B (en) | 2014-06-20 | 2014-06-20 | A kind of Three-degree-of-freeprecision precision adjustment device based on eccentric structure |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN104070518B (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105301883B (en) * | 2015-11-06 | 2017-03-22 | 中国科学院长春光学精密机械与物理研究所 | XYZ TDOF hydraulic regulating device |
| CN109938694B (en) * | 2019-01-31 | 2021-10-08 | 华中科技大学苏州脑空间信息研究院 | Multi-channel imaging system and image surface registration method |
| CN109849037B (en) * | 2019-04-11 | 2023-09-19 | 上海焕巍智能科技有限公司 | Robot gripper |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1794091A (en) * | 2005-12-27 | 2006-06-28 | 上海微电子装备有限公司 | Precision positioning and regulating tool |
| CN1988127A (en) * | 2006-12-28 | 2007-06-27 | 上海交通大学 | Silicon sheet pre-positioning system based on multiple sensor data fusing |
| CN201994077U (en) * | 2010-12-30 | 2011-09-28 | 上海微电子装备有限公司 | Rotational DOF precise regulating and positioning mechanism |
| CN202306139U (en) * | 2011-09-28 | 2012-07-04 | 浙江大学 | 3-PSR-V parallel connection mechanism for regulating immersion unit |
| CN103279013A (en) * | 2013-05-20 | 2013-09-04 | 浙江大学 | Three-freedom-degree precise regulating device based on ball location |
| CN103465258A (en) * | 2013-09-13 | 2013-12-25 | 浙江大学 | Three-degree-of-freedom precision adjustment device based on flexible hinges |
| CN103511481A (en) * | 2012-06-20 | 2014-01-15 | 上海宇航系统工程研究所 | Rotation positioning device |
| DE102013213254A1 (en) * | 2013-07-05 | 2014-05-22 | Carl Zeiss Smt Gmbh | Eccentric cam drive for use in tilting device for adjusting tilting angle of facet mirror of extreme UV-projection exposure system in e.g. electrical engineering, has driver element driving positioning unit relative to adjusting element |
-
2014
- 2014-06-20 CN CN201410277880.7A patent/CN104070518B/en not_active Expired - Fee Related
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1794091A (en) * | 2005-12-27 | 2006-06-28 | 上海微电子装备有限公司 | Precision positioning and regulating tool |
| CN1988127A (en) * | 2006-12-28 | 2007-06-27 | 上海交通大学 | Silicon sheet pre-positioning system based on multiple sensor data fusing |
| CN201994077U (en) * | 2010-12-30 | 2011-09-28 | 上海微电子装备有限公司 | Rotational DOF precise regulating and positioning mechanism |
| CN202306139U (en) * | 2011-09-28 | 2012-07-04 | 浙江大学 | 3-PSR-V parallel connection mechanism for regulating immersion unit |
| CN103511481A (en) * | 2012-06-20 | 2014-01-15 | 上海宇航系统工程研究所 | Rotation positioning device |
| CN103279013A (en) * | 2013-05-20 | 2013-09-04 | 浙江大学 | Three-freedom-degree precise regulating device based on ball location |
| DE102013213254A1 (en) * | 2013-07-05 | 2014-05-22 | Carl Zeiss Smt Gmbh | Eccentric cam drive for use in tilting device for adjusting tilting angle of facet mirror of extreme UV-projection exposure system in e.g. electrical engineering, has driver element driving positioning unit relative to adjusting element |
| CN103465258A (en) * | 2013-09-13 | 2013-12-25 | 浙江大学 | Three-degree-of-freedom precision adjustment device based on flexible hinges |
Also Published As
| Publication number | Publication date |
|---|---|
| CN104070518A (en) | 2014-10-01 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN101241314B (en) | 6 freedom degrees precision positioning station capable of compensating Z-direction position | |
| US8899887B2 (en) | Drilling apparatus with a decoupled force frame and metrology frame for enhanced positioning | |
| CN103226296B (en) | Rough-fine-movement laminated workbench with laser interferometer measurement | |
| CN101533226B (en) | Leveling and focusing mechanism and microstage and workpiece stage using same | |
| CN103252761A (en) | Long-stroke two-dimensional nano worktable system with angle compensation function | |
| CN102145456B (en) | Tabletop milling machine, gantry tabletop milling machine and combined motion platform | |
| CN108214423B (en) | Motion platform for OLED detection equipment | |
| CN101386141A (en) | Mixed straight line gyration quick cutter servo device | |
| CN107942622B (en) | Three-degree-of-freedom precise adjustment parallel mechanism based on double flexible pairs | |
| CN102152133A (en) | Five-coordinate locating mechanism | |
| CN203245845U (en) | Large stroke two-dimensional nanometer work table system with angle compensation function | |
| CN103226295A (en) | Lithography machine silicon wafer bench micro-motion workbench | |
| CN104070518B (en) | A kind of Three-degree-of-freeprecision precision adjustment device based on eccentric structure | |
| CN202106070U (en) | Desktop milling machine, gantry type desktop milling machine and combined moving platform | |
| CN1866494A (en) | High precision silicon slice bench and uses thereof | |
| CN201097108Y (en) | Balanced vibration reduction precise positioning device | |
| KR20170031076A (en) | Positioning arrangement | |
| CN103383526B (en) | The dynamic stacking workbench of a kind of thick essence | |
| CN104400763A (en) | Gas lubrication and friction damping composition type high-rigidity and high-stability two-dimensional adjusting workbench | |
| CN103465258B (en) | A kind of Three-degree-of-freeprecision precision adjustment device based on flexible hinge | |
| CN1963374A (en) | Large range motion, high speed and precision orientation apparatus of two coordinate axes | |
| CN110658688B (en) | Workpiece table system and photoetching equipment | |
| CN112289727B (en) | Chip position adjusting mechanism and chip transmission mechanism | |
| US11143529B2 (en) | Cantilever linear motion reference device employing two-layer air suspension | |
| CN203275876U (en) | Micromotion working platform of silicon wafer platform of a photoetching machine |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20150902 Termination date: 20200620 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |